CA2584421A1 - Cleaning and disinfectant compositions - Google Patents

Abstract

Cleaning and disinfectant compositions are provided particularly for use with hard surfaces. The compositions include hydrogen peroxide and an acid or salt thereof which is resistant to oxidation other than phosphorous based acids.
Replacement of phosphorous based acids with acids of the invention results in improved hydrogen peroxide stability while maintaining or increasing the efficacy of cleaning and antimicrobial activity of the compositions.
Typically, acids of the invention include substituted or unsubstituted carboxylic acids such as R4-C (R2) (R3)-R1-COOH. Inventive compositions may further include surfactants, a chelating agent or sequestrant, a water soluble or water dispersible solvent, corrosion inhibitors and other adjuvants well known to those skilled in the art. There are further provided methods of use and methods of preparing inventive compositions.

Description

CLEANING AND DISINFECTANT COMPOSITIONS

CROSS-REFERENCE TO RELATED APPLICATION:

This application claims priority based on U.S. Provisional Application No.
60/522,775 filed November 5, 2004.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH:
Not applicable.

FIELD OF THE INVENTION

The present invention relates to cleaning and disinfectant compositions for use on hard surfaces. In particular, it relates to hydrogen peroxide solutions with improved stability and antimicrobial properties and methods of use thereof.

BACKGROUND OF THE INVENTION

Disinfectants incorporating hydrogen peroxide are attractive because hydrogen peroxide displays broad spectrum antimicrobial activity and because it decomposes into innocuous products, i.e., water and oxygen. Broad spectrum antimicrobial activity is important in situations where harmful organisms are present, but their identity is not known. Drawbacks to the use of hydrogen peroxide include the inherent instability of hydrogen peroxide solutions and the lengtli of time required for hydrogen peroxide to disinfect a surface to which it had been applied. For example, stabilizers must be added to hydrogen peroxide solutions if they are to be stored for any length of time. Also, it can take 30 minutes or more after application of such solutions to disinfect a treated surface. Recently, it has been disclosed that a combination of a phosphorous based acid and an anionic surfactant can stabilize and increase the activity of hydrogen peroxide solutions. Nevertheless, hydrogen peroxide solutions with improved cleaning and disinfecting activity would be higlily desirable. The present invention is therefore directed to improving the efficacy of hydrogen peroxide based solutions.

SUMMARY OF THE INVENTION

In accordance with one aspect of the present invention, there are provided aqueous cleaning and disinfecting compositions which include hydrogen peroxide and an acid or salt thereof which is resistant to oxidation, other than a phosphorous containing acid. It has unexpectedly been discovered that in hydrogen peroxide based disinfectants replacement of phosphorous containing acids by acids that are resistant to oxidation by hydrogen peroxide enhances the stability of the hydrogen peroxide while at the same time maintaining or increasing cleaning and antimicrobial efficacy.
Moreover, the present compositions are highly effective, both as concentrated solutions, or at various dilutions. Hence, the present compositions are especially well suited for use as an all purpose cleaner and disinfectant for hard surfaces.
For example, inventive compositions are low streaking and leave little residue on glass surfaces such as mirrors. They may be used to maintain grout and fixtures from iron and hard water stains and can whiten grout. The present cleaning and disinfectant compositions can also be formulated for safe use on metal surfaces and fixtures such as stainless steel and aluminum surfaces and fixtures.

According to a second aspect of the invention, there are provided methods of cleaning and disinfecting a surface which include the step of applying to the surface a composition as described herein. Inventive compositions may be used as is or diluted with water prior to application to the surface.

In yet a further aspect of the invention, there are provided methods of preparing the cleaning and disinfecting compositions of the invention. The metliods include the step of combining the hydrogen peroxide and the acid resistant to oxidation.

DETAILED DESCRIPTION OF THE INVENTION

In one aspect, the present invention provides a composition for use in cleaning and disinfecting fabric, synthetic fibers, semi-hard and hard surfaces such as tile, glass, metal, porcelain and the like. The composition includes hydrogen peroxide and an acid or salt thereof which is resistant to oxidation. Acids contemplated for use in the present invention do not include phosphoric. As employed herein, an acid which is resistant to oxidation exhibits less than or equal to 30 or 20 weight %
oxidation by measurement of stability after thirty days exposure to no more than 30 weight percent (wt %) aqueous hydrogen peroxide and no more than 2.0 wt % N chelating agent, of the total composition at 50 C. Acids which exhibit less than or equal to 20 mole %
oxidation under the above conditions are particularly suitable for use in the present invention.

