CN100381902C - Color liquid crystal panel, its manufacturing method and color liquid crystal display adopting the same - Google Patents
Color liquid crystal panel, its manufacturing method and color liquid crystal display adopting the same Download PDFInfo
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- CN100381902C CN100381902C CNB2005100849813A CN200510084981A CN100381902C CN 100381902 C CN100381902 C CN 100381902C CN B2005100849813 A CNB2005100849813 A CN B2005100849813A CN 200510084981 A CN200510084981 A CN 200510084981A CN 100381902 C CN100381902 C CN 100381902C
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Abstract
The present invention relates to a color liquid crystal board, a manufacturing method thereof and a color liquid crystal display which adopts the color liquid crystal board. In a reflection display part R of the liquid crystal board, some light which reaches a reflecting electrode through color filters penetrates through a slit and is emitted outside, and some light which reaches the reflecting electrode through the slit is emitted outside through the color filters. In addition, the light which reaches the reflecting electrode through the color filters, the light which is emitted outside through the color filters, and the light which has no opportunity to penetrate through the slit can also be observed. Therefore, during the time when the light is input to the inside until the light is emitted outside to pass by corresponding distances, the average thickness of films of the color filters which the light penetrates through is approximately equal to the thickness of films observed in a transmission display part T. In addition, because the ratio between the area of the slit and the area of the corresponding color filter can be changed according to color which needs to be displayed, the color reduction range of the reflection display part R and the color reduction range of the transmission display part T can be mutually consistent according to the color which needs to be displayed.
Description
Technical field
The present invention relates to a kind of color liquid crystal plate and manufacture method thereof that is suitable for use as the display of portable phone, and the colour liquid crystal display device that adopts this color liquid crystal plate.More particularly, the present invention relates to a kind ofly showing color liquid crystal plate and the manufacture method thereof that has the enhancing ability aspect the high quality graphic, and the colour liquid crystal display device that adopts this color liquid crystal plate.
Background technology
We know, as a kind of LCD that had not only possessed the feature of transmission type lcd device but also possessed the feature of reflection LCD, a kind ofly be developed by the semi-transmission type liquid crystal display device that a plurality of pixels constitute and its each pixel all has a transmission display part and a reflection display part.In this semi-transmission type liquid crystal display device, corresponding to each color to be shown, provide color filter that is used for the transmission display part and the color filter that is used to reflect the display part respectively, therefore, need provide 6 kinds of color filters altogether corresponding to each color.Like this, in order to produce colour liquid crystal display device, just need prepare 6 kinds of photoresist films, and then carry out 6 lithography steps corresponding to these color filters with above-mentioned color filter structure.Therefore, can therefrom find such defective, that is, exist the problem that output is too low and manufacturing cost is too high according to the produced semi-transmission type liquid crystal display device of said method.
Consider above-mentioned defective, in how tame publication, disclosed semi-transmission type liquid crystal display device described below recently such as Japanese Patent Application Publication No.2000-111902.In the structure of this semi-transmission type liquid crystal display device, only form a kind of color filter corresponding to each color, and have one wherein not exist the zone of color filter to be formed within the reflection display part.
The planimetric map of Fig. 1 shows the topology layout that is included in the TFT substrate among the conventional semi-transmission type liquid crystal display device that Japanese Patent Application Publication No.2000-111902 disclosed.The sectional view of Fig. 2 is the sectional view along the liquid crystal board that uses in conventional semi-transmission type liquid crystal display device of the acquisition of the A-A line among Fig. 1.
In this conventional semi-transmission type liquid crystal display device that above-mentioned publication disclosed, red pixel 101R, green pixel 101G and blue pixel 101B arrange along the bearing of trend of scan signal line according to this order.In each pixel, all be formed with a thin film transistor (TFT) (TFT) 102.Thin film transistor (TFT) 102 is made up of grid 103a that stretches out from the gate line 103 as scan signal line and the drain electrode 104a that stretches out from the drain line 104 that extends perpendicular to the gate line direction.Gate line 103 and grid 103a are formed on the transparency carrier 100a, and also have a dielectric film 105 to be formed on this transparency carrier 100a upward covering gate polar curve 103 and grid 103a.Drain line 104 is formed on the dielectric film 105.On dielectric film 105, face grid 103a and formed an amorphous si-layer 106, and drain electrode 104a extends on amorphous si-layer 106.In addition, also have a source electrode 107 on direction, to extend out, and the part of source electrode is positioned on the amorphous si-layer and inside at least from amorphous si-layer 106 away from drain electrode 104a.
In the reflection display part of each pixel, all there is bossing 108 to be formed on the dielectric film 105, and in the transmission display part, has a transparency electrode 109 to be formed on the dielectric film 105.Be noted that the reflection display part is around the transmission display part.In addition, be formed with a dielectric film 110 that covers bossing 108, thin film transistor (TFT) 102 etc. in the zone beyond the transmission display part of each pixel, and in dielectric film 110, also be formed with contact hole 111 to be stretched over the surface of source electrode 107.Reflecting electrode 112 be formed within the contact hole 111 and dielectric film 105 on.Reflecting electrode 112 has the convex-concave surface of the profile that reflects bossing 108.Reflecting electrode 112 also is connected with transparency electrode 109.In addition, there is not a side of the element of formation such as thin film transistor (TFT) 102 also to be formed with a retardation film 113 and a polaroid 114 at transparency carrier 100a.Said elements has just constituted the TFT substrate.
In addition, the parallel sided that also has another transparency carrier 100b quilt and transparency carrier 100a to be formed with thin film transistor (TFT) 102 is placed.Color filter (CF) 121 and counter electrode 122 are formed on transparency carrier 100b and the side surface that transparency carrier 100a faces mutually.As shown in Figure 1, color filter 121 is parallel to drain line 104 and extends, and when when seeing a pixel perpendicular to the direction on corresponding transparency carrier surface, transparency electrode 109 is formed within two end lines of color filter 121, and the width of reflecting electrode 112 exceeds two end lines.In addition, transparency carrier 100b do not have to form such as the element of color filter 121 side also be formed with a retardation film 123 and a polaroid 124.Said elements has just constituted the CF substrate.
Except above-mentioned liquid crystal board structure, between TFT substrate and CF substrate, also be injected with liquid crystal 130 to form liquid crystal board.
In having the conventional colour liquid crystal display device of said structure, corresponding to each color a kind of color filter is arranged, thereby it has processing step number still less in manufacture process, thereby output capacity is improved.
