CN101089692A - Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof - Google Patents
Multi-domain vertical orientation mode liquid crystal display device and substrate manufacturing method thereof Download PDFInfo
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- CN101089692A CN101089692A CN 200710043459 CN200710043459A CN101089692A CN 101089692 A CN101089692 A CN 101089692A CN 200710043459 CN200710043459 CN 200710043459 CN 200710043459 A CN200710043459 A CN 200710043459A CN 101089692 A CN101089692 A CN 101089692A
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Abstract
A liquid crystal display device of multi-domain vertically-oriented mode is prepared as packing a liquid crystal layer between top and bottom base plates, forming common electrode with slit on surface of top base plate, setting multiple sub-pixel region in display region of bottom base plate, arranging pixel electrode with slit in sub-pixel region, dividing said sub-pixel region to be two regions with certain area and setting gap between common electrode and pixel electrode on at least two regions are different from each other.
Description
Technical field
The present invention relates to a kind of liquid crystal indicator, particularly relate to a kind of liquid crystal indicator and manufacture of substrates thereof that can improve the multi-domain vertical orientation mode of aberration.
Background technology
(Liquid Crystal Display is one of the main flow display technique of present widespread use LCD), feature such as have that power consumption is little, thin thickness, in light weight and operating voltage are low in liquid crystal display.Display panels generally comprises upper substrate, infrabasal plate and is filled in liquid crystal layer between the upper and lower base plate; Viewing area on the infrabasal plate comprises a plurality of subpixel area, is provided with thin film transistor (TFT) (TFT) and pixel electrode in it, and thin film transistor (TFT) serves as on-off element; Upper substrate has common electrode (except the IPS liquid crystal display pattern) and coloured filter; On the electrode of upper and lower base plate, have alignment film material, make liquid crystal molecule obtain orientation; Form electric field between the pixel electrode of infrabasal plate and the common electrode of upper substrate, under effect of electric field, the ordered state of liquid crystal molecule changes, thereby the transmitance of backlight is changed, and forms pattern displaying.
The liquid crystal display pattern that is applied to the TV aspect at present is mainly MVA (Multi-domainVertical Alignment; Multi-domain vertical alignment) pattern.The MVA liquid crystal display mostly is and utilizes protrusion or gap electrode to form the multi-domain vertical alignment display mode, to utilize protrusion to form the MVA display mode is example, under the situation that does not have electric field to exist, liquid crystal molecule is vertical orientated under the effect of alignment film, shown in Figure 1A, this moment, display had good black attitude.Liquid crystal molecule is applied certain voltage, and liquid crystal is turned to gradually by the homeotropic alignment state and is arranged in parallel, and shown in Figure 1B, the liquid crystal indicator transmitance changes, thereby realizes that GTG shows.In this process,, promptly form the multi-domain vertical alignment display mode owing to the dip plane of protrusion or because the tilting electric field that strip shaped electric poles forms triggers the orientation that liquid crystal molecule forms a plurality of directions.In this case, the observer is the shown picture of view screen under each visual angle, and observed GTG unanimity does not have the generation of phenomenons such as gray-scale inversion, has shown good viewing angle characteristic, as shown in Figure 2.
Though the GTG unanimity that the MVA display mode shows aspect the angle of squint is compared with the GTG of positive view directions, then has GTG direction interdependence.Show on the concrete color that the color of positive view directions and angle of squint direction is then not quite identical, and aberration can take place.Transmitted light intensity by LCD changes formula,
Wherein, I is a transmitted light intensity, I
0Be incident intensity, λ is a lambda1-wavelength, and d is the thickness of liquid crystal cell, and Φ is the position angle of liquid crystal molecule.Its effective refractive index
N here
0, n
e, θ is respectively the polar angle of ordinary refractive index, extraordinary refractive index and the liquid crystal molecule of liquid crystal molecule.n
0, n
e, θ and Φ definition as shown in Figure 3.
From this formula as can be seen, the effective refractive index of liquid crystal molecule is relevant with the polar angle of liquid crystal molecule, and under different visual angles, the polar angle of liquid crystal molecule performance is inequality, then can cause the variation of transmitted light intensity.The concrete ability drop that sees through that shows as, angle of squint direction the and just color that showed of view directions is inconsistent causes aberration, thereby influences angular field of view and image quality the angle of squint under.
For solving the aberration problem of angle of squint, can utilize capacity coupled method or double T FT method of driving to form the above display mode in 8 farmlands, liquid crystal molecule is reached unanimity at the effective refractive index of each view directions performance, then the transmitance difference under the different visual angles diminishes, and aberration can improve.
