CH617289A5 - Method for producing an electrical contact material - Google Patents

Method for producing an electrical contact material Download PDF

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Publication number
CH617289A5
CH617289A5 CH542279A CH542279A CH617289A5 CH 617289 A5 CH617289 A5 CH 617289A5 CH 542279 A CH542279 A CH 542279A CH 542279 A CH542279 A CH 542279A CH 617289 A5 CH617289 A5 CH 617289A5
Authority
CH
Switzerland
Prior art keywords
contact
transition metal
nitrides
melting point
carbide
Prior art date
Application number
CH542279A
Other languages
German (de)
Inventor
Niels Lervad Andersen
Find Rotvel
Original Assignee
Danfoss As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Danfoss As filed Critical Danfoss As
Publication of CH617289A5 publication Critical patent/CH617289A5/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36Carbonitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/02Contacts characterised by the material thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/02Contacts characterised by the material thereof
    • H01H1/021Composite material

Abstract

In the electrical contact, the contact surface consists of transition metal carbides and/or transition metal nitrides. This produces a contact which manages without using noble metals, has a high melting point and good electrical conductivity. The production method consists in transition metal carbides and/or transition metal nitrides being applied by an electrophoresis process.

Description

617 289 617 289

Claims (2)

PATENTANSPRÜCHEPATENT CLAIMS 1. Verfahren zur Herstellung eines Kontaktmaterials, dadurch gekennzeichnet, dass mindestens die Oberfläche der Kontaktfläche aus Üebergangsmetallcarbiden und/oder Uebergansmetallnitriden hergestellt wird, welche durch einen Elektrophoreseprozess aufgebracht werden.1. A method for producing a contact material, characterized in that at least the surface of the contact area is produced from transition metal carbides and/or transition metal nitrides, which are applied by an electrophoresis process. 2. Verfahren nach Patentanspruch 1, dadurch gekennzeichnet, dass das Kontaktmaterial anschliessend an den Elektrophoreseprozess einer Wärmebehandlung unterworfen wird, wobei die Temperatur unter dem Schmelzpunkt des Trägermaterials liegt.2. The method according to claim 1, characterized in that the contact material is then subjected to the electrophoresis process of a heat treatment, wherein the temperature is below the melting point of the carrier material. Die Erfindung betrifft ein Verfahren zur Herstellung eines Kontaktmaterials.The invention relates to a method for producing a contact material. Bei elektrischen Kontakten besteht ein Problem darin, dass sie Lichtbögen und damit anschliessenden Verschweissungen der Kontakte ausgesetzt sind. Es ist ebenfalls bekannt, Legierungen herzustellen, denen hochtemperaturfestes Material beigefügt ist, wie dies beispielsweise im USA-Patent 3 166 660 beschrieben ist, und zwar Wolframcarbid, das als poröse, mit Silber imprägnierte Masse hergestellt wird.A problem with electrical contacts is that they are exposed to electric arcs and the subsequent welding of the contacts. It is also known to produce alloys to which is added refractory material, such as that described in U.S. Patent 3,166,660, namely tungsten carbide produced as a porous mass impregnated with silver. Mit der Erfindung soll die Aufgabe gelöst werden, ein Verfahren zur Herstellung eines billigen Kontaktmaterials mit hoher Schweissbeständigkeit und geringer Neigung zur Oxydation anzugeben.The aim of the invention is to solve the problem of specifying a method for producing an inexpensive contact material with high resistance to welding and a low tendency to oxidize. Das erfindungsgemässe Verfahren ist dadurch gekennzeichnet, dass mindestens die Oberfläche der Kontaktfläche aus Üebergangsmetallcarbiden und/oder Uebergangsmetallnitriden hergestellt wird, welche durch einen Elektrophoreseprozess aufgebracht werden. Dadurch wird erreicht, dass man eine verhältnismässig geringe Materialdicke verwenden kann. Das nach diesem Verfahren erhaltene Material zeichnet sich dadurch aus, dass es einen sehr hohen Schmelzpunkt besitzt und nicht zur Verschweissung neigt.The method according to the invention is characterized in that at least the surface of the contact area is made of transition metal carbides and/or transition metal nitrides, which are applied by an electrophoresis process. This means that a relatively small material thickness can be used. The material obtained by this process is characterized in that it has a very high melting point and does not tend to weld. Es können Mischungen sowohl von Üebergangsmetallcarbiden als Übergangsmetallnitriden verwendet werden und damit eine mögliche Angleichung erfolgen, z.B. verschiedener Leitfähigkeiten sowie Ausnutzung von Materialeigenschaften, durch die sich die einzelnen Übergangsmetallcarbiden oder Übergangsmetallnitriden gegebenenfalls voneinander unterscheiden.Mixtures of both transition metal carbides and transition metal nitrides can be used and thus a possible alignment can take place, e.g. different conductivities and utilization of material properties by which the individual transition metal carbides or transition metal nitrides may differ from one another. Bevorzugte Übergangsmetallcarbide und/oder -nitride sind solche, die einen hohen Schmelzpunkt und gute elektrische Leitfähigkeit besitzen. Dadurch ist gewährleistet, dass die Schweissbeständigkeit so hoch wie möglich liegt, während zugleich der Übergangswiderstand so niedrig wie möglich wird.Preferred transition metal carbides and/or nitrides are those that have a high melting point and good electrical conductivity. This ensures that the sweat resistance is as high as possible, while at the same time the contact resistance is as low as possible. Diese Materialien können auf der Basis von Titan (Ti), Wolfram (W), Niobium (Nb), Tantal (Ta) und Hafnium (Hf) hergestellt sein. Eine besonders billige Form wird dadurch erzielt, dass das elektrisch leitende Kontaktmaterial, das