CN100406888C - Method for producing passive micro-mixer and micro-reactor in micro-flow control chip - Google Patents
Method for producing passive micro-mixer and micro-reactor in micro-flow control chip Download PDFInfo
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- CN100406888C CN100406888C CN2006100459215A CN200610045921A CN100406888C CN 100406888 C CN100406888 C CN 100406888C CN 2006100459215 A CN2006100459215 A CN 2006100459215A CN 200610045921 A CN200610045921 A CN 200610045921A CN 100406888 C CN100406888 C CN 100406888C
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Abstract
The present invention relates to a method for manufacturing a passive micro mixer and a micro reactor in a micro flow control chip. First of all, a glass master mold chip with sub-micro structures on a bottom surface and side surfaces is manufactured, a glass motherboard chip is used for manufacturing a whole glass chip or a mixed whole glass chip with sub-micro structures on three surfaces or the whole passage, or a mold is turned down after a polymer is cast so as to obtain a male mold which is complementary to the micro structures of a glass motherboard, the male mold is used for casting and duplication to obtain the chip of a base polymer material with the structure of the glass motherboard, and a whole polymer blending chip or a compound chip can be manufactured through further sealing. In the method of the present invention, glass can be used as the base material which has the advantages of low cost, high mechanical strength and optical clear performance without special requirements for manufacturing environment, one-step exposition and one-step etching are only needed, the sub-micro structures formed in a mixed passage have a certain streamline shape, and the present invention has wide potential application to the engineering of a micro flow control analysis chip and a micro flow chemical reactor.
Description
Technical field
The present invention relates to microfluidic analysis chip technical field of measurement and test and very small chemical reaction engineering field, be specifically related to the method for making of passive micro-mixer and microreactor in a kind of micro-fluidic chip.
Background technology
The mixing of reagent and material is pacing items and the operation that analytical test and differential responses thing carry out chemical reaction.Mixing is a spontaneous process, can carry out naturally by the method for molecular diffusion.Yet natural mixing efficiency is very low, and it is long to show as the time that needs, and perhaps range ability is long, is difficult to satisfy the demand.In order to raise the efficiency, the additive method that needs to introduce outside the nature mixing is improved.For the macroreaction device, mixing can effectively be improved by forcing stirring method.For ducted mobile mixing and reaction, utilize turbulent flow to improve mixing efficiency usually.
An important goal of micro-fluidic chip technology is to realize efficiently reaching the purpose of saving reagent simultaneously by analytical test fast on the platform of microminiaturization.Carry out the synthetic of fast chemical reaction research and some extraordinary compound and produce also being subjected to people's attention day by day at microminiaturized platform.Dwindling utilizing molecular diffusion to improve mixing efficiency favourable (Einstein law) of yardstick, but its efficient still can not satisfy the requirement of micro-fluidic chip technology.The method that commonly used being intended to improves mixing efficiency in the meta system is difficult to directly indiscriminately imitate in micro-system.Particularly under micro-fluidic chip yardstick and working environment, fluid all is in laminar condition, makes mixing difficulty more under this state, reaches naturally under the flow state and mixes the yardstick of the distance scale of needs considerably beyond chip fully.At the low difficult problem of mixing efficiency that flows in the microfluidic system a large amount of research has been arranged.Usually adopt two kinds of methods: the one, initiatively mix, a kind of is the passive mixing relevant with the present invention.The former improves mass transfer by the method for introducing power in system, promotes to mix.The for example use of externally-applied magnetic field and micromagnetism particle, magnetic agitation (the Manipulation ofSelf-Assembled Structures of Magnetic Beads for Microfluidic Mixing and Assaying of simulation meta system, Rida, A.Gijs, M.A.M.Anal Chem 2004; 76 (21): 6239-6246).Though this method effect is good, but technical application difficulty height.The structural change that the latter then utilizes passage to the material fluid that is in laminar condition in addition disturbance reach and promote the purpose of mixing.This method need not external impetus, utilizes the geometry resource of system itself and flowing of self to be significantly improved for power can make mixing efficiency.The example of a success is the submicroscopic structure flow-disturbing that utilizes on the bottom surface, microchannel, makes laminar flow become chaotic flow, mixing efficiency significantly improve (Chaotic Mixer for Microchannels, Stroock, A.D; Dertinger, S.K.W.Ajdari, A.Howard, I.M.Science, 2002,295:647-651).In order in little mixing and reaction channel, to form submicroscopic structure, existing method all relates to re-expose, the microchannel of submicroscopic structure is arranged even need exposure (PDMS microchannels with slanted grooves embedded in three walls to realize efficient spiralflow three times in order in passage, to form three masks, Sato, H.Ito, S.Tajima, K.Orimoto, N.Shoji, S.Sensors andActuators A, 2005,119:365-371), complex technical process to equipment and material conditional request height, and all relates to duplicating through polymkeric substance again and could finally obtain the polymer mixed chip.
