CN100442118C - Semi-transmission type liquid crystal display device and method for making the same - Google Patents
Semi-transmission type liquid crystal display device and method for making the same Download PDFInfo
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- CN100442118C CN100442118C CNB2006100630143A CN200610063014A CN100442118C CN 100442118 C CN100442118 C CN 100442118C CN B2006100630143 A CNB2006100630143 A CN B2006100630143A CN 200610063014 A CN200610063014 A CN 200610063014A CN 100442118 C CN100442118 C CN 100442118C
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Abstract
The present invention discloses a semi-transmission-type liquid crystal displays, which comprises a lower polaroid, a lower transparent substrate, a color filter film, an insulator layer, a reflective film, a transparent conductive film, LCD, a second transparent conductive film, transparent substrates and an upper polarioid; the reflective film is provided with an opening. The present invention is characterized in that the reflective film is positioned above the color filter film; the reflective film and the transparent conductive film are arranged to be adjacent with each other; the insulating layer is arranged between the reflective film and the color filter film. The present invention has the main characteristics that the reflective film is positioned above the color filter film; the reflective film and the transparent conductive film are arranged to be adjacent with each other; the insulating layer is arranged between the reflective film and the color filter film; the present invention also discloses a LCD production method; the semi-transmission type liquid crystal display in the present invention can achieve black-and-white display with high reflective rate and high contrast when the backlighting is not lit, and can display the similar all-through bright colors when the backlight is lit.
Description
Technical field
The present invention relates to have reflection function and see through the reflecting ﹠ transmitting two-purpose colourful liquid crystal display device of function, more particularly, relate to and a kind ofly under transmission and reflective operation state, have semi-transmission type liquid crystal display device of good display effect and preparation method thereof.
Background technology
The method for making of existing semi transmission type colour liquid crystal display has multiple, mainly contains two kinds of semi-transparent metal membranous type and reflectance coating open-types.Semi-transparent metal membranous type is used less because cost is higher, and the reflectance coating open-type is the method that generally adopts, and this method can be adjusted the size of transmissivity and reflectivity by changing the size of opening.
Being called " semi-transmission-type LCD and preparation method thereof ", the patent No. as name is that the Chinese invention patent of CN200410040336.7 discloses a kind of semi-transmission-type LCD and preparation method thereof, this LCD is reflectance coating, colour filter film, the insulation course that opening is arranged on following transparency carrier successively.At each opening part of reflectance coating, the colour filter membrane area is less than the reflectance coating aperture area; Be colour filter film, reflectance coating, insulation course successively on following transparency carrier perhaps, at each opening part of reflectance coating, the colour filter membrane area is less than the reflectance coating aperture area.Method for making is before the indium tin oxide design producing, earlier reflectance coating is scribed opening, makes the colour filter film of area less than the reflectance coating aperture area again; Or make the colour filter film earlier, and again reflectance coating is scribed opening, at each opening part of reflectance coating, the colour filter membrane area is less than the reflectance coating aperture area.This invention can improve the contrast and the brightness of LCD significantly, and can improve reflectivity, by adjusting the area of colour filter film, can also adjust transmissivity and color and show.
But comprise that there is a problem all the time in the prior art of foregoing invention: transmissivity and reflectivity limit mutually, promptly high transmissivity will be arranged, and reflectivity is just necessarily lower, thereby causes the reflex time contrast-response characteristic poor; High reflectivity is arranged, so the color filter film just can not do too thick, thereby color characteristics variation when making transmission.
Summary of the invention
The problem that the present invention exists in view of above-mentioned prior art and carrying out, one object of the present invention is, avoid above-mentioned the deficiencies in the prior art part, and a kind of semi-transmission type liquid crystal display device that all can reach superior display effect when transmission and reflective operation state is provided.
Another object of the present invention is, proposes a kind ofly can solve the method for making that can both reach the semi transmission type colour liquid crystal display of good display effect when transmission and reflective operation state simultaneously.
