CN101003736A - Etching liquid for preparing IT0 transparent electrodes in flat panel display - Google Patents
Etching liquid for preparing IT0 transparent electrodes in flat panel display Download PDFInfo
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- CN101003736A CN101003736A CN 200610005365 CN200610005365A CN101003736A CN 101003736 A CN101003736 A CN 101003736A CN 200610005365 CN200610005365 CN 200610005365 CN 200610005365 A CN200610005365 A CN 200610005365A CN 101003736 A CN101003736 A CN 101003736A
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- etching liquid
- inhibitor
- hcl
- etching
- transparent electrode
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Abstract
This invention provides an etching liquid for preparing indium tin oxide (ITO) transparent electrode in panel display. The etching liquid comprises: HCl, water, inhibitor and oxidant at a weight ratio of 7:1.7:(1.0-1.7):(0.09-0.12). By adding the inhibitor and oxidant, the etching liquid can etch ITO film at normal temperature with no influence to metal electrode in bus electrode. The etched ITO film has small undercutting and smooth edge. The etching liquid can improve the emission capacity of bus electrode and the image quality of panel display. In addition, the inhibitor can prevent HCl from volatilizing, thus ensures no environmental pollution.
Description
Technical field
The present invention relates to be used in a kind of flat-panel monitor prepare the required etching liquid of ito transparent electrode.
Background technology
Because the ITO film has good physical such as low-resistivity, high visible light transmissivity and high IR luminous reflectance factor, its rete is very firm, hard; Stable performances such as alkaline-resisting, heat-resisting, humidity, thereby it has been widely used in the bus electrode in liquid-crystal display, plasma display, the field-emitter display etc.If when obtaining required transparent electrode pattern, can adopt wet etching ITO film.In the literary composition " chemical stability of ITO film and etching characteristic " (coming from " vacuum " 1994 the 5th phases) of Chen Guoping, listed the characteristic of existing several etching liquids, that is: 1. adopt 37%HCl solution energy etching ITO film under the room temperature, but etching speed is slow excessively, does not meet the needs that industrialization is produced; 2. at ITO film top layer layer overlay Zn powder, adopt 8%HCl solution etching ITO film under the room temperature, its etch rate improves greatly, but this etching liquid etch rate is too fast, and etching process is difficult to control, and occurs undercutting easily, influences the ito transparent electrode quality; 3. this article points out that ideal etching liquid is with 37%HCl, 68%HNO
3Mixed in 50: 3: 50 by volume and suitably heating with distilled water, change etching speed by adjusting temperature, to adapt to the various requirement of different occasions.But etching speed is too slow under this etching liquid room temperature, if by the heating etching then etching liquid volatilize easily, cause environmental pollution, can cause the etching liquid density loss simultaneously and influence the etching speed of ITO film.
Summary of the invention
In order to overcome above-mentioned deficiency, the purpose of this invention is to provide a kind of improved etching liquid that is used for flat-panel monitor preparation ito transparent electrode, this etching liquid is not volatile, by adjusting the concentration of etching liquid, etching ITO film under the room temperature makes that the ito transparent electrode undercutting after the etching is less, neat in edge, level and smooth, thereby improve the emissive power of bus electrode greatly, improve the video picture quality of flat-panel monitor.
The objective of the invention is to realize by following technical proposals.
Etching liquid of the present invention comprises hydrochloric acid HCl and water, it is characterized in that it also comprises a certain amount of inhibitor and oxygenant, and preparing in following ratio (weight ratio) between them: HCl: H
2O: inhibitor: oxygenant=7: 1.7: 1.0～1.7: 0.09～0.12
Described inhibitor is a glycerine.
Described inhibitor is a Terpineol 350.
Described oxygenant is FeCl
3
Described oxygenant is HNO
3
Described HCl, H
2O, glycerine, FeCl
3Ratio be HCl: H
2O: glycerine: FeCl
3=7: 1.7: 1.0: 0.09
The present invention is owing to add certain inhibitor and oxygenant in etching liquid, make etching liquid etching ITO film at normal temperatures, and the ITO electrode undercutting after the etching is less, edge-smoothing is neat, do not influence simultaneously the metal electrode in the bus electrode, thereby improve the emissive power of bus electrode greatly, improve the developing quality of flat-panel monitor.In addition, owing to be subjected to the effect of inhibitor, hydrochloric acid soln is not volatile, thereby makes environment not contaminated in etching process in the present invention.