Summary of the invention
At the weak point of the hybrid technology that flows in the existing micro-fluidic chip, the invention provides the method for making of passive micro-mixer and microreactor in a kind of micro-fluidic chip.
Manufacturing process mainly is divided into three parts, the one, the making of motherboard chip, the 2nd, obtain hybrid chip by motherboard chip punching back and cover plate involution, the 3rd, the glass mother board chip obtains duplicating chip through turning over to duplicate after being molded as formpiston again, and then obtains hybrid chip with the cover plate involution.Cover plate is used for forming little hybrid channel with having the motherboard chip of open microstructure or duplicate the chip involution, and cover plate can use plain film, also can be with the chip that has microstructure face-to-face and chip involution form little hybrid channel.The hole that is communicated with the microchannel is used for the introducing and the derivation of fluid foods.Making with glass mother board chip of microchannel and submicroscopic structure is directly to make chip and by duplicating the basis that makes hybrid chip, make flow process referring to Fig. 1.At first design the mask of forming by black and white according to the layout of mixer and the requirement of inner structure, mask graph is exported with form of medium such as films, single exposure is transferred to mask graph on the base material that scribbles optical cement, utilize base materials employed (glass, quartz etc.) and the isotropy feature of etching agent, one time etching obtains the microchannel of desired depth and the submicroscopic structure in the microchannel.Submicroscopic structure in the microchannel is used to promote the cross flow of fluid, thereby promotes to mix and reaction in flow process.The layout of microchannel and the submicroscopic structure shape in the hybrid channel can design and change as required.Obtain the motherboard chip after removing the optical cement of substrate surface and protective seam.Based on the flow process of glass mother board chip manufacturing micro-mixer as shown in Figure 2.After microchannel end points punching on the mother glass chip, obtain little hybrid chip of full glass or compound substance with the plain film involution of glass planar sheets or other materials.Two or more holes are used for the introducing of potpourri or reaction mass fluid, and one or more hole is used for fluid-mixing and draws.The hole also can be beaten on the relevant position of plain film.Two all have the glass mother board chip alignment involution of microchannel and submicroscopic structure to form the full glass hybrid chip that submicroscopic structure is all arranged in the full tunnel.The flow process of making micro-mixer based on duplicating of glass mother board as shown in Figure 3.As former,, duplicate this formpiston with the method for polymer in situ polymerization again with the glass mother board chip, obtain the polymer replication chip identical after peeling off with the motherboard microstructure with the formpiston of in-situ polymerization making with the complementation of motherboard chip microstructure.Duplicate chip and after punching, make all-polymer or compound substance chip with the plain film involution of homogeneity or unlike material.Two all-polymer hybrid chip that submicroscopic structure is all arranged in the alignment involution formation full tunnel between the chip of duplicating that microchannel and submicroscopic structure are all arranged.
