CA2798002A1 - Process for the preparation of chiral triazolones - Google Patents
Process for the preparation of chiral triazolones Download PDFInfo
- Publication number
- CA2798002A1 CA2798002A1 CA2798002A CA2798002A CA2798002A1 CA 2798002 A1 CA2798002 A1 CA 2798002A1 CA 2798002 A CA2798002 A CA 2798002A CA 2798002 A CA2798002 A CA 2798002A CA 2798002 A1 CA2798002 A1 CA 2798002A1
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- Prior art keywords
- compound
- formula
- solvent
- carbon atoms
- group
- Prior art date
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- Granted
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- 238000000034 method Methods 0.000 title claims abstract description 133
- 230000008569 process Effects 0.000 title claims abstract description 116
- 238000002360 preparation method Methods 0.000 title claims abstract description 58
- 150000001875 compounds Chemical class 0.000 claims abstract description 513
- 239000002904 solvent Substances 0.000 claims abstract description 151
- 239000011541 reaction mixture Substances 0.000 claims abstract description 55
- RAGOYPUPXAKGKH-XAKZXMRKSA-N posaconazole Chemical compound O=C1N([C@H]([C@H](C)O)CC)N=CN1C1=CC=C(N2CCN(CC2)C=2C=CC(OC[C@H]3C[C@@](CN4N=CN=C4)(OC3)C=3C(=CC(F)=CC=3)F)=CC=2)C=C1 RAGOYPUPXAKGKH-XAKZXMRKSA-N 0.000 claims abstract description 33
- 229960001589 posaconazole Drugs 0.000 claims abstract description 31
- 238000002156 mixing Methods 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims description 139
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 138
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 117
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 81
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 69
- 125000004432 carbon atom Chemical group C* 0.000 claims description 65
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 64
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 61
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 56
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 54
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 54
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 45
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 42
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 42
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 39
- 125000003118 aryl group Chemical group 0.000 claims description 39
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 36
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 32
- 239000003795 chemical substances by application Substances 0.000 claims description 31
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 29
- 239000002585 base Substances 0.000 claims description 26
- 150000003839 salts Chemical class 0.000 claims description 26
- 125000000217 alkyl group Chemical group 0.000 claims description 25
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 24
- 238000010438 heat treatment Methods 0.000 claims description 24
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 claims description 20
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 19
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 19
- 229940121375 antifungal agent Drugs 0.000 claims description 19
- 239000013078 crystal Substances 0.000 claims description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 18
- 239000003429 antifungal agent Substances 0.000 claims description 17
- 229960004592 isopropanol Drugs 0.000 claims description 17
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 claims description 16
- 229940011051 isopropyl acetate Drugs 0.000 claims description 16
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 claims description 16
- 238000002425 crystallisation Methods 0.000 claims description 15
- 230000008025 crystallization Effects 0.000 claims description 15
- 150000002148 esters Chemical class 0.000 claims description 15
- 229940093499 ethyl acetate Drugs 0.000 claims description 15
- 235000019439 ethyl acetate Nutrition 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 15
- 125000003107 substituted aryl group Chemical group 0.000 claims description 15
- 239000002253 acid Substances 0.000 claims description 14
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 14
- 239000007864 aqueous solution Substances 0.000 claims description 13
- 239000008194 pharmaceutical composition Substances 0.000 claims description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 12
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 12
- -1 alkaline earth metal carbonate Chemical class 0.000 claims description 12
- NDVMCQUOSYOQMZ-UHFFFAOYSA-N 2,2-bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)C(C(N)=O)[Si](C)(C)C NDVMCQUOSYOQMZ-UHFFFAOYSA-N 0.000 claims description 11
- 206010017533 Fungal infection Diseases 0.000 claims description 11
- 208000031888 Mycoses Diseases 0.000 claims description 11
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 claims description 11
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 10
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 10
- 230000000269 nucleophilic effect Effects 0.000 claims description 10
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 9
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 9
- 229940043232 butyl acetate Drugs 0.000 claims description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 9
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 9
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 claims description 9
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 claims description 8
- 239000003054 catalyst Substances 0.000 claims description 8
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 8
- 229940043265 methyl isobutyl ketone Drugs 0.000 claims description 8
- 238000000746 purification Methods 0.000 claims description 8
- 241000124008 Mammalia Species 0.000 claims description 7
- 229910052783 alkali metal Inorganic materials 0.000 claims description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 7
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 6
- 150000001298 alcohols Chemical class 0.000 claims description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 6
- 208000015181 infectious disease Diseases 0.000 claims description 6
- 150000007522 mineralic acids Chemical class 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- NLRKCXQQSUWLCH-UHFFFAOYSA-N nitrosobenzene Chemical compound O=NC1=CC=CC=C1 NLRKCXQQSUWLCH-UHFFFAOYSA-N 0.000 claims description 6
- 238000000638 solvent extraction Methods 0.000 claims description 6
- 229910007161 Si(CH3)3 Inorganic materials 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 5
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 239000003814 drug Substances 0.000 claims description 5
- 125000002883 imidazolyl group Chemical group 0.000 claims description 5
- 150000007529 inorganic bases Chemical class 0.000 claims description 5
- 150000002576 ketones Chemical class 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 239000011260 aqueous acid Substances 0.000 claims description 4
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 claims description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 4
- 239000003880 polar aprotic solvent Substances 0.000 claims description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 150000002170 ethers Chemical class 0.000 claims description 3
- 238000005984 hydrogenation reaction Methods 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- ZXMKJJBVCQPHGU-UHFFFAOYSA-N 1-[2-(dimethylamino)ethyl]-3-phenylurea Chemical compound CN(C)CCNC(=O)NC1=CC=CC=C1 ZXMKJJBVCQPHGU-UHFFFAOYSA-N 0.000 claims description 2
- ONIBWKKTOPOVIA-SCSAIBSYSA-N D-Proline Chemical compound OC(=O)[C@H]1CCCN1 ONIBWKKTOPOVIA-SCSAIBSYSA-N 0.000 claims description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical class OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 2
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 238000011097 chromatography purification Methods 0.000 claims description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 2
- 150000003672 ureas Chemical class 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 1
- DEZRYPDIMOWBDS-UHFFFAOYSA-N dcm dichloromethane Chemical compound ClCCl.ClCCl DEZRYPDIMOWBDS-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 50
- 238000006243 chemical reaction Methods 0.000 description 39
- 239000000047 product Substances 0.000 description 35
- 150000003840 hydrochlorides Chemical class 0.000 description 30
- 239000007787 solid Substances 0.000 description 30
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 29
- 239000000725 suspension Substances 0.000 description 26
- 239000012044 organic layer Substances 0.000 description 25
- 238000005406 washing Methods 0.000 description 21
- 238000003756 stirring Methods 0.000 description 20
- 238000004128 high performance liquid chromatography Methods 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 17
- FFSJPOPLSWBGQY-UHFFFAOYSA-N triazol-4-one Chemical class O=C1C=NN=N1 FFSJPOPLSWBGQY-UHFFFAOYSA-N 0.000 description 17
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 16
- 239000003921 oil Substances 0.000 description 14
- DYLIWHYUXAJDOJ-OWOJBTEDSA-N (e)-4-(6-aminopurin-9-yl)but-2-en-1-ol Chemical compound NC1=NC=NC2=C1N=CN2C\C=C\CO DYLIWHYUXAJDOJ-OWOJBTEDSA-N 0.000 description 13
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 13
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 13
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 238000002329 infrared spectrum Methods 0.000 description 12
- 238000001914 filtration Methods 0.000 description 11
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 9
- 238000001035 drying Methods 0.000 description 9
- 239000012065 filter cake Substances 0.000 description 9
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 9
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 9
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 8
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 8
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 8
- 239000000706 filtrate Substances 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 238000001953 recrystallisation Methods 0.000 description 8
- 239000003610 charcoal Substances 0.000 description 7
- 239000003153 chemical reaction reagent Substances 0.000 description 7
- 238000004821 distillation Methods 0.000 description 7
- 239000012071 phase Substances 0.000 description 7
- 125000006239 protecting group Chemical group 0.000 description 7
- 239000011877 solvent mixture Substances 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 150000004982 aromatic amines Chemical class 0.000 description 6
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 6
- 239000003480 eluent Substances 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 229940042795 hydrazides for tuberculosis treatment Drugs 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 5
- 235000017557 sodium bicarbonate Nutrition 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- QPRQEDXDYOZYLA-UHFFFAOYSA-N 2-methylbutan-1-ol Chemical compound CCC(C)CO QPRQEDXDYOZYLA-UHFFFAOYSA-N 0.000 description 4
- 239000004322 Butylated hydroxytoluene Substances 0.000 description 4
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 4
- 239000002841 Lewis acid Substances 0.000 description 4
- 239000007853 buffer solution Substances 0.000 description 4
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 4
- 229940095259 butylated hydroxytoluene Drugs 0.000 description 4
- 238000004587 chromatography analysis Methods 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 4
- 150000007517 lewis acids Chemical class 0.000 description 4
- 239000002808 molecular sieve Substances 0.000 description 4
- 239000008363 phosphate buffer Substances 0.000 description 4
- 238000000634 powder X-ray diffraction Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 108090000790 Enzymes Proteins 0.000 description 3
- 102000004190 Enzymes Human genes 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 3
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 239000000872 buffer Substances 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 239000010779 crude oil Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 3
- 235000019796 monopotassium phosphate Nutrition 0.000 description 3
- 239000012452 mother liquor Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- 0 C*C(*)*(C(N*)=O)NC=O Chemical compound C*C(*)*(C(N*)=O)NC=O 0.000 description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000007818 Grignard reagent Substances 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000007836 KH2PO4 Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 230000010933 acylation Effects 0.000 description 2
- 238000005917 acylation reaction Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 2
- 239000002168 alkylating agent Substances 0.000 description 2
- 229940100198 alkylating agent Drugs 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000000843 anti-fungal effect Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 210000004534 cecum Anatomy 0.000 description 2
- OOCUOKHIVGWCTJ-UHFFFAOYSA-N chloromethyl(trimethyl)silane Chemical compound C[Si](C)(C)CCl OOCUOKHIVGWCTJ-UHFFFAOYSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
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- 238000010790 dilution Methods 0.000 description 2
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- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- XZBIXDPGRMLSTC-UHFFFAOYSA-N formohydrazide Chemical class NNC=O XZBIXDPGRMLSTC-UHFFFAOYSA-N 0.000 description 2
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- 150000004795 grignard reagents Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- LSACYLWPPQLVSM-UHFFFAOYSA-N isobutyric acid anhydride Chemical compound CC(C)C(=O)OC(=O)C(C)C LSACYLWPPQLVSM-UHFFFAOYSA-N 0.000 description 2
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- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
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- 229910052788 barium Inorganic materials 0.000 description 1
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- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
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- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229960004132 diethyl ether Drugs 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
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- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 1
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- RFHAOTPXVQNOHP-UHFFFAOYSA-N fluconazole Chemical compound C1=NC=NN1CC(C=1C(=CC(F)=CC=1)F)(O)CN1C=NC=N1 RFHAOTPXVQNOHP-UHFFFAOYSA-N 0.000 description 1
- 229960004884 fluconazole Drugs 0.000 description 1
- HLXVERDKKMHKLD-UHFFFAOYSA-N formylazanium;acetate Chemical compound NC=O.CC(O)=O HLXVERDKKMHKLD-UHFFFAOYSA-N 0.000 description 1
- 244000053095 fungal pathogen Species 0.000 description 1
- ZTQSADJAYQOCDD-UHFFFAOYSA-N ginsenoside-Rd2 Natural products C1CC(C2(CCC3C(C)(C)C(OC4C(C(O)C(O)C(CO)O4)O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC(C(C(O)C1O)O)OC1COC1OCC(O)C(O)C1O ZTQSADJAYQOCDD-UHFFFAOYSA-N 0.000 description 1
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- 125000000623 heterocyclic group Chemical group 0.000 description 1
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- 150000004679 hydroxides Chemical class 0.000 description 1
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- 239000011630 iodine Substances 0.000 description 1
- 229960004130 itraconazole Drugs 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- YCCXQARVHOPWFJ-UHFFFAOYSA-M magnesium;ethane;chloride Chemical compound [Mg+2].[Cl-].[CH2-]C YCCXQARVHOPWFJ-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
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- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000001477 organic nitrogen group Chemical group 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- KDCQXNHIUCCTHE-UHFFFAOYSA-N oxolane;1h-pyrrole Chemical compound C1CCOC1.C=1C=CNC=1 KDCQXNHIUCCTHE-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- BSCCSDNZEIHXOK-UHFFFAOYSA-N phenyl carbamate Chemical compound NC(=O)OC1=CC=CC=C1 BSCCSDNZEIHXOK-UHFFFAOYSA-N 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- QVLTXCYWHPZMCA-UHFFFAOYSA-N po4-po4 Chemical compound OP(O)(O)=O.OP(O)(O)=O QVLTXCYWHPZMCA-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
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- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000013341 scale-up Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- 230000000699 topical effect Effects 0.000 description 1
- 239000012049 topical pharmaceutical composition Substances 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 238000010200 validation analysis Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/14—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D295/155—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals with the ring nitrogen atoms and the carbon atoms with three bonds to hetero atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/495—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with two or more nitrogen atoms as the only ring heteroatoms, e.g. piperazine or tetrazines
- A61K31/496—Non-condensed piperazines containing further heterocyclic rings, e.g. rifampin, thiothixene or sparfloxacin
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
- A61P31/10—Antimycotics
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Veterinary Medicine (AREA)
- Public Health (AREA)
- General Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Animal Behavior & Ethology (AREA)
- Pharmacology & Pharmacy (AREA)
- General Chemical & Material Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oncology (AREA)
- Communicable Diseases (AREA)
- Epidemiology (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
A process for the preparation of a chiral compound, in particular posaconazole, wherein the process comprises mixing and reacting the compounds of formula (I) Y3-NH2; of formula (Ila) 0=C=N-Y0 and/or of formula (lIb) and of formula (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V).
Description
PROCESS FOR THE PREPARATION OF CHIRAL TRIAZOLONES
The present invention relates to a process for the preparation of a chiral compound, preferably the preparation of chiral triazolones, more preferably the preparation of disubstituted triazolone antifungals, in particular posaconazole. According to the inventive process, a particularly preferred compound used for said preparation is carbonyldiimidazole (CDI), and thus, the present invention also relates to the use of CDI
for the preparation of a chiral compound, in particular posaconazole.
1.0 Back rg ound prior art Posaconazole (CAS Registry Number 171228-49-2; CAS Name: 2,5-anhydro-1,3,4-trideoxy-2-C-(2,4-difluorophenyl)-4-[[4-[4-[4-[ 1-[(1 S,2S)-1-ethyl-2-hydroxypropyl]-1,5-dihydro-5-oxo-4H-1,2,4-triazol-4-yl]phenyl]-1-piperazinyl]phenoxy]methyl]-1-(1H-1,2,4-triazol-I-yl)-D-threo-pentitol) is a triazole antifungal drug represented by the structure:
I-,-N e_,~ OH
F / F 0 N N \ N I
Posaconazole is used, for example, to prevent and/or treat invasive fungal infections caused by Candida species, Mucor species, Aspergillus species, Fusarium species, or Coccidioides species in immunocompromised patients and/or in patients where the disease is refractory to other antifungal agents such as amphothericin B, fluconazole, or itraconazole, and/or in patients who do not tolerate these antifungal agents.
Currently known processes for the preparation involve a two-step procedure with harsh reaction conditions which necessitate very stable protecting groups, reducing the yield and quality of the triazolone product.
The present invention relates to a process for the preparation of a chiral compound, preferably the preparation of chiral triazolones, more preferably the preparation of disubstituted triazolone antifungals, in particular posaconazole. According to the inventive process, a particularly preferred compound used for said preparation is carbonyldiimidazole (CDI), and thus, the present invention also relates to the use of CDI
for the preparation of a chiral compound, in particular posaconazole.
1.0 Back rg ound prior art Posaconazole (CAS Registry Number 171228-49-2; CAS Name: 2,5-anhydro-1,3,4-trideoxy-2-C-(2,4-difluorophenyl)-4-[[4-[4-[4-[ 1-[(1 S,2S)-1-ethyl-2-hydroxypropyl]-1,5-dihydro-5-oxo-4H-1,2,4-triazol-4-yl]phenyl]-1-piperazinyl]phenoxy]methyl]-1-(1H-1,2,4-triazol-I-yl)-D-threo-pentitol) is a triazole antifungal drug represented by the structure:
I-,-N e_,~ OH
F / F 0 N N \ N I
Posaconazole is used, for example, to prevent and/or treat invasive fungal infections caused by Candida species, Mucor species, Aspergillus species, Fusarium species, or Coccidioides species in immunocompromised patients and/or in patients where the disease is refractory to other antifungal agents such as amphothericin B, fluconazole, or itraconazole, and/or in patients who do not tolerate these antifungal agents.
Currently known processes for the preparation involve a two-step procedure with harsh reaction conditions which necessitate very stable protecting groups, reducing the yield and quality of the triazolone product.
2 A process of the prior art for the preparation of a triazolone compound is disclosed in WO 96/33178. In this reaction, the triazolone ring in posaconazole is formed by heating of an aromatic carbamate, prepared from the corresponding amine and phenyl chloroformate, and an 0-protected hydrazide for 24-4 8 hours at more than 100 C. Such harsh reaction conditions during condensation of the triazolone ring are believed to cause significant degradation, becoming evident by the darkening of the product which is obtained in a yield of 80 % after deprotection. When applied to the synthesis of tetrahydrofuran azole antifungal agents, cleavage of the 0-protecting group, typically benzyl, is believed not to be quantitative. Therefore, traces of the protected compound may be found in the respective pharmaceutical composition containing the product. Further, the activation of the aromatic amine as phenyl carbamate involves the mutagenic compound phenyl chloroformate Cl\ /O
O /
and substantial amounts of toxic phenol are produced. The prolonged heating of 24 to 48 hours further reduces yield and quality of the product and obviously requires a significant and undue amount of energy.
Another process for the preparation of disubstituted triazolone compounds in general is disclosed in WO 93/09114. Document WO 95/17407 specifically relates to the preparation of posaconazole. Both documents teach the reaction of an aromatic carbamate, prepared as described above, with hydrazine followed by heating with formamide acetate to give an N-substituted triazolone. Said triazolone is alkylated satisfactorily with aliphatic hydrocarbon chains, but not with O-substituted alkyl groups as required for the preparation of posaconazole. As to the use of 0-alkylating agents, the process taught by these documents involves a large excess of alkylating agent and thus gives rise to a mixture of N-alkylated and 0-alkylated isomers. Consequently, tedious purification is necessary which is costly, time-consuming and reducing the yield for this step to 50 %
or less, thus rendering the process highly disadvantageous, in particular for industrial-scale processes for the preparation of these triazolone compounds such as posaconazole.
Yet another process is described in WO 2006/007540. A similar reaction is published by Huang et a1., Organic Letters 2004, 6 (25) 4795-4798. This reaction involves the activation of an aliphatic amine with phosgene and the addition of unsubstituted formyl hydrazine followed by heating in hexamethyldisilazane at 140 C for up to 30 hours to give N-unsubstituted triazolone compounds in low to moderate yields. This process has not
O /
and substantial amounts of toxic phenol are produced. The prolonged heating of 24 to 48 hours further reduces yield and quality of the product and obviously requires a significant and undue amount of energy.
Another process for the preparation of disubstituted triazolone compounds in general is disclosed in WO 93/09114. Document WO 95/17407 specifically relates to the preparation of posaconazole. Both documents teach the reaction of an aromatic carbamate, prepared as described above, with hydrazine followed by heating with formamide acetate to give an N-substituted triazolone. Said triazolone is alkylated satisfactorily with aliphatic hydrocarbon chains, but not with O-substituted alkyl groups as required for the preparation of posaconazole. As to the use of 0-alkylating agents, the process taught by these documents involves a large excess of alkylating agent and thus gives rise to a mixture of N-alkylated and 0-alkylated isomers. Consequently, tedious purification is necessary which is costly, time-consuming and reducing the yield for this step to 50 %
or less, thus rendering the process highly disadvantageous, in particular for industrial-scale processes for the preparation of these triazolone compounds such as posaconazole.
Yet another process is described in WO 2006/007540. A similar reaction is published by Huang et a1., Organic Letters 2004, 6 (25) 4795-4798. This reaction involves the activation of an aliphatic amine with phosgene and the addition of unsubstituted formyl hydrazine followed by heating in hexamethyldisilazane at 140 C for up to 30 hours to give N-unsubstituted triazolone compounds in low to moderate yields. This process has not
3 PCT/EP2011/058033 been described for the synthesis of triazolone-containing antifungal compounds such as posaconazole which would require the reaction with aromatic amines. In this respect, the N-alkylation step following the formation of the triazolone would obviously face the same difficulties and restrictions as described in the context of the prior art documents above.
Summarized, it is noted that all known processes for the synthesis of triazolone compounds, in particular posaconazole, from aromatic amines, such as Y3-NH2 wherein Y3 is an optionally substituted aryl residue, in particular from aromatic amines of formula O
N
N
~N
1o require and produce a large amount of toxic and/or polluting reagents, involve prolonged reaction times at high temperatures and, concerning the preparation of posaconazole, are only specifically taught for the benzyl-protected hydrazide "'O
HN NH
O \
Unprotected or, for example, silyl-protected hydrazides result in complex mixtures with minor contents of posaconazole. For the synthesis of antifungal triazolone compounds, these process constraints cause considerable pollution and waste of materials and/or energy, decrease the quality of the product and leave traces of protected triazolone compounds, in particular benzyl-protected triazolone compounds, especially
Summarized, it is noted that all known processes for the synthesis of triazolone compounds, in particular posaconazole, from aromatic amines, such as Y3-NH2 wherein Y3 is an optionally substituted aryl residue, in particular from aromatic amines of formula O
N
N
~N
1o require and produce a large amount of toxic and/or polluting reagents, involve prolonged reaction times at high temperatures and, concerning the preparation of posaconazole, are only specifically taught for the benzyl-protected hydrazide "'O
HN NH
O \
Unprotected or, for example, silyl-protected hydrazides result in complex mixtures with minor contents of posaconazole. For the synthesis of antifungal triazolone compounds, these process constraints cause considerable pollution and waste of materials and/or energy, decrease the quality of the product and leave traces of protected triazolone compounds, in particular benzyl-protected triazolone compounds, especially
4 O
F / F \O N-<) N N
N
d NN
in the antifungal agent products and the respective pharmaceutical composition.
Therefore, it was an object of the present invention to provide a novel process which overcomes at least one of the problems of the prior art processes.
Summary of the invention Surprisingly, it was found that it is possible to prepare such triazolone compounds under much milder conditions than suggested and taught in the art. Such novel and inventive process further allows for the preparation of disubstituted triazolone compounds in excellent yield and quality with a wide choice of protecting groups, even including the possibility of working without protecting group. According to a preferred embodiment, the new process of the present invention allows the use of unprotected hydrazides for the synthesis of antifungal agents.
In particular, according to the present invention, it was surprisingly found that carbonyldiimidazole can be used to mildly activate aromatic amines, in particular amines such as Y3-NH2 wherein Y3 is an optionally substituted aryl residue, especially aromatic amines of formula II
N
N
for, surprisingly, the chemoselective acylation of hydrazides. Due to this excellent chemoselectivity, it was surprisingly found that - compared to the prior art -at extremely mild conditions with considerably decreased reaction time and temperature, unprotected hydrazides or 0-silyl-protected hydrazides can be employed. A consequence of the new process of the present invention is that the only by-product produced in significant amounts is the non-toxic imidazole. Previously unknown intermediate compounds could be isolated and/or converted to triazolone compounds by heating in suitable solvents allowing
F / F \O N-<) N N
N
d NN
in the antifungal agent products and the respective pharmaceutical composition.
Therefore, it was an object of the present invention to provide a novel process which overcomes at least one of the problems of the prior art processes.
Summary of the invention Surprisingly, it was found that it is possible to prepare such triazolone compounds under much milder conditions than suggested and taught in the art. Such novel and inventive process further allows for the preparation of disubstituted triazolone compounds in excellent yield and quality with a wide choice of protecting groups, even including the possibility of working without protecting group. According to a preferred embodiment, the new process of the present invention allows the use of unprotected hydrazides for the synthesis of antifungal agents.
In particular, according to the present invention, it was surprisingly found that carbonyldiimidazole can be used to mildly activate aromatic amines, in particular amines such as Y3-NH2 wherein Y3 is an optionally substituted aryl residue, especially aromatic amines of formula II
N
N
for, surprisingly, the chemoselective acylation of hydrazides. Due to this excellent chemoselectivity, it was surprisingly found that - compared to the prior art -at extremely mild conditions with considerably decreased reaction time and temperature, unprotected hydrazides or 0-silyl-protected hydrazides can be employed. A consequence of the new process of the present invention is that the only by-product produced in significant amounts is the non-toxic imidazole. Previously unknown intermediate compounds could be isolated and/or converted to triazolone compounds by heating in suitable solvents allowing
5 for an unexpectedly efficient and clean synthesis. An optional added suitable silylation agent was surprisingly found to further improve the triazolone ring formation in terms of rate and selectivity.
A major advantage of the new process is the fact that the process is not dependent on specific protecting groups and, thus, free of associated by-products.
Therefore, the present invention relates to process for the preparation of a chiral compound, comprising (1.1) providing a compound of formula (I) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) O=C=N-Yo {IIa) or phosgene or a phosgene derivative of formula (IIb) O
Y NANY
z 1 (IIb) wherein Yo is an optionally substituted alkyl or aryl residue, and wherein YIN- and Y2N- are the same or different optionally substituted nitrogen heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III) /O
,NH
R R
(III) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, and
A major advantage of the new process is the fact that the process is not dependent on specific protecting groups and, thus, free of associated by-products.
Therefore, the present invention relates to process for the preparation of a chiral compound, comprising (1.1) providing a compound of formula (I) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) O=C=N-Yo {IIa) or phosgene or a phosgene derivative of formula (IIb) O
Y NANY
z 1 (IIb) wherein Yo is an optionally substituted alkyl or aryl residue, and wherein YIN- and Y2N- are the same or different optionally substituted nitrogen heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III) /O
,NH
R R
(III) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, and
6 wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of -SiRaRbRc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and R,, are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V) 0 Ri O
NH
fl O
(IV);
0 Ri y3N N R
According to a preferred embodiment, the present invention relates to a process for the preparation of a chiral compound, comprising (1.1) providing a compound of formula (I) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) O=C=N-Yo (IIa) or phosgene or a phosgene derivative of formula (IIb) Y N'K NY
2 (IIb) wherein Yo is an optionally substituted alkyl or aryl residue, and wherein YIN- and Y2N- are the same or different optionally substituted nitrogen heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III)
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V) 0 Ri O
NH
fl O
(IV);
0 Ri y3N N R
According to a preferred embodiment, the present invention relates to a process for the preparation of a chiral compound, comprising (1.1) providing a compound of formula (I) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) O=C=N-Yo (IIa) or phosgene or a phosgene derivative of formula (IIb) Y N'K NY
2 (IIb) wherein Yo is an optionally substituted alkyl or aryl residue, and wherein YIN- and Y2N- are the same or different optionally substituted nitrogen heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III)
7 O
~NH
O
Rl R
(III) or a salt thereof, wherein Rl is an alkyl residue preferably having from 1 to 6 carbon atoms, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of -SiRaRbR,, and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and R are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V) O Ri NH
ri O (IV);
O
N
(V);
wherein in (2), (2.1) the compounds of formulae (1) and (IIa) and/or (IIb) are mixed and at least partially reacted in a solvent to obtain a reaction mixture;
(2.2) and the compound of formula (III) is added to the reaction mixture obtained from (2.1);
(3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IV) with a solvent, to a temperature in the range of from 40 to 150 C to obtain a compound according to formula (V)
~NH
O
Rl R
(III) or a salt thereof, wherein Rl is an alkyl residue preferably having from 1 to 6 carbon atoms, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of -SiRaRbR,, and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and R are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V) O Ri NH
ri O (IV);
O
N
(V);
wherein in (2), (2.1) the compounds of formulae (1) and (IIa) and/or (IIb) are mixed and at least partially reacted in a solvent to obtain a reaction mixture;
(2.2) and the compound of formula (III) is added to the reaction mixture obtained from (2.1);
(3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IV) with a solvent, to a temperature in the range of from 40 to 150 C to obtain a compound according to formula (V)
8 (V);
(4) extracting the compound of formula (V), preferably using a suitable aqueous acid, more preferably an aqueous inorganic acid and more preferably aqueous hydrochloric acid, as extracting agent;
(5) crystallizing the compound of formula (V) in a solvent;
(6) optionally separating the crystallized compound of formula (V) from the solvent.
According to a further preferred embodiment, the present invention relates to a process for the preparation of posaconazole, comprising (l.1) providing a compound of formula (Ia) F F 0 N \ / NH2 NN iN
(Ia);
(1.2) providing a compound of formula (Ile) N'J~ N
(1.3) providing a compound of formula (Ilia) j0 HNNH
(Ilia) wherein at least 99 % of the molecules of said compound are present as compound of formula (IIIb)
(4) extracting the compound of formula (V), preferably using a suitable aqueous acid, more preferably an aqueous inorganic acid and more preferably aqueous hydrochloric acid, as extracting agent;
(5) crystallizing the compound of formula (V) in a solvent;
(6) optionally separating the crystallized compound of formula (V) from the solvent.
According to a further preferred embodiment, the present invention relates to a process for the preparation of posaconazole, comprising (l.1) providing a compound of formula (Ia) F F 0 N \ / NH2 NN iN
(Ia);
(1.2) providing a compound of formula (Ile) N'J~ N
(1.3) providing a compound of formula (Ilia) j0 HNNH
(Ilia) wherein at least 99 % of the molecules of said compound are present as compound of formula (IIIb)
9 O
HN NH
OH
(2) mixing and reacting the compounds of formulae (Ia), (IIc), and (IIIa) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IVb) O
F F /--\ 11 OH
H I y NH
NON
(IVb) wherein at least 99 % of the molecules of said compound are present as compound of formula (IVd) F
-&H 1 NH
~NH
O r ,-N
N
(IVd), and/or of formula (Vb) /\ OH N N N fy O
N-~
NON (Vb), wherein at least 99 % of the molecules of said compound are present as compound of formula (Vd) O
I I
F F O
F, / ~~O ~ ~ \~ ~~~ Nom!
N
NN 'N
(Vd), wherein in (2), (2.1) the compounds of formulae (la) and (IIc) are mixed and at least partially reacted in a solvent to obtain a reaction mixture;
5 (2.2) and the compound of formula (Ilia) is added to the reaction mixture obtained from (2.1);
(3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IVb) with a solvent, to a temperature in the range of from 40 to 150 C to
HN NH
OH
(2) mixing and reacting the compounds of formulae (Ia), (IIc), and (IIIa) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IVb) O
F F /--\ 11 OH
H I y NH
NON
(IVb) wherein at least 99 % of the molecules of said compound are present as compound of formula (IVd) F
-&H 1 NH
~NH
O r ,-N
N
(IVd), and/or of formula (Vb) /\ OH N N N fy O
N-~
NON (Vb), wherein at least 99 % of the molecules of said compound are present as compound of formula (Vd) O
I I
F F O
F, / ~~O ~ ~ \~ ~~~ Nom!
