CN101289189B - Earth silicon vesicle material with controllable shape, dimension and thickness of wall and method for preparing same - Google Patents
Earth silicon vesicle material with controllable shape, dimension and thickness of wall and method for preparing same Download PDFInfo
- Publication number
- CN101289189B CN101289189B CN2008100355925A CN200810035592A CN101289189B CN 101289189 B CN101289189 B CN 101289189B CN 2008100355925 A CN2008100355925 A CN 2008100355925A CN 200810035592 A CN200810035592 A CN 200810035592A CN 101289189 B CN101289189 B CN 101289189B
- Authority
- CN
- China
- Prior art keywords
- vesicle
- wall thickness
- silicon
- controllable
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Silicon Compounds (AREA)
Abstract
The invention pertains to the technical field of porous material, in particular to a dioxide vesicle material with a controllable shape, a controllable size and a controllable wall thickness and a preparation method thereof. The invention adopts a sol-gel method to synthetize novel silicon dioxide vesicle material with the controllable shape, an adjustable aperture and an alterable wall thickness in a near-neutral aqueous solution system. The preparation method comprises the steps such as collaborative self-assembly, hydrothermal treatment, drying, roasting to remove a template agent, etc. of the sol-gel process of vesicle with various patterns. The reaction conditions of the invention are mild, the operation is simple and easy and the material structure is rich and controllable. The shape, the size, the wall thickness, etc. of the material can be effectively adjusted and controlled by changing the conditions of the ratio of silicon sources and a surface active agent and the mol ratio of different silicon sources and by adjusting the mass ratio of composing different polymers, etc. The vesicle material has wide applicable prospect in the fields of adsorption, catalyst carriers, slow release of drug, separation, chromatogram, paints, micro reactors, etc.
Description
Technical field
The invention belongs to the porous material technical field, be specifically related to shape, size, controlled silicon oxide vesicle material and the synthetic method thereof of wall thickness.
Background technology
The vesica material is in catalysis, chromatogram, and microreactor, pigment, the weighting agent of dielectric materials separates, and aspects such as medicament slow release have broad application prospects, thereby are subjected to investigator's extensive concern.Consider its chemical constitution, the vesica material can be divided into organic and inorganic two big classes substantially.Utilize ionogenic surfactant can prepare the vesica material, in addition, Eisenberg[Kui Yu, Adi Eisenberg
*, Macromolecules, 1996,29,6359-6361; Tony, Azzam.; AdiEisenberg
*, Angewandte Chemie-International Edition 2006,45, (44), 7443-7447] and co-workers use segmented copolymer, by changing the composition of segmented copolymer, the concentration of segmented copolymer, the composition of solvent, additive (salt, acid, alkali, homopolymer), the temperature of synthetic system, methods such as pH value of solution value can obtain the macromolecular vesicles of various patterns.Organic relatively vesica, the physical strength of inorganic vesica material is good, the thermostability height, does not rely on characteristics such as organic solvent, thereby application prospect is more extensive.Analyze from its structure, an outstanding feature of vesica material is exactly to have very big pore volume.Pinnavaia[S.S.Kim; T.J.Pinnavaia, Science 1998,282,1302-1305] and the co-worker utilizes a class, and special tensio-active agent prepares the vesica of diameter for 20-1400nm, but its wall is worm meso-porous structure, and pore volume is not high, and will add organic solvent in the preparation process.Stucky[Patrick Schmidt-Winkel, Galen D.Stucky
*Et a1.Chem.Mater.2000,12,686-696] and the co-worker utilizes segmented copolymer to add a certain amount of organic expander, and (Three methyl Benzene TMB), can prepare Jie who has than large pore volume and see foam (MCF) material, what this process was followed is the mechanism of microemulsion template, can not obtain comparatively dispersive vesica material, and TMB is volatile, toxicity is bigger, unfriendly to environment.Chemistry Chen Yongming [the Jianzhong Du and Yongming Chen of institute of China Chinese Academy of Sciences, Macromolecules 2004,37,5710-5716] etc. utilize special synthetic one class amphiphilic block polymer in selective solvent, can form the polymers vesica, can prepare stable organic-inorganic hybridized vesica by colloidal sol-gelation process.Because this raw material (making silicon source and template simultaneously) costliness may be unfavorable for preparing in a large number the vesica material.Recently, our seminar [Hongning, Wang, Chengzhong, Yu
*, et a1.Adv.Funct.Mater.2007,17,613-617]. utilize commercialization block macromolecular P123 (PEO
20-PPO
70-PEO
20, wherein PEO is a polyethylene oxide, PPO is a poly(propylene oxide)) be template, under the condition that does not add organic cosolvent, directly prepare high yield, the inorganic unilamellar vesicle of high pore volume, foam materials.But up to now, also do not utilize a kind of method that shape, size and the wall thickness of the inorganic vesica material of silicon-dioxide are realized effectively synthetic control.And effectively being controlled to be on the silicon oxide vesicle material structure parameter realizes that it is providing bigger possibility and selectivity aspect above-mentioned potential using value of mentioning.
