CN101414090A - Method for light inducing light refraction change crystal surface microstructure - Google Patents
Method for light inducing light refraction change crystal surface microstructure Download PDFInfo
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- CN101414090A CN101414090A CNA2008101536186A CN200810153618A CN101414090A CN 101414090 A CN101414090 A CN 101414090A CN A2008101536186 A CNA2008101536186 A CN A2008101536186A CN 200810153618 A CN200810153618 A CN 200810153618A CN 101414090 A CN101414090 A CN 101414090A
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Abstract
The invention discloses a method for photoinduction photorefractive crystal surface microstructure, which comprises the following step: the first step, a photorefractive crystal is selected and irradiated with non uniform light; the space distribution of a space charge field is formed between the surface and the interior of the photorefractive crystal; the second step, the surface of the photorefractive crystal adopts micro-nano granules by electrophoresis or dielectrophoresis effect; and finally the micro structure which has corresponding relation with the space distribution of the space charge field is formed on the crystal surface. The invention provides the method for photoinduction photorefractive crystal surface which has simple operation, can prepare metal microstructure without needing an optical resist, simultaneously has no use for getting help from expensive devices with high pressure and high vacuum, and the like, and is beneficial to widely popularization and application.
Description
Technical field
The present invention relates to surface micro-structure manufacturing technology field, particularly relate to a kind of method of light inducing light refraction change crystal surface microstructure.
Background technology
The manufacturing process of body surface microstructure generally comprises photoetching, etching and ion beam sputtering etc., also can only depend on wherein a kind of mode to realize.
Wherein, it is several that photoetching is divided into ultraviolet photolithographic, x X-ray lithography X, beamwriter lithography and focused ion beam lithography etc. usually.On the specific implementation,, form the figure (mask) of wavelength or sub-wavelength magnitude with the method for photoetching by behind coating one deck photoresist on the medium.And etching mainly contains several modes such as atomic beam etching and ion beam etching, can directly etch the microstructure that needs at body surface and come.As for ion beam sputtering, then be to utilize mask to plate the layer of metal microstructure at dielectric surface.
Therefore new and high technologies such as above-mentioned these technology light harvesting, precision optical machinery, ultrahigh vacuum, computer controlled automatic have become the symbol of a whole scientific and technological level of country in one.
But the method for making complicated operation of above-mentioned body surface microstructure need make with photoresist, and uses the expensive device of high pressure, high vacuum just can carry out, and is unfavorable for applying widely.
In addition, because the approach effect of photoresist brings many technologic complicacy to transfer of being with glue pattern and etching etc., be unfavorable for that surface micro-structure forms.
Summary of the invention
In view of this, the method that the purpose of this invention is to provide a kind of light inducing light refraction change crystal surface microstructure, by utilize method of optics to construct metal or nonmetal microstructure on the photorefractive crystal surface, simple to operate, do not need to make with photoresist and promptly can prepare metal micro structure, need not help applying widely simultaneously by expensive equipment such as high pressure, high vacuum yet.
For this reason, the invention provides a kind of method of light inducing light refraction change crystal surface microstructure, may further comprise the steps:
The first step, select photorefractive crystal for use, it is carried out the irradiation of non-homogeneous light, in the surface and the inner space distribution that has formed space charge field of this photorefractive crystal;
Second step, by electrophoresis or dielectrophoresis effect, adsorb the micro-nano particle on the surface of this photorefractive crystal, has formed the microstructure that corresponding relation is arranged with the space distribution of space charge field at plane of crystal at last.
Preferably, described photorefractive crystal is the photorefractive crystal with photovoltaic effect.
Preferably, described photorefractive crystal is for mixing Fe lithium columbate crystal Li
1-xNb
1+yO
3: Fe
m, wherein, x, y, the span of m is respectively 0.05≤x≤0.13,0.00≤y≤0.01,0.00≤m≤7.5 * 10
-4
Preferably, the producing method of uneven irradiation light comprises: use the above coherent source of two bundles, by interfering crystal is carried out the irradiation of non-homogeneous light, perhaps utilize a branch of light time, crystal is carried out the irradiation of non-homogeneous intensity by amplitude or phase mask.
