CN101494170A - Method for preparing Sm2O3 film by microwave assisted hydrothermal process - Google Patents

Method for preparing Sm2O3 film by microwave assisted hydrothermal process Download PDF

Info

Publication number
CN101494170A
CN101494170A CNA2009100211919A CN200910021191A CN101494170A CN 101494170 A CN101494170 A CN 101494170A CN A2009100211919 A CNA2009100211919 A CN A2009100211919A CN 200910021191 A CN200910021191 A CN 200910021191A CN 101494170 A CN101494170 A CN 101494170A
Authority
CN
China
Prior art keywords
solution
hydrothermal
microwave
film
controlled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA2009100211919A
Other languages
Chinese (zh)
Other versions
CN101494170B (en
Inventor
殷立雄
黄剑锋
曹丽云
李娟莹
黄艳
马小波
朱佳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shaanxi University of Science and Technology
Original Assignee
Shaanxi University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shaanxi University of Science and Technology filed Critical Shaanxi University of Science and Technology
Priority to CN 200910021191 priority Critical patent/CN101494170B/en
Publication of CN101494170A publication Critical patent/CN101494170A/en
Application granted granted Critical
Publication of CN101494170B publication Critical patent/CN101494170B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Inorganic Compounds Of Heavy Metals (AREA)
  • Formation Of Insulating Films (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Abstract

The invention provides a microwave hydrothermal method which is used for preparing a Sm2O3 film. An analyzed pure SmC13 question mark 6H2O is added into deionized water and is stirred on a magnetic stirring apparatus so as to lead the analyzed pure SmC13 question mark 6H2O to dissolve and a solution A is obtained; the solution A is heated, stirred and mixed with hartshorn to adjust the pH value, and a solution B of which the pH value is 5.4 swung 6.0 is obtained; the solution B is poured into a microwave hydrothermal kettle, and a clean uropatagia is immersed into the solution B. Then the microwave hydrothermal kettle is sealed and put into a warm-pressing and double-control microwave hydrothermal reactor for hydro-thermal reaction; after the reaction, the kettle is naturally cooled to room temperature; and the hydrothermal kettle is opened, and the uropatagia is taken out, washed with absolute ethyl alcohol and placed in a vacuum drying chamber, and a Sm2O3 optical thin-film is obtained. As the preparation process of the invention is finished at a time in liquidoid and needs no crystallization heat treatment, thus avoiding the curling, season check and grain growth coarsening of the Sm2O3 film which can be caused in the heat treatment and the defects of film and underlay or atmosphere reaction and the like.

