CN100523939C - Manufacture method of display faceplate with microlens array, display device and exposure device - Google Patents

Manufacture method of display faceplate with microlens array, display device and exposure device Download PDF

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CN100523939C
CN100523939C CNB200480031655XA CN200480031655A CN100523939C CN 100523939 C CN100523939 C CN 100523939C CN B200480031655X A CNB200480031655X A CN B200480031655XA CN 200480031655 A CN200480031655 A CN 200480031655A CN 100523939 C CN100523939 C CN 100523939C
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light
pixel
display panel
manufacture method
pixels
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CN1875315A (en
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中西浩
冈田训明
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Sharp Corp
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Sharp Corp
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Abstract

A method of producing a display panel (100) having a displaying panel (101) and a plurality of micro-lenses (107) provided on the light incident side of the displaying panel, the method comprising (a) the step of providing a displaying panel having a plurality of pixels disposed in a matrix form, that is, providing a displaying panel having a plurality of pels where each of a plurality of pixels contains a first pel (104B) for transmitting a first chromatic light and a second pel (104R(104G)) for transmitting a second chromatic light different from the first chromatic light, (b) the step of forming a photo-curing material layer (105) on one of a pair of mutually-facing main planes of the displaying panel, (c) the step of exposing the photo-curing material layer via the displaying panel, that is, curing at least part of the photo-curing material layer by light passed through at least the first pel, and (d) the step of forming a plurality of micro-lenses (107) by removing the uncured parts of a photo-curing material layer (105').

Description

Manufacture method and the display device and the exposure device of the display panel of band microlens array
Technical field
The present invention relates to manufacture method and display device and exposure device with the display panel of microlens array.
Background technology
With the liquid crystal indicator is the display device of the non-emissive type of representative, utilizes drive signal to change the transmitance (or reflectivity) of display panel usually, and modulation shines light intensity that the light source on the display panel sends and display image or literal.Such display device has the direct viewing type display device of image shown on the Direct observation display panel etc. and utilizes enlarging projections such as image that projection lens the shows display panel projection display device (projector) to the screen etc.In addition, as the display panel of the non-emissive type beyond the display panels, known have Electronic Display Panel, electrophoretype display panel, toning display panel or a PLZT display panel etc.Now, liquid crystal indicator has been widely used in monitor, projector, portable data assistance, mobile phone etc.
Liquid crystal indicator is arranged on the rectangular pixel regularly by will the driving voltage corresponding with picture signal being added to respectively, changes the optical characteristics of liquid crystal layer of each pixel and display image or literal etc.As will be independently driving voltage be added to mode on the above-mentioned pixel, simple matrix mode and active matrix mode are arranged.For the display panels of active matrix mode, on-off element must be set and be used for the distribution of drive voltage supply to pixel electrode.As on-off element, can use 3 terminal components of non-linear 2 terminal components of MIM (metal-insulator-metal) element etc. or TFT (thin film transistor (TFT)) element etc.
When strong light incided on the on-off element (particularly TFT) that is arranged at display panel, the component resistance that is in the OFF state reduced, and gave the charge discharge of pixel electric capacity charging during making alive, can not obtain the show state of appointment, so even at black state also light leak, thereby contrast reduces.
Therefore, in display panels, for example, incide on the TFT (particularly channel region), form light shield layer (being called black matrix") with liquid crystal layer on the relative subtend substrate at the TFT substrate that is provided with TFT or pixel electrode or by the TFT substrate in order to prevent light.In reflection-type liquid-crystal display device, if reflecting electrode is used as light shield layer, effective pixel area can not reduce, but, in utilizing the liquid crystal indicator that shows through light, except not seeing through TFT, grid bus and the source bus line of light, effective pixel area reduces by light shield layer is set, and reduces thereby the ratio of the total area of the relative viewing area of effective pixel area is an aperture opening ratio.
In addition, along with the height of display panels becomes more meticulous and miniaturization, such tendency is remarkable more.This is because even reduce the spacing of pixel, TFT or bus etc. are owing to the restriction of electric property or manufacturing technology etc. can not too reduce.
Particularly, in recent years as the display device of mobile apparatus such as mobile phone and the liquid crystal indicator of universal semi-transmission type, each pixel has zone (reflector space) and the zone (seeing through the zone) to see through the pattern demonstration that shows with reflective-mode, so, by reducing pel spacing, the ratio (seeing through the aperture opening ratio in zone) that sees through the total area of the regional relative viewing area of area reduces significantly.
Semitransparent liquid crystal display utilizes the light of the rear light that sees through display panels to show under dark illumination, under bright illumination, show by the light around the reflection, so, no matter brightness on every side how, can realize the demonstration that contrast is high, but when reducing through regional aperture opening ratio, brightness will reduce.
Particularly in the direct view liquid crystal display device or one-board projector that utilize in order to carry out colored the demonstration based on the absorption of the light of color filter, the utilization ratio of light (being brightness) and then reduce.
As 1 method of the utilization ratio of improving light, in projection type liquid crystal display apparatus, on display panels, be provided with to the lenticule of each pixel gathered light and improve the method practicability of the effective aperture opening ratio of display panels.Existing lenticule almost is to form in the subtend substrate of display panels, and lenticule has and is clipped in 2 layer structures between the glass plate.
Below, illustrate to have typical 2 manufacture methods of existing lenticular subtend substrate with reference to Figure 20 (a) with (b).A plurality of lenticules of correct arrangement regularly are called microlens array.
Operation (a-1)~(a-4) that the 1st manufacture method utilizes Figure 20 (a) pattern ground to show makes the substrate (microlens array substrate) with microlens array.
(a-1): the light erosion resistant agent layer on the glass substrate is formed figure.
(a-2): with the heating of patterned resist layer, cause the heat limit of collapsing, form resist layer with lenticular shape.
(a-3): carry out dry ecthing by resist layer and glass substrate, on glass substrate, form the shape of (etch-back) resist layer, obtain microlens array substrate with microlens shape.
(a-4): by adhesive linkage that cloche is bonding with the microlens array substrate that obtains, the surface of abrading glass cover obtains the subtend substrate.Form electrode or alignment films etc. as required.
Operation (b-1)~(b-4) that the 2nd manufacture method utilizes Figure 20 (b) pattern ground to show makes the subtend substrate with microlens array.
(b-1): for example utilize electron beam exposure that the light erosion resistant agent layer on the glass substrate is formed figure, thereby form resist layer with lenticular shape.With it as mask (master).
(b-2): use mask, utilize for example electrochemical plating manufacturing metal mold.
(b-3): use metal mold (stamper), lenticular shape transferred thereon to glass substrate, is obtained microlens array substrate.
(b-4): by adhesive linkage that cloche is bonding with the microlens array substrate that obtains, the surface of abrading glass cover obtains the subtend substrate.
In addition, patent documentation 1 discloses by the pixel of utilizing display panels and will be coated in the photosensitive material exposure of subtend substrate surface and pixel is integrally formed lenticular method certainly.When utilizing this method, between lenticule and pixel, can not take place to arrange and depart from, in addition, can make lenticule at low cost.
