CN1004428B - Solution for wax chemical treatment - Google Patents
Solution for wax chemical treatment Download PDFInfo
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- CN1004428B CN1004428B CN87104522.2A CN87104522A CN1004428B CN 1004428 B CN1004428 B CN 1004428B CN 87104522 A CN87104522 A CN 87104522A CN 1004428 B CN1004428 B CN 1004428B
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- wax
- solution
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- liter
- chemical
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Abstract
The present invention relates to a chemical rough treatment method. A special formula solution is used, and the solution is prepared from K2Cr2O7, CrO3 and H2SO4. The rough treatment time is from 30 to 300 seconds, and the solution is sensitized and activated to be chemically plated. The solution can also be used for a compound wax mould containing wax, metal, glass or ceramics to carry out chemical rough treatment. A conducting metal film obtained by chemical rough solution treatment wax mould described by the present invention has strong adhesive force, the mould sticking surface maintains surface details of the original wax mould without distortion, and the color of the conducting metal film is the same as the color of the metal. The surface metallized wax mould can electrically cast various metal products.
Description
The present invention relates to a kind of chemical treatment technology of wax-pattern surface metalation, the chemical roughing treatmenting solution when before electroforming, making the wax-pattern surface metalation with chemical process.
Electroforming process is exactly after core surface electrolytic deposition layer of metal, it is separated with core rod and obtains the processing method of metal products.
Many solid matters all can be used as the material of electroforming core rod, as core rod many advantages are arranged with wax, and for example it is convenient to processing, are easy to fusing, and cost is low; Wax also can be used as combined electrical mold core binder or inlay; For example, can give the part of metal or nonmetallic plate, bar or other shape being placed on earlier in the wax-pattern core, when the part surface of this class part is exposed on the surface of wax-pattern core, after the electroforming they just and the electroforming metal layer link into an integrated entity; To the built-up type core rod, can there be the fit-up gap in its junction, embedding can be filled out with wax in these gaps.Non-conductive because of wax, before electroforming, must use appropriate means coated one deck conductive coating, i.e. surface metalation on the wax surface.Past method commonly used is meal, the Graphite Powder 99 with the metal or alloy material, be sprinkling upon the surface of wax, with appropriate means this meal sticked to the wax surface equably again and form continuous conducting layers, perhaps electric conduction paint, be sprayed on the wax surface, form the paint film of conduction.
United States Patent (USP) 2,932,609 have described with Virahol graphite suspension dipping wax-pattern core, after the remaining solvent evaporates of wax-pattern wicking surface, on the wax-pattern wicking surface, generate one deck equadag coating, and then immerse the isopropanol suspension that is added with iron powder, behind the solution evaporation, on the wax-pattern wicking surface, generate second layer coating, and then the core rod that will handle immerses copper-bath, the formation copper film.
Japanese Patent-8031140 invention is the wax-pattern core to be immersed contain in the aqueous solution of Palladous chloride and polyvinyl alcohol, and at room temperature after the drying, its surface just covers the last layer hydrophilic coating, carries out electroless plating again.
Described in Japanese Patent-8031141 invention: the wax-pattern core is immersed earlier in the mixing solutions of trichloroethane and Virahol, and at room temperature after the drying, the wax-pattern wicking surface covers the last layer hydrophilic coating, and then copper facing.
All there are some shortcomings in the method for above-mentioned wax surface metalation, in wax surface coated layer of metal powder or coating, all be difficult to guarantee the consistence of these mantle thickness, this will cause the wax-pattern dimensional precision to descend, the lines on surface distortion, thereby be unsuitable for the electroforming process of precision metallic goods.
The objective of the invention is the roughening solution with special formulation, at room temperature wax is carried out chemical roughen and handle, is that available general method is carried out sensitization, activation and electroless plating then.
The prescription of the chemical roughing solution of wax of the present invention is as follows:
K
2Cr
2O
710～60 grams per liters
CrO
330～100 grams per liters
H
2SO
4500～850 milliliters/liter
H
2120～470 milliliters/liter of O
Chemical roughen is handled and can at room temperature be carried out, and under 5～35 ℃ envrionment temperature, all has good alligatoring effect.Wax treatment time in chemical roughing solution is 30～300 seconds.
Chemical roughing solution of the present invention can directly form conductive layer after wax is carried out alligatoring on the wax surface, not additional intermediate material layer; The wax-pattern of in this roughening solution, handling, metal level can be very securely attached on the wax-pattern surface, and can in the solution that contains copper sulfate 50～250 grams per liters and sulfuric acid 10～100 grams per liters, need not heat, be copper facing under 0.1～2.5A/dm condition in cathode current density.
Advantage of the present invention is as mentioned below:
Chemical roughing solution with wax of the present invention is handled wax-pattern, can not damage or destroy the details of wax-pattern surface shape, and the subsides die face of the conductive metal film that obtains can reproduce the wax-pattern surface details realistically.Behind this solution-treated wax-pattern, the color of the subsides die face of the conductive metal film that obtains is the true qualities of this kind metal.Also there is the compound wax-pattern of other metallic surface simultaneously for the surface, uses solution-treated of the present invention, can access the successive conductive metal film in its surface.When compound wax-pattern surface also exists glass or ceramic surface, use this solution-treated, also can obtain the successive conductive metal film in its surface.