Description

A kind of microwave-hydrothermal method prepares Sm 2O 3The method of film
Technical field
The present invention relates to a kind of Sm 2O 3The thin film technology method, particularly a kind of microwave-hydrothermal method prepares Sm 2O 3The method of film.
Background technology
Sm 2O 3Be a kind of pale yellow powder, easily deliquescence is water insoluble, is soluble in inorganic acid.Sm 2O 3Conversion of Energy material and the optoelectronic thin film material of a new generation.Sm 2O 3Film can be used to prepare optical switch, data storage, photo-electric conversion element and electrical switch etc.; Sm 2O 3Film also can be used in the filter of electronics body, magnetic material and special glass; In addition nanometer Sm 2O 3Can also be used for ceramic capacitor and catalyst aspect, have wide development prospect should be arranged.
The preparation Sm that reports at present 2O 3The method of optical thin film is mainly vacuum evaporation [V.A.Rozhkov, A.Yu.Trusova, I.G.Berezhnoy.Silicon MIS structuresusing samarium oxide films.Thin Solid Films 325 (1998) 151-155] and the method [A.A.Dakhel.dielecyric and optical properties ofsamarium oxide thin films, Journal of Alloys and Compounds365 (2004) 233-239] of atmosphere evaporation.The method of vacuum evaporation is to heat Sm under vacuum condition 2O 3, obtain Sm in low temperature base version deposition 2O 3Film.The method of atmosphere evaporation is to heat Sm under oxygen atmosphere 2O 3, obtain Sm in low temperature base version deposition 2O 3Film.These two kinds of methods are all very high to equipment requirement, and equipment and instrument is relatively more expensive, owing to evaporation exists in whole container, to Sm 2O 3The utilization rate of raw material is very little.In order to reach practical purpose, must the low Sm of Development and Production cost 2O 3Optoelectronic film preparation technology.Other has the report standby Sm of hydro-thermal legal system 2O 3Optoelectronic film [Huang Jianfeng, Cao Liyun, Huang Yan etc. a kind of hydro-thermal prepares Sm 2O 3The method of film [P]. Chinese patent: 200510096004.5,2006-03-01.].
Summary of the invention
The object of the present invention is to provide a kind of microwave-hydrothermal method to prepare Sm 2O 3The method of film, this method equipment is simple, and preparation time is short, easily control, and synthesize cheaply Sm 2O 3Film.
For achieving the above object, the present invention adopts technical scheme to be:
1) at first, with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.05~0.4mol/L;
2) secondly, 45~55 ℃ of stirrings, and to adopt mass percent be that 5~10% ammonia spirit regulates that to make the pH value of solution be 5.4~6.0, stirs and form solution B after 3~5 hours with clear solution A;
3) then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 50~67%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 220~300 ℃, reaction time was controlled at 4~8 hours, and reaction naturally cools to room temperature after finishing;
4) last, open water heating kettle, take out substrate and wash 4 times with absolute ethyl alcohol, and place 80~120 ℃ vacuum drying chamber inner drying namely to obtain Sm at substrate surface 2O 3Optical thin film.
The present invention adopts microwave-hydrothermal method to prepare Sm 2O 3Optoelectronic film is because preparation Sm 2O 3The film reaction is once finished in liquid phase, does not need the crystallization and thermal treatment in later stage, thereby has avoided Sm 2O 3That film may cause in heat treatment process is curling, dry and cracked, grain coarsening and film and the defectives such as substrate or atmosphere reaction, and the Sm for preparing 2O 3Optoelectronic film purity is higher, controlled, even, fine and close, the no visible defects of grain growth, the film that presentation quality is higher, and apparatus and process is simple, and preparation time is short, has broad application prospects.
Embodiment
Embodiment 1: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.17mol/L; Secondly, 55 ℃ of stirrings, and to adopt mass percent be that 5% ammonia spirit regulates that to make the pH value of solution be 5.8, stirs and form solution B after 3 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 63%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 280 ℃, reacted 5 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 100 ℃ vacuum drying chamber inner drying promptly can obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
Embodiment 2: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.25mol/L; Secondly, 48 ℃ of stirrings, and to adopt mass percent be that 8% ammonia spirit regulates that to make the pH value of solution be 5.6, stirs and form solution B after 5 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 58%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 250 ℃, reacted 6 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 80 ℃ vacuum drying chamber inner drying promptly can obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
Embodiment 3: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.33mol/L; Secondly, 52 ℃ of stirrings, and to adopt mass percent be that 6% ammonia spirit regulates that to make the pH value of solution be 6.0, stirs and form solution B after 4 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 67%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 220 ℃, reacted 8 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 110 ℃ vacuum drying chamber inner drying promptly can obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
Embodiment 4: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.05mol/L; Secondly, 45 ℃ of stirrings, and to adopt mass percent be that 9% ammonia spirit regulates that to make the pH value of solution be 5.5, stirs and form solution B after 5 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 55%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 260 ℃, reacted 7 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 90 ℃ vacuum drying chamber inner drying promptly can obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
Embodiment 5: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.1mol/L; Secondly, 50 ℃ of stirrings, and to adopt mass percent be that 7% ammonia spirit regulates that to make the pH value of solution be 5.7, stirs and form solution B after 3 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 50%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 300 ℃, reacted 4 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 120 ℃ vacuum drying chamber inner drying promptly can obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
Embodiment 6: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.4mol/L; Secondly, 53 ℃ of stirrings, and to adopt mass percent be that 10% ammonia spirit regulates that to make the pH value of solution be 5.4, stirs and form solution B after 4 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 60%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 240 ℃, reacted 8 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 105 ℃ vacuum drying chamber inner drying promptly can obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
Because the present invention prepares Sm 2O 3The film reaction is once finished in liquid phase, does not need the crystallization and thermal treatment in later stage, thereby has avoided Sm 2O 3That film may cause in heat treatment process is curling, dry and cracked, grain coarsening and film and the defectives such as substrate or atmosphere reaction, and process equipment is simple, and gained film purity is higher, and grain growth is controlled.Can prepare evenly, densification, no visible defects, the higher film of presentation quality, prepared film shows certain oriented growth trend, and film has the strong absorption effect and visible light is had strong anti-reflection effect ultraviolet ray.And utilize the microwave hydrothermal method can better improve the quality of film and shorten the reaction time than simple hydro thermal method.