Summary of the invention
The technical matters that the present invention solves is to provide a kind of liquid crystal indicator with multi-domain vertical orientation mode, and the aberration of liquid crystal display angle of squint direction is improved.
The technical matters of another solution of the present invention is to provide a kind of manufacture method of substrate of the liquid crystal indicator that is used for multi-domain vertical orientation mode.
The manufacture method of the substrate of the liquid crystal indicator that the technical matters of another solution of the present invention is to provide another kind to be used for multi-domain vertical orientation mode.
Based on above-mentioned purpose, the invention provides a kind of liquid crystal indicator of multi-domain vertical orientation mode, comprise a upper substrate, an infrabasal plate; One liquid crystal layer is filled between the upper and lower base plate; Described upper substrate surface is formed with common electrode, is formed with slit or projection on the common electrode; The viewing area of described infrabasal plate includes a plurality of subpixel area, is provided with pixel electrode in the sub-pixel, is formed with slit or projection on the pixel electrode; Wherein said sub-pixel is divided at least two zones with certain area ratio, and has at least the common electrode in two zones and the gap between the pixel electrode different.
The present invention also provides a kind of manufacture method of substrate, is applied to the manufacture method of the liquid crystal indicator of multi-domain vertical orientation mode, comprises the steps: to provide a transparency carrier; On described transparency carrier, form black matrix, look resistance layer, flatness layer and transparent electrode layer successively; Wherein use mask to form look resistance layer or flatness layer with different-thickness.
Described mask can be half-tone mask plate or gray-tone mask version, forms look resistance layer or the flatness layer with different-thickness through single exposure.
Described mask can also be little mask that moves, and forms look resistance layer or the flatness layer with different-thickness through multiexposure, multiple exposure.
The present invention also provides the manufacture method of another kind of substrate, is applied to the manufacture method of the liquid crystal indicator of multi-domain vertical orientation mode, comprises the steps: to provide a transparency carrier; On described transparency carrier, form grid, gate insulator, semiconductor layer, leakage/source electrode, passivation protection layer, pixel electrode successively; Wherein after forming gate insulator or passivation protection layer, increase by an etching operation, form gate insulator or passivation protection layer with different-thickness.
Based on above-mentioned design, the liquid crystal indicator of multi-domain vertical orientation mode of the present invention is because the common electrode and the gap between the pixel electrode that have at least two zones to form in each sub-pixel are different, then sub-pixel is under the driving of identical voltage, the electric field intensity of each zone performance is not identical entirely, liquid crystal molecular orientation performance in the same sub-pixel is different, therefore can form the effect that multidomain shows, thereby improve aberration.
In order to illustrate further feature of the present invention and technology contents, see also following about detailed description of the present invention and accompanying drawing.Wherein the only for reference and aid illustration usefulness of accompanying drawing is not construed as limiting the invention.
Description of drawings
Figure 1A is the liquid crystal molecular orientation synoptic diagram of MVA pattern when not applying electric field;
Figure 1B is the liquid crystal molecular orientation synoptic diagram of MVA pattern when applying electric field;
Fig. 2 is the display frame of observing the MVA pattern under different visual angles;
Fig. 3 A is the synoptic diagram of liquid crystal molecule state definition;
Fig. 3 B is the synoptic diagram of liquid crystal molecule refractive index definition;
Fig. 4 A is the structural representation of the common electrode of upper substrate side in the embodiment of the invention one;
Fig. 4 B is the structural representation of pixel electrode in the embodiment of the invention one;
Fig. 5 is the schematic top plan view of sub-pixel structure in the embodiment of the invention one;
Fig. 6 A is the form synoptic diagram of 14 region liquid crystal molecules under electric field driven in the embodiment of the invention one;
Fig. 6 B is the form synoptic diagram of 15 region liquid crystal molecules under electric field driven in the embodiment of the invention one;
Fig. 7 be under the different voltages transmitance with the variation relation figure of view angle theta;
Fig. 8 A is the V-T curve map when positive visual angle and angle of squint 60 are spent under the 4 farmland display modes;
Fig. 8 B is the V-T curve map when positive visual angle and angle of squint 60 are spent under the 8 farmland display modes;
Fig. 9 is the schematic top plan view of sub-pixel structure in the embodiment of the invention;
Figure 10 is the schematic top plan view of sub-pixel structure in the embodiment of the invention;
Figure 11 is the general making flow process and the structural representation of upper substrate;
Figure 12 is the structural representation that negative photoresist of the present invention forms under mask;
Figure 13 is the structural representation that positive photoresist of the present invention forms under mask;
Figure 14 is the structural representation of the making flow process of substrate in the embodiment of the invention three;
Figure 15 has been to use the bright schematic cross-section of executing the formed liquid crystal indicator of manufacture method of example two and embodiment three of this reality;
Figure 16 is the manufacturing process of the manufacture of substrates of the embodiment of the invention five;
Figure 17 is to use the schematic cross-section of the formed liquid crystal indicator of manufacture of substrates of the embodiment of the invention four, embodiment five;
Figure 18 is the sub-pixel structure synoptic diagram on the infrabasal plate;
Figure 19 is that sub-pixel structure among Figure 18 is along the cross section structure synoptic diagram of AA ';
Figure 20 is the structural representation of making flow process of the substrate of the embodiment of the invention six;
Figure 21 is to use the schematic cross-section of the formed sub-pixel structure of manufacture method of the embodiment of the invention six.
