CN101307481A - Multifunctional dielectrophoresis operated micro-electrode on-chip system and its manufacture method - Google Patents

Multifunctional dielectrophoresis operated micro-electrode on-chip system and its manufacture method Download PDF

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CN101307481A
CN101307481A CNA2008100364411A CN200810036441A CN101307481A CN 101307481 A CN101307481 A CN 101307481A CN A2008100364411 A CNA2008100364411 A CN A2008100364411A CN 200810036441 A CN200810036441 A CN 200810036441A CN 101307481 A CN101307481 A CN 101307481A
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electrode
dielectrophoresis
microelectrode
chip
multifunctional
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唐晓东
刘伟景
蒋珂玮
王玉才
许修兵
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East China Normal University
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East China Normal University
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Abstract

The invention discloses a multifunctional dielectrophoresis manipulated microelectrode SOC (system on a chip) and a method for making the same. The invention is characterized in that under the comprehensive consideration of influences of shape, distance, material and proportion of size of the microelectrode on the distribution of manipulating electric field and requirements of the dielectrophoresis manipulation in production study, the SOC is provided inside with a series of electrodes and arrays with different shapes and distances by the micro-processing technique in order to provide designs for microelectrodes and arrays with different shapes and distances needed for different materials waiting for manipulation. The products obtained by the method have the advantages that: 1. the mass production is realized by standard micro-processing technique, so that the cost is quite low; 2. the microelectrode SOC comprises shapes and sizes of usual electrodes needed for production study, so that the microelectrode SOC has wide adaptability.