Acids resistant to oxidation include, for example, certain substituted or unsubstituted carboxylic acids, such as substituted or unsubstituted branched chain alkyl carboxylic acids. For example, carboxylic acids resistant to oxidation include those having the formula R4-C (R) (R) -RI-COOH, wherein R' is absent or is a substituted or unsubstituted alkylene, heteroalkylene, alkenylene, heteroalkenylene, alkynylene, or heteroalkynylene, each having up to 10 carbon atoms; R2 and R3 are each independently substituted or unsubstituted C1_8 alkyl; and R4 is substituted or unsubstituted alkyl, alkenyl, alkynyl, heteroalkyl, heteroalkenyl, or heteroalkynyl.
Typically, Rl and R4 are each independently substituted or unsubstituted alkylene.
Acids for use in compositions of the invention include but are not limited to 2,2-bishydroxymethylpropionic acid, neopentanoic acid, neoheptanoic acid, neooctanoic acid, neononanoic acid, or neodecanoic acid. It will be understood by those of skill in the art that other carboxylic acids (e.g., certain substituted or unsubstituted heterocyclic carboxylic acids such as picolinic acid and salicylic acid) which are resistant to oxidation according to the criteria herein provided are also contemplated for use in compositions of the invention. Typically, the acid resistant to oxidation is present in an amount of from about 0.1 to about 30 wt % of the total weight of the composition. Typically, the acid resistant to oxidation is present in a preferred amount of from about 0.5 to about 10 wt % of the total weight of the composition.

Example 1: Hydrogen Peroxide Stability and Efficacy of Various Acids All the following formulas were made using a base formula with the exclusion of Phosphoric Acid and its place the subsequent acid amount corrected to meet the Total Acid Number of the phosphoric base Fornlula and water to equal 100%/wt.
Stability of the hydrogen peroxide was determined at 50C for 4 weeks.
Microbial Efficacy was conducted on each of the samples via AOAC Sanitizer Suspension Test 960.09 at 1:64 dilution. All test formulations were diluted 1/64 in 400 PPM
(as CaCO2) hard water containing 5.0% horse serum. The test material was held at ambient temperature (24 C) for 60 seconds at which time a 0.1m1 portion of a 24 hr Brain Heart Infusion broth culture of S. aureus ATCC 6538 was added to the test solution and mixed. After 5 min at ambient temperature, the test solution was mixed and a 1.1 ml sample withdrawn and placed into 9.9 ml universal neutralizer. A
0.1 ml portion of test organism added to 9.9 ml of standard hard water containing 5%
horse serum and enumerated after 5 minutes served as a control.

Universal neutralizer RT
3 g lecithin 0.5 g fluid tliioglycollate broth 1 g histidine 10 ml phosphate buffer 10 ml phosphate buffer 0.25 N

5 g Sodium thiosulphate ml Tween Bring volume to 1 L with di water 25 The sample was serially diluted in universal neutralizer and the number of surviving organism enumerated by pour plating with Microbial Content Test Agar. A
plated were inverted and incubated at 32 C for 48 hrs. Colonies were counted with the aide of Quebec colony counter and loglo reduction in colony forming units (CFU)/ml compared to CFU/ml of control samples was determined for each 30 formulation.

Results are in the table below.

Base Formula Materials Wt%
Deionized Water 52.46 1-hydroxyethlene 1,1 Diphosponic Acid (60%)(Dequest 2010) 8.00 Dodecyl Benzene Sulfonic Acid (97%) (Biosoft S-101) 5.00 Decyl(sulfophenoxy) benzenesulfonic acid, disodium salt 5.00 (60%)(Dowfax 10CL) C6-C 10 Alcohol ethoxylate 3.5 moles of EO 1.50 Bnzotriazole 0.10 Proplene Glycol propyl ether 10.00 Phosporic Acid (85%) 2.94 Acid Total Log 4 week Peroxide loss (50 C) Acid Reduction Number Dimethyl Propionic, 77.04 >6.37 19.82%

6.50%

Furoic acid, 5.50% 77.01 >6.3 7 52.98%
Picolinic acid, 6.00% 76.99 >6.3 7 24.50%
Isopicolinic acid, 63.12 4.73 30.94%
3.00%

Neopentanoic, 5.00% 76.0 >6.37 25.29%
Neoheptanoic, 5.60% 73.04 >6.3 7 16.62%
Neooctanoic, 6.75% 73.14 >6.37 22.03%
Neononanoic, 7.25% 74.55 >6.37 4.62%

Acid Total Log 4 week Peroxide loss (50 C) Acid Reduction Number Neodecanoic, 8.25% 75.87 >6.29 11.57%
Isonanoic, 6.75% 75.94 >6.29 23.34%
Lactic acid, 5.00% 72.88 5.89 53.38%

Isovaleric acid, 6.25% 78.59 >6.37 29.97%
2-ethyl hexanoic, 76.63 >6.29 28.04%

7.00%

Citric 5.50% 98.14 6.12 57.90%
Glycolic acid, 3.57% 67.72 5.06 37.25%
Succinic, 4.50% 92.82 5.64 36.27%
Nonanoic acid 74.55 >6 37 35.64%

Phosphoric acid, 2.94% 79.7 >5.56 <1%
Example 2: Specific use of Neodecanoic acid at various Wt% and it activity.
To the same base in example 1 the following Wt% of Neodecanoic was used and its subsequent microbial efficacy was compared to both nonanoic acid as well as phosphoric acid examples.