Realize that mode of the present invention is as follows:
At first, greasy dirt on the wax-pattern is cleaned up, general available 2～3% water-detergent solution, at room temperature soak wax-pattern, also available cloth soaks solution to be cleaned, but does not damage wax-pattern, for removing washing composition, again the wax-pattern core is placed in the clear water and cleans, make its drying after, can be placed in the roughening solution and handle.The prescription of the roughening solution of wax is:
K
2Cr
2O
740～45 grams per liters
CrO
345～50 grams per liters
H
2SO
4500～600 milliliters/liter
H
2320～470 milliliters/liter of O
The temperature of roughening solution is a room temperature, and when significantly being lower than 20 ℃ as if temperature, the treatment time need extend; If when temperature was significantly higher than 30 ℃, the treatment time need suitably shorten; The temperature of roughening solution is best in 20～25 ℃ of scopes.Wax-pattern is in 20～25 ℃ solution, and the roughening treatment time is 90～300 seconds, and the roughening treatment time removes outside the Pass temperature with roughening solution has, and is also relevant with the prescription of wax.Wax-pattern cleans in the cold water that flows, then at SnC through after the roughening treatment
12Carry out sensitization in the solution, in activated solution, carry out activation treatment, in chemical plating solution metal-coated membrane and metallizing back-up coat, carry out electroforming at last again.
When compound wax-pattern surface also had localized metallic copper or silver surface simultaneously, the roughening solution prescription of wax was as follows:
K
2Cr
2O
710～15 grams per liters
CrO
330～40 grams per liters
H
2SO
4760～800 milliliters/liter
H
2170～210 milliliters/liter of O
The roughening treatment time is 30～90 seconds, and other condition is identical with last example.
When compound wax-pattern surface also had local glass, pottery, chromium, nickel, nickelalloy or stainless steel surface simultaneously, the roughening treatment solution formula of wax was as follows:
K
2Cr
2O
755～60 grams per liters
CrO
380～100 grams per liters
H
2SO
4800～850 milliliters/liter
H
2120～170 milliliters/liter of O
The roughening treatment time is 30-90 second, and other condition is identical with last example.
Claims (22)
1, a kind ofly before electroforming, make chemical roughing treatmenting solution before the wax-pattern wicking surface metallization, it is characterized in that with chemical process:
The roughening solution of wax is by K
2Cr
2O
7, CrO
3, H
2SO
4Form with water.
2, the chemical roughing treatmenting solution of wax according to claim 1 is characterized in that: the chemical roughing solution formula rate of wax is as follows:
K
2Cr
2O
710～60 grams per liters
CrO
330～100 grams per liters
H
2SO
4500～850 milliliters/liter
H
2120～850 milliliters/liter of O
3, the chemical roughing treatmenting solution of wax according to claim 2 is characterized in that, the chemical roughing solution formula rate of wax is as follows:
K
2Cr
2O
740～45 grams per liters
CrO
345～50 grams per liters
H
2SO
4500～600 milliliters/liter
H
2320～470 milliliters/liter of O
4, the chemical roughing treatmenting solution of wax according to claim 2 is characterized in that: when compound wax-pattern surface also had localized metallic copper or silver surface simultaneously, the chemical roughing solution formula rate of wax was as follows:
K
2Cr
2O
710～15 grams per liters
CrO
330～40 grams per liters
H
2SO
4760～800 milliliters/liter
H
2170～210 milliliters/liter of O
5, the chemical roughing treatmenting solution of wax according to claim 2 is characterized in that: when compound wax-pattern surface also had local glass, pottery, chromium, nickel, nickelalloy or stainless steel surface simultaneously, the chemical roughing solution formula rate of wax was as follows:
K
2Cr
2O
755～60 grams per liters
CrO
380～100 grams per liters
H
2SO
4800～850 milliliters/liter
H
2120～170 milliliters/liter of O
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN87104522.2A CN1004428B (en) | 1987-07-03 | 1987-07-03 | Solution for wax chemical treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN87104522.2A CN1004428B (en) | 1987-07-03 | 1987-07-03 | Solution for wax chemical treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN87104522A CN87104522A (en) | 1988-02-10 |
| CN1004428B true CN1004428B (en) | 1989-06-07 |
Family
ID=4814911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN87104522.2A Expired CN1004428B (en) | 1987-07-03 | 1987-07-03 | Solution for wax chemical treatment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1004428B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112095093B (en) * | 2020-09-03 | 2022-11-11 | 南昌航空大学 | Treatment method for paraffin surface conductivity |
-
1987
- 1987-07-03 CN CN87104522.2A patent/CN1004428B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CN87104522A (en) | 1988-02-10 |
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