CN100460918C - On-board reflective lens micro-stress fixture method - Google Patents
On-board reflective lens micro-stress fixture method Download PDFInfo
- Publication number
- CN100460918C CN100460918C CNB2006100431417A CN200610043141A CN100460918C CN 100460918 C CN100460918 C CN 100460918C CN B2006100431417 A CNB2006100431417 A CN B2006100431417A CN 200610043141 A CN200610043141 A CN 200610043141A CN 100460918 C CN100460918 C CN 100460918C
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- China
- Prior art keywords
- mirror
- catoptron
- picture frame
- reflection picture
- cover board
- Prior art date
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Abstract
The invention relates to a microstress clamping method of satellite mirror which has the following steps: (1) an adhesive injection hole is processed on the lateral side of a mirror frame; (2) the sizes of the mirror frame and a mirror are measured are measured; a cushion piece is processed according to the measured sizes, which makes the thicknesses of the mirror frame and the mirror be identical with each other; (3) a front cover board of the mirror and the mirror frame are combined with each other as a whole; the mirror is covered with a piece of silver paper, and then the mirror is arranged into the mirror frame; the mirror is covered with another piece of silver paper and the cushion piece in turn; the mirror is covered with a back cover board, and the back cover board is fixed up with the mirror; (4) an adhesive body is evenly poured into the adhesive injection hole on the lateral side of the mirror frame and is waited to be congealed; (5) after the surface shape of the mirror is detected to be arranged properly, the front cover board of the mirror and the sliver paper are removed out; the actual thickness of an adhesive cushion on the front cover board of the mirror is measured; a groove is processed on the front cover board of the mirror according to the actual measured value; (6) the adhesive cushion is placed into the processed groove; the front cover board and the mirror are combined with each other as a whole. The invention solves the technical problem that stress is easy to be generated in the mirror clamping method.
Description
Technical field
The present invention relates to a kind of microstress clamping method of star upper reflector.
Background technology
Conventional catoptron clamping be with catoptron bottom (non-reflecting surface) as the sticking with glue on the bottom surface of reflection picture frame of catoptron by face, and then catoptron is pushed down, and at catoptron and reflect between the picture frame and add a rubber blanket with the catoptron cover plate.Conventional this method down is feasible, but when being applied to but by many weak points: 1, adopt the method for pressing plate can produce stress, make catoptron produce distortion.2, with glue catoptron being bonded at the base plate place can be because of material expansion coefficient difference, is subjected to producing rising-heat contracting-cold after the temperature variation and causes the catoptron distortion.Can cause the mirror performance instability like this, influence image quality.
Summary of the invention
The present invention is the technical matters that is easy to generate stress of catoptron clamping method existence in the solution background technology, and a kind of microstress clamping method of star upper reflector is provided.
Technical solution of the present invention is: a kind of microstress clamping method of star upper reflector, and its special character is: this method may further comprise the steps:
1) in reflection picture frame side processing hole for injecting glue;
2) size of actual measurement reflection picture frame and catoptron makes that by pad of actual measurement dimensioned the reflection picture frame is consistent with the catoptron gauge;
3) will the catoptron front shroud, be one on the reflection picture frame, on catoptron, behind masking foil of pad catoptron packed into and reflects in the picture frame, fill up a masking foil again, add Upper gasket, cover back shroud and tighten up;
4) pour into colloid symmetrically from reflection picture frame side hole for injecting glue, treat that it solidifies;
5) after detection of reflected minute surface shape installs, catoptron front shroud and tin platinum paper are removed, measure the actual (real) thickness of the catoptron front shroud place rubber cushion of will packing into, process a groove at catoptron front shroud place by measured value;
6) rubber cushion being put into manufactured groove, will be one on front shroud and the reflection picture frame.
Said method is further comprising the steps of:
7) on back shroud, process hole for injecting glue;
8) back shroud is unclamped the taking-up pad, and then back shroud is tightened up,, treat that it solidifies from back shroud hole for injecting glue perfusion colloid.
Above-mentioned steps 1) hole for injecting glue in is two or more, and the one-tenth center is symmetricly set on reflection picture frame side.
Above-mentioned steps 5) groove topography size and rubber cushion in, groove are deeply than the little 0.05-0.08mm of rubber cushion.
Above-mentioned colloid is a 3XM glue.
The present invention has the following advantages:
1, utilization of the present invention adopts the side rotational symmetry bonding in the mode of reflection picture frame side processing hole for injecting glue, and catoptron is big or small identical with reflection picture frame abutting edge pulling force, and direction is opposite.So do not worry having stress to produce distortion, influence image quality.
2, the present invention does not stick with glue between forward and backward cover plate and catoptron and connects, and adopts rubber cushion to support, and can not cause expanding with heat and contract with cold because adhesives is different influence mirror surface and be out of shape.
3, the present invention debugs simply, makes things convenient for.
Description of drawings
Fig. 1 is the star upper reflector structural representation that utilizes method clamping of the present invention.
