CN101191199B - APCVD spraying formulation - Google Patents
APCVD spraying formulation Download PDFInfo
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- CN101191199B CN101191199B CN 200610118699 CN200610118699A CN101191199B CN 101191199 B CN101191199 B CN 101191199B CN 200610118699 CN200610118699 CN 200610118699 CN 200610118699 A CN200610118699 A CN 200610118699A CN 101191199 B CN101191199 B CN 101191199B
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- apcvd
- tetrabutyl titanate
- isooctyl alcohol
- percent
- butyl acetate
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Abstract
The invention relates to a novel APCVD spraying formula and is characterized in that: the formula consists of tetrabutyl titanate, butyl ethanoate and isooctyl alcohol, and the weight percentage is that: tetrabutyl titanate of 75 to 85 percent, butyl ethanoate of 10 to 20 percent, and isooctyl alcohol of 1 to 8 percent. The formula consists of tetrabutyl titanate, butyl ethanoate and isooctyl alcohol; the weight percentage is that: tetrabutyl titanate of 80 percent, butyl ethanoate of 15 percent, isooctyl alcohol of 5 percent. The invention discloses a novel APCVD spraying formula, can improve the thickness of the titania membrane and the density of the titania membrane, improves the parallex of the membranes in all directions, is practical and beautiful, has good solar absorption effect and high energy conversion efficiency.
Description
Technical field
The present invention relates to a kind of sprayed-out recipe, the new prescription of particularly a kind of APCVD spraying.
Background technology
Titanium dioxide film is a kind of transparent material that luminous reflectance is reduced on the light absorbing material surface that is used for, and is particularly suitable for making the reflectance coating coating of solar cell surface.APCVD of the prior art (normal pressure chemical vapour deposition method) spraying universal lacquer generally is to mix by a certain percentage with tetrabutyl titanate, n-butyl acetate, isopropylcarbinol, 2-ethyl hexanol, the often thickness low LCL of the titanium dioxide film that the spray material that this prescription is made is settled out, compactness is not strong, influence the solar absorption effect, and there are parallax in the rete all directions, and color is also different.
Summary of the invention
The object of the present invention is to provide the new prescription of a kind of APCVD spraying, solved the thickness low LCL and the insufficient problem of titanium dioxide film compactness that generate titanium dioxide film in the prior art, improved the parallax of rete all directions.For achieving the above object, technical scheme of the present invention is as follows: the new prescription of a kind of APCVD spraying, it is characterized in that: described prescription is made up of tetrabutyl titanate, n-butyl acetate, isooctyl alcohol, its weight percent is: tetrabutyl titanate 75%----85%, n-butyl acetate 10%----20%, isooctyl alcohol 1%----8%.Described prescription is made up of tetrabutyl titanate, n-butyl acetate, isooctyl alcohol, and its weight percent is: tetrabutyl titanate 80%, n-butyl acetate 15%, isooctyl alcohol 5%.The invention discloses the new prescription of a kind of APCVD spraying, use this coating can increase the thickness of titanium dioxide film and strengthen the compactness of titanium dioxide film, improved the parallax of rete all directions, practical and attractive in appearance, to the good absorbing effect of sun power, the energy conversion efficiency height.
Embodiment
Below in conjunction with embodiment the present invention is elaborated,
Embodiment 1
Get tetrabutyl titanate 80 grams, n-butyl acetate 15 grams, isooctyl alcohol 5 grams, be heated to gaseous state, make it thorough mixing, the solar cell surface of heat is fully contacted with this mixture, titanium dioxide film is deposited on the solar cell surface of heat with normal pressure chemical vapour deposition method (APCVD).
Embodiment 2
Get tetrabutyl titanate 75 grams, n-butyl acetate 20 grams, isooctyl alcohol 5 grams, be heated to gaseous state, make it thorough mixing, the solar cell surface of heat is fully contacted with this mixture, titanium dioxide film is deposited on the solar cell surface of heat with normal pressure chemical vapour deposition method (APCVD).
