CN101100354B - Method for manufacturing low radiation glass - Google Patents
Method for manufacturing low radiation glass Download PDFInfo
- Publication number
- CN101100354B CN101100354B CN200710011854XA CN200710011854A CN101100354B CN 101100354 B CN101100354 B CN 101100354B CN 200710011854X A CN200710011854X A CN 200710011854XA CN 200710011854 A CN200710011854 A CN 200710011854A CN 101100354 B CN101100354 B CN 101100354B
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- China
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- raw material
- frit
- glass
- nanometer silver
- ordinary optical
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
This invention relates to a method for producing low radiation glass. It comprises procedures of: (1), melting an ordinary optical glass raw material; (2), adding, into said raw material, nanometer silver 0.1-0.21% of the weight of the raw material and lead oxide 0.05-0.1% of the weight of the raw material; (3), thoroughly mixing said three materials; (4), the molten mixture temperature is lowered, and proceeding formation to obtain final products. The optical glass, thus produced based on this invention method, can be used for manufacturing sunglasses and protective spectacles for effectively protecting infrared from passing through the same, with no influence of the strength of the glass, and characteristics of anti-ultraviolet rays and light-flux.
Description
Technical field
The present invention relates to a kind of making method of opticglass, particularly relate to a kind of making method of low emissivity glass.
Background technology
Ultraviolet ray is to bring out the cataractous main inducing of human eye with infrared rays, all exists high-intensity ultraviolet ray, infrared rays in intensive sunlight or the special production environment.At present, the main protective devices that people adopt is to wear sun glasses or special-purpose eye-protection glasses, but common sun glasses or eye-protection glasses eyeglass only have the function of antiultraviolet, and is very faint to ultrared protective effect, can not effectively protect eyes.The low emissivity glass of manufacturing of the present invention infrared rays more than 70% capable of blocking passes through, and does not influence glass intensity, anti-uv and logical light rate simultaneously, is a kind of ideal sun glasses or eye-protection glasses opticglass.
Summary of the invention
The objective of the invention is to overcome existing sun glasses or protective glasses and can not effectively prevent ultrared shortcoming with opticglass, improve by test, providing a kind of is main raw material with the ordinary optical frit, is the making method of the low emissivity glass of additive with nanometer silver and plumbous oxide.This product can effectively prevent from not influence when infrared rays from passing through glass intensity, anti-uv and logical light rate.
The objective of the invention is to be achieved through the following technical solutions:
A kind of making method of low emissivity glass, this method may further comprise the steps:
(1) raw material with ordinary optical glass melts;
(2) nanometer silver and other frit quality 0.05%～0.10% lead oxide powder of other frit quality 0.1%～0.21% of adding in the frit of fusing;
(3) nanometer silver and plumbous oxide and other frit are stirred;
(4) with the cooling of fused mixture, moulding, can obtain qualified product.
The making method of aforesaid a kind of low emissivity glass, described ordinary optical frit are the raw material of general industry production opticglass, and nanometer silver and plumbous oxide are the silver powder of diameter between 1～100 nanometer.
Advantage of the present invention and effect are:
1. the present invention is a main raw material with the ordinary optical frit, is additive with nanometer silver and plumbous oxide, can prevent effectively that infrared rays from passing through.
2. the present invention adopts the production method production of ordinary optical glass, and its production technique is simple, and raw material is easy to get, and is with low cost.
Embodiment
Embodiment 1
Raw material fusing with ordinary optical glass, the nanometer silver and 0.05% lead oxide powder that in the frit of fusing, add other frit quality 0.1%, nanometer silver and plumbous oxide and other frit are stirred,, can obtain qualified product the cooling of fused mixture, moulding.Can prevent that 70% infrared rays from passing through.
Embodiment 2
Raw material fusing with ordinary optical glass, the nanometer silver and 0.075% lead oxide powder that in the frit of fusing, add other frit quality 0.15%, nanometer silver and plumbous oxide and other frit are stirred, with the cooling of fused mixture, moulding, can obtain qualified product.Can prevent that 74% infrared rays from passing through.
Embodiment 3
Raw material fusing with ordinary optical glass, the nanometer silver and 0.1% lead oxide powder that in the frit of fusing, add other frit quality 0.21%, nanometer silver and plumbous oxide and other frit are stirred,, can obtain qualified product the cooling of fused mixture, moulding.Can prevent that 75% infrared rays from passing through.
Claims (2)
1. the making method of a low emissivity glass is characterized in that, this method may further comprise the steps:
(1) raw material with ordinary optical glass melts;
(2) nanometer silver and other frit quality 0.05%～0.10% lead oxide powder of other frit quality 0.1%～0.21% of adding in the frit of fusing;
(3) nanometer silver and plumbous oxide and other frit are stirred;
(4) with the cooling of fused mixture, moulding, can obtain qualified product.
2. the making method of a kind of low emissivity glass according to claim 1 is characterized in that described ordinary optical frit is the raw material of general industry production opticglass, and nanometer silver is the silver powder of diameter between 1～100 nanometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710011854XA CN101100354B (en) | 2007-06-25 | 2007-06-25 | Method for manufacturing low radiation glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710011854XA CN101100354B (en) | 2007-06-25 | 2007-06-25 | Method for manufacturing low radiation glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101100354A CN101100354A (en) | 2008-01-09 |
| CN101100354B true CN101100354B (en) | 2011-01-19 |
Family
ID=39034838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200710011854XA Expired - Fee Related CN101100354B (en) | 2007-06-25 | 2007-06-25 | Method for manufacturing low radiation glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101100354B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102838934B (en) * | 2012-09-27 | 2015-09-16 | 富思特新材料科技发展股份有限公司 | Low-E coating with function of purifying indoor air and preparation method thereof |
| CN104829131A (en) * | 2015-06-03 | 2015-08-12 | 苏州靖羽新材料有限公司 | High-strength glass material and production method thereof |
| CN105060705A (en) * | 2015-08-03 | 2015-11-18 | 芜湖真空科技有限公司 | LOW-E glass matrix material composition and preparation method of LOW-E glass matrix |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87105971A (en) * | 1986-12-29 | 1988-08-31 | Ppg工业公司 | The low radiation film of pyroprocess |
| CN1078219A (en) * | 1992-04-30 | 1993-11-10 | 加迪安工业公司 | High-performance and competent low-E glass and manufacture method thereof |
| CN1133899A (en) * | 1994-12-27 | 1996-10-23 | Ppg工业公司 | Annealed low emissivity coating |
-
2007
- 2007-06-25 CN CN200710011854XA patent/CN101100354B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87105971A (en) * | 1986-12-29 | 1988-08-31 | Ppg工业公司 | The low radiation film of pyroprocess |
| CN1078219A (en) * | 1992-04-30 | 1993-11-10 | 加迪安工业公司 | High-performance and competent low-E glass and manufacture method thereof |
| CN1133899A (en) * | 1994-12-27 | 1996-10-23 | Ppg工业公司 | Annealed low emissivity coating |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101100354A (en) | 2008-01-09 |
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Legal Events
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110119 Termination date: 20110625 |