CN1009687B - Method of manufacturing fluorescent surface of a beam index type color crt - Google Patents
Method of manufacturing fluorescent surface of a beam index type color crtInfo
- Publication number
- CN1009687B CN1009687B CN 85107294 CN85107294A CN1009687B CN 1009687 B CN1009687 B CN 1009687B CN 85107294 CN85107294 CN 85107294 CN 85107294 A CN85107294 A CN 85107294A CN 1009687 B CN1009687 B CN 1009687B
- Authority
- CN
- China
- Prior art keywords
- layer
- fluorescent material
- metal back
- photosensitive resin
- back layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Abstract
The present invention relates to a method for manufacturing the fluorescent surface of an electron beam index type color cathode ray tube comprising a photosensitive resin layer and an index fluorescent material layer which are orderly coated on a metal bottom layer. Then, the photosensitive resin layer and the index fluorescent material layer are exposed, developed and washed away resin layers which are not developed in order to manufacture clear index fluorescent material fringes. Thereby, the clear index fluorescent fringes and the satisfactory index signals can be obtained. The situation of increasing the static pressure of flush water or prolonging the flush time is not favorable for the metal bottom layer, so the situation can be avoided in the method.
Description
The present invention relates to the manufacture method of a beam index type color CRT fluorescent surface.
The cross section of the fluorescent surface of beam index type color CRT as shown in Figure 2.Fluorescence panel 1 is made by flat glass plate, has formed black matrix b on this panel, is being arranged in order phosphor strip R, G, B corresponding to red, green and blue look between each bar black matrix.At color fluorescence bar R, G with made the metal back layer of making as of the film of aluminium 2 above the B, further make again above the bottom 2 at this and to guide fluorescence striped ID.The glass 4 of funnel shaped pipe shell 3 usefulness fusions is made sealed attachment with the edge of fluorescence panel.
In the guiding type cathode ray tube, scan the optical output signal that is obtained by electron beam to guide fluorescence striped ID, the photoelectric apparatus that for example can be arranged on the infundibulate shell detects and produces index signal, according to the position of this signal predetermined trichromatic phosphor strip R, G and B, receive burst signal again.
The fluorescent surface of such beam index type color CRT is normally made according to following method.As shown in Figure 3A, as the same with the style of the fluorescent surface of common color cathode ray tube of shadow mask type, be last layer black matrix b, color fluorescence striped R, G, B on fluorescence panel, one deck is as with the organic basic unit 5 of acrylic resin manufacturing and the metal back layer of making by vacuum evaporating aluminium 2.Thereafter, on metal back layer 2, cover the suspensoid that last layer guides fluorescent material by centrifugal method, this fluorescent material is made of polyvinyl alcohol (PVA) and the such sensitising agent of ammonium dichromate (ADC), has just formed photosensitive fluorescence resin layer 6 after the suspensoid oven dry of this fluorescent material.Then shown in Fig. 3 B, corresponding to the position of guiding fluorescence striped ID, expose and fix the position that this is exposed by photomask 7 usefulness ultraviolet 8, just obtained the guide fluorescence striped ID shown in Fig. 3 C after water washes then.
Yet in above-mentioned conventional method, because containing the guide fluorescent material suspensoid of PVA and ADC is to directly overlay on the metal back layer 2 to form photosensitive fluorescence resin layer 6, then expose and development treatment by ultraviolet ray, but fluorescent material 9 also can remain on the whole surface of metal back layer 2, so just can not be guided fluorescence striped ID clearly.Therefore that just may obtain bluring and noisy index signal, if improve the pressure of rinse solution in addition or increase the time of flushing so that thoroughly remove the residue fluorescent material 9 that exposes, but this just damages metal back layer 2 probably.
An object of the present invention is to provide a kind of method of producing beam index type color CRT, the shortcoming when this method does not have previous explained hereafter and can obtain to guide clearly the fluorescence striped.
Another object of the present invention provides a kind of method of producing beam index type color CRT, and this method does not need to increase the pressure of rinse solution or prolong the time of flushing, thereby can avoid damaging metal back layer.
Just can realize above-mentioned purpose according to the present invention, this is by means of making one deck photosensitive resin layer on the metal back layer earlier, make one deck guide fluorescence coating again on this layer, adopting the method for exposing and developing to make the method for guiding the fluorescence striped then.
According to this method of the present invention, because photosensitive resin layer has been arranged, fluorescent material layer guiding does not directly contact with metal back layer, and guide fluorescence coating useless position can with before be coated with the uncured photosensitive resin layer that covers and be removed together by exposure and process of washing.Therefore can avoid occurring unnecessary fluorescent material.
Can clearly learn characteristics of the present invention and advantage by reading detailed description of the present invention and accompanying drawing thereof.Here:
Figure 1A represents according to production stage of the present invention to 1D;
Fig. 2 represents the cross section of ordinary electronic bundle index type color CRT fluorescence panel;
Fig. 3 A is to the processing step of Fig. 3 C with the general beam index type color CRT of graphic method representation production.