In addition, zone in the face of reflecting electrode 112 is arranged in the color filter 121 as the employed CF substrate of above-mentioned colour liquid crystal display device, in this zone, do not form color filter 121, thereby this colour liquid crystal display device can provide the bigger brightness of brightness that can realize than the colour liquid crystal display device of developing before the colour liquid crystal display device appearance of the color filter 121 that adopts this structure.
In addition, in conventional reflection LCD, its reflecting electrode lower edge all directions are formed with a plurality of bossings.These bossings are designed to have best pattern aspect incident light and the catoptrical path.Fig. 3 shows the layout of the bossing that adopts in conventional LCD.In reflection LCD, bossing 108 is not considered the boundary effect between pixel especially.In addition, have the transmission display part and only contain this bossing in the reflection display part with the LCD that reflects the display part.
But, compare with the two kinds of color filter LCD of employing that before the LCD appearance of adopting a kind of color filter, develop, only adopt a kind of color filter to be used in the conventional semi-transmission type liquid crystal display device of manufacture course of products minimizing (for example) number of process steps, having a problem corresponding to each color this, that is, its picture quality is relatively poor.
In addition, also have another problem, that is, the shown image of reflection LCD and semi-transmission type liquid crystal display device can present light yellow on color.
Summary of the invention
An object of the present invention is to provide a kind of color liquid crystal plate and manufacture method thereof that can improve the picture quality that in semi-transmission type liquid crystal display device, demonstrates, and a kind of colour liquid crystal display device that adopts this color liquid crystal plate.
The color liquid crystal plate of first aspect comprises according to the present invention: thin film transistor (TFT), the reflecting electrode that is connected with thin film transistor (TFT) and the transparency electrode that is arranged in each pixel.This color liquid crystal plate has a kind of like this structure, that is, the light that the display surface of color liquid crystal plate allows to send from backlight passes transparency electrode from the display surface outgoing, and other light that allows to input to display surface after the electrode reflection that is reflected also from the display surface outgoing.In addition, this color liquid crystal plate also has a kind of like this structure, promptly, contain color filter in the color liquid crystal plate, in the face of being formed with an opening that can change according to color to be shown at least in the part of reflecting electrode, and it is consistent with each other substantially to pass transparency electrode color rendition scope from other light of display surface outgoing after the light of display surface outgoing and the electrode reflection that is reflected at this color filter.
It should be noted that the color liquid crystal plate of first aspect preferably constitutes according to following content according to the present invention.Promptly, red color filter, green color filter and blue color filter are formed as color filter respectively, and the ratio of area and the color filter area of formed at least one opening is maximal value as color filter selecting green color filter under with the situation of calculating this ratio in the color filter.The color liquid crystal plate preferably also constitutes according to following content, promptly, adopting under the situation of white light source as backlight, the ratio of the area of formed at least one opening and green color filter area is two to four times of ratio of area and the corresponding red color filter or the blue color filter area of formed at least one opening in red color filter and the blue color filter in the green color filter.
In addition, the color liquid crystal plate of first aspect preferably also constitutes according to following content according to the present invention, promptly, in the color filter in the area of formed at least one opening and the color filter and the ratio of the area of the color filter part faced mutually of reflecting electrode be configured to one and be not more than 50% numerical value, and at least one opening is formed and is similar to slit-shaped, and its slit width is configured to the numerical value of one 1 μ m to 10 μ m.
The color liquid crystal plate of second aspect comprises according to the present invention: thin film transistor (TFT), the reflecting electrode that is connected with thin film transistor (TFT) and the transparency electrode that is arranged in each pixel.This color liquid crystal plate has a kind of like this structure, that is, the light that the display surface of color liquid crystal plate allows to send from backlight passes transparency electrode from the display surface outgoing, and other light that allows to input to display surface after the electrode reflection that is reflected also from the display surface outgoing.In addition, this color liquid crystal plate also contain color filter and be formed at color filter and transparency carrier between and can change the hyaline membrane of its volume according to color to be shown, in this color liquid crystal plate, it is consistent with each other substantially to pass transparency electrode color rendition scope from other light of display surface outgoing after the light of display surface outgoing and the electrode reflection that is reflected.
Color liquid crystal plate according to third aspect of the present invention comprises: transparency carrier, be formed at the thin film transistor (TFT) in each pixel on the transparency carrier, be formed on the transparency carrier and in each pixel, have the dielectric film of convex-concave surface, the reflecting electrode that is formed on the dielectric film and is connected with thin film transistor (TFT) in each pixel, in this color liquid crystal plate, dielectric film contains a plurality of bossings, each bossing all extends along the border of neighbor, and each protruding width all with constitute each pixel in the width of bossing of convex-concave surface equate substantially.
In order to address the above problem, the present inventor actively and repeatedly experimentizes and studies, and final the discovery exists following problem in the routine techniques that is disclosed such as Japanese Patent Application Publication No.2000-111902.That is, only have in a kind of transmission-type and reflection LCD of color filter corresponding to color to be shown, even people's visual sensitivity changes along with the color that shows, formed each patterns of openings also is consistent with each other in the corresponding color filter.Therefore, for the color filter with this opening, its structure will make the interior transmission display part of pixel different mutually with the color rendition scope of reflection display part, make transmission and reflection LCD that high-quality display image can't be provided thus.The present invention has considered the negative effect to image quality, thereby visualizes the liquid crystal board with following structure.That is, as mentioned above, formed aperture area changes according to the color that shows in the color filter in the reflection display part, perhaps forms a hyaline membrane between color filter and transparency carrier, and the volume of hyaline membrane is changed according to the color that shows.This liquid crystal board structure can so that the transmission display part with the reflection display part the color rendition scope corresponding to each color to be shown in other words, consistent with each other according to each color to be shown, that is to say corresponding to each color to be shown thus, produce the visual image of color balance according to each color to be shown, thereby realize high-quality image.
In addition, the inventor finds that also it is owing to causing there are differences in the gap between locational two substrates within the pixel and between the pixel that image presents lurid reason.Usually, in reflection LCD, the boundary between pixel does not form black matrix so that demonstration brightens.For this reason, can believe that the difference in above-mentioned gap makes the light different distance of passing by when passing liquid crystal, thereby makes light produce phase differential, and then makes the color of image be light yellow.Therefore, liquid crystal board of the present invention is made into the boundary that makes between the pixel and also is formed with bossing, has so just reduced the difference in gap, has reduced light yellow thus and has realized high-quality image.
