CN101071269B - Photographic material of black matrix wall for ink-jet mode color filter and its manufacturing method - Google Patents
Photographic material of black matrix wall for ink-jet mode color filter and its manufacturing method Download PDFInfo
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- CN101071269B CN101071269B CN2006100758005A CN200610075800A CN101071269B CN 101071269 B CN101071269 B CN 101071269B CN 2006100758005 A CN2006100758005 A CN 2006100758005A CN 200610075800 A CN200610075800 A CN 200610075800A CN 101071269 B CN101071269 B CN 101071269B
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- photosensitive material
- irgacure
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- ether
- kayacure
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Abstract
This invention concerns a method of inkjet color filters with black matrix wall of photosensitive materials, including its composition: 0.1 to 40 wt% of the pigment, 1-95 wt% of the solvent, from 0.01 to 15 wt% of the initial , 0.1 to 30 wt% of the polymeric or oligomeric of its modification, 30 wt% and 30 wt% following polymers, as well as 10 wt% and 10 wt% of the additive. This invention involves the use of a photosensitive materials black matrix wall method. The use of the photosensitive materials manufactured black matrix and color ink retaining wall between the contact angle formed by more than traditional materials by the black matrix retaining wall to prevent color ink and black matrix wall contact, or have adsorption run wet circumstances, different color ink to avoid the mixing occurring mexican, so facilitate the smooth process.
Description
[technical field]
The present invention relates to photosensitive material and the manufacture method of a kind of ink-jet mode colour filter with black matrix (Black Matrix is called for short BM) barricade.
[background technology]
Because LCD (Liquid Crystal Display, LCD) be the assembly of non-active illuminating, must see through inner backlight light source is provided, the GTG that collocation drive integrated circult and liquid crystal control form black, white dichromatism shows, red (R), green (G), indigo plant (B) three kinds of color layers of seeing through colored filter (Color Filter) again provide form and aspect, form colored display frame, so colored filter is the key component of LCD colorize.At present, the colorful optical filter preparation method of prior art mainly contains: pigment dispersion method (Pigment-dispersed Method) and ink ejecting method (Ink Jet Method).Pigment dispersion method is that chromatic photoresist (Color Resist) is coated on the substrate in the mode of rotary coating, is prepared into color lump (Color Area) via the mode of exposure imaging.Chromatic photoresist is that color pigment is dispersed in wherein photoresistance, has the characteristic of irradiation reaction and thermmohardening.The resistance of RGB three color coloured light must form colored filter at last through three road coatings, exposure, developing manufacture process.Pigment dispersion method has processing procedure complexity and the high shortcoming of equipment cost for a long time.
Ink ejecting method is to use an ink discharge device that R, G, B color inks are sprayed in the BM on a substrate simultaneously, and color inks solidifies the back and form painted RGB color layers pattern on this substrate.Use ink ejecting method can once form the RGB color layers, make preparation process greatly simplify, cost significantly reduces.So ink ejecting method has the plurality of advantages of processing procedure simplification, environmental protection, conservation.
When using ink ejecting method to make colored filter, for the not mutual colour mixture of the color inks that makes the RGB color layers, generally between each picture element (Sub-Pixel), all be provided with barricade, also the BM barricade can be set directly.Wherein, barricade is to increase on the BM material at least that one deck macromolecular material forms again; The BM barricade then is that the BM material of individual layer forms, and directly is formed on the substrate, and more traditional BM increases highly to some extent, with as buffer action.
But the color inks contact angle θ of traditional B M barricade material therewith is very low, can cause the absorption of color inks when contacting with the BM barricade or wetting, and produce different color inks between mixed black situation, and then influence carrying out smoothly of processing procedure.
[summary of the invention]
In view of this, provide a kind of be used to make with color inks have big contact angle the BM barricade photosensitive material and use this photosensitive material to make that the method for BM barricade is real to be necessity.