Summary of the invention
The purpose of this invention is to provide controlled silicon oxide vesicle material of a kind of shape, size, wall thickness and simple and easy to do preparation method thereof.
The present invention adopts tensio-active agent P65 (EO
20PO
30EO
20) (EO oxyethylene; The PO propylene oxide), B50-6600 (EO
39BO
47EO
39) (BO is the epoxy butylene) etc. as the common mode plate, tetraethoxy [Si (OC
2H
5)
4] and methyl silicate [Si (OCH
3)
4] as mixing the silicon source, under room temperature, preparing the abundant silicon oxide vesicle material of structure at nearly neutral aqueous phase, pattern (hollow ball-shape, hollow tubular etc.) is controlled, and aperture size is at 25-100nm, and wall thickness is adjustable in the 5-25nm scope.
The present invention proposes has the used tensio-active agent of the silicon oxide vesicle material that enriches pattern and the mol ratio in silicon source is 0.01: 1～1.6, the mol ratio in the massfraction of two kinds of tensio-active agents and two kinds of silicon sources is regulated variation at 0%-100%, make the pattern (hollow ball-shape of final material, hollow tubular etc.) controlled, aperture size is at 25-100nm, and pore wall thickness is adjustable in the 5-25nm scope.
Silicon oxide vesicle preparation methods of the present invention is as follows:
(1) preparation mother liquor
Two kinds of different surfactant dissolves are gone into buffered soln, under agitation add tetraethoxy and methyl silicate, stir, leave standstill or continued to stir 24-48 hour, obtain reaction mother liquor as the silicon source, in, the mol ratio of each component is:
Tensio-active agent: silicon source=0.01: 1～1.6, buffered soln: silicon source=100: 1～1.6;
The mass ratio of two kinds of different surfaces promoting agents is 0-100%, and the mol ratio in two kinds of silicon sources is 0-100%, and these two ratios are not all 0, promptly can regulate pattern, aperture and the wall thickness of material by the variation of a ratio at least.
The temperature of reaction of system is 20-30 ℃;
(2) hydrothermal treatment consists, the mother liquor that step (1) is made under 80-120 ℃ of temperature hydro-thermal 24-36 hour;
(3) drying, with the product suction filtration after step (2) hydro-thermal, washing, the flush away inorganic salt, dry under the room temperature;
(4) removal of organic formwork agent at 500-900 ℃ of following roasting 5-9 hour, is removed template with dried product, makes required silicon oxide vesicle material.
Described two kinds of tensio-active agents are, to gather oxyethylene as hydrophilic block, respectively with the poly-rare block macromolecular tensio-active agent as hydrophobic block of the epoxy third rare and poly-epoxy fourth, its molecular formula is EOnPOmEOn, n=5-120, m=20-90, EOnBOmEOn, n=9-200, m=30-100.
Described buffered soln is that the pH value is at the NaAc-HAc of 4-6 buffered soln.
The silicon oxide vesicle material of described various structures is the mass ratioes by the polymkeric substance of regulating different hydrophilic, or changes the mol ratio that has different lengths alkoxyl silicone source, perhaps regulates two ratios, realizes the regulation and control of its shape, size, wall thickness.
The present invention compared with prior art has following advantage:
(1) raw material is cheap and easy to get, and the reaction conditions gentleness is easy to operation.