A kind of method that is used to make according to color liquid crystal plate of the present invention of following formation.At first, this color liquid crystal plate comprises thin film transistor (TFT), the reflecting electrode that is connected with thin film transistor (TFT) and the transparency electrode that is arranged in each pixel, and it also is made into the light that the display surface that makes the color liquid crystal plate allows to send from backlight and passes transparency electrode from the display surface outgoing, and other light that allows to input to display surface after the electrode reflection that is reflected also from the display surface outgoing.Secondly, the method that is used to make above-mentioned color liquid crystal plate may further comprise the steps: prepare out a photomask according to a kind of like this mode, that is, in this photomask, form an opening at least, and the area of at least one opening can be changed according to color to be shown; Utilize this photomask in constituting the raw material film of color filter, to form mask pattern, so that contain the opening that at least one can change according to color to be shown and face mutually with reflecting electrode in the color filter.
It should be noted, for this method that is used for making the color liquid crystal plate, it preferably also comprises and forms hyaline membrane covering the step of the whole color filters that form corresponding to color to be shown, and the step that after color filter forms step hyaline membrane is flattened.
According to the above method that is used to make the color liquid crystal plate, just can produce first aspect and can show the color liquid crystal plate of high quality graphic according to the present invention.
In addition, colour liquid crystal display device according to the present invention includes the liquid crystal board according to the present invention first, second and the 3rd aspect structure.
Description of drawings
The planimetric map of Fig. 1 shows the topology layout that is included in the TFT substrate among the conventional semi-transmission type liquid crystal display device that Japanese Patent Application Publication No.2000-111902 disclosed;
Fig. 2 is the sectional view along the liquid crystal board that uses in conventional semi-transmission type liquid crystal display device of the acquisition of the A-A line among Fig. 1;
Fig. 3 shows the layout of the bossing that is adopted in the conventional LCD;
The planimetric map of Fig. 4 shows the topology layout of the TFT substrate that adopts in the liquid crystal board according to first embodiment of the invention;
Fig. 5 is the sectional view that takes out along the A-A line among Fig. 4;
Fig. 6 is the sectional view that takes out along the B-B line among Fig. 4;
Fig. 7 is the sectional view that takes out along the C-C line among Fig. 4;
Fig. 8 is the spectrogram of standard light CIE " C ";
Fig. 9 is the spectrogram of the light that sends of white light LEDs;
Figure 10 is an XYZ chromaticity diagram, shows to use in TV shows and by the optimum color reduction scope of NTSC definition;
Figure 11 is the spectrogram of the light that sends from first three-wavelength source;
Figure 12 is the spectrogram of the light that sends from second three-wavelength source;
The planimetric map of Figure 13 A, 13B and 13C shows the pattern of various color filters in the respective pixel;
Figure 14 is the sectional view according to the liquid crystal board of second embodiment of the invention that takes out along the A-A line among Fig. 4;
Figure 15 is the sectional view according to the liquid crystal board of second embodiment of the invention that takes out along the B-B line among Fig. 4;
Figure 16 is the sectional view according to the liquid crystal board of second embodiment of the invention that takes out along the C-C line among Fig. 4;
Figure 17 A shows the topology layout of the bossing that forms under the reflecting electrode in the liquid crystal board of third embodiment of the invention, and Figure 17 B is the schematic cross-section of this liquid crystal board;
The synoptic diagram of Figure 18 is used to explain the width of bossing and it is with the relation between the height of wide variety;
The synoptic diagram of Figure 19 A and 19B has illustrated the method for making bossing by two step of exposure;
The synoptic diagram of Figure 20 A and 20B has illustrated by two step of exposure and has made the method for bossings and show treatment step after step shown in Figure 19 A and the 19B in order;
The synoptic diagram of Figure 21 has illustrated by two step of exposure and has made the method for bossings and show treatment step after step shown in Figure 20 A and the 20B;
The synoptic diagram of Figure 22 A and 22B has illustrated the method for making bossing by a step of exposure;
The synoptic diagram of Figure 23 A and 23B has illustrated by step of exposure and has made the method for bossing and show treatment step after step shown in Figure 22 A and the 22B in order;
The block scheme of Figure 24 shows the structure of a kind of portable data assistance that produces according to the embodiment of the invention;
The block scheme of Figure 25 shows the structure of a kind of portable phone that produces according to the embodiment of the invention.
Embodiment
Below with reference to accompanying drawing to according to described liquid crystal board of the embodiment of the invention and manufacture method thereof and adopt the LCD of this color liquid crystal plate to describe.The planimetric map of Fig. 4 shows the topology layout of the TFT substrate that adopts in the described liquid crystal board of first embodiment of the invention.Fig. 5 is the sectional view that takes out along the A-A line among Fig. 4, and Fig. 6 is the sectional view that takes out along the B-B line among Fig. 4, and Fig. 7 is the sectional view that takes out along the C-C line among Fig. 4.
First embodiment also adopted with conventional LCD in similar liquid crystal board structure.That is, in the liquid crystal board structure of first embodiment, red pixel 101R, green pixel 101G and blue pixel 101B are arranged along the bearing of trend of scan signal line according to this order.In each pixel, all be formed with a thin film transistor (TFT) (TFT) 102.Thin film transistor (TFT) 102 is made up of grid 103a that stretches out from the gate line 103 as scan signal line and the drain electrode 104a that stretches out from the drain line 104 that extends perpendicular to the gate line direction.Gate line 103 and grid 103a are formed on the transparency carrier 100a, and also have a dielectric film 105 to be formed on this transparency carrier 100a upward covering gate polar curve 103 and grid 103a.Drain line 104 is formed on the dielectric film 105.On dielectric film 105, face grid 103a and be formed with an amorphous si-layer 106, and drain electrode 104a extends on amorphous si-layer 106.In addition, source electrode 107 stretches out from amorphous si-layer 106 on the direction away from drain electrode 104a, and the part of source electrode is positioned on the amorphous si-layer and inside at least.
In addition, in the present embodiment, the line that the direction that each pixel is paralleled with scan signal line by an edge stretches is separated into, for example, and approximately equalised two parts, that is, and reflection display part R and transmission display part T.In this case, reflection display part R is positioned in the middle of the part that pixel comprises thin film transistor (TFT) 102.