A kind of photosensitive material of black matric wall for ink-jet mode colour filter, its composition comprises: 0.1 to 40wt% colorant, 1 to 95wt% solvent, 0.01 initiator to 15wt%, 0.1 modifier to the macromolecule oligomer of 30wt%, this modifier has following one or more functional groups or functional group: hydrogen cyanide base, isocyanate group, different hydrogen base, sulfydryl, amide group, siloxy, sulfenyl, urea groups, phosphate and sulfuryl, the high molecular polymer that 30wt% and 30wt% are following, and 10wt% and the following adjuvant of 10wt%.
A kind of manufacture method that is used for the BM barricade of ink-jet method manufacturing colored filter may further comprise the steps: a transparency carrier is provided; By crack formula, rotary or crack rotary process coating machine described photosensitive material is coated this upper surface of base plate; The light shield that will have predetermined black matric wall pattern is located between this photosensitive material layer and an exposure machine light source, and this photosensitive material layer that exposes, and develops again.
With respect to prior art, use the black matric wall of this photosensitive material manufacturing and color inks between the black matric wall done greater than traditional material of formed contact angle, in the time of can preventing that color inks from contacting with black matric wall, produce absorption or wetting situation, avoid different color inks between take place to mix China ink situation, in order to carrying out smoothly of processing procedure.
[embodiment]
The invention provides a kind of photosensitive material that ink-jet method is made the BM barricade of colored filter that is used for, its composition comprises: 0.1 to 40wt% colorant, 1 to 95wt% solvent, 0.01 initiator to 15wt%, 0.1 to macromolecule oligomer or its modifier of 30wt%, high molecular polymer (macromolecule resin) that 30wt% and 30wt% are following and the adjuvant of 10wt% and 10wt%.
Preferably, the optimum weight ratio scope of this colorant is 3 to 30wt%.
Preferably, the optimum weight ratio scope of this solvent is 25 to 85wt%.
Preferably, the optimum weight ratio scope of this initiator is 0.1 to 8wt%.
Preferably, the optimum weight ratio scope of the modifier of this macromolecule oligomer is 3 to 20wt%.
Preferably, the optimum weight ratio scope of this high molecular polymer (macromolecule resin) is 0.1 to 15wt%.
Preferably, the optimum weight ratio scope of this adjuvant is 0.01 to 5wt%.
Wherein, this colorant comprises the material of dyestuff, pigment or other meeting colour generation.The preferred carbon black material of this colorant.
Wherein, this solvent is an organic solvent, and this solvent mainly comprises following several big class: ester class, ethers, pure ethers, ketone, alcohols, polyalcohols derivant and nitrogenous series solvent etc.Concrete, this solvent can preferentially be selected following material for use: methoxybutanol, isopropyl alcohol, butanols, phenmethylol, butyl ether, the ethylene glycol propyl ether, ethylene glycol butyl ether, the ethylene glycol hexyl ether, ethylene glycol phenyl ether, the ethylene glycol butyl ether acetate, the diethylene glycol methyl ether, the diethylene glycol ethylether, the diethylene glycol butyl ether, the diethylene glycol hexyl ether, the triethylene glycol methyl ether, the triethylene glycol ethylether, the triethylene glycol butyl ether, methyl proxitol, dipropylene glycol methyl ether, the tripropylene glycol methyl ether, propylene glycol methyl ether acetate, the dipropylene glycol methyl ether acetate, propylene glycol butyl ether, the dipropylene glycol butyl ether, the tripropylene glycol butyl ether, propylene glycol phenyl ether, ethyl acetate, butyl acetate, ethyl benzoate, ethoxyl ethyl propionate, acetone, MEK, methyl amylketone, methylisobutylketone, diisobutyl ketone, isophorone, cyclohexanone, 2-gives a tongue-lashing and coughs up pyridine ketone, N-methyl-2 is given a tongue-lashing and is coughed up pyridine ketone etc.