For achieving the above object, the technical solution used in the present invention is:
Semi-transmission type liquid crystal display device of the present invention, from backlight toward outside light source direction, comprise successively: following polaroid, following transparency carrier, color filter film, insulation course, reflectance coating, nesa coating, liquid crystal, second nesa coating, transparency carrier and last polaroid, on the described reflectance coating opening is arranged, wherein, described reflectance coating is compared away from backlight with described color filter film, described reflectance coating and described nesa coating are done adjacent setting, are provided with described insulation course between described reflectance coating and the described color filter film.
Semi-transmission type liquid crystal display device of the present invention, described nesa coating is selected the indium tin oxide material for use; The material that described reflectance coating is selected for use is aluminium, alumel or silver.
When the material that described reflectance coating is selected for use is metallic aluminium, the nesa coating layer pattern requires to cover fully the reflective coating pattern, to avoid when transparent conductive film layer is carried out photoetching reflective coating being caused damage, at this moment, described nesa coating covers described reflectance coating fully.
Another technical scheme that the present invention is taked for the described technical matters of solution is as follows:
Propose a kind of method for making of semi transmission type colour liquid crystal display, the setting of its internal reflection film next-door neighbour conducting film is positioned on the color filter film, and wherein the making of key component colored filter substrate may further comprise the steps:
1. according to the actual displayed requirement, select the chromaticity coordinates of printing ink, so definite ink type, on glass substrate, adopt photoetching or method of printing to add black successively, redness, green and blue color ink after developing, forms the color filter film;
2.. coating esters of acrylic acid dielectric film on described color filter film; through overcuring; can adopt UV to solidify or heat curing; form insulation course; we are commonly called as the OC layer; main effect is a color filter film flattening surface, the gluing layer effect between protection color filter film and color filter rete and indium tin oxide conductive layer and the reflection horizon.
3.. the reflectivity of color monitor according to actual needs and transmitance design reflectivity film figure, if noting reflective film material is that aluminium etc. is the metal of acid corrosion easily, then the reflectance coating design requires and must be covered by conductive electrode pattern rete, in order to avoid the reflectance coating pattern is damaged when making conductive electrode rete pattern; Then, on described insulation course, utilize the method for sputter to plate silicon dioxide and reflective metal layer formation reflective coating successively, the material of described reflective metal layer can be a metallic aluminium, material such as alumel or silver also can adopt the method for evaporation that described reflective metal layer is plated on the glass substrate in addition;
4.. utilize the method for photoetching on described reflective coating, to carry out opening, specific practice is as follows: coat photoresists on described reflective metal layer, use reflectance coating figure mould method with photoetching on described photoresists to form the photoresists pattern then, then the reflective metal layer that exposes is corroded, remove photoresists then, just formed reflectance coating with opening, if being aluminium etc., reflective film material is the metal of acid corrosion easily, then the reflectance coating design requires and must be covered by conductive electrode pattern rete, in order to avoid the reflectance coating pattern is damaged when making conductive electrode rete pattern.
5.. on described reflectance coating, adopt the method for sputter to plate silicon dioxide layer and transparent conductive film layer again, descend sheet semi-permeable colorful optical filtering transparent panel just to carry out like this.
6.. just finish the LCD later process according to common colorful ultra-twist type LCD or Thin Film Transistor-LCD manufacture craft and make, make and be reflected into the liquid crystal display device that high-contrast high reflectance white and black displays is transmitted as high color saturation with semi-transparent semi-reflecting performance.
Compare with prior art, adopt semi transmission type colour liquid crystal display of the present invention and preparation method thereof, when not lighting, can obtain the white and black displays of high-contrast high reflectance, when backlight lightening, can show the bright-coloured color of high color saturation backlight.
Description of drawings
Fig. 1 is a semi transmission type colour liquid crystal display device structure sectional view of the present invention.