Embodiment
Referring to Fig. 1, the present invention specifically may further comprise the steps:
1) in reflection picture frame 3 sides processing hole for injecting glue 7;
2) size of actual measurement reflection picture frame 3 and catoptron 5 makes that by pad of actual measurement dimensioned 2 reflection picture frame 3 is consistent with catoptron 5 gauges;
3) will catoptron front shroud 6, be one on the reflection picture frame 3, on catoptron 5, behind masking foil of pad catoptron 5 packed into and reflects in the picture frame 3, fill up a masking foil again, add Upper gasket 2, cover back shroud 1 and tighten up;
4) pour into colloid symmetrically from reflection picture frame 3 side hole for injecting glue 7, treat that it solidifies;
5) after detection of reflected minute surface shape installs, catoptron front shroud 6 and tin platinum paper are removed, measure the actual (real) thickness of the catoptron front shroud 6 place's rubber cushions 4 of will packing into, process a groove at catoptron front shroud 6 places by measured value;
6) rubber cushion 4 being put into manufactured groove, will be one on front shroud 6 and the reflection picture frame 3;
7) on back shroud 1, also process hole for injecting glue;
8) back shroud 1 is unclamped taking-up pad 2, and then back shroud 1 is tightened up,, treat that it solidifies, make also to form rubber cushion between back shroud 1 and the catoptron 5 from back shroud 1 hole for injecting glue perfusion colloid.
Hole for injecting glue 7 in the step 1) is two or more, and the one-tenth center is symmetricly set on reflection picture frame 3 sides.
Groove topography size and rubber cushion in the step 5), groove be deeply than the little 0.05-0.08mm of rubber cushion, as: rubber cushion is 0.5mm, and then groove depth is 0.42-0.45mm.
Claims (3)
1. the microstress clamping method of a star upper reflector, it is characterized in that: this method may further comprise the steps:
1) in reflection picture frame side processing hole for injecting glue, described hole for injecting glue is a plurality of, and the one-tenth center is symmetricly set on reflection picture frame side;
2) size of actual measurement reflection picture frame and catoptron makes that by pad of actual measurement dimensioned the reflection picture frame is consistent with the catoptron gauge;
3) will the catoptron front shroud, be one on the reflection picture frame, on catoptron, behind masking foil of pad catoptron packed into and reflects in the picture frame, fill up a masking foil again, add Upper gasket, cover back shroud and tighten up;
4) pour into colloid symmetrically from reflection picture frame side hole for injecting glue, treat that it solidifies;
5) whether the detection of reflected mirror installs, and after installing, catoptron front shroud and tin platinum paper is removed, and measures the actual (real) thickness of the catoptron front shroud place rubber cushion of will packing into, processes a groove by measured value at catoptron front shroud place;
6) rubber cushion being put into manufactured groove, will be one on front shroud and the reflection picture frame.
2. the microstress clamping method of a kind of star upper reflector according to claim 1 is characterized in that: this method is further comprising the steps of:
7) on back shroud, process hole for injecting glue;
8) back shroud is unclamped the taking-up pad, and then back shroud is tightened up,, treat that it solidifies from back shroud hole for injecting glue perfusion colloid.
3. the microstress clamping method of a kind of star upper reflector according to claim 2 is characterized in that: the depth of groove in the described step 5) is than the little 0.05-0.08mm of thickness of rubber cushion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100431417A CN100460918C (en) | 2006-07-11 | 2006-07-11 | On-board reflective lens micro-stress fixture method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100431417A CN100460918C (en) | 2006-07-11 | 2006-07-11 | On-board reflective lens micro-stress fixture method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101105573A CN101105573A (en) | 2008-01-16 |
| CN100460918C true CN100460918C (en) | 2009-02-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100431417A Expired - Fee Related CN100460918C (en) | 2006-07-11 | 2006-07-11 | On-board reflective lens micro-stress fixture method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100460918C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103353665B (en) * | 2013-07-08 | 2015-09-09 | 中国科学院空间科学与应用研究中心 | A kind of high face shape catoptron microstress stationary installation |
| CN106200221A (en) * | 2015-04-29 | 2016-12-07 | 江苏宜清光电科技有限公司 | A kind of reflective dust-proof projector |
| CN109343198B (en) * | 2018-11-07 | 2021-01-05 | 西安应用光学研究所 | Microstress bonding assembly method for large-caliber aspheric reflector |
| CN109597180A (en) * | 2018-12-29 | 2019-04-09 | 深圳航星光网空间技术有限公司 | A kind of connection structure of primary mirror component |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030137755A1 (en) * | 2002-01-18 | 2003-07-24 | Fan-Chieh Chang | Fixture for Reflection Mirror |
| JP2004013010A (en) * | 2002-06-10 | 2004-01-15 | Mitsubishi Electric Corp | Reflector for optical instrument loaded on satellite |
| CN1499234A (en) * | 2002-11-06 | 2004-05-26 | ���ݵ��Թɷ�����˾ | Device for fixing reflecting mirror in tensile stress |
-
2006
- 2006-07-11 CN CNB2006100431417A patent/CN100460918C/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030137755A1 (en) * | 2002-01-18 | 2003-07-24 | Fan-Chieh Chang | Fixture for Reflection Mirror |
| JP2004013010A (en) * | 2002-06-10 | 2004-01-15 | Mitsubishi Electric Corp | Reflector for optical instrument loaded on satellite |
| CN1499234A (en) * | 2002-11-06 | 2004-05-26 | ���ݵ��Թɷ�����˾ | Device for fixing reflecting mirror in tensile stress |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101105573A (en) | 2008-01-16 |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090211 Termination date: 20110711 |