CA2999365A1 - Device for uv irradiation of a flowing medium - Google Patents
Device for uv irradiation of a flowing medium Download PDFInfo
- Publication number
- CA2999365A1 CA2999365A1 CA2999365A CA2999365A CA2999365A1 CA 2999365 A1 CA2999365 A1 CA 2999365A1 CA 2999365 A CA2999365 A CA 2999365A CA 2999365 A CA2999365 A CA 2999365A CA 2999365 A1 CA2999365 A1 CA 2999365A1
- Authority
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- Canada
- Prior art keywords
- lamp
- guide tube
- interference filter
- tube
- wavelength range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 title claims abstract description 5
- 230000005855 radiation Effects 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 230000000249 desinfective effect Effects 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 5
- 230000003595 spectral effect Effects 0.000 claims description 4
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000005240 physical vapour deposition Methods 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
- 229910052905 tridymite Inorganic materials 0.000 claims description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 6
- 230000005791 algae growth Effects 0.000 description 4
- 241000195493 Cryptophyta Species 0.000 description 3
- 230000001954 sterilising effect Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003651 drinking water Substances 0.000 description 2
- 235000020188 drinking water Nutrition 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 230000012010 growth Effects 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002779 inactivation Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000029553 photosynthesis Effects 0.000 description 1
- 238000010672 photosynthesis Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/38—Devices for influencing the colour or wavelength of the light
- H01J61/40—Devices for influencing the colour or wavelength of the light by light filters; by coloured coatings in or on the envelope
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/70—Lamps with low-pressure unconstricted discharge having a cold pressure < 400 Torr
- H01J61/72—Lamps with low-pressure unconstricted discharge having a cold pressure < 400 Torr having a main light-emitting filling of easily vaporisable metal vapour, e.g. mercury
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/20—Prevention of biofouling
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physical Water Treatments (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
The invention relates to a device for UV-irradiation of a flowing medium, particularly for disinfecting water, comprising a gas discharge lamp (20) that has a lamp tube (22) and emits UV radiation and longwave light, and a guide tube (18) which guides the flowing medium and separates it from said lamp tube (22). According to the invention, the guide tube (18) and/or the lamp tube (22) is coated on the outer face with an interference filter (28) that lets UV radiation in a first wavelength range through but not light in a second wavelength range.
Description
Device for UV Irradiation of a Flowing Medium Description The invention relates to a device for UV-irradiation of a flowing medium, in particular for disinfecting of water, with a UV radiation and longer-wavelength (visible) light emitting gas discharge lamp having a lamp tube and a guide tube guiding the flowing medium and separating it from the lamp tube.
DE-A 10 201 1 102 687 discloses a device for monitoring and controlling water disinfection systems with at least one broadband UV emitter arranged in a channel, which is arranged in a UV-transmissive cladding tube and thus has no direct contact with the water. In order to reliably achieve a predetermined sterilization performance, a control device is proposed comprising a sensor with a maximum sensitivity to UV radiation in a wavelength range between 200 nm and 240 nm. The promotion of algae growth in such water disinfection systems at some distance from the UV
emitter has proven to be problematic.
Proceeding from this, the object of the invention is to further develop the devices known in the prior art and to provide measures whereby a targeted UV treatment of a flowing medium without disadvantageous effects becomes possible, in particular with avoidance of algae formation. In addition to drinking water treatment, other flowing media come into consideration, such as flowable food (drinks) that can be sterilized under the influence of UV
radiation.
To solve this problem the feature combination specified in claim 1 is proposed. Advantageous embodiments and modifications of the invention will become apparent from the dependent claims.
DE-A 10 201 1 102 687 discloses a device for monitoring and controlling water disinfection systems with at least one broadband UV emitter arranged in a channel, which is arranged in a UV-transmissive cladding tube and thus has no direct contact with the water. In order to reliably achieve a predetermined sterilization performance, a control device is proposed comprising a sensor with a maximum sensitivity to UV radiation in a wavelength range between 200 nm and 240 nm. The promotion of algae growth in such water disinfection systems at some distance from the UV
emitter has proven to be problematic.
Proceeding from this, the object of the invention is to further develop the devices known in the prior art and to provide measures whereby a targeted UV treatment of a flowing medium without disadvantageous effects becomes possible, in particular with avoidance of algae formation. In addition to drinking water treatment, other flowing media come into consideration, such as flowable food (drinks) that can be sterilized under the influence of UV
radiation.