die Übergangsmetallcarbid und/oder -nitridschicht trägt, kein Edelmetall ist. Es ist auch möglich, eine dünne Kontaktschicht auf dem unedlen Metall herzustellen und dadurch im Verhältnis zu Edelmetall, das normalerweise für elektrische Kontakte verwendet wird, eine Einsparung zu erzielen.These materials can be based on titanium (Ti), tungsten (W), niobium (Nb), tantalum (Ta) and hafnium (Hf). A particularly inexpensive form is achieved in that the electrically conductive contact material that carries the transition metal carbide and/or nitride layer is not a noble metal. It is also possible to produce a thin contact layer on the base metal and thereby achieve a saving relative to the noble metal normally used for electrical contacts. Es ist vorteilhaft, wenn das unedle Metall einen Schmelzpunkt höher als 800° C besitzt. Dadurch ist während des Betriebes gewährleistet, dass das tragende Material nicht schmilzt und ausserdem einem etwaigen Wärmebehandlungs-prozess bei der Herstellung widerstehen kann.It is advantageous if the base metal has a melting point higher than 800°C. This ensures that the supporting material does not melt during operation and can also withstand any heat treatment process during manufacture. Beim erfindungsgemässen Verfahren kann man gegebenenfalls kontakttragende Materialien benutzen, die einen niedrigeren Schmelzpunkt haben und zur Aufbringung bestimmter Formen von Übergangsmetallcarbiden oder -nitriden zweckmässiger sind. Ausserdem kann es vorteilhaft sein, dass der in der Elektrophorese behandelte Kontakt einer anschliessenden Wärmebehandlung unterworfen wird, bei der die Temperatur unter dem Schmelzpunkt des tragenden Materials liegt. Dadurch wird eine kompaktere und mechanisch widerstandsfähigere Schicht erzielt, indem durch die Wärmebehandlung bessere Eigenschaften entstehen.In the method according to the invention one can optionally use contact-bearing materials which have a lower melting point and are more suitable for the application of certain forms of transition metal carbides or nitrides. In addition, it can be advantageous for the contact treated in the electrophoresis to be subjected to a subsequent heat treatment in which the temperature is below the melting point of the supporting material. This results in a more compact and mechanically more resistant layer, with better properties resulting from the heat treatment. Die Erfindung wird nachstehend anhand der Zeichnung beschrieben, die einen Kontakt im Schnitt darstellt.The invention is described below with reference to the drawing, which shows a contact in section. Der Kontakt ist mittels eines Ansatzes 2 mit einem Kontakthebel 3 vernietet. Der Kontakt besteht aus dem Tragkörper 4, der aus unedlem Metall sein kann. Dieser kontakttragende Körper hat mindestens an der Kontaktfläche 5 eine Oberflächenschicht 6, die auch die Seitenfläche des Kontaktes 7 decken kann, jedoch nicht notwendigerweise decken muss. Die Kontaktflächenschicht 6 besteht aus Übergangsmetallcarbiden und/ oder Übergangsmetallnitriden. Es kann vorteilhaft sein, wenn Mischungen sowohl von Carbiden als Nitriden vorhanden sind, da es einfach ist, diese in demselben Prozess herzustellen. An verwendbaren Materialien sind insbesondere Titancarbid (TiC), Titannitrid (TiN), Wolframcarbide (WC), Niobiumcarbide (NbC), Tantalcarbide und Hafniumcarbide oder -nitride zu nennen. Dies sind nur Beispiele von Materialien, die gute elektrische Leitfähigkeit sowie hohe Schmelzpunkte besitzen. Diese Materialien sind besonders vorteilhaft, wenn es sich um stöchiometrische Mischungen handelt, schliessen jedoch nicht aus, dass kleinere Defizite an Kohlenstoff oder Stickstoff entstehen können.The contact is riveted to a contact lever 3 by means of a lug 2 . The contact consists of the supporting body 4, which can be made of base metal. This contact-carrying body has a surface layer 6 at least on the contact surface 5, which can also cover the side surface of the contact 7, but does not necessarily have to cover it. The contact surface layer 6 consists of transition metal carbides and/or transition metal nitrides. It can be advantageous to have mixtures of both carbides and nitrides as it is easy to make them in the same process. Titanium carbide (TiC), titanium nitride (TiN), tungsten carbide (WC), niobium carbide (NbC), tantalum carbide and hafnium carbide or nitride can be mentioned in particular as materials that can be used. These are just examples of materials that have good electrical conductivity as well as high melting points. These materials are particularly advantageous when stoichiometric mixtures are involved, but do not rule out the possibility of minor carbon or nitrogen deficits occurring. Das Herstellungsverfahren besteht in der Aufbringung einer Oberflächenschicht mittels Elektrophorese, z.B. in der Weise wie sie zur Aufbringung solcher Schichten auf Schneidewerkzeuge aus Hartmetall verwendet wird. Hier hat man den Vorteil, dass man Tragmaterialien mit niedrigem Schmelzpunkt verwenden kann.The manufacturing process consists of applying a surface layer by electrophoresis, for example of the type used to apply such layers to cemented carbide cutting tools. Here you have the advantage that you can use support materials with a low melting point. Die durch Elektrophorese hergestellte Oberflächenschicht lässt sich gegebenenfalls qualitativ verbessern, wenn sie einer anschliessenden Wärmebehandlung unterworfen wird, wodurch zwischen den einzelnen Carbiden und/oder Nitriden und dem Tragmaterial eine bessere Bindung entsteht.The quality of the surface layer produced by electrophoresis can optionally be improved if it is subjected to a subsequent heat treatment, as a result of which a better bond is produced between the individual carbides and/or nitrides and the support material. 22 55 1010 1515 2020 2525 3030 3535 4040 4545 5050 cc 1 Blatt Zeichnungen1 sheet of drawings
CH542279A 1973-12-04 1979-06-11 Method for producing an electrical contact material CH617289A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DK653473A DK653473A (en) 1973-12-04 1973-12-04