N
NN 'N
(Vd), wherein in (2), (2.1) the compounds of formulae (la) and (IIc) are mixed and at least partially reacted in a solvent to obtain a reaction mixture;
5 (2.2) and the compound of formula (Ilia) is added to the reaction mixture obtained from (2.1);
(3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IVb) with a solvent, to a temperature in the range of from 40 to 150 C to
10 obtain a compound according to formula (Vb);
(4) extracting the compound of formula (Vb), using aqueous hydrochloric acid, as extracting agent;
(5) crystallizing the compound of formula (Vb) in a solvent;
(6) optionally separating the crystallized compound of formula (Vb) from the solvent.
Moreover, the present invention relates to an optionally crystalline chiral compound of formula (IVa) O RI
o\R
F F N
H
i~H
NON
(IVa) or a salt thereof, wherein Rl is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, Ri in particular being ethyl, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of-SiRaRbRc, and optionally substituted alkyl, aryl, alkaryl or aralkyl
(4) extracting the compound of formula (Vb), using aqueous hydrochloric acid, as extracting agent;
(5) crystallizing the compound of formula (Vb) in a solvent;
(6) optionally separating the crystallized compound of formula (Vb) from the solvent.
Moreover, the present invention relates to an optionally crystalline chiral compound of formula (IVa) O RI
o\R
F F N
H
i~H
NON
(IVa) or a salt thereof, wherein Rl is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, Ri in particular being ethyl, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of-SiRaRbRc, and optionally substituted alkyl, aryl, alkaryl or aralkyl
11 residues, where Ra, Rb and R, are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, with -R
preferably being -H or a hydroxyl protecting group selected from the group consisting of-Si(CH3)3 and benzyl, -R in particular being -H, and wherein said compound is most preferably a compound of formula (IVb) OH
Y
NH
O Ofl NN
(IVb).
Also, the present invention relates to a composition comprising a preferably crystalline chiral compound of formula (Va) R
O
OH
F F \ O /\ N N \-/ K N
N
O
NON
(Va) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, said composition preferably comprising a compound of formula (Vb) ~ - 11 OH
F F O -~ / \ / N
N
O
NN N
(Vb)
preferably being -H or a hydroxyl protecting group selected from the group consisting of-Si(CH3)3 and benzyl, -R in particular being -H, and wherein said compound is most preferably a compound of formula (IVb) OH
Y
NH
O Ofl NN
(IVb).
Also, the present invention relates to a composition comprising a preferably crystalline chiral compound of formula (Va) R
O
OH
F F \ O /\ N N \-/ K N
N
O
NON
(Va) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, said composition preferably comprising a compound of formula (Vb) ~ - 11 OH
F F O -~ / \ / N
N
O
NN N
(Vb)
12 wherein preferably at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said preferably crystalline compound are present as isomer of formula (Vc) Ri O
C OH
O
NON
(VG) preferably as isomer of formula (Vd) / J OH
F 0__&N N__~~N N.&#Oe N
O
NON
(V d), said composition containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve) O-R
F F \O /_\ J N
N
O
N-~
NON (Ve) preferably free of a compound of formula (Vf)
C OH
O
NON
(VG) preferably as isomer of formula (Vd) / J OH
F 0__&N N__~~N N.&#Oe N
O
NON
(V d), said composition containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve) O-R
F F \O /_\ J N
N
O
N-~
NON (Ve) preferably free of a compound of formula (Vf)
13 O
F / F \O / \ N N - NN O-R
\ I N
O
N II
N
wherein -R is -CH2---C6H5, -R preferably being selected from the group consisting of -SiRaRbRc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and R, are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, -R more preferably being a hydroxyl protecting group.
Yet further, the present invention relates to the use of a compound of formula (Ile) N 'J~ N
N\~ ~/ (Ile) lo for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb) F F \ %\ OH
NCj \ / N N
O
N-~
NON
(Vb), most preferably for the preparation of a preferably crystalline compound of formula (Vd) O
F F - OH
/ \ O `_ _\ & & N
N
O
N
(Vd).
F / F \O / \ N N - NN O-R
\ I N
O
N II
N
wherein -R is -CH2---C6H5, -R preferably being selected from the group consisting of -SiRaRbRc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and R, are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, -R more preferably being a hydroxyl protecting group.
Yet further, the present invention relates to the use of a compound of formula (Ile) N 'J~ N
N\~ ~/ (Ile) lo for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb) F F \ %\ OH
NCj \ / N N
O
N-~
NON
(Vb), most preferably for the preparation of a preferably crystalline compound of formula (Vd) O
F F - OH
/ \ O `_ _\ & & N
N
O
N
(Vd).
14 Short description of the Figures Fig. 1 shows the infrared spectrum (IR) of the compound of formula (IIIa) as obtained according to Example 3 of the present invention. In Figure 1, transmittance in % is presented on the y-axis, while wavenumber cm-1 is presented on the x-axis. The following IR peaks can be seen in particular: 3341, 3298, 2970, 2881, 1674, 1497, 1447, 1319, 1125, 1071, 945, 910, 876, 775 and 650 +1- 2 cm 1.
Fig. 2 shows the X-ray diffraction pattern of the compound of formula (111a) as obtained according to Example 3 of the present invention. In Figure 2, intensity - measured as counts per 300 seconds (linear scale) - is presented on the y-axis, while the position - expressed as 2 theta values in degrees - is presented on the x-axis. The following XRD peaks can be seen in particular:
9.0, 13.9, 17.4, 18.1, 20.0, 20.7, 23.4, 24.6, 27.5 and 29.2 +1- 0.2 11 2-Theta.
Fig. 3 shows the X-ray powder diffraction pattern (XRD) of the HCl salt of the compound of formula (GG) as obtained according to Example 1 (Exl.h) of the present invention. The cis:trans ratio, i.e. the ratio compound of formula (GGa) : compound of formula (GGb) is 99.2:0.8. In Fig. 3, on the x-axis, the position expressed as 2 theta values in degrees --- is shown, on the y-axis, the intensity -measured as counts per second (linear scale) - is shown.
Fig. 4 shows the infrared spectrum (IR) of the compound of formula (IVb) as obtained according to Example 4 of the present invention. In Figure 4, transmittance in % is presented on the y-axis, while wavenumber cm -1 is presented on the x-axis. The following IR peaks can be seen in particular:
3416, 3118, 2870, 1671, 1618, 1498, 1415, 1380, 1227, 1135, 1072, 947, 823, 728 and 663+1-2cm1.
3o Fig. 5 shows the X-ray diffraction pattern of the compound of formula (IVb) as obtained according to Example 4 of the present invention. In Figure 5, intensity - measured as counts per 300 seconds (linear scale) - is presented on the y-axis, while the position - expressed as 2 theta values in degrees - is presented on the x-axis. The following XRD peaks can be seen in particular: 5.1, 10.5, 11.6, 14.1, 16.8, 18.9, 19.8, 21.1, 22.2 and 23.8 +/- 0.2 0 2-Theta.
Detailed description As mentioned above, the present invention relates to a process for the preparation of a chiral compound wherein said process comprises the steps of 5 (1.1) providing a compound of formula (I) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) 10 O=C=N-Yo {IIa) or phosgene or a phosgene derivative of formula (IIb) Y N 'J~ NY
2 1 (IIb) wherein Yo is an optionally substituted alkyl or aryl residue, and wherein Y1N- and Y2N- are the same or different optionally substituted nitrogen
Fig. 2 shows the X-ray diffraction pattern of the compound of formula (111a) as obtained according to Example 3 of the present invention. In Figure 2, intensity - measured as counts per 300 seconds (linear scale) - is presented on the y-axis, while the position - expressed as 2 theta values in degrees - is presented on the x-axis. The following XRD peaks can be seen in particular:
9.0, 13.9, 17.4, 18.1, 20.0, 20.7, 23.4, 24.6, 27.5 and 29.2 +1- 0.2 11 2-Theta.
Fig. 3 shows the X-ray powder diffraction pattern (XRD) of the HCl salt of the compound of formula (GG) as obtained according to Example 1 (Exl.h) of the present invention. The cis:trans ratio, i.e. the ratio compound of formula (GGa) : compound of formula (GGb) is 99.2:0.8. In Fig. 3, on the x-axis, the position expressed as 2 theta values in degrees --- is shown, on the y-axis, the intensity -measured as counts per second (linear scale) - is shown.
Fig. 4 shows the infrared spectrum (IR) of the compound of formula (IVb) as obtained according to Example 4 of the present invention. In Figure 4, transmittance in % is presented on the y-axis, while wavenumber cm -1 is presented on the x-axis. The following IR peaks can be seen in particular:
3416, 3118, 2870, 1671, 1618, 1498, 1415, 1380, 1227, 1135, 1072, 947, 823, 728 and 663+1-2cm1.
3o Fig. 5 shows the X-ray diffraction pattern of the compound of formula (IVb) as obtained according to Example 4 of the present invention. In Figure 5, intensity - measured as counts per 300 seconds (linear scale) - is presented on the y-axis, while the position - expressed as 2 theta values in degrees - is presented on the x-axis. The following XRD peaks can be seen in particular: 5.1, 10.5, 11.6, 14.1, 16.8, 18.9, 19.8, 21.1, 22.2 and 23.8 +/- 0.2 0 2-Theta.
Detailed description As mentioned above, the present invention relates to a process for the preparation of a chiral compound wherein said process comprises the steps of 5 (1.1) providing a compound of formula (I) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) 10 O=C=N-Yo {IIa) or phosgene or a phosgene derivative of formula (IIb) Y N 'J~ NY
2 1 (IIb) wherein Yo is an optionally substituted alkyl or aryl residue, and wherein Y1N- and Y2N- are the same or different optionally substituted nitrogen
15 heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III) HN NH
O
R R
(III) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of---SlRaRURc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and RR are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V)
(1.3) providing a compound of formula (III) HN NH
O
R R
(III) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of---SlRaRURc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and RR are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V)
16 0 Ri H f NH
If 0 (IV);
N M.
Step (1.1) - Providing a compound of formula (1) According to step (1.1) of the present invention, a compound of formula (I) Y3-NH2 (1) wherein Y3 is an optionally substituted aryl residue and/or a suitable salt thereof is provided. No specific restrictions exist provided that the compound of formula (I) and/or to the suitable salt thereof can be used to be suitably mixed and reacted according to step (2) of the present invention.
The term "optionally substituted aryl residue" as used in the context of the present invention refers to aryl residues which have, for example, up to 6 or up to 12 carbon atoms.
If such aryl residue is a substituted aryl residue, the number of carbon atoms refers to the number of carbon atoms of the corresponding unsubstituted aryl residue.
According to preferred embodiments of the present invention, optionally substituted aryl residues are chosen so as to allow for the preparation of compounds which may be used as antifungal agent. More preferably, Y3 is a suitably substituted aryl residue, more preferably a suitably substituted phenyl residue. Most preferably, the compound of formula (I) is a chiral compound of formula z3 Z2 0 N N NHZ
N
N
II
If 0 (IV);
N M.
Step (1.1) - Providing a compound of formula (1) According to step (1.1) of the present invention, a compound of formula (I) Y3-NH2 (1) wherein Y3 is an optionally substituted aryl residue and/or a suitable salt thereof is provided. No specific restrictions exist provided that the compound of formula (I) and/or to the suitable salt thereof can be used to be suitably mixed and reacted according to step (2) of the present invention.
The term "optionally substituted aryl residue" as used in the context of the present invention refers to aryl residues which have, for example, up to 6 or up to 12 carbon atoms.
If such aryl residue is a substituted aryl residue, the number of carbon atoms refers to the number of carbon atoms of the corresponding unsubstituted aryl residue.
According to preferred embodiments of the present invention, optionally substituted aryl residues are chosen so as to allow for the preparation of compounds which may be used as antifungal agent. More preferably, Y3 is a suitably substituted aryl residue, more preferably a suitably substituted phenyl residue. Most preferably, the compound of formula (I) is a chiral compound of formula z3 Z2 0 N N NHZ
N
N
II
17 wherein Z1 and Z2 are independently F or Cl, preferably F. Even more preferably, the compound of formula (I) is a compound of formula Zl Z2 O N NH2 O
N
wherein Z1 and Z2 are independently F or Cl, preferably F, and wherein, according to an even more preferred embodiment, at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said compound are present as isomer of formula Z1 / Z2 '--O & N N NH2 N
N
Therefore, according to a preferred embodiment of the present invention, the compound of formula (I) is a compound of formula O
N Il N
N
wherein at least at least 95 %, more preferably at least 97 %, more preferably at least 99 %
of the molecules of said compound are present as isomer of formula (Ia)
N
wherein Z1 and Z2 are independently F or Cl, preferably F, and wherein, according to an even more preferred embodiment, at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said compound are present as isomer of formula Z1 / Z2 '--O & N N NH2 N
N
Therefore, according to a preferred embodiment of the present invention, the compound of formula (I) is a compound of formula O
N Il N
N
wherein at least at least 95 %, more preferably at least 97 %, more preferably at least 99 %
of the molecules of said compound are present as isomer of formula (Ia)
18 O
N_~
NON
(Ia).
Thus, the present invention in particular relates to above-defined process wherein the compound of formula (I) is the compound of formula (la).
As far as the preparation of the compound of formula (la) is concerned, no particular restrictions exist. Preferably, the compound of formula (la) is prepared by reacting a compound of formula (A) HO \ / ~; \ / NH2 (A) with a compound of formula (B) F F O-Tos O
NON (B).
Step (1.1) - Providing a compound of formula (A) As far as providing the compound of formula (A) is concerned, no particular restrictions exist. A conceivable process for the preparation of the compound of formula (A) is disclosed, for example, in M. Hepperle et. al Tetrahedron Lett. 2002, 43, 3359-3363, in US 6,355,801 B1, or in EP 1 230 231 B1.
Step (1.1) - Providing a compound of formula (B) As far as providing the compound of formula (B) is concerned, no particular restrictions exist. A conceivable process for the preparation of the compound of formula (B) is disclosed, for example, in US 5,403,937, EP 0 736 030 Al, or in WO 95/17407.
N_~
NON
(Ia).
Thus, the present invention in particular relates to above-defined process wherein the compound of formula (I) is the compound of formula (la).
As far as the preparation of the compound of formula (la) is concerned, no particular restrictions exist. Preferably, the compound of formula (la) is prepared by reacting a compound of formula (A) HO \ / ~; \ / NH2 (A) with a compound of formula (B) F F O-Tos O
NON (B).
Step (1.1) - Providing a compound of formula (A) As far as providing the compound of formula (A) is concerned, no particular restrictions exist. A conceivable process for the preparation of the compound of formula (A) is disclosed, for example, in M. Hepperle et. al Tetrahedron Lett. 2002, 43, 3359-3363, in US 6,355,801 B1, or in EP 1 230 231 B1.
Step (1.1) - Providing a compound of formula (B) As far as providing the compound of formula (B) is concerned, no particular restrictions exist. A conceivable process for the preparation of the compound of formula (B) is disclosed, for example, in US 5,403,937, EP 0 736 030 Al, or in WO 95/17407.
19 According to a preferred embodiment of the present invention, the compound of formula (B) is provided by a process wherein the HCI salt of the compound of formula (GGa) F F OH
O
NN~
(GGa) is transformed into the compound of formula (B).
As far as converting the HC1 salt of the compound of formula (Goa) to the respective tosylate according to formula (B) is concerned, no particular restrictions exist. According to a preferred embodiment of the present invention, the at least partially crystalline, preferably crystalline salt of the compound of formula (GG) F F OH
O
NN II
(G G) is provided suspended in a suitable liquid, most preferably dichloromethane (DCM). To this suspension, preferably at least one suitable organic nitrogen base such as triethylamine (TEA) and/or 4-dimethylaminopyridine (DMAP) is/are added. To the resulting mixture, a suitable p-toluenesulfonyl containing compound such as p-toluenesulfonyl chloride (TsCI) is added at a preferred temperature of from 10 to 40 C and preferably reacted for 1 to 6 hours. The obtained reaction mixture containing the compound of formula (B) is preferably suitably extracted, and from the obtained organic layer, optionally after suitable concentration, the compound of formula (B) is obtained as solid, e.g. by crystallization, which solid may be optionally suitably dried and preferably subsequently, without any further intermediate treatment, employed as starting material for the reaction with the compound of formula (A). Applying crystallization for obtaining the compound of formula (B) advantageously allows for purification of said compound as well as for a straightforward scale up of the herein described processes using said compound to a large scale production.
As far as the preparation of the HCI salt of the compound of formula (GGa) is concerned, no particular restrictions exist. According to a preferred embodiment of the present invention this HC1 salt is prepared according to a process from which the HC1 salt of the compound of formula (GG) is obtained, said compound of formula (GG) containing the 5 cis-isomer of formula (GGa) and the trans-isomer of formula (GGb) F F OH F F _OH
O O
NN i' NN y4 (GGa), (GGb).
According to a preferred embodiment of the present invention, said preferably crystalline HCl salt contains at least 97 %, preferably at least 98 % and more preferably at least 99 %
of the HCl salt of the cis-isomer of formula (GGa) and at most 3 %, preferably at most 2 %
10 and more preferably at most 1 % of the HCI salt of the trans-isomer of formula (GGb).
According to an even more preferred embodiment of the present invention, said compound of formula (GG) is obtained by a process comprising (I) providing the compound of formula (GG) comprised in a first suitable solvent;
15 (II) treating the compound of formula (GG) comprised in the first suitable solvent with HCI comprised in a second suitable solvent to obtain the HCI salt of compound of formula (GG).
In particular, the process of providing the HCI salt of the compound of formula (GG)
O
NN~
(GGa) is transformed into the compound of formula (B).
As far as converting the HC1 salt of the compound of formula (Goa) to the respective tosylate according to formula (B) is concerned, no particular restrictions exist. According to a preferred embodiment of the present invention, the at least partially crystalline, preferably crystalline salt of the compound of formula (GG) F F OH
O
NN II
(G G) is provided suspended in a suitable liquid, most preferably dichloromethane (DCM). To this suspension, preferably at least one suitable organic nitrogen base such as triethylamine (TEA) and/or 4-dimethylaminopyridine (DMAP) is/are added. To the resulting mixture, a suitable p-toluenesulfonyl containing compound such as p-toluenesulfonyl chloride (TsCI) is added at a preferred temperature of from 10 to 40 C and preferably reacted for 1 to 6 hours. The obtained reaction mixture containing the compound of formula (B) is preferably suitably extracted, and from the obtained organic layer, optionally after suitable concentration, the compound of formula (B) is obtained as solid, e.g. by crystallization, which solid may be optionally suitably dried and preferably subsequently, without any further intermediate treatment, employed as starting material for the reaction with the compound of formula (A). Applying crystallization for obtaining the compound of formula (B) advantageously allows for purification of said compound as well as for a straightforward scale up of the herein described processes using said compound to a large scale production.
As far as the preparation of the HCI salt of the compound of formula (GGa) is concerned, no particular restrictions exist. According to a preferred embodiment of the present invention this HC1 salt is prepared according to a process from which the HC1 salt of the compound of formula (GG) is obtained, said compound of formula (GG) containing the 5 cis-isomer of formula (GGa) and the trans-isomer of formula (GGb) F F OH F F _OH
O O
NN i' NN y4 (GGa), (GGb).
According to a preferred embodiment of the present invention, said preferably crystalline HCl salt contains at least 97 %, preferably at least 98 % and more preferably at least 99 %
of the HCl salt of the cis-isomer of formula (GGa) and at most 3 %, preferably at most 2 %
10 and more preferably at most 1 % of the HCI salt of the trans-isomer of formula (GGb).
According to an even more preferred embodiment of the present invention, said compound of formula (GG) is obtained by a process comprising (I) providing the compound of formula (GG) comprised in a first suitable solvent;
15 (II) treating the compound of formula (GG) comprised in the first suitable solvent with HCI comprised in a second suitable solvent to obtain the HCI salt of compound of formula (GG).
In particular, the process of providing the HCI salt of the compound of formula (GG)
20 according to a preferred embodiment of the present invention comprises steps according to the following embodiments and the respective combinations thereof, as indicated:
1. A process for the preparation of a hydrogen chloride (HCI) salt of a compound of formula (GG)
1. A process for the preparation of a hydrogen chloride (HCI) salt of a compound of formula (GG)
21 F F OH
O
N_~
NON
(GG) said compound of formula (GIG) containing the cis-isomer of formula (GGa) and the trans-isomer of formula (GGb) F F _OH F F ~--OH
O O
NN~ NN } }
(GGa), (GGb), the process comprising (I) providing the compound of formula (GG) comprised in a first suitable solvent;
(II) treating the compound of formula (GG) comprised in the first suitable solvent with HCl comprised in a second suitable solvent to obtain the HCl salt of the compound of formula (GG).
2. The process of embodiment 1, wherein the compound of formula (GG) provided in (I) contains from 80 to 95 %, preferably from 85 to 95 % of the cis-isomer of formula (GGa) and from 20 to 5 %, preferably from 15 to S % of the trans-isomer of formula (GGb).
3. The process of embodiment 1 or 2, wherein in (I), the compound of formula (GG) is provided by a method comprising (i.1) reacting a compound of formula (AA) F O
\ L
F (AA)
O
N_~
NON
(GG) said compound of formula (GIG) containing the cis-isomer of formula (GGa) and the trans-isomer of formula (GGb) F F _OH F F ~--OH
O O
NN~ NN } }
(GGa), (GGb), the process comprising (I) providing the compound of formula (GG) comprised in a first suitable solvent;
(II) treating the compound of formula (GG) comprised in the first suitable solvent with HCl comprised in a second suitable solvent to obtain the HCl salt of the compound of formula (GG).
2. The process of embodiment 1, wherein the compound of formula (GG) provided in (I) contains from 80 to 95 %, preferably from 85 to 95 % of the cis-isomer of formula (GGa) and from 20 to 5 %, preferably from 15 to S % of the trans-isomer of formula (GGb).
3. The process of embodiment 1 or 2, wherein in (I), the compound of formula (GG) is provided by a method comprising (i.1) reacting a compound of formula (AA) F O
\ L
F (AA)
22 wherein L is a leaving group, preferably a halogen, more preferably Cl, in a solvent with a nucleophilic compound comprising a nucleophilic residue RaaaRbbbRcccSi-CH2 wherein Raaa, Rbbb and R. are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, to obtain a reaction mixture containing as intermediate a beta-hydroxy silane of formula L
F
OH
SiR R R
aaa bbb ccc F
said reacting preferably being performed at a temperature in the range of from -50 to +20 C, more preferably from -30 to +10 C, more preferably from -15 to +5 C;
(i.2) treating the resulting reaction mixture, preferably without change of solvent, with a reagent promoting elimination reaction to obtain a reaction mixture containing a compound of formula (BB) F
L
F (BB) wherein treating is performed at a temperature in the range of from -20 to +70 C and wherein said reagent is preferably an acid, preferably an inorganic acid, more preferably sulfuric acid, wherein, if sulfuric acid is used, the temperature at which said treating is performed is preferably in the range of from 40 to 50 C;
(ii) reacting the compound of formula (BB) with a malonic ester Rl z.00C-CH2-COOR22 to obtain a compound of formula (CC) F (CC), wherein R11 and R22 are independently an optionally suitably substituted alkyl group having from 1 to 5 carbon atoms, preferably ethyl,
F
OH
SiR R R
aaa bbb ccc F
said reacting preferably being performed at a temperature in the range of from -50 to +20 C, more preferably from -30 to +10 C, more preferably from -15 to +5 C;
(i.2) treating the resulting reaction mixture, preferably without change of solvent, with a reagent promoting elimination reaction to obtain a reaction mixture containing a compound of formula (BB) F
L
F (BB) wherein treating is performed at a temperature in the range of from -20 to +70 C and wherein said reagent is preferably an acid, preferably an inorganic acid, more preferably sulfuric acid, wherein, if sulfuric acid is used, the temperature at which said treating is performed is preferably in the range of from 40 to 50 C;
(ii) reacting the compound of formula (BB) with a malonic ester Rl z.00C-CH2-COOR22 to obtain a compound of formula (CC) F (CC), wherein R11 and R22 are independently an optionally suitably substituted alkyl group having from 1 to 5 carbon atoms, preferably ethyl,
23 wherein, after (ii) and before (iii), the compound of formula (CC) is optionally separated by extraction in a suitable solvent, preferably cyclohexane;
(iii) reducing the compound of formula (CC) to obtain a compound of formula (DD) OH
F
OH
F (DD), the reducing agent preferably being LiBH4 which is used in an amount of at most 2 molar equivalents with respect to the compound of formula (CC), said reduction preferably being carried out in a suitable solvent preferably comprising water, the solvent preferably being selected from the group consisting of water, alcohol, and a mixture of water and at least one alcohol, more preferably from the group consisting of water, methanol, ethanol, isopropanol, and a mixture of water and at least one of these alcohols, more preferably from the group consisting of water, ethanol, isopropanol, and a mixture of water and at least one of these alcohols, more preferably from the group consisting of water, isopropanol, and a mixture of water and isopropanol, the solvent most preferably being a mixture of water and isopropanol, wherein the solvent preferably comprises from 1 to 20 vol.-%, more preferably from 5 to 15 voL-% of water;
(iv) acylating the compound of formula (DD) with isobutyric anhydride to obtain a compound of formula (EE) O
O
F =
OH
F (EE), said acylation preferably being carried out in the presence of a suitable enzyme, preferably Novo SP 435 enzyme in a suitable solvent, preferably acetonitrile or toluene, more preferably toluene,
(iii) reducing the compound of formula (CC) to obtain a compound of formula (DD) OH
F
OH
F (DD), the reducing agent preferably being LiBH4 which is used in an amount of at most 2 molar equivalents with respect to the compound of formula (CC), said reduction preferably being carried out in a suitable solvent preferably comprising water, the solvent preferably being selected from the group consisting of water, alcohol, and a mixture of water and at least one alcohol, more preferably from the group consisting of water, methanol, ethanol, isopropanol, and a mixture of water and at least one of these alcohols, more preferably from the group consisting of water, ethanol, isopropanol, and a mixture of water and at least one of these alcohols, more preferably from the group consisting of water, isopropanol, and a mixture of water and isopropanol, the solvent most preferably being a mixture of water and isopropanol, wherein the solvent preferably comprises from 1 to 20 vol.-%, more preferably from 5 to 15 voL-% of water;
(iv) acylating the compound of formula (DD) with isobutyric anhydride to obtain a compound of formula (EE) O
O
F =
OH
F (EE), said acylation preferably being carried out in the presence of a suitable enzyme, preferably Novo SP 435 enzyme in a suitable solvent, preferably acetonitrile or toluene, more preferably toluene,
24 wherein after (iv) and before (v), the compound of formula (EE) is preferably at least partially crystallized;
(v) reacting the compound of formula (EE) with a halogen Hale selected from the group consisting of C12, Br2 and I2, preferably I2, in the presence of a base in a solvent to obtain a compound of formula (FF) O
F F Y
O
Hal (FF) wherein preferably from 80 to 95 %, more preferably from 85 to 95 % of the molecules of compound (FF) are present as cis-isomer of formula (FFa) F F _~_x O
Hal (FFa) and preferably from 20 to 5 %, more preferably from 15 to 5 % of the molecules of compound (FF) are present as trans-isomer of formula (FFb) O
F / F _~_x O
Hal (FFb);
wherein the solvent is preferably ethyl acetate and wherein the base is preferably sodium hydrogencarbonate, and wherein the temperature at which the compound of formula (EE) is reacted is preferably less than 0 C, more preferably not higher than -5 C and even more preferably not higher than -10 C;
(vi.1)heating the compound of formula (FF) preferably at a temperature in the range of from +70 to +100 C, more preferably from +80 to +95 C, more preferably from +85 to +90 C, preferably in the absence of DMPU (1,3-dimethyl-3,4,5,6-tetrahydro-2(lH)-pyrimidizaone), in a solvent, preferably a polar aprotic 5 solvent, for example DMF (NN-dimethylformamide) and DMSO, more preferably DMSO, with a 1,2,4-triazole alkali metal salt, preferably the sodium salt, and treating the resulting reaction mixture with a base suitable to promote saponification of the ester moiety such as alkali metal hydroxides, alkali metal bicarbonates, alkali metal carbonates, alkaline earth metal hydroxides, alkaline 10 earth metal bicarbonates, and alkaline earth metal carbonates, preferably alkali metal bases, said base preferably being added in aqueous and/or alcoholic media, wherein suitable alcohols are alcohols containing I to 6, preferably 1 to 4, more preferably l to 3, most preferably 1 to 2 carbon atoms, said base even more preferably being sodium hydroxide, preferably employed as aqueous 15 solution, in the presence of methanol, to obtain a compound of formula (GG) F F OH
O
(GG) wherein preferably from 80 to 95 %, more preferably from 85 to 95 % of the molecules are present as cis-isomer of formula (GGa) F F OH
O
20 N~'N (GGa) and preferably from 20 to 5 %, more preferably from 15 to 5 % of the molecules are present as trans-isomer of formula (GGb) F / F -OH
O
(GGb);
(vi. 2) separating the compound of formula (GG) from the reaction mixture obtained from (vi. 1) by extraction in a suitable solvent, the solvent preferably being a polar water-immiscible solvent, more preferably an ester such as ethyl acetate or isopropyl acetate, an ether such as tetrahydrofuran or methyl tetrahydrofuran, a ketone such as methyl isobutyl ketone, a halogenated solvent such as DCM, toluene, or a mixture of two or more of these solvents, more preferably an ester or an ether, more preferably an ether, and even more preferably methyl tetrahydrofuran.
4. The process of embodiment 3, wherein the method according to which the compound of formula (GG) is provided in (I) further comprises (vii) at least partially crystallizing the compound of formula (GG) after (vi.2).
5. The process of any of embodiments 1 to 4, wherein the first suitable solvent in which the compound of formula (GG) is comprised is an organic solvent, preferably an alcohol and/or a precursor of an alcohol, an ether, a ketone, an ester, or a mixture of two or more thereof.
6. The process of any of embodiments 1 to 5, wherein the first suitable solvent in which the compound of formula (GG) is comprised is selected from the group consisting of ethyl acetate, isopropyl acetate, diethyl ether, tetrahydrofuran (THF), methyl tetralydrofuran, dioxane, methanol, n-propanol, 1-butanol, 2-butanol, 2-methyl-l-butanol, 3-methyl-1-butanol, acetone, 2-butanone, and methyl isobutyl ketone (MIBK), and wherein the second solvent is selected from the group consisting of dioxane, tetrahydrofuran (THF), diethyl ether, diisopropyl ether, methyl tert-butyl ether (MTBE), ethyl acetate, methanol, n-propanol, 1-butanol, 2-butanol, 2-methyl-1-butanol, 3-methyl-1-butanol, and toluene.
7. The process of embodiment 5 or 6, wherein the first and/or the second solvent comprise(s) an alcohol and/or a precursor of an alcohol.
8. The process of embodiment 7, wherein the first solvent is MIBK and the second solvent is THF, or wherein both the first and the second solvent is n-butanol.
9. The process of embodiment 7 or 8, wherein treating in (II) is carried out at a temperature in the range of from 20 to 100 C, preferably from 40 to 80 C, more preferably from 55 to 65 C.
10. The process of any of embodiments 7 to 9, wherein in (II), HC1 comprised in the second solvent is employed relative to the compound of formula (GG) in a molar ratio HCI:(GG) in the range of from 1.0:1 to 2.0:1, preferably from 1.1:1 to 1.8:1, more preferably 1.2:1 to 1.7:1, more preferably from 1.3:1 to 1.5:1.
11. The process of any of embodiments 7 to 10, further comprising, after (1I), at least partially crystallizing the HCl salt of compound of formula (GG).
