CN100567589C - A kind of solution of electrochemical copper removing - Google Patents
A kind of solution of electrochemical copper removing Download PDFInfo
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- CN100567589C CN100567589C CNB2007100842796A CN200710084279A CN100567589C CN 100567589 C CN100567589 C CN 100567589C CN B2007100842796 A CNB2007100842796 A CN B2007100842796A CN 200710084279 A CN200710084279 A CN 200710084279A CN 100567589 C CN100567589 C CN 100567589C
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- copper
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- move back
- stripping
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Abstract
The present invention relates to a kind of solution of electrochemical copper removing, belong to chemical field, it is characterized in that: electrochemical copper removing solution contains complexing agent---quadrol 100g/L～300g/L, inhibiter---trolamine 40g/L～120g/L and Sodium Nitrite 50g/L～150g/L, ionogen---saltpetre 50g/L～150g/L.Its advantage is: move back copper solutions with this and carry out the stripping of copper layer and do not exist and contain Cr
6+The emission problem of waste water, matrix metal is not corroded, the current efficiency height, it is short to move back the copper time, the production efficiency height, the adjustment and the regeneration of moving back copper solutions are convenient.
Description
Technical field
The present invention relates to a kind of solution of electrochemical copper removing, belong to chemical field.
Background technology
The stripping of copper plate generally can be divided into chemical method and electrochemical process, and the chemical method of stripping copper plate mainly contains following several: 1) chromic anhydride is main method; 2) m-nitrobenzene sodium sulfonate and NaCN are method main and heating; 3) dense HNO
3Method; 4) H
2O
2The method of-ammonium citrate.Cr in these methods
6+, CN
-, harmful, dense HNO
3The tobacco contaminate environment is arranged, and easily to matrix production corrosion, and H
2O
2--the used time of copper of moving back of ammonium citrate method is long, and production efficiency is low, and stability of solution is poor, the cost height.
The electrochemical process of stripping copper plate has following several: 1) chromic anhydride is main method; 2) ammonia salt method; 3) Trisodium Citrate-NaNO
2Method.Method 1) Cr of containing is arranged
6+Waste water, country forbids the problem of discharging; Method 2), 3) though solved the problem of environment protection emission, citric acid-NaNO
2Work-ing life is short, easily matrix is produced corrosion after moving back the copper ability drop; And that the ammonia salt method of using is now moved back the current efficiency of copper solutions is low, and it is long to move back the copper time, and production efficiency is low, can not satisfy demand of practical production.
Summary of the invention
To the objective of the invention is some shortcomings of existing in the above-mentioned prior art in order overcoming, a kind of electrochemical copper removing solution of being made up of complexing agent, inhibiter and ionogen to be provided.Moving back copper solutions with this carries out the stripping of copper layer and does not exist and contain Cr
6+The emission problem of waste water, matrix metal is not corroded, the current efficiency height, it is short to move back the copper time, the production efficiency height, the adjustment and the regeneration of moving back copper solutions are convenient.
Electrochemical copper removing solution of the present invention,--quadrol 100g/L～300g/L, inhibiter--trolamine 40g/L～120g/L and Sodium Nitrite 50g/L～150g/L, ionogen--saltpetre 50g/L～150g/L that contains complexing agent.Condition when moving back copper is: room temperature, voltage 4V～10V, electric current 1A/dm
2～5A/dm
2
Quadrol is complexing agent in electrochemical copper removing solution, with the Cu of anode electrochemical dissolving generation
2+Form complex compound, and kept the stable of electrochemical copper removing solution effectively, guaranteed carrying out smoothly of electrochemical copper removing, the increase of quadrol concentration can make moves back speeding up of copper, but with the increase of quadrol content, the solution conductivity ability reduces, and the speed of moving back copper is descended.As a kind of cathodic inhibiter, the protection part base solid is not corroded trolamine in electrolytic solution.It is bigger that trolamine is led influence to the electricity of electrolytic solution, increases with trolamine content, and the solution conductivity ability significantly reduces, and makes to move back the decline of copper speed.Sodium Nitrite has dual function in electrochemical copper removing solution, the one, as the positive polarity inhibiter, the copper layer of strip part is eliminated after, protection part base solid metal is not corroded; On the other hand as conducting salt, move back the conductivity of copper solutions with improvement,, increase the conductivity that Sodium Nitrite also can improve solution under certain condition, help improving the copper speed of moving back.Saltpetre is conducting salt in electrochemical copper removing solution, and it can improve the current efficiency of electrochemical copper removing solution effectively, and within the specific limits, generally with the increase of potassium nitrate content, conductive capability obviously improves, and has improved the speed of moving back copper greatly.
Advantage of the present invention is: move back copper solutions with this and carry out the stripping of copper layer and do not exist and contain Cr
6+The emission problem of waste water, matrix metal is not corroded, the current efficiency height, it is short to move back the copper time, the production efficiency height, the adjustment and the regeneration of moving back copper solutions are convenient.
