CN101206396A - Pattern forming method for photosensitive resin composition, color filter and method for making the same - Google Patents
Pattern forming method for photosensitive resin composition, color filter and method for making the same Download PDFInfo
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- CN101206396A CN101206396A CNA2007101996471A CN200710199647A CN101206396A CN 101206396 A CN101206396 A CN 101206396A CN A2007101996471 A CNA2007101996471 A CN A2007101996471A CN 200710199647 A CN200710199647 A CN 200710199647A CN 101206396 A CN101206396 A CN 101206396A
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Abstract
The invention provides a method for forming a pattern of a light-sensitive resin compound, which can shorten the time necessary for forming the pattern of the light-sensitive resin compound, a method for producing a filter sheet using the above method, and a filter sheet obtained with the production method and a display device having the filter sheet. The invention at least comprises the procedures as follow: the vacuum dying procedure of coating the light-sensitive resin compound on a vacuum medium-dry substrate so as to obtain a light-sensitive resin compound layer; and the exposure procedure of exposing the light-sensitive resin compound layer. The invention relates to a method for serially and continuously forming a pattern of a light-sensitive resin compound with the vacuum dying procedure and the exposure procedure, a method for producing the filter sheet which at least uses the above method once, a filter sheet obtained with the production method and a display device having the filter sheet.
Description
Technical field
The present invention relates to a kind of pattern formation method of photosensitive polymer combination, the method for making that comprises the color filter of this pattern formation method, the preferred color filter that uses in the liquid crystal indicator of big picture such as notebook personal computer, TV monitor etc. that utilizes that this method for making obtains and the display device of using this color filter.
Background technology
Color filter be LCD (below be also referred to as " liquid crystal indicator ".) in indispensable constituent part.As the method for making this color filter, the pigment dispersing method that extensively comprises following operation is (for example with reference to patent documentation 1.)。
(1) operation (working procedure of coating) of coating photosensitive polymer combination on substrate
(2) operation of dry sensation photosensitive resin composition (vacuum drying operation) in a vacuum
(3) operation of heat drying photosensitive polymer combination (heat drying operation)
(4) photosensitive polymer combination is exposed into the operation (exposure process) of the pattern of regulation
(5) utilize development to remove the operation (developing procedure) of the unexposed portion of photosensitive polymer combination
Patent documentation 1: the spy opens the 2006-276818 communique
Requirement at the low price of color filter is very strong, is carried out by changing the research that above-mentioned operation shortens the needed time of each operation (in case of necessity) thereby reduce manufacturing cost.
Summary of the invention
Therefore, the object of the present invention is to provide a kind of pattern that can shorten photosensitive polymer combination form the photosensitive polymer combination of needed time pattern formation method, use the color filter of this method method for making, utilize color filter that this method for making obtains and display device with this color filter.
The inventor concentrates on studies, and found that by the heat drying that deducts the photosensitive polymer combination layer increases residual solvent amount in the photosensitive polymer combination layer, can improve developing powder, shorten the cost and the developing procedure of heat drying.In addition, if only deduct heat drying, then development can become too fast, and pattern strips off or bad situation such as breach may worsen, but can be by adjusting that the vacuum drying activity time prevents that pattern from stripping off or breach etc.
That is the present invention,
＜1〉a kind of pattern formation method of photosensitive polymer combination, wherein,
At least comprise: thus the photosensitive polymer combination that applies on the dry substrate in a vacuum obtains the vacuum drying operation of photosensitive polymer combination layer; With the exposure process that described photosensitive polymer combination layer is exposed, described vacuum drying operation and described exposure process carry out successively continuously.
＜2〉the pattern formation method of basis＜1〉described photosensitive polymer combination, wherein,
Be 30 seconds～150 seconds the drying time in the described vacuum drying operation.
＜3〉the pattern formation method of basis＜1〉described photosensitive polymer combination, wherein,
Be 35 seconds～120 seconds the drying time in the described vacuum drying operation.
＜4〉the pattern formation method of basis＜1〉described photosensitive polymer combination, wherein,
Be 40 seconds～90 seconds the drying time in the described vacuum drying operation.
＜5〉according to＜1〉or＜2〉described photosensitive polymer combination pattern formation method, wherein,
Vacuum tightness in the described vacuum drying operation is 0.00001 atmospheric pressure～0.1 atmospheric pressure.