(2) by mass ratio that changes the different polymkeric substance of forming or the silicon source mol ratio that has the alkoxyl group of different lengths by change, realization has the Adjustable structure of the silicon oxide vesicle material of different shapes (hollow ball-shape, hollow tubular), size (25-100nm), wall thickness (5-25nm) at ambient temperature.
(3) gained silicon oxide vesicle structure is abundant, illustrates as accompanying drawing.The present invention provides wider basic substance for such vesica shape inorganic silicon dioxide material potential application in fields such as absorption, support of the catalyst, medicament slow release, separation, chromatogram, pigment, microreactors, also for realizing that above-mentioned application provides bigger possibility and selectivity.
Description of drawings
Fig. 1 is the transmission electron microscope picture of various dioxy pattern silicon oxide vesicle materials.Wherein:
(a), diameter～25nm, the spherical silicon dioxide vesica of wall thickness～5nm.
(b), diameter～50-70nm, the spherical silicon dioxide vesica of wall thickness～7nm.
(c), diameter～60-90nm, the spherical silicon dioxide vesica of wall thickness～25nm.
(d), diameter～25nm, the tubulose silicon oxide vesicle of wall thickness～5nm.
(e), diameter～50nm, the spherical and tubulose silicon oxide vesicle of wall thickness～13nm.
(f), diameter～35nm, the tubulose silicon oxide vesicle of wall thickness～5nm.
Embodiment
Embodiment 1
0.2g B50-6600 and 0.3g P65 mixed surfactant are added 30g pH=4.7NaAC-HAc[c (HAc)=c (NaAc)=0.4M] in the buffered soln, stirring under 25 ℃ of temperature dissolves tensio-active agent fully, in system, add 0.008mol TEOS and 0.002molTMOS mixing silicon source, continue to stir 40 minutes, left standstill 24 hours, in 100 ℃ of hydro-thermals 24 hours, suction filtration, washing, drying was 550 ℃ of roastings 5 hours.Obtain Fig. 1 (a) shape vesica material.
Embodiment 2
0.5g B50-6600 is added 30g pH=4.7NaAC-HAc[c (HAc)=c (NaAc)=0.4M] in the buffered soln, stirring under 25 ℃ of temperature dissolves tensio-active agent fully, in system, add 2.08g TEOS, continue to stir 20 minutes, left standstill 24 hours, in 100 ℃ of hydro-thermals 24 hours, suction filtration, washing, drying was 550 ℃ of roastings 5 hours.Obtain Fig. 1 (b) shape vesica material.
Embodiment 3
0.5g B50-6600 mixed surfactant is added 30g pH=4.7NaAC-HAc[c (HAc)=c (NaAc)=0.4M] in the buffered soln, stirring under 25 ℃ of temperature dissolves tensio-active agent fully, in system, add 0.01molTEOS and 0.004molTMOS mixing silicon source, continue to stir 40 minutes, left standstill 24 hours, in 100 ℃ of hydro-thermals 24 hours, suction filtration, washing, drying was 550 ℃ of roastings 5 hours.Obtain Fig. 1 (c) shape vesica material.
Embodiment 4
0.3g B50-6600 and 0.2g P65 mixed surfactant are added 30g pH=4.7NaAC-HAc[c (HAc)=c (NaAc)=0.4M] in the buffered soln, stirring under 25 ℃ of temperature dissolves tensio-active agent fully, in system, add 0.01molTEOS silicon source, continue to stir 20 minutes, left standstill 24 hours, in 100 ℃ of hydro-thermals 24 hours, suction filtration, washing, drying was 550 ℃ of roastings 5 hours.Obtain Fig. 1 (d) shape vesica material.
Embodiment 5
0.4g B50-6600 and 0.1g P65 mixed surfactant are added 30g pH=4.7NaAC-HAc[c (HAc)=c (NaAc)=0.4M] in the buffered soln, stirring under 25 ℃ of temperature dissolves tensio-active agent fully, in system, add 0.06molTEOS and 0.004molTMOS mixing silicon source, continue to stir 40 minutes, left standstill 24 hours, in 100 ℃ of hydro-thermals 24 hours, suction filtration, washing, drying was 550 ℃ of roastings 5 hours.Obtain the vesica material of Fig. 1 (e) shape.