With chromium plate glass is that the method for making of base material is described in detail as follows in conjunction with Fig. 4.(1) mask design and making: utilize figure to generate software (CorelDraw for example
TM) generate the mask graph of forming by black and white (printing opacity and light tight) zone fully according to the micro-mixer designing requirement, (resolution is greater than 2400dpi) prints on the mylar by laser photocomposing machine.(2) optical cement exposure imaging: utilize the method for ultraviolet light photoetching once to expose fully 20～50 seconds, the figure transfer on the mask to the chromium plate glass baseplate, after 0.5%NaOH solution developed 40～60 seconds, is removed unexposed portion, expose sacrifice layer; Transfer in the baking oven 110 ℃ of heating 15～30 minutes then.(3) the district's chromium floor that goes to develop: with the above-mentioned steps base material at the liquid (70%HClO that dechromises
4104ml+ (NH
4)
2Ce (NO
3)
6400g+1760ml H
2O) rocked in about 2 minutes, and washed the chromium protective seam on the development figure off.(4) etching: in containing hydrofluorite (1: 1 v/v 1mol/L NH
4F-HF or 1: 2: 7 v/v/v HF-HNO
3-H
2O) in the etching liquid, the substrate of glass that exposes is carried out isotropic etching, control etching temperature (room temperature to 40 ℃), time (1～160 minute) and etching condition (static or shake), disposable etching obtains certain depth (1～500um) microchannel, obtain submicroscopic structure in the passage simultaneously, the shape of submicroscopic structure and size characteristic are as required by mask graph shape and the decision of isotropic etching degree.(5) glue that delusters: the base material that above-mentioned steps is obtained places 2% NaOH solution or absolute ethyl alcohol, at room temperature rocks and removes optical cement remaining on the base material in about 3 minutes.(6) layer that dechromises: spend chrome liquor and remove all chromium protective seams, obtain having the glass mother board chip of submicroscopic structure in microchannel and the passage.(7) the in-situ polymerization formpiston is made: 1: 0.001～0.003w/w mixes with methyl methacrylate (MMA) and crosslinking chemical, solidifies under heating or ultraviolet lighting condition and finishes in-situ solidifying, forms polymethylmethacrylate (PMMA) formpiston.(8) demoulding: the PMMA and the glass mother board of polymerizing curable are peeled off, obtained PMMA formpiston with the complementation of glass mother board microstructure.(9) the in-situ polymerization chip duplicates: with commercialization dimethyl silicone polymer (PDMS) performed polymer and crosslinking chemical (Sylgard 184 types, Dow corning company) mixing is cast on the PMMA formpiston, heats down at 60～100 ℃ and finishes the in-situ polymerization of PDMS in 30 minutes～2 hours.(10) chip is duplicated in the demoulding: the PDMS and the PMMA formpiston of polymerization are peeled off obtained the PDMS identical with the glass mother board microstructure and duplicate chip.(11) involution: after the microchannel end points punching of duplicating the PDMS chip that obtains, close and obtain little hybrid chip with duplicating the PDMS chip that obtains and cap seal.For the PDMS chip, after the card punch punching, place the oxygen plasma washer, under the 0.1MPa air conditions, handle and carried out surface active in 20～120 seconds, obtain hybrid chip with PDMS or cover glass involution.Surface active also can carry out with ultra violet lamp in 2～6 hours.
Outstanding feature of the present invention is: (1) utilizes the isotropic etching characteristics, by mask design and etching extent control, etching of single exposure can be when obtaining the microchannel, formation has certain solid and fairshaped submicroscopic structure in passage, and this submicroscopic structure can effectively promote the mobile mixing of microchannel inner fluid; (2) utilize the method for polymer in situ polymerization can realize turning over duplicating of mould and hybrid chip easily; (3) this method promptly can be used for the making of full glass hybrid chip, can be used for the making of all-polymer and compound substance hybrid chip again.
The present invention is directed to the making difficult problem of the passive little mixing/reactor in the micro-fluidic chip, a kind of fast and convenient making microchannel is provided and in the microchannel, form to promote mixes and the method for the multi-level submicroscopic structure of reaction.This method both can have been made full glass hybrid chip, again can be through being converted into formpiston and then carrying out massive duplication, and the little hybrid chip that is used for polymkeric substance or compound substance is made.As above the microchannel with multi-level microstructure that forms of method can be used for promoting the passive mixing in the flow process, as the making of the miniature mixing/reactor that relates to reagent mix and a plurality of material chemical reactions.No matter the micro-mixer of this law processing is that the material fluid or the mixing of the material molecule in electric osmose/electrophoresis motion under pressure-driven is all very effective.The inventive method can be a basic material with glass, the base material cost is low, the physical strength height, optical clear, production environment there is not specific (special) requirements, only need single exposure and an etching, the submicroscopic structure in the hybrid channel of formation has certain streamlined, and potentiality are widely used in microfluidic analysis chip and microfluidic chemical reactor engineering.