＜6〉according to＜1〉or＜2〉described photosensitive polymer combination pattern formation method, wherein,
Vacuum tightness in the described vacuum drying operation is 0.00005 atmospheric pressure～0.05 atmospheric pressure.
＜7〉according to＜1〉or＜2〉described photosensitive polymer combination pattern formation method, wherein,
Vacuum tightness in the described vacuum drying operation is 0.0001 atmospheric pressure～0.01 atmospheric pressure.
＜8〉a kind of method for making of color filter, wherein,
Carry out once at least＜1 or＜2〉described photosensitive polymer combination pattern formation method.
＜9〉a kind of color filter, wherein,
Utilize＜8〉described color filter method for making making.
＜10〉a kind of display device, wherein,
Have＜9〉described color filter.
Utilize the present invention, pattern formation method, the method for making of using the color filter of this method that a kind of pattern that can shorten photosensitive polymer combination forms the photosensitive polymer combination of needed time can be provided, utilize color filter that this method for making obtains and display device with this color filter.
Embodiment
Below the pattern formation method of photosensitive polymer combination of the present invention, color filter and preparation method thereof and display device are specifically described.
The pattern formation method of＜photosensitive polymer combination 〉
The pattern formation method of photosensitive polymer combination of the present invention is to comprise at least: thus the dry in a vacuum photosensitive polymer combination that applies on substrate obtains the vacuum drying operation of photosensitive polymer combination layer; With the exposure process that described photosensitive polymer combination layer is exposed, the method that described vacuum drying operation and described exposure process carry out successively continuously.
The pattern formation method of photosensitive polymer combination of the present invention is the method for carrying out vacuum drying operation and exposure process successively continuously, is not included in the heat drying operation of in the past carrying out between vacuum drying operation and the exposure process.The pattern formation method of photosensitive polymer combination of the present invention is because unessential heat drying operation forms the needed time so can shorten the pattern of photosensitive polymer combination.And then, because the heat drying machine that must in the heat drying operation, not use, so can reduce the cost of the manufacturing line of the pattern formation of carrying out photosensitive polymer combination.
In the vacuum drying operation in the present invention, be preferably 30 seconds drying time～150 seconds, more preferably 35 seconds～120 seconds, be preferably 40 seconds especially～90 seconds.If drying time, the photosensitive polymer combination that has then formed pattern was difficult to take place defectives such as breach more than 30 seconds.If below 150 seconds, then can obtain the effect that operation shortens drying time.
Vacuum tightness in the vacuum drying operation among the present invention is preferably 0.00001 atmospheric pressure～0.1 atmospheric pressure, and more preferably 0.00005 atmospheric pressure～0.05 atmospheric pressure is preferably 0.0001 atmospheric pressure～0.01 atmospheric pressure especially.If faults such as foaming or underdry in the atmospheric scope in 0.00001 atmospheric pressure～0.1, then can not take place in vacuum tightness.
Vacuum drying for example can use VCD (Minton dryer: chemical industry (strain) system is answered in Tokyo) to carry out.
The pattern formation method of photosensitive polymer combination of the present invention also can comprise other operations such as working procedure of coating or developing procedure as required except vacuum drying operation and exposure process.As the example of this operation, can enumerate the middle method of putting down in writing in paragraph numbering [0023], [0035]～[0051] that the spy opens the 2006-23696 communique.
Pattern formation method at photosensitive polymer combination of the present invention is applicable under the situation of making color filter, substrate as the photosensitive polymer combination coating, for example transparency carrier can be used, various glass plate such as the soda-lime glass plate that has the monox tunicle on the surface, low-expansion glass, non-alkali glass, silex glass plate or plastic sheeting etc. can also be enumerated.
In addition, aforesaid substrate can also adhere to photosensitive polymer combination well by implementing coupling to handle in advance.Handle as this coupling, can preferably use the spy to open the method for putting down in writing in the 2000-39033 communique.In addition, the thickness of substrate is not particularly limited, is preferably 700～1200 μ m usually, preferred especially 500～1100 μ m.
