CH544274A - Device for cooling workpieces that are subjected to a treatment in a vacuum - Google Patents

Device for cooling workpieces that are subjected to a treatment in a vacuum

Info

Publication number
CH544274A
CH544274A CH1569271A CH1569271A CH544274A CH 544274 A CH544274 A CH 544274A CH 1569271 A CH1569271 A CH 1569271A CH 1569271 A CH1569271 A CH 1569271A CH 544274 A CH544274 A CH 544274A
Authority
CH
Switzerland
Prior art keywords
vacuum
subjected
treatment
cooling workpieces
workpieces
Prior art date
Application number
CH1569271A
Other languages
German (de)
Inventor
Wagner Rudolf
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH1569271A priority Critical patent/CH544274A/en
Priority to NL717117137A priority patent/NL143626B/en
Priority to DE2247014A priority patent/DE2247014C3/en
Priority to DE19727235271U priority patent/DE7235271U/en
Priority to GB4701272A priority patent/GB1364960A/en
Priority to FR7237184A priority patent/FR2157895B3/fr
Priority to US00300373A priority patent/US3818982A/en
Publication of CH544274A publication Critical patent/CH544274A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S165/00—Heat exchange
    • Y10S165/135—Movable heat exchanger
    • Y10S165/139—Fully rotatable
    • Y10S165/156—Hollow cylindrical member, e.g. drum
CH1569271A 1971-10-27 1971-10-27 Device for cooling workpieces that are subjected to a treatment in a vacuum CH544274A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CH1569271A CH544274A (en) 1971-10-27 1971-10-27 Device for cooling workpieces that are subjected to a treatment in a vacuum
NL717117137A NL143626B (en) 1971-10-27 1971-12-14 DEVICE FOR COOLING ONE OR MORE WORKPIECES TO BE LINED IN A VACUUM CHAMBER.
DE2247014A DE2247014C3 (en) 1971-10-27 1972-09-25 Device for cooling workpieces that are subjected to a treatment in a vacuum
DE19727235271U DE7235271U (en) 1971-10-27 1972-09-25 DEVICE FOR COOLING WORKPIECES THAT ARE SUBJECT TO TREATMENT IN A VACUUM
GB4701272A GB1364960A (en) 1971-10-27 1972-10-12 Apparatus for the cooling of work pieces which are subjected to treatment in vacuo
FR7237184A FR2157895B3 (en) 1971-10-27 1972-10-20
US00300373A US3818982A (en) 1971-10-27 1972-10-24 Device for cooling workpieces which are submitted to a vacuum treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1569271A CH544274A (en) 1971-10-27 1971-10-27 Device for cooling workpieces that are subjected to a treatment in a vacuum

Publications (1)

Publication Number Publication Date
CH544274A true CH544274A (en) 1973-11-15

Family

ID=4411143

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1569271A CH544274A (en) 1971-10-27 1971-10-27 Device for cooling workpieces that are subjected to a treatment in a vacuum

Country Status (6)