To solve this problem the feature combination specified in claim 1 is proposed. Advantageous embodiments and modifications of the invention will become apparent from the dependent claims.
- 2 -The invention is based on the idea of optimizing the ratio of sterilizing UV
radiation and emitted longer-wavelength light with a view to suppression of algae growth. Accordingly, the invention proposes that an interference filter, which is transmissive for UV radiation in a first wavelength range and impermeable to longer-wavelength or visible light in a second wavelength range, be arranged between the lamp tube and the flow path. These measures are based on the finding that the ratio of the proportion of visible light and UV radiation increases with increasing distance from the UV emitter in a water-based medium due to its UV-absorbing and light-conducting property. As a result, the visible light that promotes algae growth in a flow path goes much further than the sterilizing and algae-reducing UV radiation.
By suppressing the visible light by means of the interference filter, such adverse effects can be avoided without the need to dispense with the use of high intensity and efficiency gas discharge lamps. Thereby, it is also possible to maintain existing flow paths without introducing shields or deflectors, which are also disadvantageous with regard to an additional pumping capacity.
Another advantage of the filter coating can be that the surface homogeneity is improved, so that possibly fewer impurities penetrate and the susceptibility to contamination is reduced.
Also in terms of manufacturing technology, it is advantageous if the guide tube and/or the lamp tube is provided on the jacket side with a coating forming the interference filter. In principle, other configurations are possible, for example, the use of an intermediate tube as a substrate for the interference filter.
It is also conceivable that a plurality of UV emitters are distributed over the circumference of the guide tube, or that the lamp tube has a double-walled annular cross section, in the interior of which the guide tube is arranged.
A further improvement provides that the interference filter is applied as a PVD coating, in particular by sputter deposition.
radiation and emitted longer-wavelength light with a view to suppression of algae growth. Accordingly, the invention proposes that an interference filter, which is transmissive for UV radiation in a first wavelength range and impermeable to longer-wavelength or visible light in a second wavelength range, be arranged between the lamp tube and the flow path. These measures are based on the finding that the ratio of the proportion of visible light and UV radiation increases with increasing distance from the UV emitter in a water-based medium due to its UV-absorbing and light-conducting property. As a result, the visible light that promotes algae growth in a flow path goes much further than the sterilizing and algae-reducing UV radiation.
By suppressing the visible light by means of the interference filter, such adverse effects can be avoided without the need to dispense with the use of high intensity and efficiency gas discharge lamps. Thereby, it is also possible to maintain existing flow paths without introducing shields or deflectors, which are also disadvantageous with regard to an additional pumping capacity.
Another advantage of the filter coating can be that the surface homogeneity is improved, so that possibly fewer impurities penetrate and the susceptibility to contamination is reduced.
Also in terms of manufacturing technology, it is advantageous if the guide tube and/or the lamp tube is provided on the jacket side with a coating forming the interference filter. In principle, other configurations are possible, for example, the use of an intermediate tube as a substrate for the interference filter.
It is also conceivable that a plurality of UV emitters are distributed over the circumference of the guide tube, or that the lamp tube has a double-walled annular cross section, in the interior of which the guide tube is arranged.
A further improvement provides that the interference filter is applied as a PVD coating, in particular by sputter deposition.
- 3 -For the media guide, it is advantageous if the guide tube flows around the outside and the lamp tube is arranged in the guide tube, or if the guide tube flows through the inside and the lamp tube is arranged outside of the guide tube.
Advantageously, the interference filter reflects the light emitted by the UV
gas discharge lamp in the second wavelength range, wherein by back reflection into the lamp tube, the plasma can absorb a significant portion of the radiation while increasing the lamp yield, without causing further reflections.
In order to achieve the desired filter quality in a broad spectral range, it is advantageous if the interference filter is formed by a plurality of superimposed optical thin films, preferably more than 10 thin films. As a result, radiation with different angles of incidence can also be effectively filtered.
In this context, it is also advantageous if the interference filter comprises a multilayer stack alternately consisting of Hf02 and Si02 layers, wherein the layer thicknesses are in the range of 50 nm to 140 nm.
A particularly preferred embodiment provides that the first wavelength range is between 240 nm and 360 nm, in particular between 240 nm and 340 nm.
Due to the short-wave band edge, chemical effects that lead to unwanted disinfection by-products can be avoided The long-wave band edge ensures that the desired disinfecting effect is impaired as little as possible.
A further improvement provides that the interference filter in the first wavelength range transmits more than 80%, preferably more than 90% of the radiation, so that the lamp power is used as effectively as possible.
