CH606470A5 - - Google Patents

Info

Publication number
CH606470A5
CH606470A5 CH1023273A CH1023273A CH606470A5 CH 606470 A5 CH606470 A5 CH 606470A5 CH 1023273 A CH1023273 A CH 1023273A CH 1023273 A CH1023273 A CH 1023273A CH 606470 A5 CH606470 A5 CH 606470A5
Authority
CH
Switzerland
Application number
CH1023273A
Inventor
Klaus-Werner Ruff
Original Assignee
Loewe Opta Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19722244307 external-priority patent/DE2244307C3/de
Application filed by Loewe Opta Gmbh filed Critical Loewe Opta Gmbh
Publication of CH606470A5 publication Critical patent/CH606470A5/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
CH1023273A 1972-09-09 1973-07-13 CH606470A5 (US06521211-20030218-C00004.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722244307 DE2244307C3 (de) 1972-09-09 Verfahren zur Herstellung von alkalischen Bädern zur autokatalytischen stromlosen Abscheidung von Kupfer

Publications (1)

Publication Number Publication Date
CH606470A5 true CH606470A5 (US06521211-20030218-C00004.png) 1978-10-31

Family

ID=5855884

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1023273A CH606470A5 (US06521211-20030218-C00004.png) 1972-09-09 1973-07-13

Country Status (8)

Country Link
US (1) US3855141A (US06521211-20030218-C00004.png)
JP (1) JPS5549155B2 (US06521211-20030218-C00004.png)
AT (1) AT324065B (US06521211-20030218-C00004.png)
CH (1) CH606470A5 (US06521211-20030218-C00004.png)
FR (1) FR2199009B1 (US06521211-20030218-C00004.png)
GB (1) GB1416637A (US06521211-20030218-C00004.png)
IT (1) IT993886B (US06521211-20030218-C00004.png)
SE (1) SE387966B (US06521211-20030218-C00004.png)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3919100A (en) * 1974-04-24 1975-11-11 Enthone Alkaline etchant compositions
JPS5124537A (en) * 1974-08-26 1976-02-27 Hitachi Ltd Etsuchinguyokuno saiseihoho
DE2917597A1 (de) * 1979-04-30 1980-11-13 Siemens Ag Verfahren zur regenerierung ammoniakalischer aetzloesungen zum aetzen von metallischem kupfer
US5013395A (en) * 1987-08-28 1991-05-07 International Business Machines Corporation Continuous regeneration of acid solution
US5227010A (en) * 1991-04-03 1993-07-13 International Business Machines Corporation Regeneration of ferric chloride etchants
US5145553A (en) * 1991-05-06 1992-09-08 International Business Machines Corporation Method of making a flexible circuit member
US6503363B2 (en) * 2000-03-03 2003-01-07 Seh America, Inc. System for reducing wafer contamination using freshly, conditioned alkaline etching solution
US7404904B2 (en) * 2001-10-02 2008-07-29 Melvin Stanley Method and apparatus to clean particulate matter from a toxic fluid
SE531697C2 (sv) * 2007-07-11 2009-07-07 Sigma Engineering Ab Etsnings- och återvinningsförfarande
CN110790416B (zh) * 2018-08-02 2021-11-19 广州超邦化工有限公司 一种处理化学镀铜废水的方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3438901A (en) * 1965-10-22 1969-04-15 Neiko I Vassileff Metal treating bath and chelating agent for metal reactive acid baths
US3600244A (en) * 1969-02-20 1971-08-17 Ibm Process of etching metal with recovery or regeneration and recycling

Also Published As

Publication number Publication date
GB1416637A (en) 1975-12-03
DE2244307A1 (de) 1974-03-28
US3855141A (en) 1974-12-17
AT324065B (de) 1975-08-11
SE387966B (sv) 1976-09-20
DE2244307B2 (de) 1975-08-21
JPS5549155B2 (US06521211-20030218-C00004.png) 1980-12-10
FR2199009A1 (US06521211-20030218-C00004.png) 1974-04-05
JPS50110948A (US06521211-20030218-C00004.png) 1975-09-01
IT993886B (it) 1975-09-30
FR2199009B1 (US06521211-20030218-C00004.png) 1978-03-10

Similar Documents

Publication Publication Date Title
AU465394B2 (US06521211-20030218-C00004.png)
FR2199009B1 (US06521211-20030218-C00004.png)
CS172979B2 (US06521211-20030218-C00004.png)
JPS491525U (US06521211-20030218-C00004.png)
FR2209955A1 (US06521211-20030218-C00004.png)
CH559991A5 (US06521211-20030218-C00004.png)
BG18542A1 (US06521211-20030218-C00004.png)
CH563795A5 (US06521211-20030218-C00004.png)
CH576317A5 (US06521211-20030218-C00004.png)
CH563766A5 (US06521211-20030218-C00004.png)
CH562540A5 (US06521211-20030218-C00004.png)
CH561961A5 (US06521211-20030218-C00004.png)
CH576369A5 (US06521211-20030218-C00004.png)
CH561881A5 (US06521211-20030218-C00004.png)
CH576435A5 (US06521211-20030218-C00004.png)
CH560097A5 (US06521211-20030218-C00004.png)
CH574728A5 (US06521211-20030218-C00004.png)
CH576683A5 (US06521211-20030218-C00004.png)
CH560090A5 (US06521211-20030218-C00004.png)
CH560012A5 (US06521211-20030218-C00004.png)
CH576294A5 (US06521211-20030218-C00004.png)
CH559551A5 (US06521211-20030218-C00004.png)
CH559500A5 (US06521211-20030218-C00004.png)
CH1320272A4 (US06521211-20030218-C00004.png)
CH576928A5 (US06521211-20030218-C00004.png)

Legal Events

Date Code Title Description
PL Patent ceased