CN100510970C

CN100510970C - X ray exposure machine

Info

Publication number: CN100510970C
Application number: CNB2006100988914A
Authority: CN
Inventors: 郑正元; 詹德凤; 郑奎文
Original assignee: Teco Electric and Machinery Co Ltd
Current assignee: Teco Electric and Machinery Co Ltd
Priority date: 2006-07-19
Filing date: 2006-07-19
Publication date: 2009-07-08
Anticipated expiration: 2026-07-19
Also published as: CN101109904A

Abstract

The utility model discloses an X-ray exposure machine which can be used for the exposure of the special location. Such exposure machine has a high exposure resolution and comprises an X-ray backlight source and a LCD panel. The X-ray backlight source can control the partial luminescence. The LCD panel is arranged at the outside of the X-ray backlight source for partial luminescence. The X-ray backlight source can be controlled so that the partial light area hereof can send out the X-ray. When the pixel element of the LCD panel is controlled, the intensity of X-ray can be changed as X-ray goes through the LCD panel.

Description

The X-ray exposure machine

Technical field

The present invention relates to a kind of exposure machine (exposure machine), particularly a kind of X-ray exposure machine (X-ray exposure machine).

Background technology

Photoetching technique (photo lithography) has become a kind of conventional process in the commercial production now.For the requirement of different resolution, the light that is used in the photoetching process also can have different wavelength.For example for the photoetching process of high-resolution, use usually the short ultraviolet light of wavelength (ultraviolet, UV).Yet under the more and more littler trend of live width, ultraviolet light can't reach more high-resolution requirement.Therefore, having more, short wavelength's X-ray just becomes preferable selection.

Fig. 1 shows a kind of structural representation of known X source.With reference to Fig. 1, known X source 10 comprises cathode filament (cathode filament) 11, focusing electrode 12 and anode target material 13.Cathode filament 11 is after the energising heating, and electronics will be overflowed from cathode filament 11.And it is poor to be applied with accelerating potential between cathode filament 11 and anode target material 13, and this accelerating potential difference can make the electronics of effusion quicken, to form electron beam 14.During electron beam 14 directive anode target materials 13, disperse for fear of electron beam 14, on focusing electrode 12, will apply focus voltage, so that electron beam 14 focuses on anode target material 13.After the electron beam 14 impinge anode targets 13, will cause anode target material 13 to emit X-ray 15.Then, X-ray 15 can be carried out utilization.

Irradiation area that it should be noted that X-ray 15 has fixing scope, can't only shine at the less specific region of area.Therefore, X source 10 is not suitable for directly as exposure device.

In order to reach the exposure than the zonule, known also have a kind of X source structure.Fig. 2 shows the structural representation of known another kind of X source.With reference to Fig. 2, X source 20 comprises substrate 21, conductive layer 22, a plurality of electron emission source 23, gate electrode 24, collector 25 and anode target material 26.Electronics sends from electron emission source 23, and controls the electron amount that sends by gate electrode 24.After assembling and put on accelerating potential between conductive layer 22 and the anode target material 26 and quicken through collector 25, electronics is understood impinge anode target 26, causes anode target material 26 to emit X-ray 28.Though in X source 20, make the regional area of X source 20 send X-ray 28 by the electron emission source 23 of drive part, to expose the light beam of still described X-ray 28 for dispersing.After utilizing X-ray 28 to expose, and the live width that can cause exposing (critical dimension, C.D.) excessive.In other words, the exposure resolution ratio of X source 20 (resolution) is not good.

Summary of the invention

In view of the above problems, the purpose of this invention is to provide the preferable X-ray exposure machine of a kind of exposure resolution ratio.

For reaching above-mentioned or other purposes, the present invention proposes a kind of X-ray exposure machine.Described X-ray exposure machine comprises X-ray backlight and the display panels that may command is local luminous.The local luminous X-ray backlight of may command can be controlled and send X-ray at the regional area of its light-emitting area.Display panels is disposed at the local luminous X-ray backlight outside of may command.

Description of drawings

Fig. 1 illustrates the structural representation of known a kind of X source;

Fig. 2 shows the structural representation of known another kind of X source;

Fig. 3 shows the structural representation of X-ray exposure machine according to an embodiment of the invention; And

Fig. 4 shows the structural representation of the local luminous X-ray backlight of may command.

In the accompanying drawing, the list of parts of each label representative is as follows:

10, the 20:X light source 11: cathode filament

12: focusing electrode 13,26: anode target material

14,112a: electron beam 15,28,150,150 ': X-ray

21: substrate 22: conductive layer

23: carbon nano-tube 24: gate electrode

25: collector 100:X light exposure machine

110: the X-ray backlight that may command is local luminous

112: electron beam generating device

114: target

120: display panels

130: diffuser plate

160: saturating window

Embodiment

For above-mentioned and other purposes, feature and advantage of the present invention are become apparent more, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.

