CN101492237B - Mounting placing stand for photoelectric glass overflow well - Google Patents
Mounting placing stand for photoelectric glass overflow well Download PDFInfo
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- CN101492237B CN101492237B CN2008102364435A CN200810236443A CN101492237B CN 101492237 B CN101492237 B CN 101492237B CN 2008102364435 A CN2008102364435 A CN 2008102364435A CN 200810236443 A CN200810236443 A CN 200810236443A CN 101492237 B CN101492237 B CN 101492237B
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- underframe
- installation rack
- photoelectric glass
- overflow well
- glass overflow
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
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Abstract
The invention relates to a mounting and placing bracket for a photoelectrical glass overflow chute, which comprises an underframe and four upright posts vertically fixed on four corners of the underframe, wherein each two upper parts of the upright posts are fixedly connected with two cross bars which are parallel with long edges of the underframe; each two upright posts are connected with a triangular support on the lateral surface on which two short edges of the underframe are positioned; the upper surface of the triangular support is laid with a soft gasket; the upper ends of the four upright posts are provided with lifting rings; and a strutting piece is vertically connected between the two cross bars. The mounting and placing bracket not only has a simple structure and low manufacturing cost, but also is convenient and effective to use, and can absolutely mount the overflow chute into a muffle furnace safely under the condition that the overflow chute is not damaged at all.
Description
Technical field
The invention belongs to flat-panel monitor photoelectric glass substrate and make the field, relate to a kind of device of using the method production photoelectric glass substrate of overflow down draw, particularly a kind of installation rack that is used for photoelectric glass overflow well.
Background technology
Produce photoelectric glass substrate production technology as high-quality with the method for overflow down draw, the production method of a kind of being referred to as " overflow fusion glass tube down-drawing " is arranged.The silicate of process high-temperature fusion forms the glass precursor solution of molten state, and the glass more than recrystallization temperature enters retort furnace, and under the effect of overflow groove, overflow is merged in retort furnace, moulding, and annealing.Therein in the retort furnace installation of overflow groove and intact be one of them key.
The above sheet glass of narrating mainly refers to be used for the liquid crystal substrate glass of flat panel display, and this base plate glass has characteristics such as high heat resistance, high-clarity, agent of low hygroscopicity, high flat degree, good solvent resistance, scratch resistance performance, anti-strongly-acid, strong basicity resisting.
The liquid crystal flat-panel technique of display is strict to the specification of quality of base plate glass surface finish and thickness, if the substrate precision can not guarantee, the spacing that then constitutes between two substrates will produce local error, can directly have influence on the electric field and the pixel of indicating meter like this, make the gray scale and the color of indicating meter inhomogeneous, produce defectives such as bright spot.Also reach 1/10mm for base plate glass physical dimension claimed accuracy.On the whole, liquid crystal substrate glass is exactly that a kind of strict nothing is owed a glass.
The glass substrate that is used for liquid-crystal display requires to have higher recrystallization temperature and high strength, and the glass precursor solution through high-temperature digestion is shaped to satisfactory glass substrate in retort furnace.Therefore the running status of retort furnace is determining the quality of product.
The process of producing the photoelectric glass substrate with the method for overflow down draw is: the glass of melting is flow to overflow groove, overflow by the upper edge of overflow groove, form under two glass flows surface currents, merge into plate in the tip of overflow groove.Realize that this process must set up proper temperature environment to overflow groove, retort furnace is exactly the equipment that the suitable temp environment is provided to overflow groove, can run into overflow groove is installed to problem in the retort furnace in the manufacturing assembling process of retort furnace.Because the material of overflow groove is all selected special refractories for use, material is highly brittle and very easily produces breakages such as collapsing the angle, the profile of overflow groove is long in addition, and extremely fragile position such as hypotenuse, wedge angle arranged, if directly be hung in the tip of overflow groove with suspender, will cause the damage of overflow groove tip, with the support portion that common suspender hangs overflow groove, the back suspender of packing into but can't take out.
In sum, the method for overflow down draw is produced the photoelectric glass substrate and to the requirement that overflow groove is installed is: should guarantee safe and reliablely, not produce the situation of any damaged overflow groove again.To go in the retort furnace be the problem that must resolve so overflow groove is installed to.
Summary of the invention
The objective of the invention is to overcome the shortcoming of above-mentioned prior art, a kind of installation rack that is used for photoelectric glass overflow well is provided, and this installation rack can be done and accomplish not produce under the situation of any breakage overflow groove is installed in the retort furnace safely at overflow groove and go.
The objective of the invention is to solve by the following technical programs:
This installation rack that is used for photoelectric glass overflow well, comprise underframe and vertical fixing four columns on four jiaos of underframes, it is characterized in that: described column top is fixedly connected with two parallel with the long limit of underframe cross bars, described column is connected with trivet in twos on the side at underframe two minor face places, described trivet upper surface is equipped with soft liner, described four columns upper end is provided with hoisting ring, vertically is connected with tie rod between described two cross bars.
The trivet angle of above-mentioned installation rack is identical with the bevel angle of overflow groove, promptly and the vertical surface angle between 12 °～25 °.
Above-mentioned underframe, column, cross bar and tie rod all are to be starting material with carbon steel or stainless steel square tube, and the form of welding is adopted in the connection between described underframe, column and the cross bar.
Above-mentioned cross bar and tie rod adopt the hinge-coupled mode.
The length of above-mentioned installation rack is 1250～1670mm, and width is 280～480mm, highly is 1050～1450mm.
