CN101376033A - Equipment for purifying air-intake for dust-free chamber - Google Patents
Equipment for purifying air-intake for dust-free chamber Download PDFInfo
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- CN101376033A CN101376033A CNA2007101479460A CN200710147946A CN101376033A CN 101376033 A CN101376033 A CN 101376033A CN A2007101479460 A CNA2007101479460 A CN A2007101479460A CN 200710147946 A CN200710147946 A CN 200710147946A CN 101376033 A CN101376033 A CN 101376033A
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- equipment
- dust
- intake
- purifying air
- free chamber
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Abstract
The invention discloses an air inlet purifying equipment of a dust free room and mainly comprises a micro contamination purifying equipment (Airborne Molecular Contamination, AMC) connected at the air inlet. At least an absorbing mechanism is arranged in the contamination purifying equipment, wherein an absorbing layer is besmeared on the absorbing mechanism to absorb micro contamination in the outside air; and an outer air condition case (Make Up Air Unit, MAU) is connected to the back of the micro contamination purifying equipment and the outlet of the air condition case directly leads to the dust free room, and therefore, exterior compensation air can be provided for the dust free room, which has a high requirement of the compensation air quality, to use.
Description
Technical field
The present invention is the equipment for purifying air-intake for dust-free chamber of micro polluting substance in relevant a kind of gas of effective removal production environment, is applicable to the dust free room or the similar place of the dust free room of electronics manufacturing such as IC, TFT, semiconductor manufacturing industry.
Background technology
Along with semiconductor technology is constantly progressive, IC processing line footpath constantly dwindles, the up-to-date semiconductor technology that advances has entered 45nm, to further stride into 22 and the 32nm Technology future, also owing to IC line footpath constantly dwindles, therefore contain little pollution (Airborne MolecularContamination, AMC) material, for example sulphur-containing substance: SO in the extraneous air
X, H
2S, DMSO (DimethylSulfoxide, (CH
3)
2SO), DMS (Dimethyl Sulfide, (CH
3)
2SO) etc., nitrogen substance: NOX, NH3, MEA (Monoethanol Amine, NH
2C
2H
4OH) etc., contain lower boiling VOC (Volatile Organic Compounds, VOCs) material, IPA (IsopropylAlcohol, C
3H
7OH), acetone etc., and (VolatileOrganic Compounds VOCs) etc., for the influence of technology yield, enlarges day by day to contain high boiling VOC.In order to promote the technology yield, semiconductor factory improves more for the purification specification of production environment relatively.
Semiconductor factory for the prescription of outside QI invigorating once to very high, existing because of Technology promotes, require also higher for gaseous mass in the dust free room.If be in the industrial occupancy that factory is periphery around the semiconductor factory, image height scientific and technological park particularly, factory sets up density very high, often the waste gas of A factory generation may be sucked by the air-conditioning air inlet of B factory, especially gas pollutant, cause can't be by strainer filterings such as HEPA or ULPA, must be removed by chemical filter screen (Chemical Filter) or air-conditioning box (Air Washer), yet chemical filter screen (Chemical Filter) or air-conditioning box (Air Washer) dye thing for some gases, as DMSO, it is unsatisfactory that the molecule of low concentration such as DMS or IPA is removed efficient, especially after chemical filter screen (Chemical Filter) uses a period of time, must more renew filter screen, use the repeated use of can't regenerating of saturated filter screen, can only directly abandon, so produce another kind of refuse pollution.
Summary of the invention
The object of the present invention is to provide a kind of equipment for purifying air-intake for dust-free chamber, remove, use for the dust free room of all trades and professions in the hope of the micro polluting substance that effectively gas of outside QI invigorating is included.
For achieving the above object, equipment for purifying air-intake for dust-free chamber provided by the invention, mainly be connected with a little pollution (Airborne Molecular Contamination in the exogenous QI inlet, AMC) cleaning equipment, be provided with at least one adsorbing mechanism in this little removing pollutant equipment, be coated with an adsorption layer on this adsorbing mechanism, with contained micropollutants in the absorption exogenous QI, this little removing pollutant equipment rear is connected with a mau make up air hundling unit schedule (Make Up Air Unit, MAU), the outlet of this mau make up air hundling unit schedule directly imports dust free room; With this, the higher dust free room of QI invigorating prescription is used to make outside QI invigorating provide.
