CN100451734C - Human eyes high order optical aberration orthopraxy method - Google Patents
Human eyes high order optical aberration orthopraxy method Download PDFInfo
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- CN100451734C CN100451734C CNB2004100091153A CN200410009115A CN100451734C CN 100451734 C CN100451734 C CN 100451734C CN B2004100091153 A CNB2004100091153 A CN B2004100091153A CN 200410009115 A CN200410009115 A CN 200410009115A CN 100451734 C CN100451734 C CN 100451734C
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Abstract
The present invention relates to a method for correcting the high order aberration of human eyes. The present invention is characterized in that the method comprises the following steps: (1) accurately measuring the aberrations of various orders with a device for measuring the aberrations of human eyes to obtain the aberration data of human eyes; (2) carrying out the optimum design of an aberration correcting function according to the aberration data of human eyes; (3) designing a photoetched mask according to the designed aberration correcting function for human eyes and manufacturing a mask plate according to the design; (4) exposing a resist by adopting the manufactured mask so that a micro-embossing structure made of the resist can be obtained after the manufactured mask is developed; (5) using the microstructure as a mother plate and transferring the microstructure to the surfaces of contact lenses suitable for human eyes to wear by adopting a replication technique. The present invention can be used not only for correcting the low order aberration of human eyes but also for correcting the high order aberration of human eyes and improving the visual effect, and is especially suitable for myopia, presbyopia, astigmia and other complication conditions.
Description
Affiliated technical field
The present invention relates to a kind of new method that adopts micro optical element that the human eye higher order aberratons is corrected.
Background technology
Myopia is the problem that a lot of people of current society can run into.Owing to working and learning, in very little, just caused the myopia of eyes, and with advancing age, eyes also will run into more problem, produce more complicated variation, as the most common presbyopic that arrives, astigmatism etc.It optically mainly is because complicated deformation has taken place some tissue of eyes that these problems embody, thereby has produced the reason of serious aberration.
In order to give original bright visual effect for change, people have thought that very early various ways correct human eye aberration.By wearing hard, soft glasses, though perhaps can correct the low order aberration of eyes by operative treatment.But up to the present still can't well correct for the higher order aberratons of eyes, particularly under the various problems such as myopia, long sight and astigmatism and the situation of depositing, it is powerless that classic method more seems.
Both at home and abroad the someone begins that human eye aberration is measured and higher order aberratons influences the research of aspect to human eye vision very early, as the David Williams ' labrary of Rochester university and the deep research of people such as Junzhong Liang process of Heidelberg university, think that higher order aberratons has vital role to improving the human eye vision effect.The equipment that can accurately measure the human eye higher order aberratons has also been produced in Photoelectric Technology Inst., Chinese Academy of Sciences adaptive optics laboratory, for correction for higher order aberrations is laid a good foundation.
Aspect the human eye correction for higher order aberrations, people such as Rafael Navarro in 2000 and EstherMoreno-Barriuso have delivered the article of " Phase plates forwave-aberration compensation in the human eye " on Optical letter, they are positioned over human eye the place ahead with hard optics position photo, and human eye aberration is corrected.But the method that people such as Rafael Navarro mention is to adopt the hard position photo that human eye aberration is corrected, and the living eyes aberration correction element of hard material can't be positioned over people's intraocular part, realizes hidden function and dynamic compensation.
Summary of the invention
Technology of the present invention is dealt with problems: overcome the deficiencies in the prior art, provide a kind of adopt soft material correct the human eye higher order aberratons, effectively improve the human eye correction for higher order aberrations method of human eyesight level.
Technical solution of the present invention is: human eye correction for higher order aberrations method, its characteristics are to comprise the following steps:
(1) adopts the human eye aberration measuring equipment accurately to measure each rank aberration of human eye, obtain the human eye aberration data; Employing Shack-Hartmann wavefront sensing system can realize the measurement of human eye aberration easily, obtains the data of human eye aberration.
(2) according to the data-optimized design aberration correction of human eye aberration function; Owing to human eye aberration can change along with the variation of time, the variation of environment and the variation of direction of observation.Therefore the conjugation that the living eyes aberration correction circuit elements design can not the equally simple capture difference data of image optical system aberration correction, and the necessary method that adopts aberration balancing, taking all factors into consideration various factors influences the position phase correcting element that carries out computer numerical calculating, design to human eye aberration.