Description of drawings
Fig. 1 is a glass mother board chip manufacture process flow diagram.
Fig. 2 is the chip manufacture process flow diagram based on glass mother board chip involution.
Fig. 3 is for being that former is made the chip manufacture process flow diagram that duplicates again behind the formpiston with the motherboard chip.
Fig. 4 is with the motherboard chip manufacturing of chromium plate glass baseplate and PMMA and PDMS reproduction process synoptic diagram, wherein (a) mask; (b) exposure imaging; (c) the development district removes sacrifice layer; (d) etching; (e) glue that delusters; (f) remove sacrifice layer (glass mother board chip); (g) PMMA in-situ polymerization; (h) PMMA formpiston; (i) PDMS in-situ polymerization; (j) demoulding (PDMS duplicates chip); (k) involution; (l) marginal data.
Fig. 5 is glass mother board chip figure, (a) mask synoptic diagram wherein, the wide 150um in main channel, 50 microns of submicroscopic structure width, 100 microns of spacings; (b) glass mother board microchannel and inner submicroscopic structure scanning electron microscope vertical view (enlargement factor 100); (c) submicroscopic structure scanning electron microscope vertical view (enlargement factor 240) in the glass mother board microchannel; (d) the micro-CCD sectional view in glass microchannel (25 show the speck mirror).
Fig. 6 is the full glass hybrid chip photo that obtains behind the punching involution.
Fig. 7 duplicates the micro-CCD figure of result for polymer chip, and 10 show the speck mirror, (a) PMMA formpiston vertical view; (b) PMMA formpiston sectional view; (c) PDMS duplicates the chip sectional view; (d) PDMS duplicates the sectional view behind chip and the PDMS cover plate involution.
Fig. 8 is mixed effect figure, the mixed effect figure under (a) pressure current wherein, (b) the mixed effect figure under the electroosmotic flow, (c) the mixed effect figure under the electrophoresis motion.
Embodiment
Fig. 5 has showed the manufacturing process of a Y shape micro-mixer glass mother board.This mixer has two materials to introduce passage, and the herring-bone form submicroscopic structure is arranged in the main hybrid channel.Mask prints to mylar with resolution 3000dpi laser photocomposing machine.Adopt commercialization that glass baseplate (the Changsha SG2506 of the beautiful springtime microelectronics main office type of chromium layer and the positive optical cement of AZ1805 is arranged, the thick 145nm of chromium plate chromium, the thick 550nm of glue), with 100W high-pressure sodium lamp ultraviolet source, with JKG-2A photoetching type (Shanghai Xueze Optical Mechanical Co., Ltd.) exposure 30 seconds.In 0.5%NaOH, shake gently and developed 45 seconds, in the baking oven 110 ℃ after 20 minutes, at the liquid (70%HClO that dechromises
4104ml+ (NH
4)
2Ce (NO
3)
6400g+1760ml H
2O) rock the chromium protective seam that removed exposure in 2 minutes in.HF-HNO with 1: 2: 7 volume ratio
3-H
2Etching of 35 ℃ of static state of O etching liquid water-bath is after 20 minutes, with 2%NaOH solution rock removed optical cement in 3 minutes after, in the liquid that dechromises, rock again and removed the chromium protective seam in 3 minutes.Fig. 5 (a) is used Y shape mixer mask synoptic diagram, mask microchannel width 150um, submicroscopic structure width 50um, spacing 100um.Fig. 5 (b) is the micro-CCD figure in the cross section, microchannel that obtains after the etching (25 show the speck mirror), microchannel width 260um, degree of depth 53um, ridged submicroscopic structure height 8um.Fig. 5 (c) is a Y shape hybrid channel intersection scanning electron microscope vertical view (enlargement factor 100).Fig. 5 (d) is the scanning electron microscope vertical view (enlargement factor 240) of submicroscopic structure in little hybrid channel.As above phenogram shows, by the design of mask and the control of etching degree, and single exposure, an etching has also formed in passage when obtaining little hybrid channel and has promoted the mobile submicroscopic structure that mixes.