In addition, in the R of the reflection display part of each pixel, bossing 8 is formed on the dielectric film 105.Bossing 8 by, for example, dielectric film constitutes.In addition, be formed with dielectric film 10 with covering bossing 8, thin film transistor (TFT) 102 etc., and in dielectric film 10, also be formed with a contact hole 11 to be stretched over the surface of source electrode 107.And, in reflection display part R, have a reflecting electrode 12 to be formed within the contact hole 11 and dielectric film 10 on.This reflecting electrode 12 has the convex-concave surface of the profile that reflects bossing 8.On the other hand, in the T of transmission display part, have a transparency electrode 9 to be formed on the dielectric film 10, and reflecting electrode 12 and transparency electrode 9 are overlapped near the boundary between reflection display part R and the transmission display part T.In addition, on having to form side such as the element of thin film transistor (TFT) 102, transparency carrier 100a also is not formed with a retardation film 113 and a polaroid 114.Each element with said structure has constituted the TFT substrate.
In addition, the parallel sided that also has another transparency carrier 100b quilt and transparency carrier 100a to be formed with thin film transistor (TFT) 102 is placed.Color filter (CF) 21 is formed on transparency carrier 100b and the side surface that transparency carrier 100a faces mutually.To shown in Figure 7, color filter 21 is parallel to drain line 104 and extends as Fig. 4, and when when seeing a pixel perpendicular to the direction on corresponding transparency carrier surface, transparency electrode 9 and reflecting electrode 12 are formed within two end lines of color filter 21.In addition, in reflection display part R, a plurality of slit 21a are arranged in color filter 21.Slit 21a is formed has for example width of 1 μ m to 10 μ m, and it occupies below 50% of area of color filter 21 in the reflection display part R.Be noted that, the occupied area of slit 21a can change according to color to be shown with the ratio that reflects the area of color filter 21 in the R of display part, and in the present embodiment, the occupied area ratio of slit 21a that forms in green pixel 101G is (for example) three times of the area ratio that occupied respectively of the slit 21a that forms in red pixel 101R and blue pixel 101B.In addition, though slit 21a extends on the direction that is parallel to color filter 21 in the present embodiment, present embodiment is not limited to have the slit of said structure, also can adopt other slit with the pattern that is different from slit 21a.
In addition, also have a coating 25 to be formed on the last slit 21a that fills of transparency carrier 100b and cover color filter 21 simultaneously, and have a counter electrode 122 to be formed on the coating 25.Coating 25 is made of (for example) transparent resin, and 122 of counter electrodes are made of (for example) ITO (indium tin oxide).
Do not form at transparency carrier 100b on the side of color filter 21 elements such as grade and also be formed with retardation film 123 and polaroid 124.Having as above, these elements of structure have constituted the CF substrate.
Next, liquid crystal 130 is injected between TFT substrate and the CF substrate.
In having first embodiment of said structure, in the T of transmission display part, the light that sends from the backlight (not shown) passes color filter 21 and shines the outside.In reflecting display part R, the light that a part is passed color filter 21 arrival reflecting electrodes 12 shines the outside through slit 21a, and the light of part process slit 21a arrival reflecting electrode 12 color chips 21 after filtration shines the outside.Also have, in reflection display part R, can see following phenomenon.That is, pass light that color filter 21 arrives reflecting electrodes 12 after filtration color chips 21 shine the outside, pass the light that slit 21a arrives reflecting electrode 12 and shine the outside through slit 21a.Therefore, inputing to innerly until shining the outside from the light that sends of reflection display part R, light was passed by in time of respective distance, and the average film thickness that light will pass color filter is approximately equal to observed thickness in the T of transmission display part.In addition, because in the present embodiment, the ratio (hereinafter referred to as " aperture than ") of the area of color filter can change according to color to be shown in the area of slit 21a and the reflection display part R, thereby the color rendition scope that just can make the color rendition scope of reflection display part R and transmission display part T is according to color to be shown and consistent with each other.As a result, this LCD panel that constitutes according to foregoing just can demonstrate high-quality image.
Next will the relation between aperture ratio and the color balance degree be described.
In order to make above-mentioned relation clearer, the present inventor has done a simulation in the following manner: at first, decision uses a white light-emitting diode (LED) as backlight; Secondly, change the thickness of color filter; The 3rd, calculate the aperture ratio for each film thickness gauge of color filter, the numerical value that conforms to substantially with chromaticity coordinates and CIE (International Center for Education) chromaticity coordinates that obtains making the transmission display part.In this case, standard light CIE " C " is used as the light that is incident to the reflection display part.Fig. 8 is the spectrogram of standard light CIE " C ", and Fig. 9 is the spectrogram of the light that sends from White LED.It should be noted, by normalization, be 1 thereby make the maximal value value of light intensity along the light intensity of the longitudinal axis among Fig. 8 and Fig. 9.By carrying out table 1 that result that above-mentioned simulation obtains will be below to shown in the table 7.
Table 1
Table 2
Table 3
Table 4
Table 5
Table 6
Table 7
It should be noted, the NTSC ratio in the table refer to corresponding display part the color rendition scope area be suitable for most that TV shows and by the ratio of the area of the color rendition scope of NTSC (National Television System Committee (NTSC)) definition.Figure 10 is an XYZ chromaticity diagram, and it shows the color rendition scope that is suitable for the TV demonstration most and is defined by NTSC.
To shown in the table 7, be formed in the color filter so that color filter has under the situation of suitable aperture ratio the chromaticity coordinates and the NTSC ratio and the value basically identical that calculates for the reflection display part that calculate for the transmission display part at slit as above-mentioned table 1.On the other hand, do not form under the situation of slit in the color filter in the reflection display part, the chromaticity coordinates and the NTSC ratio that calculate for the transmission display part have very big difference with the value of calculating for the reflection display part.In addition, as shown in table 5, be formed in the color filter so that under the situation of color filter that have and the irrelevant constant aperture ratio of color to be shown in the reflection display part, the difference between the color rendition scope of each display part is little at slit.But, along with observed color saturation in green pixel increase and in red pixel and blue pixel observed color saturation reduce, in the transmission display part with reflect that observed respectively tone is different in the display part.
In addition, the present inventor simulates according to following steps: at first, decision uses a three-wavelength source (first three-wavelength source) as backlight; Secondly, change the thickness of color filter; The 3rd, calculate the aperture ratio for each film thickness gauge of color filter, the numerical value that conforms to substantially with chromaticity coordinates and CIE (International Center for Education) chromaticity coordinates that obtains making the transmission display part.In this case, standard light CIE " C " is used as the light that is incident to the reflection display part.Figure 11 is the spectrogram of the light that sends from first three-wavelength source.Can see, thereby be made the maximal value of light intensity be taken as 1 by normalization along the light intensity of the longitudinal axis among Figure 11.By carrying out table 8 that result that above-mentioned simulation obtains will be below to shown in the table 10.
