CA738393A - Sputtering mask - Google Patents

Sputtering mask

Info

Publication number
CA738393A
CA738393A CA738393A CA738393DA CA738393A CA 738393 A CA738393 A CA 738393A CA 738393 A CA738393 A CA 738393A CA 738393D A CA738393D A CA 738393DA CA 738393 A CA738393 A CA 738393A
Authority
CA
Canada
Prior art keywords
sputtering mask
sputtering
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA738393A
Inventor
W. Gow Gordon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Ltd
Original Assignee
Nortel Networks Ltd
Publication date
Application granted granted Critical
Publication of CA738393A publication Critical patent/CA738393A/en
Expired legal-status Critical Current

Links

CA738393A Sputtering mask Expired CA738393A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA738393T

Publications (1)

Publication Number Publication Date
CA738393A true CA738393A (en) 1966-07-12

Family

ID=36136536

Family Applications (1)

Application Number Title Priority Date Filing Date
CA738393A Expired CA738393A (en) Sputtering mask

Country Status (1)

Country Link
CA (1) CA738393A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4024041A (en) * 1974-12-18 1977-05-17 Hitachi, Ltd. Method of forming deposition films for use in multi-layer metallization
US4416759A (en) * 1981-11-27 1983-11-22 Varian Associates, Inc. Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers
US5223108A (en) * 1991-12-30 1993-06-29 Materials Research Corporation Extended lifetime collimator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4024041A (en) * 1974-12-18 1977-05-17 Hitachi, Ltd. Method of forming deposition films for use in multi-layer metallization
US4416759A (en) * 1981-11-27 1983-11-22 Varian Associates, Inc. Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers
US5223108A (en) * 1991-12-30 1993-06-29 Materials Research Corporation Extended lifetime collimator

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