The full glass-chip that utilizes the above mother glass chip peace sheet glass involution of making to obtain is shown in Fig. 6 photo.Admantine drill at motherboard chip upper channel end points place with diameter 1mm punches.Cover plate is the Changsha SG2506 of a beautiful springtime microelectronics main office type polished silicon wafer glass.Glass mother board chip peace sheet glass with the processing of deoiling of acetone and washing agent, is dried after the washed with de-ionized water, in 7: 3 (v/v) H earlier
2SO
4-H
2O
2Mixed liquor was handled 45 minutes for 100 ℃, fitted after the washed with de-ionized water, and hand-held electric heating hair-dryer dries up the back and be warmed up to 450 ℃ from room temperature in 3 hours in muffle furnace, keeps cooling to room temperature naturally after 3 hours.
Fig. 8 has provided the micro-CCD picture of the mixed effect of full glass hybrid chip under different flow states that utilizes the present invention to make that shows with different tracer agents.This test system carries out with the full glass hybrid chip of Fig. 6 that glass mother board peace sheet glass involution obtains.Mix microchannel length overall 5.5cm, same Fig. 5 of submicroscopic structure (d) in the microchannel, the wide 260um in microchannel, dark 53um.Mixed effect with the IBE2000 inverted fluorescence microscope (Chongqing Optical ﹠ Electrical Instrument Co., Ltd.) observation, CCD absorbs picture, utilize image pick-up card and computing machine with image with the document form record.Two materials to be mixed are placed two import liquid storage tanks respectively, two materials are mixed in little hybrid channel in flow process.Downstream 1.5cm and 3.0cm place observation mixed effect at two liquid stream mixing points.Bulk testing under the pressure current (Fig. 8 (a)) is inhaled to move with certain flow (1.25ul/min) in the outlet of hybrid chip with syringe pump and is placed the dye solution of two imports and colourless solution to carry out respectively.Bulk testing under the electroosmotic flow (Fig. 8 (b)) is to apply (outlet connects negative pole) under the 1500V high voltage condition between two imports and outlet, with 10mM Na
2CO
3-NaHCO
3The rhodamine B fluorescent dye of 1mM is observed under the exciting of 50W high voltage direct current mercury lamp light source and being obtained in the buffer solution (pH 9.3).Two imports add the fluorescent reagent and the background buffer solution of equal volume respectively, and the outlet liquid storage tank also adds isopyknic background buffer solution.Rhodamine B charged in this system is zero, moves along direction of an electric field with the electroosmotic flow in the microchannel in electric field.Mixing under the electrophoresis motion condition (Fig. 8 (c)) is to observe with the 1mM fluorescein molecule.Isopyknic luciferin solution and background buffer solution are placed two import liquid storage tanks respectively, and the outlet liquid storage tank also adds isopyknic background buffer solution.Applying the dc high voltage (outlet connects positive pole) of 2500V between import and outlet, is the fluoroscopic image of diverse location on the excitation source observational record hybrid channel with the high-pressure sodium lamp.In used buffer medium, fluorescein molecule is electronegative, and its mobility is greater than the electric osmose mobility in the microchannel, and direction of motion is opposite with direction of an electric field in the glass microchannel.By the picture that provides as seen, no matter the micro-mixer of this law processing is that the material fluid or the mixing of the material molecule in electric osmose/electrophoresis motion under pressure-driven is all very effective.