Patent documentation 1: the spy opens communique 2002-No. 62818
Summary of the invention
But patent documentation 1 described method is in order to make the photosensitive material exposure, used ultraviolet ray, so the display panel that can be applied to not have color filter (for example, the display panels that 3 board-like projector are used), still can not be applied to have the display panel of color filter.Because color filter absorbs ultraviolet ray, so, can not make ultraviolet ray irradiation photosensitive material by color filter.In fact, patent documentation 1 relates to the lenticular method of formation in having the display panel of color filter.
Stage before making display panels, promptly before forming color filter on the subtend substrate, can go up at subtend substrate (or TFT substrate) and form lenticule with said method, but, can be subjected to two substrates is pasted the influence that the aligning of operation departs from mutually, thereby will destroy a part of advantage of said method.In addition,, preferably make the thickness that forms lenticular glass substrate, still, use tens of cm by the display panels of multiaspect chamfering made less than 0.5mm in order to give full play to lenticular effect 2Above female glass substrate manufacturing should be processed when approaching by mother's glass substrate, and operational problem will take place.In addition, when forming lenticule on the TFT substrate, substrate will reach the temperature of hundreds of degree, so, can not have photosensitive material.Therefore, after making display panels (that is, mutually paste two substrates after), preferably, form lenticule with glass substrate etching or after being ground to desirable thickness.
With the display panels is the problem that example has illustrated the manufacture method of existing band microlens array display panel, and still, the problems referred to above are not limited to liquid crystal indicator, also is the common problem of other non-self-luminous display device.In addition, more than, represented to have the structure of color filter, still, be not limited thereto, for example the guest-host type liquid crystal indicator is such, and the pigment that use mixes with display medium layer (liquid crystal layer) etc. carries out the colored display device that shows and also has same problem.
The present invention finishes in view of the above problems, and purpose aims to provide on color display panel and makes lenticular method from integrating ground.
The manufacture method of band microlens array display panel of the present invention is the manufacture method with display panel and a plurality of lenticular band microlens array display panel of the light incident side that is arranged on above-mentioned display panel, it is characterized in that: comprise that (a) prepares to have the operation of the display panel that is configured to rectangular a plurality of pixels, promptly prepare above-mentioned a plurality of pixel and have the operation that comprises the 1st pixel that sees through the 1st coloured light and the 1st coloured light is shown and the display panel of a plurality of pixels of the 2nd pixel that sees through 2nd coloured light different and the 2nd coloured light is shown respectively with the 1st coloured light; (b) on a side's of the mutual relative a pair of interarea in the outside of above-mentioned display panel interarea, form the operation of photo-hardening material layer; (c) by above-mentioned display panel the light that the operation of above-mentioned photo-hardening material layer exposure, i.e. utilization see through above-mentioned the 1st pixel is at least made the subsclerotic operation of above-mentioned photo-hardening material layer; (d) form a plurality of lenticular operations by the unhardened part of removing the above-mentioned photo-hardening material layer that passes through above-mentioned exposure.
In explanation of the present invention, " pixel (pixel) " is made of a plurality of " pixel (pel) " that see through specific coloured light respectively.Typical situation is that red pixel (R pixel), green pixel (G pixel) that sees through green light that sees through red light and the blue pixel (B pixel) that sees through blue light constitute each pixel.But, the pixel that each pixel has is not limited to this example, also can be except R pixel, G pixel, B pixel, and then has a W pixel of coloured light (for example white light) through other, can have pixel, also can 1 pixel comprise a plurality of pixels that see through identical coloured light through each coloured light of C (green grass or young crops), M (magenta), Y (Huang).In this manual, the zone that sees through light in the pixel is called " peristome of pixel ".
In one embodiment, above-mentioned operation (a) is that the centre wavelength of preparing above-mentioned the 1st coloured light is the operation of the above-mentioned display panel of the shortest wavelength in the centre wavelength of the coloured light that sees through above-mentioned a plurality of pixels.
In one embodiment, above-mentioned operation (b) is that the light that forms the wavelength of the centre wavelength weak point that contrasts above-mentioned the 1st coloured light has the operation of photosensitive above-mentioned photo-hardening material layer.
Here, the centre wavelength that sees through the coloured light of pixel refers to stipulate to see through the wavelength at center of wavelength coverage of look of the visible light (more than or equal to 380nm smaller or equal to 800nm) of each pixel, for example, if red light, the interior centre wavelength of scope that then has 600nm~650nm is if green light then has the interior centre wavelength of scope of 520nm~580nm, if blue light then has the interior centre wavelength of scope of 430nm~490nm.But,, do not consider the light of transmitance relative value smaller or equal to 10% wavelength even see through in the wavelength of visible light scope of pixel yet.
In one embodiment, above-mentioned operation (c) comprises that the light that utilizes through above-mentioned the 1st pixel makes the corresponding a part of operation of hardening of above-mentioned photo-hardening material layer of above-mentioned a plurality of pixels that has respectively with above-mentioned a plurality of pixels, and above-mentioned operation (d) comprises a plurality of lenticular operation that the formation and the arrangement of above-mentioned a plurality of pixels of above-mentioned display panel are arranged accordingly.A plurality of microlens arrays can be a plurality of biconvex lens of for example arranging accordingly with the row that is arranged in rectangular a plurality of pixels respectively, also can be corresponding respectively with a plurality of pixels respectively a plurality of lenticules.In addition, also can be and be arranged in a plurality of lenticules that each pixel that rectangular a plurality of pixels have is arranged accordingly.Having in the semi-transmission type display device that sees through zone and reflector space at each pixel, also can be to see through zone (peristome of pixel) corresponding lenticule with each.In addition, a plurality of lenticules can form respectively independently lens as rectangular lens (comprising square lens), also can form a plurality of lenticules as biconvex lens.
In one embodiment, above-mentioned operation (a) is to prepare to have the operation of the above-mentioned display panel of above-mentioned the 1st pixel in above-mentioned a plurality of pixels substantial middle separately.
In one embodiment, above-mentioned operation (a) is to prepare above-mentioned a plurality of figure ropes to comprise the above-mentioned demonstration of red pixel, blue figure rope and green figure rope and the operation of plate, and above-mentioned operation (c) is to utilize the light that sees through above-mentioned blue pixel at least to make the operation of above-mentioned photo-hardening material layer part sclerosis.
In one embodiment, above-mentioned operation (b) is to form have the operation of photosensitive above-mentioned photo-hardening material layer smaller or equal to the light of the wavelength coverage of 420nm more than or equal to 380nm.
In one embodiment, above-mentioned operation (c) comprises that utilization makes the subsclerotic operation of above-mentioned photo-hardening material layer in the zone corresponding with above-mentioned red pixel, above-mentioned blue pixel and above-mentioned green pixel at least through the light of above-mentioned blue pixel.
In one embodiment, above-mentioned operation (c) is an operation of utilizing almost parallel light to expose, comprises the operation of change to the incident angle of the almost parallel light of an above-mentioned side's interarea.
In one embodiment, above-mentioned operation (c) comprises the above-mentioned almost parallel light of scanning and in order to form respectively the operation of a plurality of biconvex lens of arranging accordingly with the row that is arranged in above-mentioned rectangular a plurality of pixels.
In one embodiment, above-mentioned operation (c) comprises the above-mentioned almost parallel light of scanning and in order to form respectively and to be arranged in a plurality of lenticular operation that a plurality of pixels that above-mentioned rectangular above-mentioned a plurality of pixels have are arranged accordingly.