The present invention now makes specific description by reference Figure 1A to Fig. 1 D.
Shown in Figure 1A, on fluorescence panel 1, successively make black matrix b, color fluorescence striped R, G, B, one deck is as with the organic layer 5 of acrylic resin manufacturing and the metal back layer of making by vacuum evaporating aluminium 2.Just formed photosensitive resin layer 10 after the light-sensitive material that is made of polyvinyl alcohol (PVA) and ammonium dichromate (ADC) by means of printed circuit technology brushing last layer on this metal back layer 2, its oven dry, this layer thickness for example is 0.5 to 1 micron.
Then shown in Figure 1B, on this photosensitive resin layer 10, also include the suspension colloid that guides fluorescent material by means of printed circuit technology brushing last layer, just form after the drying and guide fluorescence coating 11, the thickness of this fluorescence coating is 10 microns, so owing to adopt the brushing technique of printed circuit can not damage photosensitive resin layer 10.
For another example shown in Fig. 1 C, make position, carry out exposure under ultraviolet ray 8 irradiations so that curing with photomask 7 with the photosensitive resin layer 10 that guides phosphor strip ID.Exposure back and after developing this layer 10 immediately water wash, the zone that photosensitive resin layer is not exposed is rinsed out by water together with the zone of the guide fluorescence coating 11 of correspondence, has so just obtained the guide fluorescence striped ID shown in Fig. 1 D.
In the present embodiment, avoided fluorescent material layer guiding 11 to contact owing to there being photosensitive resin layer 10 with the direct of metal back layer 2, again owing to guide useless region and 10 corresponding zones that are not exposed of photosensitive resin layer of fluorescence coating 11 to be rinsed together, therefore the covering of fluorescent material layer 11 on metal back layer 2 at useless position just can be avoided in addition.
As shown in the above description, according to process of the present invention, because there is one deck photosensitive resin layer 10 centre and can make fluorescent material layer guiding 11 directly contact with metal back layer 2, in addition because to guide the useless position of fluorescence coating 11 be that uncured zone with corresponding photosensitive resin layer 10 is rinsed together, so fluorescent material just can not be as being deposited on the unlapped metal back layer 2 with common production method.So the method according to this invention just can access the clear guide fluorescence striped that defines, and obtains gratifying signal therefrom.The hydrostatic pressing that the method according to this invention just there is no need to increase the required time of flushing or increases flushing usefulness just can avoid damaging metal back layer 2 and do like this.
Those of skill in the art can be expressly understood that foregoing description is made with embodiment preferred, under the situation that does not break away from the scope of being stipulated by claims of the present invention, can also carry out variations and modifications.
Claims (3)
1, a kind of method of making the beam index type color CRT fluorescent surface,
This cathode ray tube has the fluorescent color luminescence unit and that is fixed on the face and covers thin metal layer on this unit;
This method comprises:
On said metal back layer, form one deck photosensitive resin layer;
On said photosensitive resin layer, form one deck fluorescent material layer guiding;
By a predetermined mask said resin bed is exposed;
Through developing, be fixed on the guide fluorescent material striped of the curing on the said metal back layer with formation;
Rinse out uncured resin bed and top corresponding fluorescent material layer thereof at last.
2, the method that claim 1 limited wherein before coating colour cell and metal back layer, is coated to black matrix on the said face earlier.
3, claim 1 or 2 methods that limited, wherein said metal back layer is formed by vacuum deposition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 85107294 CN1009687B (en) | 1985-09-07 | 1985-09-07 | Method of manufacturing fluorescent surface of a beam index type color crt |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 85107294 CN1009687B (en) | 1985-09-07 | 1985-09-07 | Method of manufacturing fluorescent surface of a beam index type color crt |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN85107294A CN85107294A (en) | 1987-03-25 |
| CN1009687B true CN1009687B (en) | 1990-09-19 |
Family
ID=4795559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 85107294 Expired CN1009687B (en) | 1985-09-07 | 1985-09-07 | Method of manufacturing fluorescent surface of a beam index type color crt |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1009687B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7312017B2 (en) | 2002-10-04 | 2007-12-25 | Renesas Technology Corp. | Method for burying resist and method for manufacturing semiconductor device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100932991B1 (en) * | 2003-11-29 | 2009-12-21 | 삼성에스디아이 주식회사 | Field emission display device and manufacturing method thereof |
-
1985
- 1985-09-07 CN CN 85107294 patent/CN1009687B/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7312017B2 (en) | 2002-10-04 | 2007-12-25 | Renesas Technology Corp. | Method for burying resist and method for manufacturing semiconductor device |
| CN100375237C (en) * | 2002-10-04 | 2008-03-12 | 株式会社瑞萨科技 | Slushing compound filling method and manufacturing method of semiconductor device |
| US7556916B2 (en) | 2002-10-04 | 2009-07-07 | Renesas Technology Corp. | Method for burying resist and method for manufacturing semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN85107294A (en) | 1987-03-25 |
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