12. The process of embodiment 11, wherein the at least partially crystallized HCl salt of compound of formula (GG) contains at least 97 %, preferably at least 98 % and more preferably at least 99 % of the HCl salt of the cis-isomer of formula (GGa) and at most 3 %, preferably at most 2 % and more preferably at most 1 % of the HCl salt of the trans-isomer of formula (GGb).
13. The process of any of embodiments 7 to 12, further comprising (IIa) separating the at least partially crystallized HCl salt of compound of formula (GG), preferably by filtration, optionally followed by washing with a suitable solvent, preferably with MIBK.
14. The process of any of embodiments I to 6, wherein treating in (II) is carried out at a temperature in the range from 0 to 100 C and wherein in (II), HCl comprised in the second solvent is employed relative to the compound of formula (GG) in a molar ratio HC1:(GG) in the range of from 1.0:1 to 3.0:1, preferably from 1.5:1 to 2.5:1, more preferably from 2.0:1 to 2.2:1.
15. The process of embodiment 14, further comprising, after (II), at least partially crystallizing the HCl salt of compound of formula (GG).
16. The process of embodiment 15, wherein the at least partially crystallized HCl salt contains from 80 to 95 %, preferably from 85 to 95 % of the HCl salt of the cis-isomer of formula (GGa) and from 20 to 5 %, preferably from 15 to 5 % of the HCl salt of the trans-isomer of formula (GGb).
17. The process of embodiment 15 or 16, further comprising (IIb) separating the at least partially crystallized HCl salt of compound of formula (GG), preferably by filtration, optionally followed by washing with a suitable solvent, preferably with methyl tert-butyl ether (MTBE), acetone or methyl isobutyl ketone (MIBK), more preferably with MTBE.
18. The process of embodiment 17 or embodiment 13, further comprising (III) subjecting the at least partially crystallized HCl salt of compound of formula (GG). to solid extraction in a suitable solvent, preferably comprising MIBK, to obtain the HCl salt of compound of formula (GG), thereby increasing the content with regard to the HCl salt of the cis-isomer of formula (GGa).
19. The process of embodiment 18, wherein the suitable solvent is MIRK or a mixture of MIBK and an alcohol, preferably n-butanol, the molar ratio of MIBK relative to the alcohol preferably being in the range of from 0.5:1 to 10:1, more preferably from 0.75:1 to 5:1, more preferably from 0.95:1 to 1.05:1.
20. The process of embodiment 18 or 19, wherein the solid extraction is carried out at a temperature in the range of from 20 to 100 C, preferably from 40 to 80 C, more preferably from 55 to 65 C.
21. The process of any of embodiments 18 to 20, wherein in (III), the concentration of the HCl salt of compound of formula (GG) is in the range of from 0.25 to 0.75, preferably from 0.55 to 0.65 mol / liter solvent.
22. The process of any of embodiments 18 to 21, further comprising, after (III), isolating the at least partially crystallized HCl salt of compound of formula (GG).
23. The process of any of embodiments 18 to 22, wherein the at least partially crystallized HCl salt of compound of formula (GG) obtained from (III) contains at least 97 %, preferably at least 98 % and more preferably at least 99 % of the HCl salt of the cis-isomer of formula (GGa) and at most 3 %, preferably at most 2 % and more preferably at most 1 % of the HCl salt of the trans-isomer of formula (GGb).
24. The process of any of embodiments 18 to 23, further comprising (Ilia) isolating the at least partially crystallized HCI salt of compound of formula (GG) from the mixture obtained from (III), preferably by filtration, optionally followed by washing with a suitable solvent, preferably with diethyl ether or methyl tert-butyl ether (MTBE).
(v) reacting the compound of formula (EE) with a halogen Hale selected from the group consisting of C12, Br2 and I2, preferably I2, in the presence of a base in a solvent to obtain a compound of formula (FF) O
F F Y
O
Hal (FF) wherein preferably from 80 to 95 %, more preferably from 85 to 95 % of the molecules of compound (FF) are present as cis-isomer of formula (FFa) F F _~_x O
Hal (FFa) and preferably from 20 to 5 %, more preferably from 15 to 5 % of the molecules of compound (FF) are present as trans-isomer of formula (FFb) O
F / F _~_x O
Hal (FFb);
wherein the solvent is preferably ethyl acetate and wherein the base is preferably sodium hydrogencarbonate, and wherein the temperature at which the compound of formula (EE) is reacted is preferably less than 0 C, more preferably not higher than -5 C and even more preferably not higher than -10 C;
(vi.1)heating the compound of formula (FF) preferably at a temperature in the range of from +70 to +100 C, more preferably from +80 to +95 C, more preferably from +85 to +90 C, preferably in the absence of DMPU (1,3-dimethyl-3,4,5,6-tetrahydro-2(lH)-pyrimidizaone), in a solvent, preferably a polar aprotic 5 solvent, for example DMF (NN-dimethylformamide) and DMSO, more preferably DMSO, with a 1,2,4-triazole alkali metal salt, preferably the sodium salt, and treating the resulting reaction mixture with a base suitable to promote saponification of the ester moiety such as alkali metal hydroxides, alkali metal bicarbonates, alkali metal carbonates, alkaline earth metal hydroxides, alkaline 10 earth metal bicarbonates, and alkaline earth metal carbonates, preferably alkali metal bases, said base preferably being added in aqueous and/or alcoholic media, wherein suitable alcohols are alcohols containing I to 6, preferably 1 to 4, more preferably l to 3, most preferably 1 to 2 carbon atoms, said base even more preferably being sodium hydroxide, preferably employed as aqueous 15 solution, in the presence of methanol, to obtain a compound of formula (GG) F F OH
O
(GG) wherein preferably from 80 to 95 %, more preferably from 85 to 95 % of the molecules are present as cis-isomer of formula (GGa) F F OH
O
20 N~'N (GGa) and preferably from 20 to 5 %, more preferably from 15 to 5 % of the molecules are present as trans-isomer of formula (GGb) F / F -OH
O
(GGb);
(vi. 2) separating the compound of formula (GG) from the reaction mixture obtained from (vi. 1) by extraction in a suitable solvent, the solvent preferably being a polar water-immiscible solvent, more preferably an ester such as ethyl acetate or isopropyl acetate, an ether such as tetrahydrofuran or methyl tetrahydrofuran, a ketone such as methyl isobutyl ketone, a halogenated solvent such as DCM, toluene, or a mixture of two or more of these solvents, more preferably an ester or an ether, more preferably an ether, and even more preferably methyl tetrahydrofuran.
4. The process of embodiment 3, wherein the method according to which the compound of formula (GG) is provided in (I) further comprises (vii) at least partially crystallizing the compound of formula (GG) after (vi.2).
5. The process of any of embodiments 1 to 4, wherein the first suitable solvent in which the compound of formula (GG) is comprised is an organic solvent, preferably an alcohol and/or a precursor of an alcohol, an ether, a ketone, an ester, or a mixture of two or more thereof.
6. The process of any of embodiments 1 to 5, wherein the first suitable solvent in which the compound of formula (GG) is comprised is selected from the group consisting of ethyl acetate, isopropyl acetate, diethyl ether, tetrahydrofuran (THF), methyl tetralydrofuran, dioxane, methanol, n-propanol, 1-butanol, 2-butanol, 2-methyl-l-butanol, 3-methyl-1-butanol, acetone, 2-butanone, and methyl isobutyl ketone (MIBK), and wherein the second solvent is selected from the group consisting of dioxane, tetrahydrofuran (THF), diethyl ether, diisopropyl ether, methyl tert-butyl ether (MTBE), ethyl acetate, methanol, n-propanol, 1-butanol, 2-butanol, 2-methyl-1-butanol, 3-methyl-1-butanol, and toluene.
7. The process of embodiment 5 or 6, wherein the first and/or the second solvent comprise(s) an alcohol and/or a precursor of an alcohol.
8. The process of embodiment 7, wherein the first solvent is MIBK and the second solvent is THF, or wherein both the first and the second solvent is n-butanol.
9. The process of embodiment 7 or 8, wherein treating in (II) is carried out at a temperature in the range of from 20 to 100 C, preferably from 40 to 80 C, more preferably from 55 to 65 C.
10. The process of any of embodiments 7 to 9, wherein in (II), HC1 comprised in the second solvent is employed relative to the compound of formula (GG) in a molar ratio HCI:(GG) in the range of from 1.0:1 to 2.0:1, preferably from 1.1:1 to 1.8:1, more preferably 1.2:1 to 1.7:1, more preferably from 1.3:1 to 1.5:1.
11. The process of any of embodiments 7 to 10, further comprising, after (1I), at least partially crystallizing the HCl salt of compound of formula (GG).
12. The process of embodiment 11, wherein the at least partially crystallized HCl salt of compound of formula (GG) contains at least 97 %, preferably at least 98 % and more preferably at least 99 % of the HCl salt of the cis-isomer of formula (GGa) and at most 3 %, preferably at most 2 % and more preferably at most 1 % of the HCl salt of the trans-isomer of formula (GGb).
13. The process of any of embodiments 7 to 12, further comprising (IIa) separating the at least partially crystallized HCl salt of compound of formula (GG), preferably by filtration, optionally followed by washing with a suitable solvent, preferably with MIBK.
14. The process of any of embodiments I to 6, wherein treating in (II) is carried out at a temperature in the range from 0 to 100 C and wherein in (II), HCl comprised in the second solvent is employed relative to the compound of formula (GG) in a molar ratio HC1:(GG) in the range of from 1.0:1 to 3.0:1, preferably from 1.5:1 to 2.5:1, more preferably from 2.0:1 to 2.2:1.
15. The process of embodiment 14, further comprising, after (II), at least partially crystallizing the HCl salt of compound of formula (GG).
16. The process of embodiment 15, wherein the at least partially crystallized HCl salt contains from 80 to 95 %, preferably from 85 to 95 % of the HCl salt of the cis-isomer of formula (GGa) and from 20 to 5 %, preferably from 15 to 5 % of the HCl salt of the trans-isomer of formula (GGb).
17. The process of embodiment 15 or 16, further comprising (IIb) separating the at least partially crystallized HCl salt of compound of formula (GG), preferably by filtration, optionally followed by washing with a suitable solvent, preferably with methyl tert-butyl ether (MTBE), acetone or methyl isobutyl ketone (MIBK), more preferably with MTBE.
18. The process of embodiment 17 or embodiment 13, further comprising (III) subjecting the at least partially crystallized HCl salt of compound of formula (GG). to solid extraction in a suitable solvent, preferably comprising MIBK, to obtain the HCl salt of compound of formula (GG), thereby increasing the content with regard to the HCl salt of the cis-isomer of formula (GGa).
19. The process of embodiment 18, wherein the suitable solvent is MIRK or a mixture of MIBK and an alcohol, preferably n-butanol, the molar ratio of MIBK relative to the alcohol preferably being in the range of from 0.5:1 to 10:1, more preferably from 0.75:1 to 5:1, more preferably from 0.95:1 to 1.05:1.
20. The process of embodiment 18 or 19, wherein the solid extraction is carried out at a temperature in the range of from 20 to 100 C, preferably from 40 to 80 C, more preferably from 55 to 65 C.
21. The process of any of embodiments 18 to 20, wherein in (III), the concentration of the HCl salt of compound of formula (GG) is in the range of from 0.25 to 0.75, preferably from 0.55 to 0.65 mol / liter solvent.
22. The process of any of embodiments 18 to 21, further comprising, after (III), isolating the at least partially crystallized HCl salt of compound of formula (GG).
23. The process of any of embodiments 18 to 22, wherein the at least partially crystallized HCl salt of compound of formula (GG) obtained from (III) contains at least 97 %, preferably at least 98 % and more preferably at least 99 % of the HCl salt of the cis-isomer of formula (GGa) and at most 3 %, preferably at most 2 % and more preferably at most 1 % of the HCl salt of the trans-isomer of formula (GGb).
24. The process of any of embodiments 18 to 23, further comprising (Ilia) isolating the at least partially crystallized HCI salt of compound of formula (GG) from the mixture obtained from (III), preferably by filtration, optionally followed by washing with a suitable solvent, preferably with diethyl ether or methyl tert-butyl ether (MTBE).
25. The process of embodiment 24, further comprising subjecting the HCI salt obtained from (IIIa) to solid extraction according to the process of any of embodiments 18 to 23, preferably followed by separating the thus obtained HCl salt according to the process of embodiment 24.
Step (1.1) - Reacting the compound of formula (A) with the compound of formula (B) As far as the reaction of the compound of formula (A) with the compound of formula (B) is concerned, no specific restrictions exist provided that the compound of formula (I) is obtained.
Preferably, according to step (1.1) of the present invention, the compound of formula (I) is provided by a process (aa) reacting a compound of formula (A) HO \ / \_I \ / NH2 (A) in a suitable solvent and in the presence of a suitable base, with a compound of formula (B) F f O-Tos O
N
N
(B).
While as to the suitable solvent, no specific restrictions exist, preferred solvents according to the present invention are polar solvents. In particular, the suitable solvent is a polar protic solvent or a mixture of two or more thereof, or a polar aprotic solvent or a mixture of two or more thereof. More preferably, the suitable solvent is selected from the group 5 consisting of dimethylsulfoxide (DMSO), dimethylformamide (DMF), N-methylpyrrolidone (NMP), sulfolane, methanol, ethanol,,n-propanol, and iso-propanol, with ethanol or DMSO being particularly preferred.
Optionally, reacting in step (aa) is performed in the presence of at least one suitable anti-1.0 oxidant, such as butylated hydroxytoluene (BHT).
As to the suitable base, no specific .restrictions exist provided that the compound of formula (A) and the compound of formula (B) can be reacted with each other to give the desired product. Preferred bases according to the present invention are inorganic bases, 15 more preferably carbonates, hydroxides and/or hydrogencarbonates, and mixtures thereof.
Even more preferably, the respective cations are selected from the group consisting of alkali metal ions, alkaline earth metal ions, or mixtures thereof. As alkali metals, lithium, sodium or potassium may be mentioned. As alkaline earth metals, magnesium, calcium, strontium or barium may be mentioned. Thus, a preferred base is in particular an alkali 20 metal and/or an alkaline earth metal carbonate, an alkali metal and/or an alkaline earth metal hydroxide, and/or an alkali metal and/or an alkaline earth metal hydrogencarbonate, with sodium hydroxide and potassium carbonate being particularly preferred.
As to the preferred base sodium hydroxide, it is especially preferred to employ said base as 25 aqueous solution. Employing an aqueous solution. with a concentration of at least 20 wt.-%, preferably at least 45 wt.-% with respect to the base was found to be especially advantageous, and leads to a significant acceleration of the reaction rate as well as to increased selectivity of said reaction by reducing the formation of by-products.
30 With respect to the compound of formula (A), using an excess of the compound of formula (B) is preferred. Thus, the present invention relates to above-defined process wherein in step (aa), the molar ratio of the compound of formula (B) to the compound of formula (A) is greater than one. Further, preferred molar ratios are in the range of from greater than 1:1 to 1.2:1. Especially preferred molar ratios are in the range from 1.05:1 to 1,15:1, with a molar ratio of 1.1:1 being particularly preferred.
With respect to the compound of formula (A), using an excess of base is preferred. Thus, the present invention relates to above-defined process wherein in step (aa), the molar ratio of the base to the compound of formula (A) is greater than one. Further, preferred molar ratios are in the range of from greater than 1:1 to 2.0:1, more preferably from greater than 1:1 to 1.8:1, more preferably from greater than 1:1 to 1.6:1, more preferably from greater than 1:1 to 1.5:1.
The temperature under which the reaction in (aa) is carried out can be suitably chosen.
Preferred temperatures are in the range of from 20 to at most 35 C, more preferably from 25 to at most 32 C.
The pH under which the reaction in (aa) is carried out is suitably controlled by addition of above-defined base. In particular, the reaction is carried out at a pH of at least 10.
From step (aa) of the present invention, the compound of formula (I) is obtained as crystallized product contained in the reaction mixture. According to a preferred embodiment, the compound of formula (1) is suitably separated from the reaction mixture and optionally suitably washed. Said optional washing is preferably carried out with a base as washing agent wherein inorganic bases such as sodium hydroxide are preferred. Base concentrations of from 0.1 to 5 wt.-%, are preferred, with 0.5 to 2 wt.-%
being particularly preferred. Additionally, the compound of formula (I) may be further washed at least once with water and/or at least once with a suitable alcohol such as isopropanol.
While in general, the thus obtained product may be used for further steps without further treatment, it is preferred, according to the present invention, to re-crystallize the product obtained from step (aa). Therefore, the present invention relates to above-defined process which further comprises (bb) re-crystallizing the compound of formula (I).
While every suitable re-crystallization method is conceivable, it is especially preferred to re-crystallize the compound of formula (I) at least once from acetonitrile and/or water. It was found that compared to the isolation from water, the product obtained from re-crystallization from acetonitrile can be much easier dried, and thus, re-crystallization from acetonitrile allows for milder post-treatment conditions.
Drying of the thus re-crystallized compound of formula (I) is preferably carried out at a temperature of at most 75 C, preferably of at most 70 C at a pressure of preferably at most 500 mbar, more preferably of at most 100 mbar, more preferably of at most 75 mbar.
Most preferably, either re-crystallization, or drying, or re-crystallization and drying is/are carried out under inert atmosphere such as under nitrogen atmosphere.
Optionally, the product may be treated with a suitable porous material to remove remaining impurities. Among others, charcoal may be mentioned as such suitable material.
Step (1.2) - Providing a compound of formula (IIa) or (Ilb) According to step (1.2) of the process of the present invention, a compound of formula (IIa) O=C=N-Y' (IIa) or (IIb) O
Y NNY
i (Ilb) is provided.
As far as the compound of formula (IIa) is concerned, the residue Yo is an optionally substituted alkyl or aryl residue. The term "optionally substituted aryl residue" as used in this context of the present invention refers to aryl residues which have, for example, up to 6 or up to 12 carbon atoms. If such aryl residue is a substituted aryl residue, the number of carbon atoms refers to the number of carbon atoms of the corresponding unsubstituted aryl residue. The term "optionally substituted alkyl residue" as used in this context of the present invention refers to straight or branched alkyl residues which have, for example, 1 to 20, preferably 1 to 10 carbon atoms. If such alkyl residue is a substituted alkyl residue, the number of carbon atoms refers to the number of carbon atoms of the corresponding unsubstituted alkyl residue. As preferred compound of formula (IIa), phenylisocyanate may be mentioned.
As far as the compound of formula (IIb) is concerned, the residues YIN- and Y2N- are the same or different and are optionally substituted nitrogen heterocycle moieties. The term "nitrogen heterocycle" as used in the context of the present invention relates to a cyclic residue which contains at least one, preferably one, two or three, more preferably two nitrogen atoms. The cyclic structure as such preferably contains from five to ten atoms in total, preferably from five to nine atoms in total. Especially preferred residues Y1N- and Y2N- are imidazolyl or benzimidazolyl. According to an especially preferred embodiment of the present invention, the compound of formula (IIb) is carbonyldiimidazole (CDI) of formula (Ile) N 'J~ N
N, _~ L N
\% ~/ (IIc).
1o Typically, the compound of formula (IIb) is employed contained in. a suitable solvent or in a mixture of two or more suitable solvents. Such suitable solvent is, for example, DCM, THF, Me-THF, DMF, acetonitrile, an ester like ethyl acetate or butyl acetate, with DCM
being especially preferred.
Step (1.3) - Providing a compound of formula (III) According to step (1.3) of the present invention, a compound of formula (III) O
HN NH
(III) or a suitable salt thereof is provided.
In the compound according to formula (III), the residue R1 is preferably a straight or branched alkyl residue which preferably has from Ito 6 carbon atoms, namely 1, 2, 3, 4, 5, or 6 carbon atoms, more preferably from I to 4 carbon atoms, namely 1, 2, 3, or 4 carbon atoms, more preferably 1 or 2 carbon atoms, in particular 2 carbon atoms.
Further, in the compound of formula (III), the residue -R is either -H or a suitable hydroxyl protecting group. Conceivable protecting group are given, for example, in Greene et at., "Protective Groups in Organic Synthesis", 3rd Ed., Wiley-Interscience (1999).
Preferably, the suitable hydroxyl protecting group is benzyl or a group -SiRa,,RhRc wherein the residues Ra, Rb and R, may be the same or different and are preferably alkyl or aryl residues. The term "aryl residue" as used in this context of the present invention relates to a carbocyclic aromatic group, such as phenyl or naphthyl or the like. The term "alkyl residue" as used in the context of the present invention relates to straight or branched alkyl moieties which preferably have 1, 2, 3, 4, 5, or 6 carbon atoms, more preferably 1, 2 or 3 carbon atoms, more preferably 1 carbon atom. Especially preferably, the residue -R is -H
or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R most preferably being -H.
Even more preferably, the compound of formula (III) is provided as crystalline compound with a specific amount of molecules present as compound of the formula O
HN NH
Thus, the present invention relates to above-defined process wherein the compound of formula (III) is a preferably crystalline compound O
,NH
HN
OH
(IIla) and wherein, according to further preferred embodiment, at least 95 %, preferably at least 97 %, more preferably at least 99 % of the molecules of said crystalline compound are present as compound of formula (11Ib) /O
HN NH
OH
(IIIb).
Generally, there are no specific restrictions as far as the preparation of the compound of formula (III), in particular of formula (IHa) is concerned.
5 According to a preferred process, the compound of formula (III) wherein -R =
-H or a residue -SiRa,RbR is provided in step (1.3) of the present invention by a process which comprises the following steps:
(a) providing a chiral compound of formula (i) O
H OWNY
H
10 wherein Y is an optionally substituted aryl moiety, preferably an optionally substituted phenyl moiety, more preferably unsubstituted phenyl, said providing in (a) preferably comprising reacting propionaldehyde in a solvent with a compound of formula (j) O=N-Y (j), 15 preferably with nitrosobenzene, in the presence of a catalyst system preferably comprising at least one organocatalyst, more preferably proline (Pro), more preferably o-Pro, said catalyst system optionally further comprising a promoter, preferably an urea derivative, more preferably 1-(2-dimethylamino-ethyl)-3-phenyl urea, wherein preferably at least 95 %, more preferably at least 97 %, more 20 preferably at least 99 % of the molecules of the chiral compound of formula (i) provided in (a) are present as O
H ONY
H
(ia), said reaction of propionaldehyde with the compound of formula (j) preferably being carried out at a temperature in the range of from -15 to +5 C, preferably from -12 to 25 +3 C, more preferably from -10 to 0 C, preferably in dichloromethane as solvent, and preferably in the presence of a catalytical amount of an acid, preferably acetic acid or propionic acid;
(b) reacting the compound of formula (i) with H2N-NH-CHO in a solvent, preferably dichloromethane, to obtain a compound according to formula (ii) O
NON
H O\NY
H
(11), wherein said reacting is preferably carried out in the presence of a molecular sieve, preferably having a pore diameter determined according to DIN 66131 in the range of from 0.3 to 0.5 nm (nanometre, 3 to 5 Angstrom), and wherein said reacting is preferably carried out at a temperature in the range of from -10 to +20 C, preferably from -5 to +5 C;
(c) separating the compound of formula (ii) from the reaction mixture obtained from (b) by solvent extraction, wherein prior to (c), a solvent exchange is preferably carried out;
(d) optionally reacting the compound of formula (ii) in a solvent, preferably at a temperature in the range of from 15 to 70 C, with a silylating agent comprising the residue -SiRRbbR to obtain a compound of formula (iii) O- SIRaaRbbRcc NON
H OWN/Y
H
(iii), wherein the residues Raa, Rbb and R,, may be the same or different and are preferably alkyl or aryl residues, more preferably alkyl residues having from 1 to 6 carbon atoms, preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and wherein the silylating agent is preferably hexamethyldisilazane, trimethylchlorosilane, bistrimethylsilylacetamide or a mixture of two or three of these compounds, more preferably bistrimethylsilylacetamide;
(e) reacting the compound of formula (ii) or reacting the compound of formula (iii) with a nucleophilic compound comprising a nucleophilic residue R1, the nucleophilic compound preferably being a Grignard compound R1MgX wherein X is preferably selected from the group consisting of Cl, Br, and I, and wherein R1 is preferably an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, in a solvent, preferably selected from the group consisting of toluene, tetrahydrofurane (THF), MTBE, and a mixture of THE and MTBE, to obtain a compound of formula (iv) O
~JNH
R O\N1-1-1 Y
H
(iv), wherein the nucleophilic compound is preferably CH3CH2MgCl, wherein the reaction with the nucleophilic compound is preferably carried out at a temperature in the range of from --80 to 0 C, preferably from -75 to -10 C, more preferably from -70 to -25 C;
(f) reducing the compound of formula (iv), preferably by hydrogenation, wherein preferably a solvent mixture comprising an alcohol comprising 1 to 4 carbon atoms, preferably methanol, ethanol, isopropanol, most preferably methanol, is employed, to obtain a compound of formula (1I1) with R = H
~NH
OH
wherein the hydrogenation is preferably carried out at a temperature in the range of from 15 to 35 C, preferably from 20 to 30 C, at a hydrogen pressure in the range of from 0.5 to 50 bar, preferably from Ito 20 bar, more preferably from 1 to 10 bar, in the presence of a precious metal containing catalyst, preferably a palladium containing catalyst, most preferably a Pd/C catalyst;
(g) optionally crystallizing the compound of formula (III) with R = H, wherein the compound of formula (III) is preferably crystallized from a mixture of MTBE
and cyclohexane (CHX);
(h) optionally recrystallizing the compound of formula (III) with R = H, wherein the compound of formula (III) with R = H is preferably recrystallized from isopropyl acetate;
(i) optionally reacting the optionally crystallized compound of formula (III) with R = H
in a solvent with a silylating agent comprising the residue -SiRaRbRc to obtain a compound of formula (III) with R = SiRaRbRG
O
HN NH
Rl \ SiRaRbR5 5 wherein the residues Ra, Rb and R,, are as defined above.
Ste 2 - Mixing and.reacting the compounds of formulae I IIa and/or IIb and III
As to step (2) of the present invention, the compounds of formulae (I), (IIa) and/or (IIb), preferably (IIb), and (III) can be mixed in any suitable order wherein each of said compounds can be employed as such or contained in at least one suitable solvent or in a suitable solvent mixture.
According to a preferred embodiment of the present invention, in a first step (2.. 1), the compounds of formulae (I) and (Ila) and/or (IIb), preferably (IIb), are mixed and at least partially reacted in a solvent to obtain a reaction mixture.
No particular restrictions exist concerning the solvent in which the reaction in step (2) and/or in step (2.1) is carried out. Preferably, the solvent is a polar aprotic solvent or a mixture of two or more thereof. More preferably, the at least one solvent is selected from the group consisting of dichloromethane (DCM), tetrahydrofurane (THF), methyl tetrahydrofurane (MeTHF), dimethyl formamide (DMF), acetonitrile (AN), an ester, preferably butylacetate (BuAc) or ethylacetate (EtAc), and a mixture of two or more thereof, preferably DCM or THE Especially preferably, the solvent is DCM.
As described above, it is particularly preferred to employ the compound of formula (Ila) and/or (IIb), preferably (IIb), contained in DCM. As to the compound of formula (I), it is conceivable to introduce it either as solid compound, as, for example, obtained according to step (bb) described above wherein the compound of formula (I) is re-crystallized, preferably from acetonitrile, or contained in a suitable solvent such as DCM.
According to a preferred embodiment of the present invention, the compound of formula (I) is introduced as solid compound obtained from step (bb) into the solution containing the compound of formula (IIa) or (IIb) wherein DCM is the most preferred solvent.
Preferably, the compound of formula (IIa) or (IIb) and the compound of formula (I) are employed in a molar ratio so that the compound of formula (IIa) or (IIb) is used in excess.
Preferably, said molar ratio is in the range of from greater than 1:1 to 1.3:1, more preferably from greater than 1:1 to 1.2:1, more preferably from 1.05:1 to 1.15:1 such as 1.1:1.
After step (2.1), it is preferred to add the compound of formula (III) to the reaction mixture obtained from step (2.1).
As to the compound of formula (III), it is conceivable to introduce it either as solid compound, as, for example, obtained according to step (h) described above wherein the compound of formula (III) is recrystallized, preferably from isopropyl acetate, or contained in a suitable solvent such as DCM, THE or, preferably, a mixture thereof.
According to a preferred embodiment of the present invention, the compound of formula (III) is introduced as solid compound obtained from step (h) into the reaction mixture obtained from step (2.1).
Preferably, the compound of formula (III) is employed, relative to the compound of formula (I), in a molar ratio so that the compound of formula (III) is used in excess.
Preferably, said molar ratio is in the range of from greater than 1:1 to 1.3:1, more preferably from greater than 1:1 to 1.2:1, more preferably from 1.05:1 to 1.15:1 such as 1.1:1.
The temperature under which the reaction in step (2) is carried out, is preferably in the range of from -20 to +40 C. More preferably, the reaction in step (2.1) is carried out at a temperature in the range of from -20 to +20 C, more preferably from -15 to 0 C, more preferably from -10 to -5 C. The reaction according to step (2.2) of the present invention is preferably carried out at a temperature in the range of from -20 to +40 C, more preferably, in a first reaction period, in the range of from -20 to 0 C, more preferably from -15 to 0 C, more preferably from -15 to -5 C, and, in a subsequent reaction period, in the range of from -5 to +40 C, preferably from 15 to 40 C, more preferably from 25 to 35 C, most preferably 30 C.
Generally, the compound of formula (IV) can be crystallized from at least one suitable solvent, for example, from acetonitrile. Preferably, according to the present invention, the compound of formula (IV) is crystallized directly from the reaction mixture.
For example, in a subsequent reaction period, the reaction mixture described above is preferably suitably 5 cooled to initiate crystallization of the compound of formula (IV), wherein the reaction mixture is preferably cooled to initiate crystallization and subsequently further cooled to a temperature in the range of from -10 to +5 C, more preferably from -5 to +5 C. Seed crystals may be added to initiate crystallization.
1o Therefore, the present invention relates to above-defined process comprising isolating the chiral compound of formula (IV) O RI
ri NH 0 (IV) from the reaction mixture obtained from (2).
15 As described, said isolating is preferably carried out by crystallization.
Further, it is also conceivable to isolate the compound of formula (IV) by chromatography.
From the reaction in step (2), the suitably isolated, preferably crystallized compound of formula (IV) is obtained.
After separation from its mother liquor, the crystallized compound of formula (IV) can be suitably washed at least once and optionally dried.
According to a preferred embodiment of the present invention, the compound of formula (IV) being a compound of formula (IVb), in particular being a compound of formula (IVd) as herein described, is crystallized directly from the reaction mixture preferably containing imidazol and a solvent such as preferably DCM, and by applying the above described reaction periods and conditions.
Surprisingly, it was found that in case the compound of formula (IVb), in particular the compound of formula (IVd) is directly crystallized from the reaction mixture in particular containing DCM and imidazole, the compound of formula (IVb), in particular the compound of formula (IVd) may crystallize as adduct compound of formula (IVd) : imidazole : DCM
for example as 1:1:1 adduct, wherein said adduct is obtained in at least one polymorphic form.
After separation from its mother liquor, the crystallized compound of formula (IVd) can be suitably washed at least once and optionally dried. The product can be recrystallized from DCM to give the same .1:1:1 adduct as described above, or from acetonitrile to give an 1:1 adduct with imidazole.
