CN100545714C - Colored optical filtering substrates and manufacture method thereof - Google Patents
Colored optical filtering substrates and manufacture method thereof Download PDFInfo
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- CN100545714C CN100545714C CNB2005100807172A CN200510080717A CN100545714C CN 100545714 C CN100545714 C CN 100545714C CN B2005100807172 A CNB2005100807172 A CN B2005100807172A CN 200510080717 A CN200510080717 A CN 200510080717A CN 100545714 C CN100545714 C CN 100545714C
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Abstract
A kind of colored optical filtering substrates and manufacture method thereof, this colored optical filtering substrates comprise substrate and a plurality of color filter patterns thereon, black matrix and common electrode are set.Color filter patterns is in each pixel region that is separately positioned on the substrate.Black matrix is made of a plurality of strip pattern, and these strip patterns are arranged between the pixel region, to separate these pixel regions.And the side of each strip pattern is the edge that extends to the pixel region that is adjacent away from substrate, produces the phenomenon of stravismus light leak to avoid display.In addition, common electrode then is arranged on the substrate top, to cover these color filter patterns and black matrix.
Description
Technical field
The present invention relates to a kind of colored optical filtering substrates and manufacture method thereof, and be particularly related to a kind of colored optical filtering substrates and manufacture method thereof that good demonstration contrast or visual angle are provided.
Background technology
Multimedia society improves rapidly, is indebted to the tremendous progress of semiconductor element and display device mostly.With regard to display device, have that high image quality, space utilization efficient are good, (Liquid Crystal Display LCD) becomes the main flow in market to the LCD of low consumpting power, advantageous characteristic such as radiationless gradually.
Fig. 1 is the partial cutaway schematic of the display panel of known LCD.Please refer to Fig. 1, display panels 100 is made of active component array base board 110, colored optical filtering substrates 120 and the liquid crystal layer 130 that is arranged between two substrates.Wherein, active component array base board 110 is made of a plurality of active members 112 of lining up array and the pixel electrode 114 that couples with it.In addition, colored optical filtering substrates 120 is made of with common electrode 126 substrate 102 and black matrix 122, color filter patterns 124 disposed thereon.The manufacturing process of colored optical filtering substrates 120 below will be described.
Fig. 2 A to Fig. 2 C is followed successively by the manufacturing process sectional view of known colored optical filtering substrates.Please refer to Fig. 2 A, at first on substrate 102, form the black matrix 122 that the strip pattern (as shown in Figure 3) be staggered by many ranks is constituted, and on substrate 102, cross a plurality of pixel regions 104.Please refer to Fig. 2 B, then repeatedly be coated with and photoetching process on substrate 102, to form color filter patterns 124 respectively in these pixel regions 104, it generally includes red filter pattern R, green filter pattern G and blue filter pattern B.Afterwards, please refer to Fig. 2 C, form common electrode 126 comprehensively on substrate 102, to cover these filter pattern R, G, B and black matrix 122, this promptly finishes the manufacturing of colored optical filtering substrates 120.
Please referring again to Fig. 1, black matrix 122 can shading produce light leak (light-leakage) to avoid display panels 100, and makes display frame keep good contrast.With Fig. 1 is example, and when the light that is provided when extraneous reflected light or backlight (not shown) went out display panels 100 via the P fixed fire, the visual angle of display panels 100 was the θ degree.That is to say, when the observer with greater than the visual angle of θ degree stravismus display panels 100 time, with the contrast of finding display frame with to face the display frame contrast difference that display panels 100 seen very big.
Under above-mentioned situation, though the visual angle that can increase display panels 100 by the width w that increases black matrix 122, this kind practice can reduce the aperture opening ratio (apertureratio) of display panel 100.Therefore, how improving the shading efficient of the black matrix of colored optical filtering substrates under the situation that does not reduce aperture opening ratio, is the important topic of present display technology.
Summary of the invention
In view of this, purpose of the present invention just provides a kind of manufacture method of colored optical filtering substrates, with under the prerequisite that does not reduce aperture opening ratio, increases the shading efficient of black matrix.