Table 8
Table 9
Table 10
As above table 8 to shown in the table 10, be formed in the color filter so that color filter has under the situation of suitable aperture ratio at slit, even change employed light source in the simulation, the chromaticity coordinates and the NTSC ratio and the value of calculating for the reflection display part also basically identical that calculate for the transmission display part.On the other hand, as shown in table 9, slit be formed in the color filter so that color filter in the reflection display part, have with the irrelevant constant aperture of color to be shown than under the situation, the difference between the color rendition scope of each display part is also little.But, along with observed color saturation in green pixel increase and in red pixel and blue pixel observed color saturation reduce, in the transmission display part with reflect that observed respectively tone is different in the display part.
To the relation between aperture ratio and the light source be described in the following description.When the spectrum of the light that sends from light source changes, pass the also correspondingly change of chromaticity coordinates that the color filter transmission display part in shines outside light.By the numerical value of above-mentioned table 1 to the numerical value of the corresponding entry shown in the table 7 and above-mentioned table 8 to the corresponding entry shown in the table 10 is compared, also be appreciated that above-mentioned explanation.In order to make the relation between optimum aperture ratio and the light source clearer, the inventor has done a simulation.In this simulation, the thickness of color filter is fixed to 1.6 μ m, and above-mentioned White LED, first three-wavelength source and additional three-wavelength source (second three-wavelength source) are used as light source.Figure 12 is the spectrogram of the light that sends from second three-wavelength source.Can see, thereby be made the maximal value of light intensity be taken as 1 by normalization along the light intensity of the longitudinal axis among Figure 12.By carrying out table 11 that result that above-mentioned simulation obtains will be below to shown in the table 13, table 11 to table 13 has been represented the situation that adopts White LED, first three-wavelength source and second three-wavelength source respectively.
Table 11
Table 12
Table 13
As shown in table 13, in simulation, adopt under the situation of second three-wavelength source, when the aperture that is applied to red color filter and green color filter when consistent with each other, can obtain optimum color reduction scope.
The result of acquisition tells us in these simulations, no matter adopts which kind of light source in simulation, all should make the aperture that is applied to green color filter than be maximum in being applied to three apertures ratios of red, green, blue look color filter.Specifically, in simulation, adopt under the situation of white light source, preferably make the aperture that is applied to green color filter than two to four times for the aperture ratio that is applied to red and blue color filter.
It should be noted that the width of the slit of color filter is preferably between 1 μ m to the 10 μ m.When the width of slit is narrower than 1 μ m, the operation that forms corresponding pattern in color filter will be very difficult.On the other hand, when the width of slit is wider than 10 μ m, then make the coating that is formed on the color filter whole operation that flattens to become very difficult.
Already mentioned in above-mentioned explanation, the opening of color filter is not limited in above-mentioned slit, also can adopt to have other opening that is different from slit pattern.In addition, the relative position relation between reflection display part and the transmission display part also is not limited only to reflect the said structure of demonstration and transmission display part.
The planimetric map of Figure 13 A, 13B and 13C shows the pattern of various color filters in the pixel and the position relation between reflection display part and the transmission display part.
For example, as shown in FIG. 13A, by under according to the separated situation of the mode in the foregoing description, liquid crystal board of the present invention can adopt the opening 41a that is formed among the color filter 41 and is placed in the central authorities of reflection display part R at reflection display part R and transmission display part T.
In addition, shown in Figure 13 B, reflection display part R and transmission display part T be separated out so that reflect display part R by transmission display part T around situation under, liquid crystal board of the present invention can adopt the opening 42a that is formed among the color filter 42 and is placed in the central authorities of reflecting display part R.
In addition, shown in Figure 13 C, be separated out so that transmission display part T is inserted under two situations between the reflection display part R at reflection display part R and transmission display part T, liquid crystal board of the present invention can adopt following dot structure.That is, pixel is constructed such that the end line 43a of color filter 43 is in the position than the more close transmission of the outer end line display part T of two reflection display part R, has formed a plurality of zones that wherein do not form color filter 43 thus in pixel.
It should be noted no matter what the pattern of color filter is, all preferably make the ratio of the area of aperture area and reflection display part be equal to or less than 50%.In other words, color filter need be formed and occupy at least 50% of reflection display part whole area.Its reason is as follows.Promptly, when color filter occupies 50% when following of reflection display part whole area, in a period of time (during this period of time, light is being input to the inner corresponding distance of having passed by during shining the outside) on the light of having no chance to pass color filter and the reflection display part all the ratio of light can increase, thereby make the color rendition scope of reflection display part be difficult to consistent with the transmission display part.
Below will describe second embodiment of the present invention.In second embodiment, the thickness of color filter is thin in the Film Thickness Ratio transmission display part of the color filter in the transmission display part.Figure 14,15 and 16 sectional view show the structure according to the liquid crystal board of second embodiment of the invention that obtains along the A-A line among Fig. 4, B-B line and C-C line respectively.Can see, the parts and the element that use in the two or two embodiment shown in Figure 14,15 and 16 have also obtained use in first embodiment shown in Fig. 4,5,6,7,8, and they have with first embodiment in identical label, so omit detailed description thereof.
Second embodiment also comprises the following structure with the similar liquid crystal board of first embodiment.That is, the liquid crystal board of second embodiment is configured to like this, and the line that the direction that its each pixel is paralleled with scan signal line by an edge stretches is separated into, for example, and approximately equalised two parts, that is, and reflection display part R and transmission display part T.In addition, the TFT substrate is also constructed according to the mode identical with first embodiment.
CF substrate among second embodiment is constructed such that color filter 51 is formed on transparency carrier 100b and the surface that transparency carrier 100a faces mutually.In addition, in reflection display part R, there is a transparent resin layer 52 to be formed between color filter 51 and the transparency carrier 100b.In this case, the ratio of the whole volume of color filter 51 and transparent resin layer 52 in the volume of transparent resin layer 52 and the reflection display part R (following this ratio is called " volume ratio ") is set to the numerical value of (for example) 35% to 65%.Can adjust this volume ratio by the thickness or the area that change transparent resin layer 52.Can see that volume ratio changes according to color to be shown, and in the present embodiment, the volume ratio that is applied to green pixel 101G is about three times of the volume ratio that is applied to red pixel 101R and blue pixel 101B.In addition, though transparent resin layer 52 is formed and covers fully on the color filter 51 in the present embodiment, present embodiment is not limited to the said structure of transparent resin layer and color filter.Make color filter 51 with reflection display part R and corresponding two zones of transmission display part T on same plane in have flat surfaces also can be satisfactory.