Described equipment for purifying air-intake for dust-free chamber, wherein, the adsorbing mechanism of this little removing pollutant equipment is a runner, this runner has a binding domain, a regeneration desorption zone and isolates cooled region, its exogenous QI is after the binding domain absorption of runner, make exogenous QI be condensed into pollution waste gas by desorption by regeneration desorption zone again, and after runner will pollute the waste gas desorption, change over to and isolate the cooled region cooling, make runner recover to have adsorption function, remove the gas that polluter forms pollution-free material through reaction again and pollute waste gas.
Described equipment for purifying air-intake for dust-free chamber, wherein, the runner appearance structure of this adsorbing mechanism is rotary column (Rotary Cylinder or Rotary Tower).
Described equipment for purifying air-intake for dust-free chamber, wherein, the runner appearance structure of this adsorbing mechanism is rotary turnplate (Rotary Disk).
Described equipment for purifying air-intake for dust-free chamber, wherein, the adsorbing mechanism of this little removing pollutant equipment is an adsorption material, this adsorption material is a swapping type, promptly extracts after closing and changes adsorption material when absorption is full, and fullly close adsorption material and can send the repeated use of regenerating outside the factory.
Described equipment for purifying air-intake for dust-free chamber, wherein, the adsorbing mechanism of this little removing pollutant equipment is cellular (Honeycomb) structure, is made by inorganic material.
Described equipment for purifying air-intake for dust-free chamber, wherein, the adsorbing mechanism of this little removing pollutant equipment is the multiple hole structure, is made by inorganic material.
Described equipment for purifying air-intake for dust-free chamber, wherein, this adsorption layer is an adsorbent, with the absorption micropollutants.
Described equipment for purifying air-intake for dust-free chamber, wherein, this adsorption layer is a catalyst, with the absorption micropollutants.
Described equipment for purifying air-intake for dust-free chamber, wherein, the desorption mode in this regeneration desorption zone is to adopt electrothermal method will pollute the waste gas desorption.
Described equipment for purifying air-intake for dust-free chamber, wherein, the desorption mode in this regeneration desorption zone is to adopt combustion heat mode will pollute the waste gas desorption.
Described equipment for purifying air-intake for dust-free chamber, wherein, the desorption mode in this regeneration desorption zone is that using plasma (Plasma) mode will be polluted the waste gas desorption.
Described equipment for purifying air-intake for dust-free chamber, wherein, the desorption mode in this regeneration desorption zone is to adopt the Waste Heat Recovery mode will pollute the waste gas desorption.
Described equipment for purifying air-intake for dust-free chamber, wherein, the desorption mode in this regeneration desorption zone is to adopt the strong oxidizer mode will pollute the waste gas desorption.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt electric heating through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt electric heating and catalyst combination through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt the combustion heat through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt the combustion heat and catalyst combination through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt to import strong oxidizer through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt to import strong oxidizer and catalyst combination through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt to import plasma through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this pollution waste gas is to adopt to import plasma and catalyst combination through the reactive mode of reaction removal polluter again.
Described equipment for purifying air-intake for dust-free chamber, wherein, this little removing pollutant equipment is provided with two adsorbing mechanisms, and this two adsorbing mechanism is connected with tee T and exogenous QI inlet, and this tee T is provided with one and switches switch, changes apparatus operating to constitute one batch.
Described equipment for purifying air-intake for dust-free chamber, wherein, this little removing pollutant equipment is only established an adsorbing mechanism, does not do handover operation.
By enforcement of the present invention, have following practical advantage:
1, by little removing pollutant equipment and mau make up air hundling unit schedule, effectively micropollutants contained in the outside QI invigorating are effectively purified, use for dust free room.
2, this little removing pollutant equipment use saturated after, can the adsorbed pollutant of little removing pollutant equipment be deviate from through desorption and reclaim equiment, make little removing pollutant equipment recover the function of absorption micropollutants.
Description of drawings
Fig. 1 is the schematic block follow diagram of the embodiment of the invention.
Fig. 2 is the rotary column sketch map of the adsorbing mechanism of the little removing pollutant equipment of the present invention.
Fig. 3 is the rotary turnplate sketch map of the adsorbing mechanism of the little removing pollutant equipment of the present invention.
Fig. 4 is the use block schematic diagram of second application examples of the embodiment of the invention.
Fig. 5 is the three-dimensional appearance sketch map of little removing pollutant equipment of second application examples of the embodiment of the invention.
Fig. 6 is the use block schematic diagram of the 3rd application examples of the embodiment of the invention.
