CH416326A - Vorsensibilisierte Druckplatte oder Folie und Verfahren zu ihrer Herstellung - Google Patents

Vorsensibilisierte Druckplatte oder Folie und Verfahren zu ihrer Herstellung

Info

Publication number
CH416326A
CH416326A CH261263A CH261263A CH416326A CH 416326 A CH416326 A CH 416326A CH 261263 A CH261263 A CH 261263A CH 261263 A CH261263 A CH 261263A CH 416326 A CH416326 A CH 416326A
Authority
CH
Switzerland
Prior art keywords
manufacture
film
printing plate
presensitized printing
presensitized
Prior art date
Application number
CH261263A
Other languages
German (de)
English (en)
Inventor
Sues Oskar
Uhlig Fritz
Rebenstock August
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH416326A publication Critical patent/CH416326A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/40—Esters thereof
    • C07F9/4071—Esters thereof the ester moiety containing a substituent or a structure which is considered as characteristic
    • C07F9/4075—Esters with hydroxyalkyl compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F30/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/02—Homopolymers or copolymers of monomers containing phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Biochemistry (AREA)
  • Polymers & Plastics (AREA)
  • Molecular Biology (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CH261263A 1961-10-13 1963-03-01 Vorsensibilisierte Druckplatte oder Folie und Verfahren zu ihrer Herstellung CH416326A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEK0044931 1961-10-13
DEK46079A DE1237899B (de) 1961-10-13 1962-03-03 Verfahren zur Herstellung von vorsensibilisierten Flachdruckfolien

Publications (1)

Publication Number Publication Date
CH416326A true CH416326A (de) 1966-06-30

Family

ID=25983475

Family Applications (1)

Application Number Title Priority Date Filing Date
CH261263A CH416326A (de) 1961-10-13 1963-03-01 Vorsensibilisierte Druckplatte oder Folie und Verfahren zu ihrer Herstellung

Country Status (6)

Country Link
US (2) US3197308A (US07655688-20100202-C00109.png)
BE (1) BE629055A (US07655688-20100202-C00109.png)
CH (1) CH416326A (US07655688-20100202-C00109.png)
DE (2) DE1237899B (US07655688-20100202-C00109.png)
GB (2) GB947471A (US07655688-20100202-C00109.png)
NL (2) NL289167A (US07655688-20100202-C00109.png)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL267931A (US07655688-20100202-C00109.png) * 1960-08-05 1900-01-01
DE1447956A1 (de) * 1965-01-02 1968-11-21 Kalle Ag Verfahren zur Herstellung einer mit einem Diazoniumsalz vorsensibilisierten Druckform
DE1447955C3 (de) * 1965-01-02 1978-10-05 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung einer vorsensibilisierten Druckplatte
US3958994A (en) * 1974-08-26 1976-05-25 American Hoechst Corporation Photosensitive diazo steel lithoplate structure
GB1569021A (en) 1976-03-17 1980-06-11 Kuraray Co Adhesive cementing agents containing partial phosphonic orphosphonic acid esters
US4299906A (en) * 1979-06-01 1981-11-10 American Hoechst Corporation Light-sensitive color proofing film with surfactant in a light-sensitive coating
US4446028A (en) * 1982-12-20 1984-05-01 Betz Laboratories, Inc. Isopropenyl phosphonic acid copolymers used to inhibit scale formation
US4446046A (en) * 1981-06-17 1984-05-01 Betz Laboratories, Inc. Poly (alkenyl) phosphonic acid and methods of use thereof
US4785062A (en) * 1984-07-31 1988-11-15 W. R. Grace & Co.-Conn. Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups
US4942644A (en) * 1985-03-18 1990-07-24 Rowley William W Strap hanger
DE3615612A1 (de) * 1986-05-09 1987-11-12 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3817424A1 (de) * 1988-05-21 1989-11-23 Hoechst Ag Alkenylphosphon- und -phosphinsaeureester, verfahren zu ihrer herstellung und durch strahlung polymerisierbares gemisch, das diese verbindungen enthaelt
JP2652804B2 (ja) * 1989-04-27 1997-09-10 富士写真フイルム株式会社 感光性平版印刷版
DE3922330A1 (de) * 1989-07-07 1991-01-17 Hoechst Ag Durch strahlung polymerisierbares gemisch und dieses enthaltendes aufzeichnungsmaterial
US5736256A (en) * 1995-05-31 1998-04-07 Howard A. Fromson Lithographic printing plate treated with organo-phosphonic acid chelating compounds and processes relating thereto

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2557805A (en) * 1949-01-18 1951-06-19 Du Pont Dialkyl vinyl phosphates and polymers
NL80569C (US07655688-20100202-C00109.png) * 1949-07-23
BE540601A (US07655688-20100202-C00109.png) * 1950-12-06
US2787546A (en) * 1955-02-08 1957-04-02 Eastman Kodak Co Light-sensitive photographic elements for photomechanical processes
US2784208A (en) * 1955-02-17 1957-03-05 Standard Oil Co Monomethyl esters of aliphatic phosphonic acids
BE571292A (US07655688-20100202-C00109.png) * 1956-12-28

Also Published As

Publication number Publication date
BE629055A (US07655688-20100202-C00109.png)
US3197308A (en) 1965-07-27
GB947471A (en) 1964-01-22
NL283850A (US07655688-20100202-C00109.png)
DE1302833B (US07655688-20100202-C00109.png)
DE1237899B (de) 1967-03-30
NL289167A (US07655688-20100202-C00109.png)
US3179518A (en) 1965-04-20
GB1019919A (en) 1966-02-09

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