Description

A kind of multifunctional dielectrophoresis operated micro-electrode on-chip system and preparation method thereof
Technical field
A kind of multifunctional dielectrophoresis operated micro-electrode on-chip system and preparation method thereof belongs to design for Experimental Platform and little processing and manufacturing technical field on the sheet.
Background technology
Dielectrophoresis technology is by apply the AC signal of certain amplitude and frequency between the electrode of design in advance, between electrode, produce inhomogeneous field, make betwixt quilt control object and obtain certain dielectrophoretic force of just (bearing), thereby move to strong (weak) electric field region, thereby realize controlling micro Nano material.It is a kind of technology of controlling of very potential micro/nano level material, this controlling is not subjected to the conductive characteristic of material own, the restriction of material shape etc., be applicable to that all micro nano structures are (as nano material, biomone etc.). therefore, the concern that dielectrophoresis technology more and more is subjected to not only has very important scientific research value, also have huge commercial production potentiality, particularly control the field in nano material and biopolymer.But also exist a lot of problems to solve at present.As:
(1) thisly controls the influence that is subjected to a variety of microcosmic influencing factors, as, the pattern and the spacing of selected solvent species, the concentration of suspension, microelectrode, add the amplitude of controlling signal and frequency etc.For a kind of concrete micro-and nano-particles, the exploration that these factors all will be undertaken by Theoretical Calculation and experiment method.In experiment, need the conversion of a lot of experiment conditions, the especially microelectrode of different-shape and spacing conversion.
(2) in producing and studying, need sometimes some material to be carried out various operations, as carrying, arrangement, location, separation and screening etc. by dielectrophoresis technology.This has just required to build a control system, and wherein the design of electrode and making are very crucial and complicated steps.
(3) along with the high speed development of life science and nanosecond science and technology, novel biomone and nano material continue to bring out, and understand and use them, can carry out various operations, observation and test to it with regard to needs.Differing dielectric constant, the material of pattern and size all can be different in the requirement of controlling by dielectrophoresis microelectrode, so will design and make the corresponding electrode structure according to material, this will be very complicated repetitive operation.
If the microelectrode SOC(system on a chip) that can satisfy various patterns and spacing demand that can make in advance can be arranged, bring great convenience will for the solution of above production and research aspect problem.
Summary of the invention
Goal of the invention of the present invention is in order to provide a kind of multifunctional dielectrophoresis operated micro-electrode on-chip system, to solve the problems referred to above of prior art.
Another object of the present invention is for the making method of above-mentioned dielectrophoresis operated micro-electrode on-chip system is provided.
Purpose of the present invention can be achieved through the following technical solutions.
A kind of multifunctional dielectrophoresis operated micro-electrode on-chip system, it produces the electrode and the array of a series of different-shape and spacing by micro-processing technology in SOC(system on a chip) the inside, the microelectrode and the array design of needed different-shape and spacing are provided for material various to be controlled.
The kind of electrode that described SOC(system on a chip) comprises and array is as follows:
1) some line style series, comprise different wedge angle angle triangles to plate and dot to plate;
This structure is to produce big electric-force gradient, obtains the simplest a kind of electrode design of big dielectrophoretic force, and all the time, people are accustomed to studying the dielectrophoresis phenomenon with it.Electric-force gradient around the triangular form wedge angle electrode can be by the accurately control of size of wedge angle.Because on every side electric field by electrode to around disperse, if increase the angle of wedge angle, more material is assembled and interelectrode cross-over connection at the minimum spacing place.If reduce the wedge angle angle, the dielectrophoresis zone can dwindle, but can produce very big electric-force gradient around at the tip.
2) some type series, comprise different wedge angle angle triangles to triangular form and dot to dot;
Kind electrode is with dielectrophoresis effect limits very little zone around electrode, and the place is the strongest at eletrode tip.Kind electrode can be used for the positioning action of a small amount of or single material.Application Areas in single properties of materials research and device, the kind electrode design has a wide range of applications.
3) line line style series comprises that parallel plate-type and circular arc are to circular arc;
This also is a kind of electrode structure commonly used.When interelectrode distance is very little, can obtain big field intensity, can obtain very big dielectrophoretic force.Electric field presents the consistence of height between two electrodes, can realize the proper alignment and the cross-over connection of a plurality of materials with it.
4) interdigital series comprises referring to spacing and the different spacings that refer to together;
Kind electrode can be realized the proper alignment and the cross-over connection of lot of materials, has a wide range of applications in collective effect electricity systems such as transmitter.Difference refers to that spacing can also be used to carrying out the contrast of the different spacing manipulation effect under the similarity condition.
5) city wall buttress series comprises chiasma type and over against type;
Kind electrode can make arrangement and the cross-over connection of lot of materials at contiguous place, and it is the separation of material, purifies, and arranges the electrod-array type that operation such as collective effect test is the most frequently used.
6) four trap electrode structural series comprise four round, four different wedge angle angle triangular forms and four squares;
Kind electrode can be used for material is carried out location, four directions, plane, imports two kinds of signals simultaneously, controls and synchro measure.
7) closed intersection approach type series comprises back subtype and circle;
Kind electrode also is that lot of materials is arranged, location, ideal electrode type in the test.
The lead wire circuit that the present invention adopts is designed to following dual mode:
1) adopt the pin electrode to draw; Pin adopts circle or square design, is arranged in successively on unitary four limits of SOC(system on a chip), generally adopts individual layer or intersects bilayer structure.The circuit of drawing of slice, thin piece internal portion electrode adopts bus structure, can simplify like this and draw circuit.
2), adopt the probe lead-out mode without pin circuitry.
The making method of this multifunctional dielectrophoresis operated micro-electrode on-chip system, may further comprise the steps: by at diameter being the silicon chip surface oxidation growth layer of silicon dioxide insulation layer of Φ=2inch, the deposition one deck Ti of mode elder generation with evaporation deposits layer of Au more respectively on insulation layer, spin coating (photoetching) glue just then, successively through preceding baking, photoetching, development and back baking post bake operation, carry out the corrosion of Au, Ti again, finish the making of microelectrode and array.
Make a kind of multifunctional dielectrophoresis operated micro-electrode on-chip system according to above technical scheme, the microelectrode SOC(system on a chip) of this design and making has following purposes and advantage:
1. purposes:
The first, dielectrophoresis technology is a kind of simply and efficiently micro-nano technology of controlling, and can well finish the operational issue of micro-and nano-particles in application, as the orientation problem of nano material in electricity device is used, the arrangement of biomone etc.All will be widely used in production and scientific research field.But thisly control the influence that can be subjected to several factors.By this platform, we can conveniently produce and study the selection that multiple electrode design is provided, and mode is by experiment studied the influence factor that the dielectrophoresis of certain material is controlled, and finds proper operating parameter, simultaneously, also can check the result of Theoretical Calculation with this platform.So it is the platform that characteristic and parameter are controlled in certain dielectric material swimming of an experimental study.
The second, by this platform, can select suitable microelectrode or array, object various to be controlled is carried out operations such as various needed, carrying, arrangement, location, separation and screening.For example, can be to stressed vary in size of heterogeneity in controlling process by mixing material, to material separate, purifying.As different with the relation of medium specific inductivity, can realize a kind ofly being attracted, and another kind ofly be repelled, thereby realize the lock out operation of two kinds of electrical nanotubes of difference by electrode by electrode by the specific inductivity of metallicity and semiconduction carbon nanotube.
The 3rd, along with micro-nano technology is constantly progressive, the Development of Preparation Technology of material, new micro Nano material emerges in an endless stream, understand the character of their all respects, can pass through the dielectrophoresis mode, locate them appointed positions, finish the performance measurement of certain material by this experiment porch.As, with the micro Nano material cross-over connection with arrange between two electrodes, realize electrically contacting, carry out needed electricity characteristic measuring.So it also is a kind of test platform of material behavior.
2. advantage:
The first, to produce in enormous quantities by the standard micro fabrication, cost is very low.
The second, the microelectrode system turnkey has contained needed common electrode pattern and size in production and the research on this sheet, has extensive applicability.
Description of drawings
Fig. 1 microelectrode schema
Fig. 2 microelectrode pictorial diagram
The negative dielectrophoresis of Fig. 3 is controlled figure
The positive dielectrophoresis of Fig. 4 is controlled figure
Four round structure of trap electrodes of Fig. 5 are controlled figure
The three-back-shaped crossed electrode of Fig. 6 is controlled figure
Figure is controlled in Fig. 7 interdigital electrode location and cross-over connection
Figure is controlled in Fig. 8 city wall buttress positioning of electrode and cross-over connection
Embodiment
Further set forth technical characterstic of the present invention below in conjunction with the drawings and specific embodiments.
Now by a 2.1 * 2.3cm 2Microelectrode system-on-chip designs and making and test further describe the present invention.
One, design
Take all factors into consideration microelectrode pattern and spacing, material and electrode size ratio etc. to controlling electric field effects, design the microelectrode and the array series of different shapes and spacing, on silicon materials, produce various electrodes and array series by trickle processing technology.
Microelectrode and array design are as shown in Figure 1,1, spacing is respectively 200,100,50,30, the triangles that 20,10 microns parallel plate-type electrode pairs, wedge angle angles are respectively 90,60,30 degree to flat pole to, wedge angle angle be respectively 90,60,30 to triangular form electrode pair, interdigital electrode, city wall buttress electrod-array; 2, the different radii circle of different spacing, three kinds of wedge angle angle trilateral four electrode groups; 3, spacing increases progressively with spacing from 10 microns of 10-300 micron and increases progressively interdigital electrode from 5 microns of 5-100 micron; 4, spacing is from 10 microns multioutlet interdigital electrodes that increase progressively of 10-150 micron; 5, three-back-shaped crossed electrode of 50 and 100 micron pitch etc.
Lead design mainly adopts peripheral individual layer square pin configuration, and the probe lead-out mode is adopted in design for four trap electrodes.
Two, make:
Making processes: by oxidation is the silicon chip surface growth layer of silicon dioxide insulation layer of Φ=2inch at diameter, the deposition one deck Ti of mode elder generation with evaporation deposits layer of Au more respectively on insulation layer, just post bake is dried by the fire in (photoetching) glue, preceding baking, photoetching, development, back in spin coating then, carry out the corrosion of Au, Ti again, finish the making of microelectrode and array.
The SOC(system on a chip) of made as shown in Figure 2.
Three, test:
Experimental system on the sheet of designed and making is simply tested as controlling object by the ZnO nano material.
1. control the preparation and the description of material
The ZnO nanostructure that is adopted adopts solution growth, and the nanometer rod diameter of being grown is at 200nm, and length is at 10 μ m.
2. with prepared nano material experimental system on the sheet is simply tested
The dielectrophoresis operation: ZnO rod that at first will be to be controlled dissolves in the deionized water, then suspension is put into ultrasonic cleaning machine (model SK1200H, operating frequency 59KHz) ultrasonic 5 minutes.Move into the electrode intermediate zone with the pipettor suspension that takes a morsel then.Apply sinusoidal ac signal with the DDS AWG, at room temperature volatilize fully until solvent.Whole experiment is finished in clean room.
1) dielectrophoresis is controlled groping of characteristic