Another object of the present invention provides a kind of manufacture method of colored optical filtering substrates, to produce the colored optical filtering substrates that can effectively cover light leak.
A further object of the present invention provides a kind of colored optical filtering substrates, the light leak that it can cover display effectively and is produced, and then improve the contrast of the display frame of display and the visual angle of augmentation display.
The present invention proposes a kind of manufacture method of colored optical filtering substrates, it is that the substrate with a plurality of pixel regions is provided earlier, form a plurality ofly in order to separating the strip pattern of these pixel regions then between these pixel regions, and these strip patterns promptly are to constitute black matrix on substrate.Wherein, the side of each strip pattern is the edge that extends to adjacent pixel region away from substrate.Then, in each pixel region, form color filter patterns, on substrate, form common electrode afterwards again, to cover black matrix and these color filter patterns.
In preferred embodiment of the present invention, the method that forms above-mentioned black matrix for example is to form first mask pattern earlier in each pixel region.Wherein, the top of each first mask pattern is than the narrow base of its correspondence.Then form second mask pattern on each first mask pattern, wherein the top of each second mask pattern is wideer than the bottom of its correspondence.Afterwards, on the substrate between these first mask patterns, form black matrix, and on these second mask patterns, form light shield layer simultaneously.Wherein light shield layer is and deceives matrix and separate.Then, remove light shield layer, second mask pattern and first mask pattern.
In preferred embodiment of the present invention, the depositing operation that forms above-mentioned light shield layer or black matrix for example is manufacturing process such as physical vapour deposition (PVD), plasma enhanced chemical vapor deposition, evaporation or coating.
In preferred embodiment of the present invention, the second above-mentioned mask pattern for example is to be down trapezoidal pattern.In addition, in another embodiment, the top of each second mask pattern for example has at least one and protrudes the position.
In preferred embodiment of the present invention, the method that forms the black matrix of above-mentioned colored optical filtering substrates for example is to form a plurality of auxiliary patterns earlier on substrate, wherein these auxiliary patterns are the interior substrates of this pixel region that cover correspondence respectively, and area is greater than the area of this pixel region.Then, on substrate, form light shield layer and cover these auxiliary patterns.Then, remove light shield layer and auxiliary patterns in these pixel regions, on substrate, to form black matrix.
In preferred embodiment of the present invention, the method that forms above-mentioned light shield layer for example is physical vapour deposition (PVD), plasma enhanced chemical vapor deposition, evaporation or coating etc.
In preferred embodiment of the present invention, after forming above-mentioned color filter patterns and before the formation common electrode, can also on substrate, form flatness layer, to cover these color filter patterns and black matrix.
The present invention also proposes the manufacture method of another kind of colored optical filtering substrates, and it is to form a plurality of color filter patterns earlier on substrate, and these color filter patterns expose the substrate of part.Then on the substrate that exposes, form black matrix, and cover the some of each color filter patterns.Afterwards, on substrate, form common electrode, to cover these color filter patterns and black matrix.
In preferred embodiment of the present invention, the method that forms above-mentioned black matrix for example is to form earlier to cover the light shield layer of these color filter patterns on substrate, and then removes the light shield layer on each color filter patterns, to form black matrix on substrate.
In preferred embodiment of the present invention, the method that forms above-mentioned light shield layer comprises physical vapour deposition (PVD), plasma enhanced chemical vapor deposition, evaporation or coating etc.
In preferred embodiment of the present invention, after forming above-mentioned color filter patterns and before the formation common electrode, can also on substrate, form flatness layer, to cover these color filter patterns and black matrix.
The present invention also proposes a kind of colored optical filtering substrates, and it is made of substrate, a plurality of color filter patterns, black matrix and common electrode.Wherein, be to distinguish a plurality of pixel regions are arranged on the substrate, and these color filter patterns promptly are to be separately positioned in each pixel region.Black matrix is made of a plurality of strip pattern, and these strip patterns are arranged between these pixel regions, in order to separate these pixel regions.And the side of each strip pattern is the edge that extends to the pixel region that is adjacent away from substrate.In addition, common electrode then is arranged on the substrate top, to cover these color filter patterns and black matrix.