(3) the living eyes aberration correction function according to design designs mask, because in photoetching process, non-linear, the diffraction of light effect of photoresist etc. all can make the face shape of little embossment produce certain distortion, and the dark more then distortion of embossment is serious more.For accurate control relief surface shape, taken all factors into consideration above-mentioned various factors, and determined the quantified precision of half-tone mask the human eye aberration data to be converted to the mask gradation data one to one according to the little embossment data of target.Determine to make the technological parameter of mask at last, make mask.
(4) adopt the mask of making that resist is exposed, can obtain the micro relief profile of resist material after the development; Determine the exposure that needs apply according to the degree of depth of target embossment structure, and parameter such as solution level, development time.At first obtain microstructure by exposure, development on the resist surface.
(5) be motherboard with this microstructure, adopt duplication process that microstructure is transferred to and be suitable for the contact lens material surface that human eye is worn.
The present invention compared with prior art mainly contains following advantage:
1.Rafael the method that people such as Navarro mention is to adopt the hard position photo that human eye aberration is corrected, and the living eyes aberration correction element of hard material can't be positioned over people's intraocular part, realizes hidden function and dynamic compensation.The present invention proposes to make micro relief profile on soft material (existing contact lens material) surface, thereby realizes and dynamically correct the thinking of human eye higher order aberratons.The human eye correction for higher order aberrations element of soft material has wide application prospect as contact lenses.
2. the present invention relates to make the required micro relief profile of rectification human eye higher order aberratons, can not directly utilize the technology on hard material, need to adopt new shaping, transmission, face shape control technology to deal with problems on the soft material surface.
3. not only can be used for the human eye low order aberration and correct, and can correct the human eye higher order aberratons, improve visual effect.The situation that is particularly suitable for multiple complications such as myopia, presbyopic, astigmatism and deposits.
Description of drawings
Fig. 1 is the human eye higher order aberratons figure that the present invention adopts a certain A nearsighted person of Shack-Hartmann human eye aberration measuring system acquisition;
Fig. 2 is that the embodiment of the invention 1 is at the local figure of the half-tone mask of the required microstructure design of rectifier;
Fig. 3 be the embodiment of the invention 1 through overexposure, develop the three-dimensional relief structures vertical view of the human eye correction for higher order aberrations device of producing behind the hot melt.
Embodiment
Embodiment 1, is the bore of making by method of the present invention
Continuous relief human eye micro-optic rectifier, its manufacturing process is as follows:
(1) at first adopts Shack-Hartmann wavefront sensing system that a certain patient's human eye aberration is accurately measured, obtain higher order aberratons figure shown in Figure 1 (being the human eye aberration data).
(2) go out the correction for higher order aberrations function according to the human eye aberration design data; Human eye aberration can be along with the variation of the variation of the variation of time, environment and direction of observation and is changed.Therefore the conjugation that the living eyes aberration correction circuit elements design can not the equally simple capture difference data of image optical system aberration correction.In the experiment, at first the various factors that influences human eye vision is set the different image factors, adopt computing machine that the human eye vision effect is carried out analog simulation then, the last various influence factors of balance calculate best aberration correction function.
(3) produce the mask plate of shadow tone as shown in Figure 2 according to the living eyes aberration correction function of design; Because the about 6mm in target microstructure aperture (equaling the human eye pupil diameter), target microstructure PV value 4um according to the rate of the distinguishing ability of laser direct writing equipment, determines half-tone mask quantifying unit size 10um, 100 grades of mask gray scale quantification gradations.The human eye aberration data are converted to mask gray scale laser direct writing equipment control data one to one.
(4) adopt the mask plate of making that resist is exposed, develop.
According to the degree of depth of target embossment structure, adopt exposure 10uJ/cm
2, the developer solution MF319 of Shipley Co L.L.C., concentration 100%, development time 45s.The resist surface obtains required microstructure by exposing, being developed in.