In one embodiment, above-mentioned operation (c) comprises the operation of the luminous intensity distribution distribution of adjusting light.
In one embodiment, above-mentioned operation (c) comprises that the photomask of the distribution of using the transmitance with appointment adjusts the operation that above-mentioned luminous intensity distribution distributes.
In one embodiment, above-mentioned lenticule has the par of no spotlight effect at the top.
In one embodiment, above-mentioned lenticule is a biconvex lens, and the size of above-mentioned par is roughly the same with the size of the peristome of the above-mentioned pixel of the optically focused direction of the relative above-mentioned biconvex lens of above-mentioned display panel or less than the size of peristome.
In one embodiment, the peristome of above-mentioned lenticule and a plurality of pixels of above-mentioned display panel is corresponding respectively, and the size of the size of above-mentioned par and the peristome of above-mentioned pixel is roughly the same or less than the size of peristome.
The manufacture method of display device of the present invention comprises the operation of the band microlens array display panel of preparing to utilize above-mentioned a certain manufacture method manufacturing and area source is disposed at the operation of the described lenticule side of above-mentioned display panel.
Display device of the present invention has band microlens array display panel that utilizes above-mentioned a certain manufacture method manufacturing and the area source that penetrates light to the above-mentioned microlens array of above-mentioned display panel.
Exposure device of the present invention is the exposure device that is used to make the photo-sensitive resin exposure, it is characterized in that: comprise the optical system that penetrates almost parallel light; Has the plummer that bears the bearing plane that is formed with above-mentioned photosensitive resin layer thing; Change the above-mentioned almost parallel light that penetrates from above-mentioned optical system incident angle control gear continuously or interimly to the incident angle of the above-mentioned bearing plane of above-mentioned plummer.Exposure device of the present invention can be applied to the manufacture method of above-mentioned band microlens array display panel.
In one embodiment, above-mentioned incident angle control gear can be by the rapid change of the appointment incident angle to above-mentioned bearing plane.The speed of above-mentioned appointment is set by the user.
In one embodiment, above-mentioned incident angle control gear can change above-mentioned speed.Above-mentioned speed can change continuously or interimly.
In one embodiment, above-mentioned incident angle control gear can change above-mentioned speed with above-mentioned incident angle relatedly interimly.
In one embodiment, above-mentioned incident angle control gear can change above-mentioned incident angle with irradiation time relatedly.
In one embodiment, above-mentioned incident angle control gear comprises that to make above-mentioned bearing plane be the mechanism that the center is rotated with a certain axle that the above-mentioned assigned direction that is exposed thing that disposes extends on above-mentioned bearing plane.
In one embodiment, above-mentioned optical system has light source portion and the reflection of light mirror portion of reflection from light source portion, and above-mentioned incident angle control gear comprises the mechanism at the above-mentioned reflection of light angle of the above-mentioned catoptron of change portion.
In one embodiment, above-mentioned incident angle control gear comprises the mechanism of the above-mentioned optical system of change with respect to the position of the above-mentioned bearing plane of above-mentioned plummer.
The method of formation microlens array of the present invention is characterised in that: use above-mentioned a certain exposure device that ray hardening resin is exposed.
The effect of invention
The manufacture method of band microlens array display panel of the present invention, use by specific coloured light (the 1st coloured light for example: photo-hardening material (ray hardening resin is typically arranged) the formation lenticule that exposes and harden blue light), so, utilize the light that sees through specific chromatic graph element to be integrally formed lenticule certainly to the pixel (or pixel) of color display panel.
Manufacturing method according to the invention uses the light through the B pixel can form lenticule with the pixel that is made of for example R, G and B pixel accordingly, perhaps, also can form the lenticule corresponding respectively with R pixel, G pixel and B pixel.
Therefore, can form lenticule, simultaneously, can dispose lenticule from integrating ground pixel or pixel with low-down cost, so, can give full play to lenticular light-focusing function, the result can make the display device that can carry out the demonstration of high brightness.In addition, disperse with this condensing angle by after the pixel by the light of lenticule optically focused, so, the effect of the angle of visibility that can be expanded.That is, the display device of direct viewing type of the present invention has the feature of high brightness, wide angle of visibility.
In addition, as the light that makes photo-hardening material sensitization (sclerosis), if utilize the light of the centre wavelength of the coloured light that sees through through the conduct in a plurality of pixels that constitute pixel for the pixel of the shortest wavelength, even the absorption of photo-hardening material (light reaction begins agent) is arranged, its influence is also very little, thereby suppresses the reduction of the color reproduction of demonstration.The typical preferred light that sees through blue pixel that uses, and the preferred light that uses the wavelength shorter than the centre wavelength (for example 450nm) of blue light.Particularly preferably use the light of wavelength of the scope of 380nm~420nm.
Description of drawings
Fig. 1 (a)~(d) is the sectional view of pattern of manufacture method that is used to illustrate the band microlens array display panels 100 of embodiments of the present invention.
Fig. 2 A is the curve map of spectrophotometric transmittance characteristics of the color filter that has of display panels 101 of expression embodiments of the present invention.
Fig. 2 B is the curve map of example of the luminous frequency spectrum of expression led light source.
Fig. 3 (a)~(c) is used to illustrate the lenticular structure of band microlens array display panels 100 of embodiments of the present invention and the mode chart of exposure process.
Fig. 4 is the mode chart of exposure method of manufacture method that is used to illustrate the band microlens array display panels of embodiments of the present invention.
Fig. 5 is the mode chart of exposure method of manufacture method that is used to illustrate the band microlens array display panels of embodiments of the present invention.
Fig. 6 (a) and (b) be the figure of structure of the exposure device of pattern ground expression embodiments of the present invention.
Fig. 7 is the figure of structure of the exposure device of pattern ground expression other embodiments of the present invention.
Fig. 8 is the figure of structure of the exposure device of pattern ground expression other embodiments of the present invention.
Fig. 9 (a) and (b) be the mode chart that is used for illustrating that the luminous intensity distribution of the light that the exposure process in the manufacture method of the band microlens array display panels of embodiments of the present invention uses distributes.
Figure 10 (a) and (b) be the figure that is used for illustrating the method that the luminous intensity distribution of the light that the exposure process of the manufacture method of the band microlens array display panels that is adjusted at embodiments of the present invention uses distributes, (a) being the mode chart of expression optical system, (b) is the mode chart of the structure of expression mask.
Figure 11 is the mode chart of the example arranged of the pixel of the band microlens array display panels of expression embodiments of the present invention.
Figure 12 is the mode chart of other examples of arranging of the pixel of the band microlens array display panels of expression embodiments of the present invention.
Figure 13 (a) and (b) be to be used to illustrate lenticular other structures of band microlens array display panels of embodiments of the present invention and the mode chart of exposure process.
Figure 14 is the curve map of spectrophotometric transmittance characteristics of other color filters of having of band microlens array display panels of expression embodiments of the present invention.
Figure 15 is the figure of structure of the liquid crystal indicator of pattern ground expression embodiments of the present invention.
Figure 16 (a) and (b) be the mode chart of the configuration example that sees through zone and reflector space of pixel of the semitransparent liquid crystal display of expression embodiments of the present invention.
Figure 17 is the figure of lenticular structure of the band microlens array display panels of pattern ground expression other embodiments of the present invention.