Embodiment
Embodiment 1:
Prepare the copper solutions of moving back of 2000L, add 1200L water earlier in moving back the copper groove, gradation adds 200kg Sodium Nitrite, 200kg saltpetre again, stir while adding, treat to dissolve fully the back and add 400kg quadrol, 160kg trolamine, water is mended to 2000L, and stirring gets final product.Move back copper and carry out at ambient temperature, voltage 6V, electric current 3A/dm
2Move back the copper time and adjust, till stripping totally by copper layer thickness.Protection copper plate to underproof copper plate, heat-treatment part strips, the efficient height, and stripping is clean, and matrix metal is not had corrosion.
Embodiment 2:
Prepare the copper solutions of moving back of 2000L, add 1200L water earlier in moving back the copper groove, gradation adds 100kg Sodium Nitrite, 300kg saltpetre again, stir while adding, treat to dissolve fully the back and add 200kg quadrol, 240kg trolamine, water is mended to 2000L, and stirring gets final product.Move back copper and carry out at ambient temperature, voltage 4V, electric current 5A/dm
2Move back the copper time and adjust, till stripping totally by copper layer thickness.Protection copper plate to underproof copper plate, heat-treatment part strips, the efficient height, and stripping is clean, and matrix metal is not had corrosion.
Embodiment 3:
Prepare the copper solutions of moving back of 2000L, add 1200L water earlier in moving back the copper groove, gradation adds 300kg Sodium Nitrite, 100kg saltpetre again, stir while adding, treat to dissolve fully the back and add 600kg quadrol, 80kg trolamine, water is mended to 2000L, and stirring gets final product.Move back copper and carry out at ambient temperature, voltage 10V, electric current 1A/dm
2Move back the copper time and adjust, till stripping totally by copper layer thickness.Protection copper plate to underproof copper plate, heat-treatment part strips, the efficient height, and stripping is clean, and matrix metal is not had corrosion.
Claims (1)
1, a kind of solution of electrochemical copper removing is characterized in that: electrochemical copper removing solution contains complexing agent--quadrol 100g/L～300g/L, inhibiter--trolamine 40g/L～120g/L and Sodium Nitrite 50g/L～150g/L, ionogen--saltpetre 50g/L～150g/L.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100842796A CN100567589C (en) | 2007-02-26 | 2007-02-26 | A kind of solution of electrochemical copper removing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100842796A CN100567589C (en) | 2007-02-26 | 2007-02-26 | A kind of solution of electrochemical copper removing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101054715A CN101054715A (en) | 2007-10-17 |
| CN100567589C true CN100567589C (en) | 2009-12-09 |
Family
ID=38794763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2007100842796A Active CN100567589C (en) | 2007-02-26 | 2007-02-26 | A kind of solution of electrochemical copper removing |
Country Status (1)
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| CN (1) | CN100567589C (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102234833B (en) * | 2010-04-20 | 2013-05-29 | 深圳富泰宏精密工业有限公司 | Stripping solution and method for electrolytically removing chromium carbide film |
| CN102560495A (en) * | 2011-12-16 | 2012-07-11 | 成都泛华航空仪表电器有限公司 | Coating stripping technology method for tin-nickel alloy coating |
| CN105239147A (en) * | 2015-10-01 | 2016-01-13 | 常州市奥普泰科光电有限公司 | Preparation method of environment-friendly spraying electrolysis stripping solution |
| CN105525335A (en) * | 2016-02-01 | 2016-04-27 | 无锡市雷博电子有限公司 | Electro-corrosion marking liquid and preparation method thereof |
| CN106149042A (en) * | 2016-06-24 | 2016-11-23 | 惠州市博美环保新材料有限公司 | A kind of kirsite electrolysis stripping copper agent |
| CN106167914A (en) * | 2016-06-24 | 2016-11-30 | 惠州市博美环保新材料有限公司 | A kind of magnesium alloy release agent for electrolytic |
| CN109972194A (en) * | 2019-03-28 | 2019-07-05 | 佛山市兴中达化工实业有限公司 | One kind is de- to hang agent and its application |
| CN114108067A (en) * | 2021-10-21 | 2022-03-01 | 中国航发贵州红林航空动力控制科技有限公司 | Environment-friendly alkaline chromium-free electrolytic copper removal method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4263113A (en) * | 1980-06-02 | 1981-04-21 | Sprague Electric Company | Electrochemical removal of surface copper from aluminum foil |
-
2007
- 2007-02-26 CN CNB2007100842796A patent/CN100567589C/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4263113A (en) * | 1980-06-02 | 1981-04-21 | Sprague Electric Company | Electrochemical removal of surface copper from aluminum foil |
Non-Patent Citations (6)
| Title |
|---|
| 乙二胺在电镀工业中的应用. 吴水清.电镀与精饰，第17卷第5期. 1995 |
| 乙二胺在电镀工业中的应用. 吴水清.电镀与精饰，第17卷第5期. 1995 * |
| 硝酸盐－柠檬酸盐退铜电解液. 文斯雄.电镀与精饰，第21卷第1期. 1991 |
| 硝酸盐－柠檬酸盐退铜电解液. 文斯雄.电镀与精饰，第21卷第1期. 1991 * |
| 缓蚀剂在电镀技术中的应用. 郭国才.电镀与环保，第22卷第6期. 2002 |
| 缓蚀剂在电镀技术中的应用. 郭国才.电镀与环保，第22卷第6期. 2002 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101054715A (en) | 2007-10-17 |
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