CA993253A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
CA993253A
CA993253A CA179,914A CA179914A CA993253A CA 993253 A CA993253 A CA 993253A CA 179914 A CA179914 A CA 179914A CA 993253 A CA993253 A CA 993253A
Authority
CA
Canada
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA179,914A
Other languages
English (en)
Other versions
CA179914S (en
Inventor
Hideo Fukutani
Kazuo Torige
Yoshihiro Takahashi
Konoe Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Application granted granted Critical
Publication of CA993253A publication Critical patent/CA993253A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CA179,914A 1972-09-06 1973-08-29 Photosensitive composition Expired CA993253A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8932672A JPS515936B2 (forum.php) 1972-09-06 1972-09-06

Publications (1)

Publication Number Publication Date
CA993253A true CA993253A (en) 1976-07-20

Family

ID=13967532

Family Applications (1)

Application Number Title Priority Date Filing Date
CA179,914A Expired CA993253A (en) 1972-09-06 1973-08-29 Photosensitive composition

Country Status (7)

Country Link
JP (1) JPS515936B2 (forum.php)
CA (1) CA993253A (forum.php)
DE (1) DE2345095A1 (forum.php)
FR (1) FR2198171A1 (forum.php)
GB (1) GB1449157A (forum.php)
IT (1) IT995284B (forum.php)
NL (1) NL7311904A (forum.php)

Also Published As

Publication number Publication date
GB1449157A (en) 1976-09-15
NL7311904A (forum.php) 1974-03-08
JPS4946428A (forum.php) 1974-05-04
JPS515936B2 (forum.php) 1976-02-24
IT995284B (it) 1975-11-10
FR2198171A1 (forum.php) 1974-03-29
DE2345095A1 (de) 1974-03-14

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