Fig. 2 is reflectance coating and color filter film pair relationhip synoptic diagram (transmission is seen) described in Fig. 1.
Fig. 3 is reflectance coating and indium tin oxide transparent conductive electrode pair relationhip synoptic diagram (reflection is seen) described in Fig. 1.
The curve map that Fig. 4 changes with aperture opening ratio for the semi-transparent display reflects rate of the present invention.
Among the figure, polaroid, 20 1 glass substrates, 30 1 nesa coatings, 40 1 liquid crystal, 50 1 nesa coatings, 60 1 insulation courses, 70 1 color filter films, 80 1 reflectance coatings on 10 1,90 1 lower glass substrate, 100 polaroids once, 110 1 packaging plastics, 120 1 openings, 130 1 black matrix"s.
Embodiment
The invention will be further described below in conjunction with drawings and Examples.
As Fig. 1, Fig. 2 and shown in Figure 3, the structure of semi transmission type colour liquid crystal display of the present invention comprises from top to bottom: go up polaroid 10, glass substrate 20, nesa coating 30, liquid crystal 40, nesa coating 50, reflectance coating 80, insulation course 60, color filter film 70, lower glass substrate 90 and following polaroid 100.With packaging plastic 110 sealings, around the described color filter film 70 BM (black matrix") 130 is arranged around the described liquid crystal 40, described reflectance coating 80 has opening 120.
Described reflectance coating 80 material selection aluminium, materials such as alumel or silver.
The opening shape of described reflectance coating 80 and size will be looked actual displayed and be required to decide, and general openings of sizes is 30%-70%.
For the semi transmission type colour liquid crystal display of said structure, concrete manufacturing process may further comprise the steps:
1.. according to the actual displayed requirement, comprise transmitance, the saturation degree of display color etc. are selected the chromaticity coordinates of printing ink, and then definite ink type, a demonstration colourity of this measure preferably printing ink be example, the color saturation of this kind of printing ink has reached about 50%.After printing ink chooses, adopt the method for spin coating that black ink is coated on the glass substrate, adopt the method for photoetching to form black ink pattern 130 then, it is red to adopt above method to form on glass substrate successively, green and blue ink pattern have so just formed ink lay 70 on glass substrate 90.Except that the method for above spin coating photoetching, can also adopt method of printing.
2.. adopt the method for spin coating on ink lay 70, to form insulation course 60 then.
3.. the material of reflectance coating is selected alumel at this, and the reflectivity of alumel is 92% scholar 2%, also can select the alloy of silver or silver to do, the method that adopts sputter on transparent insulating layer 60 at the substrate plated aluminum nickel alloy of colour liquid crystal display device;
4.. spin coating photoresist on reflective coating then, adopt the method for photoetching to form the photoresist pattern, form the reflectance coating pattern by etching, and then remove the photoresist pattern by demoulding and just formed needed reflectance coating pattern.
Display element unit as shown in Figure 2, be the design of horizontal stripe shape at this reflectance coating pattern, reflectance coating opening 120 is arranged on it, can certainly adopt the reflectance coating layout of other types, different aperture opening ratios can obviously influence reflectivity, and Fig. 4 is the curve map that changes with aperture opening ratio according to the semi-transparent display reflects rate of this type that a series of test figures obtain:
From above figure as can be seen the reflectivity of this semi transmission type colour liquid crystal display along with the reflectance coating aperture opening ratio changes basically being aligned type relation, we can utilize Fig. 4, go out the aperture opening ratio of reflectance coating according to the reflectivity correspondence of wanting to reach, and then come the reflectance coating pattern is designed according to aperture opening ratio.
5.. the method with sputter plates silicon dioxide and nesa coating 50, has so just finished the making of colored filter.
