CN101327905A - Method for making mini optical fibre spectrometer narrow slit - Google Patents
Method for making mini optical fibre spectrometer narrow slit Download PDFInfo
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- CN101327905A CN101327905A CNA2008101344576A CN200810134457A CN101327905A CN 101327905 A CN101327905 A CN 101327905A CN A2008101344576 A CNA2008101344576 A CN A2008101344576A CN 200810134457 A CN200810134457 A CN 200810134457A CN 101327905 A CN101327905 A CN 101327905A
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- slit
- slit body
- groove
- silicon dioxide
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Abstract
The invention relates to a manufacturing method for a microminiaturized optical spectrograph slit. Firstly, a slit billet is subjected to oxidization, adhesive coating and photoetching to form a pattern with scallops, the pattern with the scallops undergoes corrosion, adhesive removal, adhesive coating and photosetching to form a slit hole pattern, the silt hole pattern is subjected to ICP etching or wet corrosion to form a slit billet of an impervious groove, and then the slit billet of the impervious groove is subjected to the adhesive removal, the ICP etching or the wet corrosion to obtain the scallops and a slit hole. The slit with small volume and low price is prepared by a micro-machined technology, so a microminiaturized optical spectrograph has the advantages of compact structure, small volume and the reduction of manufacturing cost, and is easier for integration.
Description
The application is dividing an application of following application.
The original application applying date: 2005.4.27
Original application application number: 200510016752.8
Original application title: the structure of mini optical fibre spectrometer and the preparation method of slit thereof
Technical field:
The invention belongs to the MOEMS field, relate to the structure and the slit preparation method thereof of mini optical fibre spectrometer.
Background technology:
Spectrometer is one of important component part of optical instrument, the basic equipment that can measure and analyze the structure and the composition of material, have advantages such as analysis precision height, measurement category is big, speed responsive is fast, be widely used in the research of subjects such as medical science, chemistry, geology, physics and astronomy.And modern optical spectrometer technology starts from commercial Application during the Second World War.In 1940, Arnold Beckman produced the instrument that is called Beckman DU and has been considered to first Tianwan businessman ultraviolet-visible spectrophotometer of usefulness already.Constantly perfect along with the improving constantly of its performance, function, what the volume of instrument also became is heavy huge, though they can satisfy the needs of the high accuracy scientific analysis in the laboratory, in addition application will be restricted in the laboratory.
The design of mini optical fibre spectrometer should be oversimplified for structure owing to the restriction in space as far as possible.But, for mini optical fibre spectrometer, some problems have just produced, and for example adopt the influence of the aberration in transmission-type collimation and the imaging system to make spectral instrument can't obtain then producing in straight spectrum face and the autocollimatic imaging system secondary diffraction and diffraction phenomena repeatedly.In case the problem that will bring after the spectrometer miniaturization resolution ratio to descend, the processing of optical element and mechanism thereof and assembling complicated.The spectrometer that requires of the mini optical fibre spectrometer of commercial usefulness must assemble fast, firmly antidetonation.
Summary of the invention:
Have secondary diffraction, diffraction and resolution ratio is low, space structure is complicated, processing and assembling is complicated, shock resistance is poor, interface generality difference and mechanical slot can not be applicable to problems such as mini optical fibre spectrometer repeatedly in order to solve in the background technology mini optical fibre spectrometer, purpose of the present invention will provide a kind of mini optical fibre spectrometer based on classical Czerny-Turner structure and preparation method thereof.