Preferably, the wavelength of the light beam that adopts is that light is sold off sensitive wave length 400nm～800nm.
Preferably, described second the step be specially: with the micro-nano particle suspending in liquid, the liquid that evenly is dispersed with the micro-nano particle is slowly flow through on the surface of photorefractive crystal, under the effect of electrophoresis or dielectrophoresis effect, formed the microstructure that is distributed with corresponding relation with space charge field at plane of crystal then; Perhaps, brush lightly on the plane of crystal being exposed to airborne micro-nano particle, under the effect of electrophoresis or dielectrophoresis effect, plane of crystal has formed the microstructure that is distributed with corresponding relation with space charge field.
Preferably, described micro-nano particle is metallic particles or non-metallic particle.
Preferably, described micro-nano average diameter of particles is 20nm～100 μ m.
By above technical scheme provided by the invention as seen, the method of a kind of light inducing light refraction change crystal surface microstructure provided by the invention is simple to operate, do not need to make with photoresist and promptly can prepare metal micro structure, need not help applying widely simultaneously by expensive equipment such as high pressure, high vacuum yet.
Description of drawings
Fig. 1 constructs silver-colored particle grid for utilizing the dielectrophoresis effect in the lithium niobate crystal surface, live metal micro-nano particle does not form the synoptic diagram of surface micro-structure under the effect of dielectrophoretic force;
Fig. 2 is for utilizing electrophoretic effect at lithium niobate crystal surface structure alumina particles grid, and positively charged metal micro-nano particle forms the synoptic diagram of surface micro-structure under the effect of electrophoretic force;
Fig. 3 is for utilizing the dielectrophoresis effect at lithium niobate crystal surface structure titania grid, and uncharged nonmetal micro-nano particle forms the synoptic diagram of surface micro-structure under the effect of dielectrophoretic force;
Fig. 4 is for utilizing electrophoretic effect at lithium niobate crystal surface structure carbon granule grid, and electronegative nonmetal micro-nano particle forms the synoptic diagram of surface micro-structure under the effect of electrophoretic force;
Embodiment
In order to make those skilled in the art person understand the present invention program better, the present invention is described in further detail below in conjunction with drawings and embodiments.
The invention provides a kind of method of light inducing light refraction change crystal surface microstructure, the basic essence of this method be utilize a branch of light by amplitude or phase mask or the coherent lights that utilize two bundles above (containing two bundles) by interfering certain space distribution that forms light intensity at plane of crystal, thereby in crystal, cause the space distribution of corresponding space charge field, in the effect lower-pilot of electrophoretic force or dielectrophoretic force and capture the micro-nano particle, finally form microstructure then on the photorefractive crystal surface.Specifically comprise following two steps:
The first step: select photorefractive crystal for use, it is carried out the irradiation of non-homogeneous light, in the surface and the inner space distribution that has formed space charge field of this photorefractive crystal;
This step is on specific implementation, photorefractive crystal is preferably selects the photorefractive crystal with photovoltaic effect for use, the photorefractive effect that has the photorefractive crystal of photovoltaic effect by utilization, when writing grating, set up the space charge field that certain space distributes, thereby cause the manipulation of micro-nano particle and capture.
Need to prove, if with even rayed photorefractive crystal, then the space charge field of plane of crystal is evenly distributed, the micro-nano particle can not be distributed in plane of crystal, but can be collected in the crystal both sides, thereby can't form micro-nano particle grid at plane of crystal, so the present invention adopts non-homogeneous light to shine photorefractive crystal with a fixed structure.