Material Wt% Wt% Wt% Wt% Wt% Wt% Wt%
Deionized Water 50.64 57.45 59.21 61.21 67.21 63.21 45.65 Phosphoric Acid 3.33 3.33 Nonaoic Acid, 96% 7.25 Neo Nonanoic Acid 3.0 3.0 3.0 2.0 Propylene Glycol propyl 10.0 10.0 ether Ethylene Glycol monobutyl 5.0 8.0 6.0 3.0 5.0 ether Material Wt% Wt% Wt% Wt% Wt% Wt% Wt%
Hydrogen peroxide 35% 21.43 21.43 Hydrogen peroxide, 50% 15.00 15.00 15.00 15.00 15.00 Benzotriazole 0.10 0.1 Tolyl triazole (Cobratec 0.29 0.29 0.29 0.29 0.29 35G) Alfonic L-610-3.5 1.50 Lubrphos LP-700 1.50 2.0 1.5 3.0 Lutensol ON 30 1.50 1.50 Dodecyl benzene sulfonic 5.0 5.0 5.0 5.0 5.0 5.0 5.0 acid (Marlon AS3) 1-hydroxyethylene-1,1 8.0 8.0 8.0 8.0 8.0 8.0 8.0 diphosphonic acid Cublen K 60/Dequest 2010 Chelating Agent 1.0 AOAC Use Dilution at +0/30 +4/30* +0/30 +1/30 +1/30 +1/30 +0/30 1:32, 5 min. contact, 400 ppm hard water and 5%
blood serum S.aureus *Considered a failure The phrase "unsubstituted alkyl" refers to allcyl groups that do not contain heteroatoms. Thus the phrase includes straight chain alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, and the like. The phrase also includes branched chain isomers of straight chain alkyl groups, including but not limited to, the following which are provided by way of example: -CH(CH3)2, -CH(CH3)(CH2CH3), -CH(CH2CH3)2, -C(CH3)3, -C(CH2CH3)3, -CH2CH(CH3)2, -CH2CH(CH3)(CH2CH3), -CH2CH(CHZCH3)2, -CH2C(CH3)3, -CH2C(CH2CH3)3, -CH(CH3)CH(CH3)(CH2CH3), -CH2CH2CH(CH3)2, -CH2CH2CH(CH3)(CH2CH3), -CH2CH2CH(CH2CH3)2, -CH2CH2C(CH3)3, -CH2CH2C(CH2CH3)3, -CH(CH3)CH2CH(CH3)2, -CH(CH3)CH(CH3)CH(CH3)2, -CH(CH2CH3)CH(CH3)CH(CH3)(CH2CH3), and others. The phrase also includes cyclic alkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl and such rings substituted with straight and branched chain alkyl groups as defined above. The phrase also includes polycyclic alkyl groups such as, but not limited to, adamantyl, norbornyl, and bicyclo[2.2.2]octyl and such rings substituted with straight and branched chain alkyl groups as defined above.
Thus, the phrase unsubstituted alkyl groups includes primary alkyl groups, secondary alkyl groups, and tertiary alkyl groups. Unsubstituted alkyl groups may be bonded to one or more carbon atom(s), oxygen atom(s), nitrogen atom(s), and/or sulfur atom(s) in the parent compound. Typical unsubstituted alkyl groups include straight and branched chain alkyl groups and cyclic alkyl groups having 1 to 20 carbon atoms, and more typical such groups have from 1 to 10 carbon atoms. Even more typical such groups, also known as unsubstituted lower alkyl groups, have from 1 to 5 carbon atoms. Typically, unsubstituted alkyl groups include straight and branched chain alkyl groups having from 1 to 3 carbon atoms and include methyl, ethyl, propyl, and -CH(CH3)2.

The phrase "substituted alkyl" refers to an unsubstituted alkyl group as defined above in which one or more bonds to a carbon(s) or liydrogen(s) are replaced by a bond to non-hydrogen and non-carbon atoms such as, but not limited to, a halogen atom such as F, Cl, Br, and I; an oxygen atom in groups such as hydroxyl groups, alkoxy groups, aryloxy groups, and ester groups; a sulfur atom in groups such as thiol groups, alkyl and aryl sulfide groups, sulfone groups, sulfonyl groups, and sulfoxide groups; a nitrogen atom in groups such as amines, amides, alkylamines, dialkylamines, arylamines, alkylarylamines, diarylamines, N-oxides, imides, and enamines; a silicon atom in groups such as in trialkylsilyl groups, dialkylarylsilyl groups, alkyldiarylsilyl groups, and triarylsilyl groups; and other heteroatoms in various other groups. Substituted alkyl groups also include groups in which one or more bonds to a carbon(s) or hydrogen(s) atom is replaced by a bond to a heteroatom such as oxygen in groups such as carbonyls, carboxyls, and esters; nitrogen in groups such as imines, oximes, hydrazones, and nitriles. Preferred substituted alkyl groups include, among others, alkyl groups in which one or more bonds to a carbon or hydrogen atom is/are replaced by one or more bonds to fluorine atoms. One example of a substituted alkyl group is the trifluoromethyl group and other alkyl groups that contain the trifluoromethyl group. Other alkyl groups include those in which one or more bonds to a carbon or hydrogen atom is replaced by a bond to an oxygen atom such that the substituted alkyl group contains a hydroxyl, alkoxy, aryloxy group, or heterocyclyloxy group. Still other alkyl groups include alkyl groups that have an amine, alkylamine, dialkylamine, arylamine, (alkyl) (aryl) amine, diarylamine, heterocyclylamine, (alkyl) (heterocyclyl) amine, (aryl) (heterocyclyl) amine, or diheterocyclylamine group.