Wherein, this initiator comprises the light initiator, described smooth initiator comprises: two (dimethyl amido) benzophenone (4,4-Bis (Dimethylamino)), two (diethyl amido) benzophenone (4,4 '-Bis (Diethylamino) Benzophenone), methoxybenzene-two (trichloromethyl)-triazine (2-(4-Methoxyphenyl)-4,6-Bis (Trichloromethyl)-1,3,5-Triazine), three (trichloromethyl) triazine (Tris (Trichloromethyl)-1,3,5-Triazine) etc.At present, the staple of this light initiator comprises following kind: IRGACURE
819, IRGACURE
369, IRGACURE
2959, IRGACURE
379, IRGACURE
184, IRGACURE
784, IRGACURE
250, IRGACURE
907, IRGACURE
651, IRGACURE
OXE01, IRGACURE
OXE02, IRGACURE
500, IRGACURE
1800, IRGACURE
1000, IRGACURE
1700, DAROCURE
BP, DAROCURE
1173CGI242, DAROCURE
1173CGI-552, Chivacure
TPO, Chivacure
TPO-L, Chivacure
200, KAYACURE DETX-S, KAYACURE CTX, KAYACURE BMS, KAYACURE BP-100, Chivacure
107, Chivacure
184, Chivacure
284, IRGACURE
OXE02, KAYACURE DETX-S, KAYACURE CTX, KAYACUREBMS or KAYACURE BP-100 etc.
Wherein, this macromolecule oligomer comprises organic unsaturated epoxy acrylic oligomer ester and derivant, organic unsaturated amino methyl acid esters oligomer and derivant or organic unsaturated polyester oligomer ester and derivant thereof etc.
This macromolecule oligomer includes but not limited to following material: organic unsaturated hydrocarbon or amine upgrading epoxy acrylic oligomer ester (Epoxy Acrylate Oligomers), amine upgrading polyester acrylic oligomer ester (Amine Modified Polyester Acrylates), PBAA oligomer ester (Polybutadiene Acrylate Oligomers), acrylate oligomer (AcrylicOligomer), diacrylate oligomer ester (Diacrylate Oligomer), triacrylate oligomer (Triacrylate Oligomer), Metal Substrate acrylate oligomer (Metallic AcrylateOligomer), carbamic acid oligomer ester (Urethane Oligomer) etc.
Wherein, this modifier is the macromolecule oligomer that above-mentioned macromolecule oligomer upgrading becomes to have following one or more functional groups or functional group.This functional group or functional group comprise: hydroxyl (OH), the hydrogen cyanide base (HCN), amino (NH), isocyanate group (NCO), carboxyl (COOH), sulfydryl (SH), epoxy radicals, phenyl ring (Aromatic Ring), amide group (Amide), lipid (Ester), ammoniacum (Urethane), siloxy (Siloxane), sulfenyl (Sulfide), vinyl (Vinyl), acid anhydrides (Anhydride), urea groups (Urea), phosphate (Phosphate Ester), sulfuryl (Sulfone) etc.Certainly, this macromolecule oligomer itself has above-mentioned one or more functional groups or functional group's structure, also can increase functional group or functional group's upgrading.
Wherein, these one or more organic monomers of high molecular polymer tool are synthetic in the mode of single or copolymerization, this monomer includes but not limited to following material: acrylic acid (Acroleic Acid), methacrylic acid (Methacrylate), acrylate (Acrylic Ester), methacrylate (MethacrylateEster), or the upgrading derivatives monomer of aforementioned monomer.
Wherein, this adjuvant is mainly used in the character that changes photosensitive material, with cooperation whole production condition, and obtains good product performance and specification.Described adjuvant comprises interfacial agent, foam inhibitor, defoamer, emulsifying agent, spreading agent or has the adjuvant of above-mentioned two or more characteristic concurrently.
This interfacial agent can change the surface tension and the film forming characteristics of this photosensitive material.This interfacial agent can select to comprise and contain non-ionic interfacial agent or contain the anionic interfacial agent, be preferably contain silica alkanes interfacial agent, fluorine is interfacial agent or alkylene oxides interfacial agent.
