CA941222A - Polyvinylcarbazole photographic systems - Google Patents

Polyvinylcarbazole photographic systems

Info

Publication number
CA941222A
CA941222A CA105,516A CA105516A CA941222A CA 941222 A CA941222 A CA 941222A CA 105516 A CA105516 A CA 105516A CA 941222 A CA941222 A CA 941222A
Authority
CA
Canada
Prior art keywords
polyvinylcarbazole
photographic systems
photographic
systems
polyvinylcarbazole photographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA105,516A
Other versions
CA105516S (en
Inventor
James M. Lewis
John E. Shirey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horizons Research Inc
Original Assignee
Horizons Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horizons Research Inc filed Critical Horizons Research Inc
Application granted granted Critical
Publication of CA941222A publication Critical patent/CA941222A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CA105,516A 1970-03-16 1971-02-16 Polyvinylcarbazole photographic systems Expired CA941222A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US2005270A 1970-03-16 1970-03-16
US2854870A 1970-04-14 1970-04-14
US2855870A 1970-04-14 1970-04-14

Publications (1)

Publication Number Publication Date
CA941222A true CA941222A (en) 1974-02-05

Family

ID=27361357

Family Applications (1)

Application Number Title Priority Date Filing Date
CA105,516A Expired CA941222A (en) 1970-03-16 1971-02-16 Polyvinylcarbazole photographic systems

Country Status (3)

Country Link
CA (1) CA941222A (en)
DE (1) DE2112416A1 (en)
GB (1) GB1314116A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107406383A (en) * 2015-03-13 2017-11-28 三菱瓦斯化学株式会社 Compound, resin, lower layer film for lithography form material, lower layer film for lithography forms the purification process for using composition, lower layer film for lithography, pattern formation method and compound or resin

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107406383A (en) * 2015-03-13 2017-11-28 三菱瓦斯化学株式会社 Compound, resin, lower layer film for lithography form material, lower layer film for lithography forms the purification process for using composition, lower layer film for lithography, pattern formation method and compound or resin
CN107406383B (en) * 2015-03-13 2021-01-26 三菱瓦斯化学株式会社 Compound for lithography, resin, and underlayer film forming material

Also Published As

Publication number Publication date
DE2112416A1 (en) 1971-10-07
GB1314116A (en) 1973-04-18

Similar Documents

Publication Publication Date Title
AU2796571A (en) Photographic processing
CA925062A (en) Photographic enlarger
CA967417A (en) Photographic film unit
CA940358A (en) Photographic camera
CA957550A (en) Photographic elements
CA996389A (en) Photographic film unit
CA962880A (en) Photographic emulsions
CA941222A (en) Polyvinylcarbazole photographic systems
CA965289A (en) Photographic emulsions
CA920411A (en) Sensitized photoconductive member
CA944989A (en) Photographic film unit
CA857269A (en) Photographic systems
CA857270A (en) Photographic systems
CA847259A (en) Photographic development
AU456867B2 (en) Photographic film units
AU456866B2 (en) Photographic film units
AU473208B2 (en) Photographic systems
CA888115A (en) Photographic systems
CA1001470A (en) Photographic systems
CA936733A (en) Photographic masking system
CA834675A (en) Photographic element
CA835319A (en) Photographic element
CA964095A (en) Photographic element
CA847269A (en) Photographic element
CA835888A (en) Electrostatic photography systems