The procedure of crystallizing the compound of formula (IVd) as adduct directly from the reaction mixture as described above leads to an improved process, because it avoids the application of complex technical requirement, and it allows an easy isolation of the crystalline product moreover resulting in low amounts of impurities in the isolated product as well as in high yields of said product.
Depending on the specific crystallization conditions and/or the components contained in the reaction mixture, also other adducts are conceivable each possibly being present in at least one polymorphic form.
Thus, the present invention also relates to an optionally crystalline chiral compound of formula (IVa) o Rl F F C ' \ / H N R
NH
O CI
NON (IVa) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, Ri in particular being ethyl, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of-SiR,,RbR, and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and Re are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, with -R
preferably being -H or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R in particular being -H, and wherein said compound is most preferably a compound of formula (IVb) F OH
H N
NH
O r N~ F
(IVb).
According to an even more preferred embodiment, at least 95 %, preferably at least 97 %, more preferably at least 99 % of the molecules of said compound of formula (lVb) are present as compound of formula (IVc) O RI
NH
NON
(IVc) most preferably as compound of formula (IVd) O
OH
F O /-\ C H
NH
O "
NON (IVd).
1.5 According to an optional embodiment of the present invention, the reaction in step (2) can be carried out in the presence of an acid which is either employed in stoichion3etric or preferably employed in a substoichiometric amount. Typically, the acid used is at least partially soluble in the solvent or solvent mixture employed in step (2). Most preferably, the acid is trifluoroacetic acid (TFA) or para-toluenesulfonic acid (PTSA), with trifluoroacetic acid (TFA) being especially preferred.
However, as indicated, reacting in step (2) can be carried out in the absence of trifluoroacetic acid (TFA), preferably in the absence of trifluoroacetic acid (TFA.) or para-toluenesulfonic acid (PTSA), more preferably in the absence of an acid.
As described above, the process of the present invention, compared to known processes of 1o the prior art, in particular compared to known processes for the preparation of posaconazole, is characterized in that it is carried out in the absence of a compound of formula Cl-C(=O)-O-Ph (phenyl chloroformate), in particular in the absence of an ester of a halogenated formic acid. Thus, the use of mutagenic compounds is avoided which may be found in the final product or the pharmaceutical composition containing such product.
Step 3 - heating the mixture obtained from ste (2) According to a first preferred embodiment of the present invention, the reaction mixture obtained from step (2), without isolation of the compound of formula (IV) is subjected to a heating step (3).
Optionally, prior to heating, the solvent present in the reaction mixture obtained from step (2), can be exchanged by at least one further solvent. Preferably, the reaction mixture obtained from step (2) contains a solvent selected from the group consisting of dichloromethane (DCM), tetrahydrofurane (THF), methyl tetrahydrofurane (MeTHF), acetonitrile (AN), an ester, preferably butylacetate (BuAc) or ethylacetate (EtAc) and dimethylformamide (DMF), and a mixture of two or more thereof, preferably DCM
or THF, in particular DCM. If solvent exchange is carried out, the solvent described above are exchanged by a solvent allowing for the heating conditions of step (3) described in 3o detail hereinunder. Preferably, such solvent preferably used for heating in step (3) is selected from the group consisting of toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIBK), dioxane, hexamethyldisilazane (HMDS) and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
According to a second preferred embodiment, the compound of formula (IV) is suitably isolated after step (2), preferably by crystallization. As to this embodiment of the present invention, the isolated, preferably crystallized compound of formula (IV) is admixed with a suitable solvent prior to heating in step (3), wherein the solvent is preferably selected from the group consisting of toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIRK), dioxane, hexamethyldisilazane (HMDS) and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
The temperature to which such mixture is heated in step (3) is preferably in the range of from 40 to 150 C, preferably from 60 to 140 C, more preferably from 70 to 130 C.
Typical temperatures will be in the range of from 70 to 80 or from 80 to 90 or from 90 to 100 or from 100 to 110 or from 110 to 120 or from 120 to 130 C.
According to a preferred embodiment of the present invention, prior to heating according to step (3), the compound of formula (IV), either as contained in the reaction mixture obtained from step (2) with an optional subsequent solvent exchange as described above, or as contained in the mixture obtained from suitably isolating the compound of formula (IV) and admixing the isolated compound with a suitable solvent as described above, is admixed and reacted with a suitable silylating agent. Such admixing with a silylating agent is particularly preferably carried out if the residue -R as described above is -H, i.e, in case the respective hydroxyl group of the compound of formula (III) is employed in its non-protected form.
No particular restrictions exist as to such silylating agent. A conceivable silylating agent is, for example, a trialkylsilylhalide, more preferably a trialkylsilylchloride and/or a trialkylsilyliodide, in particular trimethylsilylchloride (TMSC1) and/or trimethylsilyliodid (TMSI). According to a preferred embodiment of the present invention, bis-trimethylsilylacetamide (BSA) is used as silylating agent. Optionally, in particular if BSA
is used, reaction of the compound of formula (IV) with the silylating agent is performed in the presence of a suitable acid, preferably a Lewis acid, more preferably a silicon-containing Lewis acid, in particular trimethylsilyl iodide (TMSI).
Relative to the compound of formula (IV), the silylating agent is preferably employed in excess. Preferred molar ratios of the silylating agent relative to the compound of formula (IV) are in the range of from greater than 1:1 to 3:1, more preferably from greater 1.45:1 to 2.7:1, more preferably from greater 1.5:1 to 2.1:1, more preferably from 1.9:1 to 2.1:1, most preferably 2:1.
Relative to the compound of formula (IV), the acid, preferably the Lewis acid, is 5 preferably employed in substoichiometric amount. Preferred molar ratios of the Lewis acid, preferably TMSI, relative to the compound of formula (IV) are in the range of from 0.05 to less than 1:1, preferably from 0.1 to 0.5, more preferably from 0.15 to 0.25, most preferably 0.2.
1o As mentioned above, in case the most preferred compound CDI is employed, the compound of formula (IV) as obtained after solvent exchange or after crystallization and admixing with solvent will typically contain imidazole, generally in the range of from 1 to 10 wt.-%, preferably from 2 to 10 wt.-%, more preferably from 4 to 10 wt.-%, more preferably from 6 to 10 wt.-%. According to an especially preferred embodiment of the 15 present invention, imidazole is added to the compound of formula (IV) in order transform the compound of formula (IV) to the compound of formula (V). Therefore, since imidazole is already contained in the compound of formula (IV) due to the use of CDI, only a lesser amount of imidazole has to be added. At this stage, imidazole is added in amount so that, relative to the compound of formula (IV), imidazole is present in excess wherein preferred 20 molar ratios of imidazole relative to the compound of formula (IV) are in the range of from 2:1 to 10:1, more preferably from 4:1 to 9.5:1, more preferably from 7:1 to 8:1, most preferably 7.5:1.
Most preferably, imidazole is added prior to admixing the compound of formula (IV) with 25 the silylating agent as described above.
From the compound of formula (IV), after heating in step (3), preferably after addition of imidazole, and optionally after addition of the silylating agent, the compound of formula (V) is obtained, preferably contained in a solvent selected from the group consisting of 30 toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIBK), dioxane, hexamethyldisilazane (HMDS) and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
Step (4) - extracting the compound of formula (V) According to a further preferred embodiment of the present invention, the compound of formula (V) contained in above-mentioned solvent is subjected to suitable solvent extraction.
For solvent extraction, an aqueous acid is preferably used as extracting agent wherein said aqueous acid is preferably an aqueous inorganic acid and more preferably aqueous hydrochloric acid. The concentration of the aqueous inorganic acid, preferably the aqueous to hydrochloric acid, is preferably in the range of from 5 to 15 wt.-%. The temperature under which the extracting agent is added is preferably in the range of from 10 to 50 C, preferably from 20 to 40 C. The thus obtained layers are separated.
Preferably, the acidic aqueous layer which contains the compound of formula (V) is is subjected to a further solvent extraction wherein at least one suitable organic solvent, in particular DCM is used. The pH of the thus obtained aqueous layer is preferably adjusted to a value in the range of from 0.8 to 1.5, preferably from 1 to 1.2 using a suitable amount of at least one suitable base, preferably an inorganic base, more preferably an inorganic hydroxide, more preferably an aqueous sodium hydroxide solution. The thus obtained 20 layers are separated.
Preferably, the organic layer thus obtained which contains the compound of formula (V) is subjected to a suitable washing treatment. Every conceivable washing agent or combination of washing agents can be used. According to a preferred embodiment of the 25 present invention, the organic layer is washed with an acid, preferably an inorganic acid, more preferably hydrochloric acid, more preferably aqueous hydrogen chloride, and further washed with a base, preferably an inorganic base, more preferably an alkali hydrogen carbonate, more preferably sodium hydrogen carbonate. Preferably, the organic layer is first washed with the acid and subsequently washed with the base. The thus obtained layers 3o are separated.
Preferably, the organic layer thus obtained and containing the compound of formula (V) is suitably concentrated in one, two or more individual concentration steps wherein between two subsequent concentration steps, at least one solvent such as acetone or methanol, 35 preferably acetone can be added.
The finally obtained concentrated organic layer is preferably admixed with water at a temperature which is preferably in the range of from 15 to 40 C, more preferably from 20 to 30 C. Optionally, the thus obtained suspension may be subjected to a treatment with a suitable porous material to remove remaining impurities. Among others, charcoal may be mentioned as such suitable material.
After solvent extraction and preferred post-treatment steps as described, the preferred resulting suspension contains the compound of formula (V) in solution. The compound of formula (V) is preferably suitably separated from the above-mentioned suitable porous material, for example via filtration. The filter cake preferably containing above-mentioned suitable porous material such as charcoal is preferably washed with a suitable solvent or solvent mixture. Suitable washing agents are, for example, mixtures of acetone or methanol with water. The filtrate and the washing liquids, containing the compound of formula (V), are preferably combined.
According to a preferred embodiment, the compound of formula (V) preferably contained in the combined filtrate and washing liquids, is suitably crystallized in step (5) of the present invention and optionally separated from its mother liquor in a step (6) of the present invention.
Step (5) --- crystallizing the compound of formula (V) According to step (5), the compound of formula (V) is suitably crystallized in a solvent or in a mixture of two or more solvents.
No particular restrictions exist concerning the solvent provided that the compound of formula (V) can be crystallized. Preferably, crystallizing in (5) is carried out in a solvent which is selected from the group consisting of alcohols, preferably methanol, ethanol, n-propanol, iso-propanol, ethers, preferably THF, ketones, preferably acetone, acetonitril, and a mixture of two or more thereof, most preferably admixed with water, the solvent most preferably being methanol admixed with water or acetone admixed with water.
Depending on the solvent or solvents used, the temperature at which crystallization is carried out in step (5) is preferably in the range of from -20 to +90 C, more preferably from -10 to +70 C, more preferably from 0 to 50 C, more preferably from 10 to 40 C.
Optionally, seed crystals of the compound of formula (V) can be added.
According to a particularly preferred embodiment of the present invention, crystallization is performed in two or more steps, preferably in three or more steps. In an especially preferred first step, water is added, preferably to the combined filtrate and washing liquids as described above. The temperature at which this first step is carried out is preferably in the range of from 10 to 50 C, more preferably from 20 to 40 C. In an especially preferred second step, seeding crystals of the compound of formula (V) are added and the resulting mixture is stirred, preferably at a temperature in the range of from 10 to 50 C, more preferably from 20 to 40 C. In an especially preferred third step, water is added and the resulting mixture is stirred, preferably at a temperature in the range of from 10 to 50 C, more preferably from 20 to 40 C. In an especially preferred fourth step, the stirred mixture is cooled to a temperature below 20 C, preferably to a temperature in the range of from 0 to less than 20 C, more preferably from 10 to less than 20 C.
Step 6 - separating the crystallized compound of formula V
The crystallized compound thus obtained is optionally suitably separated from the solvent or solvent mixture in step (6) of the present invention. Suitable separation is preferably carried out by filtration. The separated crystallized compound of formula (V), preferably contained in the filter cake obtained from filtration, is preferably washed with a suitable solvent or solvent mixture. Suitable washing agents are, for example, mixtures of methanol, ethanol, n-propanol, iso-propanol, ethers, preferably THF, ketones, preferably acetone and acetonitrile with water. The temperature of the washing agents is preferably in the range of from 0 to 10 C, more preferably from 0 to 5 C.
The separated and preferably washed crystallized compound of formula (V) is preferably dried at suitable conditions. Drying of the crystallized compound of formula (V) is preferably carried out at a temperature of at most 50 C, preferably of at most 45 C at a pressure of preferably at most 500 mbar, more preferably of at most 100 mbar, more preferably of at most 75 mbar, more preferably at most 50 mbar.
According to the present invention, it was found that generally, there is no need to further purify the thus obtained crystallized compound of formula (V) by tedious processes taught in the art, in particular by chromatography, and that said crystallized compound of formula (V) can be used without further purification, in particular as antifungal agent. Therefore, the present invention relates to above-defined process wherein the crystallized compound obtained from (5) or (6) is not subjected to a subsequent chromatography purification stage.
Thus, the present invention also relates to a composition which is especially preferably obtained or obtainable after step (5) or step (6) of the present invention, said composition comprising, preferably essentially consisting of a preferably crystalline chiral compound of formula (Va) R
O
OH
F F N % N- N
O
NN-' (Va) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, said composition preferably comprising a compound of formula (Vb) OH
N
N
ON (Vb) wherein preferably at least 95 %, more preferably at least 97 more preferably at least 99 % of the molecules of said preferably crystalline compound are present as isomer of formula (Vc) Rl F F OH
N-~
(Vc) preferably as isomer of formula (Vd) O
F F N N OH
N
O
NN
(Vd), said composition containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve) ~ O-R
F / \ O ~~\ // / N N f---r \ I ~N
1, O
N~ 'N
5 (Ye) preferably of a compound of formula (Vf) RI
N
NN II
wherein -R is -CH2-C6H5, -R preferably being selected from the group consisting of -SiRaRbRc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb 10 and R, are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, -R more preferably being a hydroxyl protecting group. The term "essentially consisting of' as used in this context of the present invention relates to such compositions of which at least 99.9 wt.-%, more preferably at least 99.99 wt.-% consist of the compound of formula (Va), relative to the total content 15 with respect to the compounds of formula (Va) and (Vt).
Therefore, due to the novel advantageous process of the present invention, a composition as defined above can be provided which is free of benzyl-protected compound of formula (V). Especially preferably, a composition is provided which contains crystallized posaconazole which is free of benzyl-protected posaconazole.
According to above-defined process according to which posaconazole is prepared, usually a specific polymorphic form or a mixture of two or more polymorphic forms is obtained. If desired, this (crude) posaconazole can be re-crystallized at least once to give only one of these polymorphic forms or to give another polymorphic form or a mixture of two or more other polymorphic forms.
Preferably, according to the present invention, the crude posaconazole as described above is re-crystallized in a first step. Re-crystallization is especially preferably carried out from a mixture of acetone and water or from methanol as described in example 6 of US 6958337.
A solvent-mediated solid phase transformation gives posaconazole of polymorphic form IV as described in WO 2010/000668. According to a preferred embodiment, the product obtained after re-crystallization as described above is stirred in a mixture of methanol and water in the preferred presence of seed crystals of posaconazole form IV to a temperature in the range of from 40 to 45 C for a time in the range of from 4 to 48 hours. The obtained posaconazole of polymorphic form IV is suitably separated, preferably by filtration. The isolated product posaconazole of polymorphic form IV is preferably dried at suitable conditions. Drying is preferably carried out at a temperature of at most 45 C, preferably of at most 40 C at a pressure of preferably at most 500 mbar, more preferably of at most 100 mbar, more preferably of at most 75 mbar, more preferably at most 50 mbar, more preferably in the range of from 30 to 40 mbar.
Therefore, the present invention also relates to the above-defined process, wherein the crystallized compound obtained from (5) or (6), in particular the compound of formula (Vb) O
OH
N N fy N
O
NON
(Vb) wherein preferably at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said crystalline compound are present as isomer of formula (Vd) F 0 O /- /-\ % \/ OH
N
O
NON
(Vd), is re-crystallized, preferably from a mixture of acetone and water or from methanol, and is subsequently stirred in a mixture of water and methanol, preferably in the presence of seed crystals, said seed crystals comprising the crystalline compound of formula (Vd) in the form of polymorph IV.
to The antifungal agent according to the present invention, or obtainable or obtained according to the process of the present invention may be suitably contained in a pharmaceutical composition, in particular for treating fungal infections. Such pharmaceutical compositions typically comprise an antifungally effective amount of the antifungal agent, preferably posaconazole, in particular posaconazole of polymorphic form IV. In particular, the pharmaceutical compositions according to the present invention contain the above-defined composition which is especially preferably obtained or obtainable after step (5) or step (6) of the present invention or after re-crystallization and/or solid phase transformation as herein described, said composition comprising, preferably essentially consisting of a preferably crystalline chiral compound of formula (Vb) and containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve).
In addition to the antifungally effective amount of the antifungal agent, the pharmaceutical composition of the present invention preferably contains at least one pharmaceutically acceptable additive. Any pharmaceutically acceptable additive can be employed as long as it does not detrimentally affect the properties of the pharmaceutical composition. Examples of typical pharmaceutically acceptable additives are described, for example, in WO 2010/000668 Al, on page 13, lines 13 to 23, the respective disclosure being incorporated herein by reference. Other suitable pharmaceutically acceptable additives are described e.g. in Remington's Pharmaceutical Sciences, 15th Ed., Mack Publishing Co., New Jersey (1991).
The pharmaceutical compositions of the invention can be produced in a manner known per se to the skilled person as described, for example, in Remington's Pharmaceutical Sciences, 15th Ed., Mack Publishing Co., New Jersey (1991).
The pharmaceutical composition according to the present invention may be a solid or liquid. In this context, reference is made to WO 2010/000668 Al, page 13, lines 28 to 36, the respective disclosure being incorporated herein by reference. The pharmaceutically acceptable additive can also be an encapsulating material. In this context, reference is made to WO 2010/000668 Al, page 14, lines Ito 6, the respective disclosure being incorporated herein by reference.
Formulations containing the antifungal agent of the present invention, preferably the composition of the present invention, may be topical formulations normally containing one or more non-toxic, pharmaceutically acceptable topical carriers, or other formulations such as those typically described for posaconazole. In this context, reference is made to WO 2010/000668 Al, page 14, lines 8 to 19, the respective disclosure and also the patent documents cited therein being incorporated herein by reference.
Therefore, the present invention relates to a pharmaceutical composition for treating fungal infections comprising an antifungally effective amount of a composition as defined above and a pharmaceutically acceptable carrier therefore.
In particular for these cases wherein the antifungal agent prepared according to the present invention is posaconazole, the agent, in particular the above-defined composition, can be used as a medicament to treat or prevent any of the disorders which can be treated or prevented by posaconazole. In particular, it can be used for treating or preventing fungal infections, especially in mammals, such as humans. Thus, a method of treating or preventing a fungal infection by administering a therapeutically effective amount of above-defined composition to a patient in need thereof is also contemplated, as well as the above-defined composition for use in a method of treating or preventing fungal infections in mammals in need of such treating or preventing such infections. The above-defined composition is suitable for treating or preventing a wide range of infections caused by fungal pathogens, including yeasts, dermatophytes and molds. Typical fungal infections which can be treated are disclosed in WO 2010/000668 Al, on page 11, line 29 to page 12, line 5, the respective disclosure being incorporated herein by reference.
Therefore, the present invention relates to the use of above-defined composition for use as a medicament. Further, the present invention relates to the use of above-defined composition for the preparation of a medicament for treating or preventing fungal infections in mammals in need of such treating or preventing such infections.
As indicated hereinabove, the present invention is, among others, characterized in that for the preparation of the compound of formula (IV), preferably the compound of formula (V), more preferably posaconazole, even more preferably posaconazole contained in above-defined composition which is essentially free of the compound of formula (Ve), the compound of formula (Ile) is employed. The advantages of the use of this specific compound are explained throughout the present invention hereinabove.
Therefore, the present invention also relates to the use of a compound of formula (Ile) N N
N L_ ,N
~/ (IIc) for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb) F F 0- N /-\ % \ / N ~~ry N
NN l' (Vb), most preferably for the preparation of a preferably crystalline compound of formula (Vd) O
F F N/'~N-O-N OH
N
O
N-~
NON
(Vd).
Also, the present invention relates to a method for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb), 5 most preferably for the preparation of a preferably crystalline compound of formula (Vd), wherein a compound of formula (Ile) is employed.
Generally, the present invention also relates to a chiral compound which is obtainable or which is obtained according to a process of the present invention comprising steps (1.1) to 10 (2), or comprising steps (1.1) to (3), or comprising steps (1.1) to (4), or comprising steps (1.1) to (5), or comprising steps (1.1) to (6), preferably comprising steps (1.1) to (2) or comprising steps (1.1) to (5) or (1.1) to (6).
The present invention is illustrated by the following examples.
Examples Example 1: Synthesis of the compound of formula (B) (Exl.a) Preparation of the compound of formula (BB) with L = Cl F
CI
F (BB) In 20 ml of MTBE, 3.8 g of Mg were suspended. The temperature of the suspension was 55 C. Then, 0.5 g of Grignard reagent (CH3)3Si-CH2MgCI in MTBE from a previous batch were added in order to dry the system (if no such Grignard reagent is available for the first batch, (CH3)3Si-CH2MgC1 in diethyl ether (CAS Registry Number: 13170-43-9) commercially available as 1.0 M solution from Sigma-Aldrich, can be used), followed by 1.0 ml of chloromethyl trimethylsilane (CM-TMS; CAS Registry Number: 2344-80-1;
commercially available from Sigma-Aldrich). Then, a solution of 14 ml of the CM-TMS in 43 ml of MTBE was added slowly over a period of 2 hours at a temperature of 55 C. The mixture was stirred for 2 hours at 55 C and then cooled to a temperature of -10 C.
Subsequently, 10.0 g of the commercial compound of formula (AA) with L=Cl (CAS
Registry Number: 51336-94-8; commercially available from Sigma-Aldrich) in 30 ml of MTBE were added and the temperature was kept in the range of from 0 to -10 C.
The reaction mixture was quenched in a 20 % (w/v) aqueous solution of ammonium chloride.
The obtained organic layer was washed with a 20 % (w/v) aqueous solution of ammonium chloride. The thus washed organic layer was then washed with water.
To the organic layer, 11.0 ml of concentrated sulphuric acid were added, and the temperature was kept at 25 to 30 C. Then, the reaction mixture was stirred at a temperature of from 45 to 50 C for 3 hours. Subsequently, the reaction mixture was cooled to 20 C and 25 ml of water were added, and the organic layer was separated. The obtained organic layer was extracted with a 9 % (w/v) aqueous solution of sodium bicarbonate, followed by washing with water. The solvents of the washed organic layer were removed by distillation under reduced pressure, and the title compound was obtained as an oil. The yield was 9.4 g, corresponding to a theoretical value of 95 %.
(Exl.b) Preparation of the compound of formula (CC) with R11 = R22 = CH2CH3 O OEt F
OEt O
F (CC) 10.0 g of the compound of formula (BB) as oil, as obtained according to (Ex1.a) were dissolved in 20 ml of DMSO under stirring. Then, 3.2 g of NaOH flakes and 24.0 ml of diethyl malonate were added. The resulting suspension was stirred for 5 hours at 25 to C. Subsequently, 100 ml of water were added, and the resulting mixture was stirred for 30 min. The thus obtained solution was extracted with 80 ml of cyclohexane at 25 to 30 C. After separation of the layers the aqueous layer was extracted with 40 ml of 30 cyclohexane at 25 to 30 C. The combined organic layers were washed with a 5% (w/v) aqueous solution of NaOH, followed by washing with water. After washing, the solvents of the organic layer were removed by distillation under reduced pressure and the title compound was obtained as an oil. The yield was 15.0 g, corresponding to a theoretical value of 90.0 %.
(Ex1.c) Preparation of the compound of formula (DD) OH
F
OH
F (DD) 10.0 g of the compound of formula (CC) as oil, as obtained according to (Exl.b), were dissolved in 120 ml of isopropyl alcohol and 13.0 ml of water under stirring at 25 to 30 C.
The resulting mixture was cooled to a temperature of from 0 to -5 C. Then, 2.3 g of lithium chloride and 2.1 g of sodium borohydride were added at 0 to -5 C. The resulting suspension was stirred at 25 to 30 C for 20 hours. The pH of the stirred mixture was adjusted to a value of 1 (measured by using a calibrated pH meter) by addition of 4 N
aqueous HCI. Afterwards, a 20 % (w/v) aqueous solution of NaOH was added to adjust the pH to a value of 10 (measured by using a calibrated pH meter). The resulting mixture was stirred for 1 hour. Then, the lower aqueous layer was drained. From the separated organic layer, the isopropyl alcohol was distilled off, and an oil was obtained. To the oil, 100 ml of toluene and 100 ml of water were added, and the product was extracted into the toluene layer. The solvents of the resulting toluene layer were removed by distillation, under reduced pressure and the title compound was obtained as oil. The yield was 6.0 g, corresponding to a theoretical value of 82.0 %.
(Exl.d) Preparation of the compound of formula (EE) O
Y
/O
F
OH
F (EE) 10.0 g of the compound of formula (DD) as oil, as obtained according to (Exl.c), were dissolved in 80 ml of toluene and cooled to -15 C. Then, 7.4 g of sodium bicarbonate, 0.5 g of enzyme (Novo SP 435; Candida antarctica, Novozym 435 from Novo Nordisk), and 7.9 ml of isobutyric anhydride. were added. The resulting mixture was stirred at -15 C
for 24 hours. Then the solids were filtered off and the filtrate was washed with a 5 % (w/v) aqueous solution of sodium bicarbonate, followed by washing with water. The solvents of the resulting organic layer were removed by distillation under reduced pressure to obtain the desired product as an oil. This oil was dissolved in 40 ml of n-heptane at 50 to 60 C.
The clear solution was gradually cooled to a temperature of 10 C. The compound of formula (EE) crystallized as colorless crystals. The obtained solids were filtered, and the wet filter cake was washed with 20 ml of n-heptane. The filter cake was then dried at 40 C
in vacuo and the title compound was obtained as colorless crystals. The yield was 9.2 g, corresponding to a theoretical value of 70.0 %.
(Ex1.e) Preparation of the compound of formula (FF) with Hal = I
O
F F O ~-X
O
(Pp) 10.0 g of the crystals obtained in (Ex1.d) were dissolved in 80 ml of ethyl acetate under stirring. The resulting solution was cooled to -15 C, and 21.5 g of iodine and 7.0 g of sodium bicarbonate were added. The obtained suspension was stirred at -15 C
for 5 hours.
The reaction mixture was quenched in 200 ml of a 10% (w/v) aqueous solution of sodium sulphite. The organic layer was washed with 100 ml of a 10% (w/v) aqueous solution of sodium sulphite, followed by washing with water. The solvents of the thus obtained, washed organic layer were removed by distillation under reduced pressure to obtain the title compound as an oil. The yield was 13.5 g, corresponding to a theoretical value of 95.0%.
(Exl.f) Preparation of the compound of formula (GG) 10.0 g of the compound of formula (FF) as oil, as obtained according to (Ex1.e), were 3o dissolved in 80 ml of DMSO under stirring. Then, 10 g of the sodium salt of 1,2,4-triazole were added at 25 to 30 C, and the resulting reaction mixture was stirred for 24 hours at 85 to 90 C. The mixture was then cooled to 25 to 30 C, and 25 ml of 5 % (w/v) aqueous solution of sodium hydroxide were added. The mixture was then stirred for 3 hours at 25 to 30 C. 100 ml of water were added, and the product was extracted into 150 ml of methyl tetrahydrofuran. The thus obtained organic layer was washed with a 10 % (w/v) aqueous solution of sodium chloride, and subsequently the solvents of the resulting separated organic layer were removed by distillation under reduced pressure to obtain the title compound of formula (GG) F F OH
O
NN~
(GG) as a crude oil. The yield was 6.0 g, corresponding to a theoretical value of 86.0 %.
(Exl.g) Preparation of the HC1 salt of compound (GG) 10.0 g of the compound of formula (GG) as crude oil as obtained in (Exl .f) were dissolved in 200 ml of acetone under stirring at 30 to 40 C. The resulting solution was cooled to 25 to 30 C. Then, HC1 in MTBE (10 wt.-%) was added over a period of 15 min at 25 to 30 C. The solid crystallized when the mixture was stirred for 15 min. Then, 200 ml of MTBE were added slowly over a period of 30 min. The suspension was cooled to 0 to -5 C and stirred for 2 hours. The product was filtered, and the wet cake was washed with ml of MTBE. After drying at 70 C in vacuo, the HCl salt of the compound (GG) was 20 obtained as colourless solid. The yield was 9.5 g, corresponding to a theoretical value of 85.0 %.
The HCl salt of compound of formula (GG) was obtained as mixture of the cis-isomer with the respective trans-isomer with a cis:trans ratio of 9:1.
(Exl.h) Preparation of an HC1 salt of the compound of formula (GG) with solid extraction, using MIRK and n-butanol as solvent mixture 20.0 g of the crystalline HCl salt of the compound of formula (GG) containing the HCl salt of the cis-isomer of formula (GGa) F F OH
NN II
(GGa) and the HCl salt of the trans-isomer of formula (GGb) F F -OH
O
(GGb) with a cis:trans ratio of 9:1 (60 mmol) obtained as described above in (Exl.g) were 5 suspended in a mixture of n-butanol (50 ml) and MIBK (50 ml). The mixture was heated to 60 C, and this temperature was maintained for a period of 2 hours.
Subsequently, the mixture was cooled to room temperature. The obtained solid was filtered off and washed with a small amount of diethyl ether.
1o This solid (14.55 g, 43.9 mmol) was re-suspended in a mixture of n-butanol (36.4 ml) and MIBK (36.4 ml). The mixture was heated to 60 C, and this temperature was maintained for a period of 2 hours. Subsequently, the mixture was cooled to room temperature.
The obtained solid was filtered off and washed with a small amount of diethyl ether.
15 After drying under vacuum at 45 C, the HCl salt of compound of formula (GG) was obtained as colorless crystalline solid with an overall yield of 66 % over 2 steps, corresponding to 10.75 g. The crystals showed Wringing under the microscope.
The HC1 salt of compound of formula (GG) contained the HCl salt of the cis-isomer and 20 the HC1 salt of the trans-isomer with a cis:trans ratio of 99.2 : 0.8, as determined by HPLC.
HPLC Method for determination of purity and cis/trans ratio:
Principle Determination by HPLC using UV detector Potassium dihydrogen Merck Cat. No. 60487305001730 phosphate Orthophosphoric acid AR Grade e.g (Merck, Cat No Reagents and (85 %) 61768205001046) Equipment Acetonitrile HPLC grade (e.g. Merck Cat. No.
61830025001046) HPLC system Agilent 1100 series or similar pH meter e.g. Metrohm or equivalent Dissolve 2.72 g of Potassium dihydrogen phosphate in 1000 ml of Buffer Preparation water and adjust the pH to 3.0 0.05 by adding dilute orthophosphoric acid (85 %) using a pH meter. Filter through 0.45 m (micrometer) filter and degas.
Diluent Buffer: Methanol (80: 20) v/v Chromatographic Conditions Column C16, 250 mm X 4.6 mm i.d.5 p, e.g. Ascentis RP amide or equivalent column can be used after appropriate validation.