This spreading agent is mainly used in increases the colorant dispersion stabilization, and it can preferably use following material: acrylic acid or acrylic acid upgrading series organic compound or macromolecule, ammonia ester or ammonia ester are upgrading series organic compound or macromolecule.
This foam inhibitor or defoamer are mainly used in to press down and eliminate in the photoresistance ink and produce bubble, and it can preferably use following material: contain the silica alkyl compound.
This photosensitive material also can further comprise at least a high polymer monomer, and its weight ratio scope is 30wt% and below the 30wt%, and the optimum weight ratio scope is 3 to 20wt%.
The present invention also provides a kind of manufacture method that ink-jet method is made the BM barricade of colored filter that is used for, and may further comprise the steps:
The first step: a transparency carrier is provided, and this substrate can be glass substrate.
Second step: photosensitive material of the present invention is coated this upper surface of base plate by crack formula (Slit), rotary (Spin) or crack rotary process (Slit and Spin) coating machine.
The 3rd step: the light shield that will have predetermined BM barricade pattern is located between this photosensitive material layer and an exposure machine light source, and this photosensitive material layer that exposes, and develops again.
This processing procedure can further comprise a drying process behind the coating process in second step, by drying process with the solvent evaporates in this photoresistance.
This processing procedure also can further comprise a heating processing behind the 3rd step developing manufacture process, should further solidify by some barricades.
Promptly can obtain the BM barricade that ink-jet method is used by above-mentioned steps.
With respect to prior art, the colored filter that uses this photosensitive material to make, the BM that formed contact angle is done greater than traditional material between its BM barricade and color inks, in the time of can preventing that color inks from contacting with the BM barricade, produce absorption or wetting situation, avoid different color inks between take place to mix China ink situation, in order to carrying out smoothly of processing procedure.
In addition, those skilled in the art can also do other variation in spirit of the present invention, and certainly, the variation that these are done according to spirit of the present invention all should be included in the present invention's scope required for protection.
Claims (35)
1. one kind is used for the photosensitive material that ink-jet method is made the black matric wall of colored filter, it is characterized in that comprising:
0.1 colorant to 40wt%;
1 to 95wt% solvent;
0.01 initiator to 15wt%;
0.1 to the modifier of the macromolecule oligomer of 30wt%, this modifier has following one or more functional groups or functional group: hydrogen cyanide base, isocyanate group, different hydrogen base, sulfydryl, amide group, siloxy, sulfenyl, urea groups, phosphate and sulfuryl;
The high molecular polymer that 30wt% and 30wt% are following; And
The adjuvant that 10wt% and 10wt% are following.
2. photosensitive material as claimed in claim 1 is characterized in that: the optimum weight ratio scope of this colorant is 3 to 30wt%.
3. photosensitive material as claimed in claim 1 is characterized in that: the optimum weight ratio scope of this solvent is 25 to 85wt%.
4. photosensitive material as claimed in claim 1 is characterized in that: the optimum weight ratio scope of this initiator is 0.1 to 8wt%.
5. photosensitive material as claimed in claim 1 is characterized in that: the optimum weight ratio scope of the modifier of this macromolecule oligomer is 3 to 20wt%.
6. photosensitive material as claimed in claim 1 is characterized in that: the optimum weight ratio scope of this high molecular polymer is 0.1 to 15wt%.
7. photosensitive material as claimed in claim 1 is characterized in that: the optimum weight ratio scope of this adjuvant is 0.01 to 5wt%.
8. photosensitive material as claimed in claim 1 is characterized in that: this colorant comprises dyestuff or pigment.
9. photosensitive material as claimed in claim 8 is characterized in that: this colorant is a carbon black material.
10. photosensitive material as claimed in claim 1 is characterized in that: this solvent is an organic solvent.