The terin "alkylene" refers to saturated, divalent straight or branched chain hydrocarbyl groups typically having in the range of 1 up to about 20 carbon atoms, and "substituted alkylene" refers to alkylene groups further bearing one or more substituents as set forth above.

The phrase "unsubstituted alkenyl" refers to straight and branched chain and cyclic groups such as those described with respect to unsubstituted alkyl groups as defined above, except that at least one double bond exists between two carbon atoms.
Examples include, but are not limited to vinyl, -CH=CH(CH3), -CH=C(CH3)2, -C(CH3)=CH2, -C(CH3)=CH(CH3), -C(CH2CH3)=CH2, cyclohexenyl, cyclopentenyl, cyclohexadienyl, butadienyl, pentadienyl, and hexadienyl among others.

The phrase "substituted alkenyl" has the same meaning with respect to unsubstituted alkenyl groups that substituted alkyl groups had with respect to unsubstituted alkyl groups. A substituted alkenyl group includes alkenyl groups in wliich a non-carbon or non-hydrogen atom is bonded to a carbon double bonded to another carbon and those in which one of the non-carbon or non-hydrogen atoms is bonded to a carbon not involved in a double bond to another carbon. Typically unsubstituted alkenyl groups have form 2 to 20 carbons, and in some embodiments such groups have from 2 to 10 carbons.

The term "alkenylene" refers to divalent straight or branched chain hydrocarbyl groups having at least one carbon-carbon double bond, and typically having in the range of about 2 up to 20 carbon atoms, and "substituted alkenylene"
refers to alkenylene groups further bearing one or more substituents as set forth above.

The phrase "unsubstituted alkynyl" refers to straight and branched chain groups such as those described with respect to unsubstituted alkyl groups as defined above, except that at least one triple bond exists between two carbon atoms.
Examples include, but are not limited to -C=CH, -C=C (CH3), -C=C (CH2CH3), -CHZC=CH, -CHZC=C (CH3), and -CHZC=C (CH2CH3) among others. Typically, unsubstituted alkynyl groups have form 2 to 20 carbons, and in some embodiments such groups have from 2 to 10 carbons.

The phrase "substituted alkynyl" has the same meaning with respect to 5 unsubstituted alkynyl groups that substituted alkyl groups had with respect to unsubstituted alkyl groups. A substituted alkynyl group includes alkynyl groups in which a non-carbon or non-hydrogen atom is bonded to a carbon triple bonded to another carbon and those in which a non-carbon or non-hydrogen atom is bonded to a carbon not involved in a triple bond to another carbon.

10 The phrase "unsubstituted heteroalkyl" refers to unsubstituted alkyl groups as defined above in which the carbon chain is interupted by one or more heteroatoms chosen from N, 0, and S. Unsubstituted heteroalkyls containing N may have NH
or N (unsubstituted alkyl) in the carbon chain. Thus, unsubstituted heteroalkyls include alkoxy, alkoxyalkyl, alkoxyalkoxy, thioether, alkylaminoalkyl, aminoalkyloxy, and other such groups. Typically, unsubstituted heteroalkyl groups contain 1-5 heteroatoms, and more typically 1-3 heteroatoms.

The phrase "substituted heteroalkyl" has the same meaning with respect to unsubstituted heteroalkyl groups that substituted alkyl groups have with respect to unsubstituted alkyl groups.

The phrase "unsubstituted heteroalkylene" refers to a divalent unsubstituted heteroalkyl group as defined above. Thus -CHZ-O-CH2- and -CH2-NH-CHZCH2- are both examples of unsubstituted heteroalkylenes. The phrase "substituted heteroallcylene" refers to a divalent substituted heteroalkyl group as defined above.

The phrase "unsubstituted heteroalkenyl" refers to unsubstituted alkene groups as defined above in which the carbon chain is interrupted by one or more heteroatoms chosen from N, 0, and S. Unsubstituted heteroalkenyls containing N may have NH
or N (unsubstituted alkyl or alkene) in the carbon chain. The phrase "substituted heteroalkenyl" has the same meaning with respect to unsubstituted heteroallcenyl groups that substituted heteroalkyl groups have with respect to unsubstituted heteroalkyl groups.

The phrase "unsubstituted heteroalkenylene" refers to a divalent unsubstituted heteroalkenyl group as defined above. Thus -CH2-O-CH=CH- is an example of an unsubstituted heteroalkenylene. The phrase "substituted heteroalkenylene"
refers to a divalent substituted heteroalkenyl group as defined above.

The phrase "unsubstituted heteroalkynyl" refers to unsubstituted alkynyl groups as defined above in which the carbon chain is interrupted by one or more heteroatoms chosen from N, 0, and S. Unsubstituted heteroalkynyls containing N
may have NH or N(unsubstituted alkyl, alkene, or alkyne) in the carbon chain.
The phrase "substituted heteroalkynyl" has the same meaning with respect to unsubstituted heteroalkynyl groups that substituted heteroalkyl groups have with respect to unsubstituted heteroalkyl groups.