25ml methyl methacrylate (MMA) and 0.07g crosslinking chemical (benzoyl peroxide) are mixed, the glass mother board that is cast in method for preparing after 40 minutes is heated in 83 ℃ of water-baths microstructure one side, 40 ℃ of sand-baths are 24 hours in the ventilating kitchen, in baking oven, heated 2 hours under 100 ℃ again, peel off after in baking oven, naturally cooling to room temperature, obtain PMMA formpiston with the complementation of glass mother board microstructure.Fig. 7 (a) obtains and the micro-CCD vertical view of the PMMA formpiston of glass mother board microstructure complementation for turning over mould with as above PMMA in-situ polymerization, and Fig. 7 (b) be the sectional view of this PMMA formpiston, and microchannel on the visible mother glass and the interior submicroscopic structure of passage are successfully turned over mould.With bi-component PDMS performed polymer and hardening agent (Sylgard 184 types, Dow Coming Corp.USA) after mixing in 1: 10, is cast on the PMMA formpiston, 75 ℃ were heated 40 minutes in baking oven, peel off after outside baking oven, naturally cooling to room temperature, obtain PDMS and duplicate chip, Fig. 7 (c) duplicates the sectional view of chip for PDMS.PDMS duplicates chip through oxygen plasma washer (PDC-32G type, HARRICK, USA) after handling 60 seconds under 18W, the vacuum tightness 0.1MPa condition, directly fit with using the PDMS plain film of handling with method, realized the making of full PDMS hybrid chip, Fig. 7 (d) is the PDMS hybrid chip sectional view behind the involution.By this embodiment as seen, the glass mother board chip realizes successfully that with the method for polymer in situ polymerization PMMA turns over mould and PDMS duplicates, and has successfully realized involution with the plasma surface activation method.
The PDMS that said method obtains duplicates chip and places oxygen plasma washer (18W, vacuum tightness 0.1MPa) handled 60 seconds in, take out the back and directly fit and obtain the involution of satisfaction, obtain PDMS-glass composite material hybrid chip with the Changsha SG2506 of beautiful springtime microelectronics main office type polished silicon wafer.
Claims (6)
1. the method for making of passive micro-mixer and microreactor in the micro-fluidic chip is characterized in that with chromium plate glass be base material, and processing step is as follows:
(1) design and making mask;
(2) optical cement exposure imaging: utilize the method for ultraviolet light photoetching once to expose fully 20～50 seconds, the figure transfer on the mask to the chromium plate glass baseplate, after NaOH solution developed 40～60 seconds, is removed unexposed portion, expose sacrifice layer; Transfer in the baking oven 110 ℃ of heating 15～30 minutes then;
(3) remove development district chromium floor;
(4) etching: in the etching liquid that contains HF, the substrate of glass that exposes is carried out isotropic etching, control etching temperature room temperature～40 ℃, 1～160 minute time, static or shake, disposable etching obtains the microchannel of the degree of depth 1～500um, obtains submicroscopic structure in the passage simultaneously;
(5) glue that delusters: the base material that above-mentioned steps is obtained places NaOH solution or absolute ethyl alcohol, at room temperature rocks and removes optical cement remaining on the base material;
(6) layer that dechromises: spend chrome liquor and remove all chromium protective seams, obtain having the glass mother board chip of submicroscopic structure in microchannel and the passage;
(7) the in-situ polymerization formpiston is made: methyl methacrylate is mixed by 1: 0.001～0.003 weight ratio with crosslinking chemical, solidify under heating or ultraviolet lighting condition and finish in-situ solidifying, form the polymethylmethacrylate formpiston;
(8) demoulding: the polymethylmethacrylate and the glass mother board of polymerizing curable are peeled off, obtained polymethylmethacrylate formpiston with the complementation of glass mother board microstructure;
(9) the in-situ polymerization chip duplicates: dimethyl silicone polymer performed polymer and crosslinking chemical mixing are cast on the polymethylmethacrylate formpiston, heat down at 60～100 ℃ and finished the in-situ polymerization of dimethyl silicone polymer in 30 minutes～2 hours;
(10) chip is duplicated in the demoulding: the dimethyl silicone polymer and the polymethylmethacrylate formpiston of polymerization are peeled off obtained the dimethyl silicone polymer identical with the glass mother board microstructure and duplicate chip;
(11) involution: after the microchannel end points punching of duplicating the polydimethylsiloxanechip chip that obtains, obtain little hybrid chip with duplicating the polydimethylsiloxanechip chip and the cover plate involution that obtain.
