CH600379A5 - - Google Patents

Info

Publication number
CH600379A5
CH600379A5 CH1029373A CH1029373A CH600379A5 CH 600379 A5 CH600379 A5 CH 600379A5 CH 1029373 A CH1029373 A CH 1029373A CH 1029373 A CH1029373 A CH 1029373A CH 600379 A5 CH600379 A5 CH 600379A5
Authority
CH
Switzerland
Application number
CH1029373A
Inventor
Vassil Dragomirov Simeonov
Borislav Dimitrov Mednikarov
Jordan Petrov Malinovski
Original Assignee
Zlafop Pri Ban
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zlafop Pri Ban filed Critical Zlafop Pri Ban
Publication of CH600379A5 publication Critical patent/CH600379A5/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/494Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/496Binder-free compositions, e.g. evaporated
    • G03C1/4965Binder-free compositions, e.g. evaporated evaporated
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0002Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136Coating process making radiation sensitive element
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
CH1029373A 1972-07-17 1973-07-12 CH600379A5 (ru)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BG20980A BG17215A1 (ru) 1972-07-17 1972-07-17

Publications (1)

Publication Number Publication Date
CH600379A5 true CH600379A5 (ru) 1978-06-15

Family

ID=3898722

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1029373A CH600379A5 (ru) 1972-07-17 1973-07-12

Country Status (10)

Country Link
US (1) US3892571A (ru)
JP (1) JPS5651611B2 (ru)
BE (1) BE800821A (ru)
BG (1) BG17215A1 (ru)
CH (1) CH600379A5 (ru)
DE (1) DE2335072A1 (ru)
FR (1) FR2193212B1 (ru)
GB (1) GB1384037A (ru)
IT (1) IT985713B (ru)
NL (1) NL7308326A (ru)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1583033A (en) * 1976-05-14 1981-01-21 Gaf Corp Method of exposing and developing a photographic element
JPS5340281A (en) * 1976-09-27 1978-04-12 Konishiroku Photo Ind Co Ltd Photo mask material and manufacturtof it
US4276368A (en) * 1979-05-04 1981-06-30 Bell Telephone Laboratories, Incorporated Photoinduced migration of silver into chalcogenide layer
US4329410A (en) * 1979-12-26 1982-05-11 The Perkin-Elmer Corporation Production of X-ray lithograph masks
US4664996A (en) * 1983-06-24 1987-05-12 Rca Corporation Method for etching a flat apertured mask for use in a cathode-ray tube
US4656107A (en) * 1983-06-24 1987-04-07 Rca Corporation Photographic printing plate for use in a vacuum printing frame
DE3626708A1 (de) * 1986-08-07 1988-02-11 Mania Gmbh Verfahren zur herstellung von leiterplatten
US5278008A (en) * 1990-10-31 1994-01-11 Hughes Aircraft Company Diffraction efficiency control in holographic elements
US6350555B1 (en) * 1998-01-14 2002-02-26 Precision Coatings, Inc. Direct write imaging medium
US20020168586A1 (en) * 2001-05-10 2002-11-14 Shih-Che Lo Near field optical disk

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE639020A (ru) * 1959-09-18 1900-01-01
BE635636A (ru) * 1962-08-01
US3488194A (en) * 1966-06-09 1970-01-06 Eastman Kodak Co Photosensitive metal plate
GB1187980A (en) * 1966-10-28 1970-04-15 Ilford Ltd Presensitised Lithographic Plates.
US3578451A (en) * 1967-03-29 1971-05-11 Scott Paper Co Integral negative type positive photolithographic plate
US3681227A (en) * 1970-06-29 1972-08-01 Corning Glass Works Microcircuit mask and method
US3730720A (en) * 1970-08-05 1973-05-01 Bell Telephone Labor Inc Fabrication of integrated optical circuits
US3674492A (en) * 1970-12-09 1972-07-04 Bell Telephone Labor Inc Laminar photomask

Also Published As

Publication number Publication date
BE800821A (fr) 1973-10-01
DE2335072A1 (de) 1974-02-21
GB1384037A (en) 1975-02-19
JPS5651611B2 (ru) 1981-12-07
FR2193212B1 (ru) 1977-05-06
DE2335072C3 (ru) 1979-03-29
NL7308326A (ru) 1974-01-21
JPS4992980A (ru) 1974-09-04
FR2193212A1 (ru) 1974-02-15
DE2335072B2 (ru) 1978-07-27
BG17215A1 (ru) 1973-07-25
IT985713B (it) 1974-12-20
US3892571A (en) 1975-07-01

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Legal Events

Date Code Title Description
PL Patent ceased