In preferred embodiment of the present invention, above-mentioned color filter patterns for example is to comprise at least one red filter pattern, at least one green filter pattern and at least one blue filter pattern.
In preferred embodiment of the present invention, the material of above-mentioned black matrix for example is light tight metal material or the black organic material with sensing optical activity.In addition, black matrix can be single rete or composite bed.
In preferred embodiment of the present invention, above-mentioned black matrix is the some that covers each color filter patterns.
In preferred embodiment of the present invention, has angle between the side of each strip pattern of above-mentioned black matrix and the substrate less than 90 degree.
In preferred embodiment of the present invention, above-mentioned colored optical filtering substrates for example is also to comprise a plurality of protrusions, is arranged at respectively between each strip pattern and the color filter patterns.And the side of strip pattern is to be positioned on the protrusion.
In preferred embodiment of the present invention, above-mentioned colored optical filtering substrates for example is also to comprise flatness layer, is arranged between common electrode and color filter patterns, the black matrix.
The present invention mainly is in the manufacturing process of colored optical filtering substrates, and the side that constitutes the strip pattern of black matrix is designed to relative substrate and projection, produces the phenomenon of stravismus light leak to avoid display.Because this kind method needn't change the width of black matrix, thus the present invention can be under the prerequisite of the aperture opening ratio that does not influence display the visual angle of augmentation display so that display has wider visual angle and preferable contrast.
State with other purpose, feature and advantage and can become apparent on the present invention for allowing, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Fig. 1 is the partial cutaway schematic of the display panel of known LCD.
Fig. 2 A to Fig. 2 C is followed successively by the manufacturing process sectional view of known colored optical filtering substrates.
Fig. 3 is the schematic perspective view of the structure shown in Fig. 2 A.
Fig. 4 A is for finishing the schematic perspective view of the colored optical filtering substrates of deceiving matrix among the present invention's first embodiment.
Fig. 4 B to Fig. 4 C continues the manufacturing process sectional view after being followed successively by Fig. 4 A.
Fig. 5 A to Fig. 5 C is followed successively by the steps flow chart sectional view of the black matrix 410 that forms Fig. 4 A.
Fig. 6 and Fig. 7 are respectively the diagrammatic cross-section of second mask pattern among the present invention's the different embodiment.
Fig. 8 is the partial cutaway schematic of the display panels that colored optical filtering substrates constituted of utilizing the present invention's first embodiment.
Fig. 9 A to Fig. 9 D is followed successively by the manufacturing process sectional view of colored optical filtering substrates among the present invention's second embodiment.
Figure 10 is for finishing the schematic perspective view of the colored optical filtering substrates of deceiving matrix among the present invention's second embodiment.
Figure 11 is the partial cutaway schematic of the display panels that colored optical filtering substrates constituted of utilizing the present invention's second embodiment.
Figure 12 A to Figure 12 D is followed successively by the manufacturing process sectional view of colored optical filtering substrates among the present invention's the 3rd embodiment.
Figure 13 is the partial cutaway schematic of the display panels that colored optical filtering substrates constituted of utilizing the present invention's the 3rd embodiment.
The main element description of symbols
100,800: display panels
102,400,500: substrate
104,402: pixel region
110,810: active component array base board
112,812: active member
114,814: pixel electrode
120,480,550,900: colored optical filtering substrates
122,410: black matrix
124,420,510: color filter patterns
126,430: common electrode
130,830: liquid crystal layer
404: the first mask patterns
406: the second mask patterns
411,511,906: light shield layer
412,512,912: strip pattern
432: flatness layer
904: auxiliary patterns
907: protrusion
912a: side
Embodiment
The present invention forms special black matrix on colored optical filtering substrates, to improve its shading efficient.Following examples are not that the person of ordinary skill in the field can do improvement to following embodiment slightly according to the present invention's spirit, precisely because still belong to the present invention's scope in order to qualification the present invention.