Primary clustering symbol description in the accompanying drawing:
10, exogenous QI inlet
11, tee T
12, change-over switch
20, little removing pollutant equipment
22, runner
221, binding domain
222, regeneration desorption zone
223, isolate cooled region
23, adsorption material
30, mau make up air hundling unit schedule
40, dust free room
The specific embodiment
But other characteristics of the present invention and specific embodiment conjunction with figs. and following detailed description are further understood.
Please join Fig. 1～3, the present invention is connected with the inlet of a little removing pollutant equipment 20 in exogenous QI inlet 10, the inlet of the outlet of this little removing pollutant equipment 20 and a mau make up air hundling unit schedule 30 joins, the outlet of this mau make up air hundling unit schedule 30 is connected with the inlet of dust free room 40 again, the air outlet slit of this dust free room 40 then directly drains in the atmosphere, wherein this little removing pollutant equipment 20 is provided with at least one adsorbing mechanism, be coated with an adsorption layer on this adsorbing mechanism, and adsorbing mechanism is cellular (Honeycomb) structure, this adsorbing mechanism is made by inorganic material, wherein inorganic material can be inorganic fibre paper or for inorganic oxide, and the adsorption layer that is coated with on the adsorbing mechanism is that adsorbent or catalyst are with contained micropollutants in the absorption exogenous QI in addition.
During use, when the production environment of dust free room 40 need be replenished exogenous QI, this exogenous QI 10 places that enter the mouth began to extract extraneous air, this extraneous air contain micro polluting substance (Airborne MolecularContamination, in the time of AMC), sulphur-containing substance: SO for example
X, H
2S, DMSO (DimethylSulfoxide, (CH
3)
2SO), DMS (Dimethyl Sulfide, (CH
3)
2S) etc., nitrogen substance: NO
X, NH
3, MEA (Monoethanol Amine, NH
2C
2H
4OH) etc., contain lower boiling VOC (Volatile Organic Compounds, VOCs) material, IPA (IsopropylAlcohol, C
3H
7OH), acetone etc., and contain high boiling VOC (VolatileOrganic Compounds, VOCs) etc., when extraneous air enters little removing pollutant equipment 20 by exogenous QI inlet 10, and be provided with at least one adsorbing mechanism in little removing pollutant equipment 20, this adsorbing mechanism is a runner 22, and runner 22 appearance structures can be rotary column (Rotary Cylinder orRotary Tower) or rotary turnplate (Rotary Disk), and make by inorganic fibre paper or for inorganic oxide, and runner 22 has a binding domain 221, one regeneration desorption zone 222 and isolates cooled region 223, be coated with an adsorption layer on the runner 22 in addition, this adsorption layer is adsorbent or catalyst, with contained micropollutants in the absorption exogenous QI, its exogenous QI is after binding domain 221 absorption of runner 22, make exogenous QI be condensed into pollution waste gas by desorption by regeneration desorption zone 222 again, wherein the desorption and regeneration mode in this regeneration desorption zone 222 is to adopt electric heating, the combustion heat, plasma (Plasma), Waste Heat Recovery, arbitrary mode of strong oxidizer will be polluted the waste gas desorption, and after runner 22 will pollute the waste gas desorption, change over to and isolate cooled region 223 coolings, make runner 22 recover to have adsorption function, remove the gas that polluter forms pollution-free material through reaction again and pollute waste gas, wherein should pollute waste gas is removed polluter again through reaction reactive mode, can be to adopt electric heating, the combustion heat, import strong oxidizer (as: ozone) or plasma (Plasma), or any of preceding paragraph technology and catalyst combination pattern, and enter the extraneous air of removing micro polluting substance in the mau make up air hundling unit schedule 30, again with remaining pollutant removal, promptly become cleaned air, can directly import dust free room 40.
Please join Fig. 4～6 again, be second of the embodiment of the invention, the 3rd application examples, this exogenous QI inlet 10 is connected to little removing pollutant equipment 20 with tee T 11, be provided with two adsorbing mechanisms in this little removing pollutant equipment 20, this adsorbing mechanism is an adsorption material 23, this adsorption material 23 is a swapping type, be coated with an adsorption layer on the adsorption material 23 of this adsorbing mechanism, this adsorption layer is adsorbent or catalyst, and this adsorption material 23 is made the hole structure of plural pieces melikaria or low pressure drop by inorganic material (as inorganic fibre paper or for inorganic oxide), and the parting of this tee T 11 is provided with a switching switch 12, the in addition end of this adsorption material 23 is connected to mau make up air hundling unit schedule 30 after joining again, and 30 of this mau make up air hundling unit schedule are connected with dust free room 40.