Above-mentioned soft liner is nonmetal soft cushioning, and its hardness is 650～950 (shore hardnesses)
The installation rack that is used for photoelectric glass overflow well of the present invention, low cost of manufacture not only simple in structure, and easy to use effectively, it can be implemented in fully under the situation that overflow groove do not produce any breakage overflow groove is installed in the retort furnace safely and goes.
Description of drawings
Fig. 1 is a structural perspective of the present invention;
Fig. 2 is the wiring layout of the present invention and overflow groove;
Fig. 3 is rack user mode figure of the present invention.
Wherein: 1 is underframe; 2 is column; 3 is cross bar; 4 is trivet; 5 is tie rod; 6 is the tie rod screw; 7 is soft liner; 8 is hoisting ring; 9 is overflow groove.
Embodiment
Below in conjunction with accompanying drawing the present invention is done and to describe in further detail:
Referring to Fig. 1, this kind is used for the installation rack of photoelectric glass overflow well, comprise that underframe 1 and vertical weld are connected to four columns 2 on 1 four jiaos of the underframes, each column top is fixedly connected with two parallel with underframe 1 long limit cross bars 3, and the form of welding is adopted in the connection between column 2 and the cross bar 3.Described four columns 2 are connected with trivet 4 in twos on the side at underframe two minor face places, it is used for installing rack.Described trivet 4 angles are set according to the outer bevel angle of overflow groove 9, promptly and the vertical surface angle between 12 °～25 °.Described trivet 4 upper surfaces are equipped with soft liner 7, and this soft liner is nonmetal soft cushioning, and its hardness is 650～950 (shore hardnesses).Described four column 2 upper ends are provided with hoisting ring 8, and 3 of described two cross bars vertically are connected with tie rod 5, and for convenient disassembly, cross bar 3 and tie rod 5 can adopt hinge-coupled mode or bolt connecting mode.Above underframe 1, column 2, cross bar 3 and tie rod 5 all is to be starting material with carbon steel or stainless steel square tube.Totally, the length of above-mentioned installation rack is 1250～1670mm, and width is 280～480mm, highly is 1050～1450mm.
Embodiment
The use step of the installation rack that is used for photoelectric glass overflow well of the present invention is as follows:
1) rack top brace 5 will be installed earlier pulls down;
2) overflow groove 9 is put into the installation rack;
3) tie rod 5 that will install then on the rack is loaded onto, and tie rod 5 and cross bar 3 usefulness screws are tightened;
4) hang the hoisting ring 8 that rack is installed with crane, fall into retort furnace, and overflow groove 9 steadily is placed in the retort furnace support from retort furnace 10 tops;
5) rack top brace 5 will be installed again disassembles;
6) rack will be installed at last shifts out from the retort furnace bottom.
Claims (5)
1. installation rack that is used for photoelectric glass overflow well, comprise underframe (1) and vertical fixing four columns (2) on (1) four jiao of underframe, it is characterized in that: described four columns (2) top is fixedly connected with parallel with the long limit of underframe (1) two cross bars (3), described four columns (2) are connected with trivet (4) in twos on the side at underframe two minor face places, described trivet (4) upper surface is equipped with soft liner (7), described four columns (2) upper end is provided with hoisting ring (8), vertically is connected with tie rod (5) between described two cross bars (3); The trivet of described installation rack (4) angle is set according to the outer bevel angle of overflow groove (9), promptly and the vertical surface angle between 12 °～25 °.
2. the installation rack that is used for photoelectric glass overflow well according to claim 1, it is characterized in that: described underframe (1), column (2), cross bar (3) and tie rod (5) all are to be starting material with carbon steel or stainless steel square tube, and the form of welding is adopted in the connection between described underframe (1), column (2) and the cross bar (3).
3. the installation rack that is used for photoelectric glass overflow well according to claim 1 is characterized in that: described cross bar (3) and tie rod (5) adopt hinge-coupled mode or bolt connecting mode.
4. the installation rack that is used for photoelectric glass overflow well according to claim 1 is characterized in that: the length of described installation rack is 1250～1670mm, and width is 280～480mm, highly is 1050～1450mm.
5. the installation rack that is used for photoelectric glass overflow well according to claim 1 is characterized in that: described soft liner (7) is nonmetal soft cushioning, and its hardness is 650～950 shore hardnesses.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102364435A CN101492237B (en) | 2008-12-24 | 2008-12-24 | Mounting placing stand for photoelectric glass overflow well |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102364435A CN101492237B (en) | 2008-12-24 | 2008-12-24 | Mounting placing stand for photoelectric glass overflow well |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101492237A CN101492237A (en) | 2009-07-29 |
| CN101492237B true CN101492237B (en) | 2011-03-02 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008102364435A Active CN101492237B (en) | 2008-12-24 | 2008-12-24 | Mounting placing stand for photoelectric glass overflow well |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101492237B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015080992A1 (en) * | 2013-11-30 | 2015-06-04 | Corning Incorporated | Suspension and control system for glass laminate fusion |
| CN102935976A (en) * | 2012-11-07 | 2013-02-20 | 森松(江苏)海油工程装备有限公司 | Hoisting structure for oil field pry block |
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2008
- 2008-12-24 CN CN2008102364435A patent/CN101492237B/en active Active
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| Publication number | Publication date |
|---|---|
| CN101492237A (en) | 2009-07-29 |
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Effective date of registration: 20160309 Address after: 712021 Rainbow Road, Shaanxi, Xianyang, No. 1 Patentee after: IRICO Group Corp. Address before: 710049 No. 1 Rainbow Road, Shaanxi, Xianyang Patentee before: Shaanxi Caihong Electronic Glass Co., Ltd. |