CH584422A5 - - Google Patents

Info

Publication number
CH584422A5
CH584422A5 CH286974A CH286974A CH584422A5 CH 584422 A5 CH584422 A5 CH 584422A5 CH 286974 A CH286974 A CH 286974A CH 286974 A CH286974 A CH 286974A CH 584422 A5 CH584422 A5 CH 584422A5
Authority
CH
Switzerland
Application number
CH286974A
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Priority to CH286974A priority Critical patent/CH584422A5/xx
Priority to DE19742459183 priority patent/DE2459183C2/en
Priority to IT3080274A priority patent/IT1027852B/en
Priority to FR7443570A priority patent/FR2262818B1/fr
Priority to GB383775A priority patent/GB1443917A/en
Priority to JP1261675A priority patent/JPS5527476B2/ja
Publication of CH584422A5 publication Critical patent/CH584422A5/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CH286974A 1974-02-28 1974-02-28 CH584422A5 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CH286974A CH584422A5 (en) 1974-02-28 1974-02-28
DE19742459183 DE2459183C2 (en) 1974-02-28 1974-12-14 Process for the production of a double-layer photoresist mask
IT3080274A IT1027852B (en) 1974-02-28 1974-12-20 PROCESS FOR THE MANUFACTURE OF A PHOTORESISTIVE MASK DOP PIC LAYER
FR7443570A FR2262818B1 (en) 1974-02-28 1974-12-27
GB383775A GB1443917A (en) 1974-02-28 1975-01-29 Formation of photoresist masks
JP1261675A JPS5527476B2 (en) 1974-02-28 1975-01-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH286974A CH584422A5 (en) 1974-02-28 1974-02-28

Publications (1)

Publication Number Publication Date
CH584422A5 true CH584422A5 (en) 1977-01-31

Family

ID=4243404

Family Applications (1)

Application Number Title Priority Date Filing Date
CH286974A CH584422A5 (en) 1974-02-28 1974-02-28

Country Status (6)

Country Link
JP (1) JPS5527476B2 (en)
CH (1) CH584422A5 (en)
DE (1) DE2459183C2 (en)
FR (1) FR2262818B1 (en)
GB (1) GB1443917A (en)
IT (1) IT1027852B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248960A (en) * 1978-01-23 1981-02-03 W. R. Grace & Co. Radiation responsive relief imageable plastic laminate
US4716097A (en) * 1986-02-03 1987-12-29 E. I. Du Pont De Nemours And Company Increased photopolymer photospeed employing yellow light preexposure
DE3626708A1 (en) * 1986-08-07 1988-02-11 Mania Gmbh Method for producing printed circuit boards

Also Published As

Publication number Publication date
DE2459183C2 (en) 1983-02-24
FR2262818A1 (en) 1975-09-26
DE2459183A1 (en) 1975-09-04
FR2262818B1 (en) 1977-07-01
IT1027852B (en) 1978-12-20
JPS50119971A (en) 1975-09-19
GB1443917A (en) 1976-07-28
JPS5527476B2 (en) 1980-07-21

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Legal Events

Date Code Title Description
PL Patent ceased