In the liquid crystal board of second embodiment that as above makes up, in the T of transmission display part, the light that sends from backlight (not shown) color chips 51 after filtration shines the outside.In reflection display part R, the light of color chips 51 arrival reflecting electrodes 12 passes color filter 51 and shines the outside after filtration.In this case, because the thickness of color filter 51 is made into half that is about interior color filter 51 thickness of transmission display part T in the reflection display part R, input at light and inner to pass by in time of respective distance the actual thickness of the color filter that light passed and observed thickness approximately equal in the T of transmission display part until shining the outside.In addition, in the present embodiment, the volume ratio of calculating owing to the volume for transparent resin layer 52 changes with color to be shown, thereby just can make the color rendition scope of color rendition scope and transmission display part T of reflection display part R consistent with each other, and then the permission liquid crystal board shows high-quality image.
Next will the relation between volume ratio and the color balance degree be described.The present inventor by with first embodiment in similar simulation make above-mentioned relation clearer: at first, decision uses a three-wavelength source (first three-wavelength source) as backlight; Secondly, change the thickness of color filter and change the area of transparent resin layer simultaneously; The 3rd, calculate volume ratio according to each film thickness gauge of color filter, the numerical value that conforms to substantially with chromaticity coordinates and CIE (International Center for Education) chromaticity coordinates that obtains making the transmission display part.In this case, standard light CIE " C " is used as the light that is incident to the reflection display part.By carrying out table 14 that result that above-mentioned simulation obtains will be below to shown in the table 15.
Table 14
Table 15
It should be noted, volume that the ratio of the area of color filter in area of " area than " the expression transparent resin layer in the last table and the reflection display part, " volume ratio " in the last table are then represented transparent resin layer and the ratio that reflects the whole volume of color filter and transparent resin layer in the display part.In addition, the film thickness of color filter in " thickness " expression transmission display part, it with reflect the display part in the whole thickness of color filter and transparent resin layer consistent.
Shown in top table 14 and 15, in transparent resin layer is formed on the reflection display part and have under the situation of proper volume ratio, the chromaticity coordinates that calculates for the transmission display part and NTSC ratio with conform to substantially for reflecting the result who calculates the display part.
Below will describe a kind of method that is used to make according to the liquid crystal board of first embodiment of the invention.Can utilize the method identical to make the TFT substrate with making method that conventional liquid crystal board adopts.On the other hand, can adopt (for example) following method to make the CF substrate: at first, on transparency carrier 100b, to be coated with last layer photosensitive resin film to expect film as the source that constitutes monochromatic filter; The second, utilize photomask that the photosensitive resin film is exposed with predetermined slit pattern, then the photosensitive resin film is developed.By these steps, the photosensitive resin film just obtains composition and forms the monochromatic filter 21 with slit 21a.Carry out above-mentioned these steps to form three kinds of color filters 21 respectively.It should be noted, for example, when utilizing photomask to form green color filter, corresponding to the ratio maximum of the pattern area that will on photomask, form with the photomask area of slit.That is, the ratio that is applied to corresponding color filter can independently be adjusted.In other words, photomask formed separately with have corresponding with formed slit pattern in the color filter and with the corresponding pattern of color to be shown.Adopt in LCD under the situation of white light source, the area that preferably makes slit pattern and the ratio of the area of the photomask that is used to form green color filter are about two to four times of the reply photomask applies when being used to form redness or blue color filter area ratio.
After forming three kinds of color filters, overlayer is formed and carries out smoothly on the whole surface of transparency carrier 100b simultaneously, and has also formed a counter electrode thereon.In addition, on forming a side of color filter, transparency carrier 100b also do not form a retardation film and a polaroid.
Below will the method that be used to make according to the liquid crystal board of second embodiment of the invention be described.Can utilize the method identical to make the TFT substrate with making method that conventional liquid crystal board adopts.On the other hand, can adopt (for example) following method to make the CF substrate: at first, to prepare photomask in such a way in advance, that is, make in each photomask that forms corresponding to color to be shown to have and the corresponding pattern of the pattern of transparent resin film; The second, on transparency carrier 100b, coat the starting material that constitute transparent resin film; The 3rd, utilize above-mentioned photomask in the starting material film, to form corresponding pattern, on transparency carrier 100b, form transparent resin film 52 subsequently; The 4th, on transparency carrier 100b, coat the starting material film of another layer formation color filter again, carry out corresponding treatment step then, for example, another layer starting material film is exposed and develops forming color filter, thereby it is had and the corresponding flat surfaces of color to be shown.It should be noted, when utilizing photomask to form green color filter, be formed among the photomask and with the ratio maximum of area with the photomask area of the corresponding pattern of transparent resin film.That is, the ratio that is applied on the corresponding color filter can independently be adjusted.In other words, photomask is formed to have and the pattern of transparent resin film and the corresponding pattern of color to be shown separately.In LCD, adopt under the situation of white light source, preferably make the ratio of the area that is formed at the pattern among the photomask and the area of the photomask that is used to form green color filter be about two to four times of the reply photomask applies when being used to form redness or blue color filter area ratio.
After forming three kinds of color filters, overlayer is formed also to be realized smoothly simultaneously on the whole surface of transparency carrier 100b, and also formed a counter electrode thereon.In addition, on forming the back surface of color filter, transparency carrier 100b also is not formed with a retardation film and a polaroid.
Between the adjacent color filter of CF substrate, do not contain black matrix though should be noted that the liquid crystal board that is adopted among first and second embodiment, liquid crystal board can be made between the adjacent color filter of CF substrate yet and be formed with black matrix.In addition, be not formed with a color filter thereon, make on the color filter substrate that is formed with thin film transistor (TFT) formed thereon but liquid crystal board can be made though the liquid crystal board that is adopted among first and second embodiment forms on the transparency carrier of thin film transistor (TFT) yet.In this case, color filter is formed on, for example, and on reflecting electrode or the transparency electrode.
Below will describe the 3rd embodiment of the present invention.The purpose of the 3rd embodiment provides the LCD that a kind of colourity of wherein color is improved.Figure 17 A shows the topology layout of the bossing that forms under the reflecting electrode in the liquid crystal board of third embodiment of the invention, and Figure 17 B is the schematic cross-section of this liquid crystal board.