Figure 18 (a) and (b) be the mode chart that is used to illustrate the effect that the par is set on lenticule, the direct of travel when (a) expression is provided with the par, (b) expression is not provided with the direct of travel in par time.
Figure 19 is pattern ground expression other the figure of lenticular structure of band microlens array display panels of the present invention.
Figure 20 (a) and (b) be the mode chart that is used to illustrate existing method for manufacturing micro-lens.
Symbol description: 100 band microlens array display panels; 101 display panels; 102 TFT substrates; 103 subtend substrates; The red pixel (red color filter) of 104R; The green pixel (green color filter) of 104G; The blue pixel (blue color filter) of 104B; 105 ray hardening resin layers; 105 ', 105 " part of the sclerosis of ray hardening resin layer; 107 lenticules.
Embodiment
Below, with reference to the manufacture method of the band microlens array display panel of description of drawings embodiments of the present invention with have the liquid crystal indicator of this band microlens array display panel, still, the present invention does not limit above-mentioned manufacture method and above-mentioned liquid crystal indicator.
Below, the manufacture method of the band microlens array display panel 100 of embodiments of the present invention is described with reference to Fig. 1.Fig. 1 (a)~(d) is the sectional view of pattern of manufacture method that is used to illustrate the microlens array of embodiments of the present invention.
At first, shown in Fig. 1 (a), prepare color liquid crystal display panel 101.Here, prepare to have formed color filter 104R, the 104G of R, G and B, the display panels 101 of 104B accordingly with pixel.For simply, will be called R pixel 104R, B pixel 104B and G pixel 104G with the corresponding respectively pixel of color filter 104R, 104B and 104G.In addition, for simply, the areal map corresponding with the peristome (seeing through the zone) of each pixel is shown pixel 104R, 104G, 104B.Shown example is the substantial middle that the peristome of pixel is configured in pixel, and still, the present invention does not limit so.
Display panels 101 comprises TFT substrate 102, is formed with the subtend substrate 103 of color filter 104R, 104G and 104B.Between TFT substrate 102 and subtend substrate 103, form the liquid crystal layer (not shown) of appointment.In the liquid crystal layer side of TFT substrate 102, form and be arranged in the circuit important document (not shown)s such as pixel electrode, the TFT that is connected with pixel electrode, grid bus and source bus line that rectangular pixel is provided with accordingly.In addition, in the liquid crystal layer side of subtend substrate 103, form color filter 104R, 104G and 104B and be configured in light shield layer BM and counter electrode (not shown) between them.In addition, on TFT substrate 102 and subtend substrate 103 and face that liquid crystal layer contacts, form the alignment films (not shown) as required.
Shown in Fig. 1 (b), on the TFT of display panels 101 substrate 102, the coating light-hardening resin forms ray hardening resin layer 105.Here, use the ray hardening resin that in the wavelength coverage of 380nm~420nm, has wavelength photoreceptor.
In order to improve the cementability of ray hardening resin layer 105 and TFT substrate 102, before the coating ray hardening resin, preferably the glass surface at TFT substrate 102 applies silane coupling agent etc., with surface modification.
Below, with reference to the spectrophotometric transmittance characteristics of Fig. 2 A explanation color filter 104R, 104G, 104B.
Because near the light the 400nm sees through the pixel that is formed with color filter 104R, 104G hardly, so, even with irradiates light 106, also can make ray hardening resin sensitization (sclerosis) by the light that sees through these pixels hardly near the exposure the subtend substrate 103 side incident 400nm of display panels 101.
(particularly 380nm~420nm) has the photosensitive material layer of wavelength photoreceptor by using the short wavelength side that sees through wavelength zone at blue color filter 104B, can make photosensitive material sensitization by the light that sees through of color filter 104B, simultaneously, can form the very high lenticule of transmitance of visible range.That is, usually, photosensitive material absorbs the light of this wavelength photoreceptor, so, use when for example red (R) or green (G) being had the photo-hardening material of wavelength photoreceptor, absorb a part of light of R or B, so the color reproduction of demonstration will reduce.Same phenomenon also takes place when the situation of blue (B), still, little to the influence of color reproduction.Particularly use in the liquid crystal indicator that in for example mobile phone or PDA, digital camera etc., uses, as the luminescent spectrums such as led light source of rear light light source shown in Fig. 2 B be positioned near the light source of the long wavelength side the 420nm like that the time, use light time of the wavelength of 380nm~420nm scope can more effectively suppress the reduction of color reproduction.
Usually, almost do not have to see through color filter (pigment or pigment),, as mentioned above, must carry out rayed in the stage before forming color filter in order to use ultraviolet ray less than the light (ultraviolet ray) of the wavelength of 380nm.
See through the light of the pixel formed color filter 104B, shown in Fig. 2 A, comprise near the light the 400nm, so, when the light that sees through this pixel (blueprint element) incides on the ray hardening resin layer 105, ray hardening resin according to light quantity sensitization harden.Irradiation time one timing, distribution is hardened according to luminous intensity distribution.That is, form the distribution of hardenability.Therefore, by adjusting the distribution of light quantity (luminous intensity distribution distributes and/or irradiation time), can on the ray hardening resin layer, form the distribution of hardenability.So-called " luminous intensity distribution distribution ", incide exactly on the display panel relatively and the intensity distributions of the face normal angulation (incident angle) of display panel the light of photosensitive material layer exposure, corresponding to the incident angle of blue pixel with incoming position 1:1 to the photosensitive material layer.
Remove unhardened part if carry out development treatment, then can obtain the shape lenticule corresponding with the distribution of hardenability by ray hardening resin layer with exposure.Luminous intensity distribution distributes and can adjust with the incident angle of irradiates light by for example changing exposure.In addition, exposure is relatively moved with irradiates light and ray hardening resin layer 105.For example, can adjust the distribution of irradiation time with irradiates light by scan exposure, also can be with they applied in any combination.In addition, also can use the photomask of transmitance distribution to adjust the luminous intensity distribution distribution with appointment.In addition, exposure is incided on the ray hardening resin layer 105 by blue pixel 104B obliquely with irradiates light, can form the R pixel 104R and the corresponding lenticule (promptly corresponding lenticule) of G pixel 104G that comprise in the pixel identical with pixel with B pixel 104B, biconvex lens for example, also can form the lenticule corresponding respectively (that is, corresponding lenticule) with the peristome of each pixel with B pixel 104B, R pixel 104R and G pixel 104G.If will be configured in the substantial middle of pixel with the peristome of the pixel of irradiates light through exposure, preferably can adjust the distribution of light quantity easily.For example, the pixel of arranging symmetrically for red pixel, blue pixel and green pixel order if be center scan exposure irradiates light symmetrically with blue pixel, can be easy to form the lenticule to the shape of the center line symmetry of pixel.
Below, explanation forms the example of the biconvex lens corresponding with pixel with reference to Fig. 3 (a)~(c).Fig. 3 (a) is the planimetric map and the sectional view of the pattern ground expression part corresponding with 1 pixel of band microlens array display panel 100, has omitted subtend substrate 103.Figure (b) and (c) be the figure of the details of the exposure process (Fig. 1 (c)) that is used to illustrate the band microlens array display panel shown in the shop drawings 3 (a), Fig. 3 (b) is the sectional view along the pattern of A-A ' line of Fig. 3 (a), and Fig. 3 (c) is the sectional view along the pattern of B-B ' line of Fig. 3 (a).