The phrase "unsubstituted heteroalkynylene" refers to a divalent unsubstituted heteroalkynyl group as defined above. Thus -CH2-O-CH2-C=C- is an example of an unsubstituted heteroalkynylene. The phrase "substituted heteroalkynylene"
refers to a divalent substituted heteroalkynyl group as defined above.

Example 3: of a heteralkyl acid The AOAC Use Dilution test was run with 400ppm hard water and 5% blood serum Raw Material Wt% Wt%
Deionized water 52.46 52.85 Phosphoric Acid 2.94 Dimethyl propionic acid 2.55 1 -hydroxyethylene- 1, 1 diphosphonic acid (60% ) Dequest 2010 8.0 8.0 Sodium decyl diphenyloxide disulfonate (Dowfax C10L-60%) 5.0 5.0 Dodecylbenzene sulfonic acid (Biosoft S-101) 5.0 5.0 Hydrogen peroxide (50%) 15.00 15.00 C6-C 10 Alcohol Ethoxylate (alfonic L610-3.5) 1.5 1.50 Raw Material Wt% Wt%
Propylene Glycol n-Propyl Ether 10.00 10.0 Benzotriazole 0.10 0.10 %H202 Loss after 4 weeks at 50C 12.60 22.72 AOAC Use Dilution Test at 1:64 S.aueus +0/30 +0/30 AOAC Use Dilution Test at 1:64 P.aeruginosa +0/30 +0/30 Hydrogen peroxide is present as an aqueous solution in inventive compositions. The amount of hydrogen peroxide varies depending on whether the composition is intended as a concentrate or a ready-to-use formulation. The hydrogen peroxide composition may also be used in a concentrated un-diluted manner which is particularly useful as a sporicide. For example, the hydrogen peroxide solution may be prepared as a concentrated aqueous solution, at up to about 30 wt %
hydrogen peroxide, typically, at up to about 8 wt %, which then may be diluted by the end user.
Alternatively, the solution may be prepared in dilute form, for example, from about 0.05 to about 8 wt %, and more typically, from about 0.016 to about 4, 3, 2, or 1 wt %.

Solutions having from about 0.5 to about 1.0 wt % hydrogen peroxide are suitable for use as household and commercial disinfectants, bactericides, virucides, sanitizers and cleaners. Solutions having from about 3 to about 4 wt % are suitable for use as multipurpose cleaners and bleach alternatives in healthcare facilities, households and commercial facilities. Solutions having from about 6 to about 8 wt %
hydrogen peroxide are suitable for use as sporicides, fungicides, virucides, bactericides, broad spectrum sanitizers, general purpose cleaners, and each alternatives particularly in institutional healthcare and food applications.

Solvents, including water soluble solvents and water dispersible solvents can be added to inventive compositions to enhance cleaning and germicidal activity. For example, a short-chain alcohol, e.g., a C1_6 alcohol, especially methanol, ethanol, or isopropanol may be added to provide additional cleaning ability for organic contaminates. Typically, the amount of short-chain alcohol in inventive compositions ranges from about 0.1 to about 10 wt % of the composition. Similarly, benzyl alcohol may also be used for the same purpose. Such alcohols are particularly suitable for use in ready-to-use formulations.

By comparison, glycol etliers are well-suited for use in concentrated formulations that may be diluted prior to use. For example, the use of glycol ethers in inventive compositions provide additional advantages, such as streak-free properties, added stability and better efficacy. Exemplary glycol ethers for use in the present invention include propylene glycol propyl etlier, ethylene glycol butyl ether, ethylene glycol n-hexyl ether, propylene glycol methyl ether, hexylene glycol ethyl ether, propylene glycol butyl ether, carbitol, or mixtares of two or more thereof.
Typically, glycol ethers may be present at amounts of from about 0.1 to about 30 wt % of the compositions.

Compositions of the invention may include surfactants including nonionic, anionic, cationic or amphoteric surfactants. Anionic surfactants suitable for use in the present invention include sulfonic acids, sulfates, alkali metal and ammonium salts thereof and mixtures thereof. In particular, anionic surfactants include C8_16-alkyl aryl sulfonic acids and alkali metal and ammonium salts thereof, sulfonated C12_22 carboxylic acids and alkali metal and ammonium salts thereof, C8_22-alkyl diphenyl oxide sulfonic acids and alkali metal and ammonium salts thereof, naphthalene sulfonic acids and alkali metal and ammonium salts thereof, C8_22 alkyl sulfonic acids and alkali metal and ammonium salts thereof, alkali metal C$_18 alkyl sulfates, and mixtures thereof, in a concentration range of from 0.02 to 15wt % of the solution.
Typically, the anionic surfactant is an alkyl aryl sulfonate, especially a C10_16 alkyl benzene sulfonate or mixtures thereof. Dodecyl benzene sulfonate, and tridecyl benzene sulfonate and their salts, e.g. sodium, potassium, annonium salts are especially useful anionic surfactants. Other exemplary anionic surfactants include sulfonated 9-octadecanoic acid, diphenyl oxide sulfonic acids and salts, dodecyl diphenyl oxide disulfonic acid and disodium 4-dodecylated diphenyloxide sulfonate, alkylated sulfonated diphenyl oxide disodium salt, the sodium salts of 1-octane sulfonic acid, 1-decane sulfonic acid and tridecane sulfonic acid and sodium lauryl sulfate.

