CN100380196C - Method for making colour filtering-light baseboard and its structure - Google Patents
Method for making colour filtering-light baseboard and its structure Download PDFInfo
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- CN100380196C CN100380196C CNB200310100549XA CN200310100549A CN100380196C CN 100380196 C CN100380196 C CN 100380196C CN B200310100549X A CNB200310100549X A CN B200310100549XA CN 200310100549 A CN200310100549 A CN 200310100549A CN 100380196 C CN100380196 C CN 100380196C
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Abstract
The present invention relates to a method for producing a color filtering base plate and a structure thereof. The method for producing a color filtering base plate comprises the procedures that a black matrix is firstly formed on a base plate to surround a plurality of sub-pixel regions, and a color photoresistive layer is formed in the sub-pixel regions and covers part of the black matrix; the color photoresistive layer is patterned, and openings are formed on the color photoresistive layer at the points which are preset to form gap substances; the gap substances are subsequently arranged in the openings. The color filtering base plate comprises a black matrix, a color photoresistive layer and a plurality of gap substances, wherein the black matrix is firstly formed on the base plate to surround a plurality of sub-pixel regions; the color photoresistive layer is formed in the sub-pixel regions on the base plate and covers part of the black matrix; a plurality of openings are arranged in the color photoresistive layer, and each gap substance is arranged in each opening of the color photoresistive layer. The present invention can improve the problem that when a liquid crystal display panel meets external force, the color photoresistive layer on the color filtering base plate is destroyed before the gap substances are destroyed, and the distances between the bug holes of the liquid crystal display panels can not be uniformed. The present invention can also improve the load bearing capability of the liquid crystal display panel.
Description
Technical field
The present invention relates to a kind of manufacture method and structure thereof of colored optical filtering substrates, particularly relate to a kind of manufacture method and the structure thereof that can improve bug hole spacing (cell gap) inequality of display panels and improve the colored optical filtering substrates (Color Filter) of the anti-loading capacity of panel.
Background technology
Because the demand of display and day sharp increase, so industry drops into the development of related display with all strength.Wherein, again with cathode-ray tube (CRT) (Cathode Ray Tube) because of having excellent display quality and technology maturation, so monopolize the monitor market all the year round.Yet, recently since the rise of environmental protection notion for its energy resource consumption big with produce the bigger characteristic of radiant quantity, add that product flattening space is limited, therefore can't satisfy the market trend of market for light, thin, short, little, U.S. and low consumpting power.Therefore, have that high image quality, space utilization efficient are good, the Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display) of low consumpting power, advantageous characteristic such as radiationless becomes the main flow in market gradually.
At present LCD all towards full-colorization, large scale, high resolving power and cheaply direction develop, yet the various performances of liquid crystal indicator, as answer speed, transparency correlative value and angle of visibility etc., all should be relevant with the thickness of liquid crystal layer.Therefore, general all according to the optical property of liquid crystal material, strict control thickness of liquid crystal layer and add separation material (spacer).Wherein, separation material can be divided into bar-shaped separation material, granular separation material and photoresistance separation material (Photo-Spacer).But wherein bar-shaped and granular separation material all needs dissemination apparatus implement to distribute, but these two kinds of separation materials easily become lumps, makes that thickness of liquid crystal layer can't homogeneous, must implement extra processing procedure and make its even distribution, the increase production cost.Therefore, use the photoresistance separation material of micro-photographing process made, except can controlling its distributing position, and also can control its height, make thickness of liquid crystal layer can keep homogeneous.Therefore, being subjected to industry recently uses.At this, describe at its manufacturing process of the colored optical filtering substrates with photoresistance separation material.