Photosensitive polymer combination layer among the present invention can be by coating photosensitive polymer combination on substrate and dry in a vacuum formation.Composition to photosensitive polymer combination is not particularly limited, and the kind that needs only the structure that forms according to the pattern formation method of utilizing photosensitive polymer combination of the present invention is suitably selected.This structure can use and the special light sensitive black resin bed of 2005-3861 communique or layer identical photosensitive polymer combination that the special coloured composition of opening the 2004-240039 communique constitutes opened under the situation for the light shielding parts such as black matrix that use in the color filter for example.In addition, this works is under the situation of colored pixels such as RGB, can use and specially opens the identical photosensitive polymer combination of layer that 2006-23696 communique or the special photosensitive composition of opening the 2006-276818 communique constitute.
＜color filter and preparation method thereof 〉
The method for making of color filter of the present invention is the method for pattern formation method of carrying out the photosensitive polymer combination of 1 the invention described above at least.Like this, can form light shielding parts such as black matrix (below be also referred to as the K pixel), red (R), green (G) and blue colored pixels such as (B) and photosensitive gap material etc., but be not limited to these.
Color filter of the present invention can utilize the method for making manufacturing of color filter of the present invention.Color filter of the present invention is the color filter that has the works that is made of a kind of resin combination at least.This works is meant that colored pixels such as black matrix, RGB, seal coat, resin gap material, liquid crystal aligning are with timber etc.Color filter of the present invention can utilize the pattern formation method of photosensitive polymer combination of the present invention to form this works at least one (that is, carrying out the pattern formation method of 1 the present invention's photosensitive polymer combination at least).
＜display device 〉
, be not particularly limited so long as possess the device of the color filter of having stated of the present invention and get final product as display device of the present invention, for example can enumerate display device such as liquid crystal indicator, plasma display display device, EL display device, CRT display device etc.The definition of display device or the explanation of each display device for example are described in " electronic console equipment (the wooden clear husband's work of assistant assistant; (strain) census of manufacturing can be issued nineteen ninety) ", " display apparatus (she blows along the chapter work, and industry books (strain) are put down into distribution in the first year) " etc.
Display device of the present invention is preferably liquid crystal indicator especially.For liquid crystal indicator, for example be described in " LCD Technology of future generation (Uchida Tatsuo compiles, and (strain) census of manufacturing can be issued in 1994) ".The liquid crystal indicator that can be suitable for the present invention is not particularly limited, and for example goes for the liquid crystal indicator of the variety of way of record in described " LCD Technology of future generation ".The present invention's liquid crystal indicator of colored especially relatively TFT mode in these is effective.Liquid crystal indicator for colored TFT mode for example is described in " colored TFT LCD (upright publication (strain) distribution in 1996 altogether) ".And then the present invention can certainly be applicable to the extended liquid crystal indicators in visual angle such as pixel partitioning scheme such as transverse electric field type of drive, MVA such as IPS.For these modes, for example be described in " the up-to-date trend in EL, PDP, LCD display technology and market (the calendar year 2001 distribution of eastern sharp research centre (East レ リ サ one チ セ Application one) investigation department) " 43 pages.
Liquid crystal indicator is made of various members such as electrode base board, polarized light film, phase-contrast film, backlight, gap material, viewing angle compensation films except color filter.For these members, for example be recorded in the market (island Itou Kentaro (strain) シ one エ system シ one (CMC) distribution in 1994) of " ' 94 LCD peripheral material chemicalss (chemicals) ", " present situation of 2003 liquid crystal relevant markets is always ground distribution in 2003 with prospect in future (last volume) (good lucky (strain) Ji Meile of Fuji (キ メ ラ) of table)) ".
Display device of the present invention can adopt ECB (electronic birefringence) (ElectricallyControlled Birefringence), TN (twisted-nematic) (Twisted Nematic), IPS (face internal conversion) (In-Plane Switching), FLC (ferroelectric liquid crystals) (Ferroelectric LiquidCrystal), OCB (optical compensation curved) (Optically Compensatory Bend), STN (supertwist is to row) (Supper Twisted Nematic), VA (homeotropic alignment) (VerticallyAligned), HAN (mix and arrange) (Hybrid Aligned Nematic) to row, the various display modes of GH (host and guest) (Guest Host) and so on.Display device of the present invention is characterised in that uses aforesaid color filter, like this, do not show inequality when being used to be equipped on televisor, monitor, can have wide color reproduction zone and high-contrast ratio, can also be preferred for big picture display device such as personal display of notebook or TV monitor etc.
[embodiment]
Below enumerating embodiment is described more specifically the present invention.The present invention is not limited by these embodiment.In addition, in following embodiment, so long as not concluding especially, " part ", " % " reach " molecular weight " expression " mass parts ", " quality % " reaches " weight-average molecular weight ".