Mini optical fibre spectrometer of the present invention comprises as shown in the figure: mounting groove, first screwed hole, first groove, second groove, diaphragm, three-flute, the 4th groove, step surface, inlet, second screwed hole, the 3rd screw, outlet, gland, imaging mirror, collimating mirror, grating, slit are arranged on rack body; Wherein the mounting groove on rack body, first groove, second groove, three-flute and the 4th groove and the first screwed hole axis are parallel to each other, and perpendicular to the upper surface of support; Intersect the axis of inlet and the bottom surface of second groove; First groove is between the mounting groove and second groove, and the bottom surface of first groove is relative with outlet; The upper surface and the lower surface of support are parallel to each other; The side of the diaphragm of close second groove is parallel with the bottom surface of second groove, and the working face of diaphragm and the 4th groove are near the parallel sided in exit; Step surface and the 4th groove intersect near a side of inlet; The axis of the inlet and second screwed hole is parallel to each other, and perpendicular to the side of support near inlet; Three-flute is near outlet; The 3rd screw axis and outlet are parallel to each other, and perpendicular to the side of support near outlet; The installed surface of imaging mirror is placed in first groove, the installed surface of collimating mirror is placed in second groove, the installed surface of grating is placed in the 4th groove, is formed the optical system of a spectrometer by imaging mirror, collimating mirror and grating three's working face; Gland is placed in the mounting groove, and slit is placed in the gland.
Slit adopts following method to make:
A. at first the slit body of silicon materials is carried out oxidation, on slit body, form silicon dioxide layer;
B. the slit body that silicon dioxide layer is arranged among the step a is carried out gluing, photoetching forms the band pit pattern on slit body then, then finishes the slit body of band pit pattern and photoresist layer and makes;
C. the slit body to band figure photoresist layer among the step b corrodes the silicon dioxide layer of not covered protection by photoresist with hydrofluoric acid, and above-mentioned photoresist layer is removed photoresist, and then forms the silicon dioxide layer of band pit pattern on slit body;
D. the slit body among the step c is carried out gluing, photoetching forms band slit pore figure on slit body, then finishes the slit body of band slit pore figure and photoresist layer and makes;
E. to utilizing inductively coupled plasma etching slit body figure in the steps d, obtain the not slit body of penetrating groove of certain depth, or utilize wet corrosion technique to make, then finish the not making of the slit body of penetrating groove;
F. the slit body to the not penetrating groove that obtains among the step e removes photoresist, and then finishes the making of the slit body that has not penetrating groove, pit pattern and silicon dioxide layer;
G. the slit body to not penetrating groove, pit pattern and silicon dioxide layer among the step f utilizes inductively coupled plasma to carry out etching, thereby obtains pit and slit pore, then finishes the making of slit; Or utilize wet corrosion technique to make pit and slit pore, then finish the making of slit.
System principle: light enters inlet through guiding optical fiber, through slit light is controlled, width of light beam width is on request incided on the collimating mirror, incide after collimating mirror collimates light and carry out beam split on the grating, light beam after the beam split shines on the imaging mirror again, is imaged on the exit.
Advantage of the present invention: adopt support of the present invention, its compact conformation, volume are little, and the present invention adopts support and optical system to form one, produces simple, the integrated mini optical fibre spectrometer of space structure.Because the optical element of optical system of the present invention adopts support, mounting groove and gland location, make accurately location and clamping, easy to adjust, fixation fast of optical element, thereby make processing and assembling is simple, shock resistance is strong.Because the present invention prepares integrated diaphragm is arranged, guarantee to eliminate secondary diffraction, multistage diffraction and aberration on rack body.Because the slit that the present invention adopts can be controlled unpolarized light beam and shelter from the incident of natural daylight, in the present invention when adopting silicon chip to do material, owing to utilized micromechanical process processing of the present invention, make the volume of slit small, cheap, solved the problem that mechanical slot can not be applicable to mini optical fibre spectrometer, thereby realized the making of mini optical fibre spectrometer, in the time of can having difference to require according to the unpolarized light beam width simultaneously, can realize the slit replacing at an easy rate.The resolution ratio of optical system is subjected to the influence of the width of slit, utilizes the width of the silicon chip slit pore of micromachined processes among the present invention to satisfy the requirement of systemic resolution to slit width fully from selecting arbitrarily between the 1 μ m-100 μ m.Support of the present invention, optical element and gland can mass productions, adopt the silicon chip slit of micromechanical process processing to be fit to mass production, the suitable for industrial of mini optical fibre spectrometer of the present invention, commercialization especially.Mini optical fibre spectrometer of the present invention has obtained using widely in many fields such as industry and scientific researches, as environment measuring, medical diagnosis, chemical analysis, wastewater treatment, science and technology agricultural, military analysis and industrial flow monitoring etc., also applicable to online spectral detection.
