CN101441417B - Polarized light source apparatus based on liquid crystal in photolithography lens imaging system - Google Patents
Polarized light source apparatus based on liquid crystal in photolithography lens imaging system Download PDFInfo
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- CN101441417B CN101441417B CN2007100942563A CN200710094256A CN101441417B CN 101441417 B CN101441417 B CN 101441417B CN 2007100942563 A CN2007100942563 A CN 2007100942563A CN 200710094256 A CN200710094256 A CN 200710094256A CN 101441417 B CN101441417 B CN 101441417B
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Abstract
The invention discloses a polarized light source device based on liquid crystal in a photolithographic lens imaging system. The liquid crystal is used to control the polarization direction of the polarized light in the light path of the photolithographic imaging system, thereby preventing polaroid in the prior photolithographic lens imaging system from being mechanically inserted into the light path, and consequently improving the resolution of the fine variation of the polarization direction. In addition, the polarized light source device can simply and effectively control the direction of the polarized light and facilitate the switchover between the polarized light and non-polarized light which are perpendicular to each other.
Description
Technical field
The present invention relates to the polarized light source apparatus in a kind of photolithography lens imaging system, relate in particular in a kind of photolithography lens imaging system polarized light source apparatus based on liquid crystal.
Background technology
Along with the development of semiconductor technology, differentiate size for the minimum that improves photoetching, the numerical aperture of lens combination (Numerical Aperture) continues to increase.And along with the increase of lens combination numerical aperture, because interacting and interference effect between high angle scattered light, cause the spatial image contrast greatly to be weakened, so increase along with numerical aperture, people begin to adopt polarized light source as exposure light source, and the figure on the photolithography plate also is being designed to single direction (direction that is figure is identical with the polarization direction of exposure light source) simultaneously.But in the present employed litho machine, acquisition polarized light source method is: when the needs polarized light source, just need insert polaroid in light path.For example, as shown in Figure 1, be traditional photolithography lens imaging system schematic diagram, comprise: light source, polaroid, mask plate plane, lens combination and silicon chip plane, because described polaroid is mainly used in the effect of the unnecessary light of filtering in described photolithography lens imaging system, therefore in the prior art, when needs obtain polarized light source, then need between described polaroid and mask plate plane, insert one or more polaroid again, but there is following shortcoming in this method: promptly be not easy to discover the slight change of polarization direction, and implement comparatively complicated.
Summary of the invention
The technical problem to be solved in the present invention provides in a kind of photolithography lens imaging system based on the polarized light source apparatus of liquid crystal, can control the polarization direction of polarized light by liquid crystal, thereby improves the resolution to change of polarization.
For solving the problems of the technologies described above, in one embodiment, the invention provides in a kind of photolithography lens imaging system polarized light source apparatus based on liquid crystal, this device only comprises a liquid crystal polarized controller, and described liquid crystal polarized controller is placed between the polaroid and mask plate plane in the described photolithography lens imaging system, and the nesa coating of described liquid crystal polarized controller and described mask plate plane parallel.
In another embodiment, the invention provides in a kind of photolithography lens imaging system based on the polarized light source apparatus of liquid crystal, this device comprises: right side miter angle degree part reflective mirror group, left side miter angle degree be all-trans light microscopic group and liquid crystal polarized controller;
Wherein, described right side miter angle degree part reflective mirror group places between the polaroid and mask plate plane of described photolithography lens imaging system, form by a right upper portion sub reflector sheet and a lower right side sub reflector sheet, and the right side of the described right upper portion sub reflector sheet miter angle degree that is inclined upwardly, the then downward-sloping miter angle degree in the right side of described lower right side sub reflector sheet;
The miter angle degree light microscopic group that is all-trans in described left side places the left side of described right side miter angle degree part reflective mirror group, form by total reflection sheet under a total reflection sheet on the left side and the left side, and the total reflection sheet is parallel to described right upper portion sub reflector sheet on the described left side, and the total reflection sheet then is parallel to described lower right side sub reflector sheet under the described left side;
Described liquid crystal polarized controller places on the described left side under the total reflection sheet and described left side between the total reflection sheet.
The present invention is owing to adopted technique scheme, has such beneficial effect, promptly control the polarization direction of polarized light in the optical patterning system light path by liquid crystal, avoided and mechanically to have inserted polaroid in the light path in the conventional lithography lens imaging system, thereby improved resolution the polarization direction slight change; And polarized light source apparatus of the present invention can be controlled direction of polarized light simply and effectively, and is convenient to switch orthogonal polarized light and nonpolarized light.