Nonionic surfactants can also be added to inventive compositions to improve cleaning while retaining or improving antimicrobial activity. Although a number of emulsifiers such as alkyl phenoxypolyethoxy etlianol or polyoxyethylene surfactants are beneficial for cleaning surfaces of organic matter or grease, it has been found that shorter chain polyoxyethylene, C6 to Clo nonionic surfactants provide superior cleaning ability. Thus, for example, LUTENSOL ON 30 C10 (synthetic C1O
oxoalcohol) and the like may be used. Another example is Alfonic L 610 -3.5 (C5 -C10 ethoxylated 3.5 mol of EO from Sasol Chemicals. Other useful nonionic surfactants such as include block copolymers such as phosphate esters such as Novell (C6/EO2 PO from Sasol Chemicals), Pluronic L43 (block copolymer of PO/EO from BASF) and phosphate esters such as ANTARA LP-700 (polyoxyethylene phenyl ether phosphate from Rhodia). Likewise, amine oxides are also useful in inventive compositions. For example, Malkamine C8 amine oxide (octyl amine oxine from McIntyre) Amphoteric surfactants, such as cocamphodipropionate and caprylamphodiproprionate, are also suitable for us in the present invention.
Inventive compositions can include chelating agents and sequestrants.
Exemplary agents include ethylenediaminetetraacetric acid (EDTA), diaethylenetriaminepentaacetic acid (DTPA), HEDTA, HEIDA or nitrilotriacetic acid (NTA), sucrose sequestrant (e.g., BEIXON AB-200%, Chtr-Beitlich less than 5%) or sodium acid pyrophosphate/1, 3-diamino-2-hydroxypropane-4N tetraacetic acid.
These chelating agents and sequestrants may be used with or without polyphosphonates such as 1-hydroxyethylidene-1,1-diphosphonic acid. The preferred range of the chelating agent is from 0.1 % to 10%.

Example 4: Using Various Surfactants.

To a base fonnula (with no chelate), additions of the following ingredients are added and corrected for % water.

All test formulations were diluted 1/64 in 400 PPM (as CaCO2) hard water containing 5.0% horse serum. The test material was held at ambient temperature (24 C) for 60 seconds at which time a 0. lml portion of a 24 hr Brain Heart Infusion broth culture of S. aureus ATCC 6538 was added to the test solution and mixed.
After 5 min at ambient temperature, the test solution was mixed and a 1.1 ml sample withdrawn and placed into 9.9 ml universal neutralizer. A 0.1 ml portion of test organism added to 9.9 ml of standard hard water containing 5% horse serum and enumerated after 5 minutes served as a control.

Universal neutralizer 3 g lecithin 0.5 g fluid thioglycollate broth 1 g histidine 10 ml phosphate buffer 10 10 ml phosphate buffer 0.25 N
5 g Sodium thiosulphate 30 ml Tween Bring volume to 1 L with di water The sample was serially diluted in universal neutralizer and the number of 15 surviving organism enumerated by pour plating with Microbial Content Test Agar. A
plated were inverted and incubated at 32 C for 48 hrs. Colonies were counted with the aide of Quebec colony counter and log, o reduction in colony forming units (CFU)/ml compared to CFU/ml of control samples was determined for each formulation.

Results are in the table below.

Chemical %/Wt Reduction in Loglo 4 week hydrogen CFU/ml vs peroxide loss controls (50C) Cocoamphodipropionate 3.0 >5.56 26.92%
Cocoamphodipropionate 5.0 >5.56 38.13%
Caprylamphopropionate 3.0 >5.56 29.95%
Caprylamphopropionate 5.0 >5.56 44.42%
Alky dimethyl Benzyl 0.5 >5.56 8.20%
Ammonium Chloride Alky dimethyl Benzyl 3.0 2.99 59.35%
Ammonium Chloride Lauroyl ethylene diamine 0.5 3.30 0.79%

Chemical %/Wt Reduction in Loglo 4 week hydrogen CFU/ml vs peroxide loss controls (50C) triacetic acid Lauroyl ethylene diamine 1.0 3.14 9.55%
triacetic acid HEIDA (28%) 0.5 5.81 <1%
HEIDA (28%) 2.0 >5.56 6.59%
Lauiyl Amine Oxide 1.00 >5.56 3.46%
Standard Formula >5.56 4.52%
Example 5: Improved broad anti-microbiology of Neo-acid.

In this example a suspension efficacy test was run on several of the previous examples against mycobacterium smegmatis. The samples were tested both neat and at a 1:16 dilution Procedure:
Bacterial Preparation M. sfnegmatis was grown at 37 C on nutrient agar for 481irs. Three consecutive transfers were done with the last being the working culture. Two slants of the third transfer were harvested into 10 ml sterile DI water with 3 grams sterile glass beads. The culture was vortexed for 30 seconds. The cutlure was allowed to settle for 15 minutes before testing.