Among the figure:
10. infrabasal plate 11. projectioies (or slit) 12. pixel electrodes
14, different zone, 15,16 gaps
20. upper substrate 21. projectioies (or slit) 22. common electrodes
30. liquid crystal layer 31. liquid crystal molecules
40. transparency carrier 41. black matrix 42. look resistance layers 43. flatness layers
50. mask
51. intermediate tone mask version 52. gray level mask plates 53. mask
60. negative photoresist
70. positive photoresist
80. transparency carrier
121. sweep trace 122. data lines 123. contact holes 124. public electrode wires
125. passivation protection layer 126. grid layer 127. gate insulators
128.a-Si semiconductor layer 129.n+a-Si semiconductor layer
130. source/drain electrode layer
Embodiment
The invention will be further described below in conjunction with accompanying drawing and exemplary embodiments.
Embodiment one
Fig. 4 A is the structural representation of the common electrode of upper substrate side in the embodiment of the invention one; 4B is the structural representation of pixel electrode in the embodiment of the invention one.
With reference to Fig. 4 A, 4B, the liquid crystal indicator of the vertical display mode of multidomain of the present invention comprises a upper substrate 20, an infrabasal plate 10 and is filled in liquid crystal layer 30 between upper and lower base plate 10 and 20; The viewing area of described infrabasal plate 10 includes a plurality of subpixel area, is provided with pixel electrode 12 and TFT device (not shown) in the sub-pixel, is formed with slit or projection 11 on the pixel electrode 12; Described upper substrate 20 surfaces are formed with common electrode 22, are formed with slit or projection 21 on the common electrode 22.Slit that forms on the described pixel electrode 12 or projection 11, relative with slit or projection 21 dislocation on the common electrode 22.Pixel electrode 12, common electrode 22 materials are indium tin oxide or indium-zinc oxide.
With reference to Fig. 4 B, sub-pixel is divided into two zones that area is different, is respectively 14 and 15 zones.Common electrode 22 and the gap between the pixel electrode 12 in described two zones 14,15 are different.Described sub-pixel is divided into the different zone of area, can be two zones, also can be zone more than two, and its region shape or number can design as required.
With reference to Fig. 9, different zone 14,15, two gaps can rectangular shape in the described sub-pixel.
With reference to Figure 10, sub-pixel can be divided into three zones 14,15 and 16 and show, has the gap difference in two zones in three zones 14,15,16 at least.
Fig. 5 is the schematic top plan view of the embodiment of the invention one sub-pixel structure.
Show and have improvement place of the 4 farmlands demonstration of technology for the multidomain of better explanation structure of the present invention, present embodiment utilizes the LCD simulation softward to make the demonstration of 4 farmlands respectively, and the multidomain of using structure of the present invention shows (being shown as example with 8 farmlands), compares and compares.Concrete simulation is set as follows:
The sub-pixel structure of employing software simulation as shown in Figure 5.On the common electrode 22 on upper substrate 20, the infrabasal plate 10, pixel electrode 12, be formed with slit 21 and 11 (also can use projection, that uses is the IT0 slit) respectively so that produce the multi-domain vertical alignment liquid crystal display in this simulation.If be that 4 farmlands show, then all adopt identical gap, 4.0 microns of this simulation employings between two regional common electrodes 22 and the pixel electrode 12.If adopt apparatus of the present invention to show that to form 8 farmlands then the gap between regional 14 common electrodes 22 and the pixel electrode 12 is adopted 3.5 microns, 4.0 microns gap is adopted in zone 15, can realize that 8 farmlands show.