Country Link
US (1) US3818982A (en)
CH (1) CH544274A (en)
DE (2) DE2247014C3 (en)
FR (1) FR2157895B3 (en)
GB (1) GB1364960A (en)
NL (1) NL143626B (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4026787A (en) * 1974-01-25 1977-05-31 Coulter Information Systems, Inc. Thin film deposition apparatus using segmented target means
US3885520A (en) * 1974-03-08 1975-05-27 John F Krumme Vapor deposition apparatus with rotatable ring mask
US3892651A (en) * 1974-05-28 1975-07-01 Corning Glass Works Method and apparatus for coating a plurality of cylindrical articles
US4014779A (en) * 1974-11-01 1977-03-29 Coulter Information Systems, Inc. Sputtering apparatus
US4080281A (en) * 1976-04-09 1978-03-21 Tsunehiko Endo Apparatus for making metal films
US4151064A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Apparatus for sputtering cylinders
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
US4261762A (en) * 1979-09-14 1981-04-14 Eaton Corporation Method for conducting heat to or from an article being treated under vacuum
US4680061A (en) * 1979-12-21 1987-07-14 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
US4909314A (en) * 1979-12-21 1990-03-20 Varian Associates, Inc. Apparatus for thermal treatment of a wafer in an evacuated environment
US4743570A (en) * 1979-12-21 1988-05-10 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
ATE7714T1 (en) * 1980-07-01 1984-06-15 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And METHOD FOR MASS PRODUCTION OF ALLOYS AND APPARATUS THEREOF.
AT368442B (en) * 1981-01-26 1982-10-11 Alber Franz CONNECTING PIECE
GB2129018B (en) * 1982-08-30 1986-01-29 Ricoh Kk Vacuum evaporation apparatus
US4576622A (en) * 1983-11-28 1986-03-18 Lothar Jung Manufacture of preforms for energy transmitting fibers
GB8418063D0 (en) * 1984-07-16 1984-08-22 Atomic Energy Authority Uk Temperature control in vacuum
CA1251100A (en) * 1985-05-17 1989-03-14 Richard Cloutier Chemical vapor deposition
WO1987007153A1 (en) * 1986-05-29 1987-12-03 Interface Biomedical Laboratories Corporation Composite hemostatic article including a hemostatic agent onlay and methods for preparing the same
US4938992A (en) * 1988-01-07 1990-07-03 Varian Associates, Inc. Methods for thermal transfer with a semiconductor
US4832781A (en) * 1988-01-07 1989-05-23 Varian Associates, Inc. Methods and apparatus for thermal transfer with a semiconductor wafer in vacuum
US4997606A (en) * 1988-01-07 1991-03-05 Varian Associates, Inc. Methods and apparatus for fabricating a high purity thermally-conductive polymer layer
US4949783A (en) * 1988-05-18 1990-08-21 Veeco Instruments, Inc. Substrate transport and cooling apparatus and method for same
US5182093A (en) * 1990-01-08 1993-01-26 Celestech, Inc. Diamond deposition cell
US6017581A (en) * 1997-04-18 2000-01-25 Semi-Alloys Company Method for coating lenticular articles
US6241005B1 (en) 1999-03-30 2001-06-05 Veeco Instruments, Inc. Thermal interface member
US7000418B2 (en) * 2004-05-14 2006-02-21 Intevac, Inc. Capacitance sensing for substrate cooling
US8468969B2 (en) * 2010-11-30 2013-06-25 United Technologies Corporation Dimensionally stable durable thermal spray masking system
DE202014009343U1 (en) 2014-11-22 2014-12-15 Sav Automation Gmbh Device for cooling partially heated workpieces after welding or hardening work
US11174552B2 (en) * 2018-06-12 2021-11-16 Applied Materials, Inc. Rotary reactor for uniform particle coating with thin films
CN112601837A (en) 2018-07-19 2021-04-02 应用材料公司 Method and apparatus for coating particles
TWI764732B (en) 2019-04-24 2022-05-11 美商應用材料股份有限公司 Reactor for coating particles in stationary chamber with rotating paddles
TWI738301B (en) 2019-04-24 2021-09-01 美商應用材料股份有限公司 Reactor for coating particles in stationary chamber with rotating paddles and gas injection

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3185131A (en) * 1960-10-24 1965-05-25 Gen Motors Corp Apparatus for coating articles in a fluidized bed
US3344772A (en) * 1963-04-01 1967-10-03 Possis Machine Corp Spray coater
US3355309A (en) * 1963-07-15 1967-11-28 Gen Electric Method and apparatus for applying coatings onto articles of manufacture
US3498260A (en) * 1963-07-15 1970-03-03 Gen Electric Machine for applying coatings onto articles of manufacture
US3383238A (en) * 1965-05-27 1968-05-14 Unzicker Arlyn Eugene Method and apparatus of controlling thin film deposition in a vacuum
US3638606A (en) * 1969-11-21 1972-02-01 Gen Electric Apparatus for controlling the coating of selected surfaces of an article of manufacture

Also Published As

Publication number Publication date
FR2157895A1 (en) 1973-06-08
DE2247014A1 (en) 1973-05-03
DE2247014C3 (en) 1975-05-22
US3818982A (en) 1974-06-25
DE2247014B2 (en) 1974-10-10
DE7235271U (en) 1975-09-04
NL143626B (en) 1974-10-15
NL7117137A (en) 1973-05-02
FR2157895B3 (en) 1975-11-28
GB1364960A (en) 1974-08-29

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Legal Events

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