CA558215A - Resines de phenol-aldehyde - Google Patents

Resines de phenol-aldehyde

Info

Publication number
CA558215A
CA558215A CA558215A CA558215DA CA558215A CA 558215 A CA558215 A CA 558215A CA 558215 A CA558215 A CA 558215A CA 558215D A CA558215D A CA 558215DA CA 558215 A CA558215 A CA 558215A
Authority
CA
Canada
Prior art keywords
phenol
aldehyde resins
aldehyde
resins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA558215A
Other languages
English (en)
Inventor
H. W. Turner John
R. Anthony Leonard
L. Bramwyche Peter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Distillers Co Ltd
Original Assignee
Distillers Co Ltd
Publication date
Application granted granted Critical
Publication of CA558215A publication Critical patent/CA558215A/fr
Expired legal-status Critical Current

Links

CA558215A Resines de phenol-aldehyde Expired CA558215A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA558215T

Publications (1)

Publication Number Publication Date
CA558215A true CA558215A (fr) 1958-06-03

Family

ID=35724623

Family Applications (1)

Application Number Title Priority Date Filing Date
CA558215A Expired CA558215A (fr) Resines de phenol-aldehyde

Country Status (1)

Country Link
CA (1) CA558215A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins

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