Test Solution The experimental formulations were tested neat and at a 1:16 dilution. The 1:16 dilution was made in sterile 400ppm hardwater (l Oml hardwater + 0.625uL
experimental formulation).

Suspension Test Procedure Ten (10) ml of test solution (either neat or the 1:16 dilution) was placed in a sterile tube. One hundred micro liters (100uL) of working bacterial suspension was added to test solution. Solution was vortexed and timer started for 5 minutes.
After 5 minutes, the solution was re-vortexed and 1.1 ml of solution was added to 9.9m1 of universal neutralizer. Serial dilutions were done from -1 to -4. The samples were pour plated using Nutrient Agar. The plates were incubated for 5 days at 37 C.
The plates were counted and log reduction calculated. Testing was performed at ambient temperature.

The control was sterile water. Serial dilutions were done from -2 to -6.
Results SAMPLE Log CFU/ml Log reduction CONTROL 5.61 NA
Example 4 with Phosphoric Acid @
2.94%
neat <1 >4.61 1:16 5.05 0.56 With hexylene glycol ether @ 1.5% in place of solvent neat <1 >4.61 1:16 5.65 -0.04 Example 4 with DMPA @3.80%
neat <1 >4.61 1:16 2.48 3.13 Example 4 with DMPA @ 6.5%
neat <1 >4.61 1:16 2.69 2.92 SAMPLE LogCFU/ml Log reduction Example 4 with Neo-Heptanoic @ 5.6%
neat <1 >4.61 1:16 <1 >4.61 Example 4 with Neo-Nonanoic @7.25%
neat <1 >4.61 1:16 <1 >4.61 Example 4 with Neo-Decanoic @8.25%
neat <1 >4.61 1:16 <1 >4.61 Example 4 with Butyl Carbitol @ 10% in place of solvent neat <1 >4.61 1:16 4.98 0.63 Several adjuvants may be added to the composition such as corrosion inhibitors like benzotriazole, methyl benzotriazole, fragrances and viscosity modifiers.

In accordance with another aspect of the invention, there is provided a composition comprising 3.5%-30% wt % hydrogen peroxide; 0.5-20% wt % of a carboxylic acid resistant to oxidation; 0.5-10% wt % of a nonionic surfactant;
0.05-5% wt % of a chelating agent or sequestrant; and 2-30% wt % of a solvent that is water soluble or water dispersible. The composition can also include 0.5-20%
wt %
of an anionic surfactant.

In another aspect, the present invention provides methods of cleaning and disinfecting a surface. The methods include applying a composition as described herein to the surface. Inventive compositions are particularly well suited for cleaning and disinfecting hard surfaces including, but not limited to, glass, metal, such as aluminum and stainless steel, porcelain, tile and grout, and other surfaces such as found in restrooms, kitchens and the like. Inventive compositions may be applied in ready-to-use formulations or may be diluted with water prior to applying to the surface to be cleaned. It is an advantage of the present compositions that a single concentrate may be diluted to various concentrations and retains antimicrobial activity at the various dilutions. For example, diluting of 1:4, 1:8, 1:16, 1:32, 1:64, 1:128 and 1:256 of disinfectant to water may be made. In addition, inventive compositions may be used to maintain grout and fixtures from either iron or hard water stains and may also be used to whiten grout.

Example: 6 Cleaning Results Obtained with Various Carboxylic Acids Glass Cleaning results were done using a Modified CSMA DCC-09 for Glass Cleaner. A panel was used to evaluate the cleaning, wetting, streaking and residual wiping using glass mirrors with a scale of one to five, five being a good cleaner and 1 being a poor cleaner. The following results are an average of the composite results in the four categories. All examples were also run in 300 ppm hard water and diluted to 1:32.

Material Wt % Wt% Wt% Wt% Wt% Glance HC*
@1:40 Deionized Water 52.46 52.90 52.90 52.90 52.90 Phosphoric Acid 2.94 Neo pentanoic acid, 2.50 100%
Neo heptanoic acid, 2.5 100%
Neo nonanoic acid, 2.5 100%
Neo decanoic acid, 2.5 100%
Dequest 2010 8.0 8.0 8.0 8.0 8.0 Biosoft S-101 5.0 5.0 5.0 5.0 5.0 Material Wt % Wt% Wt% Wt% Wt% Glance HC*
@1:40 Dowfax C-lOL 5.0 5.0 5.0 5.0 5.0 Downaol PnP 10.0 10.0 10.0 10.0 10.0 Alfonic L610-3 . 5 1.5 1.5 1.5 1.5 1.5 Hydrogen Peroxide, 15.00 15.0 15.0 15.0 15.0 50%
Benzotriazole 0.10 0.1 0.10 0.10 0.10 Solution stability Stable Stable Stable Stable Stable Clear clear clear clear clear Stability in Hard Slight Slight Slight Clear Clear Slight Water (400 ppm @ haze haze haze Haze 1:64 %Loss of hydrogen 5.68% 19.15% 11.36% 6.24% 6.09% NA
peroxide in 4 weeks@

Mirror Cleaning 3.15 3.33 2.98 2.83 2.64 3.06 Performance :
Average Cleaning Results Typically, inventive compositions are prepared simply by combining the hydrogen peroxide and the acid resistant to oxidation as well as any other ingredients that are desired. Generally, those ingredients can be added sequentially or all at once 5 to form an aqueous solution. In some embodiments, the hydrogen peroxide is added last to the solution.