11. photosensitive material as claimed in claim 10 is characterized in that: this organic solvent comprises ester class, ethers, pure ethers, ketone, alcohols, polyalcohols derivant or nitrogenous series solvent.
12. photosensitive material as claimed in claim 10 is characterized in that: this organic solvent comprises methoxybutanol, isopropyl alcohol, butanols, phenmethylol, butyl ether, the ethylene glycol propyl ether, ethylene glycol butyl ether, the ethylene glycol hexyl ether, ethylene glycol phenyl ether, the ethylene glycol butyl ether acetate, the diethylene glycol methyl ether, the diethylene glycol ethylether, the diethylene glycol butyl ether, the diethylene glycol hexyl ether, the triethylene glycol methyl ether, the triethylene glycol ethylether, the triethylene glycol butyl ether, methyl proxitol, dipropylene glycol methyl ether, the tripropylene glycol methyl ether, propylene glycol methyl ether acetate, the dipropylene glycol methyl ether acetate, propylene glycol butyl ether, the dipropylene glycol butyl ether, the tripropylene glycol butyl ether, propylene glycol phenyl ether, ethyl acetate, butyl acetate, ethyl benzoate, ethoxyl ethyl propionate, acetone, MEK, methyl amylketone, methylisobutylketone, diisobutyl ketone, isophorone, cyclohexanone, 2-gives a tongue-lashing and coughs up pyridine ketone or N-methyl-2 and give a tongue-lashing and cough up pyridine ketone.
13. photosensitive material as claimed in claim 1 is characterized in that: this initiator comprises the light initiator.
14. photosensitive material as claimed in claim 13 is characterized in that: this light initiator comprises two (dimethyl amido) benzophenone, two (diethyl amido) benzophenone, methoxybenzene-two (trichloromethyl)-triazine or three (trichloromethyl) triazine.
15. photosensitive material as claimed in claim 13 is characterized in that: this light initiator comprises IRGACURE
819, IRGACURE
369, IRGACURE
2959, IRGACURE
379, IRGACURE
184, IRGACURE
784, IRGACURE
250, IRGACURE
907, IRGACURE
651, IRGACURE
OXE01, IRGACURE
OXE02, IRGACURE
500, IRGACURE
1800, IRGACURE
1000, IRGACURE
1700, DAROCURE
BP, DAROCURE
1173, CGI 242, DAROCURE
1173CGI-552, KAYACURE DETX-S, KAYACURE CTX, KAYACURE BMS, KAYACURE BP-100, Chivacure
TPO, Chivacure
TPO-L, Chivacure
200, Chivacure
107, Chivacure
184, Chivacure
284, IRGACURE
OXE02, KAYACURE DETX-S, KAYACURE CTX, KAYACURE BMS or KAYACURE BP-100.
16. photosensitive material as claimed in claim 1 is characterized in that: this macromolecule oligomer comprises organic unsaturated epoxy acrylic oligomer ester or derivatives thereof.
17. photosensitive material as claimed in claim 1 is characterized in that: this macromolecule oligomer comprises organic unsaturated amino methyl acid esters oligomer or derivatives thereof.
18. photosensitive material as claimed in claim 1 is characterized in that: this macromolecule oligomer comprises organic unsaturated polyester (UP) oligomer or derivatives thereof.
19. photosensitive material as claimed in claim 1 is characterized in that: this macromolecule oligomer comprises organic unsaturated hydrocarbon or amine upgrading epoxy acrylic oligomer ester, amine upgrading polyester acrylic oligomer ester, PBAA oligomer ester, acrylate oligomer, diacrylate oligomer ester, triacrylate oligomer, Metal Substrate acrylate oligomer or carbamic acid oligomer ester.
20. photosensitive material as claimed in claim 1 is characterized in that: this high molecular polymer is synthetic by at least a organic monomer.
21. photosensitive material as claimed in claim 20 is characterized in that: this organic monomer comprises acrylic acid, methacrylic acid, acrylate, methacrylate, or the upgrading derivatives monomer of aforementioned monomer.
