CN101322866A - Deep brain epileptic discharge induction treatment method and equipment - Google Patents
Deep brain epileptic discharge induction treatment method and equipment Download PDFInfo
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- CN101322866A CN101322866A CNA2008100006267A CN200810000626A CN101322866A CN 101322866 A CN101322866 A CN 101322866A CN A2008100006267 A CNA2008100006267 A CN A2008100006267A CN 200810000626 A CN200810000626 A CN 200810000626A CN 101322866 A CN101322866 A CN 101322866A
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Abstract
The invention discloses an induction therapy method for epileptic discharge in deep brain of an epileptic and a device thereof, which is of a new medical concept and a new medical device. The therapy method and the device of the invention are used for curing an epileptogenic focus in the deep brain area of the epileptic, particularly for the intractable epileptic by using medicines. The device of the invention comprises a needle-shaped electrode in the brain, a guide wire with an insulating layer, a protection sheath for silica gel guide wires and an electrode plate under the scalp. The method and the device of the invention are characterized in that the induction method is adopted to induce the hypersynchrony discharge of the epileptic under the skin outside the skull, an electrode made by the material with high electrical conductivity is embedded to epileptic discharge parts in the brain and connected to the electrode plate outside the skull by the guide wire that is made by the material with high electrical conductivity and is provided with the outer insulating layer, the electric potential difference between the high voltage in the explosive discharge of the epilepsy and the low voltage outside the skull is utilized to induce the explosive discharge current to the exterior of the brain, thereby avoiding the clinic epileptic seizure formed by the discharge induction of the epilepsy and realizing the aim of curing the epilepsy.
Description
1. technical field
The present invention relates to a kind of new medical idea and armarium, is that Therapeutic Method and the method that is used for brain deep regional epileptogenic focus patient is equipped with, in particular for the epileptic of drug refractory.
2. background technology
At present, a kind of chronic encephalopathy of epilepsy forms with the supersynchronous discharge owing to partial nerve unit in the brain.Be a kind of clinically commonly encountered diseases and frequently-occurring disease, sickness rate has 0.9% approximately, method commonly used at present is about thing treatment, operative treatment, radiotherapy and electronic stimulation, no matter be that a kind of Therapeutic Method, it all is supersynchronous discharge by inhibition or block nerves unit, that is to say it is to suppress to be the Therapeutic Method of basic theory, epileptic's Drug therapy of 50% is not good maybe can not to tolerate side effects of pharmaceutical drugs but still have, and the effect of radiation therapy extreme difference, rare application, the expenses of surgical treatment height, have a big risk and have long-term complications, and still have 40% curative effect bad, electricity irritation expense height, weak curative effect.So current overall context has nearly 30% epilepsy not obtain the effective treatment, thereby chronic function of nervous system's infringement and mental disorder occur, and have consciousness injury and dead threat.The patient of brain deep regional epileptogenic focus accounts for 1/2 of epilepsy.
3. summary of the invention
For the method that overcomes the discharge of existing inhibition neuron deficiency to epilepsy therapy, the invention provides a kind of new treatment idea and medical apparatus and instruments, the supersynchronous discharge that the method that the present invention adopts guiding is suffered from epilepsy is directed to outer subcutaneous of skull, thereby the explosive electrical activity during with epilepsy stops, thereby the high voltage and the extensively conduction of under the situation that Wicresoft hinders, removing the supersynchronous discharge of neuron easily and causing, the treatment epilepsy.
The technical solution adopted for the present invention to solve the technical problems is: the electrode that high conductivity material is made is implanted epileptic discharge position in the brain, make and have the lead of external insulation layer to be connected to outside the cranium by high conductivity material, outside cranium, connect the electrode slice that lamellar larger area high conductive material is made, the electric potential difference of the low-voltage that high voltage when utilizing the discharge of epilepsy burst and cranium are outer, explosive discharge current is directed to outside the brain, thereby the clinical epilepsy of avoiding the epileptic discharge conduction and forming reaches the purpose for the treatment of epilepsy.And brain inner potential and brain dispatch from foreign news agency potential difference are less during the normal brain activity electrical activity, can not form current active between the intracranial external electrode, do not influence the bioelectrical activity of normal brain activity.
The beneficial effects of the utility model are, can be in the bioelectrical activities that guarantees normal brain activity, and explosive high-tension generation in the brain prevents epilepsy, thereby avoids the Taking Control of Epilepsy symptom easily, and is simple in structure, easy to use, minimum to the cerebral tissue wound.