As will be understood by one skilled in the art, for any and all purposes, particularly in terms of providing a written description, all ranges disclosed herein also encompass any and all possible sub ranges and combinations of sub ranges 10 thereof. Any listed range can be easily recognized as sufficiently describing and enabling the same range being broken down into at least equal halves, thirds, quarters, fifths, tenths, eto. As a non-limiting example, each range discussed herein can be readily broken down into a lower third, middle third and upper third, etc. As will also be understood by one skilled in the art all language such as "up to," "at least,"
15 "greater than," "less than," and the like include the number recited and refer to ranges which can be subsequently broken down into sub ranges as discussed above. All patents and publications described herein are incorporated by reference in their entirety for all purposes.

Example 7: Low Phosphoric Levels Material Wt %
Deionized Water 61.275 Phosphoric Acid 0 Neo nonanoic acid, 100% 5.0 Dow Fax C10L 5.0 Biosoft S-101 5.0 Downaol PnP 8.0 Alfonic L610-3.5 3.0 Dow HEIDA, 28% 1.00 Benzotriazole 0.10 Hydrogen Peroxide 11.60 4 week H2021oss @ 50oC 6.67%
4 week H2021oss @ room temp. 1.20%
AOAC Use Dilution @ 1:16 Dilution 5 min. contact, 400 ppm hard 0/30 water and 5% blood serum S.aureus

Claims (22)

1. A composition comprising:
hydrogen peroxide; and an acid or a salt thereof which is resistant to oxidation, other than a phosphorous containing acid.

2. The composition of Claim 1 wherein the acid is a substituted or unsubstituted carboxylic acid.

3. The composition of Claim 1 wherein the acid is a substituted or unsubstituted branched chain alkyl carboxylic acid.

4. The composition of Claim 1 wherein the acid has the formula R4-C(R2)(R3)-R1-COOH, wherein R1-4 are aromatics;
R1 is absent or is a substituted or unsubstituted alkylene, heteroalkylene, alkenylene, heteroalkenylene, alkynylene, or heteroalkynylene, each having up to 10 carbon atoms;
R2 and R3 are each independently substituted or unsubstituted C1-8 alkyl; and R4 is substituted or unsubstituted alkyl, alkenyl, alkynyl, heteroalkyl, heteroalkenyl, or heteroalkynyl.

5. The composition of Claim 4 wherein R1 and R4 are each independently substituted or unsubstituted alkylene.

6. The composition of Claim 4 wherein the acid is 2,2-bishydroxymethylpropionic acid, salicylic acid, neopentanoic acid, neoheptanoic acid, neooctanoic acid, neononanoic acid, or neodecanoic acid.

7. The composition of Claim 1 further comprising a solvent.

8. The composition of Claim 7 wherein the solvent is propylene glycol propyl ether, ethylene glycol butyl ether, ethylene glycol n-hexyl ether, propylene glycol methyl ether, hexylene glycol ethyl ether, propylene glycol butyl ether, carbitol, alcohols, or mixtures of two or more thereof.

9. A composition of Claim 1 further comprising a surfactant.

10. The composition of Claim 9 wherein the surfactant is nonionic, anionic, cationic or amphoteric.

11. The composition of Claim 9 wherein the surfactant is an alkyl phenoxypolyethoxy ethanol, polyoxyethylene, amine oxide, multi block copolymer, phosphate ester, alkyl aryl sulfonic acid, amphoterics, ethoxylated corboxylates, or mixtures of two or more thereof.

12. The composition of Claim 1 further comprising a chelating agent or sequestarant.

13. The composition of Claim 12 wherein the chelating agent or sequestrant is N-(hydroxyethyl) ethylenediamine triacetic acid, a sucrose sequestrant, or sodium acid pyrophosphate/l,3-diamino-2-hydroxypropane-4N-tetraacetic acid.

14. A composition comprising 8 wt % hydrogen peroxide;
wt % of a carboxylic acid resistant to oxidation;
3 wt % of a nonionic surfactant;
0.1 wt % of a chelating agent or sequestrant; and 8 wt % of a solvent that is water soluble or water dispersible.

15. The composition of Claim 14 further comprising 8 wt % of an anionic surfactant.

16. A method of cleaning and disinfecting a surface comprising applying a composition of Claim 1 to the surface.

17. The method of Claim 16 further comprising diluting the composition with water prior to applying it to the surface.

18. A method of making the composition of Claim 1 comprising combining the hydrogen peroxide and the acid resistant to oxidation.

19. The composition of Claim 1 wherein the composition is contained on a pre-saturated wipe.

20. The composition of Claim 19 wherein the wipe consists of a non-woven product.

21. The composition of Claim 19 wherein the wipe consists of a disposable paper product.

22. The composition of Claim 19 wherein the wipe consists of a fabric.