Specific embodiment
Below will be described in further detail the present invention by specific embodiment.
The present invention comprises hydrochloric acid HCl, water H
2O, inhibitor and oxygenant, HCl is a topmost composition in the etching liquid, at room temperature etching ITO film speed is slower owing to HCl, thus need to add proper amount of oxidant, as FeCl
3Or HNO
3,, thereby improve etching speed so that quicken the dissolving of ITO film; In order to prevent that HCl from volatilizing in etching process, contaminate environment can add an amount of inhibitor.To selection of inhibitors must be: density be littler than water, and viscosity ratio is bigger, can not produce corrosive nature to the electrode of wanting etching simultaneously, as Terpineol 350 or glycerine.HCl, H
2O, glycerine, FeCl
3Optimum proportion be: 7: 1.7: 1.0: 0.09.
Claims (6)
1, a kind of etching liquid that is used for flat-panel monitor preparation ito transparent electrode, it comprises hydrochloric acid HCl and water, it is characterized in that it also comprises a certain amount of inhibitor and oxygenant, and prepares in following ratio (weight ratio) between them:
HCl: H
2O: inhibitor: oxygenant=7: 1.7: 1.0～1.7: 0.09～0.12.
2, a kind of etching liquid that is used for flat-panel monitor preparation ito transparent electrode according to claim 1 is characterized in that described inhibitor is a glycerine.
3, a kind of etching liquid that is used for flat-panel monitor preparation ito transparent electrode according to claim 1 is characterized in that described inhibitor is a Terpineol 350.
4, a kind of etching liquid that is used for flat-panel monitor preparation ito transparent electrode according to claim 1 is characterized in that described oxygenant is FeCl
3
5, a kind of etching liquid that is used for flat-panel monitor preparation ito transparent electrode according to claim 1 is characterized in that described oxygenant is HNO
3
6, a kind of etching liquid that is used for flat-panel monitor preparation ito transparent electrode according to claim 1 is characterized in that described HCl, H
2O, glycerine, FeCl
3Ratio be
HCl: H
2O: glycerine: FeCl
3=7: 1.7: 1.0: 0.09.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610005365 CN101003736A (en) | 2006-01-17 | 2006-01-17 | Etching liquid for preparing IT0 transparent electrodes in flat panel display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610005365 CN101003736A (en) | 2006-01-17 | 2006-01-17 | Etching liquid for preparing IT0 transparent electrodes in flat panel display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101003736A true CN101003736A (en) | 2007-07-25 |
Family
ID=38703120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610005365 Pending CN101003736A (en) | 2006-01-17 | 2006-01-17 | Etching liquid for preparing IT0 transparent electrodes in flat panel display |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101003736A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101585662B (en) * | 2009-05-11 | 2010-12-08 | 绵阳艾萨斯电子材料有限公司 | Etching liquid for flat panel display |
| CN102585832A (en) * | 2011-12-30 | 2012-07-18 | 江阴江化微电子材料股份有限公司 | Low-tension ITO (Indium Tin Oxide) etching liquid and preparation method thereof |
| CN107574439A (en) * | 2017-08-23 | 2018-01-12 | 华能国际电力股份有限公司 | Aggressive agent that FB2 steel original austenite crystal preventions are shown, preparation method and application |
-
2006
- 2006-01-17 CN CN 200610005365 patent/CN101003736A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101585662B (en) * | 2009-05-11 | 2010-12-08 | 绵阳艾萨斯电子材料有限公司 | Etching liquid for flat panel display |
| CN102585832A (en) * | 2011-12-30 | 2012-07-18 | 江阴江化微电子材料股份有限公司 | Low-tension ITO (Indium Tin Oxide) etching liquid and preparation method thereof |
| CN107574439A (en) * | 2017-08-23 | 2018-01-12 | 华能国际电力股份有限公司 | Aggressive agent that FB2 steel original austenite crystal preventions are shown, preparation method and application |
| CN107574439B (en) * | 2017-08-23 | 2020-01-21 | 华能国际电力股份有限公司 | Etching agent for displaying original austenite grain boundary of FB2 steel, preparation method and application |
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