CN101403805A - Production method of optical spectrum phase step type integration color filter - Google Patents
Production method of optical spectrum phase step type integration color filter Download PDFInfo
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- CN101403805A CN101403805A CNA2008102022601A CN200810202260A CN101403805A CN 101403805 A CN101403805 A CN 101403805A CN A2008102022601 A CNA2008102022601 A CN A2008102022601A CN 200810202260 A CN200810202260 A CN 200810202260A CN 101403805 A CN101403805 A CN 101403805A
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Abstract
The invention discloses a method for manufacturing stepped spectrum integrated spectral filter, which realizes integration of multichannel band pass filters into one substrate by combining vacuum plating technology and pattern mask processing. The integrated spectral filter has the advantages of simple fabrication process, high yield, can match with picture element of a detector to from a hyper spectral imaging spectrometer, and can be widely used for multi (high) spectral extensive acquisition of aerospace remote sensing instruments. The multichannel stepped spectrum integrated spectral filter has the advantages that compared with traditional spectral filters integrated one by one, yield is greatly improved by adopting combined cover plating; a plurality of spectrum channels can be formed in a micro area, accurate location of spatial location and spectral location can be realized, and high spectrum is easy to be realized.
Description
Technical field
The present invention relates to the optical element manufacturing process technology, specifically be meant a kind of method for making of optical spectrum phase step type integration color filter, it is used to be coated with optical spectrum phase step type integration color filter.
Background technology
High spectrum resolution remote sensing technique can obtain the multispectral image of scenery and target simultaneously, can significantly improve the contrast of target signature with respect to environment, field, a forward position as current development of remote sensing, more and more show its huge application potential, this technology has obtained in Aeronautics and Astronautics, field using widely.Meticulous color separation technology is an important step of high spectrum resolution remote sensing technique, and it has directly determined the information amount of obtaining, spectral resolution, weight and volume and the stability of remote sensing instrument.
The color separation mode that generally adopts both at home and abroad mainly contains prism color separation, grating color separation, Fourier color separation and optical filter color separation etc. at present.Adopt first three to plant the color separation mode, corresponding apparatus will occupy than large space, is difficult to satisfy the requirement of aero-space instrument lightweight, miniaturization.The integrated filtering chip arrays is a kind of miniature light-weighted space color separation device that rise at the twentieth century end, filter arrays can be placed on and carry out color separation on the imaging focal plane, also can be with it and detector array combination, directly corresponding with the pixel of detector, be one of the most promising color separation device in the imaging spectrometer of new generation.
Integrated optical filter is also had some reports both at home and abroad, the production method of present integrated optical filter mainly contains two kinds: a kind of is splicing, and another kind is the combination etching method.The splicing method is the optical filter that is coated with each passage on different substrates respectively, cuts into the size of requirement then, at last optical filter is glued on the carrier substrate, forms combined filters.The remarkable advantage of this method be each independently optical filter have extraordinary optical characteristics, but that the size of optical filter is difficult to is microminiaturized, and yield rate sharply reduces with the increase of passage.The combination etching method adopts semiconductor etching to cooperate technique for vacuum coating, forms the different optical filter of centre wavelength by the thickness that changes the optical filter wall.This method can use less processing step to obtain more passage, but the etching depth of passage is difficult to control, and the film surface roughness can obviously increase after the etching, influences the performance of optical filter.
Summary of the invention
The purpose of this invention is to provide a kind of method that vacuum coating cooperation pattern mask technology prepares optical spectrum phase step type integration color filter that makes up, solve splicing method and the existing technical deficiency of combination etching method.
The structure of optical spectrum phase step type integration color filter is coated with reflective stack 2, wall 3 and last reflective stack 4 films down as shown in Figure 1 successively in substrate 1, its film cording body structure is as follows:
Substrate | (HL) ^a (2b+x) H (LH) ^a| incident medium
Wherein: the refractive index of incident medium is between the 1.0-1.2, is generally air; Substrate 1 material can adopt sapphire, quartz, zinc selenide, magnesium fluoride etc.
It is the high and low refractive index rete of 1/4th centre wavelengths that H and L represent optical thickness respectively; High low-index material is optional selects the multiple combination that can see infrared band, as germanium and silicon monoxide, and silicon and silicon dioxide, titania and silicon dioxide etc.A be reflective stack periodicity (a=1,2,3......), the reflective stack periodicity is big more, the bandwidth of optical filter is just narrow more; B be wall order of interference (b=1,2,3......), improve order of interference and also can reduce passband width; X is a wall cover plating coefficient, and cover plating coefficient has guaranteed the multichannel formation of optical filter, and cover plating coefficient is port number decision in place wave band and the wave band by film, the cover plating coefficient of passage becomes arithmetic progression to distribute, cover plating coefficient is big more, and the interval of adjacency channel is also big more, and vice versa.