Shown in Fig. 3 (a), 1 pixel of this display panel 100 is made of R pixel 104R, B pixel 104B and G pixel 104G.Around each pixel, be provided with black matrix" BM (lightproof area).Pixel is arranged in rectangular, forms row (directions X) and row (Y direction), and here, shown example is the pel spacing P of directions X XPel spacing P with the Y direction YAll be 150 μ m.To the situation of TFT type display device, it is capable parallel with grid bus to be typically line direction (directions X), and column direction (Y direction) is parallel with source bus line row (video line).
The microlens array that display panel 100 has comprises a plurality of biconvex lens 107 of arranging accordingly with the row of a plurality of pixels.Biconvex lens 107 extends at line direction (directions X), has light-gathering ability at column direction (Y direction), still, does not have light-gathering ability at line direction (directions X).
Below, with reference to Fig. 3 (b) and (c) explanation be used to form the exposure process of biconvex lens 107.
Shown in Fig. 3 (b), in the face that comprises A-A ' line, irradiates light 106 is changed into the direction of being stipulated by incident angle θ 2 to the incident direction of display panels 101 from the direction of being stipulated by incident angle θ 1, shown in Fig. 3 (c), in the face that comprises B-B ' line, from change into direction by the direction of incident angle θ 3 regulations by incident angle θ 4 regulations.That is, in the face that comprises A-A ' line, the incident angle of irradiates light 106 is changed continuously or interimly from θ 1 to θ 2, in the face that comprises B-B ' line, change continuously or interimly from θ 3 to θ 4.As exposure irradiation light 106, preferably use directional light.Exposure uses the depth of parallelism of irradiates light preferably in ± 3 °, for the lenticular shape of High Accuracy Control, preferably in ± 1 °.
At this moment, the incident angle θ 1 of irradiates light 106, θ 2 and θ 3, θ 4 are preferably set to lenticule and seamlessly form.For example, shown in Fig. 3 (b), incident angle θ 1 and θ 2 are according to the pel spacing P of display panels 101 XSuitably set with the thickness of subtend substrate 103, make central portion between adjacent pixels of light through the B pixel of adjacent pixels (point among Fig. 3 (b) is unanimity a), make with the corresponding biconvex lens of adjacent pixels between thickness identical.In addition, shown in Fig. 3 (c), incident angle θ 3 and θ 4 are according to the pel spacing P of display panels 101 YSuitably set with the thickness of subtend substrate 103, make central portion (some b in Fig. 3 (the c)) unanimity of light between adjacent pixels, form the border (central portion between adjacent pixels, the thickness of lens is the thinnest) between lens through the B pixel of adjacent pixels.
The display panels 101 here, the pel spacing P of line direction (orientation of color filter) XBe 150 μ m, with the pel spacing P of the column direction of line direction quadrature YThe physical thickness that is 150 μ m, subtend substrate 103 is 400 μ m (press air and convert, be 400/1.52=260 μ m), so θ 1 and θ 2, θ 3 and θ 4 are:
θ 1=θ 2=θ 3=θ 4=tan -1(75/260)=about 16 °
In addition, light incident obliquely (incident angle is big more) more, the irradiated area of shadow surface is big more, so exposure intensity is weak more.Therefore, above-mentioned incident angle θ 1 and θ 2 (θ 3 and θ 4) need sometimes the hardenability that should form according to ray hardening resin layer 105 distribute (lenticular shape) adjust from the angle that obtains by aforementioned calculation.
Below, the scan method of irradiates light 106 is described.Here, so-called scanning comprising exposure scanned and changed irradiates light with 2 dimensions in the zone of irradiates light 106 irradiations incident angle.In addition, just can realize scanning as long as relatively change the position relation and the angle of irradiates light 106 and ray hardening resin layer 105, so, can move the liquid crystal display 101 that is formed with ray hardening resin layer 105, also can mobile irradiates light (light source).
In the present embodiment, orientation (line direction: directions X) form the biconvex lens 107 that does not have light-gathering ability at color filter 104R, 104G, 104B, so, directions X (with A-A ' line parallel) scanned make being evenly distributed of light quantity (illumination * time), to Y direction (with B-B ' line parallel), the incident angle of irradiates light is big more, makes sweep velocity fast more, the incident angle more little normal direction of display panel (more near) makes sweep velocity slow more.For example, when the normal of the relative display panel of incident angle is scanned from-30 ° to+30 °, scan in the speed of-30 °~-10 ° angular ranges with 5 °/sec, scan in the speed of-10 °~+ 10 ° angular ranges, scan in the speed of+10 °~+ 30 ° angular ranges with 5 °/sec with 3 °/sec.
Like this, by scanning irradiates light 106 and with ray hardening resin layer 105 exposure, shown in Fig. 4 pattern ground, only can make with directions X is not had curvature the corresponding part 105 ' sclerosis of biconvex lens 107 that the Y direction is had curvature.
In addition, as making irradiates light 106 carry out method for scanning, shown in Fig. 5 pattern ground, two directions of directions X and Y direction are scanned at directions X and Y direction.Fig. 5 represents the track that the relative ray hardening resin layer 105 of regional 106a by irradiates light 106 irradiation is scanned.In addition, the incident angle of illumination light can change continuously, also can change interimly.
After exposure process, in developing procedure, by removing the unhardened part of ray hardening resin layer 105, obtain having sclerosis part 105 ' the biconvex lens 107 of shape.After developing procedure, use sclerosis part 105 ' (biconvex lens 107) of irradiates light irradiates light hardening resin layer 105 by exposing once more, and then carry out the sclerosis of ray hardening resin, make it near complete hardening state.In addition, also can simultaneously and use photo-hardening and thermmohardening.
Below, the example of the exposure device of the exposure process that is fit to be applied to above-mentioned manufacture method is described with reference to Fig. 6, Fig. 7 and Fig. 8.
The almost parallel light that the plummer of the loading end that the exposure device of the embodiments of the present invention of Fig. 6~shown in Figure 8 comprises the optical system that penetrates the almost parallel light that is used for ray hardening resin layer exposure that the interarea at display panel is formed, have the carrying display panel and changing continuously or interimly penetrates from optical system is to the incident angle control gear of the incident angle of the loading end of plummer.The incident angle control gear preferably can be by the rapid change of the appointment incident angle to loading end, and the speed of appointment is set according to incident angle and light quantity etc. by the user.
In addition, the incident angle control gear changes above-mentioned speed (variable) continuously or interimly.For example, as mentioned above, in forming lenticular a series of process,, preferably can change speed with incident angle in order to regulate light quantity relatedly interimly.By adjusting the speed that incident angle changes, can obtain the microlens shape approaching with desirable shape.
In addition, the incident angle control gear preferably can change incident angle with irradiation time relatedly.Irradiation time is controlled by the switching that for example is arranged on the shutter between optical system and the loading end, and the incident angle control gear is so that shutter becomes out the moment of state is that benchmark changes incident angle.
Exposure device shown in Fig. 6 (a) comprises the optical system (light source portion) 310 that penetrates almost parallel light, plummer 320 and the plummer control device 324 with loading end of carrying display panel 101.On the interarea of display panel 101, form ray hardening resin layer 105.The a certain axle that plummer 320 makes loading end extend with the direction of appointment in the face of the display panel 101 that disposes on the loading end of plummer 320 according to the signal from plummer control device 324 is the center rotation.But, needn't rotate fully, depict the circular arc shown in the 6C among Fig. 6 (a) as long as in the angular range of appointment, move.