For a kind of given micro/nano level material, finish its certain specific operation, its dielectrophoresis characteristic comprise the concentration of selected solvent, prepare suspension, electrode (pattern and spacing) design, add the amplitude of controlling signal and frequency etc.Here the positive and negative dielectrophoresis of ZnO nano material is controlled the frequency problem under our the simple research.By changing the size of the frequency of controlling signal in the experiment, the frequency condition of the positive and negative dielectrophoresis of realization gropes in an experimental system.Through experiment, we draw, and the oxidation zinc bar for our preparation places deionized water, and about about 100KHz, frequency less than 100KHz negative dielectrophoresis phenomenon takes place the boundary frequency of positive and negative dielectrophoresis effect, as shown in Figure 3 greatly; Frequency is higher than 100KHz positive dielectrophoresis phenomenon takes place, as shown in Figure 4; Negative dielectrophoresis phenomenon was particularly evident when Frequency point was the 5KHz left and right sides, and positive dielectrophoresis phenomenon performance is obviously during in the 200KHz left and right sides when Frequency point.
2) operations such as various location, arrangement, carrying, separation
Here adopt four trap electrode structures and Back Word type structural experiment, the result as shown in Figure 5 and Figure 6.Fig. 5 is positive dielectrophoresis result.Fig. 6 is negative dielectrophoresis result.There is a trap in the middle of four electrodes as can see from Figure 5, can realizes seizure location material.As can see from Figure 6 at material in the weak electric field region of proper alignment between electrode.
3) to the performance test of material
The measurement of general material behavior all adopts array structure such as interdigital, city wall buttress to come cross-over connection and arrange a lot of materials, measures their collective effect; For the measurement of individual character, generally adopt one point-to-point type or point to wire-type of electrode, when controlling, add the time that a material cross-over connection decision circuitry is controlled experiment.Thisly control more complicated a bit.
Here the positive electrophoresis that adopts interdigital and city wall buttress electrode pair to carry out material is controlled, and finishes material in interelectrode location and cross-over connection, and the result as shown in Figure 7 and Figure 8.
As we can see from the figure, under positive dielectrophoretic force effect, material is then arranged along the electric field line direction, and a lot of materials connect from beginning to end, more tangible interelectrode cross-over connection occurs, simply and effectively finishes the orientation problem in the nano material application.If use the littler electrode structure of size instead, single material just can directly be connected across the electrode two ends.Add test signal at two ends, just can realize the measurement of some characteristic of material.For example, they are measured the wet quick characteristic etc. of prepared nano material as the humidity sensor structure.
The ZnO nanostructure has good absorption to humidity and conciliates absorption property, is a kind of good humidity-sensitive material.For the wet quick characteristic of checking this nanostructure and this electrode system to being controlled the test effect of material, city wall buttress electrode array configurations shown in Figure 8 is carried out relative humidity tests.Needed standard humidity produces by the saturated solution method of salt in the experiment.Depress at a standard atmosphere, when experimental temperature is 25 ℃, gets rh value and be respectively 97.6%, 84.34%, 75.29%, 57.57%, 43.16%5 kind of saturated salt solution is connected to LCR bridge resistance survey meter with two incoming ends of sensing arrangement and carries out ac impedance measurement.
Under 1Vrms, 10kHz condition, the sample environment of different relative humidity is switched by the order that relative humidity increases progressively in elder generation, writes down six observed values.The proceeding measurement of successively decreasing by relative humidity again comes and goes and measures 3 times, obtains 6 groups of observed values.Getting frequency respectively is 1kHz, 100Hz, the operation above repeating.Repeatedly observed value corresponding to each rh value under the same measuring condition is average in addition, obtain the actual measurement mean value of three positive reversal of stroke, the line linearity match of going forward side by side, we can obtain under three different frequencies, alternating-current impedance is with the fitting a straight line of relative humidity variations, and table 1 is the sensitivity analysis of three sensing arrangements under the different frequency.
The sensitivity analysis of the sensing arrangement under three different frequencies of table 1
Test frequency The fitting a straight line equation Sensitivity k Ω/RH% Degree of correlation R
10 kHz y=48.98831-0.07382x -0.07382 -0.92269
1kHz y=382.95964-1.23725x 1.23725 -0.92137
100 Hz y=716.06738-2.49227x 2.49227 -0.94267
Can see that from table 1 under different test frequencies, the slope of each bar fitting a straight line all is a negative value, illustrate that the alternating-current impedance of sensing arrangement reduces significantly gradually along with the increase of test environment relative humidity.The absolute value of the slope of fitting a straight line is the sensitivity of sensing arrangement.Can see the reduction along with test frequency, it is big that the absolute value of the slope of fitting a straight line becomes, and illustrates that sensing arrangement increases the sensitivity of relative humidity; Simultaneously, the relation conefficient size has minor fluctuations with the variation of test frequency, but overall numerical value is higher, illustrates that sensing arrangement all has stability preferably under different test frequency conditions.
We have also done humidity hysteresis and time of response test in addition, and under the condition of 1Vrms, 1KHz, the first sequential testing that increases progressively by rh value is once successively decreased the direction test once by opposite humidity again.For same humidity measurement point, the always a little higher than observed value in reversal of stroke of observed value in positive stroke, and the time of response in positive stroke is always short than the time of response in reversal of stroke, may be owing to moisture absorption than the easy reason of dehumidification.In same test stroke, no matter be positive stroke or reversal of stroke, moisture absorption and dehumidification are all very fast during low humidity, and during high humidity, the beginning moisture absorption is very fast, slack-off near saturated moisture absorption, this is consistent with the multilayer adsorption theory.From top test result, can see, can well finish performance test work by this electrode system to material.