Optical spectrum phase step type integration color filter method for making of the present invention at first adopts traditional optical coating technology, and the following reflective stack 2 that successively is coated with optical filter is to wall 3 (being resonant cavity layer); Use many cover mask plates then, the combination cover plating through n time can obtain 2
nThe wall 3 of the linear array step that the individual degree of depth is different; Be coated with the last reflective stack 4 of optical filter at last, finish the preparation of integrated optical filter.
The method for making of optical spectrum phase step type integration color filter comprises the steps:
A. descend reflective stack 2 thin layers preparations: conventional technique for vacuum coating is adopted in the preparation of optical filter film system, after vacuum chamber reaches certain vacuum tightness, substrate is toasted, and baking temperature can be set by with good grounds properties of materials; Before plated film, adopt ion beam that substrate was bombarded 15 minutes, clean substrate and improve its surface active energy simultaneously; Preparation (HL) ^a2bH film system in substrate;
B. wall 3 preparations: adopt mechanical mask cover plating legal system to be equipped with wall, concrete grammar is: becoming thickness with the metal or alloy material only is the figure mask plate of tens to centuries micron, can limit the thin film deposition zone with them in coating process; Pattern precision and local edge depend on the precision of the machining of mask plate, and the method for pure machining can be made the mask plate of thickness greater than 100 μ m, and electrochemical deposition method is made mask plate, and its thickness can be less than 50 μ m.The mask design method is as follows: for 2
nThe wall 3 of individual step needs to make the n mask plates, and as shown in Figure 2, back one mask plates should will block the plated film district of last mask plates and half zone in non-plated film district, and the cover plating by the n mask plates can form 2
nThe wall 3 of individual step.
C. go up the preparation of reflective stack 4 thin layers: method continuation preparation (HL) ^a film on the wall 3 that forms step according to steps A is to form to go up reflective stack 4, finishes the optical spectrum phase step type integration color filter making.
Miniature step integrated optical filter of the present invention has the advantage of the following aspects:
1. the channel spectrum overlapping is little, divides the colour efficiency height, and colour mixture is few;
2. adopt the method for combination cover plating, the integrated optical filter that yield rate is more traditional improves a lot, and has avoided the influence of ion beam etching technology to film surface;
3. can form a plurality of spectrum channels at tiny area, can the position, implementation space and the accurate location of spectral position, be easy to realize high spectrum.
Description of drawings
Fig. 1 makes up the optical spectrum phase step type integration color filter sectional view of cover plating method preparation, among the figure: reflective stack under the 1-base material 2-; The 3-wall, the last reflective stack of 4-.
Fig. 2 prepares the cover plating mask plate structure synoptic diagram of 32 passage integrated optical filters.
Fig. 3 makes up 32 channel spectrum phase step type integration color filter transmittance graphs of cover plating method preparation.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing: according to the intensity needs, select to be of a size of the jewel sheet of 20mm * 10mm as substrate.At 1.97-2.39 μ m with SiGe (Ge) and silicon monoxide (SiO) respectively as high-index material (n
H) and low-index material (n
L), get the port number N=2 that n=5 then forms
n=32, the physical dimension of each passage is 0.5mm * 6mm.In order to prepare the integrated optical filter of 32 passages, we need design a cover mask plate, have 5, and Fig. 2 is the nickel material mask plate that utilizes the electrochemical deposition method preparation for the mask plate outside drawing of design, mask plate, and its thickness only is 50 μ m.
Get central wavelength lambda
0=2.2 μ m, technological process is as follows: (1) prepares (HL) ^31.62H of film system in substrate; (2) adopt 5 mask plates successively, the combination cover plates out the wall step; (3) continue the preparation that preparation (LH) ^3 film system finishes integrated optical filter.
Germanium material adopts electron gun evaporation, and speed is 1.2nm/s; The silicon monoxide material adopts the method preparation of molybdenum boat thermal evaporation, and speed is 1.5nm/s.
Fig. 3 is the optical transmission spectra curve of Wavelength distribution at the 32 passage step integrated optical filters of 1.97-2.39 μ m.This patent is applicable to the intensive acquisition of many (height) spectrum of multispectral Aero-Space remote sensing instrument.