Advantageously, the interference filter reflects the light emitted by the UV
gas discharge lamp in the second wavelength range, wherein by back reflection into the lamp tube, the plasma can absorb a significant portion of the radiation while increasing the lamp yield, without causing further reflections.
In order to achieve the desired filter quality in a broad spectral range, it is advantageous if the interference filter is formed by a plurality of superimposed optical thin films, preferably more than 10 thin films. As a result, radiation with different angles of incidence can also be effectively filtered.
In this context, it is also advantageous if the interference filter comprises a multilayer stack alternately consisting of Hf02 and Si02 layers, wherein the layer thicknesses are in the range of 50 nm to 140 nm.
A particularly preferred embodiment provides that the first wavelength range is between 240 nm and 360 nm, in particular between 240 nm and 340 nm.
Due to the short-wave band edge, chemical effects that lead to unwanted disinfection by-products can be avoided The long-wave band edge ensures that the desired disinfecting effect is impaired as little as possible.
A further improvement provides that the interference filter in the first wavelength range transmits more than 80%, preferably more than 90% of the radiation, so that the lamp power is used as effectively as possible.
- 4 -Advantageously, the second wavelength range comprises at least the spectral range between 380 nm and 580 nm, so that the effective spectrum of photosynthesis is limited to broadband.
In this context, it is also advantageous if the interference filter in the second wavelength range has an (integral) light transmittance of less than 30%, preferably less than 20% and particularly preferably less than 10%.
In order to be able to provide the desired UV radiation with high intensity, it is advantageous if the UV gas discharge lamp is formed by a mercury vapor lamp which is designed as a medium-pressure lamp and is preferably operable with an electrical connection power of more than 1 kW.
For special applications, it may also be advantageous that the UV gas discharge lamp is formed by a mercury vapor lamp configured as a low-pressure lamp.
For the required UV transmission and temperature stability, it is advantageous if the guide tube consists of a quartz glass material.
In view of the most effective adaptation to existing flow paths, it is possible that the guide tube is arranged transversely or longitudinally to the flow direction of the medium to be irradiated.
Especially for the treatment of drinking water, it is advantageous if the guide tube is arranged in a stainless steel flow-through reactor having an inlet and an outlet for the medium. Retention of visible light avoids far-reaching reflections on the inner wall of the stainless steel reactor, which could otherwise lead to widespread algae growth.
In the following the invention will be explained in more detail with reference to the exemplary embodiments shown schematically in the drawing. Wherein:
In this context, it is also advantageous if the interference filter in the second wavelength range has an (integral) light transmittance of less than 30%, preferably less than 20% and particularly preferably less than 10%.
In order to be able to provide the desired UV radiation with high intensity, it is advantageous if the UV gas discharge lamp is formed by a mercury vapor lamp which is designed as a medium-pressure lamp and is preferably operable with an electrical connection power of more than 1 kW.
For special applications, it may also be advantageous that the UV gas discharge lamp is formed by a mercury vapor lamp configured as a low-pressure lamp.
For the required UV transmission and temperature stability, it is advantageous if the guide tube consists of a quartz glass material.
In view of the most effective adaptation to existing flow paths, it is possible that the guide tube is arranged transversely or longitudinally to the flow direction of the medium to be irradiated.
Especially for the treatment of drinking water, it is advantageous if the guide tube is arranged in a stainless steel flow-through reactor having an inlet and an outlet for the medium. Retention of visible light avoids far-reaching reflections on the inner wall of the stainless steel reactor, which could otherwise lead to widespread algae growth.
In the following the invention will be explained in more detail with reference to the exemplary embodiments shown schematically in the drawing. Wherein:
- 5 -FIG. 1 shows a flow-through reactor for water disinfection containing a gas discharge lamp and a guide tube coated with an interference filter in an axial section;
FIG. 2 shows an alternative arrangement of the gas discharge lamp with surrounding guide tube in a flow-through reactor;
FIG. 3 shows a cross section of the gas discharge lamp with surrounding guide tube and a beam path in different wavelength ranges;
FIG. 4 shows the spectral profile of the transmission of the interference filter.