(5) be motherboard with this microstructure, adopt duplication process that microstructure is transferred to and be suitable for the contact lens material surface that human eye is worn that the final micro-optic rectifier three-dimensional relief structures vertical view of making as shown in Figure 3.In the experiment, adopt the most original a kind of contact lens material-silicon rubber to duplicate.At first the silicon rubber with colloidal injects mould; Under ultraviolet light, shine the silicon rubber polymerization reaction take place then for a long time; After polymerization fully, can carry out the demoulding and handle, can obtain required microstructure on the contact lens material surface.
Claims (2)
1, human eye correction for higher order aberrations method is characterized in that comprising the following steps:
(1) adopts the human eye aberration measuring equipment accurately to measure each rank aberration of human eye, obtain the human eye aberration data;
(2) according to the data-optimized design aberration correction of human eye aberration function;
(3) the living eyes aberration correction function according to design designs mask, and determine the quantified precision of half-tone mask according to the little embossment data of target, the human eye aberration data are converted to the mask gradation data one to one, determine to make the technological parameter of mask plate at last, make mask plate;
(4) adopt the mask plate of making that resist is exposed, can obtain the micro relief profile of resist material after the development;
(5) be motherboard with this micro relief profile, adopt duplication process that micro relief profile is transferred to and be suitable for the contact lens material surface that human eye is worn.
2, human eye correction for higher order aberrations method according to claim 1 is characterized in that: described human eye aberration measuring equipment is for adopting Shack-Hartmann wavefront sensing system.
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2004100091153A CN100451734C (en) | 2004-05-24 | 2004-05-24 | Human eyes high order optical aberration orthopraxy method |
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| CNB2004100091153A CN100451734C (en) | 2004-05-24 | 2004-05-24 | Human eyes high order optical aberration orthopraxy method |
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| CN1702494A CN1702494A (en) | 2005-11-30 |
| CN100451734C true CN100451734C (en) | 2009-01-14 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2018595B1 (en) * | 2006-05-16 | 2022-07-06 | Essilor International | High-order aberration correction for optimization of human visual function |
| CN1916768A (en) | 2006-09-08 | 2007-02-21 | 中国科学院光电技术研究所 | Equipment for customizing individualized contact lenses |
| CN1971341B (en) * | 2006-12-13 | 2011-01-12 | 中国科学院光电技术研究所 | Manufacturing method of contact lens to correct higher-order aberration of human eyes |
| KR101561570B1 (en) * | 2007-10-05 | 2015-10-19 | 에씰로아 인터내셔날(콩파니에 제네랄 도프티크) | A Method for Providing a Spectacle Ophthalmic Lens by Calculating or Selecting a Design |
| CN109061878A (en) * | 2018-08-09 | 2018-12-21 | 沈阳理工大学 | A kind of microscope designs method that can correct human eye aberration simultaneously |
| CN113940811A (en) * | 2020-07-15 | 2022-01-18 | 菁眸生物科技(上海)有限公司 | Method for controlling myopia by adjusting peripheral high-order aberration and optical equipment |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1346061A (en) * | 2000-09-25 | 2002-04-24 | 中国科学院光电技术研究所 | Method for making microlens array |
| US20020154271A1 (en) * | 2000-02-16 | 2002-10-24 | Christof Donitzky | Method for producing an artificial ocular lense |
| CN1426286A (en) * | 2000-04-28 | 2003-06-25 | 罗切斯特大学 | Improving vision and retinal imaging |
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2004
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020154271A1 (en) * | 2000-02-16 | 2002-10-24 | Christof Donitzky | Method for producing an artificial ocular lense |
| CN1426286A (en) * | 2000-04-28 | 2003-06-25 | 罗切斯特大学 | Improving vision and retinal imaging |
| CN1346061A (en) * | 2000-09-25 | 2002-04-24 | 中国科学院光电技术研究所 | Method for making microlens array |
Non-Patent Citations (2)
| Title |
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| 哈特曼传感器测量人眼波像差的特性研究. 全薇，凌宁，王肇圻，饶学军，王成，陈志辉.光电工程，第30卷第3期. 2003 * |
| 微光学元件复制技术研究. 邓启凌，杜春雷.光子学报，第31卷第1期. 2002 * |
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