System. Gradient Column Temperature 40 C
Mobile phase A Buffer Mobile phase B Buffer: Acetonitrile (30: 70) v/v Flow rate 2.0 ml/min Injection temperature 25 C
Injection volume 25 l (microliter) Run time 45 minutes Detection wavelength 210 nm System Gradient Time % mobile phase B
Gradient program 25 80 The X-ray powder diffraction pattern (XRD) of this compound of formula (GG) is shown in Fig. 3.
5 Method for the recording ofX-ray diffractogr^ams:
The samples were analyzed on the Zero background holder in spinning mode at ambient conditions. A typical precision of the 2-Theta values is in the range of about 0.2 2-Theta. Thus a diffraction peak that appears at 8.6 2-Theta can appear between 8.4 and 8.8 2-Theta on most X-ray diffractometers under standard conditions.
Instrument Parameters:
XRD Measurement Conditions:
Instrument X'PERT PRO PANalytical Scan Axis Gonio Start Position [ 2Th.] 3.0 End Position [ 2Th.] 40.0 Step Size [ ] 0.0170 Scan Step Time [s] 100 Scan Type Continuous Anode Material Cu Generator Settings 45 kV, 40 mA
Spinning Yes Incident Beam Optics:
Soller Slits 0.02 radians Divergence Slit Type Programmable Slits (Fixed 0.5 ) AntiScatter Slits Fixed Slits (1 ) Beam Mask 10 mm (MPD/MRD) Diffracted Beam Optics:
Antiscatter Slit Programmable Slits (Fixed 0.5 ) Soller Slits 0.02 radians Filter Nickel Detector X'celerator Mode Scanning Active Path Length 2.122 (Exl.j) Synthesis of the compound of formula (B) A suspension of 292.0 g of the compound of formula (GG) obtained according to (Exl.h) above (MW: 331.75 g/mol; 0.88 mot, d. r. > 99:1; 1.0 equiv.) in 2.92 L of CH2C12 was prepared at a mass temperature of 12 + 3 C. To this, 142.5 g of Et3N (MW:
101.19 g/mol, 195.9 mL, 1.41 mol, 1.6 equiv.) were added slowly at 22 8 C within 60 min.
The mixture was cooled to a mass temperature of 12 3 C and 129.5 g of DMAP (4-dimethylamino-pyridine; MW: 122.17 g/mol; 1.06 mol, 1.2 equiv.) were added in one portion. Subsequently, 185.0 g of TsCl (tosyl chloride; MW: 190.65 g/mol; 0.97 mol;
1.1 equiv.) were added in at least five portions at a mass temperature of 22 8 C within 60 min. By the last addition, the mass temperature was adjusted to 25 E 3 C
and stirring of the pink suspension was continued for further 3 h at 25 3 C. The reaction mixture was extracted with 1.46 L of aq. 10 % HCl at 25 + 3 C followed by 1.46 L of aq. 9 % NaHCO3 at 25 3 C followed by 1.46 L of H2O. The organic layer was concentrated to approx.
20 % of its original volume at 25 + 3 C under reduced pressure, To the concentrate, 5.83 L of heptane (25 -L 3 C) were added slowly at 25 3 C within 60 min.
The resulting suspension was cooled to 2 3 C and stirring was continued for 60 min. The solid was filtered off and washed with 2 x 1.46 L of heptane (25 + 3 C). The product was dried under reduced pressure < 50 mbar) at 40 C over night until a level of S 0.1 % of DCM
was achieved.
372.8 g of the compound of formula (B) (0.83 mol, 94 % yield "as is") were obtained.
The product contained the compound of formula (B), the cis-isomer F F O-Tos O
Nil IN
(B) and the trans-isomer F F ~O-Tos NN "
N
with a cis:trans ratio of 99.2 0.8.
Example 2: Synthesis of the compound of formula (fa) A solution of 297 mg of BHT (butylated hydroxytoluene; M = 220.35 g/mol; 1.35 mmol;
500 ppm) and 727 g of the compound of formula (A) (A) (MW: 269.35 g/mol; 2.698 mol; 1.0 equiv.; obtainable, for example, according to example 1 of EP 1 230 231 B1 (on page 4)) in 4.7 L of DMSO was prepared at a mass temperature of 30 + 2 C. To this was added a solution (30 2 C) of 161.9 g of NaOH (MW:
40.0 g/mol, 4,047 mol, 1.5 equiv.) in 161.9 g of oxygen-free H2O upon keeping the mass temperature at < 32 C. The mixture was stirred for 10 min at 30 + 2 C. Then, a solution (30 2 C) of 1335 g of the compound of formula (B) contained in the product as obtained according to Example 1 (Exl.j) above F F O-Tos O
NN II
(B) (12.968 mol = 1.1 equiv., MW= 449.48 g/mol) in 6.6 L of DMSO was added at amass temperature of < 32 C within 10 min. The pH of the reaction mixture was checked after a reaction time of 60 min and at least also after 5 and 8 hours. After stirring for 60 to 90 min 5 at 30 2 C the crystallization of the product started. The dark brownish, thin suspension was stirred for 10-15 hat 30 2 C. At minimum agitation rate, the addition of 21.8 L of H2O was started at 30 2 C and was carried out at a constant rate whereby the reaction temperature was allowed to rise simultaneously to 45 5 C. Then, the remaining water was added at a rate to keep the temperature at 45 5 C (overall addition time: about 60 1o min in total) . Subsequently, the suspension was cooled to 20 2 C in 60 min and stirred for further 60 min at 20 + 2 C. The resulting solid was filtered off and washed with 8.5 L
of cold 1 % oxygen-free aqueous NaOH (5-10 C), then 2 x 8.5 L of cold oxygen-free H2O
(15-10 C) followed by 2 x 8.5 L of isopropanol (22 3 C).
15 All operations being part of the following purification procedure were carried out under a positive nitrogen atmosphere.
The wet crude product (approx. 2.44 kg) in 72.7 L of acetonitrile was heated to reflux temperature. The mixture was refluxed for 10-15 minutes. To the resulting solution 116 g 20 of charcoal (Ceca Eno) were added and the suspension was stirred for 10 min at reflex temperature. The charcoal was filtered off and the filter cake was washed with 11.6 L of hot acetonitrile. Under stirring the yellow coloured filtrate was cooled to 20 + 2 C during 1 hour. Crystallization started at approx. 60 C. Under stirring the crystal suspension was cooled to 0 2 C over 30 min and stirred at this temperature for one hour.
The resulting 25 crystals were filtered off and washed with 6 L of cold acetonitrile (< 5 C).
The product was dried at < 75 C (preferred temperature 70 15 C) under reduced pressure < 55 mbar) until a level of < 1.4 % of residual water was achieved. 1180 g of the compound of formula (Ia) O
NON
(Ia) (MW: 546.63 g/mol; 2.18 mol, 80.0 % yield "as is") were obtained as a white to yellow crystalline powder.
Example 3: Synthesis of the compound of formula (lIla) O
NH
HN
JOH
(IIIa) Example 3.1: Synthesis of the compound of formula (ii) with Y = phenyl 1o a) 1.70 kg of nitrosobenzene (MW: 107.11; 15.9 mol; 1.0 eq.) were dissolved in 6.16 L
of DCM by stirring at 20-25 C under N2 atmosphere.
b) In a separate vessel, 2.76 kg propionaldehyde (MW: 58.08; density: 0.798 g/mL;
47.5 mol; 3.0 eq.) and 5.28 L of DCM were cooled to -6 to -4 C under N2 atmosphere. To the resulting mixture, 0.057 kg of glacial acetic acid (MW:
60.05;
density: 1.049 g/mL; 0.95 mol; 0.06 eq.) and 0.55 kg of D-proline (MW: 115.13;
4.75 mol; 0.3 eq.) were added, and a fine suspension was obtained.
c) To this suspension of b), 0.4 L of the nitrosobenzene solution obtained in a) were added. Onset of the reaction was indicated by discoloration of the suspension and a temperature rise up to +3 C within 1 min. Then, the remaining nitrosobenzene solution (about 7 L) of the nitrosobenzene solution obtained in a) were added at a rate to keep the reaction temperature between -5 and -3 C. The mixture gradually turned darker and resulted in a clear solution when addition was complete.
Stirring was then continued for 10 min, and complete conversion was determined using HPLC. The compound of formula (i) with Y = phenyl was obtained as intermediate with an enantiomeric purity expressed as enantiomeric excess (ce) > 98 %, i.e.
more than 99 % of the molecules of the chiral compound of formula (i) with Y =
phenyl were present as isomer of formula (ia) with Y - phenyl. Enantiomeric purity was determined analogously to the method described in Brown et al., J. Cher. Soc.
2003, 125 (36), 10808-10809 and using Chiralcel OD-H and n-heptane/isopropanol/diethylamine as eluent.
d) Subsequently, 8.8 L of DCM, 3.0 kg of a molecular sieve having pores with a diameter of 0.4 nm (4 Angstrom; commercially available from Aldrich), and 3.14 kg of formyl hydrazine (MW: 60.06; 52 mol; 3.3 eq.) were added at 0-5 C, leading to an increase in temperature. Stirring was continued at 0-5 C under N2 atmosphere.
After 3 hours, complete conversion was determined using HPLC.
e) The obtained solids were filtered and washed with 4.4 L of DCM. The solution was concentrated to 1/4 of its original volume at a bath temperature of < 10 C.
Then, 28 L of MTBE were added, and the resulting solution was reduced to 1/4 of its original volume by distillation at a bath temperature of < 10 C. The resulting organic layer was then diluted with 7 L of MTBE and extracted five times with of a 20 % aqueous sodium chloride solution. Then, 8.8 L of DCM were added for azeotropic removal of water, The resulting solution was concentrated to give 12 kg of a solution of the compound of formula (ii) with Y = phenyl in MTBE which contained 2.86 kg of said compound (MW 207.23; 80 % yield), f) This solution containing the compound of formula (ii) with Y = phenyl was used in the next step (Example 3.2) without further purification.
Example 3.2: Synthesis of the compounds of formula (iii) and (iv) with Y =
phenyl, and Rfl,, Rbb and Ree = methyl and R1= ethyl a) 0.887 kg of the compound of formula (ii) as obtained,according to Example 3.1 (MW: 207.23; 4.28 mol; 1.0 eq.), employed as a solution in MTBE (total weight 290 g) which contained about 2 wt.-% of H2O, were dried with 1.54 kg of a molecular sieve having pores with a pore diameter of 0.4 nm (4 Angstrom;
commercially available from Aldrich) at 20-25 C for 30 min. Thus, the water content was reduced to a value of less than 0.1 wt.-%. Then, the molecular sieve was removed by filtration and washed with 1.7 L of MTBE. The resulting solution was diluted with 16 L of MTBE. The water content of this solution was about 0.05 %
(0.5 mat; 0.12 eq.).
b) Then, 2.8 L of BSA (bistrimethylsilylacetamide) (MW: 203.43; density: 0.832 g/mL;
11.5 mol; 2.7 eq.) were added to the filtrate. The resulting solution was stirred at 20-25 C. After 1 hour, silylation was complete, as detected by 'H-NMR. The compound of formula (iii) with Y = phenyl and Raa, Rbb and R,,, = methyl was obtained as intermediate.
c) Then, the solution was cooled to -70 to -60 C, and 8.65 L of a solution of ethyl magnesium chloride in THE' (2 mol/l; MW: 88.82; density: 0.978 g/ml; 17.3 mol;
4.0 eq.) were added at a rate to keep the reaction temperature between -70 and -60 C.
This mixture was stirred for 1 hour at -60 C. Subsequently, the temperature was raised to -25 C, and stirring was continued. After 3 hours, complete conversion was detected by HPLC. The reaction was then quenched by dropwise addition of 5.5 kg of MeOH at a temperature of -25 C. During quenching, the mixture was allowed to warm up to 0-15 C.
d) The resulting organic layer was then extracted at 20-25 C twice with 30 L
of a 10 %
aqueous ammonium chloride solution and once with 30 L of a 20 % aqueous sodium chloride solution. The organic layer (20 kg) contained approximately 0.89 kg of the compound of formula (iv) with Y = phenyl and Rl = ethyl (MW: 237.30; 80 %
yield) and was used for the next step (Example 3.3) without further purification.
Example 3.3: Synthesis of the compounds of formula (III) with R = H and Rl =
ethyl, i.e. the compound of formula (IIIa) a) 0.89 kg of the compound of formula (iv) (MW: 237.30; 3.76 mol; 1.0 eq.), obtained according to Example 3.2 and used as a solution in MTBE (total weight 20 kg) was diluted with 1 L of MeOH at 20-25 C.
b) Then, 0.9 kg of palladium on carbon (Pd/C; 5 % Pd; 50 % water) were added, and the resulting solution was stirred vigorously at 20-25 C. Reduction reaction was carried out with 1 atm of H2. The vessel was evacuated and vented with 1 atm three times. After 1.5 hours of stirring under H2 atmosphere, complete conversion was detected by HPLC. Then, the suspension was filtrated and the catalyst washed with 1.8 L of MTBE/MeOH (1/1 v/v). The combined filtrates were concentrated to a yellow oil to yield the crude compound of formula (llla), containing about 40 %
(about 0.55 kg) of the compound of formula (IIIa).
c) This oil was diluted with 13.9 L of MTBE at 20-25 C, and the resulting solution was seeded. After 1 hour of stirring at 20-25 C, a fine suspension was obtained.
Then, 17 L of CHX (cyclohexane) were added, the mixture was cooled to 0 C and stirred at 0 C for 3 hours, resulting in a thick suspension of the compound of formula (IIIa).
The thus obtained crystals were collected and washed with 2.2 L of a cold (0 C) mixture of MTBE and CHX (1/1 v/v) to give 0.44 kg of the compound of formula (IIIa) after drying (MW 146.19; 80 % yield; 64 % yield with respect to the compound of formula (ii)). More than 99 % of the molecules of the chiral compound of formula (IIIa) were obtained as isomer according to formula (IIIb).
10.4 g of this yellow colored material were added to 50 mL of isopropyl acetate, and the resulting mixture was heated to a temperature of 85 to 89 C until a solution was obtained. 0.5 g of activated carbon were added to the yellow solution, and after stirring for several minutes, the hot mixture was filtered and allowed to cool to about 5 C under stirring. After stirring for 2 to 3 hours, the precipitated product was filtered, washed with 5 mL of isopropyl acetate and dried at room temperature under vacuum over night to give 8.54 g of the product as a off-white solid (melting point 78 to 80 C), i.e, the compound of formula (IIIa), wherein more than 99 % of the molecules of said compound were obtained as isomer according to formula (Illb).
Preparation of seeds used in this step c):
100 g of the crude oil obtained in step b) above were purified by column chromatography using 800 g silica gel 60 (0.063-0.200 mm, Merck) as stationary phase and DCM / methanol = 20 /1 as mobile phase. The fractions containing the desired product in pure form, as determined by TLC (Merck, silica gel 60 F254, mobile phase CHXlethyl acetate 1/1) , were collected. After evaporation of the solvents the obtained solid was recrystallized from diethyl ether. The resulting crystals were collected and used as seeds after drying (20 C, <100 mbar).
d) The IR spectrum and the X-ray diffractogram are shown in Figures 1 and 2.
Experimental data were obtained as follows:
The enantiomeric purity of the compound of formula (llla) as obtained in c) was measured by HPLC as follows:
Chromatography 5 HPLC apparatus: Agilent 1200 Column: Waters XBridge C18, 2.5 urn, 50 x 4.6 mm (order no. 186003090) System: gradient Eluent A: buffer solution pH 7.0 Eluent B; buffer solution pH 7.0 / acetonitrile = 2/8 (v/v) 10 Flow rate: 1.8 mL/min Oven temperature: 40 C
Injection volume: 10 p,L (microliter) Stop time: 20 min Detection: 2 (lambda) = 260 nm 15 Gradient:
t (min) 0 8 12 14 15 20 Buffer solution pH 7.0 prepared according to the following recipe: dissolve 7.0 mL of triethylamine in 900 mL of water, adjust the pH to 7.0 with H3P04 and dilute to 1000 mL
with water.
20 Reagent solution prepared according to the following recipe: dissolve 80 to 90 mg of (S)-(-)-a-methylbenzyl isocyanate in acetonitrile and dilute to 1.0 mL with acetonitrile.
Sample preparation:
a) Test stock solution prepared according to the following recipe:
25 Dissolve 3 8 to 42 mg of the substance to be tested, weighed accurately to 0.01 mg, in 1.0 mL of acetonitrile.
b) Test solution prepared according to the following recipe:
In. an HPLC vial, mix 100 jiL (microliter) of test stock solution and 100 uL
(microliter) of reagent solution. Keep at room temperature (20 to 25 C) for 30 min, add 800 L
30 (microliter) of buffer solution pH 7.0 and shake well. Then cool the solution on an ice bath (0 C) for additional 30 min (precipitation of reagent) and filtrate a sample through 0.2 4m (micrometer) directly into another HPLC vial.
Infrared spectra (IR.) data were collected on a MKII Golden GateTM Single Reflection Diamond ATR (attenuated total reflection) cell with a Bruker Tensor 27 FTIR
spectrometer with 4 cni 1 resolution at ambient conditions. To collect a spectrum a spatula tip of a sample was applied to the surface of the diamond in powder form. Then the sample was pressed onto the diamond with a sapphire anvil and the spectrum was recorded. A
spectrum of the clean diamond was used as background spectrum. A typical precision of the wavenumber values is in the range of about 2 cm 1. Thus, an infrared peak that appears at 1716 cm 1 can appear between 1714 and 1718 cm-1 on most infrared spectrometers under standard conditions.
X-ray data (powder diffraction pattern XRPD, X-ray diffraction pattern XRD, X-ray diffractogram) were collected on a Unisantis XMD 300 X-ray powder diffractometer with a position sensitive detector in parallel beam optics using the following acquisition conditions: tube anode: Cu , 40 kV, 0.8 mA; 3 - 43 theta/2theta;
simultaneous detection of regions of 10 per step with detector resolution 1024, counting time 300 seconds per step. Samples were measured at room temperature in a standard sample holder on a rotating sample spinner. A typical precision of the 2-theta values is in the range of about 0.2 2-Theta. Thus a diffraction peak that appears at 5.0 2-Theta can appear between 4.8 and 5.2 2-Theta on most X-ray diffractometers under standard conditions.
HPLC for determination of completion of conversion as mentioned in Example 3.1, c) and d), Example 3.2), c) and Example 3.3, b) was performed as follows:
Column: Zorbax Eclipse XDB-C18, 150*4.6 mm, 5 m (micrometer).
System: gradient Buffer: 2.10 g KH2PO4 + 4.28 g K2HPO4 / 2.0 L H2O, adjust with 85% H3PO4 to pH
6.5 Mobile phase A. 20 mM phosphate buffer pH 6.5 / acetonitrile, 85 / 15, v/v Mobile phase B: 20 mM phosphate buffer pH 6.5 / acetonitrile, 50 / 50, v/v Solvent: H2O / acetonitrile = 50 / 50 v/v Flow rate: 1.5 mL/min Oven temperature: 60 C
Injection volume: 5-20 L (microliter) Stop time: 3 0 min Detection: ?~, (lambda) - 210 nm (Agilent 1200 detector) Autosampler: 5 C
Gradient:
t [min] 0 20 25 26 30 % B 5 100 100 5 stop Sample Preparation:
Sample solution for HPLC in Example 3.1), c) was prepared according to the following recipe: dissolve approx. 100 L (microliter) of the reaction mixture in 0.2 mL
of isopropanol, add approx. 50 mg of NaBH4 and agitate for 10 min at 25 C.
Extract with 0.2 mL of ethyl acetate and 0.5 mL of a 5% KH2PO4 buffer (pH 7.0). Dilute 50 L
(microliter) of the resulting organic layer in a 10 mL volumetric flask and fill to the mark with solvent. Sample weights are adapted according to instrument requirements.
Sample solution for HPLC for Example 3.1 d Exam le 3.2), c) and Example 3.3), b) was prepared according to the following rec pe: dissolve approx. 100 pL of the reaction mixture in 2 mL of acetonitrile in a 20 mL volumetric flask and fill to the mark with solvent. Sample weights are adapted according to instrument requirements.
Example 4: Synthesis of the compound of formula (IVb) O
OH
NH
NN-32.63g carbonyldiimidazole (compound of formula (Ile), 1.1 eq, 201.2 mmol, Sinochem Jiangsu #090506) were dissolved under nitrogen atmosphere in 1300 mL DCM in a 2.0 L
Schmizo reactor and cooled to -10 C under permanent stirring.
Afterwards 100.0 g of the compound of formula (la) obtained according to Example 2 (1 eq., 182.9 mmol) were added and rinsed in with additional 300mL DCM. The reaction mixture was stirred at -10 C for 2 hours.
Subsequently, 30.76 g of the compound of formula (IIla) as obtained in Example 3 (1.1 eq, 201.23 mmol) were added and rinsed with 300 mL DCM. The reaction mixture was warmed to 30 C and afterwards stirred for 3 hours at this temperature.
Afterwards the reaction mixture was cooled to 25 C and the mixture was stirred at this temperature for 4 hours. Crystallization occured after 2.5 hours. The suspension then was cooled to 0 C and stirred for additional 15 hours at this temperature. The solid was isolated via vacuum filtration (time: about 15 min) and afterwards, the filtercake was washed two times each with 100 mL of ice cold DCM. The filtercake was dried (20-25 C, < 50 mbar) and afterwards, 129.2 g of the compound of formula (IVb) were isolated as a 1/1/1 crystallisate with imidazole and DCM (MED) (> 98.5 area% of the compound of formula (IVb) excluding imidazole, determined by HPLC as described below yield: 81.5 %). The ratio of the compound of formula (IVb) to imidazole and to DCM (MED) was detected via NMR.
At least 99% of the molecules of the compound of formula (IVb) were obtained as isomer of formula (IVd) F F ""I"I-0- _N // N_&N 'j~ N~ OH
NH
NON
(IVd).
The IR spectrum and X-ray diffractogram of the obtained compound of formula (IVb) are shown in Figures 4 and 5.
Infrared spectra (IR) data and X-ray data (powder diffraction pattern XRPD) were determined according to the methods as described in Example 3.
1H-NMR and 13C-NMR spectra of the obtained compound of formula (IVb) as obtained in Example 4 were collected. The following results were obtained:
'H-NMR (CDC13, 3 00mHz):
delta (ppm) = 0.93-1.02 (m, 3 H), 1.26 (m, 3 H), 1.45 (m, 1 H), 2.06 (m, 2 H), 3.22 (m, 8 H), 3.52-3.80 (m, 4 H), 4.11 (m, I H), 4.52 (d, J = 16Hz, 1 H), 4.64 (d, J -16Hz, 1 H), 5.30 (s, DCM (MED)), 6.74-6.93 (m, 8 H), 7.09 (s, 2 H), 7.29-7.39 (m, 3 H), 7.67 (s, 1 H), 7.79 (s, 1 H), 8.14 (s, 1 H), 8.22 (b, 1.5 H), 9.53 (b, 0.5 H) rotamers.
13C-NMR (CDCl3, 75mHz):
delta (ppm) 10.9, 19.7, 21.5, 37.4, 38.8, 49.9, 50.6, 55.9, 67.2, 68.9, 70.7, 84.0, 104.6 (t), 111.4 (q), 115.0, 116.9, 118.3, 122.0, 125.4 (q), 128.5 (q), 130.5, 131.1, 144.5, 145.8, 148.8, 149.0, 151.0, 152.8, 156.4, 157.4 (t), 160.7 (q), 164.3, 164.5.
HPLC Method for determination of purity of the obtained compound of formula (IVb):
Column: Zorbax Eclipse XDE-C18, Rapid Res., 4.6x 50mm, 1.8 m, flow: 1.5 mL/rnin wavelength: 210 urn Auto sampler: 5 C
oven temperature: 55 C
Eluent A: 20 mM Phosphate buffer pH 6.5 /acetonitrile 85/14 (v/v) Eluent B: 20 mM Phosphate buffer pH 6.5 /acetontrile 25/75 (v/v) Gradient: 0 min/29%B, 10 min/55%B, 12 min/100%B, 15 min/100%B, 15.1 min/29B, 17 min stop Samples Preparation:
The sample (7-10mg) was dissolved in a 1/1 mixture of acetontrile and water mixture, and in case of slow dilution ultra sonic bath was used to gain complete dilution.
Example 5: Synthesis of the compound of formula (Vb) N
NNN
50.0 g of the compound of formula (IVb) as obtained according to Example 4 above (1 eq, 57.39 mmol) were dissolved in 1600 mL isopropylacetate. To the suspension ,18.66 g imidazole (5.8 eq in total with the imidazole contained in the starting material, 332.8 mmol) and 20.83 g BSA (1.78 eq, 102.4 mmol, 25.0 mL) were added and the mixture was stirred for 45 min until a clear solution occurred.
Afterwards 4.30 g of TMSI solution in DCM containing 2.56 g TMSI (0.22 eq, 12.78 mmol) were added, and the reaction mixture was heated to reflux (89 C) and stirred at that temperature for 19 hours until complete conversion of the compound of formula (lVb) was observed.
The reaction mixture was added dropwise at a temperature between 50 - 60 C to 500 mL
5 10 % HCI. The aqueous phase was separated, and 750 mL DCM were added.
Afterwards the pH of the mixture was adjusted to 1.02 by the addition of about 225 mL of 20 % NaOH
solution. The organic phase was separated and washed with 500 mL 0.1 M HCl followed by a washing with 330 mL 5 % sodium bicarbonate solution. Afterwards the organic solvent was removed under reduced pressure (40 C, 600 - 20 mbar) leading to 50.71 g of to compound of formula (Vb) as a white solid.The solid was dissolved in acetone and afterwards 325 mL water were added. To the solution lOg charcoal (Ceca Eno) were added and the mixture was stirred for 30 min. Afterwards the charcoal was removed via filtration, the filter cake was washed with 300 mL of an acetone/water (5/1) mixture leading to a slightly yellow solution. The solution was warmed to 27 C and 1000 mL water were 15 added.
Subsequently 40 mg seeding crystals (obtained according to above-described process followed by purification by chromatography) were added and the mixture was stirred for 60 min leading to white slurry. Additional 500 mL water were added and the mixture was 20 stirred at 30 C for 30 min, cooled to 15 C and stirred at that temperature for 120 min.
Afterwards the white solid was separated via filtration (G3, d = 12 cm) and the filter cake was washed with 375 mL of an acetone/water (1/2) mixture. The isolated solid was dried under vacuum (< 45mbar) at 40 C for 16 hours leading to 32.57 g of the compound of formula (Vb) (46.48 mmol, 81.0 %, contents 98.9 %).
At least 99% of the molecules of the compound of formula (Vb) were obtained as isomer of formula (Vd) Il ox 1, 0 NN
(Vd).
HPLC Method for determination of the ratio of Vd to Vb:
Column: Daicel CHIRALCEL OD, 250 x 4.6 mm System: isocratic Eluent:Hexane / Ethanol / Diethylamine = 30 / 70 / 0.2 (v I v l v) Flow rate: 1.0 mLlmin Oven temperature: 3 9 C
Injection volume: 15 ..L
Stop time: 20 min Detection: 2 (lambda) = 260 nm (Agilent 1100 detector) Autosampler: 39 C
Solutions prepared according to the following recipe:
Dissolve 24 to 27 mg of the substance to be tested, weighed accurately to 0.01 mg, in solvent in a 25-mL volumetric flask. Fill to the mark with solvent and shake well.
Example 6: Preparation of polymorph form IV of the compound of formula (Vb) The product obtained in Example 5 was transformed to the polymorph form IV
which is described in detail in WO 20101000668.
10.0 g of the compound of formula (Vb) as obtained in Example 5 were added to 110 ml acetone, and the mixture was heated to reflux. 33 ml of water were added to the hot.
suspension and a clear solution was immediately obtained. The hot solution was filtered and allowed to cool to about 20 C within 45 min. After standing in a refrigerator at about 5 C for 17 hours the precipitated product was filtered and dried under vacuum to give 8.6 g of white needles. Said product was suspended in a mixture of 160 ml of water and 40 ml of methanol. 0.9 g of seed crystals Form IV were added. Said seed crystals were prepared as described in WO 2010/000668 Al, example 2, on page 23, lines 16 to 25, this disclosure being incorporated herein by reference, as well as the patent document US 6,958,337 cited therein. The suspension was heated to 40 C and stirred until the conversion to polymorphic form IV was completed. The white suspension was then cooled down to about 10 C and the solid was collected by filtration. After washing with 20 ml of water the product was dried at room temperature under vacuum to yield 9 g of the compound of formula (Vb), polymorphic form IV, as a white powder.
List of cited documents - Huang et al., Organic Letters 2004, 6 (25) 4795-4798 - M. Hepperle et. al Tetrahedron Lett. 2002, 43, 3359-3363 - US 6,355,801 B1 to - EP 1 230 231 B1 - US 5,403,937 - Remington`s Pharmaceutical Sciences, 15th Ed., Mack Publishing Co., New Jersey (1991) - US 5,972,381 - US 5,834,472 - US 4,957,730 - Greene et al., "Protective Groups in Organic Synthesis", P Ed., Wiley-lnterscience (1999) - Brown et al., I Chem. Soc. 2003, 125 (36), 10808-10809 - US 6,958,337
Step (1.1) - Reacting the compound of formula (A) with the compound of formula (B) As far as the reaction of the compound of formula (A) with the compound of formula (B) is concerned, no specific restrictions exist provided that the compound of formula (I) is obtained.
Preferably, according to step (1.1) of the present invention, the compound of formula (I) is provided by a process (aa) reacting a compound of formula (A) HO \ / \_I \ / NH2 (A) in a suitable solvent and in the presence of a suitable base, with a compound of formula (B) F f O-Tos O
N
N
(B).
While as to the suitable solvent, no specific restrictions exist, preferred solvents according to the present invention are polar solvents. In particular, the suitable solvent is a polar protic solvent or a mixture of two or more thereof, or a polar aprotic solvent or a mixture of two or more thereof. More preferably, the suitable solvent is selected from the group 5 consisting of dimethylsulfoxide (DMSO), dimethylformamide (DMF), N-methylpyrrolidone (NMP), sulfolane, methanol, ethanol,,n-propanol, and iso-propanol, with ethanol or DMSO being particularly preferred.
Optionally, reacting in step (aa) is performed in the presence of at least one suitable anti-1.0 oxidant, such as butylated hydroxytoluene (BHT).
As to the suitable base, no specific .restrictions exist provided that the compound of formula (A) and the compound of formula (B) can be reacted with each other to give the desired product. Preferred bases according to the present invention are inorganic bases, 15 more preferably carbonates, hydroxides and/or hydrogencarbonates, and mixtures thereof.
Even more preferably, the respective cations are selected from the group consisting of alkali metal ions, alkaline earth metal ions, or mixtures thereof. As alkali metals, lithium, sodium or potassium may be mentioned. As alkaline earth metals, magnesium, calcium, strontium or barium may be mentioned. Thus, a preferred base is in particular an alkali 20 metal and/or an alkaline earth metal carbonate, an alkali metal and/or an alkaline earth metal hydroxide, and/or an alkali metal and/or an alkaline earth metal hydrogencarbonate, with sodium hydroxide and potassium carbonate being particularly preferred.
As to the preferred base sodium hydroxide, it is especially preferred to employ said base as 25 aqueous solution. Employing an aqueous solution. with a concentration of at least 20 wt.-%, preferably at least 45 wt.-% with respect to the base was found to be especially advantageous, and leads to a significant acceleration of the reaction rate as well as to increased selectivity of said reaction by reducing the formation of by-products.