First embodiment
Fig. 4 A is for finishing the schematic perspective view of the colored optical filtering substrates of deceiving matrix among the present invention's first embodiment.Fig. 4 B to Fig. 4 D continues the manufacturing process sectional view after then being followed successively by Fig. 4 A.Please refer to Fig. 4 A, the substrate 400 of distinguishing a plurality of pixel regions 402 at first is provided, and between these pixel regions 402, form a plurality of strip patterns 412, and on substrate 400, constitute black matrix 410.
It should be noted that formed color filter patterns (not shown) promptly is arranged in these pixel regions 402 in the follow-up manufacturing process.The person of ordinary skill in the field will be appreciated that, follow-up formed color filter patterns comprises red filter pattern, green filter pattern and blue filter pattern mostly, and the arrangement kenel of these filter pattern on substrate 400 can be mosaic type, triangular form, stripe or four-picture-element type, and the present invention is not limited it.And the arrangement mode of these pixel regions 402 promptly to be arrangement kenel according to the color filter patterns of follow-up formation decide, Fig. 4 A only is to be that example is represented with a kind of arrangement kenel wherein, the arrangement kenel of the present invention's pixel region is not limited to this.
In addition, the side 412a of these strip patterns 412 is the edges that extend to the pixel region 402 that is adjacent away from substrate 400, and in the present embodiment, the side 412a of strip pattern 412 for example be and substrate 400 between apart from the angle that has less than 90 degree.Below will the method that form black matrix 410 be described for embodiment.
Fig. 5 A to Fig. 5 C is followed successively by the steps flow chart sectional view of the black matrix 410 that forms Fig. 4 A.Please refer to Fig. 5 A, at first in each pixel region 402 that Fig. 4 A is indicated, form first mask pattern 404.Wherein, these first mask patterns 404 are made of photosensitive material, and the method that forms first mask pattern 404 for example is to deposit earlier one deck photosensitive material (not shown) on substrate comprehensively, and then this photosensitive material carried out photoetching process, removing the photosensitive material beyond the pixel region 402, thus each pixel region 402 in formation first mask pattern 404.Specifically, the top length of side of first mask pattern 404 is the bottom length of sides less than its correspondence.In other words, first mask pattern 404 for example is up-narrow and down-wide trapezoidal pattern.
Please refer to Fig. 5 B, then on each first mask pattern 404, form second mask pattern 406.Similarly, second mask pattern 406 is made of photosensitive material, and its formation method is similar to the formation method of first mask pattern 404.Specifically, the top length of side of these second mask patterns 406 is the bottom length of sides less than its correspondence.With present embodiment, second mask pattern 406 for example is the pattern that is down trapezoidal, and certainly, second mask pattern 406 also can be to present pattern shown in Figure 6.
What deserves to be mentioned is that in other embodiments, the present invention also can be patterned as second mask pattern 406 has the pattern that at least one protrudes position 407, as shown in Figure 7, it also can be reached and fall the identical effect of trapezoidal second mask pattern 406.
Please refer to Fig. 5 C, is that mask carries out depositing operation with second mask pattern 406 afterwards, to form light shield layer 411 on second mask pattern 406.At this moment, also can form the black matrix 410 that constitutes by many strip patterns 412 on the substrate 400 between first mask pattern 404 simultaneously.At this, light shield layer 411 and black matrix 410 are by forming in same depositing operation with a kind of material, and it for example is that sensing optical activity organic material by light tight metal material or black is constituted.What deserves to be mentioned is, in one of the present invention embodiment, can repeat depositing operation, form light shield layer 411 and black matrix 410 to utilize multilayer material.In other words, the present invention's light shield layer 411 and black matrix 410 can be single retes, can also be composite beds.
In addition, then be to decide in order to the depositing operation that forms light shield layer 411 and black matrix 410 on its material category.For instance, this depositing operation can be physical vapour deposition (PVD) (physical vapordeposition, PVD), plasma enhanced chemical vapor deposition (plasma enhance chemicalvapor deposition, PECVD), evaporation (evaporating) or coating (coating) etc.
