CH415887A - Verfahren zur Herstellung von Halbleiter-Rekombinationslasern mit Pérot-Fabry-Grenzflächen hoher Güte - Google Patents

Verfahren zur Herstellung von Halbleiter-Rekombinationslasern mit Pérot-Fabry-Grenzflächen hoher Güte

Info

Publication number
CH415887A
CH415887A CH199364A CH199364A CH415887A CH 415887 A CH415887 A CH 415887A CH 199364 A CH199364 A CH 199364A CH 199364 A CH199364 A CH 199364A CH 415887 A CH415887 A CH 415887A
Authority
CH
Switzerland
Prior art keywords
pérot
fabry
interfaces
production
high quality
Prior art date
Application number
CH199364A
Other languages
English (en)
Inventor
Hayes Jr Dill Frederick
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of CH415887A publication Critical patent/CH415887A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Geometry (AREA)
  • Dicing (AREA)
  • Semiconductor Lasers (AREA)
CH199364A 1963-02-20 1964-02-19 Verfahren zur Herstellung von Halbleiter-Rekombinationslasern mit Pérot-Fabry-Grenzflächen hoher Güte CH415887A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US260020A US3341937A (en) 1963-02-20 1963-02-20 Crystalline injection laser device manufacture

Publications (1)

Publication Number Publication Date
CH415887A true CH415887A (de) 1966-06-30

Family

ID=22987482

Family Applications (1)

Application Number Title Priority Date Filing Date
CH199364A CH415887A (de) 1963-02-20 1964-02-19 Verfahren zur Herstellung von Halbleiter-Rekombinationslasern mit Pérot-Fabry-Grenzflächen hoher Güte

Country Status (5)

Country Link
US (1) US3341937A (de)
BE (1) BE644039A (de)
CH (1) CH415887A (de)
GB (1) GB995121A (de)
NL (1) NL6401061A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3457633A (en) * 1962-12-31 1969-07-29 Ibm Method of making crystal shapes having optically related surfaces
US3419742A (en) * 1965-11-24 1968-12-31 Monsanto Co Injection-luminescent gaas diodes having a graded p-n junction
US3768037A (en) * 1965-11-26 1973-10-23 Hitachi Ltd Semiconductor diode laser device
US3531735A (en) * 1966-06-28 1970-09-29 Gen Electric Semiconductor laser having grooves to prevent radiation transverse to the optical axis
US3471923A (en) * 1966-12-09 1969-10-14 Rca Corp Method of making diode arrays
US3579055A (en) * 1968-08-05 1971-05-18 Bell & Howell Co Semiconductor laser device and method for it{3 s fabrication
US3831030A (en) * 1971-07-19 1974-08-20 Texas Instruments Inc Laser-operated system for spectroscopic analysis
IT963303B (it) * 1971-07-29 1974-01-10 Licentia Gmbh Laser a semiconduttore
US3974514A (en) * 1974-12-11 1976-08-10 Rca Corporation Electroluminescent edge-emitting diode comprising a light reflector in a groove
US4097310A (en) * 1975-06-03 1978-06-27 Joseph Lindmayer Method of forming silicon solar energy cells
US4469500A (en) * 1981-01-26 1984-09-04 Rca Corporation Method of cleaving a crystal to produce a high optical quality corner
US4380862A (en) * 1981-11-16 1983-04-26 Rca Corporation Method for supplying a low resistivity electrical contact to a semiconductor laser device
GB2172141B (en) * 1985-03-08 1988-11-16 Stc Plc Single heterostructure laser chip manufacture
US4707219A (en) * 1985-05-14 1987-11-17 American Telephone And Telegraph Company, At&T Bell Laboratories Integrated devices including cleaved semiconductor lasers
US4927778A (en) * 1988-08-05 1990-05-22 Eastman Kodak Company Method of improving yield of LED arrays
US5081002A (en) * 1989-04-24 1992-01-14 The Trustees Of Columbia University In The City Of New York Method of localized photohemical etching of multilayered semiconductor body

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3122827A (en) * 1960-08-04 1964-03-03 Hughes Aircraft Co Polycrystalline article and method for making same
US3152939A (en) * 1960-08-12 1964-10-13 Westinghouse Electric Corp Process for preparing semiconductor members
US3193418A (en) * 1960-10-27 1965-07-06 Fairchild Camera Instr Co Semiconductor device fabrication
US3128213A (en) * 1961-07-20 1964-04-07 Int Rectifier Corp Method of making a semiconductor device
BE639066A (de) * 1962-10-24 1900-01-01
US3247576A (en) * 1962-10-30 1966-04-26 Ibm Method of fabrication of crystalline shapes

Also Published As

Publication number Publication date
US3341937A (en) 1967-09-19
BE644039A (de) 1964-06-15
GB995121A (en) 1965-06-16
NL6401061A (de) 1964-08-21

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