CH354857A - Method of manufacturing an electrical semiconductor device - Google Patents

Method of manufacturing an electrical semiconductor device

Info

Publication number
CH354857A
CH354857A CH354857DA CH354857A CH 354857 A CH354857 A CH 354857A CH 354857D A CH354857D A CH 354857DA CH 354857 A CH354857 A CH 354857A
Authority
CH
Switzerland
Prior art keywords
manufacturing
semiconductor device
electrical semiconductor
electrical
semiconductor
Prior art date
Application number
Other languages
German (de)
Inventor
Norbert Dipl-Chem Dr Schink
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH354857A publication Critical patent/CH354857A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60N—SEATS SPECIALLY ADAPTED FOR VEHICLES; VEHICLE PASSENGER ACCOMMODATION NOT OTHERWISE PROVIDED FOR
    • B60N3/00—Arrangements or adaptations of other passenger fittings, not otherwise provided for
    • B60N3/08—Arrangements or adaptations of other passenger fittings, not otherwise provided for of receptacles for refuse, e.g. ash-trays
    • B60N3/083—Ash-trays
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/32—Anodisation of semiconducting materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Transportation (AREA)
  • Mechanical Engineering (AREA)
  • Weting (AREA)
CH354857D 1956-06-21 1957-06-12 Method of manufacturing an electrical semiconductor device CH354857A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES49151A DE1093910B (en) 1956-06-21 1956-06-21 Method for manufacturing an electrical semiconductor device

Publications (1)

Publication Number Publication Date
CH354857A true CH354857A (en) 1961-06-15

Family

ID=7487149

Family Applications (1)

Application Number Title Priority Date Filing Date
CH354857D CH354857A (en) 1956-06-21 1957-06-12 Method of manufacturing an electrical semiconductor device

Country Status (4)

Country Link
CH (1) CH354857A (en)
DE (1) DE1093910B (en)
FR (1) FR1435482A (en)
NL (2) NL111654C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1211335B (en) * 1962-07-16 1966-02-24 Elektronik M B H Semiconductor component with at least one pn junction and with a surface layer made of silicon oxide and method for manufacturing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE467885A (en) * 1943-08-11

Also Published As

Publication number Publication date
DE1093910B (en) 1960-12-01
FR1435482A (en) 1966-04-15
NL111654C (en)
NL216354A (en)

Similar Documents

Publication Publication Date Title
CH356211A (en) Method of manufacturing electrical semiconductor devices
CH414022A (en) Method for manufacturing an electrical component
CH422161A (en) Method for producing an electrical contact on a semiconductor element
CH354308A (en) Device for the extraction of the purest semiconductor material for electrotechnical purposes
CH352381A (en) Method of making an electrical connector
CH347268A (en) Method of manufacturing a semiconductor device
CH349346A (en) Method of manufacturing semiconductor devices
CH357121A (en) Process for the production of semiconductor devices
CH370842A (en) Method of manufacturing semiconductor devices
CH357470A (en) Method of manufacturing semiconductor devices
CH341572A (en) Method of manufacturing a semiconductor device
CH374108A (en) Method for producing an electrical contact device
CH398804A (en) Method of manufacturing electrical semiconductor devices
CH349705A (en) Semiconductor device and method for its manufacture
CH334860A (en) Method for manufacturing an electrical device and device manufactured by this method
CH354168A (en) A method of manufacturing an electrical semiconductor device and a semiconductor device manufactured by this method
AT239355B (en) Method of making an electrical circuit
CH351031A (en) Method of manufacturing semiconductor devices
CH394399A (en) Method of manufacturing semiconductor devices
CH319753A (en) A method of manufacturing an electric semiconductor device
AT198799B (en) Method of manufacturing an electrical semiconductor device
CH350722A (en) Method of manufacturing a semiconductor device
CH354857A (en) Method of manufacturing an electrical semiconductor device
CH423991A (en) Method for producing an electrical circuit component
CH354858A (en) Method for producing an electrical semiconductor device with a single-crystal semiconductor body