The flow-through reactor 1 shown in Fig. 1 is used for water disinfection by means of UV radiation while avoiding algae formation. In this case, the water 10 to be treated flows through a stainless steel tube 12, which has an inlet and an outlet 16. The stainless steel tube 12 contains a guide tube 18 and a gas discharge lamp 20. The guide tube 18 is externally surrounded by the water to be treated, while a lamp tube 22 of the gas discharge lamp 20 is arranged concentrically or possibly axially parallel in the guide tube 18. The electrodes 24, 26 of the double-ended gas discharge lamp 20 can be connected via end openings of the guide tube 18 with an electronic ballast, not shown.
The gas discharge lamp 20 is designed as a mercury vapor lamp with an electrical connection power of more than 1 kW. During operation, in the quartz glass lamp tube 22 there is a gas discharge with the emission of UV
radiation and longer-wave (visible) light. While UV radiation leads to inactivation of microorganisms in the water to be treated, visible light promotes the growth of algae. To avoid the latter, the guide tube 18 is coated on its outer jacket with an interference filter 28 which is transmissive for UV
radiation in a first wavelength range (passband) and which is impervious to longer wavelength or visible light in a second wavelength range (stopband).
The first wavelength range expediently lies between 240 nm and 360 nm, in
FIG. 2 shows an alternative arrangement of the gas discharge lamp with surrounding guide tube in a flow-through reactor;
FIG. 3 shows a cross section of the gas discharge lamp with surrounding guide tube and a beam path in different wavelength ranges;
FIG. 4 shows the spectral profile of the transmission of the interference filter.
The flow-through reactor 1 shown in Fig. 1 is used for water disinfection by means of UV radiation while avoiding algae formation. In this case, the water 10 to be treated flows through a stainless steel tube 12, which has an inlet and an outlet 16. The stainless steel tube 12 contains a guide tube 18 and a gas discharge lamp 20. The guide tube 18 is externally surrounded by the water to be treated, while a lamp tube 22 of the gas discharge lamp 20 is arranged concentrically or possibly axially parallel in the guide tube 18. The electrodes 24, 26 of the double-ended gas discharge lamp 20 can be connected via end openings of the guide tube 18 with an electronic ballast, not shown.
The gas discharge lamp 20 is designed as a mercury vapor lamp with an electrical connection power of more than 1 kW. During operation, in the quartz glass lamp tube 22 there is a gas discharge with the emission of UV
radiation and longer-wave (visible) light. While UV radiation leads to inactivation of microorganisms in the water to be treated, visible light promotes the growth of algae. To avoid the latter, the guide tube 18 is coated on its outer jacket with an interference filter 28 which is transmissive for UV
radiation in a first wavelength range (passband) and which is impervious to longer wavelength or visible light in a second wavelength range (stopband).
The first wavelength range expediently lies between 240 nm and 360 nm, in
- 6 -particular between 240 nm and 340 nm, while the second wavelength range covers at least the range between 380 nm and 580 nm.
In the embodiment of a flow-through reactor 10 shown in FIG. 2, the same or similar parts are provided with the same reference numerals as described above. This embodiment differs essentially in that the guide tube 18 and the gas discharge lamp 20 located therein are arranged transversely to the flow direction of the water to be treated. In order to make this possible, the water-bearing stainless steel tube 12 has in its central region lateral connecting pieces 30 for a transverse penetration of the guide tube 18.
As illustrated in FIG. 3, the interference filter 28 applied to the outer jacket of the guide tube 18 over its full circumference, consisting of a quartz glass material 32, is transmissive for UV radiation 34, while the visible light 36 emitted by the gas discharge lamp 20 is reflected back into the lamp tube 22 and there is at least partially absorbed in the generated plasma. In order to keep the hot lamp tube 22 clear, a free intermediate space 38 is provided inside the guide tube 18.
The interference filter 28 may be applied to the quartz glass substrate 32 in layers by sputter deposition. In this case, a multilayer stack of, for example, 70 thin layers is formed which alternately consist of hafnium and silicon dioxide and have a layer thickness which is suitable for the desired multiple interference and is in each case in a range from 50 nm to 140 nm.
FIG. 4 shows a filter curve of such an interference filter 28, the transmittance T being plotted against the rising wavelength of the unpolarized electromagnetic radiation incident at an angle of incidence of 00. In the first wavelength range 40 (240 nm-360 nm), more than 90% of the UV radiation is transmitted, that is, transmitted through the interference filter 28. In the second wavelength range 42 (380 nm-580 nm), significantly less than 10% of the light is transmitted in an integral manner, whereby only two narrow
In the embodiment of a flow-through reactor 10 shown in FIG. 2, the same or similar parts are provided with the same reference numerals as described above. This embodiment differs essentially in that the guide tube 18 and the gas discharge lamp 20 located therein are arranged transversely to the flow direction of the water to be treated. In order to make this possible, the water-bearing stainless steel tube 12 has in its central region lateral connecting pieces 30 for a transverse penetration of the guide tube 18.