Shown in Fig. 6 (b), the axle that makes loading end rotation is 6A-6A ' axle of extending in the rectangular pixel row direction of being arranged in of display panel 101 and/or at the 6B-6B ' axle that extends with the direction (being typically the pixel column direction) of its quadrature.It is that the center is rotated with 1 axle at least that plummer 320 can make loading end, and the direction that display panel 101 relative loading ends can be configured to make it in appointment is rotated.In addition, at this moment, can be configured to make turning axle to be arranged in hardening resin layer 105.
Exposure device shown in Figure 7 comprises the light source portion 310 and the photo-emission part of reflection from light source portion 310 that penetrates almost parallel light.Reflecting part comprises catoptron 332, change the mirror drive portion 334 of reflection angle θ r (equating with the incident angle θ i of catoptron) of catoptron 332 and the catoptron control part 336 of control mirror drive portion 334, and their change light is to the incident angle of the display panel on the loading end that is configured in plummer 320 101.That is, the angle on the surface (being reflecting surface) by changing catoptron 332 changes the incident angle of light to display panel 101.Catoptron 332 moves in the mode of describing the circular arc 7C shown in Fig. 7 for example and/or describe circular arc in the face perpendicular to paper.
In this exposure device, when only changing the angle of catoptron 332, not only change the incident angle of light, and change irradiation position display panel 101.Therefore, in the whole movable angular ranges of catoptron 332 for shine display panel 101 comprehensively, must make irradiation area greater than display panel 101, thereby light source portion 310 is maximized and raise the cost.In order to prevent above-mentioned situation, by be provided with change catoptron 332 with mode with the circular arc of describing 7C angle mutually interlock, make catoptron 332 to the mechanism that 7A-7A ' direction shown in Figure 7 moves, can revise the departing from of irradiation area of the variation of the angle of following catoptron 332.In the face vertical, change under the situation of angle of catoptron 332, be provided with and make the mechanism of catoptron 332 to the direction 7B vertical, 7B ' promotion with paper in the mode of describing circular arc with paper.
Exposure device shown in Figure 8 has the mechanism of the position of the loading end that changes optical system 310 relative plummers 320.Optical system 310 is according to from optical system control part 3
12 signal is for example moved by the mode of the circular arc shown in the 8C among Fig. 8 describing, and changes the incident angle of the almost parallel light that the display panel to the loading end of plummer 320 penetrates.
This exposure device is the same with exposure device shown in Figure 7, when only changing the angle of light source portion 310, not only changes the incident angle of light to display panel 101, and changes irradiation position.Therefore, 8A-8A ' direction among preferred Fig. 8 relatively or 8B, 8B ' direction change the angle and the position of light source portion 310, make it to rotate on the intermediate shaft (referring to the 6A-6A ' among Fig. 6,6B-6B ') with the display part of display panel 101 is the concentric circles at center.
Above-mentioned incident angle control gear preferably can change incident angle with irradiation time relatedly.Irradiation time (time shutter) is controlled by the switching of the shutter (not shown) between the loading end that for example is arranged on optical system (light source portion) 310 and plummer 320.Therefore, can make the on-off action and the incident angle control gear interlock of shutter.
For example, plummer is set in the position of the incident angle that becomes appointment (for example-30 °) after be benchmark so that shutter becomes out the moment of state, in the angular range till to-10 ° with the rapid change of 5 °/sec.After this, in-10 °~+ 10 ° angular range with the rapid change of 3 °/sec, in+10 °~+ 30 ° angular range with the rapid change of 5 °/sec.Arrive+30 ° the moment in incident angle, with shutter close.These a series of actions can be so that shutter becomes out the moment of state is benchmark, controls according to the time.
In addition, the incident angle control gear of the exposure device of Fig. 6~shown in Figure 8 can suitably make up.When carrying out 2 scannings with reference to Fig. 5 explanation, by incident angle control gear combination with the exposure device of Fig. 6~shown in Figure 8, can for example make 1 in 2 under the control of plummer 320, to carry out (Fig. 6), also the opposing party's axle can be carried out (Fig. 7) under the control of catoptron 332.By adopting such structure, needn't have the mechanism that makes 2 actions at 1 position, so the design of exposure device is easy.
Exposure process can carry out each display panel 101, also can the sheet that comprise a plurality of display panels 101 be carried out together.
Fig. 6~Fig. 8 represents that still, the present invention does not limit so by the example of display panel 101 with 105 exposure of hardening resin layer.For example, also can expose from hardening resin layer 105 side on the contrary.But at this moment, at the near surface of display panel 101 opposition sides of hardening resin layer 105, the mask that configuration can expose by desirable figure on hardening resin layer 105 is exposed by the light by this mask.
Above-mentioned exposure device is not limited to use ray hardening resin to form lenticular purposes, also can be widely used in the purposes with photoresist (no matter negative-type or positive type) exposure.
In the above-described embodiment, by irradiates light 106 is scanned, 105 exposure of ray hardening resin layer are become desirable microlens shape, but, make it to have the luminous intensity distribution distribution that can obtain desirable microlens shape by adjusting irradiates light 106 in advance, do not scan also and can form lenticule.In the method, can reduce the needed time of scanning, so, can form lenticule at short notice, thereby can enhance productivity.
For example, during biconvex lens 107 shown in the construction drawing 9 (b), can adjust irradiates light 106 and make it to have Fig. 9 the luminous intensity distribution shown in (a) pattern ground distributes.That is, irradiates light is had has certain intensity and the Y direction is increased along with incident angle and luminous intensity distribution that intensity weakens distributes directions X (referring to Fig. 3 (b)) in the scope of θ 1~θ 2.
For example, shown in Figure 10 (a),,, can adjust luminous intensity distribution and distribute by inserting mask 702 with the different zone of transmitance on the interim ground of this focal point (or continuously) by assembling from the light of light source 701 earlier.
As mask 702, distribute relevant with luminous intensity distribution from the light of light source 701, but, for example when making the lens of common circle, shown in Figure 10 (b), use the transmitance mask that interim ground (or continuously) changes from central area 702a to neighboring area 702b, make luminous intensity distribution distribute strong more the closer to central part through the light of mask 702.When making above-mentioned biconvex lens 107, only can adopt the light intensity of a direction (Y direction) to distribute and distribute near the strong more luminous intensity distribution of central part more.
In addition, also can be simultaneously and use the exposure of the control that also distributes based on luminous intensity distribution based on the exposure of scanning.At this moment, for example can scan, and adjustment the opposing party's luminous intensity distribution distributes in a certain direction in directions X or the Y direction.
As mentioned above, only use at column direction (Y direction) when having the biconvex lens 107 of spotlight effect to the display panel of pixel with striped arrangement, as shown in Figure 9, the intensity distributions of line direction (directions X) can be certain, so,, then must regulate luminous intensity distribution hardly and distribute if use the light source of the light that penetrates uniform luminous intensity distribution distribution, so, can control the shape of lenticule (biconvex lens) with comparalive ease.