Figure 1A to Fig. 1 E is the manufacturing process diagrammatic cross-section that has known colored optical filtering substrates now.See also shown in Figure 1A, at first, provide substrate 100, then on substrate 100, form black matrix 102.See also shown in Figure 1B, form colorama resistance layer 104 then on substrate 100 and black matrix 102, wherein colorama resistance layer 104 is made of several red photoresistance blocks, several green photoresistance blocks and several blue photoresistance blocks.See also shown in Fig. 1 C, on colorama resistance layer 104, form overlayer 106 (over coating) subsequently.See also shown in Fig. 1 D, on overlayer 106, form electrode layer 108 afterwards.See also shown in Fig. 1 E, on electrode layer 108 surfaces, form photoresistance separation material 110 at last.
Therefore, the photoresistance separation material in the existing known colored optical filtering substrates is to be stacked on electrode layer, overlayer and the colorama resistance layer.And because the separation material major function is the homogeneous that keeps thickness of liquid crystal layer, so separation material need have character such as rigidity, perfectly elastic body, dimensional stability be good, in other words, colorama resistance layer or overlayer that its engineering properties is all more general come goodly.So, when display panels in use or when suffering abnormal application of force in making, colorama resistance layer on its colored optical filtering substrates tends to the ratio gap thing and produces destruction or distortion ahead of time, and causes the bug hole spacing heterogeneity of display panels, and then influences the display effect of panel.
This shows that the manufacture method of above-mentioned existing colored optical filtering substrates and structure thereof still have defective, and demand urgently further being improved.For the manufacture method that solves existing colored optical filtering substrates and the defective of structure thereof, relevant manufacturer there's no one who doesn't or isn't seeks solution painstakingly, but does not see always that for a long time suitable design finished by development, and this obviously is the problem that the anxious desire of relevant dealer solves.
Because the defective that the manufacture method of above-mentioned existing colored optical filtering substrates and structure thereof exist, the inventor is based on being engaged in this type of product design manufacturing abundant for many years practical experience and professional knowledge, actively studied innovation, in the hope of founding a kind of manufacture method and structure thereof of new colored optical filtering substrates, can improve the manufacture method and the structure thereof of general existing colored optical filtering substrates, make it have more practicality.Through constantly research, design, and after studying sample and improvement repeatedly, create the present invention who has practical value finally.
Summary of the invention
The objective of the invention is to, overcome the manufacture method of above-mentioned existing colored optical filtering substrates and the defective that structure exists thereof, and provide a kind of manufacture method and structure thereof of new colored optical filtering substrates, technical matters to be solved is that it can be overcome when panel meets with the extraneous application of force, colorama resistance layer often ratio gap thing produces destruction or distortion ahead of time, and cause the inhomogenous problem of panel bug hole spacing, can improve the variation of issuable panel bug hole spacing when panel suffers external force, and have the value on the industry.
Another object of the present invention is to, a kind of manufacture method and structure thereof of new colored optical filtering substrates is provided, technical matters to be solved is to make its anti-loading capacity that can further improve panel, thereby is suitable for practicality more.
The manufacture method of colored optical filtering substrates of the present invention and structure thereof, can improve when display panels suffers the extraneous application of force, colorama resistance layer ratio gap thing on its colored optical filtering substrates produces ahead of time and destroys, and causes the problem that the bug hole spacing (cell gap) of liquid crystal panel can't homogeneous.And can improve the anti-loading capacity of display panels in addition.
The object of the invention to solve the technical problems realizes by the following technical solutions.The manufacture method of a kind of colored optical filtering substrates that proposes according to the present invention, it may further comprise the steps: form a black matrix on a substrate, to cross a plurality of sub picture elements district; Form a colorama resistance layer in those sub picture element districts on this substrate, and cover this black matrix of part; This colorama resistance layer of patterning is to form an opening in this colorama resistance layer at predetermined formation separation material place; And in this opening, form a separation material, wherein, this electrode layer is between this separation material and this black matrix layer.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
The manufacture method of aforesaid colored optical filtering substrates, formed this opening is to expose this black matrix in the wherein said colorama resistance layer.