Specifically, because second mask pattern 406 has profile wide at the top and narrow at the bottom, therefore light shield layer 411 is separated automatically with black matrix 410.Thus, as long as in next step, remove light shield layer 411, first mask pattern 404 and second mask pattern 406, can form the black matrix 410 shown in Fig. 4 A.
Please refer to Fig. 4 B, form color filter patterns 420 in each pixel region between black matrix 410, it is formed with rotary coating (spin coating) method.Please follow C, above substrate 400, form common electrode 430, to cover color filter patterns 420 and black matrix 410 with reference to Fig. 4.Wherein, the material of common electrode 430 for example is a transparent conductive oxide, as indium tin oxide (Indium Tin Oxide, ITO) or indium-zinc oxide (Indium Zinc Oxide, IZO) etc.What deserves to be mentioned is, present embodiment can also form flatness layer 432 earlier and cover color filter patterns 420 and black matrix 410 on substrate 400 before forming common electrode 420, so that the colored optical filtering substrates planarization that finally produces, and then reduce the follow-up degree of difficulty that carries out orientation work of colored optical filtering substrates.
After finishing the structure shown in Fig. 4 C, finished the manufacturing process of colored optical filtering substrates haply, follow-up substrate cut and detection manufacturing process etc. is the person of ordinary skill in the field to be known, and repeats no more herein.Below in detail the structure of the colored optical filtering substrates of finishing by above-mentioned manufacturing process will be described in detail.
Fig. 4 C is the partial cutaway schematic of the colored optical filtering substrates of the present invention's first embodiment.Please be simultaneously with reference to Fig. 4 A and Fig. 4 C, colored optical filtering substrates 480 is made of with common electrode 430 substrate 400 and setting black matrix 410, color filter patterns 420 thereon.Wherein, be to have distinguished a plurality of pixel regions 402 on the substrate 400, black matrix 410 is made of a plurality of strip pattern 412.These strip patterns 412 are arranged between the pixel region 402, in order to separate these pixel regions 402.In a preferred embodiment, the material of black matrix 410 for example is the sensing optical activity organic material of light tight metal material or black.Specifically, black matrix 410 can be single rete, also can be the composite bed that is coincided and formed by multiple material.
In addition, color filter patterns 420 is arranged in the pixel region 402, and it is described as preamble, these color filter patterns 420 for example are to comprise red filter pattern, green filter pattern and blue filter pattern, and its arrangement kenel for example is mosaic type, triangular form, stripe or four-picture-element type.The person of ordinary skill in the field will be appreciated that red filter pattern, green filter pattern and the blue filter pattern detailed arrangement position in above-mentioned various arrangement kenels, herein no longer with description of drawings it.
In addition, common electrode 430 is to be arranged at the substrate top, and covers black matrix 410 and color filter patterns 420.And in the present embodiment, colored optical filtering substrates 480 also includes flatness layer 432, is arranged between common electrode 430 and black matrix 410 and the color filter patterns 420.
Fig. 8 is the partial cutaway schematic of the display panels that colored optical filtering substrates constituted of utilizing the present invention's first embodiment.Please refer to Fig. 8, display panels 800 is made of active component array base board 810, colored optical filtering substrates 480 and the liquid crystal layer 830 that is arranged between two substrates.Wherein, active component array base board 810 is made of a plurality of active members 812 of lining up array and the pixel electrode 814 that couples with it.In the time can't penetrating display panels 800 through the q point by the light that active member 812 is controlled brightness in the display panels 800, owing to constitute the side 412a of the strip pattern 412 of black matrix is to extend toward the pixel region that is adjacent away from substrate 400, can be θ ' degree by known θ degree augmentation with the visual angle of display panels 800 therefore.And as shown in Figure 8, the width of the strip pattern 412 of black matrix is identical with the strip pattern 122 of known black matrix.In other words, the present invention's colored optical filtering substrates 480 needn't increase the shading efficient that black matrix width can improve black matrix, thus can be under the situation that does not influence aperture opening ratio the visual angle of augmentation LCD 800.More particularly, the person of ordinary skill in the field can be with the black matrix reduced width of the present invention's colored optical filtering substrates 480, with under visual angle and known identical condition, obtains better opening ratio.
