CH561079A5 - - Google Patents

Info

Publication number
CH561079A5
CH561079A5 CH1566470A CH1566470A CH561079A5 CH 561079 A5 CH561079 A5 CH 561079A5 CH 1566470 A CH1566470 A CH 1566470A CH 1566470 A CH1566470 A CH 1566470A CH 561079 A5 CH561079 A5 CH 561079A5
Authority
CH
Switzerland
Application number
CH1566470A
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH561079A5 publication Critical patent/CH561079A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
CH1566470A 1970-05-05 1970-10-23 CH561079A5 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702022025 DE2022025C3 (de) 1970-05-05 1970-05-05 Vorrichtung zum Herstellen eines Hohlkörpers aus Halbleitermaterial

Publications (1)

Publication Number Publication Date
CH561079A5 true CH561079A5 (cs) 1975-04-30

Family

ID=5770320

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1566470A CH561079A5 (cs) 1970-05-05 1970-10-23

Country Status (10)

Country Link
JP (1) JPS4918917B1 (cs)
AT (1) AT306105B (cs)
CH (1) CH561079A5 (cs)
CS (1) CS163774B2 (cs)
DE (1) DE2022025C3 (cs)
FR (1) FR2092930B2 (cs)
GB (1) GB1315167A (cs)
IT (1) IT951574B (cs)
NL (1) NL7017481A (cs)
SE (1) SE368912B (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE789719A (fr) * 1972-05-16 1973-02-01 Siemens Ag Procede et dispositif de fabrication de corps creux en matiere semi-conductrice, en particulier des tubes en silicium
DE2618273C3 (de) * 1976-04-27 1984-04-19 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Abscheidung von polykristallinem Silicium
JPH0166340U (cs) * 1987-10-21 1989-04-27

Also Published As

Publication number Publication date
DE2022025B2 (de) 1979-06-28
NL7017481A (cs) 1971-11-09
FR2092930A2 (cs) 1972-01-28
GB1315167A (en) 1973-04-26
DE2022025A1 (de) 1971-11-18
AT306105B (de) 1973-03-26
JPS4918917B1 (cs) 1974-05-14
CS163774B2 (cs) 1975-11-07
DE2022025C3 (de) 1980-03-20
IT951574B (it) 1973-07-10
SE368912B (cs) 1974-07-29
FR2092930B2 (cs) 1973-02-02

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Legal Events

Date Code Title Description
PL Patent ceased
PL Patent ceased