Above-mentioned non-homogeneous light is to have the light that certain space distributes, and for there being the light of certain strength distribution, non-homogeneous light can be by two kinds of methods hereinafter described: two restraint or multi beam coherent light interference and mask means obtain.
Need to prove that photorefractive effect is the abbreviation that photon-induced refractive index changes, it is the photoelectric process that occurs in a kind of complexity in the electrooptical material.The people such as Ashkin of Bell Laboratory in 1966 are at lithium niobate (LiNbO
3, be called for short the LN crystal) and lithium tantalate (LiTaO
3, be called for short the LT crystal) at first observed photorefractive effect in the crystal.
Photorefractive material comprises organic high molecular polymer, organic crystal and inorganic material multiple materials such as (photorefractive crystal, potteries etc.).Photorefractive crystal can be divided three classes again: compound semiconductor, bismuth silicon family oxide and ferroelectric crystal.Ferroelectric crystal is owing to having bigger electrooptical coefficient and some other useful properties, so most of work of studying and using about photorefractive effect all concentrate on this class material.In all photorefractive materials, it is the most extensive that the LN crystal is studied.Single domain crystal after the polarization can be used for high-resolution holographic memory.Impurity by mixing variety classes and concentration, crystal is carried out [Li]/[Nb] that oxidation/reduction is handled and changed crystal itself, can improve the photorefractive property of crystal greatly, obtain having high uniformity and good light is sold off the LN crystal of characteristic.Donor impurity in the lithium columbate crystal is produced photo-generated carrier by optical excitation, and photo-generated carrier drifts about under the photovoltaic effect effect and captured by trap.Charge carrier constantly is excited, moves and capture the apart of final formation positive and negative charge.These photodecompositions from space charge field set up and the corresponding space charge field of light intensity space distribution at crystals and surface.
Second step: by electrophoresis or dielectrophoresis effect, adsorb the micro-nano particle on the surface of this photorefractive crystal, has formed the microstructure that certain corresponding relation is arranged with the space distribution of space charge field at plane of crystal at last.
On the specific implementation, after waiting for that the photorefractive crystal space charge field is set up fully, when obtaining strong space charge field, carried out for second step again.Need to prove that the response time that the space charge field of photorefractive crystal is set up generally between several seconds～dozens of minutes, is looked the time that factors such as incident intensity, crystal doping amount, crystal thickness determine to write grating.Through the process of writing grating after a while, form strong space charge field distribution on the inside and the surface of photorefractive crystal at last, under enough strong space charge field distribution, can adsorb the micro-nano particle better, strengthen adsorption effect.
Need to prove that electrophoresis is charged particle motion to its electrically opposite electrode under electric field action, utilizes electrophoretic force can handle and capture charged particle; And dielectrophoresis is the not motion of charged particle under the inhomogeneous field effect, so this phenomenon provides the approach that charged particle is not controlled.
Photorefractive crystal within it portion and surface form have the space charge field of certain distribution after, at charged or uncharged micro-nano particle, following different situation can appear:
As easy as rolling off a log charged in view of the micro-nano particle, any operation slight to the micro-nano particle (for example stir, ultrasonic etc.) all can cause charged owing to the reason of friction, and wherein, metal micro-nano particle becomes positively charged easily, and nonmetallic materials are with negative electricity easily.So charged micro-nano particle forms electrophoresis, can under the space charge field action, move, so, the micro-nano particle of positively charged is attracted on the surface of negative charge aggregation zone of photorefractive crystal, and electronegative micro-nano particle is attracted on the surface of positive charge aggregation zone of crystal, thereby forms microstructure on the photorefractive crystal surface.
If space charge field is a periodic distribution, the structural cycle of Xing Chenging is an one-to-one relationship with the distribution cycle of space electric field like this.