Embodiment 6
The 0.5gB50-6600 tensio-active agent is added 30g pH=4.7NaAC-HAc[c (HAc)=c (NaAc)=0.4M] in the buffered soln, stirring under 25 ℃ of temperature dissolves tensio-active agent fully, in system, add 0.03molTEOS and 0.007molTMOS mixing silicon source, continue to stir 40 minutes, left standstill 24 hours, in 100 ℃ of hydro-thermals 24 hours, suction filtration, washing, drying was 550 ℃ of roastings 5 hours.Obtain the vesica material of Fig. 1 (f) shape.
Claims (1)
1. silicon oxide vesicle preparation methods is characterized in that concrete steps are as follows:
(1) preparation of silicon oxide vesicle material
Two kinds of different surfactant dissolves are gone into buffered soln, under agitation add tetraethoxy and methyl silicate as the silicon source, continuously stirring 20-40 minute, leave standstill or continued to stir 24-48 hour, obtain reaction mother liquor, wherein the mol ratio of each component is:
Tensio-active agent: silicon source=0.01: 1～1.6, buffered soln: silicon source=100: 1～1.6,
The mass ratio of two kinds of different surfaces promoting agents is 0-100%, and the mol ratio in two kinds of silicon sources is 0-100%, and these two ratios are not 0 simultaneously;
The temperature of reaction of system is 20-30 ℃;
(2) hydrothermal treatment consists, the mother liquor that step (1) is made under 80-120 ℃ of temperature hydro-thermal 24-36 hour;
(3) drying, with the product suction filtration after step (2) hydro-thermal, washing, the flush away inorganic salt, dry under the room temperature;
(4) removal of organic formwork agent at 500-900 ℃ of following roasting 5-9 hour, is removed template with dried product, promptly makes required silicon oxide vesicle material; This silicon oxide vesicle material pattern is hollow ball-shape or hollow tubular, and aperture size is at 25-100nm, and pore wall thickness is in the 5-25nm scope;
In the step (1), be in the NaAc-HAc buffered soln of 4-6, by regulating the mass ratio of two kinds of tensio-active agents, or have the mol ratio in different lengths alkoxyl silicone source, realize the regulation and control of its shape, aperture size, wall thickness by adjusting in the pH value;
Described two kinds of tensio-active agents are for gathering oxyethylene as hydrophilic block, and poly-propylene oxide or poly-epoxy butylene are as the block macromolecular tensio-active agent of hydrophobic block, and its molecular formula is EOnPOmEOn, n=5-120, m=20-90; EOnBOmEOn, n=9-200, m=30-100.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100355925A CN101289189B (en) | 2008-04-03 | 2008-04-03 | Earth silicon vesicle material with controllable shape, dimension and thickness of wall and method for preparing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100355925A CN101289189B (en) | 2008-04-03 | 2008-04-03 | Earth silicon vesicle material with controllable shape, dimension and thickness of wall and method for preparing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101289189A CN101289189A (en) | 2008-10-22 |
| CN101289189B true CN101289189B (en) | 2010-12-29 |
Family
ID=40033671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100355925A Expired - Fee Related CN101289189B (en) | 2008-04-03 | 2008-04-03 | Earth silicon vesicle material with controllable shape, dimension and thickness of wall and method for preparing same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101289189B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102826557A (en) * | 2012-09-25 | 2012-12-19 | 复旦大学 | Method for preparing silicon oxide nanotube and two-dimensional ordered assembly body thereof |
| US11033507B2 (en) | 2013-12-19 | 2021-06-15 | The University Of Queensland | Method of synthesis of silica vesicles and use thereof |
| CN109010250A (en) * | 2017-06-12 | 2018-12-18 | 天津城建大学 | Galapectite-silicon dioxide composite aerogel material and preparation method thereof |
| CN107311185B (en) * | 2017-06-23 | 2020-12-22 | 复旦大学 | Preparation method of ultrahigh-porosity porous silicon dioxide |
| CN107352544A (en) * | 2017-08-11 | 2017-11-17 | 贵州大学 | A kind of synthetic method for lithium-ion electric pool size controllable silicon nanotube |