As illustrated in FIG. 3, the interference filter 28 applied to the outer jacket of the guide tube 18 over its full circumference, consisting of a quartz glass material 32, is transmissive for UV radiation 34, while the visible light 36 emitted by the gas discharge lamp 20 is reflected back into the lamp tube 22 and there is at least partially absorbed in the generated plasma. In order to keep the hot lamp tube 22 clear, a free intermediate space 38 is provided inside the guide tube 18.
The interference filter 28 may be applied to the quartz glass substrate 32 in layers by sputter deposition. In this case, a multilayer stack of, for example, 70 thin layers is formed which alternately consist of hafnium and silicon dioxide and have a layer thickness which is suitable for the desired multiple interference and is in each case in a range from 50 nm to 140 nm.
FIG. 4 shows a filter curve of such an interference filter 28, the transmittance T being plotted against the rising wavelength of the unpolarized electromagnetic radiation incident at an angle of incidence of 00. In the first wavelength range 40 (240 nm-360 nm), more than 90% of the UV radiation is transmitted, that is, transmitted through the interference filter 28. In the second wavelength range 42 (380 nm-580 nm), significantly less than 10% of the light is transmitted in an integral manner, whereby only two narrow
- 7 -mercury lines are less strongly suppressed. This light is largely reflected, so that in addition radiation power is introduced into the plasma of the gas discharge lamp 20.
Claims (17)
1. Device for UV irradiation of a flowing medium, in particular for disinfecting water, with a UV radiation and visible light-emitting gas discharge lamp (20) having a lamp tube (22) and a guide tube (18) guiding the flowing medium in a flow path and separating it from the lamp tube (22), characterized in that an interference filter that is transmissive for UV radiation in a first wavelength range and is impervious for light in a second wavelength range is arranged between the lamp tube (22) and the flow path.
2. The device according to claim 1, characterized in that the guide tube (18) and/or the lamp tube (22) is provided on the jacket side with a coating forming the interference filter (28).
3. The device according to claim 1 or 2, characterized in that the interference filter (28) is applied as a PVD coating, especially by sputter deposition.
4. The device according to one of claims 1 to 3, characterized in that the guide tube (18) flows around the outside, and the lamp tube (22) is arranged in the guide tube (18) or the guide tube (18) flows through the inside and the lamp tube (22) is arranged on the outside of the guide tube (18).
5. The device according to one of claims 1 to 4, characterized in that the interference filter (28) preferably reflects the light radiated by the UV
gas discharge lamp (20) in the second wavelength range back into the lamp tube (22).
gas discharge lamp (20) in the second wavelength range back into the lamp tube (22).
6. The device according to one of claims 1 to 5, characterized in that the plasma generated in the UV gas discharge lamp (20) absorbs the light reflected by the interference filter (28).
7. The device according to one of claims 1 to 6, characterized in that the interference filter (28) is formed by a plurality of superimposed optical thin films, preferably more than 10.
8. The device according to one of claims 1 to 7, characterized in that the interference filter (28) comprises a multilayer stack alternately consisting of HfO2 and SiO2 layers, wherein the layer thicknesses are in the range of 50 nm to 140 nm.
9. The device according to one of claims 1 to 8, characterized in that the first wavelength range is between 240 nm and 360 nm, in particular between 240 nm and 340 nm.
10. The device according to one of claims 1 to 9, characterized in that the interference filter (28) in the first wavelength range transmits more than 80%, preferably more than 90%, of the radiation.
11. The device according to one of claims 1 to 10, characterized in that the second wavelength range comprises at least the spectral range between 380 nm and 580 nm.
12. The device according to one of claims 1 to 11, characterized in that the interference filter (28) in the second wavelength range has a light transmittance of less than 30%, preferably less than 20%, and especially preferably less than 10%.
13. The device according to one of claims 1 to 12, characterized in that the UV gas discharge lamp (20) is formed by a mercury vapor lamp designed as a medium-pressure lamp and is preferably operable with an electrical connection power of more than 1 kW.
14. The device according to one of claims 1 to 13, characterized in that the UV gas discharge lamp (20) is formed by a mercury vapor lamp formed as a low-pressure lamp.