Claims (7)

1, a kind of microwave-hydrothermal method prepares Sm 2O 3The method of film is characterized in that:
1) at first, with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.05~0.4mol/L;
2) secondly, 45~55 ℃ of stirrings, and to adopt mass percent be that 5~10% ammonia spirit regulates that to make the pH value of solution be 5.4~6.0, stirs and form solution B after 3~5 hours with clear solution A;
3) then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 50~67%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 220~300 ℃, reaction time was controlled at 4~8 hours, and reaction naturally cools to room temperature after finishing;
4) last, open water heating kettle, take out substrate and wash 4 times with absolute ethyl alcohol, and place 80~120 ℃ vacuum drying chamber inner drying namely to obtain Sm at substrate surface 2O 3Optical thin film.
2, microwave-hydrothermal method according to claim 1 prepares Sm 2O 3The method of film is characterized in that: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.17mol/L; Secondly, 55 ℃ of stirrings, and to adopt mass percent be that 5% ammonia spirit regulates that to make the pH value of solution be 5.8, stirs and form solution B after 3 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 63%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the MDS-8 type temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 280 ℃, reacted 5 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 100 ℃ vacuum drying chamber inner drying promptly to obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
3, microwave-hydrothermal method according to claim 1 prepares Sm 2O 3The method of film is characterized in that: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.25mol/L; Secondly, 48 ℃ of stirrings, and to adopt mass percent be that 8% ammonia spirit regulates that to make the pH value of solution be 5.6, stirs and form solution B after 5 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 58%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 250 ℃, reacted 6 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 80 ℃ vacuum drying chamber inner drying promptly to obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
4, microwave-hydrothermal method according to claim 1 prepares Sm 2O 3The method of film is characterized in that: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.33mol/L; Secondly, 52 ℃ of stirrings, and to adopt mass percent be that 6% ammonia spirit regulates that to make the pH value of solution be 6.0, stirs and form solution B after 4 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 67%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 220 ℃, reacted 8 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 110 ℃ vacuum drying chamber inner drying promptly to obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
5, microwave-hydrothermal method according to claim 1 prepares Sm 2O 3The method of film is characterized in that: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.05mol/L; Secondly, 45 ℃ of stirrings, and to adopt mass percent be that 9% ammonia spirit regulates that to make the pH value of solution be 5.5, stirs and form solution B after 5 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 55%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 260 ℃, reacted 7 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 90 ℃ vacuum drying chamber inner drying promptly to obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
6, microwave-hydrothermal method according to claim 1 prepares Sm 2O 3The method of film is characterized in that: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.1mol/L; Secondly, 50 ℃ of stirrings, and to adopt mass percent be that 7% ammonia spirit regulates that to make the pH value of solution be 5.7, stirs and form solution B after 3 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 50%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 300 ℃, reacted 4 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 120 ℃ vacuum drying chamber inner drying promptly to obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
7, microwave-hydrothermal method according to claim 1 prepares Sm 2O 3The method of film is characterized in that: at first, and with analytically pure SmCl 36H 2O adds in the deionized water, stirs on magnetic stirring apparatus and makes its dissolving, makes Sm 3+Concentration is the clear solution A of 0.4mol/L; Secondly, 53 ℃ of stirrings, and to adopt mass percent be that 10% ammonia spirit regulates that to make the pH value of solution be 5.4, stirs and form solution B after 4 hours with clear solution A; Then, solution B is poured in the microwave hydrothermal still, compactedness is controlled at 60%, the substrate that cleans up is immersed in the solution B, seal the microwave hydrothermal still then, put it in the two control of the temperature and pressure microwave hydrothermal reaction, hydrothermal temperature is controlled at 240 ℃, reacted 8 hours, reaction naturally cools to room temperature after finishing; At last, open water heating kettle, take out substrate and wash 4 times, and place 105 ℃ vacuum drying chamber inner drying promptly to obtain Sm at substrate surface with absolute ethyl alcohol 2O 3Optical thin film.
CN 200910021191 2009-02-19 2009-02-19 Method for preparing Sm2O3 film by microwave assisted hydrothermal process Expired - Fee Related CN101494170B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200910021191 CN101494170B (en) 2009-02-19 2009-02-19 Method for preparing Sm2O3 film by microwave assisted hydrothermal process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200910021191 CN101494170B (en) 2009-02-19 2009-02-19 Method for preparing Sm2O3 film by microwave assisted hydrothermal process

Publications (2)

Publication Number Publication Date
CN101494170A true CN101494170A (en) 2009-07-29
CN101494170B CN101494170B (en) 2010-12-29