Claims (4)

1, a kind of multifunctional dielectrophoresis operated micro-electrode on-chip system, it is characterized in that: take all factors into consideration microelectrode pattern and spacing, material and electrode size ratio demand is controlled in the influence of controlling electric field distribution and the various dielectrophoresises of producing research, produce the electrode and the array of a series of different-shape and spacing in SOC(system on a chip) the inside by micro-processing technology, the microelectrode and the array design of needed different-shape and spacing are provided for material various to be controlled.
2, a kind of multifunctional dielectrophoresis operated micro-electrode on-chip system according to claim 1, it is characterized in that: the kind of electrode that described SOC(system on a chip) comprises and array is as follows:
1) some line style series, comprise different wedge angle angle triangles to plate and dot to plate;
2) some type series, comprise different wedge angle angle triangles to triangular form and dot to dot;
3) line line style series comprises that parallel plate-type and circular arc are to circular arc;
4) interdigital series comprises referring to spacing and the different spacings that refer to together;
5) city wall buttress series comprises chiasma type and over against type;
6) four trap electrode structural series comprise four round, four different wedge angle angle triangular forms and four squares;
7) closed intersection approach type series comprises back subtype and circle.
3, a kind of multifunctional dielectrophoresis operated micro-electrode on-chip system according to claim 1 is characterized in that: lead wire circuit design of the present invention is selected from dual mode:
1) adopt the pin electrode to draw; Pin adopts circle or square design, is arranged in successively on unitary four limits of SOC(system on a chip), generally adopts individual layer or intersects bilayer structure; The circuit of drawing of slice, thin piece internal portion electrode adopts bus structure, can simplify like this and draw circuit;
2), adopt the probe lead-out mode without pin circuitry.
4, the making method of the described a kind of multifunctional dielectrophoresis operated micro-electrode on-chip system of claim 1, comprise the steps: silicon chip surface oxidation growth layer of silicon dioxide insulation layer by at diameter being Φ=2inch, the deposition one deck Ti of mode elder generation with evaporation deposits layer of Au more respectively on insulation layer, spin coating (photoetching) glue just then, successively through preceding baking, photoetching, development and back baking post bake operation, carry out the corrosion of Au, Ti again, finish the making of microelectrode and array.
CNA2008100364411A 2008-04-22 2008-04-22 Multifunctional dielectrophoresis operated micro-electrode on-chip system and its manufacture method Pending CN101307481A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110031519A (en) * 2019-04-28 2019-07-19 河海大学常州校区 A kind of graphene deposition aggregation parallel device, operating method and its application based on dielectrophoresis principle

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110031519A (en) * 2019-04-28 2019-07-19 河海大学常州校区 A kind of graphene deposition aggregation parallel device, operating method and its application based on dielectrophoresis principle

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