Description of drawings
The present invention is further detailed explanation below in conjunction with accompanying drawing and embodiment:
Fig. 1 is used for the lens imaging system schematic diagram of photoetching for tradition;
Fig. 2 a Liquid Crystal Molecules Alignment direction synoptic diagram in the liquid crystal polarized controller during for making alive not;
Fig. 2 b is for adding behind the voltage Liquid Crystal Molecules Alignment direction synoptic diagram in the liquid crystal polarized controller;
Fig. 3 a is the schematic diagram of liquid crystal polarized controller during making alive not;
Fig. 3 b is the schematic diagram that adds liquid crystal polarized controller behind the voltage;
Fig. 4 is the structural representation that adds an embodiment of polarized light source apparatus of the present invention in photolithography lens imaging system;
Fig. 5 is the structural representation that adds another embodiment of polarized light source apparatus of the present invention in photolithography lens imaging system.
Embodiment
The light of occurring in nature can resolve into the polarized light of any mutually perpendicular both direction arbitrarily, and the orientation of liquid crystal molecule then can change the polarization direction of polarized light, and is widely used in modern light source aspect.The refractive index of liquid crystal can change with the orientation of liquid crystal molecule, shown in Fig. 2 a, when not having electric field between two electrodes of liquid crystal polarized controller, when promptly on two nesa coatings of described liquid crystal polarized controller, not applying voltage, the orientation of liquid crystal molecule wherein is parallel to described nesa coating, therefore be vertical through the polarization direction of light after this liquid crystal polarized controller transmission with original polarization direction of light, specifically shown in Fig. 3 a.Utilize electric field can make the principle of liquid crystal rotation, by after adding voltage on two electrodes (i.e. two nesa coatings) of liquid crystal polarized controller, by two intermembranous thickness of electrically conducting transparent of suitable selection, then can be as shown in the 2b, make the orientation of the liquid crystal molecule that this liquid crystal polarized controller is interior turn to parallel with added direction of an electric field, therefore be parallel with original polarization direction of light at this moment, specifically shown in Fig. 3 b through the polarization direction of light after this liquid crystal polarized controller transmission.Wherein, the polaroid among Fig. 3 a and Fig. 3 b all has been used for inclined to one side, with the unwanted light of filtering.
Based on above-mentioned principle, in first embodiment, polarized light source apparatus based on liquid crystal in the photolithography lens imaging system of the present invention is only realized by a liquid crystal polarized controller, this liquid crystal polarized controller is placed between the polaroid and mask plate plane in the photolithography lens imaging system, and the nesa coating of this liquid crystal polarized controller and described mask plate plane parallel.Therefore, when described photolithography lens imaging system does not need to use polarized light source, then can realize by the mode that described liquid crystal polarized controller and polaroid are removed.For this embodiment, its principle of work is as follows: after light source emits beam, reflex on the described liquid crystal polarized controller by polaroid, light is by liquid crystal polarized optical controller then, and then, be imaged onto on the silicon chip plane by mask plate plane and lens group.Like this, identical with former direction by the polarization direction of this liquid crystal polarized optical controller transmission when described liquid crystal polarized optical controller is applied in voltage, therefore at this moment imaging is a linearly polarized photon; And when not applying voltage, vertical with former direction by the polarization direction of this liquid crystal polarized optical controller transmission, therefore at this moment imaging is a nonlinear polarization light.