Second embodiment
Fig. 9 A to Fig. 9 D is followed successively by the manufacturing process sectional view of colored optical filtering substrates among the present invention's second embodiment.It should be noted that the formed black matrix of the method for utilizing present embodiment, it is made of side extends to adjacent pixel edges away from substrate a plurality of strip pattern, and the formation method of this kind strip pattern below will be described in detail in detail.
Please refer to Fig. 9 A, the substrate 400 of distinguishing a plurality of pixel regions 402 at first is provided, and on substrate 400, form a plurality of auxiliary patterns 904.Wherein, each auxiliary patterns 904 all extends in the pixel region 402 of correspondence around the pixel region 402.That is to say that auxiliary patterns 904 is the substrates 400 that cover pixel region interior 402, and its area is the area greater than pixel region 402.
Please refer to Fig. 9 B, on substrate 400, form light shield layer 906 and cover auxiliary patterns 904.Wherein, the material of light shield layer 906 for example is similar to the light shield layer 411 of Fig. 5 C to the formation method, repeats no more herein.
Please refer to Fig. 9 C, then remove light shield layer 906 and auxiliary patterns 904 in the pixel region 402, to expose the part substrate 400 in the pixel region 402, and on substrate, form side away from substrate 400 and extend to the strip pattern 912 at adjacent pixel region 402 edges, to constitute black matrix 910, as shown in figure 10.Wherein, the auxiliary patterns that is not removed around the pixel region 402 then is to form protrusion (protrusion) 907 between the side 912a of strip pattern 912 and substrate 400.
Please refer to Fig. 9 D, after forming the black matrix 910 of Figure 10, follow-up manufacturing process is promptly described as the present invention's first embodiment, in each pixel region 402, form color filter patterns 420 earlier, and then on substrate, form flatness layer 432 and common electrode 430 in regular turn, to cover black matrix 910 and color filter patterns 420, this promptly finishes colored optical filtering substrates 900.
The main difference place of formed colored optical filtering substrates only is strip pattern different of black matrix among the present invention's second embodiment and first embodiment, and in addition formed colored optical filtering substrates is identical haply among two embodiment.Hereinafter will be illustrated at the difference place of two embodiment.
Comparison diagram 4C and Fig. 9 D can learn, among first embodiment formed strip pattern 412 its side 412a be away from substrate 400 and and substrate 400 between have angle less than 90 degree, and can extend toward adjacent pixel region 402 edges.Formed strip pattern 912 its side 912a lean against on the protrusion 907 among second embodiment, and extend to pixel region 402 edges that are adjacent.
From the above, though the strip pattern 912 of Fig. 9 D is not quite similar with the strip pattern 412 of Fig. 4 C, but all has spacing between its side and the substrate, therefore the colored optical filtering substrates 900 shown in Fig. 9 D still can be reached the effect identical with the colored optical filtering substrates 480 shown in Fig. 4 C, as shown in figure 11, it has the advantage of wide viewing angle and high contrast.
The 3rd embodiment
Figure 12 A to Figure 12 D is followed successively by the manufacturing process sectional view of colored optical filtering substrates among the present invention's the 3rd embodiment.Please refer to Figure 12 A, at first on substrate 500, form a plurality of color filter patterns 510, and the formation method of these color filter patterns 510, material and arrangement kenel etc. for example are identical with the color filter patterns 410 of first and second embodiment, repeat no more herein.In addition, for these color filter patterns 510 being precisely defined at the precalculated position on the substrate 500, can before forming color filter patterns 510, on substrate 500, make earlier contraposition mark (mark) (not shown) usually.In the present embodiment, it for example is before forming color filter patterns 510, carries out laser chemical vapor deposition technology earlier, to form alignment mark on substrate 500.On substrate 500, form color filter patterns 510 afterwards more respectively according to these marks.