6.. and then the nesa coating 50 that the colorized optical filtering sheet glass carries out is carried out photoetching form the transparent conductive electrode pattern, as shown in Figure 3, the location diagram of reflectance coating patterned layer 80 and nesa coating 50, the electrically conducting transparent film figure requires to cover the reflectance coating pattern fully, to avoid when nesa coating is carried out photoetching reflectance coating being caused damage.
7.. can finish the work of following operation then with reference to colorful ultra-twist type LCD manufacture craft or Thin Film Transistor-LCD manufacture craft, comprise that panel of LCD is made and the making of follow-up module, so just finished the making of the semi-transparent liquid crystal display device of this type.Annotate: the colored filter that is used for the Thin Film Transistor-LCD demonstration is made the making that can save step 2, promptly saves insulation course 60.
Be illustrated with colorful ultra-twist type LCD at this, select 50%NTSC color saturation printing ink for use, reflectance coating aperture opening ratio 60%, after making display device, reflectivity can reach about 6.4%, transmitance can reach about 2.6%, show that color saturation therebetween can reach about 35%, become the good display device of a display performance, in addition because transparent conductive electrode and reflectance coating are done adjacent setting, reflectance coating participates in doing the resistivity of the electrode that electrode reduces greatly, thereby has alleviated the cross effect phenomenon greatly.
More than listed preferred embodiment be intended to clearly demonstrate design of the present invention and technical scheme.The present invention's enforcement is not limited thereto.Any based on design of the present invention and technical scheme, and need not creative work, the simple deduction or replace carried out, perhaps this invention is applied to other colour liquid crystal display device structure situation, all belong to the present invention's enforcement.
Claims (12)
1. semi-transmission type liquid crystal display device, from backlight toward outside light source direction, comprise successively: following polaroid (100), following transparency carrier, color filter film (70), insulation course (60), reflectance coating (80), nesa coating (50), liquid crystal (40), second nesa coating (30), transparency carrier (20) and last polaroid (10), opening (120) is arranged on the described reflectance coating (80), it is characterized in that: described reflectance coating (80) is compared away from backlight with described color filter film (70), described reflectance coating (80) and described nesa coating (50) are done adjacent setting, are provided with described insulation course (60) between described reflectance coating (80) and the described color filter film (70).
2. semi-transmission type liquid crystal display device as claimed in claim 1 is characterized in that: described nesa coating is selected the indium tin oxide material for use.
3, semi-transmission type liquid crystal display device as claimed in claim 1 or 2 is characterized in that: the material that described reflectance coating is selected for use is aluminium, alumel or silver.
4. semi-transmission type liquid crystal display device as claimed in claim 1 or 2 is characterized in that: the material that described reflectance coating is selected for use is an aluminium, and described nesa coating (50) covers described reflectance coating (80) fully.
5. the method for making of a semi-transmission type liquid crystal display device is characterized in that, comprises following processing step:
On transparency carrier, form color filter film (70);
The coating transparent insulation material forms insulation course (60) on described color filter film;
On insulation course, utilize the method for sputter to plate silicon dioxide and reflective metal layer formation reflective coating successively;
Reflectance coating figure according to design in advance adopts the method for photoetching that described reflective coating is carried out the reflectance coating (80) that etching obtains having the certain opening rate; And
On reflectance coating (80), plate silicon dioxide layer and transparent conductive film layer (50) again, form sheet semi-permeable colorful filter coating transparent panel down.
6. the method for making of semi-transmission type liquid crystal display device as claimed in claim 5, it is characterized in that: the operation of above-mentioned formation color filter film comprises that employing photoetching or method of printing add black, redness, green and blue color ink successively, after developing, form the color filter film.
7. the method for making of semi-transmission type liquid crystal display device as claimed in claim 5 is characterized in that: the operation of above-mentioned formation insulation course also comprises through UV solidifies or curing process.
8. the method for making of semi-transmission type liquid crystal display device as claimed in claim 5, it is characterized in that: the operation of above-mentioned formation reflective coating comprises that the method that adopts evaporation is plated in described reflective metal layer on the transparency carrier.