In first and second embodiment, bossing 8 is formed in all directions under the reflecting electrode, thereby reflecting electrode is had reflect the convex-concave surface of bossing profile.In the present embodiment, except bossing 8, the direction that the bossing 58 that forms in forming the same step of bossing 8 extends along scan signal line (gate line) is formed within the frontier district between the neighbor.The width of bossing 58 and height and the width of bossing 8 and highly basic identical.
According to the 3rd embodiment that constitutes according to foregoing, shown in Figure 17 B, color filter 21 and the gap " d1 " between the dielectric film 10 under the pixel internal reflection electrode and transparency carrier 100b and between pixel the difference between the gap between the dielectric film in the juncture area 10 " d2 " done to such an extent that be shorter than viewed difference gap in conventional liquid crystal board.More particularly, in conventional liquid crystal board, owing to have undesirable juncture area (wherein not forming bossing 108) in the juncture area between pixel, so compare with viewed gap in the present embodiment (wherein not having this undesirable juncture area), the gap between undesirable juncture area and the transparency carrier 100b seems big especially.According to the liquid crystal board in the present embodiment, can from show, eliminate the image that presents light yellow color substantially.
It should be noted that the width of supposing bossing 58 is that the width of W1 and bossing 8 is W2, then bossing 58 and bossing 8 preferably satisfy following formula:
(W2-1)≤(unit: μ m) of W1≤(W2+1)
In addition, then better if can make bossing 58 and bossing 8 satisfy following formula:
(W2-0.5)≤(unit: μ m) of W1≤(W2+0.5)
The synoptic diagram of Figure 18 is used to explain the width of bossing and it is with the relation between the height of wide variety.Done to such an extent that be longer than under the situation of " W1 " at " W2 ", when bossing experiences thermal treatment (material liquefies by baking) in corresponding manufacturing step, the difference between bossing 8 and 58 the surface tension will make the material that constitutes bossing 8 flow into bossing 58 according to the direction of arrow " A ".As a result, the height of bossing 58 becomes and is longer than design load, and the height of bossing 8 then becomes and is shorter than design load.In contrast, done to such an extent that be shorter than under the situation of " W1 " at " W2 ", the height of bossing 58 becomes and is shorter than design load, and the height of bossing 8 then becomes and is longer than design load, makes the effort of eliminating the difference between the gap " d1 " and " d2 " become impossible thus.Therefore, it is equal substantially to need value with " W1 " and " W2 " to be designed to, and also need guarantee the surplus in the above-mentioned formula simultaneously.Can see that if the sectional view shown in Figure 17 B is accurately drawn with corresponding to Figure 17 A, then bossing 8 also should be drawn among Figure 17 B.But for simplicity, in the sectional view shown in Figure 17 B, bossing 8 is omitted, and the bossing 58 that only drawn.In addition, skilled person in the art should be understood that the liquid crystal board shown in Figure 14 and Figure 16 also constructs according to foregoing,, except bossing 8, also has the bossing 58 that has same widths and height with bossing 8 that is.
Below will describe a kind of method of utilizing individual layer photosensitive resin thin film fabrication to be positioned at the bossing under the reflecting electrode.At first a kind of method of making bossing by two step of exposure is described, and then a kind of method of making bossing by a step of exposure is described.Figure 19 A, 19B, 20A, 20B and 21 synoptic diagram show the method that is used for making by two step of exposure bossings in order.
At first, shown in Figure 19 A, after forming TFT (not shown) etc., will be coated on the transparency carrier 100a by the etchant resist 71 that photosensitive resin constitutes.Smear before operation finishes above-mentioned, prepare what a photomask 72, that is, on a transparency carrier 74, form a Cr film 73 according to a kind of like this mode, it can prevent light incide on the etchant resist 71 with the corresponding part of bossing on.
Next, shown in Figure 19 B, utilize 72 pairs of etchant resists 71 that constitute by photosensitive resin of photomask to expose, thereby in etchant resist 71, form exposed portion 71a.In this case, exposure depth preferably is limited in (for example) arrives the film thickness of the etchant resist 71 that is made of photosensitive resin downwards from etchant resist surface half position of pact.
Afterwards, shown in Figure 20 A, prepare what a photomask 75, that is, on a transparency carrier 74, form a Cr film 76, in this film with in the contact hole 11 corresponding parts, have an opening according to a kind of like this mode.Then, utilize 75 pairs of etchant resists 71 that constitute by photosensitive resin of photomask to expose, thereby on etchant resist 71, form another part 71a that is exposed, it with etchant resist on will to form the position of contact hole 11 in the back corresponding, and the surface of arrival source electrode (not shown).
Then, shown in Figure 20 B, the part 71a that etchant resist is developed and is exposed to remove.
Next, as shown in figure 21, the etchant resist 71 that is made of photosensitive resin is toasted so that flow around its step on the surface that is present in the etchant resist 71 that is made of photosensitive resin.As a result, bossing and contact hole 11 have just been formed.
Next will describe a kind of method of making bossing by a step of exposure.The synoptic diagram of Figure 22 A, 22B, 23A and 23B shows the method that is used for making by a step of exposure bossing in order.
At first, shown in Figure 22 A, after forming the TFT (not shown), an etchant resist 71 that is made of photosensitive resin is coated on the transparency carrier 100a.Above-mentioned smear the operation finish before, prepare what a photomask 82 in such a way, promptly, on a transparency carrier 84, form a semitransparent thin film 83, only in this film with in the contact hole 11 corresponding parts, has an opening, and forming a Cr film 85 on this semitransparent thin film with on the corresponding position of bossing, it can prevent that light from inciding on the etchant resist 71.In this case, semitransparent thin film 83 is made of (for example) metal oxide film.
Next, shown in Figure 22 B, utilize 82 pairs of etchant resists 71 that constitute by photosensitive resin of photomask to expose to form exposed portion 71b.In this case, exposure depth preferably is limited in (for example) arrives the film thickness of the etchant resist 71 that is made of photosensitive resin downwards from etchant resist surface half position of pact.As a result, just in the etchant resist 71 that constitutes by photosensitive resin, formed exposed portion 71b.Can directly receive the exposure of not passing semitransparent thin film 83 with contact hole 11 corresponding parts among the exposed portion 71b, therefore, exposure depth is positioned at the near surface of source electrode (not shown).
Afterwards, shown in Figure 23 A, the part 71b that etchant resist is developed and is exposed to remove.