Description of drawings:
The structural representation of Fig. 1 mini optical fibre spectrometer support of the present invention;
The structural representation of Fig. 2 mini optical fibre spectrometer entrance and exit of the present invention;
Fig. 3 the present invention lays the structure chart behind optical element and the slit;
The structural representation of Fig. 4 slit of the present invention;
The structural representation of Fig. 5 gland of the present invention;
The assembling schematic diagram of Fig. 6 slit of the present invention and gland;
The specific embodiment:
The present invention is further described below in conjunction with drawings and Examples, but the invention is not restricted to these embodiment.Mini optical fibre spectrometer support of the present invention and related elements thereof such as accompanying drawing 1, Fig. 2, Fig. 3, Fig. 4, Fig. 5, shown in Figure 6 comprise mounting groove 1, support 2, first screwed hole 3, first groove 4, second groove 5, diaphragm 6, three-flute 7, the 4th groove 8, step surface 9, inlet 10, second screwed hole 11, the 3rd screw 12, outlet 13, gland 14, imaging mirror 15, collimating mirror 16, grating 17, slit 23.
The bottom surface of first groove 4 is 13 staggered relatively with outlet, light behind grating 17 diffraction is converged be imaged on outlet 13 places; The side of the diaphragm 6 of close second groove 5 is parallel or crossing with the bottom surface of second groove 5, and diaphragm 6 working faces and the 4th groove 8 are near the side coplanes at outlet 13 places, or diaphragm 6 working faces are parallel and be higher than the 4th groove 8 near the sides that export 13; Both axis coplane or antarafacial of the inlet 10 and second screwed hole 11 is parallel; Inlet 10 is used for guiding optical fiber, can guarantee that optical fiber enters along fixing direction.
The installed surface of first groove 4, second groove 5, three-flute 7, the 4th groove 8 adopts square groove or V-type groove, when first groove 4, second groove 5, three-flute 7, the 4th groove 8 employing square grooves, the connected mode of imaging mirror 15, collimating mirror 16, grating 17 can be to connect by adhesive such as 502 glue or high performance structures AB glue; Or when first groove 4, second groove 5, three-flute 7, the 4th groove 8 employing V-type grooves, the connected mode of imaging mirror 15, collimating mirror 16, grating 17 is inlayed connection, so just can guarantee the shock resistance of spectrometer system.Imaging mirror 15 and collimating mirror 16 can adopt sphere concave surface, non-spherical reflector structure, plate one deck 0.5mm aluminium on its surface again after grinding on the K9 glass substrate.Grating 17 can adopt mechanical scratching grating or holographic grating.
Two through hole 18 symmetry or asymmetric both sides that are distributed in boss 22, and the axis coplane or the antarafacial of the axis of two through holes 18 and light hole 21.
Four the 4th screwed hole 19 symmetry or the asymmetric both sides that are distributed in through hole 18.
A. at first slit body is carried out oxidation, on slit body, form silicon dioxide layer;
B. the slit body that silicon dioxide layer is arranged among the step a is carried out gluing, photoetching forms band pit 24 figures on slit body then, then finishes the slit body of band pit 24 figures and photoresist layer and makes;
C. the slit body to band figure photoresist layer among the step b corrodes the silicon dioxide layer of not covered protection by photoresist with hydrofluoric acid, and above-mentioned photoresist layer is removed photoresist, and then forms the silicon dioxide layer of band pit 24 figures on slit body;
D. the slit body among the step c is carried out gluing, photoetching forms band slit pore figure on slit body, then finishes the slit body of band slit pore figure and photoresist layer and makes;
E. to utilizing inductively coupled plasma etching (ICP) slit body figure in the steps d, obtain the not slit body of penetrating groove of certain depth, or utilize wet corrosion technique to make, then finish the not making of the slit body of penetrating groove;
F. the slit body to the not penetrating groove that obtains among the step e removes photoresist, and then finishes the making of the slit body that has not penetrating groove, pit 24 figures and silicon dioxide layer;
G. the slit body to not penetrating groove, pit 24 figures and silicon dioxide layer among the step f utilizes inductively coupled plasma to carry out etching (ICP), thereby obtains pit 24 and slit pore 25, then finishes the making of slit; Or utilize wet corrosion technique to make pit 24 and slit pore 25, then finish the making of slit.