Please refer to Figure 12 B, then on substrate, form one deck light shield layer 511 comprehensively, and then light shield layer 511 carried out patterning, just remove the part light shield layer 511 on the color filter patterns 510, with the strip pattern 512 shown in formation Figure 12 C, and these strip patterns 512 promptly are in order to constitute the black matrix of colored optical filtering substrates.Side 512a that it should be noted that strip pattern 512 is the some that covers color filter patterns 510.
Please refer to Figure 12 D, after forming color filter patterns 510 and black matrix on the substrate 500, follow-up manufacturing process is promptly described as first and second embodiment of the present invention, on substrate, form flatness layer 432 and common electrode 430 in regular turn, to cover black matrix and color filter patterns 420, this promptly finishes colored optical filtering substrates 550.
Please continue the D with reference to Figure 12, the side 512a of the strip pattern 512 of present embodiment is the color filter patterns 510 that covers part.Hence one can see that, and 500 of the side 512a of the strip pattern 512 of present embodiment and substrates also have spacing, so colored optical filtering substrates 550 also can reach the effect identical with the colored optical filtering substrates of above-mentioned two embodiment, as shown in figure 13.
In sum, the present invention mainly is in the manufacturing process of colored optical filtering substrates, and the side that constitutes the strip pattern of black matrix is designed to relative substrate and projection, produces the phenomenon of stravismus light leak to avoid display.Because this kind method needn't change the width of black matrix, thus the present invention can be under the prerequisite of the aperture opening ratio that does not influence display the visual angle of augmentation display so that display has wider visual angle and preferable contrast.
In addition, under identical visual angle, the black matrix width of the present invention's colored optical filtering substrates is that the black matrix width of more known colored optical filtering substrates is narrow.In other words, the present invention can dwindle the aperture opening ratio of the width of black matrix with the increase display under the situation at the visual angle that does not influence display, and then improves its demonstration usefulness.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; any person of ordinary skill in the field; without departing from the spirit and scope of the invention; when can doing a little change and improvement, thus the present invention's protection domain when with claim the person of being defined be as the criterion.
Claims (14)
1. the manufacture method of a colored optical filtering substrates comprises:
Provide substrate, and differentiation there are a plurality of pixel regions on this substrate;
In between above-mentioned these pixel regions, form a plurality of strip patterns, separate above-mentioned these pixel regions, and respectively the side of this strip pattern is to extend to the edge of stating these pixel regions on adjacent away from this substrate to constitute black matrix; The method that wherein forms this black matrix comprises:
In this pixel region respectively, form first mask pattern, wherein respectively the top of this first mask pattern than the narrow base of correspondence;
On this first mask pattern respectively, form second mask pattern, and respectively the top of this second mask pattern than wide bottom the correspondence;
Light shield layer is formed on the top at this second mask pattern respectively, and form on the substrate between above-mentioned these first mask patterns simultaneously should black matrix, should black matrix be to separate with this light shield layer wherein; And
Remove this light shield layer, above-mentioned these second mask patterns and above-mentioned these first mask patterns;
In respectively forming color filter patterns in this pixel region; And
Form common electrode in this substrate top, to cover above-mentioned these color filter patterns and should deceive matrix.
2. according to the manufacture method of the described colored optical filtering substrates of claim 1, it is characterized in that the depositing operation that forms this light shield layer or black matrix comprises physical vapour deposition (PVD), plasma enhanced chemical vapor deposition, evaporation or coating.
3. according to the manufacture method of the described colored optical filtering substrates of claim 1, it is characterized in that above-mentioned these second mask patterns are for falling trapezoidal pattern.
4. according to the manufacture method of the described colored optical filtering substrates of claim 1, it is characterized in that respectively the top of this second mask pattern has at least one protrusion position.
5. according to the manufacture method of the described colored optical filtering substrates of claim 4, it is characterized in that after forming above-mentioned these color filter patterns and before forming this common electrode, also be included on this substrate and form flatness layer, to cover above-mentioned these color filter patterns and should deceive matrix.