[embodiment 1]
The formation of-black (K) pixel-
(1) substrate matting
After UV cleaning device cleaning alkali-free glass substrate, use clean-out system to scrub, and then carry out ultrasonic cleaning with ultrapure water.120 ℃ of following thermal treatment substrates 3 minutes make the surface state stabilization.
(2) working procedure of coating
Cool off this substrate, temperature transfers to after 23 ℃, with the coating machine (coater) (flat field machine worker (strain) system) of the glass substrate with slot-shaped nozzle, applies the photosensitive composition K1 of the composition shown in the following table 1.
(3) vacuum drying operation
Then, with VCD (Minton dryer, Tokyo are answered chemical industry (strain) system), dry solvent 40 seconds (0.001 atmospheric pressure) disappears the flowability of overlay, obtains the photosensitive polymer combination layer K1 of thickness 1.7 μ m.
(4) exposure process
With the close induction type exposure machine with ultrahigh pressure mercury lamp (Hitachi's high-tech electronic engineering (strain) system), with substrate and the vertical state that erects of mask (quartzy exposed mask) with picture pattern, the distance of setting between exposed mask face and this photosensitive polymer combination layer K1 is 200 μ m, with exposure 300mJ/cm
2Carry out pattern exposure.
(5) developing procedure
Then, with the spray spout pure water of spraying, make the uniform surface ground of this photosensitive polymer combination layer K1 moistening after, with 23 ℃, 40 seconds, flat burner pressure 0.04MPa, to KOH is that developer solution (contains KOH, non-ionic surfactant, trade name: CDK-1, Fujiphoto electronics synthesis material (Off イ Le system エ レ Network ト ロ ニ Network ス マ テ リ ア Le ズ) (strain) system) spray development, obtain the patterning image.Then, use the UHV (ultra-high voltage) washer jet, under the pressure of 9.8MPa, spray ultrapure water, remove residue, and then spray ultrapure water from the two sides, remove the developer solution or the described photosensitive polymer combination layer dissolved matter of attachment removal, with the air knife liquid that breaks with spray spout.
(6) heat treatment step
Then, with 220 ℃ of thermal treatments 30 minutes, obtain having black (K) image of thickness 1.5 μ m, optical concentration 3.4.
[preparation of photosensitive composition K1]
Photosensitive composition K1 can obtain by as described below, that is: at first by measuring the K pigment dispersing thing 1 of the amount of record in the table 1, propylene glycol monomethyl ether acetic acid esters, mix down in 24 ℃ of temperature (± 2 ℃), stirred 10 minutes with 150rpm, simultaneously, measure the methyl ethyl ketone of the amount of record in the table 1, bonding agent 1, the quinhydrones monomethyl ether, DPHA liquid, 2, two (the trichloromethyl)-6-[4 ' of 4--(N, the two ethoxy carbonyl methyl of N-) amino-3 '-bromophenyl]-the s-triazine, surfactant 1, under 25 ℃ of temperature (± 2 ℃), add successively, under 40 ℃ of temperature (± 2 ℃), stirred 30 minutes with 150rpm.Wherein, the amount shown in the table 1 is a mass parts, is specially following composition.
＜K pigment dispersing thing 1 〉
Carbon black (Dixon (デ グ Star サ) corporate system Nipex35) 13.1%
Spreading agent (following compound (1)) 0.65%
Polymkeric substance (random copolymers of methacrylic acid benzyl ester/methacrylic acid=72/28 mol ratio, molecular weight 3.7 ten thousand) 6.72%
Propylene glycol monomethyl ether acetic acid esters 79.53%
[changing 1]
＜bonding agent 1 〉
Polymkeric substance (random copolymers of methacrylic acid benzyl ester/methacrylic acid=78/22 mol ratio, molecular weight 3.8 ten thousand) 27%
Propylene glycol monomethyl ether acetic acid esters 73%
＜DPHA liquid 〉
Dipentaerythritol six acrylic acid
(contain anti-polymerizer MEHQ 500ppm, Japanese chemical drug (strain) system, trade name: KAYARAD DPHA) 76%
Propylene glycol monomethyl ether acetic acid esters 24%
＜surfactant 1 〉
Following works 130%
Methyl ethyl ketone 70%
[changing 2]
Works 1
(n＝6，x＝55，y＝5，Mw＝33940，Mw/Mn＝2.55
PO: epoxypropane, EO: oxirane)
[table 1]
| Photosensitive composition | K1 |
| K pigment dispersing thing 1 (carbon black) | 25 |
| Propylene glycol monomethyl ether acetic acid esters | 8.0 |
| Methyl ethyl ketone | 53 |
| Bonding agent 1 | 9.1 |
| DPHA liquid | 4.2 |
| 2, two (the trichloromethyl)-6-[4 ' of 4--(N, the two ethoxy carbonyl methyl of N-) amino-3 '-bromophenyl]-the s-triazine | 0.16 |
| The quinhydrones monomethyl ether | 0.002 |
| Surfactant 1 | 0.044 |
(mass parts)
[embodiment 2]
In embodiment 1, vacuum drying condition and development conditions are altered to the condition of record in the following table 2, in addition, use the method identical to be deceived (K) image with embodiment 1.