The manufacture method of aforesaid colored optical filtering substrates wherein also comprises: form an overlayer on this colorama resistance layer; This overlayer of patterning, to form this opening in this overlayer at predetermined formation separation material place, wherein, this electrode layer is formed on this colorama resistance layer, this black matrix layer and this overlayer.
The object of the invention to solve the technical problems also adopts following technical scheme to realize.The structure of a kind of colored optical filtering substrates that proposes according to the present invention, it comprises: a black matrix, be formed on the substrate, wherein should can cross a plurality of sub picture elements district by black matrix; One colorama resistance layer is formed in those sub picture element districts on this substrate, and covers this black matrix of part, wherein has plurality of openings in this colorama resistance layer; One electrode layer is formed on this colorama resistance layer and should deceives on the matrix layer; And a plurality of separation materials, each those separation material is in each those opening that is configured in this colorama resistance layer, wherein, this electrode layer is between this separation material and this black matrix layer.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
The structure of aforesaid colored optical filtering substrates, those openings in the wherein said colorama resistance layer are to expose this black matrix.
The structure of aforesaid colored optical filtering substrates, it more comprises an overlayer, is formed on this colorama resistance layer.
The present invention compared with prior art has tangible advantage and beneficial effect.By above technical scheme as can be known, in order to reach aforementioned goal of the invention, major technique of the present invention thes contents are as follows:
The present invention proposes a kind of manufacture method of colored optical filtering substrates.This method comprises the following step: at first form black matrix on substrate, to cross several sub picture element districts.Then, form the colorama resistance layer and cover substrate and the black matrix of part in these sub picture element districts, wherein the colorama resistance layer is made of several red photoresistance blocks, several green photoresistance blocks and several blue photoresistance blocks.Then, this colorama resistance layer of patterning is to form opening in the colorama resistance layer at predetermined formation separation material place.Then, on this colorama resistance layer and this black matrix layer, form an electrode layer.In opening, form separation material at last.
In a preferred embodiment of the present invention, formed opening is to expose black matrix in the colorama resistance layer.
The present invention also proposes a kind of structure of colored optical filtering substrates, mainly is to be made of substrate, black matrix, colorama resistance layer, electrode layer and several separation materials.Wherein, black matrix configuration is on substrate, to cross several sub picture element districts.In addition, the colorama resistance layer is disposed in these sub picture element districts on the substrate, and this colorama resistance layer is to cover substrate and the black matrix of part.Particularly, have several openings in the colorama resistance layer.Electrode layer is formed on this colorama resistance layer and should deceives on the matrix layer.Separation material then is in these openings that are configured in the colorama resistance layer.
In a preferred embodiment of the present invention, these openings in the colorama resistance layer are to expose black matrix.
In the present invention, because of the separation material of colored optical filtering substrates is not to be configured on the colorama resistance layer, but directly be disposed on the preferable black matrix of rigidity, therefore can avoid the extraneous application of force that the colorama resistance layer is caused distortion or destroy, and influence surface lath cave spacing, and then influence the display effect of panel.
By technique scheme, colored optical filtering substrates of the present invention has following advantage at least:
One, colored optical filtering substrates of the present invention can improve the variation of issuable panel bug hole spacing when panel suffers external force, and can further improve the anti-loading capacity of panel.
Two, because the present invention is formed on the photoresistance separation material on the colorama resistance layer, therefore chromatic photoresist layer material engineering properties can be not need considered, and the dirigibility of the material selection of separation material can be increased.
Three, the present invention not only goes for general colored filter and also can be applicable to copline suitching type colored filter.