4. description of drawings
Fig. 1 is this equipment median vertical line generalized section
Fig. 2 is a use sketch map of the present invention
1. epileptic discharge positions among the figure, 2. patient's epileptic discharge pathway, 3. electrode, 4. tape insulation layer conductor, 5. silica gel wire-protecting sheath, 6. scalp bottom electrode sheet, 7. skull, 8. brain, 9. scalp in the brain
5. the specific embodiment
In Fig. 2, after skull (6) boring, electrode in the brain (3) is inserted into the fixed discharge of epilepsy position (1) in the human brain together with lead (4), after place, bone hole is fixed, the electrode slice (5) of lead (4) other end is positioned over no muscle position under the scalp (8).With air bag (3) inflation, but, between glottis and air bag, form dead space, divide bold and vigorous thing to accumulate owing to patient's glottis is tight usually closed.Electric current will be along epileptic discharge position (1) to brain in electrode (3) to lead (4) to scalp bottom electrode (5) to the scalp conduction.
Claims (9)
1. the method and apparatus of a brain deep epileptic discharge guiding; the guide line, medical silica-gel protection sheath and the whole not dististyle shape electrode that comprise electrode in the brain, band external insulation layer; it is characterized in that: insert epileptogenic focus position, brain deep by electrode in the brain; lead wire links to each other with whole not dististyle electrode in the brain with electrode, cause high-amplitude epilepsy discharge in the brain subcutaneous to the end.
2. the method for discharge guiding according to claim 1 and the equipment of rising, its feature is directed to brain with epilepsy discharge in the brain and treats the epilepsy method outward.
3. the method for discharge guiding according to claim 1 and the equipment of rising are implanted preceding termination electrode in the brain, comprise structures such as deep epileptogenic focus and Hippocampus.
4. the method and apparatus of discharge guiding according to claim 1 is characterized in that its preceding termination electrode is acicular, and single or multiple contacts is arranged.
5. the method and apparatus of discharge guiding according to claim 1, the lead of termination electrode is many before it is characterized in that.
6. the method and apparatus of discharge guiding according to claim 1 is between its preceding termination electrode multiconductor of its feature and the mutually insulated between each lead.
7. the method and apparatus of discharge guiding according to claim 1, each whole not dististyle shape electrode of its feature links to each other with a lead.
8. the method and apparatus of discharge guiding according to claim 1, each whole not dististyle shape electrode of its feature is all to be to place midline position under the scalp.
9. the method and apparatus of discharge guiding according to claim 1, each whole not dististyle shape electrode midline position under scalp of its feature is disjunct.
Priority Applications (1)
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CNA2008100006267A CN101322866A (en) | 2008-01-11 | 2008-01-11 | Deep brain epileptic discharge induction treatment method and equipment |
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CNA2008100006267A CN101322866A (en) | 2008-01-11 | 2008-01-11 | Deep brain epileptic discharge induction treatment method and equipment |
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CNA2008100006267A Pending CN101322866A (en) | 2008-01-11 | 2008-01-11 | Deep brain epileptic discharge induction treatment method and equipment |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102341036B (en) * | 2009-01-26 | 2015-06-17 | 因库博实验室有限责任公司 | Method and apparatus for the detection of aberrant neural-electric activity |
CN105561474A (en) * | 2015-02-20 | 2016-05-11 | 邵志辉 | Device for treating epilepsy by stimulating vagus nerves of human body |
CN107405390A (en) * | 2014-12-05 | 2017-11-28 | 阿雷克森制药公司 | With recombinant basic phosphoric acid enzyme treatment epilepsy |
CN110917493A (en) * | 2019-12-30 | 2020-03-27 | 龙岩学院 | Epilepsia electrode implantation equipment |
CN116251295A (en) * | 2023-03-09 | 2023-06-13 | 北京工业大学 | Focal epileptic electric guidance-nerve electric regulation and control system and method |
-
2008
- 2008-01-11 CN CNA2008100006267A patent/CN101322866A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102341036B (en) * | 2009-01-26 | 2015-06-17 | 因库博实验室有限责任公司 | Method and apparatus for the detection of aberrant neural-electric activity |
CN104983417A (en) * | 2009-01-26 | 2015-10-21 | 因库博实验室有限责任公司 | Apparatus for the detection of aberrant neural-electric activity |
CN104983417B (en) * | 2009-01-26 | 2018-02-27 | 因库博实验室有限责任公司 | For detecting the device of the abnormal neuron electrical activity in brain |
CN107405390A (en) * | 2014-12-05 | 2017-11-28 | 阿雷克森制药公司 | With recombinant basic phosphoric acid enzyme treatment epilepsy |
CN105561474A (en) * | 2015-02-20 | 2016-05-11 | 邵志辉 | Device for treating epilepsy by stimulating vagus nerves of human body |
CN110917493A (en) * | 2019-12-30 | 2020-03-27 | 龙岩学院 | Epilepsia electrode implantation equipment |
CN110917493B (en) * | 2019-12-30 | 2023-09-22 | 龙岩学院 | Epileptic electrode implantation equipment |
CN116251295A (en) * | 2023-03-09 | 2023-06-13 | 北京工业大学 | Focal epileptic electric guidance-nerve electric regulation and control system and method |
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Open date: 20081217 |