[comparative example 1]
In embodiment 1, (3) vacuum drying operation is altered to following method (3 ') development time in (5) developing procedure is altered to 60 seconds, in addition, use the method identical to be deceived (K) image with embodiment 1.
(3 ') followed, with VCD (Minton dryer: chemical industry (strain) system is answered in Tokyo), the part of dry solvent 20 seconds, the flowability of overlay is disappeared, 90 ℃ of following prebake (prebake) (heat drying operation) 150 seconds, obtain the photosensitive polymer combination layer K1 of thickness 1.7 μ m then.
In embodiment 1,2 and comparative example 1, the sum total (T.T.) of drying time and needed time of development time is as shown in table 2.In addition, visual and strip off with the pattern of the observable photosensitive polymer combination layer K1 of optical microscope (50 times), utilize following standard to estimate.Its result concludes and is shown in table 2.
The evaluation criterion that-pattern strips off-
Zero: whole base plate is not observed pattern and is stripped off.
△: can be observed slight pattern in the part of substrate and strip off.
*: observe pattern in the part of substrate and strip off.
[table 2]
| The vacuum drying condition | The heat drying condition | Development time | T.T. | Pattern strips off | ||
| Embodiment 1 | CF1 | 0.001 atmospheric pressure 40 seconds | Do not have | 40 seconds | 80 seconds | ○ |
| Embodiment 2 | CF2 | 0.001 atmospheric pressure 20 seconds | Do not have | 20 seconds | 40 seconds | △ |
| Comparative example 1 | CF3 | 0.001 atmospheric pressure 20 seconds | 90 ℃ following 150 seconds | 60 seconds | 230 seconds | ○ |
In addition, carry out under the condition of comparative example 1 after vacuum drying and the heat drying, development time is less than 60 seconds, the result, and residual residue can not develop.
[embodiment 3]
The making of＜color filter and liquid crystal indicator 〉
The preparation of-photosensitive composition-
Photosensitive composition R1, G1 and B1 that preparation was made of forming shown in the following table 3.
[table 3]
| Photosensitive composition | R1 | G1 | B1 |
| R pigment dispersing thing 1 (C.I.P.R.254) | 44 | - | - |
| R pigment dispersing thing 2 (C.I.P.R.177) | 5.0 | - | - |
| G pigment dispersing thing 1 (C.I.P.G.36) | - | 24 | - |
| Y pigment dispersing thing 1 (C, I.P.Y.150) | - | 13 | |
| B pigment dispersing thing 1 (C.I.P.B.15:6) | - | - | 8.0 |
| B pigment dispersing thing 2 (C.I.P.B.15:6+C.I.P.V.23) | - | - | 14 |
| Propylene glycol monomethyl ether acetic acid esters | 7.6 | 29 | 28 |
| Methyl ethyl ketone | 37 | 26 | 26 |
| Cyclohexanone | - | 1.3 | - |
| Bonding agent-1 | - | 2.5 | - |
| Bonding agent-2 | 0.7 | - | - |
| Bonding agent-3 | - | - | 19 |
| DPHA liquid | 3.8 | 3.5 | 4.2 |
| 2-trichloromethyl-5-(to the styryl styryl)-1,3, the 4-oxadiazole | 0.12 | 0.1 | 0.17 |
| 2, two (the trichloromethyl)-6-[4 ' of 4--(N, the two ethoxy carbonyl methyl of N-) amino-3 '-bromophenyl]-the s-triazine | 0.05 | 0.05 | - |
| Phenothiazine | 0.010 | 0.005 | 0.020 |
| Surfactant 1 | 0.060 | 0.070 | 0.060 |
(mass parts)
The formation of-red (R) pixel-
Black (K) pixel that forms the glass substrate of black (K) image in embodiment 1 forms the face side, use is at the above-mentioned photosensitive composition R1 that obtains, the identical operation of formation of black (K) pixel of the embodiment 1 that carries out and stated forms and has implemented heat treated R pixel.