6. the manufacture method of a colored optical filtering substrates comprises:
Provide substrate, and differentiation there are a plurality of pixel regions on this substrate;
In between above-mentioned these pixel regions, form a plurality of strip patterns, separate above-mentioned these pixel regions, and respectively the side of this strip pattern is to extend to the edge of stating these pixel regions on adjacent away from this substrate to constitute black matrix; The method that wherein forms this black matrix comprises:
Form a plurality of auxiliary patterns on this substrate, above-mentioned these auxiliary patterns cover the interior substrate of this pixel region of correspondence respectively, and area is greater than the area of this pixel region;
On this substrate, form light shield layer and cover above-mentioned these auxiliary patterns; And
Remove this light shield layer and above-mentioned these auxiliary patterns in above-mentioned these pixel regions, should deceive matrix on this substrate, to form;
In respectively forming color filter patterns in this pixel region; And
Form common electrode in this substrate top, to cover above-mentioned these color filter patterns and should deceive matrix.
7. according to the manufacture method of the described colored optical filtering substrates of claim 6, it is characterized in that the method that forms this light shield layer comprises physical vapour deposition (PVD), plasma enhanced chemical vapor deposition, evaporation or coating.
8. colored optical filtering substrates is characterized in that comprising:
Substrate, distinguishing on this substrate has a plurality of pixel regions;
Black matrix, have a plurality of strip patterns, above-mentioned these strip patterns are arranged between above-mentioned these pixel regions, and to separate above-mentioned these pixel regions, wherein respectively the side of this strip pattern is to extend to the edge of stating these pixel regions on adjacent away from this substrate;
A plurality of color filter patterns are arranged at respectively respectively in this pixel region;
A plurality of protrusions, be arranged at respectively respectively this strip pattern and adjacent on state between these color filter patterns, and the side of above-mentioned these strip patterns is to lean against respectively on respectively this protrusion of correspondence; And
Common electrode is arranged at this substrate top, to cover above-mentioned these color filter patterns and should deceive matrix.
9. described according to Claim 8 colored optical filtering substrates is characterized in that above-mentioned these color filter patterns comprise at least one red filter pattern, at least one green filter pattern and at least one blue filter pattern.
10. described according to Claim 8 colored optical filtering substrates is characterized in that this black matrix is single rete or composite bed.
11. described according to Claim 8 colored optical filtering substrates is characterized in that the material of this black matrix comprises light tight metal material or sensing optical activity black organic material.
12. described according to Claim 8 colored optical filtering substrates is characterized in that this black matrix is to cover the respectively part of this color filter patterns.
13. described according to Claim 8 colored optical filtering substrates, the side that it is characterized in that respectively this strip pattern of this black matrix are and this substrate between have less than 90 the degree angle.
14. described according to Claim 8 colored optical filtering substrates is characterized in that also comprising flatness layer, is arranged between above-mentioned these color filter patterns, this black matrix and this common electrode.
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| CNB2005100807172A CN100545714C (en) | 2005-07-05 | 2005-07-05 | Colored optical filtering substrates and manufacture method thereof |
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|---|---|---|---|---|
| KR101329791B1 (en) * | 2007-07-16 | 2013-11-15 | 삼성디스플레이 주식회사 | Liquid crystal display |
| CN102681246B (en) * | 2012-04-12 | 2014-12-17 | 京东方科技集团股份有限公司 | Color film substrate, method for manufacturing same and liquid crystal display |
| EP3012820B1 (en) * | 2013-06-17 | 2018-04-04 | Toppan Printing Co., Ltd. | Substrate for display device, and display device using same |
| CN103513509B (en) * | 2013-10-25 | 2016-03-02 | 北京京东方光电科技有限公司 | The method for making of a kind of mask plate, substrate |
| CN104731437B (en) * | 2015-04-17 | 2017-10-17 | 京东方科技集团股份有限公司 | Touch-control display panel and preparation method thereof, display device |
-
2005
- 2005-07-05 CN CNB2005100807172A patent/CN100545714C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1892344A (en) | 2007-01-10 |
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