30 With respect to the compound of formula (A), using an excess of the compound of formula (B) is preferred. Thus, the present invention relates to above-defined process wherein in step (aa), the molar ratio of the compound of formula (B) to the compound of formula (A) is greater than one. Further, preferred molar ratios are in the range of from greater than 1:1 to 1.2:1. Especially preferred molar ratios are in the range from 1.05:1 to 1,15:1, with a molar ratio of 1.1:1 being particularly preferred.
With respect to the compound of formula (A), using an excess of base is preferred. Thus, the present invention relates to above-defined process wherein in step (aa), the molar ratio of the base to the compound of formula (A) is greater than one. Further, preferred molar ratios are in the range of from greater than 1:1 to 2.0:1, more preferably from greater than 1:1 to 1.8:1, more preferably from greater than 1:1 to 1.6:1, more preferably from greater than 1:1 to 1.5:1.
The temperature under which the reaction in (aa) is carried out can be suitably chosen.
Preferred temperatures are in the range of from 20 to at most 35 C, more preferably from 25 to at most 32 C.
The pH under which the reaction in (aa) is carried out is suitably controlled by addition of above-defined base. In particular, the reaction is carried out at a pH of at least 10.
From step (aa) of the present invention, the compound of formula (I) is obtained as crystallized product contained in the reaction mixture. According to a preferred embodiment, the compound of formula (1) is suitably separated from the reaction mixture and optionally suitably washed. Said optional washing is preferably carried out with a base as washing agent wherein inorganic bases such as sodium hydroxide are preferred. Base concentrations of from 0.1 to 5 wt.-%, are preferred, with 0.5 to 2 wt.-%
being particularly preferred. Additionally, the compound of formula (I) may be further washed at least once with water and/or at least once with a suitable alcohol such as isopropanol.
While in general, the thus obtained product may be used for further steps without further treatment, it is preferred, according to the present invention, to re-crystallize the product obtained from step (aa). Therefore, the present invention relates to above-defined process which further comprises (bb) re-crystallizing the compound of formula (I).
While every suitable re-crystallization method is conceivable, it is especially preferred to re-crystallize the compound of formula (I) at least once from acetonitrile and/or water. It was found that compared to the isolation from water, the product obtained from re-crystallization from acetonitrile can be much easier dried, and thus, re-crystallization from acetonitrile allows for milder post-treatment conditions.
Drying of the thus re-crystallized compound of formula (I) is preferably carried out at a temperature of at most 75 C, preferably of at most 70 C at a pressure of preferably at most 500 mbar, more preferably of at most 100 mbar, more preferably of at most 75 mbar.
Most preferably, either re-crystallization, or drying, or re-crystallization and drying is/are carried out under inert atmosphere such as under nitrogen atmosphere.
Optionally, the product may be treated with a suitable porous material to remove remaining impurities. Among others, charcoal may be mentioned as such suitable material.
Step (1.2) - Providing a compound of formula (IIa) or (Ilb) According to step (1.2) of the process of the present invention, a compound of formula (IIa) O=C=N-Y' (IIa) or (IIb) O
Y NNY
i (Ilb) is provided.
As far as the compound of formula (IIa) is concerned, the residue Yo is an optionally substituted alkyl or aryl residue. The term "optionally substituted aryl residue" as used in this context of the present invention refers to aryl residues which have, for example, up to 6 or up to 12 carbon atoms. If such aryl residue is a substituted aryl residue, the number of carbon atoms refers to the number of carbon atoms of the corresponding unsubstituted aryl residue. The term "optionally substituted alkyl residue" as used in this context of the present invention refers to straight or branched alkyl residues which have, for example, 1 to 20, preferably 1 to 10 carbon atoms. If such alkyl residue is a substituted alkyl residue, the number of carbon atoms refers to the number of carbon atoms of the corresponding unsubstituted alkyl residue. As preferred compound of formula (IIa), phenylisocyanate may be mentioned.
As far as the compound of formula (IIb) is concerned, the residues YIN- and Y2N- are the same or different and are optionally substituted nitrogen heterocycle moieties. The term "nitrogen heterocycle" as used in the context of the present invention relates to a cyclic residue which contains at least one, preferably one, two or three, more preferably two nitrogen atoms. The cyclic structure as such preferably contains from five to ten atoms in total, preferably from five to nine atoms in total. Especially preferred residues Y1N- and Y2N- are imidazolyl or benzimidazolyl. According to an especially preferred embodiment of the present invention, the compound of formula (IIb) is carbonyldiimidazole (CDI) of formula (Ile) N 'J~ N
N, _~ L N
\% ~/ (IIc).
1o Typically, the compound of formula (IIb) is employed contained in. a suitable solvent or in a mixture of two or more suitable solvents. Such suitable solvent is, for example, DCM, THF, Me-THF, DMF, acetonitrile, an ester like ethyl acetate or butyl acetate, with DCM
being especially preferred.
Step (1.3) - Providing a compound of formula (III) According to step (1.3) of the present invention, a compound of formula (III) O
HN NH
(III) or a suitable salt thereof is provided.
In the compound according to formula (III), the residue R1 is preferably a straight or branched alkyl residue which preferably has from Ito 6 carbon atoms, namely 1, 2, 3, 4, 5, or 6 carbon atoms, more preferably from I to 4 carbon atoms, namely 1, 2, 3, or 4 carbon atoms, more preferably 1 or 2 carbon atoms, in particular 2 carbon atoms.
Further, in the compound of formula (III), the residue -R is either -H or a suitable hydroxyl protecting group. Conceivable protecting group are given, for example, in Greene et at., "Protective Groups in Organic Synthesis", 3rd Ed., Wiley-Interscience (1999).
Preferably, the suitable hydroxyl protecting group is benzyl or a group -SiRa,,RhRc wherein the residues Ra, Rb and R, may be the same or different and are preferably alkyl or aryl residues. The term "aryl residue" as used in this context of the present invention relates to a carbocyclic aromatic group, such as phenyl or naphthyl or the like. The term "alkyl residue" as used in the context of the present invention relates to straight or branched alkyl moieties which preferably have 1, 2, 3, 4, 5, or 6 carbon atoms, more preferably 1, 2 or 3 carbon atoms, more preferably 1 carbon atom. Especially preferably, the residue -R is -H
or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R most preferably being -H.
Even more preferably, the compound of formula (III) is provided as crystalline compound with a specific amount of molecules present as compound of the formula O
HN NH
Thus, the present invention relates to above-defined process wherein the compound of formula (III) is a preferably crystalline compound O
,NH
HN
OH
(IIla) and wherein, according to further preferred embodiment, at least 95 %, preferably at least 97 %, more preferably at least 99 % of the molecules of said crystalline compound are present as compound of formula (11Ib) /O
HN NH
OH
(IIIb).
Generally, there are no specific restrictions as far as the preparation of the compound of formula (III), in particular of formula (IHa) is concerned.
5 According to a preferred process, the compound of formula (III) wherein -R =
-H or a residue -SiRa,RbR is provided in step (1.3) of the present invention by a process which comprises the following steps:
(a) providing a chiral compound of formula (i) O
H OWNY
H
10 wherein Y is an optionally substituted aryl moiety, preferably an optionally substituted phenyl moiety, more preferably unsubstituted phenyl, said providing in (a) preferably comprising reacting propionaldehyde in a solvent with a compound of formula (j) O=N-Y (j), 15 preferably with nitrosobenzene, in the presence of a catalyst system preferably comprising at least one organocatalyst, more preferably proline (Pro), more preferably o-Pro, said catalyst system optionally further comprising a promoter, preferably an urea derivative, more preferably 1-(2-dimethylamino-ethyl)-3-phenyl urea, wherein preferably at least 95 %, more preferably at least 97 %, more 20 preferably at least 99 % of the molecules of the chiral compound of formula (i) provided in (a) are present as O
H ONY
H
(ia), said reaction of propionaldehyde with the compound of formula (j) preferably being carried out at a temperature in the range of from -15 to +5 C, preferably from -12 to 25 +3 C, more preferably from -10 to 0 C, preferably in dichloromethane as solvent, and preferably in the presence of a catalytical amount of an acid, preferably acetic acid or propionic acid;
(b) reacting the compound of formula (i) with H2N-NH-CHO in a solvent, preferably dichloromethane, to obtain a compound according to formula (ii) O
NON
H O\NY
H
(11), wherein said reacting is preferably carried out in the presence of a molecular sieve, preferably having a pore diameter determined according to DIN 66131 in the range of from 0.3 to 0.5 nm (nanometre, 3 to 5 Angstrom), and wherein said reacting is preferably carried out at a temperature in the range of from -10 to +20 C, preferably from -5 to +5 C;
(c) separating the compound of formula (ii) from the reaction mixture obtained from (b) by solvent extraction, wherein prior to (c), a solvent exchange is preferably carried out;
(d) optionally reacting the compound of formula (ii) in a solvent, preferably at a temperature in the range of from 15 to 70 C, with a silylating agent comprising the residue -SiRRbbR to obtain a compound of formula (iii) O- SIRaaRbbRcc NON
H OWN/Y
H
(iii), wherein the residues Raa, Rbb and R,, may be the same or different and are preferably alkyl or aryl residues, more preferably alkyl residues having from 1 to 6 carbon atoms, preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, and wherein the silylating agent is preferably hexamethyldisilazane, trimethylchlorosilane, bistrimethylsilylacetamide or a mixture of two or three of these compounds, more preferably bistrimethylsilylacetamide;
(e) reacting the compound of formula (ii) or reacting the compound of formula (iii) with a nucleophilic compound comprising a nucleophilic residue R1, the nucleophilic compound preferably being a Grignard compound R1MgX wherein X is preferably selected from the group consisting of Cl, Br, and I, and wherein R1 is preferably an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, in a solvent, preferably selected from the group consisting of toluene, tetrahydrofurane (THF), MTBE, and a mixture of THE and MTBE, to obtain a compound of formula (iv) O
~JNH
R O\N1-1-1 Y
H
(iv), wherein the nucleophilic compound is preferably CH3CH2MgCl, wherein the reaction with the nucleophilic compound is preferably carried out at a temperature in the range of from --80 to 0 C, preferably from -75 to -10 C, more preferably from -70 to -25 C;
(f) reducing the compound of formula (iv), preferably by hydrogenation, wherein preferably a solvent mixture comprising an alcohol comprising 1 to 4 carbon atoms, preferably methanol, ethanol, isopropanol, most preferably methanol, is employed, to obtain a compound of formula (1I1) with R = H
~NH
OH
wherein the hydrogenation is preferably carried out at a temperature in the range of from 15 to 35 C, preferably from 20 to 30 C, at a hydrogen pressure in the range of from 0.5 to 50 bar, preferably from Ito 20 bar, more preferably from 1 to 10 bar, in the presence of a precious metal containing catalyst, preferably a palladium containing catalyst, most preferably a Pd/C catalyst;
(g) optionally crystallizing the compound of formula (III) with R = H, wherein the compound of formula (III) is preferably crystallized from a mixture of MTBE
and cyclohexane (CHX);
(h) optionally recrystallizing the compound of formula (III) with R = H, wherein the compound of formula (III) with R = H is preferably recrystallized from isopropyl acetate;
(i) optionally reacting the optionally crystallized compound of formula (III) with R = H
in a solvent with a silylating agent comprising the residue -SiRaRbRc to obtain a compound of formula (III) with R = SiRaRbRG
O
HN NH
Rl \ SiRaRbR5 5 wherein the residues Ra, Rb and R,, are as defined above.
Ste 2 - Mixing and.reacting the compounds of formulae I IIa and/or IIb and III
As to step (2) of the present invention, the compounds of formulae (I), (IIa) and/or (IIb), preferably (IIb), and (III) can be mixed in any suitable order wherein each of said compounds can be employed as such or contained in at least one suitable solvent or in a suitable solvent mixture.
According to a preferred embodiment of the present invention, in a first step (2.. 1), the compounds of formulae (I) and (Ila) and/or (IIb), preferably (IIb), are mixed and at least partially reacted in a solvent to obtain a reaction mixture.
No particular restrictions exist concerning the solvent in which the reaction in step (2) and/or in step (2.1) is carried out. Preferably, the solvent is a polar aprotic solvent or a mixture of two or more thereof. More preferably, the at least one solvent is selected from the group consisting of dichloromethane (DCM), tetrahydrofurane (THF), methyl tetrahydrofurane (MeTHF), dimethyl formamide (DMF), acetonitrile (AN), an ester, preferably butylacetate (BuAc) or ethylacetate (EtAc), and a mixture of two or more thereof, preferably DCM or THE Especially preferably, the solvent is DCM.
As described above, it is particularly preferred to employ the compound of formula (Ila) and/or (IIb), preferably (IIb), contained in DCM. As to the compound of formula (I), it is conceivable to introduce it either as solid compound, as, for example, obtained according to step (bb) described above wherein the compound of formula (I) is re-crystallized, preferably from acetonitrile, or contained in a suitable solvent such as DCM.
According to a preferred embodiment of the present invention, the compound of formula (I) is introduced as solid compound obtained from step (bb) into the solution containing the compound of formula (IIa) or (IIb) wherein DCM is the most preferred solvent.
Preferably, the compound of formula (IIa) or (IIb) and the compound of formula (I) are employed in a molar ratio so that the compound of formula (IIa) or (IIb) is used in excess.
Preferably, said molar ratio is in the range of from greater than 1:1 to 1.3:1, more preferably from greater than 1:1 to 1.2:1, more preferably from 1.05:1 to 1.15:1 such as 1.1:1.
After step (2.1), it is preferred to add the compound of formula (III) to the reaction mixture obtained from step (2.1).
As to the compound of formula (III), it is conceivable to introduce it either as solid compound, as, for example, obtained according to step (h) described above wherein the compound of formula (III) is recrystallized, preferably from isopropyl acetate, or contained in a suitable solvent such as DCM, THE or, preferably, a mixture thereof.
According to a preferred embodiment of the present invention, the compound of formula (III) is introduced as solid compound obtained from step (h) into the reaction mixture obtained from step (2.1).
Preferably, the compound of formula (III) is employed, relative to the compound of formula (I), in a molar ratio so that the compound of formula (III) is used in excess.
Preferably, said molar ratio is in the range of from greater than 1:1 to 1.3:1, more preferably from greater than 1:1 to 1.2:1, more preferably from 1.05:1 to 1.15:1 such as 1.1:1.
The temperature under which the reaction in step (2) is carried out, is preferably in the range of from -20 to +40 C. More preferably, the reaction in step (2.1) is carried out at a temperature in the range of from -20 to +20 C, more preferably from -15 to 0 C, more preferably from -10 to -5 C. The reaction according to step (2.2) of the present invention is preferably carried out at a temperature in the range of from -20 to +40 C, more preferably, in a first reaction period, in the range of from -20 to 0 C, more preferably from -15 to 0 C, more preferably from -15 to -5 C, and, in a subsequent reaction period, in the range of from -5 to +40 C, preferably from 15 to 40 C, more preferably from 25 to 35 C, most preferably 30 C.
Generally, the compound of formula (IV) can be crystallized from at least one suitable solvent, for example, from acetonitrile. Preferably, according to the present invention, the compound of formula (IV) is crystallized directly from the reaction mixture.
For example, in a subsequent reaction period, the reaction mixture described above is preferably suitably 5 cooled to initiate crystallization of the compound of formula (IV), wherein the reaction mixture is preferably cooled to initiate crystallization and subsequently further cooled to a temperature in the range of from -10 to +5 C, more preferably from -5 to +5 C. Seed crystals may be added to initiate crystallization.
1o Therefore, the present invention relates to above-defined process comprising isolating the chiral compound of formula (IV) O RI
ri NH 0 (IV) from the reaction mixture obtained from (2).
15 As described, said isolating is preferably carried out by crystallization.
Further, it is also conceivable to isolate the compound of formula (IV) by chromatography.
From the reaction in step (2), the suitably isolated, preferably crystallized compound of formula (IV) is obtained.
After separation from its mother liquor, the crystallized compound of formula (IV) can be suitably washed at least once and optionally dried.
According to a preferred embodiment of the present invention, the compound of formula (IV) being a compound of formula (IVb), in particular being a compound of formula (IVd) as herein described, is crystallized directly from the reaction mixture preferably containing imidazol and a solvent such as preferably DCM, and by applying the above described reaction periods and conditions.
Surprisingly, it was found that in case the compound of formula (IVb), in particular the compound of formula (IVd) is directly crystallized from the reaction mixture in particular containing DCM and imidazole, the compound of formula (IVb), in particular the compound of formula (IVd) may crystallize as adduct compound of formula (IVd) : imidazole : DCM
for example as 1:1:1 adduct, wherein said adduct is obtained in at least one polymorphic form.
After separation from its mother liquor, the crystallized compound of formula (IVd) can be suitably washed at least once and optionally dried. The product can be recrystallized from DCM to give the same .1:1:1 adduct as described above, or from acetonitrile to give an 1:1 adduct with imidazole.
The procedure of crystallizing the compound of formula (IVd) as adduct directly from the reaction mixture as described above leads to an improved process, because it avoids the application of complex technical requirement, and it allows an easy isolation of the crystalline product moreover resulting in low amounts of impurities in the isolated product as well as in high yields of said product.
Depending on the specific crystallization conditions and/or the components contained in the reaction mixture, also other adducts are conceivable each possibly being present in at least one polymorphic form.
Thus, the present invention also relates to an optionally crystalline chiral compound of formula (IVa) o Rl F F C ' \ / H N R
NH
O CI
NON (IVa) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, Ri in particular being ethyl, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of-SiR,,RbR, and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb and Re are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, with -R
preferably being -H or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R in particular being -H, and wherein said compound is most preferably a compound of formula (IVb) F OH
H N
NH
O r N~ F
(IVb).
According to an even more preferred embodiment, at least 95 %, preferably at least 97 %, more preferably at least 99 % of the molecules of said compound of formula (lVb) are present as compound of formula (IVc) O RI
NH
NON
(IVc) most preferably as compound of formula (IVd) O
OH
F O /-\ C H
NH
O "
NON (IVd).
1.5 According to an optional embodiment of the present invention, the reaction in step (2) can be carried out in the presence of an acid which is either employed in stoichion3etric or preferably employed in a substoichiometric amount. Typically, the acid used is at least partially soluble in the solvent or solvent mixture employed in step (2). Most preferably, the acid is trifluoroacetic acid (TFA) or para-toluenesulfonic acid (PTSA), with trifluoroacetic acid (TFA) being especially preferred.
However, as indicated, reacting in step (2) can be carried out in the absence of trifluoroacetic acid (TFA), preferably in the absence of trifluoroacetic acid (TFA.) or para-toluenesulfonic acid (PTSA), more preferably in the absence of an acid.
As described above, the process of the present invention, compared to known processes of 1o the prior art, in particular compared to known processes for the preparation of posaconazole, is characterized in that it is carried out in the absence of a compound of formula Cl-C(=O)-O-Ph (phenyl chloroformate), in particular in the absence of an ester of a halogenated formic acid. Thus, the use of mutagenic compounds is avoided which may be found in the final product or the pharmaceutical composition containing such product.
Step 3 - heating the mixture obtained from ste (2) According to a first preferred embodiment of the present invention, the reaction mixture obtained from step (2), without isolation of the compound of formula (IV) is subjected to a heating step (3).
Optionally, prior to heating, the solvent present in the reaction mixture obtained from step (2), can be exchanged by at least one further solvent. Preferably, the reaction mixture obtained from step (2) contains a solvent selected from the group consisting of dichloromethane (DCM), tetrahydrofurane (THF), methyl tetrahydrofurane (MeTHF), acetonitrile (AN), an ester, preferably butylacetate (BuAc) or ethylacetate (EtAc) and dimethylformamide (DMF), and a mixture of two or more thereof, preferably DCM
or THF, in particular DCM. If solvent exchange is carried out, the solvent described above are exchanged by a solvent allowing for the heating conditions of step (3) described in 3o detail hereinunder. Preferably, such solvent preferably used for heating in step (3) is selected from the group consisting of toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIBK), dioxane, hexamethyldisilazane (HMDS) and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
According to a second preferred embodiment, the compound of formula (IV) is suitably isolated after step (2), preferably by crystallization. As to this embodiment of the present invention, the isolated, preferably crystallized compound of formula (IV) is admixed with a suitable solvent prior to heating in step (3), wherein the solvent is preferably selected from the group consisting of toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIRK), dioxane, hexamethyldisilazane (HMDS) and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
The temperature to which such mixture is heated in step (3) is preferably in the range of from 40 to 150 C, preferably from 60 to 140 C, more preferably from 70 to 130 C.
Typical temperatures will be in the range of from 70 to 80 or from 80 to 90 or from 90 to 100 or from 100 to 110 or from 110 to 120 or from 120 to 130 C.
According to a preferred embodiment of the present invention, prior to heating according to step (3), the compound of formula (IV), either as contained in the reaction mixture obtained from step (2) with an optional subsequent solvent exchange as described above, or as contained in the mixture obtained from suitably isolating the compound of formula (IV) and admixing the isolated compound with a suitable solvent as described above, is admixed and reacted with a suitable silylating agent. Such admixing with a silylating agent is particularly preferably carried out if the residue -R as described above is -H, i.e, in case the respective hydroxyl group of the compound of formula (III) is employed in its non-protected form.
No particular restrictions exist as to such silylating agent. A conceivable silylating agent is, for example, a trialkylsilylhalide, more preferably a trialkylsilylchloride and/or a trialkylsilyliodide, in particular trimethylsilylchloride (TMSC1) and/or trimethylsilyliodid (TMSI). According to a preferred embodiment of the present invention, bis-trimethylsilylacetamide (BSA) is used as silylating agent. Optionally, in particular if BSA
is used, reaction of the compound of formula (IV) with the silylating agent is performed in the presence of a suitable acid, preferably a Lewis acid, more preferably a silicon-containing Lewis acid, in particular trimethylsilyl iodide (TMSI).
Relative to the compound of formula (IV), the silylating agent is preferably employed in excess. Preferred molar ratios of the silylating agent relative to the compound of formula (IV) are in the range of from greater than 1:1 to 3:1, more preferably from greater 1.45:1 to 2.7:1, more preferably from greater 1.5:1 to 2.1:1, more preferably from 1.9:1 to 2.1:1, most preferably 2:1.
Relative to the compound of formula (IV), the acid, preferably the Lewis acid, is 5 preferably employed in substoichiometric amount. Preferred molar ratios of the Lewis acid, preferably TMSI, relative to the compound of formula (IV) are in the range of from 0.05 to less than 1:1, preferably from 0.1 to 0.5, more preferably from 0.15 to 0.25, most preferably 0.2.
1o As mentioned above, in case the most preferred compound CDI is employed, the compound of formula (IV) as obtained after solvent exchange or after crystallization and admixing with solvent will typically contain imidazole, generally in the range of from 1 to 10 wt.-%, preferably from 2 to 10 wt.-%, more preferably from 4 to 10 wt.-%, more preferably from 6 to 10 wt.-%. According to an especially preferred embodiment of the 15 present invention, imidazole is added to the compound of formula (IV) in order transform the compound of formula (IV) to the compound of formula (V). Therefore, since imidazole is already contained in the compound of formula (IV) due to the use of CDI, only a lesser amount of imidazole has to be added. At this stage, imidazole is added in amount so that, relative to the compound of formula (IV), imidazole is present in excess wherein preferred 20 molar ratios of imidazole relative to the compound of formula (IV) are in the range of from 2:1 to 10:1, more preferably from 4:1 to 9.5:1, more preferably from 7:1 to 8:1, most preferably 7.5:1.
Most preferably, imidazole is added prior to admixing the compound of formula (IV) with 25 the silylating agent as described above.
From the compound of formula (IV), after heating in step (3), preferably after addition of imidazole, and optionally after addition of the silylating agent, the compound of formula (V) is obtained, preferably contained in a solvent selected from the group consisting of 30 toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIBK), dioxane, hexamethyldisilazane (HMDS) and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
Step (4) - extracting the compound of formula (V) According to a further preferred embodiment of the present invention, the compound of formula (V) contained in above-mentioned solvent is subjected to suitable solvent extraction.
For solvent extraction, an aqueous acid is preferably used as extracting agent wherein said aqueous acid is preferably an aqueous inorganic acid and more preferably aqueous hydrochloric acid. The concentration of the aqueous inorganic acid, preferably the aqueous to hydrochloric acid, is preferably in the range of from 5 to 15 wt.-%. The temperature under which the extracting agent is added is preferably in the range of from 10 to 50 C, preferably from 20 to 40 C. The thus obtained layers are separated.
Preferably, the acidic aqueous layer which contains the compound of formula (V) is is subjected to a further solvent extraction wherein at least one suitable organic solvent, in particular DCM is used. The pH of the thus obtained aqueous layer is preferably adjusted to a value in the range of from 0.8 to 1.5, preferably from 1 to 1.2 using a suitable amount of at least one suitable base, preferably an inorganic base, more preferably an inorganic hydroxide, more preferably an aqueous sodium hydroxide solution. The thus obtained 20 layers are separated.
Preferably, the organic layer thus obtained which contains the compound of formula (V) is subjected to a suitable washing treatment. Every conceivable washing agent or combination of washing agents can be used. According to a preferred embodiment of the 25 present invention, the organic layer is washed with an acid, preferably an inorganic acid, more preferably hydrochloric acid, more preferably aqueous hydrogen chloride, and further washed with a base, preferably an inorganic base, more preferably an alkali hydrogen carbonate, more preferably sodium hydrogen carbonate. Preferably, the organic layer is first washed with the acid and subsequently washed with the base. The thus obtained layers 3o are separated.
Preferably, the organic layer thus obtained and containing the compound of formula (V) is suitably concentrated in one, two or more individual concentration steps wherein between two subsequent concentration steps, at least one solvent such as acetone or methanol, 35 preferably acetone can be added.
The finally obtained concentrated organic layer is preferably admixed with water at a temperature which is preferably in the range of from 15 to 40 C, more preferably from 20 to 30 C. Optionally, the thus obtained suspension may be subjected to a treatment with a suitable porous material to remove remaining impurities. Among others, charcoal may be mentioned as such suitable material.
After solvent extraction and preferred post-treatment steps as described, the preferred resulting suspension contains the compound of formula (V) in solution. The compound of formula (V) is preferably suitably separated from the above-mentioned suitable porous material, for example via filtration. The filter cake preferably containing above-mentioned suitable porous material such as charcoal is preferably washed with a suitable solvent or solvent mixture. Suitable washing agents are, for example, mixtures of acetone or methanol with water. The filtrate and the washing liquids, containing the compound of formula (V), are preferably combined.
According to a preferred embodiment, the compound of formula (V) preferably contained in the combined filtrate and washing liquids, is suitably crystallized in step (5) of the present invention and optionally separated from its mother liquor in a step (6) of the present invention.
Step (5) --- crystallizing the compound of formula (V) According to step (5), the compound of formula (V) is suitably crystallized in a solvent or in a mixture of two or more solvents.
No particular restrictions exist concerning the solvent provided that the compound of formula (V) can be crystallized. Preferably, crystallizing in (5) is carried out in a solvent which is selected from the group consisting of alcohols, preferably methanol, ethanol, n-propanol, iso-propanol, ethers, preferably THF, ketones, preferably acetone, acetonitril, and a mixture of two or more thereof, most preferably admixed with water, the solvent most preferably being methanol admixed with water or acetone admixed with water.
Depending on the solvent or solvents used, the temperature at which crystallization is carried out in step (5) is preferably in the range of from -20 to +90 C, more preferably from -10 to +70 C, more preferably from 0 to 50 C, more preferably from 10 to 40 C.
Optionally, seed crystals of the compound of formula (V) can be added.
According to a particularly preferred embodiment of the present invention, crystallization is performed in two or more steps, preferably in three or more steps. In an especially preferred first step, water is added, preferably to the combined filtrate and washing liquids as described above. The temperature at which this first step is carried out is preferably in the range of from 10 to 50 C, more preferably from 20 to 40 C. In an especially preferred second step, seeding crystals of the compound of formula (V) are added and the resulting mixture is stirred, preferably at a temperature in the range of from 10 to 50 C, more preferably from 20 to 40 C. In an especially preferred third step, water is added and the resulting mixture is stirred, preferably at a temperature in the range of from 10 to 50 C, more preferably from 20 to 40 C. In an especially preferred fourth step, the stirred mixture is cooled to a temperature below 20 C, preferably to a temperature in the range of from 0 to less than 20 C, more preferably from 10 to less than 20 C.
Step 6 - separating the crystallized compound of formula V
The crystallized compound thus obtained is optionally suitably separated from the solvent or solvent mixture in step (6) of the present invention. Suitable separation is preferably carried out by filtration. The separated crystallized compound of formula (V), preferably contained in the filter cake obtained from filtration, is preferably washed with a suitable solvent or solvent mixture. Suitable washing agents are, for example, mixtures of methanol, ethanol, n-propanol, iso-propanol, ethers, preferably THF, ketones, preferably acetone and acetonitrile with water. The temperature of the washing agents is preferably in the range of from 0 to 10 C, more preferably from 0 to 5 C.
The separated and preferably washed crystallized compound of formula (V) is preferably dried at suitable conditions. Drying of the crystallized compound of formula (V) is preferably carried out at a temperature of at most 50 C, preferably of at most 45 C at a pressure of preferably at most 500 mbar, more preferably of at most 100 mbar, more preferably of at most 75 mbar, more preferably at most 50 mbar.
According to the present invention, it was found that generally, there is no need to further purify the thus obtained crystallized compound of formula (V) by tedious processes taught in the art, in particular by chromatography, and that said crystallized compound of formula (V) can be used without further purification, in particular as antifungal agent. Therefore, the present invention relates to above-defined process wherein the crystallized compound obtained from (5) or (6) is not subjected to a subsequent chromatography purification stage.
Thus, the present invention also relates to a composition which is especially preferably obtained or obtainable after step (5) or step (6) of the present invention, said composition comprising, preferably essentially consisting of a preferably crystalline chiral compound of formula (Va) R
O
OH
F F N % N- N
O
NN-' (Va) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, said composition preferably comprising a compound of formula (Vb) OH
N
N
ON (Vb) wherein preferably at least 95 %, more preferably at least 97 more preferably at least 99 % of the molecules of said preferably crystalline compound are present as isomer of formula (Vc) Rl F F OH
N-~
(Vc) preferably as isomer of formula (Vd) O
F F N N OH
N
O
NN
(Vd), said composition containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve) ~ O-R
F / \ O ~~\ // / N N f---r \ I ~N
1, O
N~ 'N
5 (Ye) preferably of a compound of formula (Vf) RI
N
NN II
wherein -R is -CH2-C6H5, -R preferably being selected from the group consisting of -SiRaRbRc and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where Ra, Rb 10 and R, are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, -R more preferably being a hydroxyl protecting group. The term "essentially consisting of' as used in this context of the present invention relates to such compositions of which at least 99.9 wt.-%, more preferably at least 99.99 wt.-% consist of the compound of formula (Va), relative to the total content 15 with respect to the compounds of formula (Va) and (Vt).
Therefore, due to the novel advantageous process of the present invention, a composition as defined above can be provided which is free of benzyl-protected compound of formula (V). Especially preferably, a composition is provided which contains crystallized posaconazole which is free of benzyl-protected posaconazole.
According to above-defined process according to which posaconazole is prepared, usually a specific polymorphic form or a mixture of two or more polymorphic forms is obtained. If desired, this (crude) posaconazole can be re-crystallized at least once to give only one of these polymorphic forms or to give another polymorphic form or a mixture of two or more other polymorphic forms.
