CA2523896A1 - Methode d'impression par nanocontact - Google Patents

Methode d'impression par nanocontact Download PDF

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Publication number
CA2523896A1
CA2523896A1 CA002523896A CA2523896A CA2523896A1 CA 2523896 A1 CA2523896 A1 CA 2523896A1 CA 002523896 A CA002523896 A CA 002523896A CA 2523896 A CA2523896 A CA 2523896A CA 2523896 A1 CA2523896 A1 CA 2523896A1
Authority
CA
Canada
Prior art keywords
molecules
substrate
functional group
composition
molecule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002523896A
Other languages
English (en)
Inventor
Francesco Stellacci
Arum Amy Yu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Massachusetts Institute of Technology
Original Assignee
Massachusetts Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Institute of Technology filed Critical Massachusetts Institute of Technology
Priority to CA002523896A priority Critical patent/CA2523896A1/fr
Publication of CA2523896A1 publication Critical patent/CA2523896A1/fr
Abandoned legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
CA002523896A 2005-10-19 2005-10-19 Methode d'impression par nanocontact Abandoned CA2523896A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA002523896A CA2523896A1 (fr) 2005-10-19 2005-10-19 Methode d'impression par nanocontact

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002523896A CA2523896A1 (fr) 2005-10-19 2005-10-19 Methode d'impression par nanocontact

Publications (1)

Publication Number Publication Date
CA2523896A1 true CA2523896A1 (fr) 2007-04-19

Family

ID=37951539

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002523896A Abandoned CA2523896A1 (fr) 2005-10-19 2005-10-19 Methode d'impression par nanocontact

Country Status (1)

Country Link
CA (1) CA2523896A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008042079A2 (fr) * 2006-09-28 2008-04-10 E. I. Du Pont De Nemours And Company Procédé de formation d'un motif de matériau fonctionnel sur un substrat

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008042079A2 (fr) * 2006-09-28 2008-04-10 E. I. Du Pont De Nemours And Company Procédé de formation d'un motif de matériau fonctionnel sur un substrat
WO2008042079A3 (fr) * 2006-09-28 2008-05-22 Du Pont Procédé de formation d'un motif de matériau fonctionnel sur un substrat

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Effective date: 20140507