Publications (1)

Publication Number Publication Date
CH617289A5 true CH617289A5 (en) 1980-05-14

Family

ID=8148853

Family Applications (2)

Application Number Title Priority Date Filing Date
CH1522674A CH614309A5 (en) 1973-12-04 1974-11-15 Electrical contact and method for producing it
CH542279A CH617289A5 (en) 1973-12-04 1979-06-11 Method for producing an electrical contact material

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CH1522674A CH614309A5 (en) 1973-12-04 1974-11-15 Electrical contact and method for producing it

Country Status (5)

Country Link
CA (1) CA1029786A (en)
CH (2) CH614309A5 (en)
DE (1) DE2453918C3 (en)
DK (1) DK653473A (en)
FR (1) FR2253261B1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0088123A4 (en) * 1981-09-11 1985-10-01 Western Electric Co Apparatus including electrical contacts.
GB2145523A (en) * 1983-08-26 1985-03-27 Gte Valeron Corp Coatings for contacts of a touch probe
DE3509039A1 (en) * 1985-03-14 1986-09-18 W.C. Heraeus Gmbh, 6450 Hanau COMPOSITE FOR ELECTRICAL CONTACTS AND METHOD FOR THE PRODUCTION THEREOF
EP0428740A1 (en) * 1989-05-10 1991-05-29 The Furukawa Electric Co., Ltd. Electric contact material, method of producing said material, and electric contact produced therefrom
DE102019135459A1 (en) * 2019-12-20 2021-06-24 Deutsches Zentrum für Luft- und Raumfahrt e.V. Device for breaking an electrical circuit

Also Published As

Publication number Publication date
FR2253261A1 (en) 1975-06-27
DE2453918C3 (en) 1978-12-07
CA1029786A (en) 1978-04-18
CH614309A5 (en) 1979-11-15
DE2453918B2 (en) 1977-06-16
DK653473A (en) 1975-07-21
FR2253261B1 (en) 1980-12-12
DE2453918A1 (en) 1975-06-12

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