Preferably, according to the present invention, the crude posaconazole as described above is re-crystallized in a first step. Re-crystallization is especially preferably carried out from a mixture of acetone and water or from methanol as described in example 6 of US 6958337.
A solvent-mediated solid phase transformation gives posaconazole of polymorphic form IV as described in WO 2010/000668. According to a preferred embodiment, the product obtained after re-crystallization as described above is stirred in a mixture of methanol and water in the preferred presence of seed crystals of posaconazole form IV to a temperature in the range of from 40 to 45 C for a time in the range of from 4 to 48 hours. The obtained posaconazole of polymorphic form IV is suitably separated, preferably by filtration. The isolated product posaconazole of polymorphic form IV is preferably dried at suitable conditions. Drying is preferably carried out at a temperature of at most 45 C, preferably of at most 40 C at a pressure of preferably at most 500 mbar, more preferably of at most 100 mbar, more preferably of at most 75 mbar, more preferably at most 50 mbar, more preferably in the range of from 30 to 40 mbar.
Therefore, the present invention also relates to the above-defined process, wherein the crystallized compound obtained from (5) or (6), in particular the compound of formula (Vb) O
OH
N N fy N
O
NON
(Vb) wherein preferably at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said crystalline compound are present as isomer of formula (Vd) F 0 O /- /-\ % \/ OH
N
O
NON
(Vd), is re-crystallized, preferably from a mixture of acetone and water or from methanol, and is subsequently stirred in a mixture of water and methanol, preferably in the presence of seed crystals, said seed crystals comprising the crystalline compound of formula (Vd) in the form of polymorph IV.
to The antifungal agent according to the present invention, or obtainable or obtained according to the process of the present invention may be suitably contained in a pharmaceutical composition, in particular for treating fungal infections. Such pharmaceutical compositions typically comprise an antifungally effective amount of the antifungal agent, preferably posaconazole, in particular posaconazole of polymorphic form IV. In particular, the pharmaceutical compositions according to the present invention contain the above-defined composition which is especially preferably obtained or obtainable after step (5) or step (6) of the present invention or after re-crystallization and/or solid phase transformation as herein described, said composition comprising, preferably essentially consisting of a preferably crystalline chiral compound of formula (Vb) and containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve).
In addition to the antifungally effective amount of the antifungal agent, the pharmaceutical composition of the present invention preferably contains at least one pharmaceutically acceptable additive. Any pharmaceutically acceptable additive can be employed as long as it does not detrimentally affect the properties of the pharmaceutical composition. Examples of typical pharmaceutically acceptable additives are described, for example, in WO 2010/000668 Al, on page 13, lines 13 to 23, the respective disclosure being incorporated herein by reference. Other suitable pharmaceutically acceptable additives are described e.g. in Remington's Pharmaceutical Sciences, 15th Ed., Mack Publishing Co., New Jersey (1991).
The pharmaceutical compositions of the invention can be produced in a manner known per se to the skilled person as described, for example, in Remington's Pharmaceutical Sciences, 15th Ed., Mack Publishing Co., New Jersey (1991).
The pharmaceutical composition according to the present invention may be a solid or liquid. In this context, reference is made to WO 2010/000668 Al, page 13, lines 28 to 36, the respective disclosure being incorporated herein by reference. The pharmaceutically acceptable additive can also be an encapsulating material. In this context, reference is made to WO 2010/000668 Al, page 14, lines Ito 6, the respective disclosure being incorporated herein by reference.
Formulations containing the antifungal agent of the present invention, preferably the composition of the present invention, may be topical formulations normally containing one or more non-toxic, pharmaceutically acceptable topical carriers, or other formulations such as those typically described for posaconazole. In this context, reference is made to WO 2010/000668 Al, page 14, lines 8 to 19, the respective disclosure and also the patent documents cited therein being incorporated herein by reference.
Therefore, the present invention relates to a pharmaceutical composition for treating fungal infections comprising an antifungally effective amount of a composition as defined above and a pharmaceutically acceptable carrier therefore.
In particular for these cases wherein the antifungal agent prepared according to the present invention is posaconazole, the agent, in particular the above-defined composition, can be used as a medicament to treat or prevent any of the disorders which can be treated or prevented by posaconazole. In particular, it can be used for treating or preventing fungal infections, especially in mammals, such as humans. Thus, a method of treating or preventing a fungal infection by administering a therapeutically effective amount of above-defined composition to a patient in need thereof is also contemplated, as well as the above-defined composition for use in a method of treating or preventing fungal infections in mammals in need of such treating or preventing such infections. The above-defined composition is suitable for treating or preventing a wide range of infections caused by fungal pathogens, including yeasts, dermatophytes and molds. Typical fungal infections which can be treated are disclosed in WO 2010/000668 Al, on page 11, line 29 to page 12, line 5, the respective disclosure being incorporated herein by reference.
Therefore, the present invention relates to the use of above-defined composition for use as a medicament. Further, the present invention relates to the use of above-defined composition for the preparation of a medicament for treating or preventing fungal infections in mammals in need of such treating or preventing such infections.
As indicated hereinabove, the present invention is, among others, characterized in that for the preparation of the compound of formula (IV), preferably the compound of formula (V), more preferably posaconazole, even more preferably posaconazole contained in above-defined composition which is essentially free of the compound of formula (Ve), the compound of formula (Ile) is employed. The advantages of the use of this specific compound are explained throughout the present invention hereinabove.
Therefore, the present invention also relates to the use of a compound of formula (Ile) N N
N L_ ,N
~/ (IIc) for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb) F F 0- N /-\ % \ / N ~~ry N
NN l' (Vb), most preferably for the preparation of a preferably crystalline compound of formula (Vd) O
F F N/'~N-O-N OH
N
O
N-~
NON
(Vd).
Also, the present invention relates to a method for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb), 5 most preferably for the preparation of a preferably crystalline compound of formula (Vd), wherein a compound of formula (Ile) is employed.
Generally, the present invention also relates to a chiral compound which is obtainable or which is obtained according to a process of the present invention comprising steps (1.1) to 10 (2), or comprising steps (1.1) to (3), or comprising steps (1.1) to (4), or comprising steps (1.1) to (5), or comprising steps (1.1) to (6), preferably comprising steps (1.1) to (2) or comprising steps (1.1) to (5) or (1.1) to (6).
The present invention is illustrated by the following examples.
Examples Example 1: Synthesis of the compound of formula (B) (Exl.a) Preparation of the compound of formula (BB) with L = Cl F
CI
F (BB) In 20 ml of MTBE, 3.8 g of Mg were suspended. The temperature of the suspension was 55 C. Then, 0.5 g of Grignard reagent (CH3)3Si-CH2MgCI in MTBE from a previous batch were added in order to dry the system (if no such Grignard reagent is available for the first batch, (CH3)3Si-CH2MgC1 in diethyl ether (CAS Registry Number: 13170-43-9) commercially available as 1.0 M solution from Sigma-Aldrich, can be used), followed by 1.0 ml of chloromethyl trimethylsilane (CM-TMS; CAS Registry Number: 2344-80-1;
commercially available from Sigma-Aldrich). Then, a solution of 14 ml of the CM-TMS in 43 ml of MTBE was added slowly over a period of 2 hours at a temperature of 55 C. The mixture was stirred for 2 hours at 55 C and then cooled to a temperature of -10 C.
Subsequently, 10.0 g of the commercial compound of formula (AA) with L=Cl (CAS
Registry Number: 51336-94-8; commercially available from Sigma-Aldrich) in 30 ml of MTBE were added and the temperature was kept in the range of from 0 to -10 C.
The reaction mixture was quenched in a 20 % (w/v) aqueous solution of ammonium chloride.
The obtained organic layer was washed with a 20 % (w/v) aqueous solution of ammonium chloride. The thus washed organic layer was then washed with water.
To the organic layer, 11.0 ml of concentrated sulphuric acid were added, and the temperature was kept at 25 to 30 C. Then, the reaction mixture was stirred at a temperature of from 45 to 50 C for 3 hours. Subsequently, the reaction mixture was cooled to 20 C and 25 ml of water were added, and the organic layer was separated. The obtained organic layer was extracted with a 9 % (w/v) aqueous solution of sodium bicarbonate, followed by washing with water. The solvents of the washed organic layer were removed by distillation under reduced pressure, and the title compound was obtained as an oil. The yield was 9.4 g, corresponding to a theoretical value of 95 %.
(Exl.b) Preparation of the compound of formula (CC) with R11 = R22 = CH2CH3 O OEt F
OEt O
F (CC) 10.0 g of the compound of formula (BB) as oil, as obtained according to (Ex1.a) were dissolved in 20 ml of DMSO under stirring. Then, 3.2 g of NaOH flakes and 24.0 ml of diethyl malonate were added. The resulting suspension was stirred for 5 hours at 25 to C. Subsequently, 100 ml of water were added, and the resulting mixture was stirred for 30 min. The thus obtained solution was extracted with 80 ml of cyclohexane at 25 to 30 C. After separation of the layers the aqueous layer was extracted with 40 ml of 30 cyclohexane at 25 to 30 C. The combined organic layers were washed with a 5% (w/v) aqueous solution of NaOH, followed by washing with water. After washing, the solvents of the organic layer were removed by distillation under reduced pressure and the title compound was obtained as an oil. The yield was 15.0 g, corresponding to a theoretical value of 90.0 %.
(Ex1.c) Preparation of the compound of formula (DD) OH
F
OH
F (DD) 10.0 g of the compound of formula (CC) as oil, as obtained according to (Exl.b), were dissolved in 120 ml of isopropyl alcohol and 13.0 ml of water under stirring at 25 to 30 C.
The resulting mixture was cooled to a temperature of from 0 to -5 C. Then, 2.3 g of lithium chloride and 2.1 g of sodium borohydride were added at 0 to -5 C. The resulting suspension was stirred at 25 to 30 C for 20 hours. The pH of the stirred mixture was adjusted to a value of 1 (measured by using a calibrated pH meter) by addition of 4 N
aqueous HCI. Afterwards, a 20 % (w/v) aqueous solution of NaOH was added to adjust the pH to a value of 10 (measured by using a calibrated pH meter). The resulting mixture was stirred for 1 hour. Then, the lower aqueous layer was drained. From the separated organic layer, the isopropyl alcohol was distilled off, and an oil was obtained. To the oil, 100 ml of toluene and 100 ml of water were added, and the product was extracted into the toluene layer. The solvents of the resulting toluene layer were removed by distillation, under reduced pressure and the title compound was obtained as oil. The yield was 6.0 g, corresponding to a theoretical value of 82.0 %.
(Exl.d) Preparation of the compound of formula (EE) O
Y
/O
F
OH
F (EE) 10.0 g of the compound of formula (DD) as oil, as obtained according to (Exl.c), were dissolved in 80 ml of toluene and cooled to -15 C. Then, 7.4 g of sodium bicarbonate, 0.5 g of enzyme (Novo SP 435; Candida antarctica, Novozym 435 from Novo Nordisk), and 7.9 ml of isobutyric anhydride. were added. The resulting mixture was stirred at -15 C
for 24 hours. Then the solids were filtered off and the filtrate was washed with a 5 % (w/v) aqueous solution of sodium bicarbonate, followed by washing with water. The solvents of the resulting organic layer were removed by distillation under reduced pressure to obtain the desired product as an oil. This oil was dissolved in 40 ml of n-heptane at 50 to 60 C.
The clear solution was gradually cooled to a temperature of 10 C. The compound of formula (EE) crystallized as colorless crystals. The obtained solids were filtered, and the wet filter cake was washed with 20 ml of n-heptane. The filter cake was then dried at 40 C
in vacuo and the title compound was obtained as colorless crystals. The yield was 9.2 g, corresponding to a theoretical value of 70.0 %.
(Ex1.e) Preparation of the compound of formula (FF) with Hal = I
O
F F O ~-X
O
(Pp) 10.0 g of the crystals obtained in (Ex1.d) were dissolved in 80 ml of ethyl acetate under stirring. The resulting solution was cooled to -15 C, and 21.5 g of iodine and 7.0 g of sodium bicarbonate were added. The obtained suspension was stirred at -15 C
for 5 hours.
The reaction mixture was quenched in 200 ml of a 10% (w/v) aqueous solution of sodium sulphite. The organic layer was washed with 100 ml of a 10% (w/v) aqueous solution of sodium sulphite, followed by washing with water. The solvents of the thus obtained, washed organic layer were removed by distillation under reduced pressure to obtain the title compound as an oil. The yield was 13.5 g, corresponding to a theoretical value of 95.0%.
(Exl.f) Preparation of the compound of formula (GG) 10.0 g of the compound of formula (FF) as oil, as obtained according to (Ex1.e), were 3o dissolved in 80 ml of DMSO under stirring. Then, 10 g of the sodium salt of 1,2,4-triazole were added at 25 to 30 C, and the resulting reaction mixture was stirred for 24 hours at 85 to 90 C. The mixture was then cooled to 25 to 30 C, and 25 ml of 5 % (w/v) aqueous solution of sodium hydroxide were added. The mixture was then stirred for 3 hours at 25 to 30 C. 100 ml of water were added, and the product was extracted into 150 ml of methyl tetrahydrofuran. The thus obtained organic layer was washed with a 10 % (w/v) aqueous solution of sodium chloride, and subsequently the solvents of the resulting separated organic layer were removed by distillation under reduced pressure to obtain the title compound of formula (GG) F F OH
O
NN~
(GG) as a crude oil. The yield was 6.0 g, corresponding to a theoretical value of 86.0 %.
(Exl.g) Preparation of the HC1 salt of compound (GG) 10.0 g of the compound of formula (GG) as crude oil as obtained in (Exl .f) were dissolved in 200 ml of acetone under stirring at 30 to 40 C. The resulting solution was cooled to 25 to 30 C. Then, HC1 in MTBE (10 wt.-%) was added over a period of 15 min at 25 to 30 C. The solid crystallized when the mixture was stirred for 15 min. Then, 200 ml of MTBE were added slowly over a period of 30 min. The suspension was cooled to 0 to -5 C and stirred for 2 hours. The product was filtered, and the wet cake was washed with ml of MTBE. After drying at 70 C in vacuo, the HCl salt of the compound (GG) was 20 obtained as colourless solid. The yield was 9.5 g, corresponding to a theoretical value of 85.0 %.
The HCl salt of compound of formula (GG) was obtained as mixture of the cis-isomer with the respective trans-isomer with a cis:trans ratio of 9:1.
(Exl.h) Preparation of an HC1 salt of the compound of formula (GG) with solid extraction, using MIRK and n-butanol as solvent mixture 20.0 g of the crystalline HCl salt of the compound of formula (GG) containing the HCl salt of the cis-isomer of formula (GGa) F F OH
NN II
(GGa) and the HCl salt of the trans-isomer of formula (GGb) F F -OH
O
(GGb) with a cis:trans ratio of 9:1 (60 mmol) obtained as described above in (Exl.g) were 5 suspended in a mixture of n-butanol (50 ml) and MIBK (50 ml). The mixture was heated to 60 C, and this temperature was maintained for a period of 2 hours.
Subsequently, the mixture was cooled to room temperature. The obtained solid was filtered off and washed with a small amount of diethyl ether.
1o This solid (14.55 g, 43.9 mmol) was re-suspended in a mixture of n-butanol (36.4 ml) and MIBK (36.4 ml). The mixture was heated to 60 C, and this temperature was maintained for a period of 2 hours. Subsequently, the mixture was cooled to room temperature.
The obtained solid was filtered off and washed with a small amount of diethyl ether.
15 After drying under vacuum at 45 C, the HCl salt of compound of formula (GG) was obtained as colorless crystalline solid with an overall yield of 66 % over 2 steps, corresponding to 10.75 g. The crystals showed Wringing under the microscope.
The HC1 salt of compound of formula (GG) contained the HCl salt of the cis-isomer and 20 the HC1 salt of the trans-isomer with a cis:trans ratio of 99.2 : 0.8, as determined by HPLC.
HPLC Method for determination of purity and cis/trans ratio:
Principle Determination by HPLC using UV detector Potassium dihydrogen Merck Cat. No. 60487305001730 phosphate Orthophosphoric acid AR Grade e.g (Merck, Cat No Reagents and (85 %) 61768205001046) Equipment Acetonitrile HPLC grade (e.g. Merck Cat. No.
61830025001046) HPLC system Agilent 1100 series or similar pH meter e.g. Metrohm or equivalent Dissolve 2.72 g of Potassium dihydrogen phosphate in 1000 ml of Buffer Preparation water and adjust the pH to 3.0 0.05 by adding dilute orthophosphoric acid (85 %) using a pH meter. Filter through 0.45 m (micrometer) filter and degas.
Diluent Buffer: Methanol (80: 20) v/v Chromatographic Conditions Column C16, 250 mm X 4.6 mm i.d.5 p, e.g. Ascentis RP amide or equivalent column can be used after appropriate validation.
System. Gradient Column Temperature 40 C
Mobile phase A Buffer Mobile phase B Buffer: Acetonitrile (30: 70) v/v Flow rate 2.0 ml/min Injection temperature 25 C
Injection volume 25 l (microliter) Run time 45 minutes Detection wavelength 210 nm System Gradient Time % mobile phase B
Gradient program 25 80 The X-ray powder diffraction pattern (XRD) of this compound of formula (GG) is shown in Fig. 3.
5 Method for the recording ofX-ray diffractogr^ams:
The samples were analyzed on the Zero background holder in spinning mode at ambient conditions. A typical precision of the 2-Theta values is in the range of about 0.2 2-Theta. Thus a diffraction peak that appears at 8.6 2-Theta can appear between 8.4 and 8.8 2-Theta on most X-ray diffractometers under standard conditions.
Instrument Parameters:
XRD Measurement Conditions:
Instrument X'PERT PRO PANalytical Scan Axis Gonio Start Position [ 2Th.] 3.0 End Position [ 2Th.] 40.0 Step Size [ ] 0.0170 Scan Step Time [s] 100 Scan Type Continuous Anode Material Cu Generator Settings 45 kV, 40 mA
Spinning Yes Incident Beam Optics:
Soller Slits 0.02 radians Divergence Slit Type Programmable Slits (Fixed 0.5 ) AntiScatter Slits Fixed Slits (1 ) Beam Mask 10 mm (MPD/MRD) Diffracted Beam Optics:
Antiscatter Slit Programmable Slits (Fixed 0.5 ) Soller Slits 0.02 radians Filter Nickel Detector X'celerator Mode Scanning Active Path Length 2.122 (Exl.j) Synthesis of the compound of formula (B) A suspension of 292.0 g of the compound of formula (GG) obtained according to (Exl.h) above (MW: 331.75 g/mol; 0.88 mot, d. r. > 99:1; 1.0 equiv.) in 2.92 L of CH2C12 was prepared at a mass temperature of 12 + 3 C. To this, 142.5 g of Et3N (MW:
101.19 g/mol, 195.9 mL, 1.41 mol, 1.6 equiv.) were added slowly at 22 8 C within 60 min.
The mixture was cooled to a mass temperature of 12 3 C and 129.5 g of DMAP (4-dimethylamino-pyridine; MW: 122.17 g/mol; 1.06 mol, 1.2 equiv.) were added in one portion. Subsequently, 185.0 g of TsCl (tosyl chloride; MW: 190.65 g/mol; 0.97 mol;
1.1 equiv.) were added in at least five portions at a mass temperature of 22 8 C within 60 min. By the last addition, the mass temperature was adjusted to 25 E 3 C
and stirring of the pink suspension was continued for further 3 h at 25 3 C. The reaction mixture was extracted with 1.46 L of aq. 10 % HCl at 25 + 3 C followed by 1.46 L of aq. 9 % NaHCO3 at 25 3 C followed by 1.46 L of H2O. The organic layer was concentrated to approx.
20 % of its original volume at 25 + 3 C under reduced pressure, To the concentrate, 5.83 L of heptane (25 -L 3 C) were added slowly at 25 3 C within 60 min.
The resulting suspension was cooled to 2 3 C and stirring was continued for 60 min. The solid was filtered off and washed with 2 x 1.46 L of heptane (25 + 3 C). The product was dried under reduced pressure < 50 mbar) at 40 C over night until a level of S 0.1 % of DCM
was achieved.
372.8 g of the compound of formula (B) (0.83 mol, 94 % yield "as is") were obtained.
The product contained the compound of formula (B), the cis-isomer F F O-Tos O
Nil IN
(B) and the trans-isomer F F ~O-Tos NN "
N
with a cis:trans ratio of 99.2 0.8.
Example 2: Synthesis of the compound of formula (fa) A solution of 297 mg of BHT (butylated hydroxytoluene; M = 220.35 g/mol; 1.35 mmol;
500 ppm) and 727 g of the compound of formula (A) (A) (MW: 269.35 g/mol; 2.698 mol; 1.0 equiv.; obtainable, for example, according to example 1 of EP 1 230 231 B1 (on page 4)) in 4.7 L of DMSO was prepared at a mass temperature of 30 + 2 C. To this was added a solution (30 2 C) of 161.9 g of NaOH (MW:
40.0 g/mol, 4,047 mol, 1.5 equiv.) in 161.9 g of oxygen-free H2O upon keeping the mass temperature at < 32 C. The mixture was stirred for 10 min at 30 + 2 C. Then, a solution (30 2 C) of 1335 g of the compound of formula (B) contained in the product as obtained according to Example 1 (Exl.j) above F F O-Tos O
NN II
(B) (12.968 mol = 1.1 equiv., MW= 449.48 g/mol) in 6.6 L of DMSO was added at amass temperature of < 32 C within 10 min. The pH of the reaction mixture was checked after a reaction time of 60 min and at least also after 5 and 8 hours. After stirring for 60 to 90 min 5 at 30 2 C the crystallization of the product started. The dark brownish, thin suspension was stirred for 10-15 hat 30 2 C. At minimum agitation rate, the addition of 21.8 L of H2O was started at 30 2 C and was carried out at a constant rate whereby the reaction temperature was allowed to rise simultaneously to 45 5 C. Then, the remaining water was added at a rate to keep the temperature at 45 5 C (overall addition time: about 60 1o min in total) . Subsequently, the suspension was cooled to 20 2 C in 60 min and stirred for further 60 min at 20 + 2 C. The resulting solid was filtered off and washed with 8.5 L
of cold 1 % oxygen-free aqueous NaOH (5-10 C), then 2 x 8.5 L of cold oxygen-free H2O
(15-10 C) followed by 2 x 8.5 L of isopropanol (22 3 C).
15 All operations being part of the following purification procedure were carried out under a positive nitrogen atmosphere.
The wet crude product (approx. 2.44 kg) in 72.7 L of acetonitrile was heated to reflux temperature. The mixture was refluxed for 10-15 minutes. To the resulting solution 116 g 20 of charcoal (Ceca Eno) were added and the suspension was stirred for 10 min at reflex temperature. The charcoal was filtered off and the filter cake was washed with 11.6 L of hot acetonitrile. Under stirring the yellow coloured filtrate was cooled to 20 + 2 C during 1 hour. Crystallization started at approx. 60 C. Under stirring the crystal suspension was cooled to 0 2 C over 30 min and stirred at this temperature for one hour.
The resulting 25 crystals were filtered off and washed with 6 L of cold acetonitrile (< 5 C).
The product was dried at < 75 C (preferred temperature 70 15 C) under reduced pressure < 55 mbar) until a level of < 1.4 % of residual water was achieved. 1180 g of the compound of formula (Ia) O
NON
(Ia) (MW: 546.63 g/mol; 2.18 mol, 80.0 % yield "as is") were obtained as a white to yellow crystalline powder.
Example 3: Synthesis of the compound of formula (lIla) O
NH
HN
JOH
(IIIa) Example 3.1: Synthesis of the compound of formula (ii) with Y = phenyl 1o a) 1.70 kg of nitrosobenzene (MW: 107.11; 15.9 mol; 1.0 eq.) were dissolved in 6.16 L
of DCM by stirring at 20-25 C under N2 atmosphere.
b) In a separate vessel, 2.76 kg propionaldehyde (MW: 58.08; density: 0.798 g/mL;
47.5 mol; 3.0 eq.) and 5.28 L of DCM were cooled to -6 to -4 C under N2 atmosphere. To the resulting mixture, 0.057 kg of glacial acetic acid (MW:
60.05;
density: 1.049 g/mL; 0.95 mol; 0.06 eq.) and 0.55 kg of D-proline (MW: 115.13;
4.75 mol; 0.3 eq.) were added, and a fine suspension was obtained.
c) To this suspension of b), 0.4 L of the nitrosobenzene solution obtained in a) were added. Onset of the reaction was indicated by discoloration of the suspension and a temperature rise up to +3 C within 1 min. Then, the remaining nitrosobenzene solution (about 7 L) of the nitrosobenzene solution obtained in a) were added at a rate to keep the reaction temperature between -5 and -3 C. The mixture gradually turned darker and resulted in a clear solution when addition was complete.
Stirring was then continued for 10 min, and complete conversion was determined using HPLC. The compound of formula (i) with Y = phenyl was obtained as intermediate with an enantiomeric purity expressed as enantiomeric excess (ce) > 98 %, i.e.
more than 99 % of the molecules of the chiral compound of formula (i) with Y =
phenyl were present as isomer of formula (ia) with Y - phenyl. Enantiomeric purity was determined analogously to the method described in Brown et al., J. Cher. Soc.
2003, 125 (36), 10808-10809 and using Chiralcel OD-H and n-heptane/isopropanol/diethylamine as eluent.
d) Subsequently, 8.8 L of DCM, 3.0 kg of a molecular sieve having pores with a diameter of 0.4 nm (4 Angstrom; commercially available from Aldrich), and 3.14 kg of formyl hydrazine (MW: 60.06; 52 mol; 3.3 eq.) were added at 0-5 C, leading to an increase in temperature. Stirring was continued at 0-5 C under N2 atmosphere.
After 3 hours, complete conversion was determined using HPLC.
e) The obtained solids were filtered and washed with 4.4 L of DCM. The solution was concentrated to 1/4 of its original volume at a bath temperature of < 10 C.
Then, 28 L of MTBE were added, and the resulting solution was reduced to 1/4 of its original volume by distillation at a bath temperature of < 10 C. The resulting organic layer was then diluted with 7 L of MTBE and extracted five times with of a 20 % aqueous sodium chloride solution. Then, 8.8 L of DCM were added for azeotropic removal of water, The resulting solution was concentrated to give 12 kg of a solution of the compound of formula (ii) with Y = phenyl in MTBE which contained 2.86 kg of said compound (MW 207.23; 80 % yield), f) This solution containing the compound of formula (ii) with Y = phenyl was used in the next step (Example 3.2) without further purification.
Example 3.2: Synthesis of the compounds of formula (iii) and (iv) with Y =
phenyl, and Rfl,, Rbb and Ree = methyl and R1= ethyl a) 0.887 kg of the compound of formula (ii) as obtained,according to Example 3.1 (MW: 207.23; 4.28 mol; 1.0 eq.), employed as a solution in MTBE (total weight 290 g) which contained about 2 wt.-% of H2O, were dried with 1.54 kg of a molecular sieve having pores with a pore diameter of 0.4 nm (4 Angstrom;
commercially available from Aldrich) at 20-25 C for 30 min. Thus, the water content was reduced to a value of less than 0.1 wt.-%. Then, the molecular sieve was removed by filtration and washed with 1.7 L of MTBE. The resulting solution was diluted with 16 L of MTBE. The water content of this solution was about 0.05 %
(0.5 mat; 0.12 eq.).
b) Then, 2.8 L of BSA (bistrimethylsilylacetamide) (MW: 203.43; density: 0.832 g/mL;
11.5 mol; 2.7 eq.) were added to the filtrate. The resulting solution was stirred at 20-25 C. After 1 hour, silylation was complete, as detected by 'H-NMR. The compound of formula (iii) with Y = phenyl and Raa, Rbb and R,,, = methyl was obtained as intermediate.
c) Then, the solution was cooled to -70 to -60 C, and 8.65 L of a solution of ethyl magnesium chloride in THE' (2 mol/l; MW: 88.82; density: 0.978 g/ml; 17.3 mol;
4.0 eq.) were added at a rate to keep the reaction temperature between -70 and -60 C.
This mixture was stirred for 1 hour at -60 C. Subsequently, the temperature was raised to -25 C, and stirring was continued. After 3 hours, complete conversion was detected by HPLC. The reaction was then quenched by dropwise addition of 5.5 kg of MeOH at a temperature of -25 C. During quenching, the mixture was allowed to warm up to 0-15 C.
d) The resulting organic layer was then extracted at 20-25 C twice with 30 L
of a 10 %
aqueous ammonium chloride solution and once with 30 L of a 20 % aqueous sodium chloride solution. The organic layer (20 kg) contained approximately 0.89 kg of the compound of formula (iv) with Y = phenyl and Rl = ethyl (MW: 237.30; 80 %
yield) and was used for the next step (Example 3.3) without further purification.
Example 3.3: Synthesis of the compounds of formula (III) with R = H and Rl =
ethyl, i.e. the compound of formula (IIIa) a) 0.89 kg of the compound of formula (iv) (MW: 237.30; 3.76 mol; 1.0 eq.), obtained according to Example 3.2 and used as a solution in MTBE (total weight 20 kg) was diluted with 1 L of MeOH at 20-25 C.
b) Then, 0.9 kg of palladium on carbon (Pd/C; 5 % Pd; 50 % water) were added, and the resulting solution was stirred vigorously at 20-25 C. Reduction reaction was carried out with 1 atm of H2. The vessel was evacuated and vented with 1 atm three times. After 1.5 hours of stirring under H2 atmosphere, complete conversion was detected by HPLC. Then, the suspension was filtrated and the catalyst washed with 1.8 L of MTBE/MeOH (1/1 v/v). The combined filtrates were concentrated to a yellow oil to yield the crude compound of formula (llla), containing about 40 %
(about 0.55 kg) of the compound of formula (IIIa).
c) This oil was diluted with 13.9 L of MTBE at 20-25 C, and the resulting solution was seeded. After 1 hour of stirring at 20-25 C, a fine suspension was obtained.
Then, 17 L of CHX (cyclohexane) were added, the mixture was cooled to 0 C and stirred at 0 C for 3 hours, resulting in a thick suspension of the compound of formula (IIIa).
The thus obtained crystals were collected and washed with 2.2 L of a cold (0 C) mixture of MTBE and CHX (1/1 v/v) to give 0.44 kg of the compound of formula (IIIa) after drying (MW 146.19; 80 % yield; 64 % yield with respect to the compound of formula (ii)). More than 99 % of the molecules of the chiral compound of formula (IIIa) were obtained as isomer according to formula (IIIb).
10.4 g of this yellow colored material were added to 50 mL of isopropyl acetate, and the resulting mixture was heated to a temperature of 85 to 89 C until a solution was obtained. 0.5 g of activated carbon were added to the yellow solution, and after stirring for several minutes, the hot mixture was filtered and allowed to cool to about 5 C under stirring. After stirring for 2 to 3 hours, the precipitated product was filtered, washed with 5 mL of isopropyl acetate and dried at room temperature under vacuum over night to give 8.54 g of the product as a off-white solid (melting point 78 to 80 C), i.e, the compound of formula (IIIa), wherein more than 99 % of the molecules of said compound were obtained as isomer according to formula (Illb).
Preparation of seeds used in this step c):
100 g of the crude oil obtained in step b) above were purified by column chromatography using 800 g silica gel 60 (0.063-0.200 mm, Merck) as stationary phase and DCM / methanol = 20 /1 as mobile phase. The fractions containing the desired product in pure form, as determined by TLC (Merck, silica gel 60 F254, mobile phase CHXlethyl acetate 1/1) , were collected. After evaporation of the solvents the obtained solid was recrystallized from diethyl ether. The resulting crystals were collected and used as seeds after drying (20 C, <100 mbar).
d) The IR spectrum and the X-ray diffractogram are shown in Figures 1 and 2.