Under 4 above-mentioned farmland display modes, performance was identical when the liquid crystal molecule in two zones was subjected to electric field driven.Under 8 above-mentioned farmland display modes, the liquid crystal molecule 31 in two zones 14,15 is because the gap difference between common electrode 22 and the pixel electrode 12, under the effect of identical voltage, the electric field intensity difference that is subjected to, the electric field action that the liquid crystal molecule 31 in zone 14 is subjected to is higher, and then liquid crystal molecule 31 more tends to the arrangement of parallel substrate 10,20 directions; Zone 15 electric field action a little less than, the degree that liquid crystal molecule 31 trend parallel substrates 10,20 directions are arranged then forms 8 farmlands and shows not as zone 14.The signal of liquid crystal molecule state as shown in Figure 6.
Utilize software simulation, Fig. 7 has provided under the 3.5V voltage, and 4 domain modes and 8 domain mode transmitances are with the variation diagram of view angle theta.In Fig. 7,8 farmlands of apparatus of the present invention show that visual angle ± 60 degree are respectively 0.02527 and 0.01164 with the difference of 0 degree.The visual angle that 4 farmlands show ± 60 degree are respectively 0.027411 and 0.037537 with the difference of 0 degree.As can be seen, to be presented at the difference that positive visual angle and≤60 transmitance diversity ratio 4 farmlands of degree within the visual angles show little on 8 farmlands.
Fig. 8 has provided the demonstration of 4 farmlands and 8 farmlands show, transmitance was with the curve of change in voltage when positive visual angle and angle of squint 60 were spent.From Fig. 8 also as can be seen, 8 farmlands under the structure of the present invention show that angle of squint 60 degree are littler than the difference on 4 farmlands with the difference of facing the visual angle.Fig. 7,8 shows that 8 farmlands under the structure of the present invention show, the minimizing of the transmitance of its angle of squint direction and positive view directions transmitance difference, and then aberration is less.
Embodiment two
Figure 11 is the general making flow process and the structural representation of upper substrate.
With reference to Figure 11 A, a transparency carrier 40 at first is provided, this transparency carrier 40 is glass substrate or plastic substrate; Then form the black matrix (BM) 41 of certain pattern on transparency carrier 40, the material of BM41 can be made for black resin or crome metal.With reference to Figure 11 B, then, on the transparency carrier 40 that has BM41, form certain thickness look resistance layer 42, utilize the mask 50 shown in Figure 11 C to expose, pattern after the red color resistance layer develops is shown in Figure 11 D, repeat Figure 11 B to the manufacturing process shown in Figure 11 D, form the redness (R) shown in Figure 11 E, green (G) and blue (B) look resistance layer successively.
Once more, form certain thickness flatness layer 43 on three layers of look resistance layer 42, shown in Figure 11 F, the material of flatness layer 43 can be transparent photoresist resin.
At last, form the common electrode 22 of certain pattern on flatness layer 43, shown in Figure 11 G, common electrode 22 can be tin indium oxide (IT0) material.
Make in the basal plate making process in traditional photoetching process, the mask 50 of use is generally the binary mask version.Mask 50 is the binary mask version, and the light distribution that sees through mask 50 is shown in Figure 12 A.Adopt negative photoresist layer 60, photoresist shape adopts intermediate tone mask version 51 and gray level mask plate 52 behind the exposure imaging shown in Figure 12 A, and it sees through the light distribution of mask and the photoresist shape behind the exposure imaging respectively shown in Figure 12 B and Figure 12 C.Adopt positive photoresist layer 70, the light distribution of binary mask version, intermediate tone mask version 51 and gray level mask plate 52, and behind the exposure imaging photoresist shape respectively shown in Figure 13 A, 13B, 13C.As can be seen, adopt intermediate tone mask version 51 and gray level mask plate 52, can in single exposure, form photoresist layer 60,70 with different-thickness.
In the manufacture method of present embodiment substrate, use photoetching process to make in the upper substrate process, in child optical filtering regional extent, utilize the look resistance layer 42 of intermediate tone mask version 51 or gray-tone mask version 52 preparation upper substrates 20, realize the look resistance layer 42 thickness differences in the same son optical filtering zone, as a part of regional look resistance layer 42 thickness wherein is 2 microns, and look resistance layer 42 thickness in another part zone are 1.5 microns.With the sub-optical filtering of redness zone is example, and when the son that forms the red color resistance layer filtered the zone, the light shield of sub-optical filtering regional exposure adopted intermediate tone mask version 51 or gray-tone mask version 52, can obtain the look resistance layer of different-thickness in same son filters the zone.Utilize mask 51 or gray-tone mask version 52 to form different green, the blue look resistance layers of thickness successively.Form identical flatness layer of thickness 43 and common electrode layer 22 at last, can realize liquid crystal indicator structure of the present invention.