In sum, the manufacture method of the colored optical filtering substrates that the present invention is special and structure thereof, can overcome when panel meets with the extraneous application of force, colorama resistance layer often ratio gap thing produces destruction or distortion ahead of time, and cause the inhomogenous problem of panel bug hole spacing, can improve the variation of issuable panel bug hole spacing when panel suffers external force, and have the value on the industry; It can also further improve the anti-loading capacity of panel in addition, thereby is suitable for practicality more.It has above-mentioned many advantages and practical value, and in similar manufacture method and structure, do not see have similar method and structural design to publish or use and really genus innovation, no matter it all has bigger improvement on manufacture method, structure or function, have large improvement technically, and produced handy and practical effect, and the manufacture method of more existing colored optical filtering substrates and structure thereof have the multinomial effect of enhancement, thereby be suitable for practicality more, and have the extensive value of industry, really be a new and innovative, progressive, practical new design.
Above-mentioned explanation only is the general introduction of technical solution of the present invention, for can clearer understanding technological means of the present invention, and can be implemented according to the content of instructions, below with preferred embodiment of the present invention and conjunction with figs. describe in detail as after.
Description of drawings
Figure 1A to Fig. 1 E is the manufacturing process diagrammatic cross-section that has known colored filter now.
Fig. 2 is the vertical view according to the colored filter of a preferred embodiment of the present invention.
Fig. 3 A to Fig. 3 F is the processing flow diagrammatic cross-section according to the colored filter of a preferred embodiment of the present invention.
Fig. 4 is the structural profile synoptic diagram according to the colored filter of another preferred embodiment of the present invention.
Fig. 5 is the structural profile synoptic diagram according to the colored filter of the another preferred embodiment of the present invention.
Fig. 6 is according to the present invention's structural profile synoptic diagram of the colored filter of a preferred embodiment again.
100,200: substrate 102,202: black matrix
204: sub picture element district 106,206: colorama resistance layer
106a, 206a, 206b, 206c: opening 108,208: overlayer
110,210: electrode layer 112,212: separation material
Embodiment
Below in conjunction with accompanying drawing and preferred embodiment, manufacture method and its concrete manufacture method of structure, step, structure, feature and the effect thereof of the colored optical filtering substrates that foundation the present invention is proposed, describe in detail as after.
Fig. 2 is the vertical view according to the colored optical filtering substrates of a preferred embodiment of the present invention.Fig. 3 A to Fig. 3 F is the manufacturing process diagrammatic cross-section according to the colored optical filtering substrates of a preferred embodiment of the present invention, wherein Fig. 3 A to Fig. 3 F be corresponding among Fig. 2 by the section place of I-I '.
See also Fig. 3 A and cooperate consult shown in Figure 2, at first on substrate 200, form a black matrix material layer (not shown), afterwards, this black matrix material layer is carried out micro-photographing process or micro-photographing process adds etch process, to form black matrix 202, draw number district 204 and cross several times.Wherein, if the composition material of black matrix 202 is the shading resin, then can uses micro-photographing process to form and should deceive matrix 202, its thickness for example is 1-2 μ m.If the composition material of black matrix 202 is the chromium metal, then can use micro-photographing process to add that etch process forms black matrix 202, its thickness for example is 0.1-0.2 μ m.In addition, the material of substrate 200 can be transparency carriers such as glass and plastic cement.
See also Fig. 3 B and cooperate and consult shown in Figure 2ly, form colorama resistance layer 206 subsequently in these sub picture element districts 204 on substrate 200, cover substrate 200 and the black matrix 202 of part.Wherein colorama resistance layer 206 is made of with several blue photoresistance blocks (B) several red photoresistance blocks (R), several green photoresistance blocks (G), its formation method for example is to carry out steps such as rotary coating process (spincoating) and baking processing procedure earlier, form a red light resistance layer (not shown), carry out micro-photographing process then to keep the red light resistance layer (not shown) at place, specific region.Then utilize rotary coating and baking processing procedure to form a green light resistance layer (not shown) again, carry out micro-photographing process then and keep the green light resistance layer (not shown) that the specific region is located, repeat the blue light resistance layer (not shown) that above-mentioned steps keeps the place, specific region afterwards.And the arrangement mode of red, the green and blue photoresistance block of colorama resistance layer 206 for example is mosaic arrangement (Mosaic type), stripe-arrangement (stripe type), the arrangement of four picture elements (four pixels type) and rounded projections arranged kenels such as (triangle type).