Claims (2)
1. the method for making of an optical spectrum phase step type integration color filter, it is characterized in that: it may further comprise the steps:
A. descend the preparation of reflective stack (2) thin layer: adopt conventional technique for vacuum coating to go up reflective stack (2) film system under preparation (HL) ^a 2bH in substrate (1);
B. wall (3) preparation: adopt mechanical mask cover plating legal system to be equipped with wall, concrete grammar is: the figure mask plate that becomes with the metal or alloy material limits depositing of thin film zone in the coating process, back one mask plates always blocks the plated film district of last mask plates and half zone in non-plated film district, cover plating by the n mask plates can form 2
nThe wall of individual step (3);
C. go up the preparation of reflective stack (4) thin layer: the method according to steps A upward continues upward reflective stack (4) of preparation (HL) ^a film system formation at the wall (3) of formation step, makes thereby finish optical spectrum phase step type integration color filter.
2. the method for making of a kind of optical spectrum phase step type integration color filter according to claim 1 is characterized in that: said figure mask plate is the nickel material mask plate that adopts the electrochemical deposition method preparation, and its thickness is 50 μ m.
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| CNA2008102022601A CN101403805A (en) | 2008-11-05 | 2008-11-05 | Production method of optical spectrum phase step type integration color filter |
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| CNA2008102022601A CN101403805A (en) | 2008-11-05 | 2008-11-05 | Production method of optical spectrum phase step type integration color filter |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102054772A (en) * | 2009-10-27 | 2011-05-11 | 北京邮电大学 | Preparation method for monolithic integration light detector array with multiple wavelength processing function |
| CN105093376A (en) * | 2015-09-07 | 2015-11-25 | 西安工业大学 | Preparation method for bandpass optical filters with central wavelengths thereof gradually varied |
| CN109031491A (en) * | 2018-08-30 | 2018-12-18 | 西安工业大学 | A kind of preparation method of array F-P cavity optical filter |
| CN109870408A (en) * | 2019-01-15 | 2019-06-11 | 广东省计量科学研究院（华南国家计量测试中心） | A kind of detection method for the optical filter and its application and Nitrogen trifluoride detecting Nitrogen trifluoride for non-dispersive infrared |
| CN113433607A (en) * | 2021-05-28 | 2021-09-24 | 浙江晶驰光电科技有限公司 | Double-bandpass optical filter and manufacturing method thereof |
| CN115980898A (en) * | 2023-03-21 | 2023-04-18 | 成都沃达惠康科技股份有限公司 | Multi-element multi-layer middle infrared high-reflection film and preparation method thereof |
-
2008
- 2008-11-05 CN CNA2008102022601A patent/CN101403805A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102054772A (en) * | 2009-10-27 | 2011-05-11 | 北京邮电大学 | Preparation method for monolithic integration light detector array with multiple wavelength processing function |
| CN105093376A (en) * | 2015-09-07 | 2015-11-25 | 西安工业大学 | Preparation method for bandpass optical filters with central wavelengths thereof gradually varied |
| CN109031491A (en) * | 2018-08-30 | 2018-12-18 | 西安工业大学 | A kind of preparation method of array F-P cavity optical filter |
| CN109870408A (en) * | 2019-01-15 | 2019-06-11 | 广东省计量科学研究院（华南国家计量测试中心） | A kind of detection method for the optical filter and its application and Nitrogen trifluoride detecting Nitrogen trifluoride for non-dispersive infrared |
| CN109870408B (en) * | 2019-01-15 | 2021-06-01 | 广东省计量科学研究院（华南国家计量测试中心） | Optical filter for non-dispersive infrared detection of nitrogen trifluoride, application of optical filter and detection method of nitrogen trifluoride |
| CN113433607A (en) * | 2021-05-28 | 2021-09-24 | 浙江晶驰光电科技有限公司 | Double-bandpass optical filter and manufacturing method thereof |
| CN113433607B (en) * | 2021-05-28 | 2023-06-27 | 浙江晶驰光电科技有限公司 | Double-bandpass filter and manufacturing method thereof |
| CN115980898A (en) * | 2023-03-21 | 2023-04-18 | 成都沃达惠康科技股份有限公司 | Multi-element multi-layer middle infrared high-reflection film and preparation method thereof |
| CN115980898B (en) * | 2023-03-21 | 2023-06-20 | 成都沃达惠康科技股份有限公司 | Multi-element multi-layer middle infrared high-reflection film and preparation method thereof |
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