Embodiment 3
Get tetrabutyl titanate 85 grams, n-butyl acetate gram 10, isooctyl alcohol 5 grams, be heated to gaseous state, make it thorough mixing, the solar cell surface of heat is fully contacted with this mixture, titanium dioxide film is deposited on the solar cell surface of heat with normal pressure chemical vapour deposition method (APCVD).
The invention discloses the new prescription of a kind of APCVD spraying, use this coating can increase the thickness of titanium dioxide film and strengthen the compactness of titanium dioxide film, improved the parallax of rete all directions, practical and attractive in appearance, to the good absorbing effect of sun power, the energy conversion efficiency height.
Claims (2)
1. one kind is equipped with the coating of solar cell surface titanium dioxide film with the APCVD legal system, and it is characterized in that: be made up of tetrabutyl titanate, n-butyl acetate, isooctyl alcohol, its weight percent is:
Tetrabutyl titanate 75%----85%,
N-butyl acetate 10%----20%,
Isooctyl alcohol 1%----8%.
2. a kind ofly be equipped with the coating of solar cell surface titanium dioxide film with the APCVD legal system by claim 1 is described, it is characterized in that: be made up of tetrabutyl titanate, n-butyl acetate, isooctyl alcohol, its weight percent is:
Tetrabutyl titanate 80%,
N-butyl acetate 15%,
Isooctyl alcohol 5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610118699 CN101191199B (en) | 2006-11-23 | 2006-11-23 | APCVD spraying formulation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610118699 CN101191199B (en) | 2006-11-23 | 2006-11-23 | APCVD spraying formulation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101191199A CN101191199A (en) | 2008-06-04 |
| CN101191199B true CN101191199B (en) | 2011-12-14 |
Family
ID=39486398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610118699 Active CN101191199B (en) | 2006-11-23 | 2006-11-23 | APCVD spraying formulation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101191199B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0962428A1 (en) * | 1998-06-04 | 1999-12-08 | Elf Atochem North America, Inc. | Preparation of fluorine modified, low haze, metal oxide films |
| CN1593747A (en) * | 2004-06-25 | 2005-03-16 | 清华大学 | Preparation method of highly active titanium dioxide membrane photocatalyst |
| CN1764737A (en) * | 2003-03-25 | 2006-04-26 | 皮尔金顿公共有限公司 | Titania coatings. |
-
2006
- 2006-11-23 CN CN 200610118699 patent/CN101191199B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0962428A1 (en) * | 1998-06-04 | 1999-12-08 | Elf Atochem North America, Inc. | Preparation of fluorine modified, low haze, metal oxide films |
| CN1764737A (en) * | 2003-03-25 | 2006-04-26 | 皮尔金顿公共有限公司 | Titania coatings. |
| CN1593747A (en) * | 2004-06-25 | 2005-03-16 | 清华大学 | Preparation method of highly active titanium dioxide membrane photocatalyst |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101191199A (en) | 2008-06-04 |
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Address after: 201406 Shanghai city Fengxian District Jianghai Economic Zone Patentee after: Assist prosperous integrated Science and Technology Co., Ltd. Address before: 201406, Shanghai Guangming Economic Zone, Fengxian District, a group of arches Village Patentee before: Shanghai Chaori Solar Energy Science & Technology Co., Ltd. |
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Effective date of registration: 20160620 Address after: 201406 Shanghai city Fengxian District Jianghai Economic Zone Patentee after: Assist prosperous integrated Science and Technology Co., Ltd. Patentee after: GCL Technology (Suzhou) Co. Ltd. integrated Patentee after: SUZHOU GCL SYSTEM INTEGRATION TECHNOLOGY INDUSTRIAL APPLICATION RESEARCH INSTITUTE CO., LTD. Patentee after: ZHANGJIAGANG XIEXIN INTEGRATED TECHNOLOGY CO., LTD. Address before: 201406 Shanghai city Fengxian District Jianghai Economic Zone Patentee before: Assist prosperous integrated Science and Technology Co., Ltd. |