Next, shown in Figure 23 B, the etchant resist 71 that is made of photosensitive resin is toasted so that flow around its step on the surface that is present in the etchant resist 71 that is made of photosensitive resin.As a result, bossing and contact hole 11 have just been formed.
It should be noted that though utilize the etchant resist that is made of photosensitive resin to form bossing in the present embodiment, replace, present embodiment also can adopt following method to make bossing.That is, for example, form a plurality of bossings that constitute by dielectric film, and form another dielectric film thereon again, form a convex-concave surface thus in the boundary in pixel and between the pixel to cover the whole film of above-mentioned dielectric film.
In addition, the structure of the liquid crystal board that is adopted among structure that also can be by the liquid crystal board that will be adopted among one of first and second embodiment and the 3rd embodiment combines to construct according to liquid crystal board of the present invention.
The liquid crystal board of producing according to the foregoing description can be applied to, for example, and in the middle of the display of portable data assistance, portable phone, pocket pc, notebook computer or desktop personal computer.The block scheme of Figure 24 shows the structure of a kind of portable data assistance that produces according to the embodiment of the invention.In addition, the block scheme of Figure 25 shows the structure of a kind of portable phone that produces according to the embodiment of the invention.
Contain a display unit 268 according to the produced portable data assistance 250 of the embodiment of the invention, it by liquid crystal board 265, backlight unit 266 and the image signal processing unit 267 that is used to handle picture signal form.In addition, portable data assistance 250 also contains: control module 269 is used to control each ingredient of portable data assistance 250; Storage unit 271 is used to preserve program and the various data of being carried out by control module 269; Communication unit 272, it is used for carrying out data transmission and Data Receiving with external unit; Input block 273, it comprises for example keyboard or pointing device; And power supply unit 274, it is used to each ingredient of portable data assistance 250 that electric energy is provided.As can be seen, above-mentioned second and the 3rd embodiment has been applied in the middle of the liquid crystal board 265.
Have the visual image that the portable data assistance 250 of the described structure of the embodiment of the invention can be by producing color balance or suppress light yellow in the color, thereby show high-quality image.
As mentioned above, according to first to the 6th technical scheme of the present invention, owing in color filter, formed an opening that its footprint area can change according to color to be shown, and only be formed with a kind of color filter, thereby just can make the color rendition scope of reflection display part in each pixel and transmission display part consistent with each other substantially according to liquid crystal board of the present invention corresponding to each pixel.This structure of liquid crystal board makes liquid crystal board can realize the demonstration of high quality graphic under the situation that does not increase its manufacturing technology steps.Specifically, under the situation of aperture ratio for maximum that is applied on the color filter that is used to show the green with high-visibility, the difference of the color rendition scope of reflection display part and transmission display part can further be dwindled.In addition, the 7th technical scheme according to the present invention is described because the gap that is inserted between each substrate in the liquid crystal is reduced, so in conventional liquid crystal board viewed light yellowly just can be reduced.
In addition, the described method of the 8th and the 9th technical scheme according to the present invention, the configuration aspects that can be manufactured on color filter has the color liquid crystal plate of above-mentioned advantage.
In addition, the tenth technical scheme is described according to the present invention, in the middle of the color liquid crystal plate that the color filter configuration aspects has an above-mentioned advantage can be applied to colour liquid crystal display device.
Claims (2)
1. color liquid crystal plate comprises:
Transparency carrier;
Be formed at the thin film transistor (TFT) in the middle of each pixel on the above-mentioned transparency carrier;
Be formed on the above-mentioned transparency carrier and in above-mentioned each pixel, have the dielectric film of convex-concave surface;
The reflecting electrode that is formed on the above-mentioned dielectric film and is connected with above-mentioned thin film transistor (TFT) in above-mentioned each pixel,
In above-mentioned color liquid crystal plate, above-mentioned dielectric film contains a plurality of bossings, each bossing all extends along the border between the neighbor, and the width of each bossing all with constitute above-mentioned each pixel in the width of bossing of convex-concave surface equate.
2. a colour liquid crystal display device is characterized in that having the liquid crystal board according to the described structure of claim 1.
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| CN 02141272 CN1251013C (en) | 2002-07-05 | 2002-07-05 | Color liquid crystal board and mfg. method, and color LCD using same |
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| CN 02141272 Division CN1251013C (en) | 2002-07-05 | 2002-07-05 | Color liquid crystal board and mfg. method, and color LCD using same |
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| CN1737654A CN1737654A (en) | 2006-02-22 |
| CN100381902C true CN100381902C (en) | 2008-04-16 |
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| CN 02141272 Expired - Lifetime CN1251013C (en) | 2002-07-05 | 2002-07-05 | Color liquid crystal board and mfg. method, and color LCD using same |
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| CN1295551C (en) * | 2004-03-15 | 2007-01-17 | 信利半导体有限公司 | Color variable liquid crystal display and fabrication method thereof |
| KR101197049B1 (en) | 2005-06-27 | 2012-11-06 | 삼성디스플레이 주식회사 | Thin film transistor array panel and liquid crystal display including the panel |
| TWI357517B (en) | 2006-01-27 | 2012-02-01 | Au Optronics Corp | Optical compensated bend type lcd |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010004276A1 (en) * | 1999-12-13 | 2001-06-21 | Sony Corporation | Display apparatus, a method of manufacturing the same and a color filter |
| US6341002B1 (en) * | 1998-10-15 | 2002-01-22 | Sharp Kabushiki Kaisha | Liquid crystal display device |
| US6380995B1 (en) * | 1998-08-06 | 2002-04-30 | Lg.Philips Lcd Co., Ltd. | Transflective liquid crystal display device with asymmetry reflective electrode having a transparent portion facing a main viewing angle |
-
2002
- 2002-07-05 CN CNB2005100849813A patent/CN100381902C/en not_active Expired - Lifetime
- 2002-07-05 CN CN 02141272 patent/CN1251013C/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6380995B1 (en) * | 1998-08-06 | 2002-04-30 | Lg.Philips Lcd Co., Ltd. | Transflective liquid crystal display device with asymmetry reflective electrode having a transparent portion facing a main viewing angle |
| US6341002B1 (en) * | 1998-10-15 | 2002-01-22 | Sharp Kabushiki Kaisha | Liquid crystal display device |
| US20010004276A1 (en) * | 1999-12-13 | 2001-06-21 | Sony Corporation | Display apparatus, a method of manufacturing the same and a color filter |
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| CN1251013C (en) | 2006-04-12 |
| CN1466010A (en) | 2004-01-07 |
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