If micro-nano particle not band powers on, this micro-nano particle can polarize under the space charge field action so, produce polarization charge, because the non-uniform Distribution of space charge field, stressed can not cancelling each other out between the polarization charge that diverse location occurs on the micro-nano particle, thereby this micro-nano particle embodies the effect that is subjected to space charge field on macroscopic view, and the dielectrophoretic force size that it is subjected to is determined by following formula:
Wherein, r is the micro-nano particle radius, and E is an electric field intensity, ε
mAnd ε
pIt is respectively the specific inductive capacity of the circumgranular medium of micro-nano (being said air in front or solvent), micro-nano particle.According to the relation of the specific inductive capacity of the specific inductive capacity of micro-nano particle and surrounding medium, at ε
mε
pThe time, this moment, dielectrophoretic force F was for just, and the micro-nano particle moves along the positive dirction of the electric field line of suffered electric field so; At ε
m＜ε
mThe time, this moment dielectrophoretic force for negative, the micro-nano particle can move along the negative direction of the electric field line of suffered electric field, the micro-nano particle arrives all finally that not stress be that dielectrophoretic force is zero equilibrium position under two kinds of situations.
Therefore, not charged micro-nano particle is when dielectrophoresis, and not charged micro-nano particle moves under the space charge field action, is near zero the plane of crystal equilibrium position up to being adsorbed to suffered dielectrophoretic force F, thereby forms microstructure on the photorefractive crystal surface.
In view of the intensity of space charge field is the situation of sinusoidal variations, so as shown from the above formula, in one-period, dielectrophoretic force F is that zero place occurs twice, and therefore the photorefractive crystal microstructure that forms like this is bi-period structure (with respect to the variation of the one-period of field intensity).
In the present invention, the photorefractive crystal surface includes two kinds of implementations to the absorption of micro-nano particle:
First kind of mode is: with the micro-nano particle suspending in liquid, the liquid that evenly is dispersed with the micro-nano particle is slowly flow through on the surface of photorefractive crystal, under the effect of electrophoresis or dielectrophoresis effect, formed the microstructure that is distributed with certain corresponding relation with space charge field at plane of crystal then;
This liquid can be polar solvent (as water), or non-polar solvent (as methyl-silicone oil).
On concrete the enforcement be: at first the micro-nano uniform particles is suspended in the liquid, the photorefractive crystal of finishing writing grating is taken out from light path, tilt to place, drawing dispensed in small quantity has the liquid of micro-nano particle, drip the surface of a drop of liquid to crystal, make liquid slipping over gently,, form the microstructure that is distributed with corresponding relation with space charge field on the surface that will be adsorbed on crystal with the regional particle of grating from plane of crystal.
The second way is: brush lightly on the plane of crystal being exposed to airborne micro-nano particle, under the effect of electrophoresis or dielectrophoresis effect, plane of crystal has formed the microstructure that is distributed with corresponding relation with space charge field.
On concrete the enforcement, the micro-nano particle is exposed in the air, is spread across on the plane of crystal lightly then,, on plane of crystal, form required surface micro-structure so under the effect of electrophoretic force or dielectrophoretic force, the micro-nano particle is adsorbed to plane of crystal.
In the present invention, described photorefractive crystal is preferably to adopt and mixes Fe lithium columbate crystal: Li
1-xNb
1-yO
3: Fe
m, wherein, x, y, the span of m is respectively 0.05≤x≤0.13,0.00≤y≤0.01,0.00≤m≤7.5 * 10
-4
In the present invention, described micro-nano particle can be non-metallic particles such as metallic particles such as silver, aluminium or carbon dust.
The scope of described micro-nano particle diameter is preferably 20nm～100 μ m.
On the specific implementation, the non-homogeneous photodistributed generation of the present invention has dual mode:
First kind of mode: the method for the interference of light of two light beams above (containing two bundles), this method is used the above coherent source of two bundles, utilizing the method for interfering that crystal is carried out the irradiation of non-homogeneous light, mainly is to be used to construct periodic surface structure (grating, waveguide etc.).