22. photosensitive material as claimed in claim 1 is characterized in that: this adjuvant comprises interfacial agent.
23. photosensitive material as claimed in claim 1 is characterized in that: this adjuvant comprises foam inhibitor or defoamer.
24. photosensitive material as claimed in claim 1 is characterized in that: this adjuvant comprises emulsifying agent or spreading agent.
25. photosensitive material as claimed in claim 22 is characterized in that: this interfacial agent comprises and contains non-ionic interfacial agent.
26. photosensitive material as claimed in claim 22 is characterized in that: this adjuvant comprises and contains the anionic interfacial agent.
27. photosensitive material as claimed in claim 22 is characterized in that: this adjuvant comprises siliceous oxygen alkanes interfacial agent.
28. photosensitive material as claimed in claim 22 is characterized in that: this adjuvant comprises that fluorine-containing is interfacial agent.
29. photosensitive material as claimed in claim 22 is characterized in that: this adjuvant comprises and contains the alkylene oxides interfacial agent.
30. photosensitive material as claimed in claim 1 is characterized in that: this photosensitive material further comprises at least a high polymer monomer.
31. photosensitive material as claimed in claim 1 is characterized in that: this photosensitive material further comprises 30wt% and the following high polymer monomer of 30wt%.
32. photosensitive material as claimed in claim 31 is characterized in that: the optimum weight ratio scope of this high polymer monomer is 3 to 20wt%.
33. one kind is used for the manufacture method that ink-jet method is made the black matric wall of colored filter, may further comprise the steps:
One transparency carrier is provided;
To coat this upper surface of base plate as each described photosensitive material of claim 1 to 33 by crack formula, rotary or crack rotary process coating machine;
The light shield that will have predetermined black matric wall pattern is located between this photosensitive material layer and an exposure machine light source, and this photosensitive material layer that exposes, and develops again.
34. the manufacture method of black matric wall as claimed in claim 33 is characterized in that: further comprise a drying process behind the processing procedure being coated with the step, by drying process with the solvent evaporates in this photoresistance.
35. the manufacture method of black matric wall as claimed in claim 33 is characterized in that: behind developing manufacture process, further comprise a heating processing, should further solidify by some barricades.
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| CN2006100758005A CN101071269B (en) | 2006-05-09 | 2006-05-09 | Photographic material of black matrix wall for ink-jet mode color filter and its manufacturing method |
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| CN2006100758005A CN101071269B (en) | 2006-05-09 | 2006-05-09 | Photographic material of black matrix wall for ink-jet mode color filter and its manufacturing method |
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| CN101071269B true CN101071269B (en) | 2010-09-29 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI519581B (en) * | 2010-12-28 | 2016-02-01 | Tamura Seisakusho Kk | White hardening resin composition |
| JP5993809B2 (en) * | 2013-06-28 | 2016-09-14 | 富士フイルム株式会社 | Inkjet ink composition, ink set, and image forming method |
| KR102245394B1 (en) * | 2015-03-27 | 2021-04-28 | 도레이 카부시키가이샤 | Photosensitive resin composition for a thin film transistor, a cured film, a thin film transistor, a liquid crystal display device or an organic electroluminescent display device, a method of manufacturing a cured film, a method of manufacturing a thin film transistor, and a method of manufacturing a liquid crystal display device or an organic electroluminescent display device |
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| CN1564083A (en) * | 2004-03-26 | 2005-01-12 | 奇美实业股份有限公司 | Light sensitive resin compsn. for black matrix |
| CN1880390A (en) * | 2005-06-17 | 2006-12-20 | 鸿富锦精密工业（深圳）有限公司 | Ejection ink for colorful light filter |
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| CN1564083A (en) * | 2004-03-26 | 2005-01-12 | 奇美实业股份有限公司 | Light sensitive resin compsn. for black matrix |
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