Experimental data were obtained as follows:
The enantiomeric purity of the compound of formula (llla) as obtained in c) was measured by HPLC as follows:
Chromatography 5 HPLC apparatus: Agilent 1200 Column: Waters XBridge C18, 2.5 urn, 50 x 4.6 mm (order no. 186003090) System: gradient Eluent A: buffer solution pH 7.0 Eluent B; buffer solution pH 7.0 / acetonitrile = 2/8 (v/v) 10 Flow rate: 1.8 mL/min Oven temperature: 40 C
Injection volume: 10 p,L (microliter) Stop time: 20 min Detection: 2 (lambda) = 260 nm 15 Gradient:
t (min) 0 8 12 14 15 20 Buffer solution pH 7.0 prepared according to the following recipe: dissolve 7.0 mL of triethylamine in 900 mL of water, adjust the pH to 7.0 with H3P04 and dilute to 1000 mL
with water.
20 Reagent solution prepared according to the following recipe: dissolve 80 to 90 mg of (S)-(-)-a-methylbenzyl isocyanate in acetonitrile and dilute to 1.0 mL with acetonitrile.
Sample preparation:
a) Test stock solution prepared according to the following recipe:
25 Dissolve 3 8 to 42 mg of the substance to be tested, weighed accurately to 0.01 mg, in 1.0 mL of acetonitrile.
b) Test solution prepared according to the following recipe:
In. an HPLC vial, mix 100 jiL (microliter) of test stock solution and 100 uL
(microliter) of reagent solution. Keep at room temperature (20 to 25 C) for 30 min, add 800 L
30 (microliter) of buffer solution pH 7.0 and shake well. Then cool the solution on an ice bath (0 C) for additional 30 min (precipitation of reagent) and filtrate a sample through 0.2 4m (micrometer) directly into another HPLC vial.
Infrared spectra (IR.) data were collected on a MKII Golden GateTM Single Reflection Diamond ATR (attenuated total reflection) cell with a Bruker Tensor 27 FTIR
spectrometer with 4 cni 1 resolution at ambient conditions. To collect a spectrum a spatula tip of a sample was applied to the surface of the diamond in powder form. Then the sample was pressed onto the diamond with a sapphire anvil and the spectrum was recorded. A
spectrum of the clean diamond was used as background spectrum. A typical precision of the wavenumber values is in the range of about 2 cm 1. Thus, an infrared peak that appears at 1716 cm 1 can appear between 1714 and 1718 cm-1 on most infrared spectrometers under standard conditions.
X-ray data (powder diffraction pattern XRPD, X-ray diffraction pattern XRD, X-ray diffractogram) were collected on a Unisantis XMD 300 X-ray powder diffractometer with a position sensitive detector in parallel beam optics using the following acquisition conditions: tube anode: Cu , 40 kV, 0.8 mA; 3 - 43 theta/2theta;
simultaneous detection of regions of 10 per step with detector resolution 1024, counting time 300 seconds per step. Samples were measured at room temperature in a standard sample holder on a rotating sample spinner. A typical precision of the 2-theta values is in the range of about 0.2 2-Theta. Thus a diffraction peak that appears at 5.0 2-Theta can appear between 4.8 and 5.2 2-Theta on most X-ray diffractometers under standard conditions.
HPLC for determination of completion of conversion as mentioned in Example 3.1, c) and d), Example 3.2), c) and Example 3.3, b) was performed as follows:
Column: Zorbax Eclipse XDB-C18, 150*4.6 mm, 5 m (micrometer).
System: gradient Buffer: 2.10 g KH2PO4 + 4.28 g K2HPO4 / 2.0 L H2O, adjust with 85% H3PO4 to pH
6.5 Mobile phase A. 20 mM phosphate buffer pH 6.5 / acetonitrile, 85 / 15, v/v Mobile phase B: 20 mM phosphate buffer pH 6.5 / acetonitrile, 50 / 50, v/v Solvent: H2O / acetonitrile = 50 / 50 v/v Flow rate: 1.5 mL/min Oven temperature: 60 C
Injection volume: 5-20 L (microliter) Stop time: 3 0 min Detection: ?~, (lambda) - 210 nm (Agilent 1200 detector) Autosampler: 5 C
Gradient:
t [min] 0 20 25 26 30 % B 5 100 100 5 stop Sample Preparation:
Sample solution for HPLC in Example 3.1), c) was prepared according to the following recipe: dissolve approx. 100 L (microliter) of the reaction mixture in 0.2 mL
of isopropanol, add approx. 50 mg of NaBH4 and agitate for 10 min at 25 C.
Extract with 0.2 mL of ethyl acetate and 0.5 mL of a 5% KH2PO4 buffer (pH 7.0). Dilute 50 L
(microliter) of the resulting organic layer in a 10 mL volumetric flask and fill to the mark with solvent. Sample weights are adapted according to instrument requirements.
Sample solution for HPLC for Example 3.1 d Exam le 3.2), c) and Example 3.3), b) was prepared according to the following rec pe: dissolve approx. 100 pL of the reaction mixture in 2 mL of acetonitrile in a 20 mL volumetric flask and fill to the mark with solvent. Sample weights are adapted according to instrument requirements.
Example 4: Synthesis of the compound of formula (IVb) O
OH
NH
NN-32.63g carbonyldiimidazole (compound of formula (Ile), 1.1 eq, 201.2 mmol, Sinochem Jiangsu #090506) were dissolved under nitrogen atmosphere in 1300 mL DCM in a 2.0 L
Schmizo reactor and cooled to -10 C under permanent stirring.
Afterwards 100.0 g of the compound of formula (la) obtained according to Example 2 (1 eq., 182.9 mmol) were added and rinsed in with additional 300mL DCM. The reaction mixture was stirred at -10 C for 2 hours.
Subsequently, 30.76 g of the compound of formula (IIla) as obtained in Example 3 (1.1 eq, 201.23 mmol) were added and rinsed with 300 mL DCM. The reaction mixture was warmed to 30 C and afterwards stirred for 3 hours at this temperature.
Afterwards the reaction mixture was cooled to 25 C and the mixture was stirred at this temperature for 4 hours. Crystallization occured after 2.5 hours. The suspension then was cooled to 0 C and stirred for additional 15 hours at this temperature. The solid was isolated via vacuum filtration (time: about 15 min) and afterwards, the filtercake was washed two times each with 100 mL of ice cold DCM. The filtercake was dried (20-25 C, < 50 mbar) and afterwards, 129.2 g of the compound of formula (IVb) were isolated as a 1/1/1 crystallisate with imidazole and DCM (MED) (> 98.5 area% of the compound of formula (IVb) excluding imidazole, determined by HPLC as described below yield: 81.5 %). The ratio of the compound of formula (IVb) to imidazole and to DCM (MED) was detected via NMR.
At least 99% of the molecules of the compound of formula (IVb) were obtained as isomer of formula (IVd) F F ""I"I-0- _N // N_&N 'j~ N~ OH
NH
NON
(IVd).
The IR spectrum and X-ray diffractogram of the obtained compound of formula (IVb) are shown in Figures 4 and 5.
Infrared spectra (IR) data and X-ray data (powder diffraction pattern XRPD) were determined according to the methods as described in Example 3.
1H-NMR and 13C-NMR spectra of the obtained compound of formula (IVb) as obtained in Example 4 were collected. The following results were obtained:
'H-NMR (CDC13, 3 00mHz):
delta (ppm) = 0.93-1.02 (m, 3 H), 1.26 (m, 3 H), 1.45 (m, 1 H), 2.06 (m, 2 H), 3.22 (m, 8 H), 3.52-3.80 (m, 4 H), 4.11 (m, I H), 4.52 (d, J = 16Hz, 1 H), 4.64 (d, J -16Hz, 1 H), 5.30 (s, DCM (MED)), 6.74-6.93 (m, 8 H), 7.09 (s, 2 H), 7.29-7.39 (m, 3 H), 7.67 (s, 1 H), 7.79 (s, 1 H), 8.14 (s, 1 H), 8.22 (b, 1.5 H), 9.53 (b, 0.5 H) rotamers.
13C-NMR (CDCl3, 75mHz):
delta (ppm) 10.9, 19.7, 21.5, 37.4, 38.8, 49.9, 50.6, 55.9, 67.2, 68.9, 70.7, 84.0, 104.6 (t), 111.4 (q), 115.0, 116.9, 118.3, 122.0, 125.4 (q), 128.5 (q), 130.5, 131.1, 144.5, 145.8, 148.8, 149.0, 151.0, 152.8, 156.4, 157.4 (t), 160.7 (q), 164.3, 164.5.
HPLC Method for determination of purity of the obtained compound of formula (IVb):
Column: Zorbax Eclipse XDE-C18, Rapid Res., 4.6x 50mm, 1.8 m, flow: 1.5 mL/rnin wavelength: 210 urn Auto sampler: 5 C
oven temperature: 55 C
Eluent A: 20 mM Phosphate buffer pH 6.5 /acetonitrile 85/14 (v/v) Eluent B: 20 mM Phosphate buffer pH 6.5 /acetontrile 25/75 (v/v) Gradient: 0 min/29%B, 10 min/55%B, 12 min/100%B, 15 min/100%B, 15.1 min/29B, 17 min stop Samples Preparation:
The sample (7-10mg) was dissolved in a 1/1 mixture of acetontrile and water mixture, and in case of slow dilution ultra sonic bath was used to gain complete dilution.
Example 5: Synthesis of the compound of formula (Vb) N
NNN
50.0 g of the compound of formula (IVb) as obtained according to Example 4 above (1 eq, 57.39 mmol) were dissolved in 1600 mL isopropylacetate. To the suspension ,18.66 g imidazole (5.8 eq in total with the imidazole contained in the starting material, 332.8 mmol) and 20.83 g BSA (1.78 eq, 102.4 mmol, 25.0 mL) were added and the mixture was stirred for 45 min until a clear solution occurred.
Afterwards 4.30 g of TMSI solution in DCM containing 2.56 g TMSI (0.22 eq, 12.78 mmol) were added, and the reaction mixture was heated to reflux (89 C) and stirred at that temperature for 19 hours until complete conversion of the compound of formula (lVb) was observed.
The reaction mixture was added dropwise at a temperature between 50 - 60 C to 500 mL
5 10 % HCI. The aqueous phase was separated, and 750 mL DCM were added.
Afterwards the pH of the mixture was adjusted to 1.02 by the addition of about 225 mL of 20 % NaOH
solution. The organic phase was separated and washed with 500 mL 0.1 M HCl followed by a washing with 330 mL 5 % sodium bicarbonate solution. Afterwards the organic solvent was removed under reduced pressure (40 C, 600 - 20 mbar) leading to 50.71 g of to compound of formula (Vb) as a white solid.The solid was dissolved in acetone and afterwards 325 mL water were added. To the solution lOg charcoal (Ceca Eno) were added and the mixture was stirred for 30 min. Afterwards the charcoal was removed via filtration, the filter cake was washed with 300 mL of an acetone/water (5/1) mixture leading to a slightly yellow solution. The solution was warmed to 27 C and 1000 mL water were 15 added.
Subsequently 40 mg seeding crystals (obtained according to above-described process followed by purification by chromatography) were added and the mixture was stirred for 60 min leading to white slurry. Additional 500 mL water were added and the mixture was 20 stirred at 30 C for 30 min, cooled to 15 C and stirred at that temperature for 120 min.
Afterwards the white solid was separated via filtration (G3, d = 12 cm) and the filter cake was washed with 375 mL of an acetone/water (1/2) mixture. The isolated solid was dried under vacuum (< 45mbar) at 40 C for 16 hours leading to 32.57 g of the compound of formula (Vb) (46.48 mmol, 81.0 %, contents 98.9 %).
At least 99% of the molecules of the compound of formula (Vb) were obtained as isomer of formula (Vd) Il ox 1, 0 NN
(Vd).
HPLC Method for determination of the ratio of Vd to Vb:
Column: Daicel CHIRALCEL OD, 250 x 4.6 mm System: isocratic Eluent:Hexane / Ethanol / Diethylamine = 30 / 70 / 0.2 (v I v l v) Flow rate: 1.0 mLlmin Oven temperature: 3 9 C
Injection volume: 15 ..L
Stop time: 20 min Detection: 2 (lambda) = 260 nm (Agilent 1100 detector) Autosampler: 39 C
Solutions prepared according to the following recipe:
Dissolve 24 to 27 mg of the substance to be tested, weighed accurately to 0.01 mg, in solvent in a 25-mL volumetric flask. Fill to the mark with solvent and shake well.
Example 6: Preparation of polymorph form IV of the compound of formula (Vb) The product obtained in Example 5 was transformed to the polymorph form IV
which is described in detail in WO 20101000668.
10.0 g of the compound of formula (Vb) as obtained in Example 5 were added to 110 ml acetone, and the mixture was heated to reflux. 33 ml of water were added to the hot.
suspension and a clear solution was immediately obtained. The hot solution was filtered and allowed to cool to about 20 C within 45 min. After standing in a refrigerator at about 5 C for 17 hours the precipitated product was filtered and dried under vacuum to give 8.6 g of white needles. Said product was suspended in a mixture of 160 ml of water and 40 ml of methanol. 0.9 g of seed crystals Form IV were added. Said seed crystals were prepared as described in WO 2010/000668 Al, example 2, on page 23, lines 16 to 25, this disclosure being incorporated herein by reference, as well as the patent document US 6,958,337 cited therein. The suspension was heated to 40 C and stirred until the conversion to polymorphic form IV was completed. The white suspension was then cooled down to about 10 C and the solid was collected by filtration. After washing with 20 ml of water the product was dried at room temperature under vacuum to yield 9 g of the compound of formula (Vb), polymorphic form IV, as a white powder.
List of cited documents - Huang et al., Organic Letters 2004, 6 (25) 4795-4798 - M. Hepperle et. al Tetrahedron Lett. 2002, 43, 3359-3363 - US 6,355,801 B1 to - EP 1 230 231 B1 - US 5,403,937 - Remington`s Pharmaceutical Sciences, 15th Ed., Mack Publishing Co., New Jersey (1991) - US 5,972,381 - US 5,834,472 - US 4,957,730 - Greene et al., "Protective Groups in Organic Synthesis", P Ed., Wiley-lnterscience (1999) - Brown et al., I Chem. Soc. 2003, 125 (36), 10808-10809 - US 6,958,337
Claims (38)
1. A process for the preparation of a chiral compound, comprising (1.1) providing a compound of formula (1) Y3-NH2 (I) or a salt thereof, wherein Y3 is an optionally substituted aryl residue;
(1.2) providing a compound of formula (IIa) O=C=N-Y0 (IIa) or phosgene or a phosgene derivative of formula (IIb) wherein Y0 is an optionally substituted alkyl or aryl residue, and wherein Y1N- and Y2N- are the same or different optionally substituted nitrogen heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of -SiR a R b R c and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where R a, R b and R c are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V)
(1.2) providing a compound of formula (IIa) O=C=N-Y0 (IIa) or phosgene or a phosgene derivative of formula (IIb) wherein Y0 is an optionally substituted alkyl or aryl residue, and wherein Y1N- and Y2N- are the same or different optionally substituted nitrogen heterocycle moieties, preferably selected from the group consisting of imidazolyl and benzimidazolyl;
(1.3) providing a compound of formula (III) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of -SiR a R b R c and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where R a, R b and R c are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues;
(2) mixing and reacting the compounds of formulae (I), (IIa) and/or (IIb), and (III) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IV) and/or formula (V)
2. The process of claim 1, wherein in (2), (2.1) the compounds of formulae (I) and (IIa) and/or (IIb) are mixed and at least partially reacted in a solvent to obtain a reaction mixture;
(2.2) adding the compound of formula (III) to the reaction mixture obtained from (2.1).
(2.2) adding the compound of formula (III) to the reaction mixture obtained from (2.1).
3. The process of claim 1 or 2, wherein reacting in (2) is carried out in the absence of a compound of formula Cl-C(=O)-O-Ph, in particular in the absence of an ester of a halogenated formic acid.
4. The process of any of claims 1 to 3, wherein in (2), the solvent is a polar aprotic solvent or a mixture of two or more thereof, preferably selected from the group consisting of dichloromethane DCM, tetrahydrofurane (THF), methyl tetrahydrofurane (MeTHF), acetonitrile (AN), an ester, preferably butylacetate (BuAc) or ethylacetate (EtAc), dimethylformamide (DMF) and a mixture of two or more thereof, preferably DCM or THF.
5. The process of any of claims 1 to 4, wherein reacting in (2) is carried out at a temperature in the range of from -20 to +40 °C.
6. The process of any of claims 1 to 5, wherein reacting in (2) is carried out in the presence of an acid, preferably in the presence of a substoichiometric amount of an acid, which acid is at least partially soluble in the solvent employed in (2), the acid preferably being trifluoroacetic acid (TFA).
7. The process of any of claims 1 to 6, wherein in (1.2), a compound of formula (IIb) is provided, said compound of formula (IIb) preferably being carbonyldiimidazole (CDI) of formula (IIc)
8. The process of any of claims 1 to 7, wherein in the compound of formula (III), R1 is an alkyl residue having from 1 to 4 carbon atoms, preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, in particular ethyl, and wherein -R is -H or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R preferably being -H.
9. The process of any of claims 1 to 8, wherein the compound of formula (III) is a preferably crystalline compound wherein preferably at least 95 %, preferably at least 97 %, more preferably at least 99 % of the molecules of said crystalline compound are present as
10. The process of any of claims 1 to 9, wherein in (1.3), the compound of formula (III) is provided by a process comprising (a) providing a chiral compound of formula (i) wherein Y is an optionally substituted aryl moiety, preferably an optionally substituted phenyl moiety, more preferably unsubstituted phenyl, said providing in (a) preferably comprising reacting propionaldehyde in a solvent with a compound of formula (j) O=N-Y (j), preferably with nitrosobenzene, in the presence of a catalyst system preferably comprising at least one organocatalyst, more preferably proline (Pro), more preferably D-Pro, said catalyst system optionally further comprising a promoter, preferably an urea derivative, more preferably 1-(2-dimethylamino-ethyl)-3-phenyl urea;
(b) reacting the compound of formula (i) with H2N-NH-CHO in a solvent, preferably dichloromethane (DCM), to obtain a compound according to formula (ii) (c) separating the compound of formula (ii) from the reaction mixture obtained from (b) by solvent extraction, wherein prior to (c), a solvent exchange is preferably carried out;
(d) optionally reacting the compound of formula (ii) in a solvent with a silylating agent comprising the residue -SiR aa R bb R cc to obtain a compound of formula (iii) wherein the residues R aa, R bb and R cc may be the same or different and are preferably alkyl or aryl residues, more preferably alkyl residues having from to 6 carbon atoms, preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms;
(e) reacting the compound of formula (ii) or reacting the compound of formula (iii) with a nucleophilic compound comprising a nucleophilic residue R1, the nucleophilic compound preferably being a Grignard compound R1MgX
wherein X is preferably selected from the group consisting of Cl, Br, and I, and wherein R1 is preferably an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, in a solvent, preferably selected from the group consisting of toluene, tetrahydrofurane (THF), MTBE, and a mixture of THF and MTBE, to obtain a compound of formula (iv) (f) reducing the compound of formula (iv), preferably by hydrogenation, to obtain a compound of formula (III) with R = H
(g) optionally crystallizing the compound of formula (III) with R= H;
(h) optionally recrystallizing the compound of formula (III) with R= H, wherein the compound of formula (III) with R = H is preferably recrystallized from isopropyl acetate;
(i) optionally reacting the optionally crystallized compound of formula (III) with R = H in a solvent with a silylating agent comprising the residue -SiR a R b R
c to obtain a compound of formula (III) with R = SiR a R b R c wherein the residues R a, R b and R c may be the same or different and are preferably alkyl or aryl residues.
(b) reacting the compound of formula (i) with H2N-NH-CHO in a solvent, preferably dichloromethane (DCM), to obtain a compound according to formula (ii) (c) separating the compound of formula (ii) from the reaction mixture obtained from (b) by solvent extraction, wherein prior to (c), a solvent exchange is preferably carried out;
(d) optionally reacting the compound of formula (ii) in a solvent with a silylating agent comprising the residue -SiR aa R bb R cc to obtain a compound of formula (iii) wherein the residues R aa, R bb and R cc may be the same or different and are preferably alkyl or aryl residues, more preferably alkyl residues having from to 6 carbon atoms, preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms;
(e) reacting the compound of formula (ii) or reacting the compound of formula (iii) with a nucleophilic compound comprising a nucleophilic residue R1, the nucleophilic compound preferably being a Grignard compound R1MgX
wherein X is preferably selected from the group consisting of Cl, Br, and I, and wherein R1 is preferably an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, in a solvent, preferably selected from the group consisting of toluene, tetrahydrofurane (THF), MTBE, and a mixture of THF and MTBE, to obtain a compound of formula (iv) (f) reducing the compound of formula (iv), preferably by hydrogenation, to obtain a compound of formula (III) with R = H
(g) optionally crystallizing the compound of formula (III) with R= H;
(h) optionally recrystallizing the compound of formula (III) with R= H, wherein the compound of formula (III) with R = H is preferably recrystallized from isopropyl acetate;
(i) optionally reacting the optionally crystallized compound of formula (III) with R = H in a solvent with a silylating agent comprising the residue -SiR a R b R
c to obtain a compound of formula (III) with R = SiR a R b R c wherein the residues R a, R b and R c may be the same or different and are preferably alkyl or aryl residues.
11. The process of claim 10, wherein at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of the chiral compound of formula (i) provided in (a) are present as
12. The process of any of claims 1 to 11, wherein the compound of formula (I) is or a suitable salt thereof.
13. The process of claim 12, wherein in (1.1), the compound of formula (I) is provided by a process comprising (aa) reacting a compound of formula (A) in a suitable solvent, preferably a polar protic or a polar aprotic solvent, more preferably selected from the group consisting of dimethylsulfoxide (DMSO), dimethylformanaide (DMF), N-methylpyrrolidone (NMP), sulfolane, methanol, ethanol, n-propanol, and isopropanol, and in the presence of a suitable base, preferably a suitable inorganic base, more preferably a carbonate, a hydroxide and/or a hydrogencarbonate, more preferably an alkali metal and/or an alkaline earth metal carbonate, hydroxide and/or hydrogencarbonate, with a compound of formula (B) wherein the solvent is preferably ethanol or DMSO; and wherein the base is preferably selected from the group consisting of sodium hydroxide and potassium carbonate.
14. The process of claim 13, wherein the base is sodium hydroxide which is preferably employed as aqueous solution with a concentration of at least 20 wt.-%, preferably at least 45 wt.% with respect to the base.
15. The process of claim 13 or 14, further comprising (bb) at least once re-crystallizing the compound of formula (I), preferably from acetonitrile and/or water.
16. The process of any of claims 1 to 15, comprising isolating the chiral compound of formula (IV) from the reaction mixture obtained from (2), said isolating preferably being carried out by crystallization.
17. The process of any of claims 1 to 15 or 16, further comprising (3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IV) with a solvent, to a temperature in the range of from 40 to 150 °C to obtain a compound according to formula (V)
18. The process of claim 17, wherein either the mixture obtained from (2) or the mixture obtained from mixing the isolated chiral compound of formula (IV) with a solvent is heated to a temperature in the range of from 60 to 140 °C, preferably from 70 to 130 °C.
19. The process of claim 17 or 18, wherein prior to heating, either the mixture obtained from (2), optionally after solvent exchange, or the mixture obtained from mixing the isolated chiral compound of formula (IV) with a solvent, is admixed with a silylating agent, preferably trimethylsilylchloride (TMSCI); trimethylsilyl iodide (TMSI) or bis-trimethylsilylacetamide (BSA) or a combination thereof, preferably TMSI
and BSA.
and BSA.
20. The process of claim 19, wherein prior to admixing with the silylating agent, imidazole is admixed in amount so that the molar ratio of imidazole relative to the compound of formula (IV) is in the range of 2:1 to 10:1, more preferably from 4:1 to 9.5:1, more preferably from 7:1 to 8:1, most preferably 7.5:1.
21. The process of any of claims 17 to 20, wherein the mixture obtained from (2) contains a solvent selected from the group consisting of dichloromethane (DCM), tetrahydrofurane (THF), methyl tetrahydrofurane (MeTHF), acctonitrile (AN), an ester, preferably butylacetate (BuAc) or ethylacetate (EtAc) and dimethylformamide (DMF), and a mixture of two or more thereof, preferably DCM or THF, and prior to heating the mixture obtained from (2), said solvent is exchanged by a different solvent suitable to allow the temperature conditions according to claim 17, said different solvent preferably being selected from the group consisting of toluene, benzene, an ester of a saturated carboxylic acid, preferably isopropyl acetate, dimethylformamide (DMF), acetonitrile (AN), methyltetrahydrofurane (Me-THF), methylisobutylketone (MIBK), dioxane, hexamethyldisilazane (HMDS), and a mixture of two or more thereof, preferably toluene or isopropyl acetate.
22. The process of any of claims 17 to 21, further comprising (4) extracting the compound of formula (V), preferably using a suitable aqueous acid, more preferably an aqueous inorganic acid and more preferably aqueous hydrochloric acid, as extracting agent.
23. The process of any of claims 1 to 22, further comprising (5) crystallizing the compound of formula (V) in a solvent, (6) optionally separating the crystallized compound from the solvent.
24. The process of claim 23, wherein crystallizing in (5) is carried out in a solvent which is selected from the group consisting of alcohols, preferably methanol, ethanol, n-propanol, iso-propanol, ethers, preferably THF, ketones, preferably acetone, acetonitril, and a mixture of two or more thereof, most preferably admixed with water, the solvent most preferably being methanol admixed with water or acetone admixed with water.
25. The process of any of claims 1 to 24 for the preparation of posaconazole, comprising (1.1) providing a compound of formula (Ia) (1.2) providing a compound of formula (IIc) (1.3) providing a compound of formula (IIIa) wherein at least 99 % of the molecules of said compound are present as compound of formula (IIIb) (2) mixing and reacting the compounds of formulae (Ia), (IIc), and (IIIa) in a solvent in any order to obtain a reaction mixture containing a chiral compound of formula (IVb) wherein at least 99 % of the molecules of said compound are present as compound of formula (IVd) and/or of formula (Vb) wherein at least 99 % of the molecules of said compound are present as compound of formula (Vd) wherein in (2), (2.1) the compounds of formulae (Ia) and (IIc) are mixed and at least partially reacted in a solvent to obtain a reaction mixture;
(2.2) and the compound of formula (IIIa) is added to the reaction mixture obtained from (2.1);
(3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IVb) with a solvent, to a temperature in the range of from 40 to 150 °C to obtain a compound according to formula (Vb);
(4) extracting the compound of formula (Vb), using aqueous hydrochloric acid, as extracting agent;
(5) crystallizing the compound of formula (Vb) in a solvent;
(6) optionally separating the crystallized compound of formula (Vb) from the solvent.
(2.2) and the compound of formula (IIIa) is added to the reaction mixture obtained from (2.1);
(3) either heating the mixture obtained from (2), optionally during and/or after solvent exchange, or heating a mixture obtained from mixing the isolated chiral compound of formula (IVb) with a solvent, to a temperature in the range of from 40 to 150 °C to obtain a compound according to formula (Vb);
(4) extracting the compound of formula (Vb), using aqueous hydrochloric acid, as extracting agent;
(5) crystallizing the compound of formula (Vb) in a solvent;
(6) optionally separating the crystallized compound of formula (Vb) from the solvent.
26. The process of any of claims 23 to 25, wherein the crystallized compound obtained from (5) or (6) is not subjected to a subsequent chromatography purification stage, preferably not subjected to a subsequent purification stage.
27. The process of any of claims 23 to 25, wherein the crystallized compound obtained from (5) or (6), in particular the compound of formula (Vb) wherein preferably at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said crystalline compound are present as isomer of formula (Vd) is re-crystallized, preferably from a mixture of acetone and water or from methanol, and is subsequently stirred in a mixture of water and methanol, preferably in the presence of seed crystals, said seed crystals comprising the crystalline compound of formula (Vd) in the form of polymorph IV.
28. A chiral compound, obtainable or obtained by a process according to any of claims 1 to 27, preferably according to claim 16 or according to any of claims 23 to 27.
29. An optionally crystalline chiral compound of formula (IVa) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, R1 in particular being ethyl, and wherein -R is -H or a suitable hydroxyl protecting group preferably selected from the group consisting of -SiR a R b R c and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where R a, R b and R c are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, with -R
preferably being -H or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R in particular being -H, and wherein said compound is most preferably a compound of formula (IVb)
preferably being -H or a hydroxyl protecting group selected from the group consisting of -Si(CH3)3 and benzyl, -R in particular being -H, and wherein said compound is most preferably a compound of formula (IVb)
30. The compound of claim 29, wherein at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said compound are present as compound of formula (IVc) most preferably as compound of formula (IVd)
31. A composition comprising a preferably crystalline chiral compound of formula (Va) or a salt thereof, wherein R1 is an alkyl residue preferably having from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, more preferably 1 or 2 carbon atoms, most preferably 2 carbon atoms, said composition preferably comprising a compound of formula (Vb) wherein preferably at least 95 %, more preferably at least 97 %, more preferably at least 99 % of the molecules of said preferably crystalline compound are present as isomer of formula (Vc) preferably as isomer of formula (Vd) said composition containing at most 70 weight-ppm, preferably at most 50 weight-ppm, more preferably at most 30 weight-ppm, more preferably at most 10 weight-ppm, said composition in particular being free of a compound of formula (Ve) preferably a compound of formula (Vf) wherein -R is -CH2-C6H5, -R preferably being selected from the group consisting of -SiR a R b R c and optionally substituted alkyl, aryl, alkaryl or aralkyl residues, where R a, R b and R c are the same or different and selected from the group consisting of optionally suitably substituted alkyl and aryl residues, -R more preferably being a hydroxyl protecting group.
32. The composition of claim 31, obtainable or obtained by a process according to any of claims 23 to 27.
33. A pharmaceutical composition for treating fungal infections comprising an antifungally effective amount of a composition according to claim 31 or 32 and a pharmaceutically acceptable additive therefor.
34. A composition according to claim 31 or 32 for use as a medicament.
35. A composition according to claim 31 or 32 for use in a method of treating or preventing fungal infections in mammals in need of such treating or preventing such infections.
36. Use of a composition according to claim 31 or 32 for the preparation of a medicament for treating or preventing fungal infections in mammals in need of such treating or preventing such infections.
37. A method of treating or preventing fungal infections in mammals in need of such treating or preventing such infections, said method comprising administering to such mammal an antifungally effective amount of a composition or pharmaceutical composition according to any of claims 31 to 33.
38. Use of a compound of formula (IIc) for the preparation of an antifungal agent, preferably for the preparation of a preferably crystalline chiral compound of formula (Vb) most preferably for the preparation of a preferably crystalline compound of formula (Vd)
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EP (1) | EP2571871B1 (en) |
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MX2012013334A (en) | 2013-02-01 |
EP2571871A1 (en) | 2013-03-27 |
AU2011254654B2 (en) | 2016-01-07 |
US9040539B2 (en) | 2015-05-26 |
CN102906087B (en) | 2016-03-23 |
RU2012154811A (en) | 2014-06-27 |
RU2585760C2 (en) | 2016-06-10 |
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