This colorama resistance layer 206 of patterning is to form opening 206a then, and its split shed 206a exposes black matrix 202, and the position of opening 206a is corresponding to the thin film transistor (TFT) position (not shown) on the thin-film transistor display panel.The method of above-mentioned patterning colorama resistance layer 206 is for example exposed and developing manufacture process, to form opening 206a in colorama resistance layer 206.
See also Fig. 3 C and cooperate consult shown in Figure 2, in a preferred embodiment of the present invention, after forming colorama resistance layer 206, more be included on black matrix 202 and the colorama resistance layer 206 and form overlayer 208, wherein the material of overlayer 208 is propylene (acrylic) and amine ethyl formate (urethane) resin, and its major function is to prevent that liquid crystal from being polluted and the flattening surface that makes colorama resistance layer 206.
See also Fig. 3 D and cooperate consult shown in Figure 2, patterning overlayer 208 forms opening 206b with formed opening 206a place formerly, its split shed 206b exposes black matrix 202, and the position of opening 206b is corresponding to the thin film transistor (TFT) position (not shown) on the thin-film transistor display panel.The method of above-mentioned patterning overlayer 208 is for example exposed and developing manufacture process.
See also Fig. 3 E figure and cooperate and consult shown in Figure 2ly, on overlayer 208 and black matrix 202, form electrode layer 210 afterwards.Wherein electrode layer 210 materials can be indium tin oxide (ITO), indium-zinc oxide electrically conducting transparent materials such as (IZO), and the method for its formation for example is a sputtering method, and its thickness for example is 0.15 μ m.
See also Fig. 3 F and cooperate consult shown in Figure 2, utilize rotary coating and baking processing procedure on electrode layer 210, to form a separation material material layer (not shown), expose afterwards with developing manufacture process in the opening 206b of colorama resistance layer 206, to form separation material 212, the material of above-mentioned separation material material layer for example is a photoresist.
Shown in Fig. 3 F, this structure is made of substrate 200, black matrix 202, colorama resistance layer 206, overlayer 208, electrode layer 210 and several separation materials 212 by the prepared colored optical filtering substrates of above-mentioned step.Wherein, black matrix 202 is to be disposed on the substrate 200, to cross several sub picture element districts 204.Wherein, colorama resistance layer 206 is to be disposed in these sub picture element districts 204 and to cover substrate 200 to deceive matrix 202 with part.In addition, overlayer 208 is disposed on black matrix 202 and the colorama resistance layer 206.And have opening 206b in colorama resistance layer 206 and overlayer 208, and opening 206b exposes black matrix 202.Electrode layer 210 is to be formed on the overlayer 208.And these separation materials 212 are to be positioned at these openings 206b, cover the electrode layer 210 in the opening 206b.
Above-described colored optical filtering substrates is for having tectal design, yet the present invention can also be applied in not to be had in the tectal colored optical filtering substrates, now specifies its structure as follows.Seeing also shown in Figure 4ly, is the structural profile synoptic diagram according to the colored optical filtering substrates of another preferred embodiment of the present invention.This structure is made of substrate 200, black matrix 202, colorama resistance layer 206, electrode layer 210 and several separation materials 212.Wherein, black matrix 202 is disposed on the substrate 200, to form several sub picture element districts 204.In the middle of, colorama resistance layer 206 is disposed in these sub picture element districts 204 and covers substrate 200 and the black matrix 202 of part.And colorama resistance layer 206 has several openings 206c, and these openings 206c exposes black matrix 202.In addition, electrode layer 210 is to be formed on black matrix 202 and the colorama resistance layer 206, and separation material 212 is positioned at these openings 206c, covers the electrode layer 210 in the opening 206c.