9. the method for making of semi-transmission type liquid crystal display device as claimed in claim 5, it is characterized in that: the operation that above-mentioned formation has the reflectance coating of certain opening rate comprises successively:
On described reflective metal layer, coat photoresists;
Use reflectance coating figure mould method with photoetching on described photoresists to form the photoresists pattern;
The reflective metal layer that exposes is corroded, remove photoresists then, form described reflectance coating with opening.
10. the method for making of semi-transmission type liquid crystal display device as claimed in claim 5, it is characterized in that: the operation of sheet semi-permeable colorful filter coating transparent panel comprises that the method that adopts sputter plates described silicon dioxide layer and transparent conductive film layer (50) under the described formation.
11. the method for making as each described semi-transmission type liquid crystal display device of claim 5-10 is characterized in that: the material that described reflectance coating uses is aluminium, alumel or silver.
12. the method for making as each described semi-transmission type liquid crystal display device of claim 5-10 is characterized in that: the material that described reflectance coating uses is aluminium, and described reflectance coating (80) is covered by described transparent conductive film layer (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100630143A CN100442118C (en) | 2006-09-30 | 2006-09-30 | Semi-transmission type liquid crystal display device and method for making the same |
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2006100630143A CN100442118C (en) | 2006-09-30 | 2006-09-30 | Semi-transmission type liquid crystal display device and method for making the same |
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| CN101118332A CN101118332A (en) | 2008-02-06 |
| CN100442118C true CN100442118C (en) | 2008-12-10 |
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| CNB2006100630143A Expired - Fee Related CN100442118C (en) | 2006-09-30 | 2006-09-30 | Semi-transmission type liquid crystal display device and method for making the same |
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| CN115167029B (en) * | 2022-07-01 | 2023-11-28 | Tcl华星光电技术有限公司 | Display module and manufacturing method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001133770A (en) * | 1999-11-04 | 2001-05-18 | Hitachi Ltd | Liquid crystal display device |
| JP2002333622A (en) * | 2001-03-07 | 2002-11-22 | Sharp Corp | Reflection and transmission common type color liquid crystal display device |
| CN1493903A (en) * | 2003-09-15 | 2004-05-05 | 信利半导体有限公司 | Method of determining ratio of coloured liquid crystal screen reflectivity and transmisivity from reflecting film opening |
| US20040207783A1 (en) * | 2002-12-26 | 2004-10-21 | Citizen Watch Co., Ltd. | Liquid crystal display device and method for manufacturing the same |
| CN1570729A (en) * | 2004-03-15 | 2005-01-26 | 信利半导体有限公司 | Color variable liquid crystal display and fabrication method thereof |
| CN1727951A (en) * | 2004-07-27 | 2006-02-01 | 比亚迪股份有限公司 | Semi permeable type liquid crystal display, and producing method |
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- 2006-09-30 CN CNB2006100630143A patent/CN100442118C/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001133770A (en) * | 1999-11-04 | 2001-05-18 | Hitachi Ltd | Liquid crystal display device |
| JP2002333622A (en) * | 2001-03-07 | 2002-11-22 | Sharp Corp | Reflection and transmission common type color liquid crystal display device |
| US20040207783A1 (en) * | 2002-12-26 | 2004-10-21 | Citizen Watch Co., Ltd. | Liquid crystal display device and method for manufacturing the same |
| CN1493903A (en) * | 2003-09-15 | 2004-05-05 | 信利半导体有限公司 | Method of determining ratio of coloured liquid crystal screen reflectivity and transmisivity from reflecting film opening |
| CN1570729A (en) * | 2004-03-15 | 2005-01-26 | 信利半导体有限公司 | Color variable liquid crystal display and fabrication method thereof |
| CN1727951A (en) * | 2004-07-27 | 2006-02-01 | 比亚迪股份有限公司 | Semi permeable type liquid crystal display, and producing method |
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