CH499206A - Method for controlling the quality of the unit patterns of a mask used for the manufacture of integrated circuits and machine for its implementation - Google Patents

Method for controlling the quality of the unit patterns of a mask used for the manufacture of integrated circuits and machine for its implementation

Info

Publication number
CH499206A
CH499206A CH1382668A CH1382668A CH499206A CH 499206 A CH499206 A CH 499206A CH 1382668 A CH1382668 A CH 1382668A CH 1382668 A CH1382668 A CH 1382668A CH 499206 A CH499206 A CH 499206A
Authority
CH
Switzerland
Prior art keywords
implementation
manufacture
quality
controlling
machine
Prior art date
Application number
CH1382668A
Other languages
French (fr)
Inventor
Pettavel Jacques
Koulicovitch Maurice
Original Assignee
Genevoise Instr Physique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Genevoise Instr Physique filed Critical Genevoise Instr Physique
Priority to CH1382668A priority Critical patent/CH499206A/en
Priority to FR1594122D priority patent/FR1594122A/fr
Priority to GB3561769A priority patent/GB1246584A/en
Priority to DE19691944631 priority patent/DE1944631A1/en
Publication of CH499206A publication Critical patent/CH499206A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B07—SEPARATING SOLIDS FROM SOLIDS; SORTING
    • B07C—POSTAL SORTING; SORTING INDIVIDUAL ARTICLES, OR BULK MATERIAL FIT TO BE SORTED PIECE-MEAL, e.g. BY PICKING
    • B07C5/00—Sorting according to a characteristic or feature of the articles or material being sorted, e.g. by control effected by devices which detect or measure such characteristic or feature; Sorting by manually actuated devices, e.g. switches
    • B07C5/04—Sorting according to size
    • B07C5/10—Sorting according to size measured by light-responsive means
    • G—PHYSICS
    • G07—CHECKING-DEVICES
    • G07C—TIME OR ATTENDANCE REGISTERS; REGISTERING OR INDICATING THE WORKING OF MACHINES; GENERATING RANDOM NUMBERS; VOTING OR LOTTERY APPARATUS; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDED FOR ELSEWHERE
    • G07C3/00—Registering or indicating the condition or the working of machines or other apparatus, other than vehicles
    • G07C3/14—Quality control systems
CH1382668A 1968-09-16 1968-09-16 Method for controlling the quality of the unit patterns of a mask used for the manufacture of integrated circuits and machine for its implementation CH499206A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CH1382668A CH499206A (en) 1968-09-16 1968-09-16 Method for controlling the quality of the unit patterns of a mask used for the manufacture of integrated circuits and machine for its implementation
FR1594122D FR1594122A (en) 1968-09-16 1968-12-05
GB3561769A GB1246584A (en) 1968-09-16 1969-07-15 Process and machine for checking the quality of drawings on masks for integrated circuits
DE19691944631 DE1944631A1 (en) 1968-09-16 1969-09-03 Method and device for controlling the quality of uniform motifs or uniform symbols of masks for integrated circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1382668A CH499206A (en) 1968-09-16 1968-09-16 Method for controlling the quality of the unit patterns of a mask used for the manufacture of integrated circuits and machine for its implementation

Publications (1)

Publication Number Publication Date
CH499206A true CH499206A (en) 1970-11-15

Family

ID=4395654

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1382668A CH499206A (en) 1968-09-16 1968-09-16 Method for controlling the quality of the unit patterns of a mask used for the manufacture of integrated circuits and machine for its implementation

Country Status (4)

Country Link
CH (1) CH499206A (en)
DE (1) DE1944631A1 (en)
FR (1) FR1594122A (en)
GB (1) GB1246584A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944369A (en) * 1974-05-24 1976-03-16 Bell Telephone Laboratories, Incorporated Optical comparator system to separate unacceptable defects from acceptable edge aberrations
EP0128183B1 (en) * 1982-12-15 1989-04-12 Cogent Limited Inspection apparatus and method
US4634876A (en) * 1983-05-13 1987-01-06 Canon Kabushiki Kaisha Object position detecting apparatus using accumulation type sensor
DE4322803C2 (en) * 1993-07-08 1998-09-10 Mohndruck Reinhard Mohn Ohg Process for monitoring the completeness of individually printed products in online production

Also Published As

Publication number Publication date
GB1246584A (en) 1971-09-15
FR1594122A (en) 1970-06-01
DE1944631A1 (en) 1970-05-21

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Legal Events

Date Code Title Description
PL Patent ceased