If the present invention is applied to the copline suitching type (In-plane Switching, IPS) LCD then will can not be formed with electrode layer on its colored optical filtering substrates, and the existing structure that it is detailed specifies as follows.Seeing also shown in Figure 5ly, is the structural profile synoptic diagram according to the colored optical filtering substrates of the another preferred embodiment of the present invention, and this structure is made of substrate 200, black matrix 202, colorama resistance layer 206, overlayer 208 and several separation materials 212.Wherein, black matrix 202 is disposed on the substrate 200, to cross several sub picture element districts 204.In the middle of, colorama resistance layer 206 is to be disposed in these sub picture element districts 204 and to cover substrate 200 to deceive on the matrix 202 with part.In addition, overlayer 208 is covered on black matrix 202 and the colorama resistance layer 206.In addition, have several openings 206b in colorama resistance layer 206 and the overlayer 208, and opening 206b exposes black matrix 202.And separation material 212 is to be formed in the opening 206b.
The above-mentioned colored optical filtering substrates that is applied to the copline switching type liquid crystal display can also be not have tectal form, now its structure is described as follows.Seeing also shown in Figure 6ly, is the structural profile synoptic diagram according to the colored optical filtering substrates of the another preferred embodiment of the present invention, and this structure is made of substrate 200, black matrix 202, colorama resistance layer 206 and several separation materials 212.Wherein, black matrix 202 is disposed on the substrate 200, to cross several sub picture element districts 204.In the middle of, colorama resistance layer 206 is disposed in these sub picture element districts 204 and covers substrate 200 and the black matrix 202 of part.And colorama resistance layer 206 has several openings 206c, and these openings 206c exposes black matrix 202.In addition, several separation materials 212 are positioned at these openings 206c.
The above, it only is preferred embodiment of the present invention, be not that the present invention is done any pro forma restriction, though the present invention discloses as above with preferred embodiment, yet be not in order to limit the present invention, any those skilled in the art, in not breaking away from the technical solution of the present invention scope, when the method that can utilize above-mentioned announcement and technology contents are made a little change or be modified to the equivalent embodiment of equivalent variations, but every content that does not break away from technical solution of the present invention, according to technical spirit of the present invention to any simple modification that above embodiment did, equivalent variations and modification all still belong in the scope of technical solution of the present invention.
Claims (6)
1. the manufacture method of a colored optical filtering substrates is characterized in that it may further comprise the steps:
On a substrate, form a black matrix, to cross a plurality of sub picture elements district;
Form a colorama resistance layer in those sub picture element districts on this substrate, and cover this black matrix of part;
This colorama resistance layer of patterning is to form an opening in this colorama resistance layer at predetermined formation separation material place;
On this colorama resistance layer and this black matrix layer, form an electrode layer; And
Form a separation material in this opening, wherein, this electrode layer is between this separation material and this black matrix layer.
2. the manufacture method of colored optical filtering substrates according to claim 1 is characterized in that formed this opening is to expose this black matrix in the wherein said colorama resistance layer.
3. the manufacture method of colored optical filtering substrates according to claim 1 is characterized in that wherein also comprising:
On this colorama resistance layer, form an overlayer;
This overlayer of patterning, to form this opening in this overlayer at predetermined formation separation material place, wherein, this electrode layer is formed on this colorama resistance layer, this black matrix layer and this overlayer.
4. the structure of a colored optical filtering substrates is characterized in that it comprises:
One black matrix is formed on the substrate, wherein should can cross a plurality of sub picture elements district by black matrix;
One colorama resistance layer is formed in those sub picture element districts on this substrate, and covers this black matrix of part, wherein has plurality of openings in this colorama resistance layer;
One electrode layer is formed on this colorama resistance layer and should deceives on the matrix layer; And
A plurality of separation materials, each those separation material are in each those opening that is configured in this colorama resistance layer, and wherein, this electrode layer is between this separation material and this black matrix layer.