By grating crystal to be written being placed on interference region (in order to obtain maximum space charge field, select the lithium columbate crystal of mixing Fe for use as grating crystal to be written), and when writing grating, adopt e light incident (the parallel and polarization of incident light direction of the c direction of principal axis of crystal); Secondly, we select the bigger Argon ion laser of power for use, and wavelength 488nm is gone in outgoing.Wherein, the grating cycle that forms on the crystal between 200nm～800 μ m, the degree of modulation setting (strength ratio) of two-beam intensity is between 0.1～1.0.
The second way: utilize the method for a branch of light by amplitude or phase mask, this method is utilized a branch of light time, crystal is carried out the irradiation of non-homogeneous intensity by the method for amplitude or phase mask.This method is used to construct the surface micro-structure of arbitrary shape.The incident of same employing e light, what employed laser instrument adopted is and first kind of Argon ion laser that mode is identical.
The wavelength of light beam that above-mentioned dual mode adopts is that light is sold off sensitive wave length, is 400nm～800nm.
The invention will be further described below by embodiment.
Embodiment one:
For the present invention, adopt nano-silver powder as the micro-nano particle, its average diameter of particles is 50nm, utilizes the dielectrophoresis effect to construct silver-colored particle grid in the lithium niobate crystal surface, uncharged silver metal micro-nano particle forms surface micro-structure under the effect of dielectrophoretic force, this surface micro-structure as shown in Figure 1;
Embodiment two:
For the present invention, adopt spherical metallic aluminium powder particle as the micro-nano particle, the meso-position radius of its particle is 1.52 microns, utilize electrophoretic effect at lithium niobate crystal surface structure alumina particles grid so, the aluminum metal micro-nano particle of positively charged forms surface micro-structure under the effect of electrophoretic force, this surface micro-structure as shown in Figure 2;
Embodiment three: adopt titanium dioxide granule as the micro-nano particle, utilize the dielectrophoresis effect at lithium niobate crystal surface structure titania grid so, uncharged nonmetal micro-nano particle forms surface micro-structure under the effect of dielectrophoretic force, this surface micro-structure as shown in Figure 3;
Embodiment four:
Adopt the spherical toner particle as the micro-nano particle, its average diameter of particles is about 10 microns.By these material granules are placed on respectively in the methyl-silicone oil, use then about the supersonic oscillations several hrs, it is uniformly dispersed.Utilize electrophoretic effect at lithium niobate crystal surface structure carbon granule grating so, electronegative nonmetal micro-nano particle forms surface micro-structure under the effect of electrophoretic force, and this surface micro-structure as shown in Figure 4.
In sum, the method of a kind of light inducing light refraction change crystal surface microstructure provided by the invention does not need photoresist promptly can prepare microstructure, broken away from the constraint that in the past can only under accurate large-scale instrument, make microstructure, the professional equipment that no longer needs large-scale costliness utilizes the microstructure that simple optical means just can simply be made to be needed.
In addition, the method for light inducing light refraction change crystal surface microstructure provided by the invention is simple to operate, has versatility, is fit under laboratory conditions, makes microstructure.
In addition, the method good reproducibility of light inducing light refraction change crystal surface microstructure provided by the invention can write microstructure easily repeatedly and wipe microstructure in photorefractive crystal.
The above only is a preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (8)
1, a kind of method of light inducing light refraction change crystal surface microstructure is characterized in that, may further comprise the steps:
The first step, select photorefractive crystal for use, it is carried out the irradiation of non-homogeneous light, in the surface and the inner space distribution that has formed space charge field of this photorefractive crystal;
Second step, by electrophoresis or dielectrophoresis effect, adsorb the micro-nano particle on the surface of this photorefractive crystal, has formed the microstructure that corresponding relation is arranged with the space distribution of space charge field at plane of crystal at last.
2, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 1 is characterized in that, described photorefractive crystal is the photorefractive crystal with photovoltaic effect.
3, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 2 is characterized in that, described photorefractive crystal is for mixing Fe lithium columbate crystal Li
1-xNb
1+yO
3: Fe
m, wherein, x, y, the span of m is respectively 0.05≤x≤0.13,0.00≤y≤0.01,0.00≤m≤7.5 * 10
-4
4, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 1, it is characterized in that, the producing method that inhomogeneous illumination is penetrated comprises: use the above coherent source of two bundles, by interfering crystal is carried out the irradiation of non-homogeneous light, perhaps utilize a branch of light time, crystal is carried out the irradiation of non-homogeneous intensity by amplitude or phase mask.
5, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 4 is characterized in that, the wavelength of the light beam that adopts is that light is sold off sensitive wave length 400nm～800nm.
6, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 1, it is characterized in that, described second the step be specially: with the micro-nano particle suspending in liquid, the liquid that evenly is dispersed with the micro-nano particle is slowly flow through on the surface of photorefractive crystal, under the effect of electrophoresis or dielectrophoresis effect, formed the microstructure that is distributed with corresponding relation with space charge field at plane of crystal then; Perhaps, brush lightly on the plane of crystal being exposed to airborne micro-nano particle, under the effect of electrophoresis or dielectrophoresis effect, plane of crystal has formed the microstructure that is distributed with corresponding relation with space charge field.
7, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 1 is characterized in that, described micro-nano particle is metallic particles or non-metallic particle.
8, the method for light inducing light refraction change crystal surface microstructure as claimed in claim 7 is characterized in that, described micro-nano average diameter of particles is 20nm～100 μ m.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103193194B (en) * | 2013-03-05 | 2015-10-21 | 西安交通大学 | Based on the ordered nano method for manufacturing microstructure of Nano silver grain dielectrophoresis assembling |
| CN105204189A (en) * | 2015-10-10 | 2015-12-30 | 杭州虹视科技有限公司 | Optical light-homogenizing sheet |
| CN107024452A (en) * | 2017-04-27 | 2017-08-08 | 河北工业大学 | A kind of real-time monitoring device and method of photorefractive material microcell refractive index |
| CN110879433A (en) * | 2019-11-25 | 2020-03-13 | 中国科学院上海光学精密机械研究所 | Preparation method of reflective volume grating based on photo-thermal conversion glass |
| CN111880254A (en) * | 2020-07-14 | 2020-11-03 | 浙江大学 | Preparation method of grating with continuously-changed diffraction efficiency |
-
2008
- 2008-11-28 CN CNA2008101536186A patent/CN101414090A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103193194B (en) * | 2013-03-05 | 2015-10-21 | 西安交通大学 | Based on the ordered nano method for manufacturing microstructure of Nano silver grain dielectrophoresis assembling |
| CN105204189A (en) * | 2015-10-10 | 2015-12-30 | 杭州虹视科技有限公司 | Optical light-homogenizing sheet |
| CN105204189B (en) * | 2015-10-10 | 2019-06-14 | 杭州中科极光科技有限公司 | A kind of even mating plate of optics |
| CN107024452A (en) * | 2017-04-27 | 2017-08-08 | 河北工业大学 | A kind of real-time monitoring device and method of photorefractive material microcell refractive index |
| CN107024452B (en) * | 2017-04-27 | 2019-11-12 | 河北工业大学 | A kind of real-time monitoring device and method of photorefractive material microcell refractive index |
| CN110879433A (en) * | 2019-11-25 | 2020-03-13 | 中国科学院上海光学精密机械研究所 | Preparation method of reflective volume grating based on photo-thermal conversion glass |
| CN111880254A (en) * | 2020-07-14 | 2020-11-03 | 浙江大学 | Preparation method of grating with continuously-changed diffraction efficiency |
| CN111880254B (en) * | 2020-07-14 | 2021-05-14 | 浙江大学 | Preparation method of grating with continuously-changed diffraction efficiency |
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Open date: 20090422 |