CA943391A - Increasing the light sensitivity of polymeric compositions comprising azido groups - Google Patents
Increasing the light sensitivity of polymeric compositions comprising azido groupsInfo
- Publication number
- CA943391A CA943391A CA098,869A CA98869A CA943391A CA 943391 A CA943391 A CA 943391A CA 98869 A CA98869 A CA 98869A CA 943391 A CA943391 A CA 943391A
- Authority
- CA
- Canada
- Prior art keywords
- increasing
- light sensitivity
- polymeric compositions
- azido groups
- azido
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D263/00—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
- C07D263/02—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings
- C07D263/30—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D263/32—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5046—Amines heterocyclic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Polyamides (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB6270969 | 1969-12-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA943391A true CA943391A (en) | 1974-03-12 |
Family
ID=10488409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA098,869A Expired CA943391A (en) | 1969-12-23 | 1970-11-23 | Increasing the light sensitivity of polymeric compositions comprising azido groups |
Country Status (8)
Country | Link |
---|---|
US (1) | US3721566A (xx) |
JP (1) | JPS493042B1 (xx) |
BE (1) | BE759079A (xx) |
CA (1) | CA943391A (xx) |
CH (1) | CH569987A5 (xx) |
DE (1) | DE2058345A1 (xx) |
FR (1) | FR2072275A5 (xx) |
GB (1) | GB1333560A (xx) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3887379A (en) * | 1972-03-30 | 1975-06-03 | Ibm | Photoresist azide sensitizer composition |
JPS515935B2 (xx) * | 1972-04-17 | 1976-02-24 | ||
US3947337A (en) * | 1973-05-10 | 1976-03-30 | The Upjohn Company | α,ω-Diarylpolyene photosensitizers for sulfonylazide polymers |
US4086090A (en) * | 1973-07-25 | 1978-04-25 | Hitachi, Ltd. | Formation of pattern using acrylamide-diacetoneacrylamide copolymer |
JPS51149021A (en) * | 1974-12-28 | 1976-12-21 | Fuji Yakuhin Kogyo Kk | Water soluble photosensitive resin composition |
US4062686A (en) * | 1976-04-21 | 1977-12-13 | Eastman Kodak Company | Sensitizers for photocrosslinkable polymers |
JPS56141321A (en) * | 1980-04-08 | 1981-11-05 | Mitsubishi Gas Chem Co Inc | Photosetting resin composition |
US4622284A (en) * | 1984-03-01 | 1986-11-11 | Digital Recording Corporation | Process of using metal azide recording media with laser |
US4666824A (en) * | 1984-04-23 | 1987-05-19 | Hercules Incorporated | Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides |
US4563413A (en) * | 1984-04-23 | 1986-01-07 | Hercules Incorporated | Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides |
JPS61166542A (ja) * | 1985-01-18 | 1986-07-28 | Hitachi Chem Co Ltd | 感光性組成物 |
EP0402718B1 (en) * | 1989-06-03 | 1994-11-02 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Control of cell arrangement |
-
0
- BE BE759079D patent/BE759079A/nl unknown
-
1969
- 1969-12-23 GB GB6270969A patent/GB1333560A/en not_active Expired
-
1970
- 1970-07-06 US US00052690A patent/US3721566A/en not_active Expired - Lifetime
- 1970-11-18 CH CH1701170A patent/CH569987A5/xx not_active IP Right Cessation
- 1970-11-20 FR FR7042057A patent/FR2072275A5/fr not_active Expired
- 1970-11-23 CA CA098,869A patent/CA943391A/en not_active Expired
- 1970-11-27 DE DE19702058345 patent/DE2058345A1/de active Pending
- 1970-12-07 JP JP45108410A patent/JPS493042B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CH569987A5 (xx) | 1975-11-28 |
JPS493042B1 (xx) | 1974-01-24 |
GB1333560A (en) | 1973-10-10 |
US3721566A (en) | 1973-03-20 |
FR2072275A5 (xx) | 1971-09-24 |
DE2058345A1 (de) | 1971-07-01 |
BE759079A (nl) | 1971-05-18 |
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