5. the structure of colored optical filtering substrates according to claim 4 is characterized in that those openings in the wherein said colorama resistance layer are to expose this black matrix.
6. the structure of colored optical filtering substrates according to claim 4 is characterized in that it more comprises an overlayer, is formed on this colorama resistance layer.
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| Application Number | Priority Date | Filing Date | Title |
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| CNB200310100549XA CN100380196C (en) | 2003-10-16 | 2003-10-16 | Method for making colour filtering-light baseboard and its structure |
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| Application Number | Priority Date | Filing Date | Title |
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| CNB200310100549XA CN100380196C (en) | 2003-10-16 | 2003-10-16 | Method for making colour filtering-light baseboard and its structure |
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| CN1529199A CN1529199A (en) | 2004-09-15 |
| CN100380196C true CN100380196C (en) | 2008-04-09 |
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| CNB200310100549XA Expired - Fee Related CN100380196C (en) | 2003-10-16 | 2003-10-16 | Method for making colour filtering-light baseboard and its structure |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101231415B (en) * | 2004-12-01 | 2010-06-02 | 中华映管股份有限公司 | Colorful light filtering substrate and manufacturing method thereof |
| TWI280421B (en) | 2005-09-27 | 2007-05-01 | Chi Mei Optoelectronics Corp | Color filter substrate and fabricating method thereof, LCD panel and device |
| CN100380143C (en) * | 2006-02-22 | 2008-04-09 | 友达光电股份有限公司 | Colour optical filtering substrate and producing method thereof |
| CN101153933B (en) * | 2006-09-26 | 2011-08-17 | 奇美电子股份有限公司 | Colorful optical filtering substrate and its manufacturing method, LCD panel and device |
| CN100462787C (en) * | 2007-04-05 | 2009-02-18 | 友达光电股份有限公司 | Pixel structure, its display panel, photoelectric device and its production |
| CN103901656B (en) * | 2012-12-25 | 2017-10-13 | 上海仪电显示材料有限公司 | Colored optical filtering substrates and its manufacture method and its online test method |
| CN104749675B (en) * | 2013-12-31 | 2017-07-11 | 上海仪电显示材料有限公司 | Optical filter and preparation method thereof, touch LCD display and preparation method thereof |
| CN108227273B (en) * | 2016-12-21 | 2021-03-09 | 上海仪电显示材料有限公司 | Display panel, color filter substrate and manufacturing method of color filter substrate |
| CN111381403A (en) * | 2018-12-27 | 2020-07-07 | 上海仪电显示材料有限公司 | Liquid crystal display device and method for forming the same |
| CN113433746A (en) * | 2021-06-10 | 2021-09-24 | 深圳市华星光电半导体显示技术有限公司 | Display panel and display device |
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| JPH0926570A (en) * | 1995-07-10 | 1997-01-28 | Hitachi Ltd | Liquid crystal display device |
| JPH0950020A (en) * | 1995-08-09 | 1997-02-18 | Toshiba Corp | Liquid crystal display device |
| JPH11248921A (en) * | 1998-02-27 | 1999-09-17 | Toray Ind Inc | Color filter and liquid crystal display device using same |
| JP2002023170A (en) * | 2000-07-04 | 2002-01-23 | Toppan Printing Co Ltd | Liquid crystal display device |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0926570A (en) * | 1995-07-10 | 1997-01-28 | Hitachi Ltd | Liquid crystal display device |
| JPH0950020A (en) * | 1995-08-09 | 1997-02-18 | Toshiba Corp | Liquid crystal display device |
| JPH11248921A (en) * | 1998-02-27 | 1999-09-17 | Toray Ind Inc | Color filter and liquid crystal display device using same |
| JP2002023170A (en) * | 2000-07-04 | 2002-01-23 | Toppan Printing Co Ltd | Liquid crystal display device |
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