Fig. 3 shows the structural representation of the X-ray exposure machine of one embodiment of the present of invention, and Fig. 4 shows the structural representation of the local luminous X-ray backlight of may command.With reference to Fig. 3, X-ray exposure machine 100 comprises X-ray backlight 110 and the display panels 120 that may command is local luminous earlier.Display panels 120 is disposed at local luminous X-ray backlight 110 outsides of may command.Wherein, the local luminous X-ray backlight 110 of may command can be controlled, and makes the regional area of its light-emitting area send X-ray 150.120 of display panels are used as light valve (lightvalve), with the intensity of control X-ray 150 by display panels 120.

In the present embodiment, also dispose window 160 between local luminous X-ray backlight 110 of may command and the display panels 120.X-ray is after passing through saturating window 160, and its intensity can be more even.In addition, X-ray exposure machine 100 also comprises diffuser plate 130.Diffuser plate 130 is configurable between may command local luminous X-ray backlight 110 and display panels 120.In Fig. 3, saturating window 160 is disposed between the local luminous X-ray backlight 110 of diffuser plate 130 and may command.The effect of diffuser plate 130 is to make the intensity of injecting the X-ray before the display panels 120 more even.

With reference to Fig. 4, in the present embodiment, the local luminous X-ray backlight 110 of may command comprises minus plate 112 and anode target material 114.Wherein, anode target material 114 corresponding minus plate 112 configurations.In order to make minus plate 112 and anode target material 114 electrical isolations, the local luminous X-ray backlight 110 of may command can comprise at least one barrier wall structure (not shown), is disposed between minus plate 112 and the anode target material 114.

Specifically, the local luminous X-ray backlight 110 of may command can send more low-energy X-ray 150.The electron beam 112a that minus plate 112 is produced is after impinge anode target 114, and anode target material 114 just can be emitted X-ray 150.The local luminous X-ray backlight 110 of may command of the present invention can be cathode-ray tube (CRT) or field emission apparatus, and the X-ray backlight 110 shown in the figure is a field emission apparatus.Display panels 120 for example is the display panels of torsion nematic liquid crystal display panel, multi-domain vertical alignment-type liquid crystal display panel, copline twist mode display panels or other suitable types.

Merit attention and be, the X-ray 150 that X-ray backlight 110 is sent is through after the effect of diffuser plate 130, and light intensity distributions can be more even, although the light beam of X-ray 150 for dispersing.In pixel (pixel) by control display panels 120, make X-ray 150 through after the polaroid and liquid crystal effect of display panels 120, can make part X-ray 150 by display panels 120.So, the degree of divergence of the X-ray 150 ' by display panels 120 will be much smaller than the degree of divergence by the X-ray 150 before the display panels 120 not.In addition, the X-ray 150 ' by display panels 120 corresponds to specific pixel.In other words, utilize the pixel of control display panels 120, can not only reach and be exposed in the specific region, more can improve exposure resolution ratio.

Be noted that though in the present embodiment, X-ray exposure machine 100 comprises diffuser plate 130 and saturating window 160.Yet, can determine whether disposing diffuser plate 130 and saturating window 160 in other embodiments according to demand.

In sum, X-ray exposure machine proposed by the invention has following advantage at least:

One, the pixel of X-ray exposure machine utilization control display panels proposed by the invention makes the part X-ray pass through display panels.With by comparing before the display panels, less by the degree of divergence of the X-ray behind the display panels, therefore can improve exposure resolution ratio.

Two, the pixel of X-ray exposure machine utilization control display panels proposed by the invention makes the part X-ray pass through display panels.And correspond to specific pixel by the X-ray of display panels.Therefore, X-ray exposure machine proposed by the invention can expose to the specific region.

Three, X-ray exposure machine proposed by the invention can directly expose to the specific region, does not need to make in addition mask.

Four, X-ray exposure machine proposed by the invention also can be used for other field except the exposure purposes that can be used for photoetching process, for example be used for industrial detection, with the defective of inspection encapsulating structure or the welding situation of circuit board etc.

The above is the preferred embodiments of the present invention only, is not so promptly limits claim of the present invention, and every other equivalence of being done within the spirit and scope of the present invention changes or modifies, and all should be included in the claim of the present invention.

Claims

1. X-ray exposure machine comprises:

The X-ray backlight that may command is local luminous, described X-ray backlight can be controlled and send X-ray at the regional area of its light-emitting area; And

Display panels, it is as light valve, and with the intensity of control X-ray by described display panels, described display panels is disposed at the emission side of the local luminous X-ray backlight of described may command.

2. X-ray exposure machine as claimed in claim 1 further comprises diffuser plate, and it is disposed between described may command local luminous the X-ray backlight and described display panels.

3. X-ray exposure machine as claimed in claim 1, wherein said display panels are any one in torsion nematic liquid crystal display panel, multi-domain vertical alignment-type liquid crystal display panel and the copline twist mode display panels.

4. X-ray exposure machine as claimed in claim 1, the local luminous X-ray backlight of wherein said may command is a field emission apparatus, described field emission apparatus further comprises barrier wall structure, minus plate and anode target material.

5. X-ray exposure machine as claimed in claim 4, wherein said barrier wall structure are disposed between described minus plate and the described anode target material, so that described minus plate and described anode target material electrical isolation.