Claims (1)
1, a kind of preparation method of mini optical fibre spectrometer narrow slit is characterized in that:
A. at first the slit body of silicon materials is carried out oxidation, on slit body, form silicon dioxide layer;
B. the slit body that silicon dioxide layer is arranged among the step a is carried out gluing, photoetching forms the band pit pattern on slit body then, then finishes the slit body of band pit pattern and photoresist layer and makes;
C. the slit body to band figure photoresist layer among the step b corrodes the silicon dioxide layer of not covered protection by photoresist with hydrofluoric acid, and above-mentioned photoresist layer is removed photoresist, and then forms the silicon dioxide layer of band pit pattern on slit body;
D. the slit body among the step c is carried out gluing, photoetching forms band slit pore figure on slit body, then finishes the slit body of band slit pore figure and photoresist layer and makes;
E. to utilizing inductively coupled plasma etching slit body figure in the steps d, obtain the not slit body of penetrating groove of certain depth, or utilize wet corrosion technique to make, then finish the not making of the slit body of penetrating groove;
F. the slit body to the not penetrating groove that obtains among the step e removes photoresist, and then finishes the making of the slit body that has not penetrating groove, pit pattern and silicon dioxide layer;
G. the slit body to not penetrating groove, pit pattern and silicon dioxide layer among the step f utilizes inductively coupled plasma to carry out etching, thereby obtains pit and slit pore, then finishes the making of slit; Or utilize wet corrosion technique to make pit and slit pore, then finish the making of slit.
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CNA2008101344576A CN101327905A (en) | 2005-04-27 | 2005-04-27 | Method for making mini optical fibre spectrometer narrow slit |
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CNA2008101344576A CN101327905A (en) | 2005-04-27 | 2005-04-27 | Method for making mini optical fibre spectrometer narrow slit |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102226717A (en) * | 2011-04-07 | 2011-10-26 | 江阴市嘉臣光电科技有限公司 | Ultraviolet enhanced miniature fiber optic spectrometer |
CN102540775A (en) * | 2010-12-27 | 2012-07-04 | 无锡华润上华科技有限公司 | Method for removing photoresist of silicide protection layer |
CN103398778A (en) * | 2013-08-19 | 2013-11-20 | 深圳先进技术研究院 | Micro spectrograph and preparing and assembling method thereof |
CN104457984A (en) * | 2014-12-30 | 2015-03-25 | 中国科学院长春光学精密机械与物理研究所 | Low-stray-light small monochrometer |
-
2005
- 2005-04-27 CN CNA2008101344576A patent/CN101327905A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102540775A (en) * | 2010-12-27 | 2012-07-04 | 无锡华润上华科技有限公司 | Method for removing photoresist of silicide protection layer |
CN102226717A (en) * | 2011-04-07 | 2011-10-26 | 江阴市嘉臣光电科技有限公司 | Ultraviolet enhanced miniature fiber optic spectrometer |
CN103398778A (en) * | 2013-08-19 | 2013-11-20 | 深圳先进技术研究院 | Micro spectrograph and preparing and assembling method thereof |
CN103398778B (en) * | 2013-08-19 | 2015-07-29 | 深圳先进技术研究院 | Micro spectrometer and preparation assembly method thereof |
CN104457984A (en) * | 2014-12-30 | 2015-03-25 | 中国科学院长春光学精密机械与物理研究所 | Low-stray-light small monochrometer |
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Open date: 20081224 |