2. according to the method for making of passive micro-mixer and microreactor in the described micro-fluidic chip of claim 1, the method that it is characterized in that described design of step (1) and making mask is: utilize figure to generate software and generate the mask graph of being made up of the black and white zone fully according to the micro-mixer designing requirement, printed on the mylar by the laser photocomposing machine of resolution greater than 2400dpi.
3. according to the method for making of passive micro-mixer and microreactor in the described micro-fluidic chip of claim 1, it is characterized in that the described method of distinguishing the chromium floor of going to develop of step (3) is: will be 70%HClO at prescription through the base material that step (2) is handled
4104ml+ (NH
4)
2Ce (NO
3)
6400g+1760ml H
2Rocked 120 ± 20 seconds in the liquid that dechromises of O, wash the chromium protective seam on the development figure off.
4. according to the method for making of passive micro-mixer and microreactor in the described micro-fluidic chip of claim 1, it is characterized in that step (7), (8) described method is specially: 25ml methyl methacrylate and 0.07g benzoyl peroxide crosslinking chemical are mixed, 83 ℃ of water-bath heating are after 40 minutes, be cast in the glass mother board that step (6) obtains microstructure one side is arranged, 40 ℃ of sand-baths are 24 hours in the ventilating kitchen, in baking oven, heated 2 hours under 100 ℃ again, peel off after in baking oven, naturally cooling to room temperature, obtain polymethylmethacrylate formpiston with the complementation of glass mother board microstructure.
5. according to the method for making of passive micro-mixer and microreactor in the described micro-fluidic chip of claim 1, it is characterized in that step (9), (10) described method are specially: with Sylgard 184 type bi-component dimethyl silicone polymer performed polymer and crosslinking chemicals, after mixing in 1: 10, be cast on the polymethylmethacrylate formpiston, 75 ℃ were heated 40 minutes in baking oven, peel off after outside baking oven, naturally cooling to room temperature, obtain dimethyl silicone polymer and duplicate chip.
6. according to the method for making of passive micro-mixer and microreactor in the described micro-fluidic chip of claim 1, it is characterized in that the described method of step (11) is specially: for polydimethylsiloxanechip chip, after Path end point is with the card punch punching, place the oxygen plasma washer under the 0.1MPa air conditions, to handle and carried out surface active in 20～120 seconds, or, obtain hybrid chip with dimethyl silicone polymer or cover glass involution with 2～6 hours surface actives of uviol lamp.
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| CN101434377B (en) * | 2008-11-28 | 2011-02-16 | 复旦大学 | Method for preparing organic glass micro-fluidic chip by infrared ray auxiliary mass polymerization |
| EP3671180B1 (en) | 2010-01-15 | 2023-03-08 | On-chip Biotechnologies Co., Ltd. | Method of using an apparatus configured to separate biological particles |
| CN103170378A (en) * | 2011-12-20 | 2013-06-26 | 中国科学院深圳先进技术研究院 | Micro fluidic chip apparatus used for immunization analysis |
| CN102527280B (en) * | 2012-01-11 | 2014-01-22 | 华中科技大学 | Micro mixing and micro reaction device |
| CN102556957B (en) * | 2012-03-19 | 2014-06-25 | 大连理工大学 | Method for manufacturing ion aggregation device of micro electro mechanical system (MEMS) air amplifier |
| CN102749804B (en) * | 2012-07-24 | 2013-11-06 | 长沙韶光铬版有限公司 | Optical cemented component manufacturing method |
| CN103447101B (en) * | 2013-07-23 | 2015-01-14 | 武汉友芝友医疗科技有限公司 | Method for preparing micro-flow chip |
| CN106268472B (en) * | 2016-08-26 | 2018-11-20 | 苏州含光微纳科技有限公司 | A kind of inverted V-shaped multistage mixing array structure for passive micro-mixer |
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