| CN110272052B (en) * | 2018-03-14 | 2022-10-04 | 天津工业大学 | Novel preparation method of nano silicon dioxide microcapsule |
| CN109575589A (en) * | 2018-11-29 | 2019-04-05 | 歌尔股份有限公司 | A kind of silicon oxide vesicle reinforced resin based composites and preparation method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5876690A (en) * | 1997-02-11 | 1999-03-02 | National Science Council | Mesoporous aluminosilicate molecular sieves having "tubules-within-a-tubule" hierarchical order morphology and the preparation thereof |
| CN1730392A (en) * | 2005-06-16 | 2006-02-08 | 复旦大学 | Large aperture capacity silicon oxide vesicle, foamed material and process for preparing the same |
-
2008
- 2008-04-03 CN CN2008100355925A patent/CN101289189B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5876690A (en) * | 1997-02-11 | 1999-03-02 | National Science Council | Mesoporous aluminosilicate molecular sieves having "tubules-within-a-tubule" hierarchical order morphology and the preparation thereof |
| CN1730392A (en) * | 2005-06-16 | 2006-02-08 | 复旦大学 | Large aperture capacity silicon oxide vesicle, foamed material and process for preparing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101289189A (en) | 2008-10-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101289189B (en) | Earth silicon vesicle material with controllable shape, dimension and thickness of wall and method for preparing same | |
| CN1312038C (en) | Large aperture capacity silicon oxide vesicle, foamed material and process for preparing the same | |
| CN103738969B (en) | Mesoporous silica and preparation method thereof | |
| CN102643513B (en) | Preparation method of meta-aminophenol-formaldehyde resin spheres and preparation method of carbon spheres | |
| CN101541674A (en) | Manufacturing methods of mesoporous carbon structure with spray drying or spray pyrolysis and composition thereof | |
| CN101343065A (en) | Nano-silicon dioxide hollow sphere material and method of preparing the same | |
| CN101723393A (en) | Method for preparing silicon-aluminum oxide material with mesopore/macropore combined porous structure | |
| CN102718225A (en) | Preparation method of ordered mesoporous silica microspheres with hollow structures | |
| CN102099512A (en) | Hollow fiber, dope solution composition for forming a hollow fiber, and method for manufacturing a hollow fiber using the same | |
| CN105031664A (en) | Triple-hybrid yolk-shell structured mesoporous organic silica and preparation method thereof | |
| CN106517227B (en) | A kind of method that microwave method quickly prepares the SBA-15 of corynebacterium | |
| CN106587077A (en) | Three-dimensional ordered macroporous-mesoporous oxide material and preparation method thereof | |
| CN105110343A (en) | Method for rapid preparation of monodisperse ordered mesoporous silicon oxide hollow sphere | |
| CN101348254B (en) | Preparation of hollow nanosilica white sphere | |
| CN102674379A (en) | Hollow mesoporous silicon dioxide nano particles and method for preparing same | |
| CN107010641A (en) | A kind of zeolite molecular sieves of three-level hole shell core ZSM 5 and preparation method thereof | |
| CN104386699A (en) | Method for preparing multi-shell mesoporous silicon oxide nanomaterial by dual-template method | |
| CN101837983B (en) | Method for synthesizing macroporous netlike spherical silicon dioxide material having mesoscopic structure | |
| CN104746178A (en) | Preparation method of silicate double-layer hollow nanometer fiber with multistage structure | |
| CN109012609A (en) | A kind of lignin nanosphere environment-friendly preparation method thereof | |
| CN105776180B (en) | A kind of preparation method of nanometer porous carbosphere | |
| CN104892851A (en) | Preparation method of hollow polymer microspheres | |
| CN101130644A (en) | Orderly self-assembled and formed composite material containing energy of organic molecule and method of producing the same | |
| CN103495350B (en) | Hollow hydrophobic fiber membrane and preparation method thereof | |
| CN104591936B (en) | Composite material containing energy based on three-dimensional ordered macroporous carbon skeleton and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101229 Termination date: 20130403 |