During use, when the production environment of dust free room 40 need be replenished exogenous QI, it is unimpeded earlier change-over switch 12 to be cut into first adsorption material, 23 passages, second adsorption material 23 is closed, the air exhauster of restarting mau make up air hundling unit schedule 30 is to extract extraneous air, this extraneous air contain micro polluting substance (AirborneMolecular Contamination, in the time of AMC), sulphur-containing substance: SO for example
X, H
2S, DMSO (Dimethyl Sulfoxide, (CH
3)
2SO), DMS (Dimethyl Sulfide, (CH
3)
2S) etc., nitrogen substance: NO
X, NH
3, MEA (Monoethanol Amine, NH
2C
2H
4OH) etc., contain lower boiling VOC (Volatile Organic Compounds, VOCs) material, IPA (Isopropyl Alcohol, C
3H
7OH), acetone etc., and contain high boiling VOC (Volatile Organic Compounds, VOCs) etc., the adsorption material 23 that enters little removing pollutant equipment 20 by exogenous QI inlet 10 via change-over switch 12 when extraneous air, this extraneous air is by being made the adsorption material 23 of alveolate texture by inorganic material, because of being coated with adsorbent (or catalyst) on the adsorption material 23, when the former extraneous air that contains micro polluting substance passes through the adsorption material 23 of adsorbing mechanism, the interior contained micro polluting substance of this extraneous air is adsorbed adsorbent on the material 23 (or catalyst) absorption and holds back down, should enter mau make up air hundling unit schedule 30 by the extraneous air of adsorbing mechanism, and enter the extraneous air of removing micro polluting substance in the mau make up air hundling unit schedule 30, again with remaining pollutant removal, promptly become cleaned air, can directly import dust free room 40, and after using a period of time, when the little pollution of first adsorption material, 23 absorption of this little removing pollutant equipment 20 has reached degree of saturation, it is unimpeded that be cut into second adsorption material 23 passages with change-over switch 12 this moment, and first adsorption material, 23 pathway closures, make extraneous air enter second adsorption material 23 of adsorbing mechanism, adsorbent (or catalyst) by its inner adsorption material 23 is held back down micropollutants absorption, first adsorption material 23 of inhaling little removing pollutant equipment 20 saturatedly then can be sent factory because of adsorbing, and utilizes desorption and reclaim equiment regeneration back to reuse.Only be placed under the situation of single passage and use and further application of the invention example (as shown in Figure 6) also can be made as adsorption material, do not do the handover operation on the passage, can reach identical purpose equally.
The above only is preferred embodiment of the present invention, and when can not be in order to limit the enforceable scope of the present invention, all those skilled in the art obviously can do to change and modification, all should be considered as not departing from flesh and blood of the present invention.
Claims (24)
1, a kind of equipment for purifying air-intake for dust-free chamber, mainly be connected with a little pollution (Airborne Molecular Contamination in the exogenous QI inlet, AMC) cleaning equipment, be provided with at least one adsorbing mechanism in this little removing pollutant equipment, be coated with an adsorption layer on this adsorbing mechanism, with contained micropollutants in the absorption exogenous QI, this little removing pollutant equipment rear is connected with a mau make up air hundling unit schedule (Make Up Air Unit, MAU), the outlet of this mau make up air hundling unit schedule directly imports dust free room; With this, the higher dust free room of QI invigorating prescription is used to make outside QI invigorating provide.
2, equipment for purifying air-intake for dust-free chamber as claimed in claim 1, wherein, the adsorbing mechanism of this little removing pollutant equipment is a runner, this runner has a binding domain, a regeneration desorption zone and isolates cooled region, its exogenous QI is after the binding domain absorption of runner, make exogenous QI be condensed into pollution waste gas by desorption by regeneration desorption zone again, and after runner will pollute the waste gas desorption, change over to and isolate the cooled region cooling, make runner recover to have adsorption function, remove the gas that polluter forms pollution-free material through reaction again and pollute waste gas.
3, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the runner appearance structure of this adsorbing mechanism is rotary column (Rotary Cylinder or Rotary Tower).
4, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the runner appearance structure of this adsorbing mechanism is rotary turnplate (Rotary Disk).
5, equipment for purifying air-intake for dust-free chamber as claimed in claim 1, wherein, the adsorbing mechanism of this little removing pollutant equipment is an adsorption material, and this adsorption material is a swapping type, promptly extract after closing and change adsorption material when absorption is full, and fullly close adsorption material and can send the repeated use of regenerating outside the factory.