When using biconvex lens 107, because the orientation (directions X) at color filter does not have spotlight effect, so, the effect that is improved brightness by this part lenticule will reduce, but, as shown in figure 11, the interval (W between the neighbor of display panels column direction (direction that source bus line row (video line) extends) Y) usually than the interval W between line direction (directions X) neighbor (and pixel) XWide.That is, use the lens that have a spotlight effect in the Y direction than using the lens that have a spotlight effect at directions X and improve the effect height of brightness, thereby it is less not have a reduction of the effect that the caused brightness of spotlight effect improves at directions X.
Use only when a direction has the lenticule of spotlight effect, the look of color filter is arranged the situation that is not limited to striped arrangement shown in Figure 11, for example, even the situation of oblique arrangement shown in Figure 12, according to above-mentioned identical reason, the direction that preferably makes lenticule have spotlight effect is the column direction (video line direction) of display panel.
Certainly,, be not limited to only have the biconvex lens of spotlight effect, also can make and possess the lenticular display panels that all has spotlight effect in directions X and Y direction in a direction according to embodiments of the present invention.
For example as Figure 13 (a) with (b) shown in the pattern ground, use the light that sees through blue pixel 104B, distribute with the sweep velocity or the luminous intensity distribution of irradiates light by regulating exposure as described above, can be respectively with green pixel 104G, blue pixel 104B and red pixel 104R be formed on accordingly the sclerosis part 105 that directions X and Y direction have curvature ' '.After this, through developing procedure, can obtain each pixel is formed with the microlens array that has the lenticule (for example rectangular lens) of spotlight effect in directions X and Y direction.
Exposure process also can carry out before liquid crystal material is injected display panels.But, at this moment, after injecting liquid crystal material, heat treatment step in the orientation that is used for obtaining liquid crystal material, microlens array is heated to for example hundred tens of degree, so as ray hardening resin, thereby change of shape does not take place or the resin that lenticular spotlight effect is not made a difference such as peels off in preferred the use by thermal treatment.
In addition, in the above-described embodiment, shown in Fig. 2 A, illustrated use red color filter 104R and green color filter 104G to see through near the 400nm that uses with irradiates light as exposure light hardly and only blue color filter 104B fully through near the example of the color filter of the light the 400nm, but the present invention does not limit so.
For example, even use color filter, utilize said method also can form the lenticule of designated shape with light transmission rate characteristic shown in Figure 14.That is, blue color filter 104B and red color filter 104R see through near the light time of 400nm of the usefulness of exposing, and can consider the transmitance of blue color filter 104B and red color filter 104R, adjust the luminous intensity distribution distribution of exposure with the sweep velocity and/or the adjustment illumination light of illumination light.In Figure 14, represented that the color filter of 2 looks of Lan Hehong sees through the situation of exposure light, still, even the situation of 2 blue and green looks is too, in addition, even blue, green and red all color filters are through the situation of the light of the usefulness of exposing too.
In the above-described embodiment, form microlens array, still, also can form in subtend substrate 103 sides in TFT substrate 102 sides.Certainly, the invention is not restricted to TFT type liquid crystal indicator, also can use the liquid crystal indicator of using MIM or the liquid crystal indicator that does not have the passive of on-off element.
Above-mentioned resulting band microlens array display panels 100, for example the high rear light 120 of such preferred and directive property shown in Figure 15 pattern ground is used in combination.By the high light of directive property is incided on the lenticule, can obtain high spotlight effect.
The high directivity rear light 120 of lenticule 107 sides that liquid crystal indicator 200 shown in Figure 15 comprises the display panels 100 with lenticule 107 and is configured in liquid crystal display 100.Rear light 120 comprises light source 122, accept the light guide plate 12 that makes it to propagate therein and penetrate to display panels 100 from the light that light source 122 penetrates
4 and the light that will penetrate from the back side of light guide plate 124 to the reflecting plate 126 of light guide plate 124 reflections.In Figure 15, only marked critical piece, omitted the polaroid of the front and back that are arranged on display panels 101 etc.
As the rear light that is fit to be applied to display panels 200, for example there are IDW ' 02 " Viewing Angle Control using Optical Microstructures onLight-Guide Plate for Illumination System of Mobile Transmissive LCDModule " K.KALANTAR p549-552 or spy open communique 2003-No. 35824, M.Shinohara, et al.:Optical Society of AmericanAnnual Meeting Conference Program, Vol.10, p.189 (1998), the rear light of record such as 8-No. 511129 communiques of Te Biaoping.
As mentioned above, in semitransparent liquid crystal display, the zone (peristome of pixel) that sees through light is littler than the infiltration type, so, by reducing pel spacing, the reduction of ratio (area ratio of the peristome of pixel) of gross area that sees through the area in zone and viewing area is also remarkable than infiltration type.Therefore, we can say that to use lenticule to improve the effect of effective aperture opening ratio to semitransparent liquid crystal display also big than infiltration type.The peristome of the pixel of the liquid crystal indicator of above-mentioned embodiment, also the peristome with pixel is corresponding in semitransparent liquid crystal display.But, in semitransparent liquid crystal display, the configuration of the peristome in the pixel (seeing through the zone) can have various configurations, as mentioned above, use is preferably disposed peristome (seeing through the zone) to such an extent that make the peristome (be positioned at and see through interregional lightproof area (also comprising reflector space)) at the adjacent pixel of line direction thin as far as possible when the biconvex lens that line direction extends.
For example, pixel 204 shown in Figure 16 (a) pattern ground is such, to be arranged on the central portion of pixel 204 through zone (peristome of pixel) 204t, when reflector space 204r is configured in its periphery, not only there is the source bus line row in seeing through between the regional 204t of pixel in adjacency, and have reflector space 204r, so the adjacent interval (width of lightproof area) that sees through between regional 204t broadens.In contrast, shown in Figure 16 (b) shown in the pattern ground like that, adopt when the periphery that sees through regional 204t ' is not provided with the configuration of reflector space 204r ', the width through between regional 204t ' lightproof area that preferably can be adjacent form very carefully.Typical situation see through the zone by the transparent pixels electrode regulation that forms on the TFT substrate, and reflector space is stipulated by reflective pixel electrode.
In the above-described embodiment, used display panels, still with color filter, the invention is not restricted to so, for example, as the guest-host type liquid crystal indicator, the pigment that use mixes with display medium layer (liquid crystal layer) etc. carries out the colored display device that shows and equally also can use.In addition, be not limited to display panels, also can use other non-emissive type display panels (for example electricity causes color display panel, electrophoretype display panel, toner display panel or PLZT display panel).
In addition, the par is set, can further increases lenticular brightness and improve effect by the lenticular apex of in the liquid crystal indicator of above-mentioned embodiment, using.
For example, band microlens array display panel 100 shown in Figure 17 ' have apex form the lenticule 107 of par 107 ' f ', so, can make the height of front face brightness than band microlens array display panel 100 shown in Figure 3.
As shown in figure 17, when lenticule was biconvex lens, the width of par 107 ' f was preferably roughly the same with the width of the optically focused direction of the lens of the peristome (104R, 104G, 104B) of pixel.Certainly, the width of par 107 ' f also can be littler than the width of the optically focused direction of the lens of the peristome (104R, 104G, 104B) of pixel, and still, the effect that par 107 ' f caused is set will be reduced.Here, for simply, be pixel 104R, 104G, 104B with the region representation corresponding with the peristome (seeing through the zone) of each pixel.