Embodiment three
In the process of using photoetching process manufacturing upper substrate 20, in child optical filtering regional extent, utilize little mask 53 of moving, the method of multiexposure, multiple exposure prepares the look resistance layer 42 of upper substrate 20, realize the look resistance layer 42 thickness differences in same son optical filtering zone, as a part of regional look resistance thickness wherein is 2 microns, and the look resistance thickness in another part zone is 1.5 microns.The mask 53 of present embodiment is that with the difference of traditional mask 50 light transmission part of mask 50 is whole son optical filtering zone, and the light transmission part of mask 53 is 1/2 sub zone of filtering.With the sub-optical filtering of redness zone is example, when the son that forms red color resistance filters the zone, at first, expose with exposure X in 1/2 sub zone of filtering, and little then mask 53 of moving, little distance of moving is 1/2 son optical filtering zone, Y exposes with exposure.Same individual sub-filter area territory can obtain the look resistance layer 42 of different-thickness after developing, and its process utilizes mask 53 to form different green, the blue look resistance layers of thickness as shown in figure 14 successively.Form identical flatness layer of thickness 43 and common electrode layer 22 at last, can realize liquid crystal indicator structure of the present invention.
The sectional view of the formed liquid crystal indicator of manufacture method of use embodiment two and embodiment three as shown in figure 15, use above-mentioned manufacture method, can in subpixel area, form common electrode 22 and different zone, pixel electrode 12 gaps, thereby realize that multidomain liquid crystal shows.
Embodiment four
In the process of using photoetching process manufacturing upper substrate 20, similar with the foregoing description two, in son filters regional scope, utilize the flatness layer 43 of intermediate tone mask version 51 or gray-tone mask version 52 preparation upper substrates 20, realizing the filter flatness layer 43 thickness differences in zone of same son, is 1 micron as a part of regional flatness layer thickness wherein, and the thickness in another part zone is 0.5 micron, on flatness layer 43, form common electrode 22 then, can realize liquid crystal indicator structure of the present invention.
Embodiment five
Use photoetching process to make in the process of upper substrate 20, similar with the foregoing description three, in child optical filtering regional extent, utilize little mask 53 of moving, the method of multiexposure, multiple exposure prepares the flatness layer 43 of upper substrate 20, realizing the filter flatness layer 43 thickness differences in zone of same son, is 1 micron as a part of regional look resistance thickness wherein, and the look resistance thickness in another part zone is 0.5 micron.As shown in figure 16, at first, expose with exposure X ' in 1/2 son optical filtering zone.Little then mask 53 of moving, little distance of moving is 1/2 son optical filtering zone, Y ' exposes with exposure.Same individual sub-filter area territory can obtain the flatness layer 43 of different-thickness after developing, and forms common electrode layer 22 at last, can realize liquid crystal indicator structure of the present invention.
The cross section structure of the formed liquid crystal indicator of manufacture method of use embodiment four and embodiment five as shown in figure 17, use above-mentioned manufacture method, can in subpixel area, form common electrode 22 and different zone, pixel electrode 12 gaps, thereby realize that multidomain liquid crystal shows.
Embodiment six
Figure 18 is the sub-pixel structure synoptic diagram on the infrabasal plate; Figure 19 is that sub-pixel structure among Figure 18 is along the cross section structure synoptic diagram of AA '; Figure 20 is the manufacturing process of the substrate of the embodiment of the invention six.
With reference to Figure 18, Figure 19, Figure 20, one transparency carrier 80 at first is provided, this transparency carrier 80 is glass substrate or plastic substrate, form a first metal layer (M1) and gate insulator 127 then on transparency carrier 80 successively, the first metal layer forms a grid layer 126 patterns and the controlling grid scan line 121 that is electrically connected with described grid, the public electrode wire 124 parallel with controlling grid scan line 121 through photoetching; Gate insulator 127 cover grid, controlling grid scan line 121 and public electrode wire 124.
The material of the first metal layer can be chromium (Cr), tungsten (W), titanium (Ti), molybdenum (Mo), aluminium metal or alloy such as (Al), and the material of gate insulator 127 can be silicon nitride (SiNx), monox (SiOx) or silicon oxynitride.