6, as claim 1,2,3,4 or 5 described equipment for purifying air-intake for dust-free chamber, wherein, the adsorbing mechanism of this little removing pollutant equipment is an alveolate texture, is made by inorganic material.
7, as claim 1,2,3,4 or 5 described equipment for purifying air-intake for dust-free chamber, wherein, the adsorbing mechanism of this little removing pollutant equipment is the multiple hole structure, is made by inorganic material.
8, equipment for purifying air-intake for dust-free chamber as claimed in claim 1, wherein, this adsorption layer is an adsorbent, with the absorption micropollutants.
9, equipment for purifying air-intake for dust-free chamber as claimed in claim 1, wherein, this adsorption layer is a catalyst, with the absorption micropollutants.
10, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the desorption mode in this regeneration desorption zone is to adopt electrothermal method will pollute the waste gas desorption.
11, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the desorption mode in this regeneration desorption zone is to adopt combustion heat mode will pollute the waste gas desorption.
12, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the desorption mode in this regeneration desorption zone is that the using plasma mode will be polluted the waste gas desorption.
13, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the desorption mode in this regeneration desorption zone is to adopt the Waste Heat Recovery mode will pollute the waste gas desorption.
14, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, the desorption mode in this regeneration desorption zone is to adopt the strong oxidizer mode will pollute the waste gas desorption.
15, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt electric heating through the reactive mode of reaction removal polluter again.
16, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt electric heating and catalyst combination through the reactive mode of reaction removal polluter again.
17, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt the combustion heat through the reactive mode of reaction removal polluter again.
18, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt the combustion heat and catalyst combination through the reactive mode of reaction removal polluter again.
19, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt to import strong oxidizer through the reactive mode of reaction removal polluter again.
20, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt to import strong oxidizer and catalyst combination through the reactive mode of reaction removal polluter again.
21, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt to import plasma through the reactive mode of reaction removal polluter again.
22, equipment for purifying air-intake for dust-free chamber as claimed in claim 2, wherein, this pollution waste gas is to adopt to import plasma and catalyst combination through the reactive mode of reaction removal polluter again.
23, equipment for purifying air-intake for dust-free chamber as claimed in claim 1, wherein, this little removing pollutant equipment is provided with two adsorbing mechanisms, and this two adsorbing mechanism is connected with tee T and exogenous QI inlet, this tee T is provided with one and switches switch, changes apparatus operating to constitute one batch.
24, equipment for purifying air-intake for dust-free chamber as claimed in claim 1, wherein, this little removing pollutant equipment is only established an adsorbing mechanism, does not do handover operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101479460A CN101376033A (en) | 2007-08-27 | 2007-08-27 | Equipment for purifying air-intake for dust-free chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101479460A CN101376033A (en) | 2007-08-27 | 2007-08-27 | Equipment for purifying air-intake for dust-free chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101376033A true CN101376033A (en) | 2009-03-04 |
Family
ID=40419879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101479460A Pending CN101376033A (en) | 2007-08-27 | 2007-08-27 | Equipment for purifying air-intake for dust-free chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101376033A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107485957A (en) * | 2017-10-11 | 2017-12-19 | 苏州和必尔斯电子科技有限公司 | A kind of environment-friendly type paint spray booth tail gas binary channels purifying processing device |
| CN111121072A (en) * | 2019-11-18 | 2020-05-08 | 华夏碧水环保科技有限公司 | VOCs waste gas catalytic combustion treatment system and method |
| WO2020216357A1 (en) * | 2019-04-25 | 2020-10-29 | 上海必修福企业管理有限公司 | Clean room system for semiconductor manufacturing and electric-field dust removal method therefor |
-
2007
- 2007-08-27 CN CNA2007101479460A patent/CN101376033A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107485957A (en) * | 2017-10-11 | 2017-12-19 | 苏州和必尔斯电子科技有限公司 | A kind of environment-friendly type paint spray booth tail gas binary channels purifying processing device |
| CN107485957B (en) * | 2017-10-11 | 2019-10-01 | 泰州文杰数控设备有限公司 | A kind of environment-friendly type paint spray booth tail gas binary channels purifying processing device |
| WO2020216357A1 (en) * | 2019-04-25 | 2020-10-29 | 上海必修福企业管理有限公司 | Clean room system for semiconductor manufacturing and electric-field dust removal method therefor |
| CN111121072A (en) * | 2019-11-18 | 2020-05-08 | 华夏碧水环保科技有限公司 | VOCs waste gas catalytic combustion treatment system and method |
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Open date: 20090304 |