In second embodiment, the polarized light source apparatus based on liquid crystal in the photolithography lens imaging system of the present invention comprises: right side miter angle degree part reflective mirror group, left side miter angle degree be all-trans light microscopic group and liquid crystal polarized controller.Wherein, described right side miter angle degree part reflective mirror group places between photolithography lens imaging system polaroid and the mask plate plane, form by a right upper portion sub reflector sheet and a lower right side sub reflector sheet, and the described right upper portion sub reflector sheet miter angle degree that is inclined upwardly, the then downward-sloping miter angle degree of described lower right side sub reflector sheet.The miter angle degree light microscopic group that is all-trans in described left side places the left side of described right side miter angle degree part reflective mirror group, form by total reflection sheet under a total reflection sheet on the left side and the left side, and the total reflection sheet is parallel to described right upper portion sub reflector sheet on the described left side, and the total reflection sheet then is parallel to described lower right side sub reflector sheet under the described left side.Described liquid crystal polarized controller places on the described left side under the total reflection sheet and described left side between the total reflection sheet.Described polarized light source apparatus among this embodiment is compared with first embodiment, though its structure is comparatively complicated comparatively speaking, but when photolithography lens imaging system does not need to use polarized light source, can need not to remove this polarized light source apparatus, therefore use more convenient based on liquid crystal.For this embodiment, its principle of work is as follows: after light source emits beam, reflex on the right upper portion sub reflector sheet by polaroid, a part of light refraction wherein is by lower right side sub reflector sheet then, and then, be imaged onto on the silicon chip plane by mask plate plane and lens group; Another part light then reflexes to the left side and goes up the total reflection sheet, by liquid crystal polarized optical controller, and then reflexes on the lower right side sub reflector sheet through total reflection sheet under the left side, and last, light is imaged on the silicon chip plane by mask plate plane and lens group.Like this, identical with former direction by the polarization direction of this liquid crystal polarized optical controller transmission when liquid crystal polarized optical controller is applied in voltage, therefore at this moment imaging is a linearly polarized photon; And when not applying voltage, vertical with former direction by the polarization direction of this liquid crystal polarized optical controller transmission, therefore at this moment imaging is a nonlinear polarization light.
Claims (2)
- In the photolithography lens imaging system based on the polarized light source apparatus of liquid crystal, it is characterized in that, this device only comprises a liquid crystal polarized controller, and described liquid crystal polarized controller is placed between the polaroid and mask plate plane in the described photolithography lens imaging system, and the nesa coating of described liquid crystal polarized controller and described mask plate plane parallel.
- In the photolithography lens imaging system based on the polarized light source apparatus of liquid crystal, it is characterized in that this device comprises: right side miter angle degree part reflective mirror group, left side miter angle degree be all-trans light microscopic group and liquid crystal polarized controller;Wherein, described right side miter angle degree part reflective mirror group places between the polaroid and mask plate plane of described photolithography lens imaging system, form by a right upper portion sub reflector sheet and a lower right side sub reflector sheet, and the right side of the described right upper portion sub reflector sheet miter angle degree that is inclined upwardly, the then downward-sloping miter angle degree in the right side of described lower right side sub reflector sheet;The miter angle degree light microscopic group that is all-trans in described left side places the left side of described right side miter angle degree part reflective mirror group, form by total reflection sheet under a total reflection sheet on the left side and the left side, and the total reflection sheet is parallel to described right upper portion sub reflector sheet on the described left side, and the total reflection sheet then is parallel to described lower right side sub reflector sheet under the described left side;Described liquid crystal polarized controller places on the described left side under the total reflection sheet and described left side between the total reflection sheet.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2007100942563A CN101441417B (en) | 2007-11-22 | 2007-11-22 | Polarized light source apparatus based on liquid crystal in photolithography lens imaging system |
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| CN2007100942563A CN101441417B (en) | 2007-11-22 | 2007-11-22 | Polarized light source apparatus based on liquid crystal in photolithography lens imaging system |
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| CN101441417B true CN101441417B (en) | 2010-09-08 |
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| CN105607432A (en) * | 2016-01-11 | 2016-05-25 | 上海理工大学 | Low linear density grating exposure system |
| CN108180995B (en) * | 2018-01-05 | 2024-04-05 | 长春理工大学 | Novel polarization spectrum camera |
| CN114089584A (en) * | 2021-10-27 | 2022-02-25 | 广东博智林机器人有限公司 | Anti-dazzle shooting device and construction robot |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1621944A (en) * | 2003-11-28 | 2005-06-01 | 中国科学院光电技术研究所 | Projection optical photoetching polarization imaging system |
| CN1717777A (en) * | 2002-12-03 | 2006-01-04 | 株式会社尼康 | Illumination optical system, exposure system, and exposure method |
| CN1797202A (en) * | 2004-12-28 | 2006-07-05 | Asml荷兰有限公司 | Polarized radiation in lithographic apparatus and device manufacturing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1717777A (en) * | 2002-12-03 | 2006-01-04 | 株式会社尼康 | Illumination optical system, exposure system, and exposure method |
| CN1621944A (en) * | 2003-11-28 | 2005-06-01 | 中国科学院光电技术研究所 | Projection optical photoetching polarization imaging system |
| CN1797202A (en) * | 2004-12-28 | 2006-07-05 | Asml荷兰有限公司 | Polarized radiation in lithographic apparatus and device manufacturing method |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131216 |
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Effective date of registration: 20131216 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |