CA921175A - Microwave schottky barrier field effect transistor and method of preparation - Google Patents
Microwave schottky barrier field effect transistor and method of preparationInfo
- Publication number
- CA921175A CA921175A CA114014A CA114014A CA921175A CA 921175 A CA921175 A CA 921175A CA 114014 A CA114014 A CA 114014A CA 114014 A CA114014 A CA 114014A CA 921175 A CA921175 A CA 921175A
- Authority
- CA
- Canada
- Prior art keywords
- preparation
- field effect
- effect transistor
- schottky barrier
- barrier field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
- H01L21/28581—Deposition of Schottky electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5396970A | 1970-07-10 | 1970-07-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA921175A true CA921175A (en) | 1973-02-13 |
Family
ID=21987819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA114014A Expired CA921175A (en) | 1970-07-10 | 1971-05-27 | Microwave schottky barrier field effect transistor and method of preparation |
Country Status (3)
| Country | Link |
|---|---|
| CA (1) | CA921175A (en) |
| DE (1) | DE2133326A1 (en) |
| FR (1) | FR2098314A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2793658C1 (en) * | 2022-07-05 | 2023-04-04 | Акционерное общество "Научно-производственное предприятие "Исток" им. А.И. Шокина" (АО "НПП "Исток" им. Шокина") | Method for manufacturing microwave field transistor with a schottky barrier |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1155870B (en) * | 1978-03-09 | 1987-01-28 | Selenia Ind Elettroniche | IMPROVEMENT IN PROCEDURES FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES |
| JPS5667974A (en) * | 1979-10-26 | 1981-06-08 | Ibm | Method of manufacturing semiconductor device |
-
1971
- 1971-05-27 CA CA114014A patent/CA921175A/en not_active Expired
- 1971-07-05 DE DE19712133326 patent/DE2133326A1/en active Pending
- 1971-07-09 FR FR7125240A patent/FR2098314A1/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2793658C1 (en) * | 2022-07-05 | 2023-04-04 | Акционерное общество "Научно-производственное предприятие "Исток" им. А.И. Шокина" (АО "НПП "Исток" им. Шокина") | Method for manufacturing microwave field transistor with a schottky barrier |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2098314B1 (en) | 1974-04-05 |
| FR2098314A1 (en) | 1972-03-10 |
| DE2133326A1 (en) | 1972-01-20 |
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