Then, form semiconductor layer above transparency carrier 80, semiconductor layer comprises a-si semiconductor layer by layer 128 and n+a-si semiconductor layer 129.Form second metal level (M2) then on transparency carrier, the pattern of formation source/drain electrode layer 130 reaches the data line 122 that is electrically connected with source electrode.Data line 122 and sweep trace 121 intersection regions define pixel region, form passivation protection layer 125 above drain electrode layer 130, and etch contact hole 123 on passivation protection layer 125; Form the pattern of pixel electrode 12 at last on transparency carrier 80 surfaces, pixel electrode 12 is electrically connected by contact hole 123 and drain electrode.
Behind the certain thickness gate insulator 127 of above-mentioned formation (as 0.5 micron), shown in Figure 20 A, increase following operation, on TFT device top and parton pixel region (as 1/2 sub-pixel) cover photoresist 60, shown in Figure 20 B, utilize the method for carving of doing, the zone that will not cover photoresist 60 etches away the dielectric film of segment thickness, shown in Figure 20 C, perhaps dielectric film is all etched away, shown in Figure 20 D, finish peeling off and other operation of substrate of photoresist again.After the sub-pixel viewing area forms,, realize apparatus of the present invention because the material thickness difference under the pixel electrode 12 can realize the gap difference between interior common electrode 22 of same pixel and the pixel electrode 12.
It is similar to catch up with the method for stating; after forming certain thickness passivation protection layer 125 (as 0.5 micron); in order to realize the passivation protection layer 125 of different-thickness; increase following operation: on TFT device top and parton pixel region (as 1/2 sub-pixel) cover photoresist 60; utilize the method for carving of doing; the zone that will not cover photoresist 60 etches away the passivation protection layer 125 of segment thickness; also passivation protection layer 125 all can be etched away; finish peeling off and other operation of substrate of photoresist again, the sub-pixel structure cross section that etches away part passivation protection layer 125 as shown in figure 21.After the sub-pixel viewing area forms,, realize apparatus of the present invention structure because the material thickness difference under the pixel electrode 12 can realize the gap difference between interior common electrode 22 of same pixel and the pixel electrode 12.
The method of the liquid crystal indicator of above-mentioned realization multi-domain vertical orientation mode of the present invention can be used wherein a kind of as required respectively or is used in combination wherein two or more method.
Under the situation that does not break away from spirit of the present invention or method, can make amendment and be out of shape the present invention, but these modifications and distortion include within claim protection domain of the present invention.
Claims (7)
1. the liquid crystal indicator of a multi-domain vertical orientation mode comprises
One upper substrate;
One infrabasal plate;
One liquid crystal layer is filled between the upper and lower base plate;
Described upper substrate surface is formed with common electrode, is formed with slit or projection on the common electrode;
The viewing area of described infrabasal plate includes a plurality of subpixel area, is provided with pixel electrode in the sub-pixel, is formed with slit or projection on the pixel electrode;
Wherein said sub-pixel is divided at least two zones with certain area ratio, and has at least the common electrode in two zones and the gap between the pixel electrode different.
2. liquid crystal indicator according to claim 1 is characterized in that described pixel electrode, common electrode material are indium tin oxide.
3. liquid crystal indicator according to claim 1 is characterized in that the area at least two zones of described sub-pixel is unequal.
4. the manufacture method of a substrate is applied to the manufacture method of the liquid crystal indicator of multi-domain vertical orientation mode, comprises the steps:
One transparency carrier is provided;
On described transparency carrier, form black matrix, look resistance layer, flatness layer and transparent electrode layer successively;
It is characterized in that using mask to form look resistance layer or flatness layer with different-thickness.
5. manufacture method according to claim 4 is characterized in that described mask is half-tone mask plate or gray-tone mask version, forms look resistance layer or the flatness layer with different-thickness through single exposure.
6. manufacture method according to claim 4 is characterized in that by little mask that moves, and forms look resistance layer or the flatness layer with different-thickness through multiexposure, multiple exposure.
7. the manufacture method of a substrate is applied to the manufacture method of the liquid crystal indicator of multi-domain vertical orientation mode, comprises the steps:
One transparency carrier is provided;
On described transparency carrier, form grid, gate insulator, semiconductor layer, leakage/source electrode, passivation protection layer, pixel electrode successively;
It is characterized in that after forming gate insulator or passivation protection layer, increasing by an etching operation, form gate insulator or passivation protection layer with different-thickness.
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