The formation of-green (G) pixel-
Use is at the above-mentioned photosensitive composition G1 that obtains, black (K) pixel at the glass substrate that forms black (K) pixel and R pixel forms the face side, the same operation of formation of black (K) pixel of the embodiment 1 that carries out and stated forms and has implemented heat treated G pixel.
The formation of-blue (B) pixel-
Use is at the above-mentioned photosensitive composition B1 that obtains, black (K) pixel at the glass substrate that forms black (K) pixel, R pixel and G pixel forms the face side, the same operation of formation of black (K) pixel of the embodiment 1 that carries out and stated forms and has implemented heat treated B pixel.
Carry out as described above, make color filter (hereinafter referred to as colour filtering chip basic board.)。
In addition, the concrete condition of the composition of the photosensitive composition R1 of record is as described below in the described table 3.
*The composition of R pigment dispersing thing 1
C.I. paratonere 254 (the red B-CF of trade name: Irgaphor, the special chemicals of Chiba (チ バ ス ペ シ ヤ Le テ イ ケ ミ カ Le ズ) (strain) system) is 8.0 parts
0.8 part of described compound 1 (spreading agent)
The random copolymers of polymkeric substance (methacrylic acid benzyl ester/methacrylic acid (=72/28[mol ratio]), matter average molecular weight: 30,000) 8 parts
83 parts of propylene glycol monomethyl ether acetic acid esters
*The composition of R pigment dispersing thing 2
C.I. paratonere 177 (the red A2B of trade name: Cromophtal, the special chemicals of Chiba (strain) system) is 18 parts
Polymkeric substance [methacrylic acid benzyl ester/methacrylic acid (=72/28[mol ratio]) random copolymers (matter average molecular weight 37,000)] 12 parts
70 parts of propylene glycol monomethyl ether acetic acid esters
*The composition of bonding agent 2
The random copolymers of polymkeric substance (methacrylic acid benzyl ester/methacrylic acid/methyl methacrylate (=38/25/37[mol ratio]), matter average molecular weight: 40,000) 27 parts
73 parts of propylene glycol monomethyl ether acetic acid esters
*The composition of DPHA liquid, surfactant 1 is same as described above.
In addition, the concrete condition of the composition of the photosensitive composition G1 of record is as described below in the described table 3.
*G pigment dispersing thing 1
Trade name: GT-2 (Fujiphoto electronics synthesis material (Off イ Le system エ レ Network ト ロ ニ Network ス マ テ リ ア Le ズ) (strain) system)
*Y pigment dispersing thing 1
The yellow EX3393 of trade name: CF (driving state's pigment (strain) system)
*The composition of bonding agent 1 is same as described above.
In addition, the concrete condition that each among the photosensitive composition B1 of record formed in the described table 3 is as described below.
*B pigment dispersing thing 1
The blue EX3357 of trade name: CF (driving state's pigment (strain) system)
*B pigment dispersing thing 2
The blue EX3383 of trade name: CF (driving state's pigment (strain) system)
*The composition of bonding agent 3
The random copolymers of polymkeric substance (methacrylic acid benzyl ester/methacrylic acid/methyl methacrylate (=36/22/42[mol ratio]), matter average molecular weight 38,000) 27 part
73 parts of propylene glycol monomethyl ether acetic acid esters
The making of-liquid crystal indicator-
Utilizing on the R pixel of the above-mentioned colour filtering chip basic board that obtains, G pixel and B pixel and black (K) pixel, further utilize sputter to form the transparency electrode of indium tin oxide (ITO:Indium Tin Oxide).Then, the embodiment 1 according to the spy opens the 2006-64921 communique forms the gap material in the part that is equivalent to the top, next door (black matrix) on the ITO film of above-mentioned formation.