Family

ID=40924690

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200910021191 Expired - Fee Related CN101494170B (en) 2009-02-19 2009-02-19 Method for preparing Sm2O3 film by microwave assisted hydrothermal process

Country Status (1)

Country Link
CN (1) CN101494170B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102330081A (en) * 2011-10-13 2012-01-25 陕西科技大学 Method for preparing Sm2O3 film by solvent heat method
CN104071821A (en) * 2014-06-20 2014-10-01 陕西科技大学 Method for preparing Sm(OH)3/ZnO composite film by using homogeneous hydrothermal method
CN104556201A (en) * 2015-01-19 2015-04-29 陕西科技大学 Method for preparing Sm(OH3)3/CuO nano composite by microwave-hydrothermal process
CN105110653A (en) * 2015-07-27 2015-12-02 陕西科技大学 Sol-gel preparation method of Sm2O3 film from sol prepared by peptization method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102330081A (en) * 2011-10-13 2012-01-25 陕西科技大学 Method for preparing Sm2O3 film by solvent heat method
CN104071821A (en) * 2014-06-20 2014-10-01 陕西科技大学 Method for preparing Sm(OH)3/ZnO composite film by using homogeneous hydrothermal method
CN104071821B (en) * 2014-06-20 2015-11-04 陕西科技大学 A kind of homogeneous phase hydrothermal method that adopts prepares Sm (OH) 3the method of/ZnO laminated film
CN104556201A (en) * 2015-01-19 2015-04-29 陕西科技大学 Method for preparing Sm(OH3)3/CuO nano composite by microwave-hydrothermal process
CN104556201B (en) * 2015-01-19 2016-03-30 陕西科技大学 A kind of microwave-hydrothermal method that adopts prepares Sm (OH) 3the method of/CuO nano-complex
CN105110653A (en) * 2015-07-27 2015-12-02 陕西科技大学 Sol-gel preparation method of Sm2O3 film from sol prepared by peptization method

Also Published As

Publication number Publication date
CN101494170B (en) 2010-12-29

Similar Documents

Publication Publication Date Title
CN102330081B (en) Method for preparing Sm2O3 film by solvent heat method
CN104058461B (en) A kind of delafossite structure CuFeO2The low temperature preparation method of crystalline material
CN109368702B (en) Preparation method of tungsten-bronze-structured cesium tungstate
CN101494170B (en) Method for preparing Sm2O3 film by microwave assisted hydrothermal process
CN107986323B (en) A kind of CsPb2Br5The preparation method of inorganic perovskite nanometer sheet
CN106745226A (en) Micro-nano titanium dioxide and preparation method and application based on eutectic solvent synthesis
CN110563035A (en) Rare earth zirconate nano powder and preparation method and application thereof
Wang et al. Mutual composition transformations among 2D/3D organolead halide perovskites and mechanisms behind
CN101289191B (en) Transparent meso-porousearth silicon gel monolithi material
CN104477977A (en) Method for synthesizing Dy2TiO5 powder by molten-salt growth method
CN102775989B (en) Synthetic method of terbium-doped zinc tungstate long afterglow nano rod array
CN108910948A (en) A kind of niobic acid tin nanometer sheet and preparation method thereof
CN108439462B (en) Preparation method of pyrochlore type rare earth titanate powder
CN101486482B (en) Method for preparing Sm2O3 nano powder by microwave-hydrothermal method
CN104071821B (en) A kind of homogeneous phase hydrothermal method that adopts prepares Sm (OH) 3the method of/ZnO laminated film
CN100386473C (en) Collosol/gel preparation method for Sm2O3 photoelectric film
CN100359044C (en) Hydrothermal Sm2O3 film preparing process
CN110639437B (en) Preparation method of silicon-aluminum oxide composite aerogel based on non-hydrolytic sol-gel technology
CN102774879B (en) Preparation method of dual-phase coexistence one-dimensional structure tin dioxide
CN103352251B (en) Solvothermal method for preparing Sm2O3 nanoarray
CN101289192B (en) Method for preparing transparent meso-porousearth silicon gel monolithi material
CN115020598A (en) Promote inorganic CsPbI 3 Method for stabilizing perovskite film environment
CN103390692A (en) Method for producing copper indium tellurium film
CN104140090B (en) A kind of preparation method of hydrophilic ordered mesoporous carbon material
CN102897818A (en) Method for preparing Sm2O3 semiconductor nanocrystals with hexagonal sheet structures

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20101229

Termination date: 20140219