CH483657A - Process for the production of a photoresist - Google Patents

Process for the production of a photoresist

Info

Publication number
CH483657A
CH483657A CH538267A CH538267A CH483657A CH 483657 A CH483657 A CH 483657A CH 538267 A CH538267 A CH 538267A CH 538267 A CH538267 A CH 538267A CH 483657 A CH483657 A CH 483657A
Authority
CH
Switzerland
Prior art keywords
photoresist
production
Prior art date
Application number
CH538267A
Other languages
German (de)
Inventor
Tjalke Boersma Theo
Johannes Veenendaal Hendrikes
Nicolaas Van Der Sand Cornelis
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH483657A publication Critical patent/CH483657A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CH538267A 1966-04-20 1967-04-17 Process for the production of a photoresist CH483657A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6605244A NL6605244A (en) 1966-04-20 1966-04-20

Publications (1)

Publication Number Publication Date
CH483657A true CH483657A (en) 1969-12-31

Family

ID=19796338

Family Applications (1)

Application Number Title Priority Date Filing Date
CH538267A CH483657A (en) 1966-04-20 1967-04-17 Process for the production of a photoresist

Country Status (9)

Country Link
US (1) US3545973A (en)
AT (1) AT278997B (en)
BE (1) BE697257A (en)
CH (1) CH483657A (en)
DE (1) DE1669238B2 (en)
ES (1) ES339435A1 (en)
GB (1) GB1123642A (en)
NL (1) NL6605244A (en)
SE (1) SE330828B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6605244A (en) * 1966-04-20 1967-10-23
US4262080A (en) * 1978-10-31 1981-04-14 Nasa Method for applying photographic resist to otherwise incompatible substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6412172A (en) * 1964-10-20 1966-04-21
NL6605244A (en) * 1966-04-20 1967-10-23

Also Published As

Publication number Publication date
BE697257A (en) 1967-10-19
AT278997B (en) 1970-02-25
NL6605244A (en) 1967-10-23
DE1669238A1 (en) 1971-06-09
GB1123642A (en) 1968-08-14
SE330828B (en) 1970-11-30
US3545973A (en) 1970-12-08
DE1669238B2 (en) 1976-06-16
ES339435A1 (en) 1968-10-01

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Legal Events

Date Code Title Description
PL Patent ceased