Like this, use 107 ' time of lenticule with par 107 ' f, shown in Figure 18 (a), the light by par 107 ' f lenticule 107 ' in do not bend and the direct peristome by pixel.Therefore, when using the rear light of the high high directivity of front face brightness, can obtain high front face brightness.On the other hand, incide lenticule 107 ' par 107 ' f beyond the light in zone (lenticule 107 ' curved face part) peristome in lenticule 107 ' middle generation refraction and by pixel.Incide lenticule 107 ' curved face part on the light that 107 ' time of lenticule got rid of by BM etc. only is not set, so, can improve the utilization ratio of light.
In contrast, use shown in Figure 3 when not having the lenticule 107 of par, though improved the utilization ratio of light, but, shown in Figure 18 (b), the high light of the depth of parallelism that penetrates from the high directivity rear light then almost all (except light) by optical axis cause bending by lenticule 107, so front face brightness more or less reduces.That is, use the raising effect of the front face brightness that the high directivity rear light brought to reduce.
Be not limited to above-mentioned example by the raising effect that the front face brightness that the par causes is set.For example, band microlens array display panel 100 as shown in figure 19 " like that, also can arrange accordingly with each pixel of display panel, two directions in length and breadth have the lenticule 107 of spotlight effect ' ' on par 107 " f are set.At this moment, the par 107, and " size of f is preferred all roughly the same with the size in length and breadth of the peristome of pixel in length and breadth.By adopting such structure, can obtain with reference to the Figure 18 (a) and (b) effect of explanation in two directions in length and breadth.At this moment, par 107 ' ' width of f can be littler than the width of the peristome of pixel, and still, effect will reduce, and this is same as described above.
Utilizability on the industry
According to the present invention, utilize the peristome (see through zone) of the pixel of transmission display panel Light forms microlens array, so, can certainly be integrally formed lenticule. Therefore, do not need Want the aligning of mask, can simplify fabrication schedule, thereby can obtain opening of lenticule and pixel The high-precision position of oral area cooperates.
According to the present invention, can improve the display unit of the low direct viewing type of the pixel aperture ratio of physics Brightness and realize wide angle of visibility. For example, can improve brightness and not reduce for example conduct movement The infiltration type that the display unit of equipment is used and the angle of visibility of semitransparent liquid crystal display. Special Be not, by being applied to see through the low semitransparent liquid crystal display of aperture opening ratio in zone, can Effectively to realize wide angle of visibility and to obtain high brightness.

Claims (17)

1. manufacture method with the microlens array display panel, this band microlens array display panel have display panel and are arranged on a plurality of lenticules of the light incident side of described display panel, it is characterized in that: comprise
(a) prepare to have the operation of the display panel that is configured to rectangular a plurality of pixels, promptly prepare described a plurality of pixel and have the operation that comprises the 1st pixel that sees through the 1st coloured light and the 1st coloured light is shown and the display panel of a plurality of pixels of the 2nd pixel that sees through 2nd coloured light different and the 2nd coloured light is shown respectively with described the 1st coloured light;
(b) on a side's of the mutual relative a pair of interarea in the outside of described display panel interarea, form the operation of photo-hardening material layer;
(c) by described display panel the light that the operation of described photo-hardening material layer exposure, i.e. utilization see through described the 1st pixel is at least made the subsclerotic operation of described photo-hardening material layer;
(d) form a plurality of lenticular operations by the unhardened part of removing the described photo-hardening material layer that passes through described exposure.
2. manufacture method according to claim 1 is characterized in that:
Described operation (a) is that the centre wavelength of preparing described the 1st coloured light is the operation of the described display panel of the shortest wavelength in the centre wavelength of the coloured light that sees through described a plurality of pixels.
3. manufacture method according to claim 1 and 2 is characterized in that:
Described operation (b) is that the light that forms for the wavelength shorter than the centre wavelength of described the 1st coloured light has the operation of photosensitive described photo-hardening material layer.
4. manufacture method according to claim 1 and 2 is characterized in that:
Described operation (c) comprises the operation that the light that utilize to see through behind described the 1st pixel partly hardens the corresponding described photo-hardening material layer of described a plurality of pixels that has separately with described a plurality of pixels,
Described operation (d) comprises and forms a plurality of lenticular operation of arranging accordingly with the arrangement of described a plurality of pixels of described display panel.
5. manufacture method according to claim 1 and 2 is characterized in that:
Described operation (a) is to prepare to have the operation of the described display panel of described the 1st pixel in described a plurality of pixels central authorities separately.
6. manufacture method according to claim 1 and 2 is characterized in that:
Described operation (a) is to prepare the operation that described a plurality of pixels comprise the described display panel of red pixel, blue pixel, green pixel,
Described operation (c) is an operation of utilizing at least the light that sees through described blue pixel that described photo-hardening material layer is partly hardened.
7. manufacture method according to claim 6 is characterized in that:
Described operation (b) is to form have the operation of photosensitive described photo-hardening material layer smaller or equal to the light of the wavelength coverage of 420nm more than or equal to 380nm.
8. manufacture method according to claim 6 is characterized in that:
Described operation (c) comprises the operation that light that utilization sees through described blue pixel at least partly hardens the described photo-hardening material layer in the zone corresponding with described red pixel, described blue pixel and described green pixel.
9. manufacture method according to claim 1 and 2 is characterized in that:
Described operation (c) is an operation of utilizing directional light to expose, comprises to change the operation of directional light to the incident angle of a described side's interarea.
10. manufacture method according to claim 9 is characterized in that:
Described operation (c) comprises the operation that described directional light is scanned and form respectively a plurality of biconvex lens of arranging accordingly with the row that is arranged in described rectangular described a plurality of pixels.
11. manufacture method according to claim 9 is characterized in that:
Described operation (c) comprises to be scanned described directional light and forms respectively and be arranged in a plurality of lenticular operation that a plurality of pixels that described rectangular described a plurality of pixels have are arranged accordingly.
12. manufacture method according to claim 1 and 2 is characterized in that:
Described operation (c) comprises the operation of the luminous intensity distribution distribution of adjusting light.
13. manufacture method according to claim 12 is characterized in that:
Described operation (c) comprises uses the photomask of the transmitance distribution with appointment to adjust the operation that described luminous intensity distribution distributes.
14. manufacture method according to claim 1 and 2 is characterized in that:
Described lenticule portion atop has the par of the spotlight effect that does not have light.
15. manufacture method according to claim 14 is characterized in that:
Described lenticule is a biconvex lens, and the size of described par is equal to or less than the size of described display panel to the peristome of the described pixel of the optically focused direction of described biconvex lens.
16. manufacture method according to claim 14 is characterized in that:
Described lenticule is corresponding respectively with the peristome of described a plurality of pixels of described display panel, and the size of described par is equal to or less than the size of the described peristome of described pixel.
17. the manufacture method of a display device is characterized in that: comprise
Preparation utilizes the operation of the band microlens array display panel that each described manufacture method is made in the claim 1~16; With
Area source is configured in the operation of the described lenticule side of described display panel.
CNB200480031655XA 2003-12-09 2004-12-08 Manufacture method of display faceplate with microlens array, display device and exposure device Expired - Fee Related CN100523939C (en)

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