In addition, prepare glass substrate again,, the alignment films that polyimide constitutes is set further thereon to implementing the PVA pattern respectively and form on the transparency electrode of colour filtering chip basic board and on the counter substrate with pattern as counter substrate.
Then, be arranged to surround the position of housing of black (K) pixel of the pixel groups of color filter around be equivalent to, utilize decollator (dispenser) mode, the sealant of coating ultraviolet curable resin, the PVA pattern of dripping liquid crystal, itself and counter substrate are fitted after, carry out the UV irradiation to the substrate of having fitted, heat-treat then, make sealant cures.On the two sides of the liquid crystal cells that obtains like this, stick the polaroid HLC2-2518 of (strain) three upright magnetic (サ Application リ ッ Star) systems.Then, use red (R) LED of FR1112H (sheet (chip) the type LED that Stanley's (ス Application レ one) electric (strain) makes) conduct, use DG1112H (sheet (chip) the type LED of ス Application レ one electric (strain) system) conduct green (G) LED, use DB1112H (sheet (chip) the type LED of Stanley's electric (strain) system) as blueness (B) LED, constitute the backlight of side lamp mode, be disposed at a side at the back side that becomes liquid crystal cells that is provided with described polaroid, become liquid crystal indicator.
The liquid crystal indicator that obtains does not show inequality, shows that grade is good.
Claims (10)
1. the pattern formation method of a photosensitive polymer combination, wherein,
At least comprise: thus the dry in a vacuum photosensitive polymer combination that applies on substrate obtains the vacuum drying operation of photosensitive polymer combination layer; With the exposure process that described photosensitive polymer combination layer is exposed, described vacuum drying operation and described exposure process carry out successively continuously.
2. the pattern formation method of photosensitive polymer combination according to claim 1, wherein,
Be 30 seconds～150 seconds the drying time in the described vacuum drying operation.
3. the pattern formation method of photosensitive polymer combination according to claim 1, wherein,
Be 35 seconds～120 seconds the drying time in the described vacuum drying operation.
4. the pattern formation method of photosensitive polymer combination according to claim 1, wherein,
Be 40 seconds～90 seconds the drying time in the described vacuum drying operation.
5. the pattern formation method of photosensitive polymer combination according to claim 1 and 2, wherein,
Vacuum tightness in the described vacuum drying operation is 0.00001 atmospheric pressure～0.1 atmospheric pressure.
6. the pattern formation method of photosensitive polymer combination according to claim 1 and 2, wherein,
Vacuum tightness in the described vacuum drying operation is 0.00005 atmospheric pressure～0.05 atmospheric pressure.
7. the pattern formation method of photosensitive polymer combination according to claim 1 and 2, wherein,
Vacuum tightness in the described vacuum drying operation is 0.0001 atmospheric pressure～0.01 atmospheric pressure.
8. the method for making of a color filter, wherein,
At least carry out the pattern formation method of claim 1 or 2 described photosensitive polymer combinations.
9. color filter, wherein,
Utilize the method for making of the described color filter of claim 8 to make.
10. display device, wherein,
Has the described color filter of claim 9.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006337032 | 2006-12-14 | ||
| JP2006337032 | 2006-12-14 |
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| CN101206396A true CN101206396A (en) | 2008-06-25 |
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| JP2003035812A (en) * | 2001-07-24 | 2003-02-07 | Canon Inc | Color filter and method for manufacturing the same, liquid crystal element using the color filter |
| JP2003075624A (en) * | 2001-09-03 | 2003-03-12 | Canon Inc | Method for resist patterning, color filter and method for manufacturing the color filter, liquid crystal element |
| JP2003112103A (en) * | 2001-10-01 | 2003-04-15 | Toray Ind Inc | Coating apparatus, coating method, and apparatus and method for producing color filter |
| JP4839710B2 (en) * | 2004-08-09 | 2011-12-21 | 三菱化学株式会社 | Photosensitive resin composition, color filter, and liquid crystal display device |
-
2007
- 2007-12-04 JP JP2007313735A patent/JP2008170972A/en not_active Abandoned
- 2007-12-11 CN CNA2007101996471A patent/CN101206396A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104102028A (en) * | 2013-04-10 | 2014-10-15 | 第一毛织株式会社 | Organic solution for surface treatment of induim zinc oxide substrate and method of preparing display substrate using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008170972A (en) | 2008-07-24 |
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