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Application filed by Molnar Josef, Kalmar Ladislaus, Krausz EugenfiledCriticalMolnar Josef
Publication of CH207533ApublicationCriticalpatent/CH207533A/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/20—Exposure; Apparatus therefor
G03F7/24—Curved surfaces
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Physics & Mathematics
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CH207533D1938-10-211938-10-21Einrichtung zum photomechanischen Auftragen von Musterelementen auf zur Herstellung von Druckwalzen dienende Walzen.
CH207533A
(de)