15. The device according to one of claims 1 to 14, characterized in that the guide tube (18) consists of a quartz glass material.
16. The device according to one of claims 1 to 15, characterized in that the guide tube (18) is arranged transversely or longitudinally to the flow direction of the medium to be irradiated.
17. The device according to one of claims 1 to 16, characterized in that the guide tube (18) is arranged in a stainless steel flow-through reactor (12) having an inlet and an outlet for the medium.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102015218053.0 | 2015-09-21 | ||
DE102015218053.0A DE102015218053A1 (en) | 2015-09-21 | 2015-09-21 | Device for UV irradiation of a flowing medium |
PCT/EP2016/071984 WO2017050656A1 (en) | 2015-09-21 | 2016-09-16 | Device for uv-irradiation of a flowing medium |
Publications (1)
Publication Number | Publication Date |
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CA2999365A1 true CA2999365A1 (en) | 2017-03-30 |
Family
ID=56940057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA2999365A Abandoned CA2999365A1 (en) | 2015-09-21 | 2016-09-16 | Device for uv irradiation of a flowing medium |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP3353118A1 (en) |
CN (1) | CN108349756A (en) |
CA (1) | CA2999365A1 (en) |
DE (1) | DE102015218053A1 (en) |
WO (1) | WO2017050656A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2549114A (en) * | 2016-04-05 | 2017-10-11 | Alpha-Cure Ltd | UV steriliser assembley and method for constructing same |
DE102017104273A1 (en) | 2017-03-01 | 2018-09-06 | Eta Plus Electronic Gmbh | Device for UV irradiation of a flowing medium |
DE202017107543U1 (en) * | 2017-12-12 | 2018-12-18 | Hermann Einberger Gmbh | A pneumatic conveyor |
CN108502970A (en) * | 2018-05-02 | 2018-09-07 | 清华大学深圳研究生院 | A kind of integrated ultraviolet irradiation algal-inhibition device |
CN113908305A (en) * | 2021-09-30 | 2022-01-11 | 余建军 | Preparation method of short-wave light source suitable for sterilization and disinfection under human condition |
DE102022105112A1 (en) | 2022-03-04 | 2023-09-07 | Vaillant Gmbh | Method for disinfecting a volume flow of water, filter unit, computer program, regulating and control unit and arrangement for providing hot water |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4212604A1 (en) * | 1992-04-15 | 1993-10-21 | Ultra Systems Gmbh Uv Oxidatio | Treating drinking water contg. organic substances esp. pesticides |
JP3302247B2 (en) * | 1996-02-20 | 2002-07-15 | 株式会社クボタ | UV sterilizer |
JP2002025503A (en) * | 2000-07-07 | 2002-01-25 | Nippon Photo Science:Kk | Treatment device utilizing ultraviolet rays |
US6587264B2 (en) * | 2001-01-18 | 2003-07-01 | Thermo Corion Corporation | Selectively tuned ultraviolet optical filters and methods of use thereof |
CN2521209Y (en) * | 2002-02-07 | 2002-11-20 | 吴涛 | Water purifier |
IL157229A (en) * | 2003-08-04 | 2006-08-20 | Zamir Tribelsky | Method for energy coupling especially useful for disinfecting and various systems using it |
TWI245163B (en) * | 2003-08-29 | 2005-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE102011102687A1 (en) | 2011-05-20 | 2012-11-22 | XYLEM IP Holding LLC | Control for a UV disinfection system with broadband UV lamps |
CN202816869U (en) * | 2012-07-12 | 2013-03-20 | 飞利浦电子技术(上海)有限公司 | Gas discharge lamp |
WO2015031492A1 (en) * | 2013-08-29 | 2015-03-05 | 3M Innovative Properties Company | Water purification apparatuses using filters and ultraviolet radiation |
-
2015
- 2015-09-21 DE DE102015218053.0A patent/DE102015218053A1/en not_active Withdrawn
-
2016
- 2016-09-16 WO PCT/EP2016/071984 patent/WO2017050656A1/en active Application Filing
- 2016-09-16 CA CA2999365A patent/CA2999365A1/en not_active Abandoned
- 2016-09-16 CN CN201680054912.4A patent/CN108349756A/en active Pending
- 2016-09-16 EP EP16766552.0A patent/EP3353118A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP3353118A1 (en) | 2018-08-01 |
WO2017050656A1 (en) | 2017-03-30 |
CN108349756A (en) | 2018-07-31 |
DE102015218053A1 (en) | 2017-03-23 |
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